CN109143797A - A kind of dual stage face write-through exposure machine and its exposure method - Google Patents
A kind of dual stage face write-through exposure machine and its exposure method Download PDFInfo
- Publication number
- CN109143797A CN109143797A CN201811312705.1A CN201811312705A CN109143797A CN 109143797 A CN109143797 A CN 109143797A CN 201811312705 A CN201811312705 A CN 201811312705A CN 109143797 A CN109143797 A CN 109143797A
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- Prior art keywords
- moving parts
- exposure
- axis moving
- table top
- dual stage
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a kind of dual stage face write-through exposure machines, improve utilization rate of equipment and installations, reduce the free time of the work of each system of equipment, to effectively improve the production capacity of exposure machine, the positioning mechanism being set in sequence in including pedestal and by gantry mechanism on pedestal, exposure mechanism, there are two stepping axis moving parts arranged in parallel for setting on pedestal, Z axis moving parts are separately installed on stepping axis moving parts, stepping axis moving parts are able to drive Z axis moving parts and are moved forward and backward by positioning mechanism, exposure mechanism, Z axis moving parts are fixedly connected with base plate carrying table top respectively, base plate carrying table top is equipped with sucker, base plate carrying table top is arranged to two layers one on the other, Z axis moving parts are able to drive base plate carrying table top and move up and down so that exposing focal plane alignment, furthermore, the present invention also provides a kind of dual stages The exposure method of face write-through exposure machine.
Description
Technical field
The present invention relates to laser direct-writing formula exposure machine technical field, specially a kind of dual stage face write-through exposure machine and its exposure
Light method.
Background technique
The exposure of laser direct-writing formula is for printing the composition with feature on the surface of a substrate, compared to traditional mask plate
With the direct transfer techniques of image of the exposures such as film egative film, write-through exposure technique production capacity is high, and aligning accuracy is high.In semiconductor and
PCB production field has very important effect.
Direct write exposure currently on the market is mostly based on single table surface exposure machine.The production capacity of existing single table surface exposure machine is lower,
Production cycle is long, and the exposure of each plate base needs to complete upper plate, be aligned, exposure, the processes such as lower plate, the whole flow process time compared with
It is long.And the important indicator that production capacity is customer demand is exposed, the production capacity for improving direct write exposure machine is highly desirable.
Summary of the invention
In view of the above-mentioned problems, improving utilization rate of equipment and installations the present invention provides a kind of dual stage face write-through exposure machine, reduce
The free time of the work of each system of equipment, so that the production capacity of exposure machine is effectively improved, in addition, the present invention also provides one
The exposure method of kind dual stage face write-through exposure machine.
Its technical solution is such that a kind of dual stage face write-through exposure machine, including pedestal and suitable by gantry mechanism
Sequence setting positioning mechanism on the base, exposure mechanism, it is characterised in that: there are two mutually flat for setting on the base
The stepping axis moving parts of row setting are separately installed with Z axis moving parts, the stepping axis fortune on the stepping axis moving parts
Dynamic component, which is able to drive the Z axis moving parts and is moved forward and backward, passes through the positioning mechanism, exposure mechanism, the Z axis exercise group
Part is fixedly connected with base plate carrying table top respectively, and the base plate carrying table top is equipped with sucker, on the base plate carrying table top one
Once it is arranged to two layers, the Z axis moving parts are able to drive the base plate carrying table top and move up and down so that exposing focal plane pair
It is quasi-.
Further, the positioning mechanism includes the contraposition axis moving parts being mounted on the first gantry mechanism, described right
Position axis moving parts include motion motor and linear guide, alignment system are provided on motion motor, the motion motor can
Alignment system is driven to move along the linear guide.
Further, the exposure mechanism includes the scan axis moving parts being mounted on the gantry mechanism, described to sweep
It retouches and exposure system is installed on axis moving parts, the scan axis moving parts are able to drive the exposure system movement.
Further, the exposure mechanism includes the first scan axis moving parts being mounted on the first gantry mechanism and peace
The second scan axis moving parts on second gantry mechanism, the first scan axis moving parts are parallel to described
The setting of two scan axis moving parts, is provided between the first scan axis moving parts and the second scan axis moving parts
Crossbeam, the first scan axis moving parts and the second scan axis moving parts can synchronous drive crossbeam movement, it is described
Exposure system sequence is arranged on the crossbeam.
Further, the exposure system is equidistantly mounted on the crossbeam.
Further, the gantry mechanism includes the gantry upright post for being separately positioned on the pedestal two sides, and described gantry is vertical
The upper end of column is provided with installation gantry.
Further, the stepping axis moving parts, Z axis moving parts, contraposition axis moving parts, the movement of the first scan axis
Component, the second scan axis moving parts are electricly connected with kinetic control system respectively.
Further, the exposure system includes exposure cameras, the alignment system include CCD camera, alignment camera lens and
Lighting source.
Further, the base plate carrying table top is fixed by screws on the Z axis cantilever of the Z axis moving parts.
A kind of exposure method of above-mentioned dual stage face write-through exposure machine, it is characterised in that: be set in base plate carrying table top
It is T1 to the time that substrate carries out upper and lower plates, the time that positioning mechanism is aligned is T2, and the time for exposure of exposure mechanism is T3,
And meet following formula: T1+T2=T3 so that on the wherein one base plate carrying table top substrate carry out loading and unloading after and
When successively being aligned by positioning mechanism, another described base plate carrying table top can be completed by exposure mechanism to substrate
Exposure.
Dual stage face write-through exposure machine of the invention has the advantage that the dual stage for capableing of two self-movements by being arranged
Face, it is another when the substrate on a wherein substrate placing stage is successively aligned, exposed by positioning mechanism, exposure mechanism
A substrate placing stage is capable of the upper and lower plates of completing substrate, and existing to greatly reduce equipment in the waiting time of each process
Separate unit surface technology compare, can greatly lifting means utilization efficiency, when reducing the free time of the work of each system of equipment
Between, to effectively improve the production capacity of exposure machine, two-layer substrate loading floor is setting up and down at two layers, sets with existing dual stage face
It is standby to compare the width that effectively reduce double countertop fixtures, place space needed for saving equipment, dual stage face direct write of the invention
The exposure method of formula exposure machine carries out the time of upper and lower plates in face of substrate by setting substrate placing stage and positioning mechanism carries out pair
The sum of time of position is equal to the time for exposure of exposure mechanism, so that two table top concurrent workings, can greatly shorten exposure system
Waiting time improves the utilization efficiency about 100% of equipment entirety.
Detailed description of the invention
Fig. 1 is the structural schematic diagram at the first visual angle of dual stage face write-through exposure machine of the invention；
Fig. 2 is the structural schematic diagram at the second visual angle of dual stage face write-through exposure machine of the invention；
Fig. 3 is the schematic diagram of exposure system of the invention；
Fig. 4 is a kind of flow diagram of the exposure method of dual stage face write-through exposure machine of the present invention；
Fig. 5 is located at the T1 period of upper and lower plates and A table top in B table top for dual stage face write-through exposure machine in embodiment
Positioned at the structural schematic diagram of the vertical view of the T3 period of exposure；
Fig. 6 is located at the T2 period of contraposition and A table top position in B table top for dual stage face write-through exposure machine in embodiment
In the structural schematic diagram of the vertical view of the T3 period of exposure；
Fig. 7 is located at the T3 period of exposure and A table top position in B table top for dual stage face write-through exposure machine in embodiment
In the structural schematic diagram of the vertical view of the T1 period of upper and lower plates；
Fig. 8 is located at the T3 period of exposure and A table top position in B table top for dual stage face write-through exposure machine in embodiment
In the structural schematic diagram of the vertical view of the T2 period of contraposition.
Specific embodiment
See Fig. 1 to Fig. 3, a kind of dual stage face write-through exposure machine of the invention, including pedestal 1 and by gantry mechanism sequence
The positioning mechanism 2 that is set on the base, exposure mechanism 3, in the present embodiment, pedestal use marble pedestal, set on pedestal 1
It sets there are two stepping axis moving parts 4 arranged in parallel, is separately installed with Z axis moving parts on stepping axis moving parts 4
5, stepping axis moving parts 4 are able to drive Z axis moving parts 5 and are moved forward and backward by positioning mechanism 2, exposure mechanism 3, Z axis movement
Component 5 is fixedly connected with 6 face of substrate placing stage respectively, and base plate carrying table top 6 is arranged to two layers one on the other, Z axis moving parts 4
Base plate carrying table top 6 is able to drive to move up and down so that exposing focal plane alignment, in the present embodiment, base plate carrying table top 6 passes through
Screw is fixed on the Z axis cantilever of Z axis moving parts 5, it is ensured that and the levelness and flatness of base plate carrying table top 6 are good,
And base plate carrying table top is equipped with hollow sucker structure, and substrate can firmly be sucked, and guarantees exposure quality.
Specifically, in the present embodiment, positioning mechanism 2 includes the contraposition axis exercise group being mounted on the first gantry mechanism 7
Part, contraposition axis moving parts include two motion motors 21 and linear guide 22, are provided with alignment system 23 on motion motor 21,
Motion motor 21 is able to drive alignment system 23 and moves along linear guide 22, and alignment system includes CCD camera, alignment camera lens and photograph
Mingguang City source.
Specifically, in the present embodiment, exposure mechanism 3 includes the first scan axis fortune being mounted on the first gantry mechanism 7
Dynamic the second scan axis moving parts 32 component 31 and be mounted on the second gantry mechanism 8, the first scan axis moving parts 31 are flat
Row is arranged in the second scan axis moving parts 32, sets between the first scan axis moving parts 31 and the second scan axis moving parts 32
It is equipped with crossbeam 33, one end of crossbeam 33 is connected with the first scan axis moving parts 31, the other end of crossbeam 33 and the second scan axis
Moving parts 31 are connected, and the first scan axis moving parts 31 and the second scan axis moving parts 32 being capable of the fortune of synchronous drive crossbeam 33
Dynamic, exposure system 34 includes exposure cameras, such as Fig. 3, and exposure system 34 is equidistantly mounted on crossbeam 33, and 6 exposure systems 34 are suitable
Sequence is arranged on crossbeam 33, can flexibly increase and decrease number to meet the actual needs.
In the present embodiment, the first gantry mechanism 7, the second gantry mechanism 8 include the gantry for being separately positioned on pedestal two sides
Column 9, the upper end of gantry upright post are provided with installation gantry 10.
In addition, in the present embodiment, stepping axis moving parts 4, Z axis moving parts 5, contraposition axis moving parts 21, first
Scan axis moving parts 31, the second scan axis moving parts 32 can use straight line mould group, electric with kinetic control system 11 respectively
Control connection can ensure high-precision and safety, and alignment system can move on high-precision contraposition axis, and high-precision may be implemented
Contraposition, across on two high-precision scan axises, high-precision intermittent scanning is may be implemented in each scan axis for exposure system and crossbeam
Movement, kinetic control system control two scan axis linkages, realize the intermittent scanning movement of exposure system, two substrate placing stages
Face is mounted on Z axis moving parts, and Z axis moving parts can drive base plate carrying table top to realize and move up and down and expose focal plane pair
It is quasi-.Z axis system is mounted on stepping axis moving parts, and stepping axis drives base plate carrying table top and Z axis to realize high-precision stepping fortune
It is dynamic, it is another when the substrate on a wherein substrate placing stage is successively aligned, exposed by positioning mechanism, exposure mechanism
A substrate placing stage is capable of the upper and lower plates of completing substrate, and existing to greatly reduce equipment in the waiting time of each process
Separate unit surface technology compare, can greatly lifting means utilization efficiency, when reducing the free time of the work of each system of equipment
Between, to effectively improve the production capacity of exposure machine, two-layer substrate loading floor is setting up and down at two layers, sets with existing dual stage face
It is standby to compare the width that effectively reduce double countertop fixtures, place space needed for saving equipment.
During setting substrate production, being set in substrate placing stage in face of the time that substrate carries out upper and lower plates is T1, contraposition
The time that mechanism is aligned is T2, and the time for exposure of exposure mechanism is T3, the dual stage face write-through exposure machine in the present embodiment
Two base plate carrying table tops one be table top A, another be table top B, see the table below 1, table 2, table 1 gives traditional single table surface machine
Type produces the specific timetable of 2 plate bases, and table 2 gives the specific timetable that double countertop fixtures of the invention produce 2 plate bases.
Table 1
Table 2
It is the time required to 2 plate bases of traditional single table surface type production 2* (T1+T2+T3), the table top bearing substrate of equipment, only
The process can be sequentially executed, when executing upper and lower plates, contraposition, exposing one in these three processes, other two process of equipment
Component is in standby mode.Dual stage face write-through exposure machine of the invention executes exposure in A table top because having upper and lower two table tops
When the T3 period of light stream journey, B table top returns to starting point from lower layer and completes upper and lower plates T1 period and contraposition T2 period, B platform
When face is exposed T3, A table top returns to starting point from lower layer and completes upper and lower plates T1 period and contraposition T2 period, so recycles
Operation.
The present invention also provides a kind of exposure methods of dual stage face write-through exposure machine, are faced by the way that substrate placing stage is arranged
The sum of the time T2 that substrate carries out the time T1 of upper and lower plates and positioning mechanism is aligned is approximately equal to the time for exposure of exposure mechanism
T3, T3 and the T1+T2 time are equal, are T1+T2+T3 in this way the time required to 2 plate bases of production, so that two table top concurrent workings,
Half the time is saved than single table surface equipment, can greatly shorten the exposure system waiting time, whole the utilizing of equipment is improved and imitates
Rate about 100%.
Fig. 4 gives a kind of flow diagram of the exposure method of dual stage face write-through exposure machine of the present invention.
As shown in figure 5, A table top is exposed process front half section, B table top carries out upper and lower plates operation；As shown in fig. 6, A table top
It is exposed the second half section, B table top carries out alignment operation；As shown in fig. 7, A table top, which returns to starting point, carries out upper and lower plates operation, B table top
It is exposed front half section；As shown in figure 8, A table top carries out alignment operation, the second half section that B table top is exposed；As Fig. 5 to Fig. 8 is followed
Ring realizes the operating of whole equipment, and within the T1+T2+T3 time, table top A and table top B complete respective exposure process, produces base
Plate 2, substrate 1 is produced within the T1+T2+T3 time compared to single table surface equipment, double countertop fixtures substantially increase equipment work
Make efficiency.
Above embodiments only express one of embodiment of the invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (10)
1. a kind of dual stage face write-through exposure machine is set in sequence in the contraposition on the pedestal including pedestal and by gantry mechanism
Mechanism, exposure mechanism, it is characterised in that: stepping axis moving parts arranged in parallel there are two setting on the base,
Z axis moving parts are separately installed on the stepping axis moving parts, the stepping axis moving parts are able to drive the Z axis fortune
Dynamic component, which is moved forward and backward, passes through the positioning mechanism, exposure mechanism, and the Z axis moving parts are fixed with base plate carrying table top respectively
Connection, the base plate carrying table top are equipped with sucker, and the base plate carrying table top is arranged to two layers one on the other, the Z axis fortune
Dynamic component is able to drive the base plate carrying table top and moves up and down so that exposing focal plane alignment.
2. a kind of dual stage face write-through exposure machine according to claim 1, it is characterised in that: the positioning mechanism includes peace
Contraposition axis moving parts on the first gantry mechanism, the contraposition axis moving parts include motion motor and linear guide,
Alignment system is provided on motion motor, the motion motor is able to drive alignment system and moves along the linear guide.
3. a kind of dual stage face write-through exposure machine according to claim 2, it is characterised in that: the exposure mechanism includes peace
Scan axis moving parts on the gantry mechanism are equipped with exposure system on the scan axis moving parts, described to sweep
It retouches axis moving parts and is able to drive the exposure system movement.
4. a kind of dual stage face write-through exposure machine according to claim 3, it is characterised in that: the exposure mechanism includes peace
The first scan axis moving parts on the first gantry mechanism and the second scan axis being mounted on second gantry mechanism
Moving parts, the first scan axis moving parts are parallel to the second scan axis moving parts setting, first scanning
It is provided with crossbeam between axis moving parts and the second scan axis moving parts, the first scan axis moving parts and described
Second scan axis moving parts can the movement of synchronous drive crossbeam, exposure system sequence is arranged on the crossbeam.
5. a kind of dual stage face write-through exposure machine according to claim 4, it is characterised in that: the exposure system is equidistantly pacified
On the crossbeam.
6. a kind of dual stage face write-through exposure machine according to claim 5, it is characterised in that: the gantry mechanism includes point
The gantry upright post of the pedestal two sides is not set, and the upper end of the gantry upright post is provided with installation gantry.
7. a kind of dual stage face write-through exposure machine according to claim 4, it is characterised in that: the stepping axis exercise group
Part, Z axis moving parts, contraposition axis moving parts, the first scan axis moving parts, the second scan axis moving parts respectively with movement
Control system electricly connects.
8. a kind of dual stage face write-through exposure machine according to claim 1, it is characterised in that: the exposure system includes exposing
Light microscopic head, the alignment system include CCD camera, alignment camera lens and lighting source.
9. a kind of dual stage face write-through exposure machine according to claim 1, it is characterised in that: the base plate carrying table top is logical
Screw is crossed to be fixed on the Z axis cantilever of the Z axis moving parts.
10. a kind of exposure method of dual stage face write-through exposure machine described in claim 1, it is characterised in that: be set in substrate
The time that loading floor carries out substrate is T1, and the time that positioning mechanism is aligned is T2, and the time for exposure of exposure mechanism is
T3, and meet following formula: T1+T2=T3, so that the substrate on the wherein one base plate carrying table top carries out loading and unloading
When being aligned afterwards and successively by positioning mechanism, another described base plate carrying table top can be completed by exposure mechanism to base
The exposure of plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811312705.1A CN109143797A (en) | 2018-11-06 | 2018-11-06 | A kind of dual stage face write-through exposure machine and its exposure method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811312705.1A CN109143797A (en) | 2018-11-06 | 2018-11-06 | A kind of dual stage face write-through exposure machine and its exposure method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110187608A (en) * | 2019-05-21 | 2019-08-30 | 苏州源卓光电科技有限公司 | A kind of exposure method of write-through exposure machine |
| CN111965944A (en) * | 2019-05-20 | 2020-11-20 | 中山新诺科技股份有限公司 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1578595A (en) * | 2003-07-03 | 2005-02-09 | 富士胶片株式会社 | Image forming device |
| CN209433179U (en) * | 2018-11-06 | 2019-09-24 | 苏州源卓光电科技有限公司 | A kind of dual stage face write-through exposure machine |
-
2018
- 2018-11-06 CN CN201811312705.1A patent/CN109143797A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1578595A (en) * | 2003-07-03 | 2005-02-09 | 富士胶片株式会社 | Image forming device |
| CN209433179U (en) * | 2018-11-06 | 2019-09-24 | 苏州源卓光电科技有限公司 | A kind of dual stage face write-through exposure machine |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111965944A (en) * | 2019-05-20 | 2020-11-20 | 中山新诺科技股份有限公司 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
| CN110187608A (en) * | 2019-05-21 | 2019-08-30 | 苏州源卓光电科技有限公司 | A kind of exposure method of write-through exposure machine |
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