CN111965944A - Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method - Google Patents
Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method Download PDFInfo
- Publication number
- CN111965944A CN111965944A CN201910419633.9A CN201910419633A CN111965944A CN 111965944 A CN111965944 A CN 111965944A CN 201910419633 A CN201910419633 A CN 201910419633A CN 111965944 A CN111965944 A CN 111965944A
- Authority
- CN
- China
- Prior art keywords
- exposure
- plate
- station
- plate mechanism
- carrier plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007246 mechanism Effects 0.000 title claims abstract description 237
- 238000000034 method Methods 0.000 title claims abstract description 148
- 230000008569 process Effects 0.000 claims abstract description 124
- 230000006870 function Effects 0.000 claims description 5
- 230000001174 ascending effect Effects 0.000 claims description 2
- 206010070834 Sensitisation Diseases 0.000 claims 1
- 230000008313 sensitization Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 7
- 238000007514 turning Methods 0.000 abstract description 5
- 230000007306 turnover Effects 0.000 abstract description 4
- 230000000007 visual effect Effects 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000000712 assembly Effects 0.000 description 6
- 238000000429 assembly Methods 0.000 description 6
- 230000007723 transport mechanism Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- 235000005811 Viola adunca Nutrition 0.000 description 1
- 240000009038 Viola odorata Species 0.000 description 1
- 235000013487 Viola odorata Nutrition 0.000 description 1
- 235000002254 Viola papilionacea Nutrition 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The embodiment of the invention discloses a novel double-sided double-support-plate mechanism digital direct writing exposure machine, which comprises an exposure machine base, an upper end exposure engine system, a lower end engine exposure system, a double-workbench support plate mechanism, an engine, double workbenches and a visual system calibration mechanism, wherein the upper end exposure engine system is arranged on the exposure machine base and used for exposing the upper surface of a photosensitive plate, the lower end engine exposure system is arranged on the exposure machine base and used for exposing the other surface of the photosensitive plate, the double-workbench support plate mechanism is arranged on the exposure machine base and used for clamping the photosensitive plate to move to an exposure area, and the engine, the double workbenches and the visual system calibration mechanism; because the glass clamping plate mechanism of the traditional double-sided exposure machine is not needed, the glass clamping plate mechanism is not in contact with the photosensitive plate surface, and the exposure yield is greatly improved. The exposure process of the outer layer photosensitive plate does not need the alignment process of the turnover plate, and the front surface and the back surface are simultaneously exposed by one-time alignment; the exposure process of the inner layer photosensitive plate does not need marking and turning plate alignment processes, and the front side and the back side are simultaneously exposed.
Description
Technical Field
The embodiment of the invention relates to the technical field of digital direct-write exposure, in particular to a novel double-sided double-carrier-plate mechanism digital direct-write exposure machine and an exposure method.
Background
In a conventional double-sided exposure machine, a film transfer means is usually used to expose a double-sided photosensitive plate. Before exposure, films with patterns to be transferred are manufactured, the films with the patterns on two sides are fixed on upper and lower pieces of glass respectively, a photosensitive plate with the patterns to be transferred is clamped between the upper and lower pieces of glass, exposure is carried out by using a blue-violet high-brightness light source, the circuit patterns are transferred to a circuit board, and double-side exposure is completed. The double-sided exposure method has the advantages of complex process, incapability of intelligently controlling the expansion and contraction and deviation of the patterns on the front side and the back side of the circuit board and bad influence on the quality of an exposed circuit.
Direct writing is one of the main techniques of pattern lithography, which utilizes a light source with variable intensity to perform a variable dose exposure of a resist material on a substrate surface, and forms a desired relief profile on the resist layer surface after development. Direct writing combines computer control and micro-machining technology, provides great flexibility for a pattern photoetching method, and can reach submicron level of manufacturing precision.
For exposure of a double-sided pattern, a direct-write exposure machine generally employs single-sided exposure. Exposing one surface of the photosensitive plate, turning over the photosensitive plate after exposure is finished, then exposing the other surface of the photosensitive plate, and finally finishing double-surface exposure of the photosensitive plate. Therefore, when the direct-writing exposure machine carries out double-sided exposure work, the turnover operation is needed, the turnover operation inevitably can generate the problem that the photosensitive plate needs to be aligned after turnover, the exposure flow is increased, the exposure precision of the graph can be influenced due to the alignment precision problem, the final product quality is further influenced, and the direct-writing double-sided exposure machine adopts a single-plate-carrying mechanism and a glass box carrier plate, so that the exposure efficiency is low and the yield is low.
Disclosure of Invention
Therefore, the embodiment of the invention provides a novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and an exposure method, so as to solve the problem that the alignment precision and the exposure efficiency of upper and lower patterns of exposure are influenced by re-alignment and double-sided contact exposure after turning over because a common direct-writing exposure machine can only perform single-sided exposure on a photosensitive plate once in the prior art.
In order to achieve the above object, the embodiments of the present invention provide the following technical solutions:
according to the first aspect of the embodiment of the invention, the novel double-sided double-support-plate mechanism digital direct writing exposure machine comprises an exposure machine base, an upper end exposure engine system, a lower end engine exposure system, a clamping plate mechanism, a support plate mechanism and a calibration mechanism, wherein the upper end exposure engine system is arranged on the exposure machine base and used for exposing one surface of a photosensitive plate, the lower end engine exposure system is arranged on the exposure machine base and used for exposing the other surface of the photosensitive plate, the clamping plate mechanism is used for clamping the photosensitive plate, the support plate mechanism is arranged on the exposure machine base and used for enabling the clamping plate mechanism to clamp the photosensitive plate to move to the position of the upper end exposure engine system and the position of the lower end engine exposure system, and the.
Furthermore, the number of the carrier plate mechanisms is two, and the two carrier plate mechanisms are respectively arranged on two sides of the exposure surface.
Furthermore, the device also comprises an alignment mechanism for aligning the marking patterns of the photosensitive plate.
Further, the upper end exposure engine system comprises an upper end exposure component for carrying out exposure operation on the photosensitive plate and an upper end exposure engine component movement X axis arranged in the width direction of the exposure machine base, and the upper end exposure engine component movement X axis is used for enabling the upper end exposure component to move in the width direction of the exposure machine base.
Further, each of the chucking mechanisms is provided with a Z-axis for height adjustment of the chucking mechanism in the height direction of the exposure machine base.
And further, the system also comprises a real-time focusing system, wherein the real-time focusing system comprises a ranging sensor arranged on the alignment mechanism and the upper end exposure engine system.
Further, the calibration mechanism is arranged between the upper end exposure engine system and the lower end exposure engine system, and the calibration system comprises a movement mechanism and a vision system which move in the X direction.
According to the second aspect of the embodiment of the invention, the inner-layer PCB exposure method of the novel double-sided double-carrier plate mechanism digital direct writing exposure machine is characterized in that the exposure machine is divided into a first station for carrying out plate loading and alignment processes, a second station for waiting for the plate loading, a third station for carrying out the exposure process on the photosensitive plate and a fourth station for carrying out the plate unloading process according to functions, and the method comprises the following steps of
The first step is as follows: the upper end support plate mechanism carries out plate loading work at a plate loading position of a first work station, and the lower end support plate mechanism waits below the first work station;
the second step is that: after the upper end support plate mechanism carries out plate loading, the upper end support plate mechanism starts to execute an exposure process on an exposure focal plane, when the upper end support plate mechanism moves away from a first station to reach a second station, the lower end support plate mechanism rises to a first station and carries out a plate loading process, and the upper end support plate mechanism is waited to finish the exposure process;
the third step: after the upper end support plate mechanism finishes the exposure process, executing a plate unloading process at the fourth station, then ascending above the fourth station, and simultaneously executing the exposure process by the lower end support plate mechanism;
the fourth step: the upper end support plate mechanism executes a return process, descends to a first station upper plate position to execute an upper plate process after reaching the position above the first station, and waits for the lower end support plate mechanism to finish an exposure process;
the fifth step: after the lower end support plate mechanism finishes the exposure process, executing a plate unloading process at the fourth station, then descending below the fourth station, executing a return process, and simultaneously executing the exposure process by the upper end support plate mechanism;
and a sixth step: returning to the third step to start the execution.
According to a third aspect of the embodiment of the invention, the novel outer layer PCB exposure method of the double-sided digital direct writing exposure machine is characterized in that the exposure machine is divided into a first station for carrying out plate loading and alignment processes, a second station for waiting for the plate loading, a third station for carrying out the exposure process on the photosensitive plate and a fourth station for carrying out the plate unloading process according to functions, and the method comprises the following steps of
The first step is as follows: the upper end support plate mechanism carries out plate loading work at the plate loading position of the first work station, and the lower end support plate mechanism waits below the first work station;
the second step is that: after the upper end support plate mechanism is used for loading the plate, an alignment procedure is executed, the alignment assembly is controlled to align the photosensitive plate, and when the upper end support plate mechanism moves away from the first station to reach the second station, the lower end support plate mechanism rises to the first station and the plate loading position to execute the plate loading procedure;
the third step: after leaving the second station, the upper end support plate mechanism reaches the third station exposure process to perform the exposure process, the upper end exposure engine system and the lower exposure engine system simultaneously work to perform the exposure process on the photosensitive plate on the upper end support plate mechanism, at the moment, the lower end support plate mechanism performs the alignment process, and the upper end support plate mechanism waits for the exposure process to be completed at the second station;
the fourth step: after the exposure of the upper end support plate mechanism is finished, the support plate mechanism executes a photosensitive plate unloading process and ascends to the position above the fourth station exposure surface, and meanwhile, the lower end support plate mechanism moves to the third station exposure surface to execute an exposure process;
the fifth step: the upper end support plate mechanism starts to execute a return process after being positioned above the exposure surface, the upper end support plate mechanism descends to the first station upper plate position after reaching the position above the first station upper plate position, an upper plate and alignment process is executed, and after the alignment is finished, the lower end support plate mechanism is waited to finish the exposure process;
and a sixth step: after the lower end support plate mechanism finishes the exposure process, the photosensitive plate unloading process is carried out at the fourth station and descends below the exposure surface of the fourth station, the upper end support plate mechanism starts to carry out the exposure process, meanwhile, the lower end support plate mechanism carries out the return process, after the lower end support plate mechanism reaches the position below the upper plate position of the first station, the lower end support plate mechanism ascends to the upper plate position of the first station, the upper plate and the alignment process are carried out, and the upper end support plate mechanism is waited to finish the exposure process;
the seventh step: returning to the third step to start the execution.
The embodiment of the invention has the following advantages: the exposure process of the exposure machine can realize that alignment and exposure are carried out on two different photosensitive plates at the same time, optimizes the beat of digital direct-writing exposure, saves time and improves production efficiency; the inner layer photosensitive plate exposure process can omit marking and turning plate alignment processes, and can simultaneously expose the front surface and the back surface, thereby greatly improving the production efficiency of the inner layer photosensitive plate and the precision of products, and the upper plate position can be adjusted to be at the same height with the exposure focal plane according to specific design and can also be different.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below. It should be apparent that the drawings in the following description are merely exemplary, and that other embodiments can be derived from the drawings provided by those of ordinary skill in the art without inventive effort.
The structures, ratios, sizes, and the like shown in the present specification are only used for matching with the contents disclosed in the specification, so as to be understood and read by those skilled in the art, and are not used to limit the conditions that the present invention can be implemented, so that the present invention has no technical significance, and any structural modifications, changes in the ratio relationship, or adjustments of the sizes, without affecting the effects and the achievable by the present invention, should still fall within the range that the technical contents disclosed in the present invention can cover.
Fig. 1 is a perspective view of the overall structure of a novel double-sided double-carrier plate mechanism digital direct writing exposure machine according to an embodiment of the present invention;
fig. 2 is a schematic diagram of motion tracks of two groups of support plate mechanisms of the novel double-sided double-support plate mechanism digital direct writing exposure machine provided by the embodiment of the invention;
fig. 3 is a system structure layout diagram of a novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine embodying the positions of an upper-end carrier plate mechanism and a lower-end carrier plate mechanism according to an embodiment of the present invention;
fig. 4 is a system structure layout diagram of a novel double-sided double-carrier mechanism digital direct writing exposure machine embodying the positions of an upper end exposure engine system and a lower end exposure engine system according to an embodiment of the present invention;
fig. 5 is a top layout view of a system structure of a novel double-sided double-carrier plate mechanism digital direct writing exposure machine according to an embodiment of the present invention;
fig. 6 is a structural diagram of a calibration system of a novel double-sided double-carrier mechanism digital direct writing exposure machine according to an embodiment of the present invention;
fig. 7 is a schematic diagram of calibration of the relationship between the engines of the novel double-sided double-carrier mechanism digital direct-writing exposure machine according to the embodiment of the present invention;
fig. 8 is a flow chart of an outer-layer PCB exposure method of the novel double-sided double-carrier mechanism digital direct-writing exposure machine according to the embodiment of the invention;
fig. 9 is a flowchart of an inner PCB exposure method of a novel double-sided double-carrier mechanism digital direct writing exposure machine according to an embodiment of the present invention.
In the figure: 101. an exposure machine base; 102. an upper end exposure engine system; 103. a lower end exposure engine system; 104. the upper exposure engine system moves along the X axis; 105. an upper end support plate mechanism; 106. the lower end exposure engine system moves along the X axis; 107. the aligning mechanism moves the K shaft; 108. an alignment mechanism; 109. a lower end support plate mechanism; 110. a left upper carrier plate assembly; 111. a carrier plate assembly on the right side of the upper end; 112. a lower left carrier plate assembly; 113. a lower right support plate component; 114. a light-sensing plate; 115. a Y-axis sliding table; 116. a first clamping plate mechanism; 117. a second clamping plate mechanism; 118. a third clamping plate mechanism; 119. a fourth clamping plate mechanism; 120. calibrating the system; 201. the motion trail of the upper end carrier plate mechanism; 202. the motion trail of the lower end carrier plate mechanism; 203. a fourth station; 204. a third station; 205. a second station; 206. a first station; 207. a plate loading position; 601. a motion mechanism; 603. a vision system; 602. a cylinder moving in the Y-axis direction; 604. a marking plate; 701-; 709. the positions to which both exposure engines 701 and 702 can move in the X-axis direction;
Detailed Description
The present invention is described in terms of particular embodiments, other advantages and features of the invention will become apparent to those skilled in the art from the following disclosure, and it is to be understood that the described embodiments are merely exemplary of the invention and that it is not intended to limit the invention to the particular embodiments disclosed. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example (b): a novel digital direct-writing exposure machine with double-sided double-carrier plate mechanism is disclosed, as shown in fig. 1, fig. 3, fig. 4 and fig. 5, comprising an exposure machine base 101, an upper end exposure engine system 102 for exposing one side of a photosensitive plate 114, a lower end engine exposure system for exposing the other side of the photosensitive plate 114, an alignment component for aligning the patterns of the photosensitive plate 114, a clamping plate mechanism for clamping the photosensitive plate 114 to enable the photosensitive plate 114 not to contact with the exposure pattern area, a carrier plate mechanism for enabling the clamping plate mechanism to clamp the photosensitive plate 114 to move to the upper end exposure engine system 102 and the lower end engine exposure system, and a bearing seat for placing the photosensitive plate 114.
As shown in fig. 1 and 3, the carrier plate mechanisms respectively include an upper carrier plate mechanism 105 and a lower carrier plate mechanism 109, Y-axis sliding tables 115 are respectively disposed on both sides of the exposure machine base 101 along the length direction of the exposure machine base 101, each Y-axis sliding table 115 is respectively provided with an upper transport mechanism and a lower transport mechanism, the transport mechanisms are controlled by a control system, and the transport mechanisms of the two Y-axis sliding tables 115 are symmetrically disposed, wherein the upper carrier plate mechanism 105 is mounted on the transport mechanism above the Y-axis sliding table 115, and the lower carrier plate mechanism 109 is mounted on the transport mechanism below the Y-axis sliding table 115. The upper end support plate mechanism 105 comprises two upper end left side support plate assemblies 110 and two upper end right side support plate assemblies 111, the two upper end left side support plate assemblies 110 and the two upper end right side support plate assemblies 111 are symmetrically arranged, wherein the two upper end left side support plate assemblies 110 are arranged on a conveying mechanism above one side of the Y-axis sliding table 115 and are driven by the conveying mechanism, and the two upper end left side support plate assemblies 110 are arranged on the conveying mechanism above one side of the Y-axis sliding table 115 and are driven by the conveying mechanism.
The lower end carrier mechanism 109 is the same as the upper end carrier mechanism 105, and will not be described in detail herein.
As shown in fig. 1 and fig. 5, four clamping mechanisms are disposed on each carrier plate assembly, and the four clamping mechanisms are respectively fixed on the four carrier plate mechanisms in an aligned manner, that is, a clamping mechanism is disposed on each carrier plate mechanism, and in this embodiment, the four clamping mechanisms are respectively named as a first clamping mechanism 116, a second clamping mechanism 117, a third clamping mechanism 118, and a fourth clamping mechanism 119, and are configured to clamp the photosensitive plate 114, and can be driven by the carrier plate assembly to slide along the Y-axis sliding table 115. Therefore, by the control system, it is realized that the chucking mechanisms on both sides can be moved on the Y-axis slide table 115 in synchronization. Wherein, a Z-axis for adjusting the height of the chucking mechanism is provided in the height direction of each chucking mechanism along the exposure machine base 101, and the height of each chucking mechanism can be adjusted in real time.
Referring to fig. 2, in the present embodiment, the exposure machine base 101 is functionally divided in the longitudinal direction into a first station 206 for performing a plate loading process, a second station 205 for performing an alignment process on the photosensitive web 114, a third station 204 for performing an exposure process on the photosensitive web 114, and a fourth station 203 for performing a plate unloading process.
Referring to fig. 1 and 3, the alignment assembly is also disposed in the first station 206 area for aligning the photosensitive web 114, and the alignment assembly includes two alignment mechanisms 108 for aligning the mark patterns of the photosensitive web 114 and a movement K-axis 107 of the alignment mechanism 108 disposed along the width direction of the base of the photosensitive web 114, the movement K-axis 107 of the alignment mechanism 108 is fixed above the Y-axis slide table 115, and the alignment mechanism 108 is disposed on the movement K-axis 107 of the alignment mechanism 108 and can move along the alignment K-axis. The alignment mechanism 108 can grasp the mark points on the photosensitive web 114 for pattern alignment, and then perform double-sided pattern alignment through pattern data processing.
Referring to fig. 1 and 4, the upper end exposure engine system 102 and the lower end exposure engine system 103 are disposed in the area of the third station 204, wherein the upper end exposure engine system 102 includes an upper end exposure component for performing exposure operation on the photosensitive web 114 and an upper end exposure engine component movement X axis disposed along the width direction of the exposure machine base 101, and the upper end exposure component is disposed on the upper end exposure component movement X axis for moving the upper end exposure component along the width direction of the exposure machine base 101.
The lower end exposure engine system 103 includes a lower end exposure unit for performing an exposure operation on the photosensitive web 114, and a lower end exposure engine unit movement X-axis provided in the width direction of the exposer base 101, the lower end exposure unit being provided on the lower end exposure unit movement X-axis for allowing the lower end exposure unit to move in the width direction of the exposer base 101.
Wherein the support seat sets up in first station, is provided with the sucking disc on the support seat, when last board, places photosensitive web 114 on the sucking disc, and the sucking disc is with photosensitive web 114 absorption level and smooth, utilizes four splint mechanisms, centre gripping photosensitive web 114, then moves the Z axle of each splint mechanism, makes photosensitive web 114 move to upper plate position 207, then carries out each item and exposes the process, simplifies the operation of upper plate.
The device is characterized by further comprising a real-time focusing system, two alignment components and an upper end exposure engine system 102 are respectively provided with a distance measuring sensor, the distance measuring sensors are used for measuring the relative position relation between the photosensitive plate 114 and the focal plane of the alignment mechanism 108 and the focal plane of the exposure engine, the distance measuring sensors transmit measured distance data to an industrial controller, the threshold values of the distance measuring sensors are preset in the industrial controller, the distance data and the threshold values obtained through real-time measurement are compared through the industrial controller, the clamping plate mechanism is controlled to move in the Z-axis direction, real-time position adjustment of the photosensitive plate 114 in the Z-axis direction is achieved, the position of the photosensitive plate 114 is always on the focal plane of alignment and exposure, the alignment precision and the quality of an exposure circuit are improved, and the yield of products is improved.
The upper and lower exposure engine systems are adopted to simultaneously expose the two sides of the photosensitive plate 114, so that the registration precision of the front and back sides of the graph can be improved, and the production efficiency is improved; the support plate mechanism adopts a scheme of clamping plates at two sides, and the middle of the light-sensing plate 114 is in a suspended state, so that the problem of cleaning glass by the traditional glass pressing plate scheme can be avoided, and the production efficiency is improved; the exposure machine is also provided with an alignment system and an exposure system, so that the outer layer photosensitive plate 114 and the inner layer photosensitive plate 114 can be used in a compatible manner, and the alignment precision of the patterns is ensured;
referring to fig. 8, when exposure of the outer PCB is required, the first step: the upper end carrier plate mechanism 105 carries out a plate loading process on the exposure surface of the first station 206, namely, the photosensitive plate 114 is placed on the sucker, and the lower end carrier plate mechanism 109 waits below the first station 206; the second step is that: after the upper end plate loading mechanism 105 loads the plate, the alignment process is executed, the alignment assembly is controlled to align the photosensitive plate 114, and when the upper end plate loading mechanism 105 moves away from the first station 206 to the second station 205, the lower end plate loading mechanism 109 rises to the first station 206 to execute the plate loading process; the third step: after leaving the second station 205, the upper end carrier plate mechanism 105 reaches the third station 204 to perform an exposure process, the upper end exposure engine system 102 and the lower exposure engine system simultaneously operate to perform an exposure process on the photosensitive plate 114 on the upper end carrier plate mechanism 105, at this time, the lower end carrier plate mechanism 109 performs an alignment process, and waits for the upper end carrier plate mechanism 105 to complete the exposure process at the second station 205; the fourth step: after the exposure of the upper end carrier plate mechanism 105 is completed, the carrier plate mechanism executes a photosensitive plate unloading process and rises above the exposure surface of the fourth station 203, and meanwhile, the lower end carrier plate mechanism 109 moves to the third station 204 to execute an exposure process; the fifth step: the upper end support plate mechanism 105 executes a return process above the exposure surface, descends to the first station 206 exposure surface after reaching the first station 206 exposure surface, executes an upper plate and alignment process, and waits for the lower end support plate mechanism 109 to finish the exposure process after completing the alignment; and a sixth step: after the exposure process is completed, the lower end carrier plate mechanism 109 performs the photosensitive plate unloading process at the fourth station 203 and descends below the exposure surface of the fourth station 203, the upper end carrier plate mechanism 105 starts to perform the exposure process, meanwhile, the lower end carrier plate mechanism 109 performs the return process, after the lower end carrier plate mechanism 109 reaches the position below the exposure surface of the first station 206, the lower end carrier plate mechanism rises to the exposure surface of the first station 206, the upper plate and alignment process is performed, the upper end carrier plate mechanism 105 waits for the exposure process to be completed, and then the third step is continued to be performed.
Referring to fig. 9, when exposure of the inner PCB is required, the first step: the upper end support plate mechanism 105 carries out a plate loading process on the exposure surface of the first station 206, and the lower end support plate mechanism 109 waits below the first station 206; the second step is that: after the upper end plate loading mechanism 105 loads the plate, performing an exposure process, when the upper end plate loading mechanism 105 moves away from the first station 206 to the second station 205, the lower end plate loading mechanism 109 rises to the first station 206 and the plate loading position 207 to perform the plate loading process, and waiting for the upper end plate loading mechanism 105 to complete the exposure process; the third step: after the exposure process is completed by the upper end carrier plate mechanism 105, the plate unloading process is executed at the fourth station 203, and then the upper end carrier plate mechanism is lifted above the fourth station 203, and meanwhile, the exposure process is executed by the lower end carrier plate mechanism 109; the fourth step: the upper end carrier plate mechanism 105 executes a return process, descends to the first station 206 and the upper plate position 207 to execute an upper plate process after reaching the position above the first station 206, and waits for the lower end carrier plate mechanism 109 to finish an exposure process; the fifth step: after the lower end carrier plate mechanism 109 completes the exposure process, the plate unloading process is performed at the fourth station 203, and then the lower end carrier plate mechanism descends below the fourth station 203. The return process is performed while the upper end carrier mechanism 105 performs the exposure process, and thereafter, the execution is continued from the third step.
The exposure process of the exposure machine can realize that alignment and exposure are carried out on two different photosensitive plates 114 at the same time, optimizes the beat of digital direct writing exposure, saves time and improves production efficiency; the exposure process of the inner layer photosensitive plate can omit marking and turning plate alignment processes, and simultaneously carry out simultaneous exposure on the front side and the back side, thereby greatly improving the production efficiency of the inner layer photosensitive plate and the precision of products.
Referring to fig. 6 and 7, the calibration system 120 is a system independent of the exposure function of the system, and is intended to calibrate the correction system and also an important part for ensuring the accuracy of the exposed pattern, and the calibration system 120 includes a moving mechanism 601 movable in the X-axis direction, a vision system 603, an air cylinder 602 movable in the Y-axis direction, and a marking plate 604.
The calibration system is positioned in the middle of the upper and lower exposure engines, when the position of the exposure system is calibrated, the air cylinder 602 moves, so that the marking plate 604 of the calibration system is positioned on the optical axis of the upper and lower exposure engines in the Y-axis direction, and then the upper exposure engine system movement X-axis 104 and the lower exposure engine system movement X-axis 106 are moved; the marking patterns from the exposure engines are projected onto the marking board 604, and the positions of the marking patterns from the exposure engines and the positions of the marking points on the marking board are calculated by the vision system, so as to calculate the precise positions of the exposure engines. After the calibration of the positional relationship of the engine is completed, the cylinder 602 drives the marking plate 604 to retract, so as to prevent the marking plate 604 from blocking the projection image of the exposure engine on the photosensitive plate during exposure.
Wherein 701-710 all indicate the corresponding position of the exposure machine, particularly when the marking plate is moved to 709, moving the upper exposure engine system to move the X-axis 104, projecting the marking patterns sent by the exposure engines 701 and 702 to the position 709, calculating the position relationship between the marking patterns sent by the exposure engines 701 and 702 and the marking points on the marking plate by the vision system 603, thereby calculating the relative positional relationship of the exposure engines 701 and 702, when the marking plate is moved to 710, moving the upper exposure engine system to move the X-axis 104, projecting the marking patterns emitted by the exposure engines 702 and 703 to the position of 710, calculating the position relationship between the marking patterns emitted by the exposure engines 702 and 703 and the marking points on the marking plate by the vision system 603, the relative position relationship of the exposure engines 702 and 703 is calculated, and so on, the position relationship of each upper end exposure engine is calibrated. In the same manner, the relationship of the positions of the lower-end exposure engines can be calibrated. The number of the engines is not limited to four, and can be multiple, and the engines are calibrated by using the principle.
When the marking patterns from the upper engine 701 and the lower engine 705 are projected to the position 709, the vision system 603 can calculate the position relationship between the upper and lower engines 701 and 705.
By using the calibration mode, the motion error of the motion mechanism 601 can be eliminated, the position relation of the upper engine and the lower engine is more accurate, and the precision of the system is improved.
Meanwhile, a marking plate is also arranged on the upper end carrier plate mechanism, the upper end carrier plate mechanism moves to the optical axis of the upper and lower exposure engines in the Y-axis direction, the upper end exposure engine system moves the X-axis 104 at the same time, so that a marking pattern emitted by the exposure engine 701 is projected onto the marking plate of the upper end carrier plate mechanism, the movement mechanism 601 is moved, and the positions of marking points on the marking plate on the upper end carrier plate mechanism and the positions of the marking patterns emitted by the exposure engine 701 are observed by using the vision system 603, so that the position relation between the upper end carrier plate mechanism and the engines is calculated. In the same way, the position relation between the lower end carrier plate mechanism and the exposure engine can be obtained.
The positional relationship between the alignment mechanism 108 and the engine is calculated by observing the positions of the mark points on the mark plates on the upper end carrier plate mechanism 105 by the alignment mechanism 108 depending on the mark plates on the upper end carrier plate mechanism 105, and by the positional relationship between the upper end carrier plate mechanism 105 and the engine. In the above manner, the coordinate systems of the different movement axes can be unified into the coordinate system of the exposure, so that the accuracy of the exposure system can be improved.
Although the invention has been described in detail above with reference to a general description and specific examples, it will be apparent to one skilled in the art that modifications or improvements may be made thereto based on the invention. Accordingly, such modifications and improvements are intended to be within the scope of the invention as claimed.
Claims (9)
1. The utility model provides a novel digital direct-writing exposure machine of two-sided two support plate mechanism, includes exposure machine base (101), characterized by: the device comprises an exposure machine base (101), an upper end exposure engine system (102) arranged on the exposure machine base (101) and used for exposing one surface of a photosensitive plate (114), a lower end engine exposure system arranged on the exposure machine base (101) and used for exposing the other surface of the photosensitive plate (114), a clamping plate mechanism used for clamping the photosensitive plate (114), a loading plate mechanism arranged on the exposure machine base (101) and used for enabling the clamping plate mechanism to clamp the photosensitive plate (114) to move to the position of the upper end exposure engine system (102) and the position of the lower end engine exposure system, a loading plate mechanism used for calibrating the positions of the upper end engine exposure system and the lower end engine exposure system, and a calibration mechanism of a vision system.
2. The novel double-sided double-carrier plate mechanism digital direct writing exposure machine and the exposure method as claimed in claim 1, wherein: the carrier plate mechanisms are arranged in two numbers, and the two carrier plate mechanisms are respectively arranged on two sides of the exposure surface.
3. The novel double-sided double-carrier plate mechanism digital direct writing exposure machine and the exposure method as claimed in claim 1, wherein: an alignment mechanism (108) is also included for aligning the marking patterns on the light-sensing plate (114).
4. The novel double-sided double-carrier plate mechanism digital direct writing exposure machine and the exposure method as claimed in claim 1, wherein: the upper end exposure engine system (102) comprises an upper end exposure component for carrying out exposure operation on the photosensitive plate (114) and an upper end exposure engine component movement X axis arranged in the width direction of the exposure machine base (101), and the upper end exposure engine component movement X axis is used for enabling the upper end exposure component to move in the width direction of the exposure machine base (101).
5. The novel double-sided double-carrier plate mechanism digital direct writing exposure machine and the exposure method as claimed in claim 1, wherein: each clamping plate mechanism is provided with a Z axis for adjusting the height of the clamping plate mechanism along the height direction of the exposure machine base (101).
6. The novel double-sided double-carrier plate mechanism digital direct writing exposure machine and the exposure method as claimed in claim 1, wherein: the calibration mechanism is arranged between the upper end exposure engine system and the lower end exposure engine system, and comprises a movement mechanism (601) moving in the X direction and a vision system (603).
7. The novel double-sided double-carrier plate mechanism digital direct writing exposure machine and the exposure method as claimed in claim 3, wherein: the real-time focusing system comprises a distance measuring sensor arranged on the alignment mechanism (108) and the upper end exposure engine system (102).
8. The utility model provides a novel digital direct-write exposure machine's of two-sided two support plate mechanism inlayer PCB exposure method, divide into according to the function exposure machine and be used for carrying on the upper plate and counterpoint No. one station (206) of process, be used for waiting for No. two stations (205) of upper plate, be used for carrying on No. three stations (204) of process and be used for carrying out No. four stations (203) of unloading the board process to sensitization board (114), characterized by: comprises the following steps
The first step is as follows: the upper end carrier plate mechanism (105) carries out a plate loading process at a plate loading position of the first station (206), and the lower end carrier plate mechanism (109) waits at a waiting position below the first station (206);
the second step is that: after the upper end plate carrying mechanism (105) carries out plate loading, the upper end plate carrying mechanism (105) starts to execute an exposure process, when the upper end plate carrying mechanism (105) moves away from the first station (206) to reach the second station (205), the lower end plate carrying mechanism (109) rises to the plate loading position (207) of the first station (206) to execute the plate loading process, the exposure process of the upper end plate carrying mechanism (105) is started on an exposure focal plane is waited, and then the lower end plate carrying mechanism (109) arrives at the second station (205) to wait for the exposure process of the upper end plate carrying mechanism (105) to finish the exposure process;
the third step: after the upper end carrier plate mechanism (105) finishes the exposure process, executing a plate unloading process at the fourth station (203), then ascending to the position above the fourth station (203) and returning to a waiting position above the first station (206), and simultaneously executing the exposure process at the exposure focal plane by the lower end carrier plate mechanism (109);
the fourth step: when the lower end carrier plate mechanism (109) executes the exposure process, the upper end carrier plate mechanism (105) arrives above the first station (206) and then descends to the first station (206), the upper plate position (207) executes the upper plate process, and the lower end carrier plate mechanism (109) waits for the exposure process to be completed on the second exposure focal plane;
the fifth step: after the lower end carrier plate mechanism (109) finishes the exposure process, executing a plate unloading process at the fourth station (203), then descending below the fourth station (203), executing a return process, and simultaneously executing the exposure process by the upper end carrier plate mechanism (105);
and a sixth step: and the lower end carrier plate mechanism (109) returns to the first station (206) to execute the board loading process at the board loading position (207), waits for the upper end carrier plate mechanism (105) to start the exposure process, then waits for the upper end carrier plate mechanism (105) to finish the exposure process at the second station by the lower end carrier plate mechanism (109), and returns to the third station to start the execution.
9. The utility model provides a novel two-sided two support plate mechanism digital direct writing exposure machine's outer PCB counterpoint exposure method, divide into according to the function exposure machine and be used for carrying on the upper plate and counterpoint No. one station (206) of process, be used for counterpoint and wait for No. two station (205) of exposure, be used for carrying on No. three station (204) of process and be used for exposing and carrying out No. four station (203) of unloading the board process to photosensitive plate (114), characterized by: comprises the following steps
The first step is as follows: the upper end carrier plate mechanism (105) carries out a plate loading procedure at the plate loading position of the first station (206), and the lower end carrier plate mechanism (109) waits below the first station (206);
the second step is that: after the upper end plate carrying mechanism (105) carries out plate loading, a contraposition process is executed, the contraposition mechanism is controlled to contraposition the photosensitive plate (114), and when the upper end plate carrying mechanism (105) finishes contraposition and moves away from the first station (206) to the second station (205), the lower end plate carrying mechanism (109) rises to the plate loading position of the first station (206) to execute the plate loading process;
the third step: the upper end carrier plate mechanism (105) executes an exposure process at the third and fourth stations (204), the upper end exposure engine system (102) and the lower exposure engine system simultaneously operate to expose a photosensitive plate (114) on the upper end carrier plate mechanism (105), at the moment, the lower end carrier plate mechanism (109) executes an alignment process, and after the alignment is finished, the upper end carrier plate mechanism (105) waits for the exposure process to be finished at the second station (205);
the fourth step: after the exposure of the upper end carrier plate mechanism (105) is completed, the carrier plate mechanism executes a photosensitive plate unloading process and ascends to the position above the exposure surface of the fourth station (203), and meanwhile, the lower end carrier plate mechanism (109) moves to the third station (204) to execute an exposure process;
the fifth step: the upper end carrier plate mechanism (105) starts to execute a return stroke after being arranged above the exposure surface, the upper end carrier plate mechanism (105) descends to the upper plate position of the first station (206) after reaching the upper plate position of the first station (206), the upper plate and the alignment process are executed at the first station and the second station, and after the alignment is finished, the lower end carrier plate mechanism (109) is waited to finish the exposure process at the second station;
and a sixth step: after the lower end carrier plate mechanism (109) completes the exposure process, the photosensitive plate unloading process is carried out at the fourth station (203), the photosensitive plate unloading process is lowered to the position below the exposure surface of the fourth station (203), the upper end carrier plate mechanism (105) simultaneously starts to carry out the exposure process, meanwhile, the lower end carrier plate mechanism (109) carries out the return process, after the lower end carrier plate mechanism (109) reaches the position below the upper plate position of the first station (206), the upper plate position of the first station (206) is raised, the plate loading and alignment processes are carried out, and the upper end carrier plate mechanism (105) is waited to complete the exposure process;
the seventh step: returning to the third step to start the execution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910419633.9A CN111965944A (en) | 2019-05-20 | 2019-05-20 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910419633.9A CN111965944A (en) | 2019-05-20 | 2019-05-20 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111965944A true CN111965944A (en) | 2020-11-20 |
Family
ID=73358219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910419633.9A Pending CN111965944A (en) | 2019-05-20 | 2019-05-20 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111965944A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113031405A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production double-sided laser direct writing photoetching machine and control method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106647188A (en) * | 2017-01-16 | 2017-05-10 | 上海誉刻智能装备有限公司 | Double-face alignment type exposure system |
| CN108873622A (en) * | 2018-07-26 | 2018-11-23 | 中山新诺科技股份有限公司 | Sided exposure machine and double-faced exposure method |
| CN109143797A (en) * | 2018-11-06 | 2019-01-04 | 苏州源卓光电科技有限公司 | A kind of dual stage face write-through exposure machine and its exposure method |
| CN110187608A (en) * | 2019-05-21 | 2019-08-30 | 苏州源卓光电科技有限公司 | A kind of exposure method of write-through exposure machine |
| CN110727177A (en) * | 2019-09-23 | 2020-01-24 | 钧迪智能装备科技(苏州)有限公司 | Exposure device and exposure method for special-shaped workpiece |
-
2019
- 2019-05-20 CN CN201910419633.9A patent/CN111965944A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106647188A (en) * | 2017-01-16 | 2017-05-10 | 上海誉刻智能装备有限公司 | Double-face alignment type exposure system |
| CN108873622A (en) * | 2018-07-26 | 2018-11-23 | 中山新诺科技股份有限公司 | Sided exposure machine and double-faced exposure method |
| CN109143797A (en) * | 2018-11-06 | 2019-01-04 | 苏州源卓光电科技有限公司 | A kind of dual stage face write-through exposure machine and its exposure method |
| CN110187608A (en) * | 2019-05-21 | 2019-08-30 | 苏州源卓光电科技有限公司 | A kind of exposure method of write-through exposure machine |
| CN110727177A (en) * | 2019-09-23 | 2020-01-24 | 钧迪智能装备科技(苏州)有限公司 | Exposure device and exposure method for special-shaped workpiece |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113031405A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production double-sided laser direct writing photoetching machine and control method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI645267B (en) | Optical measuring device and method | |
| EP1939930B1 (en) | Article loading/unloading method and article loading/unloading device, exposure method and exposure apparatus, and method of manufacturing device | |
| CN116679531A (en) | Direct-writing lithography equipment and calibration method thereof | |
| TW201019055A (en) | Exposure device | |
| US20140063480A1 (en) | Exposure device and exposure method | |
| JP2007225727A (en) | Substrate exposure device and substrate exposure method | |
| JPH0541981B2 (en) | ||
| CN106997159A (en) | Wafer pre-alignment mechanism, exposure device and exposure method | |
| CN111965944A (en) | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method | |
| CN109426094B (en) | Exposure method, measurement method, and exposure apparatus | |
| WO2024130764A1 (en) | Gap detection system and method, and focal plane correction method | |
| JP2000250227A (en) | Exposure device | |
| JP2007193197A (en) | Apparatus and method for positioning workpiece | |
| CN111308868B (en) | Alignment compensation method of direct-writing exposure machine | |
| CN114624964A (en) | Exposure method and device | |
| JPH0147007B2 (en) | ||
| CN113589656A (en) | Roll-to-roll double-sided digital laser direct writing exposure machine and exposure alignment method | |
| JP2017204508A (en) | Substrate processing device and product manufacturing method | |
| CN104570592B (en) | A kind of big mask apparatus for shaping and method | |
| CN112255897A (en) | Special accurate multi-functional work piece platform of COF exposure machine | |
| CN114690581A (en) | Automatic focusing device, exposure device, photoetching device and exposure method | |
| KR20200110249A (en) | Substrate processing apparatus and article manufacturing method | |
| KR20020069101A (en) | Aligner | |
| JP3017395B2 (en) | Screen printing equipment | |
| JP4886719B2 (en) | Processing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201120 |