CN104570592B - A kind of big mask apparatus for shaping and method - Google Patents
A kind of big mask apparatus for shaping and method Download PDFInfo
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- CN104570592B CN104570592B CN201310473556.8A CN201310473556A CN104570592B CN 104570592 B CN104570592 B CN 104570592B CN 201310473556 A CN201310473556 A CN 201310473556A CN 104570592 B CN104570592 B CN 104570592B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a kind of big mask apparatus for shaping and method, comprising: big mask holds the vertical hoisting mechanism of bed, several groups and several groups measuring device；Wherein, the big mask is fixed on described hold on bed；The measuring device feeds back the position signal of the big mask of measurement in the corresponding vertical hoisting mechanism；The vertical hoisting mechanism adjusts the vertical position of the big mask according to feedback signal.The present invention carries out shaping to big mask by vertical hoisting mechanism and measuring device, realize the real-time closed-loop control of the vertical deflection of big mask, the shaping effect of big mask has been effectively ensured, image-quality problems caused by solving because of big mask deformation induced by gravity, and the configuration of the present invention is simple, it is convenient to operate.
Description
Technical field
The present invention relates to technical field of integrated circuits, in particular to a kind of big mask apparatus for shaping and method.
Background technique
Lithographic equipment in the prior art is mainly used for Integrated circuit IC or flat display field and other microdevices
Manufacture.By lithographic equipment, the multi-layer mask with different mask patterns is successively imaged in the case where precisely aligning coated with light
On the chip of photoresist, such as semiconductor wafer or LCD panel.
Lithographic equipment is generally divided into two classes, and one kind is stepping lithographic equipment, and mask pattern single exposure is imaged on chip
An exposure area, subsequent chip is mobile relative to mask, and next exposure area is moved to mask pattern and projection object
Below mirror, mask pattern is exposed on to another exposure area of chip again, repeats this process until exposures all on chip
Light region is owned by the picture of mask pattern.
Another kind of is step-scan lithographic equipment, and in above process, mask pattern not instead of single exposure is imaged, and is led to
Cross the mobile imaging of scanning of projection light field.In mask pattern imaging process, mask and chip simultaneously relative to optical projection system and
Projected light beam is mobile.
In above-mentioned photoetching process, there need to be corresponding device as the carrier of mask and chip, be mounted with mask
The carrier of version and chip generates accurate mutually movement to meet photoetching needs.The carrier of aforementioned mask version is referred to as holding version
The carrier of platform, chip is referred to as wafer-supporting platform.
In lithographic equipment, mask is to carry fixation by mask platform, and exposure figure is fixed on mask, such as
The vertical position of fruit mask deviates from the optimal object plane of object lens, then the poor quality of exposure figure imaging on chip,
Thus for mask platform design, how to guarantee that the vertical position precision of mask is one of the difficulty of mask platform design.
In the fields such as the field preceding road IC and the encapsulation of rear road, mask size is usually 6 inches, and is fixed on and holds essentially by vacuum suction
On bed, vertical deformation of the mask in mask graph area is substantially 20nm or so, and the influence to image quality substantially may be used
To ignore.
However, in recent years, with the continuous improvement of exposure area and exposure throughput requirements, exposure field is increasing,
The size of exposure figure is also being continuously increased, and is caused the mask size for carrying exposure figure to be also increasing, is especially answered
For the litho machine of flat display field, mask size is far beyond the fields such as the field preceding road IC and the encapsulation of rear road
Mask size.Such as: G4.5 to G6 generally uses 520*610mm and 520*800mm, and G6 or more then uses 850*1200mm
And 850*1400mm, even more greatly.For this large-sized mask, the fixed form of mask is also utilized in two substantially
Side is by vacuum suction fixed form, but mask is influenced by being self-possessed, and vertical deformation alreadys exceed 30um, and mask is vertical
Deformation be in be similar to parabolic shape, along Non-scanning mode to (Y-direction shown in FIG. 1, X to be scanning direction) its deformation size be not
It is identical.If the vertical deformation of mask is not controlled, optimal object plane of the figure on mask far from object lens will lead to,
To seriously affect final image quality.And there are mask shaping technique complexity, shaping in existing technical solution
The very cumbersome problem of ineffective and debugging process.
Summary of the invention
The purpose of the present invention is to provide a kind of big mask apparatus for shaping and method, with solve existing lithographic equipment because
The problem of image quality caused by big mask deformation induced by gravity.
In order to solve the above technical problems, the present invention provides a kind of big mask apparatus for shaping, comprising: big mask holds version
The vertical hoisting mechanism of platform, several groups and several groups measuring device；Wherein,
The big mask is fixed on described hold on bed；
The measuring device feeds back the position signal of the big mask of measurement in the corresponding vertical hoisting mechanism；
The vertical hoisting mechanism adjusts the vertical position of the big mask according to position feed back signal.
Further, in the big mask apparatus for shaping, the vertical hoisting mechanism and the measuring device are set
Be placed in the first side of the big mask, and each one group of measuring device of correspondence of one group vertical hoisting mechanism, the measuring device with
Corresponding vertical hoisting mechanism is disposed adjacent.
Further, in the big mask apparatus for shaping, the vertical hoisting mechanism and the measuring device are set
Be placed in the first side of the big mask, and in non-scan direction the position vertical hoisting mechanism of identical several groups share it is same
Group measuring device.
Further, in the big mask apparatus for shaping,
The vertical hoisting mechanism is set to the first side of the big mask；
The measuring device is set to second side of the big mask；
The position vertical hoisting mechanism of identical several groups shares same group of measuring device in non-scan direction.
Further, in the big mask apparatus for shaping, the vertical hoisting mechanism is in scanning direction and non-sweeps
Direction is retouched to be set in distance.
Further, in the big mask apparatus for shaping, the vertical hoisting mechanism and the corresponding measurement
Position of the device in non-scan direction is identical.
Further, in the big mask apparatus for shaping, the measuring device is sensed using contactless position
Device, including photoelectric sensor, vapour-pressure type sensor or capacitance type sensor.
Further, in the big mask apparatus for shaping, the vertical hoisting mechanism includes: driving device, axis
Bar, flexible apparatus, air-bearing and axle sleeve；Wherein,
The driving device includes: driving device stator and driving device mover；
The driving device stator and the shaft are separately fixed on a support；
The driving device mover is fixedly connected with the axle sleeve；
Guiding device is formed between the shaft and the axle sleeve；
Described flexible apparatus one end is connect with the axle sleeve, and the other end is connect with the air-bearing；
An air film with two-way stiffness is formed between the air-bearing and the big mask.
Further, in the big mask apparatus for shaping, the guiding device is air bearing guiding, mechanical guide is led
To or magnetic bearing guiding.
Further, in the big mask apparatus for shaping, the driving device is that voice coil motor or piezoelectric type are made pottery
Porcelain motor.
Further, in the big mask apparatus for shaping, the flexible apparatus is flexible hinge, the flexible hinge
Chain includes: connecting pin, X to flexible wall, support end, Y-direction flexible wall and fixing end；Wherein,
The connecting pin is fixedly connected with the axle sleeve；
Described support end one end is connect with the X to flexible wall, and the other end is connect with the Y-direction flexible wall；
The fixing end is connect with the air-bearing.
Further, in the big mask apparatus for shaping, thickness model of the X to flexible wall and Y-direction flexible wall
It encloses for 0.1mm-0.5mm.
Further, in the big mask apparatus for shaping, the flexible hinge has the soft of Rx, Ry both direction
Property, and the vertical stiffness of the flexible hinge be greater than Rx, Ry to rigidity.
Further, in the big mask apparatus for shaping, the flexible apparatus is flexural pivot.
Meanwhile the present invention also provides a kind of big mask shaping methods, it is special using the big mask apparatus for shaping
Sign is, which comprises
Measuring device measures the position of big mask, and the position signal of the big mask of measurement is fed back in vertical promotion
Mechanism；
Vertical hoisting mechanism moves downward, and judges whether vacuum is established between vertical hoisting mechanism and big mask, if it is not,
Vertical hoisting mechanism continues to decline, if so, vertical hoisting mechanism moves upwards the position for adjusting big mask；
Measuring device measures the position of big mask again, and the position signal of the big mask of measurement is fed back in vertical
Hoisting mechanism, vertical hoisting mechanism adjust the position of big mask according to position feed back signal, until big mask is without vertical change
Shape then complete by shaping.
Further, in the big mask shaping methods, measuring device measures the position of big mask, and will survey
The position signal feedback of the big mask of amount in the vertical hoisting mechanism the step of before further include following steps:
After the initialization of one mask platform, mask platform moves to handover position adjustment of the printing plate；
Mask platform moves to zero-bit.
Further, in the big mask shaping methods, measuring device measures the position of big mask, and will survey
The position signal feedback of the big mask of amount in the vertical hoisting mechanism the step of before further include following steps:
After the initialization of one mask platform, mask platform moves to handover position adjustment of the printing plate；
Mask platform is moved along scanning direction.
A kind of big mask apparatus for shaping provided by the invention and method have the advantages that the present invention by hanging down
Shaping is carried out to big mask to hoisting mechanism and measuring device, realizes the real-time closed-loop control of the vertical deflection of big mask,
The shaping effect of big mask has been effectively ensured, the image-quality problems caused by solving because of big mask deformation induced by gravity, and
The configuration of the present invention is simple, it is convenient to operate.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of existing big mask deformation；
Fig. 2 is exposure device structural schematic diagram of the invention；
Fig. 3 is the top view of exposure device structural schematic diagram of the invention；
Fig. 4 is the structural schematic diagram of the big mask apparatus for shaping of the embodiment of the present invention 1；
Fig. 5 is the top view of the big mask apparatus for shaping of the embodiment of the present invention 1；
Fig. 6 is the vertical hoisting mechanism structural schematic diagram of the big mask apparatus for shaping of the embodiment of the present invention 1；
Fig. 7 is the flexible hinge structure schematic diagram of the big mask apparatus for shaping of the embodiment of the present invention 1；
Fig. 8 is the flexible hinge structure schematic diagram of the big mask apparatus for shaping of the embodiment of the present invention 1；
Fig. 9 is the flow diagram of the big mask shaping methods of the embodiment of the present invention 1；
Figure 10 is the control system figure of the vertical hoisting mechanism of the big mask shaping methods of the embodiment of the present invention 1；
Figure 11 is the structural schematic diagram of the big mask apparatus for shaping of the embodiment of the present invention 2；
Figure 12 is the top view of the big mask apparatus for shaping of the embodiment of the present invention 2；
Figure 13 is the structural schematic diagram of the big mask apparatus for shaping of the embodiment of the present invention 3；
Figure 14 is the top view of the big mask apparatus for shaping of the embodiment of the present invention 3；
Figure 15 is the flow diagram of the big mask shaping methods of the embodiment of the present invention 3.
Specific embodiment
Big mask apparatus for shaping proposed by the present invention and method are made below in conjunction with the drawings and specific embodiments further
It is described in detail.According to following explanation and claims, advantages and features of the invention will be become apparent from.It should be noted that attached drawing
It is all made of very simplified form and uses non-accurate ratio, only to convenient, lucidly the aid illustration present invention is implemented
The purpose of example.
The present invention provides the apparatus for shaping and method of a kind of big mask, can be used in the litho machine of the fields such as FPD,
Prevent big mask from vertical deformation occurring because of own wt.
As shown in Fig. 2, it is an exposure device structural schematic diagram, exposure device mainly includes lighting system 101, mask platform
102, projection objective 103, Substrate table 104.Lighting system 101 provides exposure light source for exposure device；Mask platform 102 is used to support
With the big mask 105 of positioning；Projection objective 103 is spliced by multiple groups camera lens, forms the visual field that exposes completely, projection objective 103 is not
It is defined in the splicing of multiple groups object lens, it can also single big objective angular field；104 bearing substrate 106 of Substrate table provides branch for substrate 106
Support and positioning function.
As shown in figure 3, it is the top view of exposure device structural schematic diagram, projection objective as shown in the figure respectively splices camera lens
Single-lens small field of view is constituted big exposure field by the crossed geometry of each camera lens by placement position, by big mask 105
On exposure figure 201 be exposed on substrate.
[embodiment 1]
As shown in Figures 4 and 5, the present invention provides a kind of big mask apparatus for shaping, and for X to for scanning direction, Y-direction is Non-scanning mode
Direction, described device include: big mask 304, hold the vertical hoisting mechanism 302 of bed 303, several groups and several groups measuring device
301；Wherein,
The big mask 304 is fixed on described hold 303 on bed by vacuum suction；
The vertical hoisting mechanism 302 and the measuring device 301 respectively with the big mask 304 is vertical opposite sets
It sets, and has certain gap with big 304 upper surface of mask, and be horizontally placed near objective angular field；
Specifically, the vertical hoisting mechanism 302 and the measuring device 301 are respectively arranged at the big mask 304
The first side (in figure be top), and one group vertical hoisting mechanism, 302 one group of measuring device 301 of each correspondence, the measuring device
301 are disposed adjacent with corresponding vertical hoisting mechanism 302.
The measuring device 301 feeds back the position signal of the big mask 304 of measurement in the corresponding vertical promotion
Mechanism 302；
The vertical hoisting mechanism 302 is by establishing vertical stiffness K between air floating structure and the big mask 304.Institute
State the vertical position that vertical hoisting mechanism 302 adjusts the big mask 304 according to position feed back signal.
Specifically, the measuring device 302 uses non-contact position sensor, including photoelectric sensor, vapour-pressure type
Sensor or capacitance type sensor.The present invention preferentially selects photoelectric sensor.
Specifically, the vertical hoisting mechanism 302 is set in distance in scanning direction and non-scan direction, but do not limit
The quantity and set-up mode of setting.
Specifically, the position of the vertical hoisting mechanism 302 and the corresponding measuring device 301 in non-scan direction
It is identical.
In the present embodiment, in X to interval setting three groups of measuring devices 301 and vertical hoisting mechanism 302, Y-direction also between
Every three groups of measuring devices 301 and vertical hoisting mechanism 302 is arranged, wherein have three groups be arranged in big mask 304X to centre bit
Set place.Measuring device 301 is arranged in the horizontal direction near corresponding vertical hoisting mechanism 302, one group of vertical hoisting mechanism
302 one group of measuring device 301 of configuration complete the measurement to big 304 vertical position of mask, and the position signal of measurement are fed back
It is effectively ensured to vertical hoisting mechanism 302 so that vertical hoisting mechanism 302 adjusts the vertical deflection of big mask 304 in real time
The shaping effect of apparatus for shaping, and realize the closed-loop control of big 304 deflection of mask.
As shown in fig. 6, it is the structural schematic diagram of vertical hoisting mechanism.Vertical hoisting mechanism includes: driving device, shaft
403, flexible apparatus 404, air-bearing 405 and axle sleeve 407；Wherein,
The driving device includes: driving device stator 401 and driving device mover 402；
Particularly, the driving device can be voice coil motor or piezoelectric ceramic motor.The present invention preferentially selects voice coil
Motor.
The driving device stator 401 and the shaft 403 are separately fixed on a support；
The driving device mover 402 is fixedly connected with the axle sleeve 407；
Guiding device is formed between the shaft 403 and the axle sleeve 407, provides vertical lead for vertical hoisting mechanism 302
To；
Specifically, the guiding device includes air bearing guiding, mechanical guide guiding or magnetic bearing guiding.The present invention is preferential
Select air bearing guiding.
Described 404 one end of flexible apparatus is connect with the axle sleeve 407, and the other end is connect with the air-bearing 405；
One is formed between the air-bearing 405 and the big mask 304 has two-way stiffness air film 406.
Specifically, air-bearing 405 is vacuum preload formula air floating structure, air-bearing 405 is guaranteed by positive pressure and vacuum
Being formed between big mask 304 has two-way stiffness K and the stable air film 406 of rigidity, it is therefore prevented that air-bearing 405 with cover greatly
Physical contact occurs between template 304 and damages big mask 304, big mask 304 is effectively reduced in vertical deformation.
Specifically, the flexible apparatus is flexible hinge or flexural pivot, the present invention preferentially selects flexible hinge.
As shown in FIG. 7 and 8, be flexible hinge structural schematic diagram, the flexible hinge include: connecting pin 601, X to
Flexible wall 602, support end 603, Y-direction flexible wall 604 and fixing end 605；Wherein,
The connecting pin 601 is fixedly connected with the axle sleeve；
Described 603 one end of support end is connect with the X to flexible wall 602, and the other end is connect with the Y-direction flexible wall 604；
The fixing end 605 is connect with the air-bearing.
Specifically, X all has thin-walled feature to flexible wall 602 and Y-direction flexible wall 604, so that flexible hinge has Rx, Ry
The flexibility of both direction, and its vertical stiffness K be greater than Rx, Ry to rigidity, for air-bearing provide Rx, Ry to decoupling, make
Air-bearing can adaptive big mask face type.X is to the range of the thickness deltat of flexible wall 602 and Y-direction flexible wall 604
0.1mm~0.5mm, specific rigidity value can carry out analysis design according to actual needs.
Meanwhile as shown in figure 9, the present embodiment also provides a kind of big mask shaping methods, using big as described in Fig. 2-8
Mask apparatus for shaping, which comprises
After the initialization of S11: one mask platform, mask platform moves to handover position adjustment of the printing plate；
S12: mask platform moves to zero-bit；
S13: measuring device measures the position of big mask, and the position signal of the big mask of measurement is fed back in vertical
Hoisting mechanism；
S14: vertical hoisting mechanism moves downward, and judges whether vacuum is established between vertical hoisting mechanism and big mask,
If it is not, vertical hoisting mechanism continues to decline, if vertical hoisting mechanism moves upwards the position for adjusting big mask；
S15: measuring device measures the position of big mask again, and by the position signal of the big mask of measurement feedback in
Vertical hoisting mechanism, vertical hoisting mechanism adjust the position of big mask according to position feed back signal, until big mask is without vertical
To deformation, then shaping is completed.
It further, as shown in Figure 10, is the control system figure of vertical hoisting mechanism.Specifically include that measuring device
501, controller 502, analog line driver 503, driving device 504 and big mask 505.Wherein, big mask 505 is controlled
Object, driving device 502 carry out driving big mask 505 according to the position signal that measuring device 501 is fed back, and complete big mask
The closed-loop control of 505 vertical positions.
The present embodiment carries out shaping to big mask by vertical hoisting mechanism and measuring device, improves because of big mask
Image-quality problems caused by deformation induced by gravity, and the configuration of the present invention is simple, it is convenient to operate.
[embodiment 2]
In embodiment 1, (i.e. one group vertical hoisting mechanism configures one group for measuring device and the mating arrangement of vertical hoisting mechanism
Measuring device), and be simutaneously arranged above big mask (Mask).Measuring device is arranged near vertical hoisting mechanism, is completed
Measurement to the vertical position big mask (Mask), and the position signal of measurement is fed back into vertical hoisting mechanism, so that vertical
Hoisting mechanism adjusts the vertical deflection of big mask in real time, and the shaping effect of apparatus for shaping has been effectively ensured.Realize big mask
The closed-loop control of the vertical deflection of version.
As shown in FIG. 11 and 12, due to big mask 704(Mask) vertical deformation along X to the basic phase of deflection
Together, therefore in the case where the operation of big 704 plastic precision of mask, X is to can also only arrange one group of measuring device 701, without being used in
702 mating one groups of measuring devices 701 of every group vertical hoisting mechanism.That is the vertical hoisting mechanism 702 and the measurement
Vertical the first side (in figure for top) for being relatively arranged on the big mask 704 respectively of device 701, and in Non-scanning mode to upper
Set identical vertical hoisting mechanism 702 and the same group of mating setting of measuring device 701.That is, in the upward position of Non-scanning mode
Several identical vertical hoisting mechanisms 702 share a measuring device.
In the present embodiment, in X to one group of measuring device of arranged for interval, 701, three groups of vertical hoisting mechanisms 702, between Y-direction
Every arranging three groups of measuring devices, 701, three groups of vertical hoisting mechanisms 702.Wherein, vertical hoisting mechanism 702 is in X to there is three groups of cloth
Set in big mask 704(Mask) center position, but do not limit the quantity and arrangement of arrangement.Measuring device 701
It is arranged near a certain group vertical hoisting mechanism 702, and identical as the vertical hoisting mechanism 702 of the group to position in X, completes to this
Locate big mask 704(Mask) measurement of vertical position, and the vertical deflection of big mask 704 is respectively issued to Y-direction position phase
Same every group vertical hoisting mechanism 702, vertical hoisting mechanism up move, and adjust the vertical deflection of big mask 704, effectively
The shaping effect that ensure that apparatus for shaping realizes the closed-loop control of the vertical deflection of big mask.
Particularly, vertical hoisting mechanism 702 is identical with the vertical hoisting mechanism structure of embodiment 1.
Further, in the present embodiment, big mask shaping methods are also identical with embodiment 1.
[embodiment 3]
Embodiment 3 and 2 mask of embodiment the difference is that, as shown in Figs. 13 and 14, by the spaced apart three groups of surveys of Y-direction
Amount device is set to the lower section of big mask, that is to say, that the vertical hoisting mechanism 901 is vertical to be relatively arranged on and described cover greatly
First side of template 904；
The vertical second side (being lower section in figure) for being relatively arranged on the big mask 904 of measuring device 903 described in three groups,
And it is connect with a measuring device pedestal 904；
In Non-scanning mode to the identical vertical hoisting mechanism 901 in position and the same group of mating setting of measuring device 903.
In the present embodiment, in X to one group of measuring device of arranged for interval, 903, three groups of vertical hoisting mechanisms 901, between Y-direction
Every arrangement three groups of measuring devices, 903, three groups of vertical hoisting mechanisms 901, wherein vertical hoisting mechanism 901 is in X to there is three groups of arrangements
In the center position of big mask (Mask).Meanwhile three groups of measuring devices 903, every group of measuring device are also arranged in Y-direction
903 X to position it is identical as three groups vertical hoisting mechanism 901.
Particularly, vertical hoisting mechanism 901 is identical with the vertical hoisting mechanism structure of embodiment 1.
Particularly, since the vertical space between exposure device object lens and mask platform is limited, especially in splicing object lens exposure
In device, vertical space is very narrow, therefore measuring device 903 is arranged in except mask platform exposure stroke.Measuring device 903
Spacing between mask platform center (center that mask platform is in when zero-bit) is L, and it is S that mask platform, which exposes unilateral stroke, then needs
Meet L > S, so that the location layout of measuring device does not influence to expose.Meanwhile L also by object lens and the vertical space of mask platform about
Beam.
Meanwhile as shown in figure 15, the present embodiment also provides a kind of big mask shaping methods, uses the big mask
Apparatus for shaping, which comprises
After the initialization of S31: one mask platform, mask platform moves to handover position adjustment of the printing plate；
S32: mask platform is moved along scanning direction；
S33: measuring device measures the position (vertical deflection) of big mask, and the position of the big mask of measurement is believed
Number feedback in vertical hoisting mechanism；
S34: vertical hoisting mechanism moves downward, and judges whether vacuum is established between vertical hoisting mechanism and big mask,
If it is not, vertical hoisting mechanism continues to decline, if vertical hoisting mechanism moves upwards the position for adjusting big mask；
S35: measuring device measures the position of big mask again, and by the position signal of the big mask of measurement feedback in
Vertical hoisting mechanism, vertical hoisting mechanism adjust the position of big mask according to position feed back signal, until big mask is without vertical
To deformation, then shaping is completed.
The present embodiment carries out shaping to big mask by vertical hoisting mechanism and measuring device, improves because of big mask
Image-quality problems caused by deformation induced by gravity, and the configuration of the present invention is simple, it is convenient to operate.
Foregoing description is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, this hair
Any change, the modification that the those of ordinary skill in bright field does according to the disclosure above content, belong to the protection of claims
Range.
Claims (16)
1. a kind of big mask apparatus for shaping characterized by comprising big mask holds the vertical hoisting mechanism of bed, several groups
With several groups measuring device；Wherein,
The big mask is fixed on described hold on bed；
The measuring device feeds back the position signal of the big mask of measurement in the corresponding vertical hoisting mechanism；
The vertical hoisting mechanism adjusts the vertical position of the big mask according to position feed back signal；
The vertical hoisting mechanism includes: driving device, shaft, flexible apparatus, air-bearing and axle sleeve；Wherein,
The driving device includes: driving device stator and driving device mover；
The driving device stator and the shaft are separately fixed on a support；
The driving device mover is fixedly connected with the axle sleeve；
Guiding device is formed between the shaft and the axle sleeve；
Described flexible apparatus one end is connect with the axle sleeve, and the other end is connect with the air-bearing；
An air film with two-way stiffness is formed between the air-bearing and the big mask.
2. big mask apparatus for shaping as described in claim 1, which is characterized in that the vertical hoisting mechanism and the measurement
Device is set to the first side of the big mask, and each one group of measuring device of correspondence of one group vertical hoisting mechanism, the measurement
Device is disposed adjacent with corresponding vertical hoisting mechanism.
3. big mask apparatus for shaping as described in claim 1, which is characterized in that the vertical hoisting mechanism and the measurement
Device is set to the first side of the big mask, and the vertical hoisting mechanism of the identical several groups in position is total in non-scan direction
With same group of measuring device.
4. big mask apparatus for shaping as described in claim 1, which is characterized in that
The vertical hoisting mechanism is set to the first side of the big mask；
The measuring device is set to second side of the big mask；
The position vertical hoisting mechanism of identical several groups shares same group of measuring device in non-scan direction.
5. the big mask apparatus for shaping as described in any in claim 1-4, which is characterized in that vertical promotion described in several groups
Mechanism is set in distance in scanning direction and non-scan direction.
6. the big mask apparatus for shaping as described in any in claim 1-4, which is characterized in that the vertical hoisting mechanism and
Position of the corresponding measuring device in non-scan direction is identical.
7. big mask apparatus for shaping as described in claim 1, which is characterized in that the measuring device uses contactless position
Set sensor, including photoelectric sensor, vapour-pressure type sensor or capacitance type sensor.
8. big mask apparatus for shaping as described in claim 1, which is characterized in that the guiding device is air bearing guiding, machine
Tool guide rail guiding or magnetic bearing guiding.
9. big mask apparatus for shaping as described in claim 1, which is characterized in that the driving device is voice coil motor or pressure
Electric-type ceramic motor.
10. big mask apparatus for shaping as described in claim 1, which is characterized in that the flexible apparatus is flexible hinge, institute
Stating flexible hinge includes: connecting pin, X to flexible wall, support end, Y-direction flexible wall and fixing end；Wherein,
The connecting pin is fixedly connected with the axle sleeve；
Described support end one end is connect with the X to flexible wall, and the other end is connect with the Y-direction flexible wall；
The fixing end is connect with the air-bearing.
11. mask apparatus for shaping as claimed in claim 10 big, which is characterized in that the X is to flexible wall and Y-direction flexible wall
Thickness range be 0.1mm-0.5mm.
12. big mask apparatus for shaping as claimed in claim 10, which is characterized in that the flexible hinge has Rx, Ry two
The flexibility in a direction, and the vertical stiffness of the flexible hinge be greater than Rx, Ry to rigidity.
13. big mask apparatus for shaping as described in claim 1, which is characterized in that the flexible apparatus is flexural pivot.
14. a kind of big mask shaping methods use big mask apparatus for shaping as described in claim 1, which is characterized in that
The described method includes:
Measuring device measures the position of big mask, and the position signal of the big mask of measurement is fed back in vertical elevator
Structure；
Vertical hoisting mechanism moves downward, and judges whether vacuum is established between vertical hoisting mechanism and big mask, if it is not, vertical
Hoisting mechanism continues to decline, if so, vertical hoisting mechanism moves upwards the position for adjusting big mask；
Measuring device measures the position of big mask again, and the position signal of the big mask of measurement is fed back in vertical promotion
Mechanism, vertical hoisting mechanism adjust the position of big mask according to position feed back signal, until big mask without vertical deformation then
Shaping is completed.
15. big mask shaping methods as claimed in claim 14, which is characterized in that measuring device measures the position of big mask
Set, and by the position signal of the big mask of measurement feedback in the vertical hoisting mechanism the step of before further include following steps:
After the initialization of one mask platform, mask platform moves to handover position adjustment of the printing plate；
Mask platform moves to zero-bit.
16. big mask shaping methods as claimed in claim 14, which is characterized in that measuring device measures the position of big mask
Set, and by the position signal of the big mask of measurement feedback in the vertical hoisting mechanism the step of before further include following steps:
After the initialization of one mask platform, mask platform moves to handover position adjustment of the printing plate；
Mask platform is moved along scanning direction.
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| CN109491201B (en) * | 2018-12-26 | 2024-01-19 | 仪晟科学仪器(嘉兴)有限公司 | High-precision two-dimensional movement mechanism for mask |
| CN111580359B (en) * | 2020-04-29 | 2021-06-18 | 中国科学院光电技术研究所 | Intelligent correction device control system for super-resolution lithography precision mask |
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| CN101398636A (en) * | 2008-09-17 | 2009-04-01 | 华中科技大学 | Precision vibration damping assembly and vibration damping platform composed of the assembly |
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| JP4314054B2 (en) * | 2003-04-15 | 2009-08-12 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
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| CN1991593A (en) * | 2005-12-28 | 2007-07-04 | 优志旺电机株式会社 | Supporting mechanism and mask carrying stage using the same |
| CN101398636A (en) * | 2008-09-17 | 2009-04-01 | 华中科技大学 | Precision vibration damping assembly and vibration damping platform composed of the assembly |
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