CN103676488B - Mask connecting mechanism and there is the mask platform of this mask connecting mechanism - Google Patents

Mask connecting mechanism and there is the mask platform of this mask connecting mechanism Download PDF

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CN103676488B
CN103676488B CN201210333084.1A CN201210333084A CN103676488B CN 103676488 B CN103676488 B CN 103676488B CN 201210333084 A CN201210333084 A CN 201210333084A CN 103676488 B CN103676488 B CN 103676488B
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mask
motor
motion
grating scale
platform
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CN103676488A (en
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江旭初
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

There is a mask platform for described mask connecting mechanism, comprising: hold bed; First card extender and the second card extender; First motor and the second motor, the first motor and the second motor are used for for described mask platform provides scanning to motion driving force, fine motion direction driving force, and by the differential driving force providing Rz fine motion direction of the first motor and the second motor; First grating scale and the second grating scale; First direction measures mirror and second direction measures mirror; And mask connecting mechanism, described mask connecting mechanism is fixedly installed on described base, and is positioned at the mask handing-over position place in described mask bench scanning direction of motion.Mask platform of the present invention is by being fixedly installed described mask connecting mechanism in described mask handing-over position place, and described mask connecting mechanism also has Rz and Z-direction motor function, reduces the Rz stroke demand of described mask platform.Meanwhile, described mask platform has the first motor, the second motor, and the first grating scale, the second grating scale, reduces the design difficulty of described mask platform.

Description

Mask connecting mechanism and there is the mask platform of this mask connecting mechanism
Technical field
The present invention relates to semi-conductor device technology field, particularly relate to a kind of mask connecting mechanism and there is the mask platform of this mask connecting mechanism.
Background technology
In the prior art, lithographic equipment is mainly used in integrated circuit (IC), flat display field, or the manufacture of other microdevice.By lithographic equipment, the multi-layer mask with different mask pattern is imaged on successively and is coated with on the wafer of photoresist under accurately aiming at, such as semiconductor wafer or LCD.Lithographic equipment is divided into two classes substantially, one class is stepping lithographic equipment, mask pattern single exposure is imaged on an exposure area of wafer, wafer moves relative to mask subsequently, next exposure area is moved to below mask pattern and projection objective, again mask pattern is exposed on another exposure area of wafer, repeats this process until all exposure areas all have the picture of mask pattern on wafer.Another kind of is step-scan lithographic equipment, and in above process, mask pattern is not single exposure imaging, but passes through the scanning mobile imaging of projection light field.In mask pattern imaging process, mask and wafer move relative to optical projection system and projected light beam simultaneously.In above-mentioned lithographic equipment, the carrier of corresponding device as mask and wafer need be had, be mounted with mask, the carrier of wafer produces accurate motion mutually and meet photoetching needs.The carrier of aforementioned mask version is referred to as and holds bed, and the carrier of wafer is referred to as wafer-supporting platform.
In scanning photoetching device, mask platform is generally made up of micropositioner and coarse motion platform.Described micropositioner completes the Precision trimming of mask.Described coarse motion platform completes the Long Distances scan exposure motion of mask.The handing-over of described mask is a motion flow the most key in scanning photoetching machine, and the motion operating mode of described mask platform directly limited by the handing-over flow process of described mask.
In traditional scanning photoetching device, mask transmission system due to the existence of the kinematic error of described mask transmission system and the plate-making precision of described mask, can cause described mask to there is the adjustment of the printing plate error of a Rz after described mask being delivered to handing-over position.For meeting the seizure visual field size requirement of mask registration, adjustment of the printing plate Rz error needs to compensate.Be generally by the pre-alignment system in described lithographic equipment to being fed back to described mask platform or described mask transmission system after adjustment of the printing plate error measure, then compensated by described mask platform or described mask transmission system.
But in large mask scanning photoetching device, be such as applied in the splicing camera lens lithographic equipment of flat display field, in G4.5 generation, generally adopts 520 × 610mm to G6 2with 520 × 800mm 2, more than G6 then adopts 850*1200mm and 850*1400mm, even larger.Because mask size increases, make it and utilize the IC field lithographic equipment of 6 inch reticle and compare, the adjustment of the printing plate Rz error of its mask increases greatly.And due to the manufacturing cost of described large mask very expensive, for reduce large mask damage risk, the mask transmission system of described large mask does not arrange Rz rotating mechanism usually.After described large mask is transferred to mask handing-over position by the mask transmission system of described large mask, Rz adjustment of the printing plate Error Feedback to mask platform, is compensated by the Rz error of mask platform to adjustment of the printing plate by mask prealignment mechanism.This directly causes mask platform Rz stroke demand to increase, and the design difficulty of mask platform increases.
Therefore for prior art Problems existing, this case designer is by means of being engaged in the industry experience for many years, and active research improves, so there is a kind of mask connecting mechanism of invention and there is the mask platform of this mask connecting mechanism.
Summary of the invention
The present invention be directed in prior art, traditional masks platform Rz stroke demand increases, and the defects such as the design difficulty increase of mask platform provide a kind of mask connecting mechanism.
Another object of the present invention is in prior art, and traditional masks platform Rz stroke demand increases, and the defects such as the design difficulty increase of mask platform provide a kind of mask platform with mask connecting mechanism.
The third object of the present invention is in prior art, and traditional masks platform Rz stroke demand increases, and the defects such as the design difficulty increase of mask platform provide a kind of litho machine with described mask platform.
In order to solve the problem, the invention provides a kind of mask connecting mechanism, described mask connecting mechanism comprises: handing-over hand, and its top braces also adsorbs mask; Vertical movement mechanism, described vertical movement mechanism is fixedly connected with the bottom of described handing-over hand, and drives the vertically motion of described handing-over hand; And rotating mechanism, described rotating mechanism is arranged at the bottom of described vertical movement mechanism, and drives described vertical movement mechanism and handing-over hand along Rz to rotary motion.
Optionally, described vertical movement mechanism comprises further: guide rail splice, and its upper surface is fixedly connected with described handing-over hand; Voice coil motor, the stator of described voice coil motor is arranged on rotating mechanism, and the mover of described voice coil motor is fixedly connected with described guide rail splice lower surface, and drives described guide rail splice vertically to move; Guide rail, described guide rail to be vertically arranged on rotating mechanism and to be provided with slide block, and described slide block is fixedly connected with described guide rail splice, for described vertical movement mechanism provides vertical movement to lead.
Optionally, between described guide rail splice and described rotating mechanism, be also provided with a resetting means, reset in zero-bit for completing the rear described handing-over hand of handing-over at described mask.
Optionally, described rotating mechanism comprises further: rotating bottom board, is arranged on a pedestal, described rotating bottom board is fixedly connected with respectively stator and the guide rail of described voice coil motor, and makes described vertical movement mechanism have Rz to spinfunction; Coded scale, the read head of described coded scale is fixedly installed on described pedestal, and the tape correspondence of described coded scale is arranged on described rotating bottom board, for described rotating mechanism provides position measurement; Vertical pneumatic bearing, under described vertical pneumatic bearing is fixedly installed on described rotating bottom board, and provides vertical support function for described rotating bottom board; Ring-shaped guide rail, described ring-shaped guide rail is arranged between described rotating bottom board and described pedestal; Annular air-bearing, described annular air-bearing is arranged between described ring-shaped guide rail and described rotating bottom board, and provides Rz to guide function for described rotating bottom board; And linear electric motors, the stator of described linear electric motors is fixedly connected with described pedestal, and the mover of described linear electric motors is fixedly connected with described rotating bottom board, and provides Rz to driving force for described rotating mechanism.
For realizing the another object of the present invention, the invention provides a kind of mask platform with described mask connecting mechanism, described mask platform does scanning motion along Y-direction, along X to making jogging motion, described mask platform comprises: hold bed, described in hold bed for carrying described mask; First card extender and the second card extender, hold the both sides of bed described in described first card extender and described second card extender are separately positioned on, and be movably arranged on a base respectively by the first pneumatic bearing be fixedly installed under described first card extender and described second card extender and the second pneumatic bearing; First motor and the second motor, the stator of described first motor and described second motor is fixedly installed on described base, described first motor is fixedly connected with the second card extender with described first card extender respectively with the mover of the second motor, for described mask platform provides the driving force of moving along described mask bench scanning direction of motion and jogging motion direction; First grating scale and the second grating scale, the read head of described first grating scale and described second grating scale or tape are arranged on described first card extender and the second card extender respectively, the tape of described first grating scale and described second grating scale or read head respectively correspondence are arranged on described base, for the motion control of described mask platform initialization and described first motor and the second motor provides position measurement signal; And mask connecting mechanism, described mask connecting mechanism is fixedly installed on the mask handing-over position place be positioned in described mask bench scanning direction of motion.
Optionally, described in hold measurement mirror bed is also fixedly installed perpendicular to mask bench scanning direction of motion and jogging motion direction, corresponding described measurement mirror is also provided with laser interferometer measurement system, for the motion control of described mask platform provides position measurement signal.
Optionally, in described first motor and described second motor, at least one is rough micro-moving mechanism integrated motor.
Optionally, described first motor and described second motor all adopt rough micro-moving mechanism integrated motor, and it comprises respectively: coil holder, and be fixedly installed on the first card extender or the second card extender, described coil holder is provided with coarse motion coil and fine motion coil; Magnetic receiver, described magnetic receiver is arranged at intervals with coarse motion magnet and the fine motion magnet of corresponding coarse motion coil and fine motion coil respectively; Form magnetic field between the described coarse motion magnet with opposed polarity, after described coarse motion coil passes into electric current, described first motor or the second motor are along scanning motion direction output drive strength; Form magnetic field between the described fine motion magnet with opposed polarity, after described fine motion coil passes into electric current, described first motor or the second motor are along jogging motion direction output drive strength.
Optionally, described first grating scale and described second grating scale comprise respectively: coarse motion grating scale, and the read head of described coarse motion grating scale and tape are arranged along scanning motion direction correspondence respectively, carry out position measurement to the motion of mask platform on scanning motion direction; Fine motion grating scale, the read head of described fine motion grating scale and tape are arranged along jogging motion direction correspondence respectively, carry out position measurement to the motion of mask platform on jogging motion direction.
For realizing the 3rd object of the present invention, the invention provides a kind of litho machine with described mask platform, described litho machine comprises: illuminator, and described illuminator is used for providing exposure light source for the exposure device of described litho machine; Mask platform, described mask platform is used for supporting and locating described mask; Projection objective, described projection objective is assembled by many arrangements of mirrors head, composition Large visual angle exposure device, and passes through the crossed geometry of each camera lens, single-lens small field of view is formed large exposure field, by the pattern exposure on described mask in described substrate to be patterned; Work stage, described work stage for carrying described substrate to be patterned, and provides location and support function; Laser interferometer, described laser interferometer is used for providing position signalling for the precise motion of described mask platform and described work stage; Mask prealignment mechanism, described mask prealignment mechanism for measuring the adjustment of the printing plate error of described mask, and provides described adjustment of the printing plate error signal to carry out adjustment of the printing plate error compensation; And mask transmission system, described mask transmission system has X to motor function, and provides transfer function for described mask.
In sum, mask platform of the present invention is by being fixedly installed the mask handing-over position place of described mask connecting mechanism in described mask bench scanning direction of motion, described mask connecting mechanism also has Rz and Z-direction motor function, after described mask is transferred into described mask handing-over position, just compensate described mask adjustment of the printing plate error by described mask connecting mechanism, reduce the Rz stroke demand of described mask platform.Meanwhile, described mask platform has the first motor, the second motor, and the first grating scale, the second grating scale, reduces the design difficulty of described mask platform.
Accompanying drawing explanation
Figure 1 shows that the main TV structure schematic diagram of mask platform of the present invention;
Figure 2 shows that the plan structure schematic diagram of mask platform of the present invention;
Figure 3 shows that the structural representation of mask connecting mechanism of the present invention;
Figure 4 shows that the workflow schematic diagram of mask platform of the present invention;
Figure 5 shows that the concrete structure schematic diagram of mask connecting mechanism of the present invention;
Figure 6 shows that the dynamic divided stator of described first motor is from structural representation;
It is the main TV structure schematic diagram of described first motor described in Fig. 7;
Figure 8 shows that the structural representation of described first grating scale;
Figure 9 shows that the litho machine structural representation with mask platform of the present invention;
Figure 10 shows that the litho machine plan structure schematic diagram with mask platform of the present invention.
Embodiment
By describe in detail the invention technology contents, structural attitude, reached object and effect, coordinate accompanying drawing to be described in detail below in conjunction with embodiment.
Refer to Fig. 1, Fig. 2, Figure 1 shows that the main TV structure schematic diagram of mask platform of the present invention.Figure 2 shows that the plan structure schematic diagram of mask platform of the present invention.Described mask platform 1 comprises holds bed 10, described in hold bed 10 for carrying described mask 11; First card extender 12a and the second card extender 12b, hold the both sides of bed 10 described in described first card extender 12a and described second card extender 12b is separately positioned on and hold the adjacent layout of bed 10 with described, described first card extender 12a and the second card extender 12b is movably arranged on described base 14 by being fixedly installed on the first pneumatic bearing 13a under described first card extender 12a and described second card extender 12b and the second pneumatic bearing 13b respectively; First motor 15a and the second motor 15b, the stator of described first motor 15a and described second motor 15b is fixedly installed on described base 14, described first motor 15a is fixedly connected with the described bed 10 that holds with the mover of the second motor 15b, described first motor 15a and described second motor 15b is used for for described mask platform 1 provides scanning to motion driving force, fine motion direction driving force, and by the differential driving force providing fine motion direction of described first motor 15a and described second motor 15b; First grating scale 16a and the second grating scale 16b, the read head of described first grating scale 16a and described second grating scale 16b or tape are fixedly installed on described first card extender 12a and described second card extender 12b; The tape of described first grating scale 16a and described second grating scale 16b or read head respectively correspondence are arranged on described base 14, and described first grating scale 16a and the second grating scale 16b is used for providing position measurement signal for the control of the initialization of described mask platform 1 and described first motor 15a and the second motor 15b; And mask connecting mechanism 17, described mask connecting mechanism 17 is fixedly installed on described base 14, and is positioned at mask handing-over position 170 place on described mask platform 1 scanning motion direction.
In the present embodiment, tape (as scale grating) is arranged on base 14 by the first grating scale 16a and the second grating scale 16b, is arranged on by the read head including indication grating and holds on bed 10.But, be not limited to this mounting means in actual use, such as, read head can be selected to be arranged on base 14, and tape is arranged on holds on bed 10, also can select interval that multiple read head is set according to movement travel and the size relationship holding bed 10.
Apparently, in the present invention, described first grating scale 16a and the second grating scale 16b is used for providing position measurement signal for the control of the initialization of described mask platform 1 and described first motor 15a and described second motor 15b.If when the measuring accuracy of described first grating scale 16a and described second grating scale 16b can not meet the user demand of described mask platform 1, mask platform 1 of the present invention can comprise further be fixedly installed on described in hold on bed 10 and respectively perpendicular to measurement mirror 18a, the 18b in described mask platform 1 scanning motion direction and jogging motion direction, corresponding described measurement mirror 18a, 18b are also provided with the laser interferometer measurement system 19 for providing position measurement signal for the motion control of described mask platform 1.Described laser interferometer measurement system 19 provides position signalling for the precise flange of the supporting body (not shown) for described mask platform 1 and described substrate to be patterned.Namely, after described mask platform 1 completes initialization by described first grating scale 16a and described second grating scale 16b, just described first grating scale 16a and described second grating scale 16b is switched to laser interferometer measurement system 19, to complete the position measurement of described mask platform 1.
Refer to Fig. 3, and Fig. 2 is consulted in combination, Figure 3 shows that the structural representation of mask connecting mechanism of the present invention.Described mask connecting mechanism 17 comprises handing-over hand 171, and described handing-over hand 171 top braces also adsorbs described mask 11; Vertical movement mechanism 172, described vertical movement mechanism 172 is fixedly connected with the bottom of described handing-over hand 171, and drives the vertically motion of described handing-over hand 171; And rotating mechanism 173, described rotating mechanism 173 is arranged at the bottom of described vertical movement mechanism 172, and drives described vertical movement mechanism 172 and described handing-over hand 171 along Rz to rotary motion.
In the present invention, particularly, described handing-over hand 171 is disposed in described vertical movement mechanism 172, and for providing vacuum and support function for the absorption of described mask 11; Described vertical movement mechanism 172 for realizing the catenary motion function of described handing-over hand 171, and provides vacuum line (not shown) for the absorption of described mask 11.
Please continue to refer to Fig. 1, and Fig. 3, Fig. 4 are consulted in combination, and the principle of work of mask connecting mechanism 17 of the present invention is described in detail in detail.
Figure 4 shows that the workflow schematic diagram of mask platform of the present invention.In the present invention, described mask 11 be carried on by the mode of vacuum suction described in hold on bed 10.Describedly hold bed 10 and slide on described base 14 by being fixedly installed on the first pneumatic bearing 13a under described first card extender 12a and described second card extender 12b and the second pneumatic bearing 13b respectively.Describedly hold measurement mirror 18a, 18b of bed 10 being also fixedly installed perpendicular to mask platform 1 scanning motion direction and jogging motion direction, corresponding described measurement mirror 18a, 18b are also provided with laser interferometer measurement system 19, for providing position measurement signal for the motion control of described mask platform 1.
The motion process of the mask connecting mechanism 17 of mask platform 1 of the present invention comprises the following steps:
Perform step S1: described mask platform 1 adsorb described mask 11 move on described mask platform 1 scanning motion direction mask handing-over position 170 place;
Perform step S2: described mask connecting mechanism 17 is from described zero-bit h 0version position h is met described in moving to 1, and open vacuum to adsorb described mask 11;
Perform step S3: the adjustment of the printing plate Rz error measuring described mask 11, and carry out adjustment of the printing plate error compensation by described rotating mechanism 173, described mask connecting mechanism 17 is from meeting version position h subsequently 1motion best friend's version position h 2, close vacuum, hold bed 10 simultaneously and open vacuum to adsorb described mask 11;
Perform step S4: described mask connecting mechanism 17 is from friendship version position h 2move to zero-bit h 0;
Perform step S5: described mask platform 1 moves to zero-bit h 0;
Perform step S6: described mask platform 1 waits for the handing-over signal of mask 11, and carries out subsequent action.
Refer to Fig. 5, and Fig. 3 is consulted in combination, Figure 5 shows that the concrete structure schematic diagram of mask connecting mechanism of the present invention.As embodiment, the vertical movement mechanism 172 of mask connecting mechanism 17 of the present invention comprises guide rail splice 1721 further, and its upper surface is fixedly connected with described handing-over hand 171; Voice coil motor 1722, the stator of described voice coil motor 1722 is arranged on rotating mechanism 173, and the mover of described voice coil motor 1722 is fixedly connected with described guide rail splice 1721 lower surface, and drives described guide rail splice 1721 vertically to move; Guide rail 1723, described guide rail 1723 to be vertically arranged on rotating mechanism 173 and to be provided with slide block 1724, and described slide block 1724 is fixedly connected with described guide rail splice 1721, for described vertical movement mechanism 172 provides vertical movement to lead.
Further, between described guide rail splice 1721 and described rotating mechanism 173, be also provided with a resetting means 1725, reset in zero-bit h for completing the rear described handing-over hand 171 of handing-over at described mask 11 0.Please continue to refer to Fig. 3, Fig. 5, and Fig. 2 is consulted in combination, the rotating mechanism 173 of mask connecting mechanism 17 of the present invention comprises rotating bottom board 1731 further, described rotating bottom board 1731 is arranged on a pedestal 1732, described rotating bottom board 1731 is fixedly connected with respectively stator and the guide rail 1723 of described voice coil motor 1722, and makes described vertical movement mechanism 172 have Rz to spinfunction; Coded scale 1733, the read head of described coded scale 1733 is fixedly installed on described pedestal 1732, and the tape correspondence of described coded scale 1733 is arranged on described rotating bottom board 1731, for described rotating mechanism 173 provides position measurement; Vertical pneumatic bearing 1734, described vertical pneumatic bearing 1734 is fixedly installed on described rotating bottom board 1731 times, and provides vertical support function for described rotating bottom board 1731; Ring-shaped guide rail 1735, described ring-shaped guide rail 1735 is arranged between described rotating bottom board 1731 and described pedestal 1732; Annular air-bearing 1736, described annular air-bearing 1736 is arranged between described ring-shaped guide rail 1735 and described rotating bottom board 1731, and provides Rz to guide function for described rotating bottom board 1731; And linear electric motors 1737, the stator of described linear electric motors 1737 is fixedly connected with described pedestal 1732, and the mover of described linear electric motors 1737 is fixedly connected with described rotating bottom board 1731, and provides Rz to driving force for described rotating mechanism 173.
Please continue to refer to Fig. 1, and Fig. 6, Fig. 7 are consulted in combination, and in the present embodiment, described first motor 15a and described second motor 15b has identical structural design, and described first motor 15a and described second motor 15b is rough micro-moving mechanism integrated motor.In the present embodiment, set forth for described first motor 15a, described second motor 15b has identical structure, does not repeat them here.Figure 6 shows that the dynamic divided stator of described first motor is from structural representation.It is the main TV structure schematic diagram of described first motor described in Fig. 7.Described first motor 15a comprises coil holder 151, the described coarse motion coil 152 that described coil holder 151 is arranged for fixed intervals and described fine motion coil 153; Magnetic receiver 154, described magnetic receiver 154 is arranged at intervals with coarse motion magnet 155 and the fine motion magnet 156 of corresponding coarse motion coil 152 and fine motion coil 153 respectively.Magnetic field is formed between the described coarse motion magnet 155 with opposed polarity.After described coarse motion coil 152 passes into electric current, described first motor 15a or the second motor 15b is along scanning motion direction output drive strength.Similarly, magnetic field is formed between the described fine motion magnet 156 with opposed polarity.After described fine motion coil 153 passes into electric current, described first motor 15a or the second motor 15b is along jogging motion direction output drive strength.In the present embodiment, the magnetic pole arrangement of described coarse motion magnet 155 and described fine motion magnet 156 is only to be enumerated, and should not be considered as the restriction to the technical program.
Apparently, in the present invention, described first motor 15a and described second motor 15b can adopt linear electric motors and can be described mask platform 1 provides scanning motion direction coarse motion, the fine motion of jogging motion direction simultaneously, and Rz is to the motor of fine motion driving force.
Refer to Fig. 8, and Fig. 2 is consulted in combination, in the present embodiment, described first grating scale 16a and described second grating scale 16b has identical structural design.In the present embodiment, set forth for described first grating scale 16a, described second grating scale 16b has identical structure, does not repeat them here.Figure 8 shows that the structural representation of described first grating scale.Described first grating scale 16a and described second grating scale 16b comprises coarse motion grating scale respectively, and the tape 160 of described coarse motion grating scale and read head 161 are arranged along scanning motion direction correspondence respectively, carry out position measurement to the motion of mask platform 1 on scanning motion direction; Fine motion grating scale, the read head 162 of described fine motion grating scale and tape 163 are arranged along jogging motion direction correspondence respectively, carry out position measurement to the motion of mask platform on jogging motion direction.Described fine motion grating scale can complete the position measurement of described mask platform 1 in jogging motion direction by interferential scanning or image scanning.Described coarse motion grating scale can complete the position measurement of described mask platform 1 in coarse motion direction of motion by interferential scanning or image scanning.Described first grating scale 16a is used for for the initialization of described mask platform and described first motor 15a provide control signal.
In the present embodiment, the first grating scale 16a and the second grating scale 16b adopts scan-type grating to be only citing and clearly demonstrates technical scheme of the present invention, should not be considered as the restriction to the technical program.In actual use, those skilled in the art also can select the grating scale as transmission phase formula grating or other types to carry out displacement measurement.
Refer to Fig. 9, Figure 10, and Fig. 1, Fig. 2, Fig. 3, Fig. 4 are consulted in combination, Figure 9 shows that the litho machine structural representation with mask platform of the present invention.Figure 10 shows that the litho machine plan structure schematic diagram with mask platform of the present invention.Described litho machine 2 comprises illuminator 21, and described illuminator 21 is for providing exposure light source for the exposure device of described litho machine 2; Mask platform 1, described mask platform 1 is for supporting and locating described mask 11; Projection objective 22, described projection objective 22 is assembled by many arrangements of mirrors head, composition Large visual angle exposure device, and passes through the crossed geometry of each camera lens, single-lens small field of view is formed large exposure field, by the pattern exposure on described mask 11 in described substrate to be patterned; Work stage 23, described work stage 23 for carrying described substrate to be patterned, and provides location and support function; Laser interferometer 24, described laser interferometer 24 is for providing position signalling for the precise motion of described mask platform 1 and described work stage 23; Mask prealignment mechanism 25, described mask prealignment mechanism 25 for measuring the adjustment of the printing plate error of described mask 11, and provides described adjustment of the printing plate error signal to carry out adjustment of the printing plate error compensation; Mask transmission system 26, described mask transmission system 26 has X to motor function, and provides transfer function for described mask 11.
In sum, mask platform of the present invention is by being fixedly installed the mask handing-over position place of described mask connecting mechanism in described mask bench scanning direction of motion, described mask connecting mechanism also has Rz and Z-direction motor function, after described mask is transferred into described mask handing-over position, just compensate described mask adjustment of the printing plate error by described mask connecting mechanism, reduce the Rz stroke demand of described mask platform.Meanwhile, described mask platform has the first motor, the second motor, and the first grating scale, the second grating scale, reduces the design difficulty of described mask platform.
Those skilled in the art all should be appreciated that, without departing from the spirit or scope of the present invention, can carry out various modifications and variations to the present invention.Thus, if when any amendment or modification fall in the protection domain of appended claims and equivalent, think that these amendment and modification are contained in the present invention.

Claims (9)

1. a mask connecting mechanism, is characterized in that, described mask connecting mechanism comprises:
Handing-over hand, its top braces also adsorbs mask;
Vertical movement mechanism, described vertical movement mechanism is fixedly connected with the bottom of described handing-over hand, and drives the vertically motion of described handing-over hand; And,
Rotating mechanism, described rotating mechanism is arranged at the bottom of described vertical movement mechanism, and drives described vertical movement mechanism and handing-over hand along Rz to rotary motion;
Described vertical movement mechanism comprises further:
Guide rail splice, its upper surface is fixedly connected with described handing-over hand;
Voice coil motor, the stator of described voice coil motor is arranged on rotating mechanism, and the mover of described voice coil motor is fixedly connected with described guide rail splice lower surface, and drives described guide rail splice vertically to move;
Guide rail, described guide rail to be vertically arranged on rotating mechanism and to be provided with slide block, and described slide block is fixedly connected with described guide rail splice, for described vertical movement mechanism provides vertical movement to lead.
2. mask connecting mechanism as claimed in claim 1, is characterized in that, be also provided with a resetting means between described guide rail splice and described rotating mechanism, resets in zero-bit for completing the rear described handing-over hand of handing-over at described mask.
3. mask connecting mechanism as claimed in claim 1 or 2, it is characterized in that, described rotating mechanism comprises further:
Rotating bottom board, is arranged on a pedestal, described rotating bottom board is fixedly connected with respectively stator and the guide rail of described voice coil motor, and makes described vertical movement mechanism have Rz to spinfunction;
Coded scale, the read head of described coded scale is fixedly installed on described pedestal, and the tape correspondence of described coded scale is arranged on described rotating bottom board, for described rotating mechanism provides position measurement;
Vertical pneumatic bearing, under described vertical pneumatic bearing is fixedly installed on described rotating bottom board, and provides vertical support function for described rotating bottom board;
Ring-shaped guide rail, described ring-shaped guide rail is arranged between described rotating bottom board and described pedestal;
Annular air-bearing, described annular air-bearing is arranged between described ring-shaped guide rail and described rotating bottom board, and provides Rz to guide function for described rotating bottom board; And,
Linear electric motors, the stator of described linear electric motors is fixedly connected with described pedestal, and the mover of described linear electric motors is fixedly connected with described rotating bottom board, and provides Rz to driving force for described rotating mechanism.
4. have a mask platform for mask connecting mechanism as described in claim arbitrary in claims 1 to 3, described mask platform is done scanning motion along Y-direction, along X to making jogging motion, be it is characterized in that, described mask platform comprises:
Hold bed, described in hold bed for carrying described mask;
First card extender and the second card extender, hold the both sides of bed described in described first card extender and described second card extender are separately positioned on, and be movably arranged on a base respectively by the first pneumatic bearing be fixedly installed under described first card extender and described second card extender and the second pneumatic bearing;
First motor and the second motor, the stator of described first motor and described second motor is fixedly installed on described base, described first motor is fixedly connected with the second card extender with described first card extender respectively with the mover of the second motor, for described mask platform provides the driving force of moving along described mask bench scanning direction of motion and jogging motion direction;
First grating scale and the second grating scale, the read head of described first grating scale and described second grating scale or tape are arranged on described first card extender and the second card extender respectively, the tape of described first grating scale and described second grating scale or read head respectively correspondence are arranged on described base, for the motion control of described mask platform initialization and described first motor and the second motor provides position measurement signal; And,
Mask connecting mechanism, described mask connecting mechanism is fixedly installed on the mask handing-over position place be positioned in described mask bench scanning direction of motion.
5. mask platform as claimed in claim 4, it is characterized in that, describedly hold measurement mirror bed is also fixedly installed perpendicular to mask bench scanning direction of motion and jogging motion direction, corresponding described measurement mirror is also provided with laser interferometer measurement system, for the motion control of described mask platform provides position measurement signal.
6. the mask platform as described in claim arbitrary in claim 4 ~ 5, is characterized in that, in described first motor and described second motor, at least one is rough micro-moving mechanism integrated motor.
7. mask platform as claimed in claim 6, it is characterized in that, described first motor and described second motor all adopt rough micro-moving mechanism integrated motor, and it comprises respectively:
Coil holder, be fixedly installed on the first card extender or the second card extender, described coil holder is provided with coarse motion coil and fine motion coil;
Magnetic receiver, described magnetic receiver is arranged at intervals with coarse motion magnet and the fine motion magnet of corresponding coarse motion coil and fine motion coil respectively;
Form magnetic field between the described coarse motion magnet with opposed polarity, after described coarse motion coil passes into electric current, described first motor or the second motor are along scanning motion direction output drive strength; Form magnetic field between the described fine motion magnet with opposed polarity, after described fine motion coil passes into electric current, described first motor or the second motor are along jogging motion direction output drive strength.
8. the mask platform as described in claim arbitrary in claim 4 ~ 5, is characterized in that, described first grating scale and described second grating scale comprise respectively:
Coarse motion grating scale, the read head of described coarse motion grating scale and tape are arranged along scanning motion direction correspondence respectively, carry out position measurement to the motion of mask platform on scanning motion direction;
Fine motion grating scale, the read head of described fine motion grating scale and tape are arranged along jogging motion direction correspondence respectively, carry out position measurement to the motion of mask platform on jogging motion direction.
9. have a litho machine for mask platform as described in claim arbitrary in claim 4 ~ 8, it is characterized in that, described litho machine comprises:
Illuminator, described illuminator is used for providing exposure light source for the exposure device of described litho machine;
Mask platform, described mask platform is used for supporting and locating described mask;
Projection objective, described projection objective is assembled by many arrangements of mirrors head, composition Large visual angle exposure device, and passes through the crossed geometry of each camera lens, single-lens small field of view is formed large exposure field, by the pattern exposure on described mask in substrate to be patterned;
Work stage, described work stage for carrying described substrate to be patterned, and provides location and support function;
Laser interferometer, described laser interferometer is used for providing position signalling for the precise motion of described mask platform and described work stage;
Mask prealignment mechanism, described mask prealignment mechanism for measuring the adjustment of the printing plate error of described mask, and provides described adjustment of the printing plate error signal to carry out adjustment of the printing plate error compensation; And,
Mask transmission system, described mask transmission system has X to motor function, and provides transfer function for described mask.
CN201210333084.1A 2012-09-10 2012-09-10 Mask connecting mechanism and there is the mask platform of this mask connecting mechanism Active CN103676488B (en)

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CN103926805A (en) * 2014-04-28 2014-07-16 清华大学 Planar motor-driven coarse motion and fine motion integrated mask platform
TW202244627A (en) * 2021-01-08 2022-11-16 美商應用材料股份有限公司 Active linear motor parasitic force compensation

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US5796469A (en) * 1993-06-30 1998-08-18 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
CN1854909A (en) * 2005-04-20 2006-11-01 应用菲林股份有限两合公司 Method and apparatus for positioning a mask
CN101356623A (en) * 2006-01-19 2009-01-28 株式会社尼康 Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method
CN102203677A (en) * 2009-11-25 2011-09-28 日本精工株式会社 Exposure unit and method for exposing substrate

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Publication number Priority date Publication date Assignee Title
US5796469A (en) * 1993-06-30 1998-08-18 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
CN1854909A (en) * 2005-04-20 2006-11-01 应用菲林股份有限两合公司 Method and apparatus for positioning a mask
CN101356623A (en) * 2006-01-19 2009-01-28 株式会社尼康 Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method
CN102203677A (en) * 2009-11-25 2011-09-28 日本精工株式会社 Exposure unit and method for exposing substrate

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