CN104375388B - A kind of multi-work piece platform direct-write photoetching system - Google Patents
A kind of multi-work piece platform direct-write photoetching system Download PDFInfo
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- CN104375388B CN104375388B CN201410539094.XA CN201410539094A CN104375388B CN 104375388 B CN104375388 B CN 104375388B CN 201410539094 A CN201410539094 A CN 201410539094A CN 104375388 B CN104375388 B CN 104375388B
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Abstract
The invention discloses a kind of multi-work piece platform direct-write photoetching system, use parallel exposure structure, belong to direct-write type lithography machine exposure technique field.Including the parallel type multi-work piece platform installed by scanning direction motion guide rail on the support structure；And installed by step direction motion guide rail, it is achieved the light path system to base plate exposure.Compared with existing single work stage direct-write photoetching technology, the present invention significantly reduces the complexity of structure, the exposure process that originally serial is carried out in order is made to become parallel exposure process, highly shortened time of exposure, the production capacity comparing current main flow either simplex part desk-top write-through exposure machine has significantly increase.Additionally, the structure design that one aspect of the present invention simplifies, it is possible to preferably play vac sorb effect, improve exposure quality and produce yield；On the other hand, due to the Parallel Design of multi-work piece platform, it is not necessary to focus module and alignment modules move up and down, ensureing while lithographic accuracy, will not increase any time-consuming.
Description
Technical field
The present invention relates to a kind of direct-write photoetching system, specifically a kind of multi-work piece platform direct-write photoetching system, belong to straight
Write formula litho machine quick scan exposure technical field.
Background technology
Write-through photoetching technique be development in recent years faster, to substitute the shadow of the board-like photoetching technique of traditional mask
As direct transfer techniques, in quasiconductor and PCB production field, there is increasingly consequence.Can shorten
Technological process, and reduce manufacturing cost.
The direct-write type lithography machine of main flow is scanned exposure, i.e. serial in single work stage mode mostly in the market
Workflow.In single workpiece table system, for exposure substrate upper plate, be directed at, expose, lower plate is
Carry out successively.According to current structural system, each operating process has reached the time-consuming upper limit, is difficult to contract again
The operating time of certain operating procedure short, the direct-write type lithography machine of i.e. single work stage is due to the serial of each operating process
Character, has been difficult to improve production capacity more.
Use the direct-write type lithography machine of double-workpiece-table design at present, be all that right angle setting mode is designed.I.e.
Two work stage are up-down structure, due to two work stage drop in vertical direction, it is desirable to focus module and
Alignment modules have to move up and down, and which increases structure design difficulty, and moves up and down frequently, meeting
Cause the reduction of alignment precision and increase alignment time-consumingly.The compactest lifting workpiece platform structure also causes vacuum system
System is difficult to install, and the warpage of substrate itself and the work stage substrate resulted in high-speed motion moves and all can drop
Low exposure quality and yield.
Summary of the invention
The problem existed for above-mentioned prior art, the present invention provides a kind of multi-work piece platform direct-write photoetching system, makes
Originally the exposure process that serial is carried out in order becomes the exposure process of part parallel, can effectively shorten integral basis plate
Time of exposure, significantly improve the production capacity of exposure machine.
To achieve these goals, this multi-work piece platform direct-write photoetching system includes on the support structure by scanning side
The parallel type multi-work piece platform installed to motion guide rail；And installed by step direction motion guide rail, it is achieved right
The light path system of base plate exposure.
Further, described parallel type multi-work piece platform is that left and right is arranged side by side, and carries substrate to be exposed.
Further, the multiple work stage of described scanning direction motion guide rail carrying independently make the reciprocal fortune of scanning direction
Dynamic；
The range of movement of scanning direction motion guide rail makes the longitudinal extent of multiple work stage be covered by light path system.
Further, the step direction motion guide rail carrying light path system of described installation light path system makees step direction
Mobile；
The scan exposure scope of whole light path system covers the lateral separation of whole multi-work piece platform.
Further, described supporting construction is gantry structure.
Compared with single work stage direct-write photoetching technology of the prior art, this multi-work piece platform direct-write photoetching system is significantly
Reduce the complexity of structure.Two work stage do not interfere with each other in respective working region, and a work stage exists
During scan exposure, another work stage carries out the operating process such as upper and lower plates, alignment, makes the most in order
The exposure process that serial is carried out becomes parallel exposure process, highly shortened time of exposure, than current main flow
The production capacity of either simplex part desk-top write-through exposure machine has significantly increase.
In addition, compared with work stage right angle setting mode, on the one hand this multi-work piece platform direct-write photoetching system simplifies
Structure designs, it is possible to preferably play vac sorb effect, improves exposure quality and produces yield；On the other hand,
Parallel Design due to two work stage, it is not necessary to focus module and alignment modules move up and down, is ensureing light
Carve while precision, will not increase any time-consumingly.
Accompanying drawing explanation
Fig. 1 is the agent structure schematic diagram of the present invention；
Fig. 2 is the fundamental diagram of the present invention.
Detailed description of the invention
The present invention will be further described below in conjunction with the accompanying drawings.
As it is shown in figure 1, this multi-work piece platform direct-write photoetching system includes being moved by scanning direction on the support structure
The parallel type multi-work piece platform of guide rails assembling；And installed by step direction motion guide rail, it is achieved substrate is exposed
The light path system of light.Whole light path system is arranged on step direction motion guide rail, with step in exposure process
Enter axle and carry out transverse shifting.
Further, described parallel type multi-work piece platform is that left and right is arranged side by side, and carries substrate to be exposed.Multiple works
Part platform is arranged on the motion guide rail of scanning direction abreast, carries out longitudinal shifting in exposure process respectively with scan axis
Dynamic, complete the actions such as alignment, scan exposure.
Further, the multiple work stage of described scanning direction motion guide rail carrying independently make the reciprocal fortune of scanning direction
Dynamic；The range of movement of scanning direction motion guide rail makes the longitudinal extent of multiple work stage be covered by light path system.Real
The most parallel exposure process.Light path system can be increased or decreased according to different design structures and design requirement
Illumination, imaging optical path, to be issued to the most reasonably design in different equipment performance demands.
Further, the step direction motion guide rail carrying light path system of described installation light path system makees step direction
Mobile；The scan exposure scope of whole light path system covers the lateral separation of whole multi-work piece platform.
Further, described supporting construction is gantry structure.Framework for whole system supports, marble gantry
The construction features of structure can well keep the stability that platform moves, and has good isolation property.
As in figure 2 it is shown, as a example by double-workpiece-table, can by script upper plate, be directed at, expose, lower plate etc. is by suitable
The workflow of sequence serial be improved as exposure and upper plate, be directed at, lower plate classifies parallel workflow, reduces whole
The plate operating time, in order to improve production capacity.
When A work stage is while carrying out normal scan exposure, and B work stage carries out the lower plate of previous piece of substrate,
The upper plate of front substrate also carries out being directed at preparation, and then B work stage moves to exposure original position and waits and exposing
Light.
After A work stage has exposed, light path system moves to B work stage table top with stepping axle, starts
B work stage is scanned exposure.Meanwhile, A work stage exits to home and carries out lower plate, next block upper
The work such as substrate, alignment, then moves to expose original position etc. to be exposed.
Workflow as shown in Figure 2 moves in circles and carries out, and forms the work flow of ping-pong type, to reach operation
The purpose that flow process is carried out parallel.
As depicted in figs. 1 and 2, when using a set of light path system, can be respectively to A, B as shown in Figure 2
Substrate in two work stage is exposed, and i.e. in the case of increasing little cost, equipment is greatly improved
Production capacity.Design in structure, simply a lot of relative to the method using up-down structure placement double-workpiece-table, example
As the focus issues brought because of different substrate thickness need not be rethought, up-down structure workpiece need not be rethought
The alignment issues that platform is brought.
And for the work stage of up-down structure designs, multi-work piece platform placed side by side can independently, mutually
The carrying out not disturbed moves, and can simplify whole exposing operation flow process, and the effective travel of its guide rail is the most shorter,
Being solely dependent upon the substrate sheet material size that designed equipment can be suitable for, such stability is more preferable, and cost is lower.And
The work stage design of up-down structure, the motion between two work stage has interference, it is impossible to independent motion, and i.e. one
Individual work stage is when exposure, and another work stage wants timesharing to carry out alignment function, and therefore efficiency to reduce.Its
The effective travel of guide rail also can be longer.
In sum, this multi-work piece platform direct-write photoetching system significantly reduces the complexity of structure, makes originally by suitable
The exposure process that sequence serial is carried out becomes parallel exposure process, highly shortened time of exposure, and ratio is the most main
The production capacity of stream either simplex part desk-top write-through exposure machine has significantly increase.In addition with work stage right angle setting mode
Compare, the structure design that on the one hand this multi-work piece platform direct-write photoetching system simplifies, it is possible to preferably play vacuum
Adsorption effect, improves exposure quality and produces yield；On the other hand, due to the Parallel Design of multi-work piece platform, no
Need focus module and alignment modules to move up and down, while ensureing lithographic accuracy, will not increase any
Time-consumingly.
Claims (5)
1. a multi-work piece platform direct-write photoetching system, it is characterised in that
Including the parallel type multi-work piece platform installed by scanning direction motion guide rail on the support structure；
And installed by step direction motion guide rail, it is achieved the light path system to base plate exposure；
Described parallel type multi-work piece platform is vertically moved with scan axis by scanning direction motion guide rail；
Described light path system carries out transverse shifting by step direction motion guide rail with stepping axle.
A kind of multi-work piece platform direct-write photoetching system the most according to claim 1, it is characterised in that
Described parallel type multi-work piece platform is that left and right is arranged side by side, and carries substrate to be exposed.
A kind of multi-work piece platform direct-write photoetching system the most according to claim 1, it is characterised in that
Described scanning direction motion guide rail carries multiple work stage and independently makees the reciprocating motion of scanning direction；
The range of movement of scanning direction motion guide rail makes the longitudinal extent of multiple work stage be covered by light path system.
A kind of multi-work piece platform direct-write photoetching system the most according to claim 1, it is characterised in that
The step direction motion guide rail carrying light path system of described installation light path system makees the movement of step direction；
The scan exposure scope of whole light path system covers the lateral separation of whole multi-work piece platform.
A kind of multi-work piece platform direct-write photoetching system the most according to claim 1, it is characterised in that
Described supporting construction is gantry structure.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410539094.XA CN104375388B (en) | 2014-10-13 | 2014-10-13 | A kind of multi-work piece platform direct-write photoetching system |
Applications Claiming Priority (1)
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| CN201410539094.XA CN104375388B (en) | 2014-10-13 | 2014-10-13 | A kind of multi-work piece platform direct-write photoetching system |
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| CN104375388A CN104375388A (en) | 2015-02-25 |
| CN104375388B true CN104375388B (en) | 2016-09-14 |
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Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106066581A (en) * | 2016-08-02 | 2016-11-02 | 无锡影速半导体科技有限公司 | The exposure system of a kind of dual stage face write-through exposure machine and exposure method |
| CN117872688A (en) * | 2016-11-22 | 2024-04-12 | 江苏影速集成电路装备股份有限公司 | Partition alignment focusing method of exposure machine |
| CN107664927A (en) * | 2017-11-28 | 2018-02-06 | 苏州源卓光电科技有限公司 | A kind of novel sports platform architecture and workflow based on mask-free photolithography system |
| CN108762007B (en) * | 2018-06-05 | 2024-05-03 | 苏州源卓光电科技有限公司 | Direct-writing photoetching mechanism for improving exposure productivity and exposure method thereof |
| CN109240048A (en) * | 2018-11-06 | 2019-01-18 | 无锡影速半导体科技有限公司 | A kind of multistation work stage single exposure molding direct-write photoetching system |
| CN112099315B (en) * | 2019-06-17 | 2021-10-22 | 上海微电子装备（集团）股份有限公司 | Photoetching equipment, control method and device thereof and storage medium |
| CN110286563A (en) * | 2019-06-19 | 2019-09-27 | 深圳凯世光研股份有限公司 | A kind of circulating scanning exposure machine |
| CN110850687B (en) * | 2019-11-27 | 2021-06-11 | 江苏影速集成电路装备股份有限公司 | Laser direct-writing exposure system and exposure method for controlling board-out distance of platform |
| CN111399869A (en) * | 2020-02-28 | 2020-07-10 | 合肥芯碁微电子装备股份有限公司 | Method for controlling software upgrading of direct-writing exposure machine, control unit and exposure machine |
| CN111722469A (en) * | 2020-07-28 | 2020-09-29 | 苏州苏大维格科技集团股份有限公司 | Light guide plate lithography apparatus |
| CN113031404B (en) * | 2021-03-23 | 2023-08-15 | 合肥芯碁微电子装备股份有限公司 | Mass production type laser direct writing lithography machine and control method thereof |
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| CN102402133A (en) * | 2011-11-12 | 2012-04-04 | 哈尔滨工业大学 | Double-workpiece-platform same-phase rotation exchange method based on parallel connection mechanisms, and device thereof |
| CN103576463A (en) * | 2012-07-20 | 2014-02-12 | 上海微电子装备有限公司 | Workbench of lithography machine and working method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5975723B2 (en) * | 2012-05-09 | 2016-08-23 | 株式会社ディスコ | Cutting equipment |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102393612A (en) * | 2011-11-12 | 2012-03-28 | 哈尔滨工业大学 | Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof |
| CN102402133A (en) * | 2011-11-12 | 2012-04-04 | 哈尔滨工业大学 | Double-workpiece-platform same-phase rotation exchange method based on parallel connection mechanisms, and device thereof |
| CN103576463A (en) * | 2012-07-20 | 2014-02-12 | 上海微电子装备有限公司 | Workbench of lithography machine and working method thereof |
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Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221399 Huashan Road, Pizhou Economic Development Zone, Xuzhou, Jiangsu Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
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