CN111722469A - Light guide plate lithography apparatus - Google Patents
Light guide plate lithography apparatus Download PDFInfo
- Publication number
- CN111722469A CN111722469A CN202010736318.1A CN202010736318A CN111722469A CN 111722469 A CN111722469 A CN 111722469A CN 202010736318 A CN202010736318 A CN 202010736318A CN 111722469 A CN111722469 A CN 111722469A
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- Prior art keywords
- guide
- photoetching
- light guide
- guide plate
- plate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a light guide plate photoetching device which comprises a base, a platform arranged on the base and used for placing a light guide plate, a photoetching mechanism used for photoetching the light guide plate, and a guide mechanism used for enabling a light beam used for photoetching by the photoetching mechanism to be always vertical to the platform when the photoetching mechanism moves relative to the platform and moves, wherein the guide mechanism is respectively connected with the photoetching mechanism and the platform, and comprises a first guide mechanism used for enabling the photoetching mechanism to move along a first direction and a second guide mechanism used for enabling the photoetching mechanism to move along a second direction. By the structure, the abnormal phenomenon of the dot morphology after photoetching can not occur, and the product quality is greatly improved.
Description
Technical Field
The invention relates to the technical field of light guide plate processing equipment, in particular to light guide plate photoetching equipment.
Background
The wide use of liquid crystal displays has also prompted the rise of the light guide plate processing industry. The light guide plates of products in the current market, such as mobile phones, computers, televisions and other electronic products including displays, are all small-size types, and when a large-size light guide plate is manufactured at present, as shown in fig. 1, under the condition that the engraving range of the laser emergent field lens 61 at the same position is gradually enlarged from small to large, light beams can be eccentric, so that the light beams are not perpendicular to the light guide plate placing platform 62, the quality of the light guide plate is affected (abnormal phenomena occur in the dot shapes, the quality of the products is greatly affected), and meanwhile, the improvement of the operation efficiency is also limited.
Therefore, in order to meet the market demand, it is urgently needed to develop a device which can ensure the quality of the light guide plate when the light guide plate with a large size (such as 110 inches) can be manufactured.
The foregoing description is provided for general background information and is not admitted to be prior art.
Disclosure of Invention
The invention aims to provide a light guide plate photoetching device for improving the quality of a light guide plate.
The invention provides a light guide plate photoetching device, which comprises a base, a platform arranged on the base and used for placing a light guide plate, a photoetching mechanism used for photoetching the light guide plate, and a guide mechanism used for realizing that a light beam used for photoetching by the photoetching mechanism is always vertical to the platform when the photoetching mechanism moves relative to the platform and moves, wherein the guide mechanism is respectively connected with the photoetching mechanism and the base, the guide mechanism comprises a first guide mechanism used for realizing that the photoetching mechanism moves along a first direction and a second guide mechanism used for realizing that the photoetching mechanism moves along a second direction, the second guide mechanism comprises a fixed structure, the fixed structure comprises a vertical plate and a transverse plate lapped on the vertical plate, the photoetching mechanism comprises a laser, an optical device sealing cover, a light path sealing tube, a vibrating mirror and a field lens, the laser instrument with the optics sealed cowling is installed respectively the upper surface of diaphragm, the light path sealed tube shake the mirror with the field lens is installed respectively the outside of vertical board, the laser of laser instrument transmission passes through in proper order the optics sealed cowling the light path sealed tube shake the mirror with the field lens shines on the platform.
In one embodiment, the first guide mechanism is connected to the platform, the second guide mechanism is connected to the first guide mechanism and the lithography mechanism, respectively, the first guide mechanism drives the second guide mechanism and the lithography mechanism to move along the first direction when moving along the first direction, and the second guide mechanism drives the lithography mechanism to move along the second direction when moving along the second direction.
In one embodiment, the first guide mechanism includes first guide rails respectively mounted on two opposite sides of the platform, a first slider mounted on the first guide rails, and a cross beam connecting the two first sliders, and the second guide mechanism includes two second guide rails, a third guide rail, a second slider, and a third slider, the two second guide rails are mounted on the side surfaces of the cross beam in parallel, the third guide rail is mounted on the upper surface of the cross beam, the second slider is mounted on the second guide rail, the third slider is mounted on the third guide rail, and the second slider and the third slider are both fixed on the fixed structure.
In one embodiment, the two ends of the first guide rail are provided with first buffer limiting blocks, and the two ends of the first guide rail, which are parallel to each other, between the second guide rails are provided with second buffer limiting blocks.
In one embodiment, a groove penetrating through the beam is formed between the two second guide rails, and the second buffer limiting block is installed in the groove.
In one embodiment, the inner side of the vertical plate is connected with the second sliding block, and the lower surface of the transverse plate is connected with the third sliding block.
In one embodiment, the platform is a partitioned adsorption platform, and the partitioned adsorption platform is provided with a plurality of vacuum adsorption areas.
According to the light guide plate photoetching equipment provided by the invention, the photoetching mechanism moves relative to the platform and the guide mechanism which is perpendicular to the movement of the platform is used for realizing that the pattern of the screen dots after photoetching is not abnormal, so that the quality of products is greatly improved.
Drawings
FIG. 1 is a schematic diagram of a field lens of a conventional light guide plate lithography apparatus;
FIG. 2 is a schematic structural diagram of a photolithography apparatus for light guide plates according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a partial structure of a photolithography apparatus for a light guide plate according to an embodiment of the present invention;
FIG. 4 is a schematic optical path diagram of an optical bench according to an embodiment of the present invention;
FIG. 5 is a schematic optical path diagram of an optical bench according to another embodiment of the present invention;
FIG. 6 is a schematic diagram of the operation of a field lens of the light guide plate lithography apparatus of FIG. 2.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
Referring to fig. 2 and fig. 3, the light guide plate lithography apparatus provided in the embodiment of the present invention includes a base 1, a platform 2 disposed on the base 1 for placing the light guide plate, a lithography mechanism 3 for lithography the light guide plate, and a guiding mechanism 4 for enabling the lithography mechanism 3 to move relative to the platform 2 and enabling a light beam of the lithography mechanism 3 for lithography to be always perpendicular to the platform 2 when the lithography mechanism 3 moves. The guide mechanism 4 is connected with the photoetching mechanism 3 and the platform 2 respectively. The guide mechanism 4 comprises a first guide mechanism 41 for enabling horizontal movement of the lithography mechanism in a first direction and/or a second guide mechanism 42 for enabling horizontal movement of the lithography mechanism in a second direction.
The length and width of the base 1 and the platform 2 are respectively 2.5 meters and 1.5 meters, and the platform 2 is a partitioned adsorption platform, that is, the platform 2 is provided with a plurality of vacuum adsorption areas, and each vacuum adsorption area can work independently. When light guide plates with different sizes are manufactured, the corresponding adsorption areas can be selected according to the sizes of the light guide plates.
In the present embodiment, the guide mechanism 4 includes a first guide mechanism 41 and a second guide mechanism 42. Specifically, the first guide mechanism 41 is disposed on the stage 2, and the second guide mechanism 42 is respectively connected to the first guide mechanism 41 and the lithography mechanism 3; the first guiding mechanism 41 is similar to a gantry structure. The first guide mechanism 41 drives the second guide mechanism 42 and the lithography mechanism 3 to move horizontally along the first direction when moving horizontally along the first direction, and the second guide mechanism 42 drives the lithography mechanism 3 to move horizontally along the second direction when moving along the second direction. Wherein, the first direction and the second direction are respectively the directions of two crossed sides of the platform 2.
The first guide mechanism 41 includes first guide rails 411 respectively installed at opposite sides of the platform 2, and a first slider 412 placed on the first guide rails 411 and a cross beam 415 connecting the two first sliders 412.
The first guide rail 411 is a long iron bar with a certain width, and the number of the first guide rail is 2; the mounting direction of the first guide rail 411 is the same as the moving direction of the first guide mechanism 41.
The first sliding block 412 is U-shaped, and the first sliding block 412 of the U-shaped structure is inverted (the opening of the U-shape faces the first guide rail 411) on the first guide rail 411, that is, the first sliding block 412 spans the first guide rail 411. The length of the top of the first sliding block 412 with the U-shaped structure is slightly larger than the width of the cross beam 415, so as to ensure the stability of the cross beam 415 when the first guiding mechanism 41 moves. The first slider 412 can slide along the first guide rail 411 to realize the horizontal movement of the first guide mechanism 41 in the first direction and drive the horizontal movement of the second guide mechanism 42 and the lithography mechanism 3 in the first direction.
The beam 415 is a square bar, and a side of one side of the beam 415 is provided with a groove 4151, and the groove 4151 penetrates the beam 415 in the second direction.
The second guide mechanism 42 includes a second guide rail 421, a third guide rail 424, a second slider 422, a third slider 426, and a fixed structure 427.
The second guide rail 421 is a long iron bar with a certain width, and the number of the second guide rail is 2; 2 second guide rails 421 parallel to each other are installed on the lateral surface of the cross beam 415 and located on both sides of the groove 4151; the mounting direction of the second guide rail 421 is the same as the moving direction of the second guide mechanism 42.
The third guide rail 424 is an elongated iron bar with a certain width, and the number of the third guide rail is 1; the third rail 424 is installed on the upper surface of the beam 415 and is located at the center of the upper surface; the third guide rail 424 is installed in the same direction as the moving direction of the second guide mechanism 42.
The first guide rail 411, the second guide rail 421 and the third guide rail 424 may have the same or different structures, but the lengths of the first guide rail 411, the second guide rail 421 and the third guide rail 424 are selected to be suitable for the required movement of the respective guide devices according to requirements.
In this embodiment, in order to save development cost, the first guide rail 411, the second guide rail 421 and the third guide rail 424 have the same structure, wherein the length of the first guide rail 411 is greater than that of the second guide rail 421, and the length of the second guide rail 421 is equal to that of the third guide rail 424.
The second slider 422 is U-shaped, and the second slider 422 of the U-shaped structure is inverted (the opening of the U-shape faces the second rail 421) on the second rail 421, that is, the second slider 422 crosses the second rail 421. The second slider 422 can slide along the second guide rail 421 to realize the movement of the second guide mechanism 42 along the second direction and drive the lithography mechanism 3 to move along the second direction.
The fixing structure 427 includes a vertical plate 4272 and a transverse plate 4271 lapped on top of the vertical plate 4272. The surface of the vertical plate 4272 facing the cross beam 415 is fixedly connected with the second slider 422, and the lower surface of the transverse plate 4271 is fixedly connected with the third slider 426.
The lithography mechanism 3 includes a laser 301, an optical device sealing cap 302, an optical path sealing tube 303, a galvanometer 304, and a field lens 305. The laser emitted from the laser 301 is irradiated onto the stage 2 through the optical device sealing cover 302, the optical path sealing tube 303, the galvanometer 304, and the field lens 305 in this order. Specifically, the laser 301 and the optical device sealing cover 302 are respectively mounted on the upper surface of the transverse plate 4271; the light path sealing tube 303, the galvanometer 304 and the field lens 305 are respectively installed on the outer sides of the vertical plates 4272.
The photolithography mechanism 3 is movable along the second guide rail 421 and the third guide rail 424 on the beam 415 in the second direction along with the fixing structure 427, and the beam 415 is movable along the first guide rail 411 in the first direction, so that the photolithography mechanism 3 can move in the first and second directions respectively or simultaneously, thereby enabling the photolithography mechanism to perform photolithography on a larger-sized light guide plate; meanwhile, the light beam emitted by the laser 301 after passing through the field lens 305 is always in a perpendicular state with the platform 2, the external dimension of the light guide plate photoetching equipment is large, and the length and the width respectively reach 2.5 meters and 1.5 meters, so that the light guide plate photoetching equipment can be used for manufacturing light guide plates with various dimensions in the length and width range, especially large-size light guide plates, and the abnormal phenomenon of the mesh point appearance after photoetching can not occur, thereby greatly improving the quality and the quality of products.
In this embodiment, as shown in fig. 4, a beam expander 306, a first reflector 307, a second reflector 308, an adjustable diaphragm 309 and a third reflector 310 are sequentially installed in the optical device sealing cover 302 along the optical path direction; the fourth mirror 311 is mounted in the optical path sealing tube 303. This further ensures that the beam of laser light emitted by the laser 301 after passing through the field lens 305 is always perpendicular to the platform 2, as shown in fig. 6.
In other embodiments, as shown in fig. 5, a beam expander 306, an adjustable diaphragm 309, and a third reflector 310 are sequentially installed in the optical device sealing cover 302 along the optical path direction; the fourth mirror 311 is mounted in the optical path sealing tube 303.
The light guide plate lithography apparatus is further provided with a first buffer stop 71 and a second buffer stop 72. The first buffer limiting blocks 71 are disposed at two ends of the first guide rail 411, and are used for playing a role of buffer limiting when the first guide mechanism 41 collides with the first slider 412 when moving beyond a preset movement range. The second buffer stoppers 72 are disposed at both ends between the two parallel second guide rails 421, that is, the second buffer stoppers 72 are installed at both ends inside the grooves 4151 on the cross beam 415, and serve as buffer stoppers when the second guide mechanism 42 collides with the vertical plate 4272 when moving beyond a preset movement range.
The light guide plate lithographic apparatus is further provided with a linear motor movement mechanism (not shown). The linear motor motion mechanism is respectively connected with the first guide mechanism 41 and the second guide mechanism 42, so that the light guide plate lithography equipment can operate quickly and stably, the operation time is greatly shortened, and the working efficiency is improved.
In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. It will be understood that when an element such as a layer, region or substrate is referred to as being "formed on," "disposed on" or "located on" another element, it can be directly on the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly formed on" or "directly disposed on" another element, there are no intervening elements present.
In this document, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms can be understood in a specific case to those of ordinary skill in the art.
In this document, the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", "vertical", "horizontal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for the purpose of clarity and convenience of description of the technical solutions, and thus, should not be construed as limiting the present invention.
As used herein, the ordinal adjectives "first", "second", etc., used to describe an element are merely to distinguish between similar elements and do not imply that the elements so described must be in a given sequence, either temporally, spatially, in ranking, or in any other manner.
As used herein, the meaning of "a plurality" or "a plurality" is two or more unless otherwise specified.
As used herein, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, including not only those elements listed, but also other elements not expressly listed.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and all the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (7)
1. A light guide plate photoetching equipment is characterized by comprising a base, a platform arranged on the base and used for placing a light guide plate, a photoetching mechanism used for photoetching the light guide plate, and a guide mechanism used for realizing that a light beam used for photoetching by the photoetching mechanism is always vertical to the platform when the photoetching mechanism moves relative to the platform and moves, wherein the guide mechanism is respectively connected with the photoetching mechanism and the base, the guide mechanism comprises a first guide mechanism used for realizing that the photoetching mechanism moves along a first direction and a second guide mechanism used for realizing that the photoetching mechanism moves along a second direction, the second guide mechanism comprises a fixed structure, the fixed structure comprises a vertical plate and a transverse plate lapped on the vertical plate, and the photoetching mechanism comprises a laser, an optical device sealing cover, a light path sealing tube, a vibrating mirror and a field lens, the laser instrument with the optics sealed cowling is installed respectively the upper surface of diaphragm, the light path sealed tube shake the mirror with the field lens is installed respectively the outside of vertical board, the laser of laser instrument transmission passes through in proper order the optics sealed cowling the light path sealed tube shake the mirror with the field lens shines on the platform.
2. The light guide plate lithography apparatus according to claim 1, wherein the first guide mechanism is coupled to the stage, the second guide mechanism is coupled to the first guide mechanism and the lithography mechanism, respectively, the first guide mechanism moving in a first direction drives the second guide mechanism and the lithography mechanism to move in the first direction, and the second guide mechanism moving in a second direction drives the lithography mechanism to move in the second direction.
3. A light guide plate lithographic apparatus as claimed in claim 1 or 2, wherein said first guide mechanism comprises first guide rails mounted on opposite sides of said stage, respectively, and a first slider mounted on said first guide rails and a beam connecting said two first sliders, said second guide mechanism further comprises two second guide rails mounted in parallel on sides of said beam, a third guide rail mounted on an upper surface of said beam, a second slider mounted on said second guide rails, and a third slider mounted on said third guide rails, and said second and third sliders are fixed to said fixed structure.
4. The light guide plate lithography apparatus according to claim 3, wherein both ends of the first guide rail are provided with first buffer stoppers, and both ends between the two parallel second guide rails are provided with second buffer stoppers.
5. The light guide plate lithography apparatus according to claim 4, wherein a groove is provided between the two second rails and penetrates the beam, and the second buffer stopper is installed in the groove.
6. A light guide plate lithographic apparatus as claimed in claim 3, wherein the inner side of the vertical plate is connected to the second slider and the lower surface of the cross plate is connected to the third slider.
7. The light guide plate lithography apparatus according to claim 1, wherein said stage is a zoned adsorption stage having a plurality of vacuum adsorption areas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010736318.1A CN111722469A (en) | 2020-07-28 | 2020-07-28 | Light guide plate lithography apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010736318.1A CN111722469A (en) | 2020-07-28 | 2020-07-28 | Light guide plate lithography apparatus |
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| CN111722469A true CN111722469A (en) | 2020-09-29 |
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| CN202010736318.1A Pending CN111722469A (en) | 2020-07-28 | 2020-07-28 | Light guide plate lithography apparatus |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201516538U (en) * | 2009-09-24 | 2010-06-30 | 苏州苏大维格光电科技股份有限公司 | Photo-etching system for processing with lasers of double optical heads in parallel |
| US20130153546A1 (en) * | 2010-07-07 | 2013-06-20 | Laserlighting | Apparatus for Laser Processing a Light Guide Plate and Having Constant Light Path Distance of a Laser Beam |
| CN104375388A (en) * | 2014-10-13 | 2015-02-25 | 江苏影速光电技术有限公司 | Multi-workpiece table direct-writing photoetching system |
| CN105345266A (en) * | 2015-11-20 | 2016-02-24 | 苏州光韵达光电科技有限公司 | Laser type carving device of light guide plate |
| WO2018039893A1 (en) * | 2016-08-30 | 2018-03-08 | 陈海涛 | Multi-functional engraving machine |
| CN209969850U (en) * | 2019-01-31 | 2020-01-21 | 大族激光科技产业集团股份有限公司 | Zoom laser scanning processing device |
-
2020
- 2020-07-28 CN CN202010736318.1A patent/CN111722469A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201516538U (en) * | 2009-09-24 | 2010-06-30 | 苏州苏大维格光电科技股份有限公司 | Photo-etching system for processing with lasers of double optical heads in parallel |
| US20130153546A1 (en) * | 2010-07-07 | 2013-06-20 | Laserlighting | Apparatus for Laser Processing a Light Guide Plate and Having Constant Light Path Distance of a Laser Beam |
| CN104375388A (en) * | 2014-10-13 | 2015-02-25 | 江苏影速光电技术有限公司 | Multi-workpiece table direct-writing photoetching system |
| CN105345266A (en) * | 2015-11-20 | 2016-02-24 | 苏州光韵达光电科技有限公司 | Laser type carving device of light guide plate |
| WO2018039893A1 (en) * | 2016-08-30 | 2018-03-08 | 陈海涛 | Multi-functional engraving machine |
| CN209969850U (en) * | 2019-01-31 | 2020-01-21 | 大族激光科技产业集团股份有限公司 | Zoom laser scanning processing device |
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