CN108863342A - 一种高密度Nb-ZnO材料的制备 - Google Patents
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Abstract
一种高密度Nb‑ZnO材料的制备。本发明属于非金属元素及其化合物。本发明公开了一种新的Nb‑ZnO材料制备技术。把(0.005‑1at%)的Nb2O5与ZnO粉末经过充分混合、成型、烧结可制备出致密度超过99.8%,抗弯强度超过100MPa,电阻率小于2×10‑2Ω·cm的Nb‑ZnO材料。这种Nb‑ZnO材料,可制成溅射镀膜靶材,在显示、薄膜太阳能电池、low‑E玻璃等领域有极其广泛的应用。
Description
技术领域
本发明属于无机非金属元素及其化合物。
背景技术
ZnO薄膜作为透明导电氧化物薄膜是一种被广泛研究的功能材料。ZnO透明导电膜性能稳定、制备简单、成本低廉,是新一代透明导电膜,有可能替代昂贵的ITO,在薄膜,在平板显示、太阳能电池、节能玻璃、智能玻璃等领域有广泛的应用前景。
透明导电ZnO薄膜的制备方法主要有:物理气相沉积、化学气相沉积、溶胶-凝胶等各种方法。由于物理气相沉积制备的薄膜与基体的结合强度高、沉积效率高、工艺成熟稳定而被广泛应用。而用物理气相沉积制备薄膜需要使用高密度靶材,通过能量束轰击靶材将其气化,再沉积到基体表面形成透明导电膜。Nb2O5掺杂ZnO能大幅度降低ZnO靶材的烧结温度,促进其烧结的致密化,提高靶材的密度、强度及导电性,从而提高镀膜质量。
发明内容
本发明公开了一种高密度Nb-ZnO材料的制备。把(0.001-1at%)的Nb2O5、ZnO粉末,按水∶料比为3∶1制成混合料浆,湿磨72h,干燥过筛,粉末预烧后加入5wt%的PEG-2000溶液,继续湿磨2h后,干燥过筛,然后造粒、成型、烧结。在1100℃-1250℃温度下烧结,可制备出致密度超过99.8%,抗弯强度超过100MPa,电阻率小于2×10-2Ω·cm的Nb-ZnO(NZO)靶材,这种NZO靶材,可经济、高效的制成各种复杂形状。NZO透明导电薄膜有性能稳定、制备简单、成本低廉等优势,在光电学性能平板显示领域得到了极其广泛的应用,是新一代透明导电膜,最有可能替代昂贵的ITO,在薄膜太阳能电池和low-E玻璃等领域,正显示出巨大的应用前景和市场,是一种被广泛研究的功能材料。
本发明详细研究并掌握了掺杂比、球磨参数、烧结温度等对NZO烧结致密化过程的变化规律,从而可制备出高性能的烧结NZO材料。这种材料可经济、高效的制成各种复杂形状的产品,主要是溅射镀膜用的靶材(包括平面靶和旋转靶),也可用于制造多种导电零部件。
附图说明
下面结合附图对本发明作进一步说明:
附图1:一种高密度Nb-ZnO材料的制备工艺流程图。
下面结合附图对本发明作进一步说明:
如附图1所示,本发明的高密度Nb-ZnO材料的制备工艺流程图:先将Nb2O5、ZnO粉末和成型剂加入到球磨机中于水溶液中湿磨混合,充分混合均匀后,经干燥过筛得到充分混合的Nb-ZnO粉体,然后成型(干压、冷等静压、注射成型等),得到生坯,经脱成型剂后,即可进行常压烧结或气压烧结,得到高强度高密度的Nb掺杂ZnO烧结材料。
本发明的优点在于用微量Nb2O5掺杂,即可大幅度降低ZnO靶材的烧结温度,提高ZnO靶材致密度,通过对Nb-ZnO粉体进行烧结,可制备出高性能烧结Nb掺杂ZnO靶材。
具体实施方式:
实例1:0.05wt%Nb-ZnO粉体的制备
将市售纯度为99.9%ZnO、Nb2O5粉末按质量比99.95∶0.05混合加入1wt%-5wt%聚乙二醇(PEG),在水溶液中置于球磨机中湿磨24-96h,干燥过筛后,得到各种粉料充分混合、粒径分布均匀、成型性好、各组分质量比为ZnO∶Nb2O5=99.95∶0.05的Nb-ZnO粉体。
实例2:0.05wt%Nb-ZnO粉体1100℃烧结
将制备的Nb-ZnO粉体,在100-200MPa压力下压制成型,脱成型剂后,在高温炉内1100℃下于Ar中常压烧结60-180分钟,随炉冷却。这样制得的烧结NZO靶材,密度大于5.59g/cm3,相对密度≥99.8%,抗弯强度大于100MPa,电阻率小于2.0×10-2Ω·cm。
实例3:0.05wt%Nb-ZnO粉体1200℃烧结
将制备的Nb-ZnO粉,在100-200MPa压力下压制成型,脱成型剂后,在高温炉内1200℃下于Ar中常压烧结60-180分钟,随炉冷却。这样制得的烧结NZO靶材,密度大于5.58g/cm3,相对密度≥99.6%,抗弯强度大于75MPa,电阻率小于1×10-2Ω·cm。
实例4:0.05wt%Nb-ZnO粉体1250℃烧结
将制备的Nb-ZnO粉,在100-200MPa压力下压制成型,脱成型剂后,在高温炉内1250℃下于空气中常压烧结60-180分钟,随炉冷却。这样制得的烧结NZO靶材,密度大于5.56g/cm3,相对密度≥99.2%,抗弯强度大于100MPa,电阻率小于5×10-1Ω·cm。
Claims (3)
1.一种高密度Nb-ZnO材料的制备,实验采用球磨(加成型剂)-卸料-干燥-过筛-干压成型-烧结的制备工艺流程,可制备出密度达5.59g/cm3,抗弯强度大于100MPa,电阻率小于2.0×10-2Ω·cm的高性能靶材。
2.对权利要求1所述的Nb-ZnO粉体的烧结,既可采用常压烧结工艺,也适用于气压烧结工艺,另外也可将权利要求1所述的Nb-ZnO粉体直接热压而得到致密Nb-ZnO材料。
3.利用权利要求1所述Nb-ZnO粉体制备的Nb-ZnO材料,可制成各种复杂形状的制品,主要是溅射镀膜用的靶材(包括平面靶和旋转靶),也可用于制造其它多种导电零部件。
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Cited By (2)
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CN109970096A (zh) * | 2019-05-08 | 2019-07-05 | 扬州新达锌业有限公司 | 一种高密度氧化锌加工工艺 |
CN110655387A (zh) * | 2019-11-08 | 2020-01-07 | 先导薄膜材料(广东)有限公司 | 一种低密度ito靶材及其制备方法 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN109970096A (zh) * | 2019-05-08 | 2019-07-05 | 扬州新达锌业有限公司 | 一种高密度氧化锌加工工艺 |
CN110655387A (zh) * | 2019-11-08 | 2020-01-07 | 先导薄膜材料(广东)有限公司 | 一种低密度ito靶材及其制备方法 |
CN110655387B (zh) * | 2019-11-08 | 2022-05-10 | 先导薄膜材料(广东)有限公司 | 一种低密度ito靶材及其制备方法 |
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