CN108761995A - Mask plate, exposure method and touch panel - Google Patents
Mask plate, exposure method and touch panel Download PDFInfo
- Publication number
- CN108761995A CN108761995A CN201810642760.0A CN201810642760A CN108761995A CN 108761995 A CN108761995 A CN 108761995A CN 201810642760 A CN201810642760 A CN 201810642760A CN 108761995 A CN108761995 A CN 108761995A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- substrate
- exposure
- width
- shading strip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0416—Control or interface arrangements specially adapted for digitisers
- G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Computer Networks & Wireless Communication (AREA)
- Position Input By Displaying (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A kind of mask plate is provided, including：Multiple shading strips, the multiple shading strip is configured to blocking light, the multiple shading strip, which surrounds the gap to be formed, allows light to pass through, wherein, the multiple shading strip is arranged to latticed, the multiple shading strip includes the first shading strip and the second shading strip, and first shading strip is located at at least one lateral edges of the mask plate, and the width of first shading strip is more than the width of second shading strip.The touch panel that a kind of exposure method using the mask plate is also provided and is manufactured using the exposure method.
Description
Technical field
This disclosure relates to which mask exposure technical field, more particularly, to a kind of mask plate, uses the exposure of the mask plate
Method and the touch panel manufactured using the exposure method.
Background technology
With the continuous development of display technology, the size of display panel or touch panel is increasing.In order to produce
Larger sized display panel or touch panel need to establish new production line.And new production line is established, especially higher generation
The production line in generation not only needs huge investment, but also there are higher technical risks.
Accordingly, there exist the demands for using the production line of small generation to produce large-sized display panel or touch panel.
Invention content
On one side, a kind of mask plate is provided, including：Multiple shading strips, the multiple shading strip are configured to blocking light,
The multiple shading strip, which surrounds the gap to be formed, allows light to pass through,
Wherein, the multiple shading strip is arranged to latticed, and the multiple shading strip includes that the first shading strip and second hide
Striation, first shading strip are located at at least one lateral edges of the mask plate, and the width of first shading strip is more than
The width of second shading strip.
Optionally, the mask plate is used in the splicing exposure technology including exposing at least twice, first shading strip
With the first width, second shading strip has the second width, the difference between first width and second width
It is directly proportional to the position deviation of mask plate between double exposing in splicing exposure technology.
Optionally, first width and second width meet following relational expression：
Wm1=Wm2+2Wp,
Wherein, Wm1For first width, Wm2For second width, WpFor width difference and it is more than zero.
Optionally, the width difference WpMore than or equal to 16 μm.
Optionally, first shading strip is located at two lateral edges along stitching direction of the mask plate, alternatively, institute
The first shading strip is stated to be located at four lateral edges of the mask plate.
Optionally, the width of second shading strip is less than or equal to 6 μm.
Optionally, the spacing between two adjacent second shading strips is in the range of 100~300 μm.
Optionally, the mask plate further includes at least one alignment mark.
On the other hand, a kind of exposure method is provided, which executes spelling using above-mentioned mask plate on substrate
Exposure technology is connect, the substrate includes the first exposure area and the second exposure area, which includes the following steps：
It is directed at the first exposure area of the mask plate and the substrate, is exposed for the first time with executing；
Make the mask plate and the substrate relative motion；With
It is directed at the second exposure area of the mask plate and the substrate, is exposed with executing second.
Optionally, exposure includes for the first time for the execution：
Using the first shading strip of the mask plate, the first pattern is formed in first exposure area；With
Using the second shading strip of the mask plate, the second pattern is formed in first exposure area,
Wherein, the width of first pattern is more than the width of second pattern.
Optionally, in second exposes, the orthographic projection of the first shading strip of the mask plate on substrate and described the
Orthographic projection of one pattern on substrate partly overlaps, and the width of lap is equal to the width of second shading strip.
Optionally, it is directed at the first exposure area of the mask plate and the substrate, to execute first time exposure technology packet
It includes：
First alignment mark is set on the mask plate；
Second alignment mark is set on the substrate；With
It is directed at first alignment mark and second alignment mark, to be directed at the of the mask plate and the substrate
One exposure area.
Optionally, it is directed at the second exposure area of the mask plate and the substrate, to execute second of exposure technology packet
It includes：
Third alignment mark is set on the substrate；With
It is directed at first alignment mark and the third alignment mark, to be directed at the of the mask plate and the substrate
Two exposure areas.
Optionally, there is the substrate long side and short side, the mask plate to have maximum contraposition distance, the maximum contraposition
Distance be can be arranged on the mask plate side of mask plate described in the positional distance of first alignment mark it is maximum away from
From the exposure method further includes：
Compare the short side of the substrate and the maximum contraposition distance；With
When the maximum contraposition distance is more than the length of the short side and the maximum contraposition distance and the short side
When the difference of length is more than predetermined threshold, only the first time exposure and described second are executed along the long side direction of the substrate
Exposure.
Another aspect provides a kind of touch panel, including：
Substrate；
The touch drive electrode being set on the substrate；With
The touch-control sensing electrode being set on the substrate,
It is characterized in that, the touch drive electrode and/or the touch-control sensing electrode have metal mesh structure, and
The touch drive electrode and/or the touch-control sensing electrode are manufactured according to above-mentioned exposure method.
Optionally, the metal mesh structure includes a plurality of metal wire in grid arrangement, and the line width of the metal wire is small
In equal to 5 μm, the spacing between each two adjacent metal wire is in 150~250 μ ms.
Advantageously, by using the splicing exposure technology including double exposure, the production line using the small generation can be met
Produce the demand of large-sized display panel or touch panel.
Description of the drawings
By below with reference to attached drawing to being described made by the disclosure, the other objects and advantages of the disclosure will be aobvious and easy
See, and can help to be fully understood by the disclosure.
Fig. 1 diagrammatically illustrates the structure of metal grid electrode；
Fig. 2 is the structural schematic diagram according to the touch panel of one embodiment of the disclosure；
Fig. 3 is the structural schematic diagram according to the mask plate of one embodiment of the disclosure；
Fig. 4 is the schematic top plan view according to the substrate of the touch panel of one embodiment of the disclosure；
Fig. 5 A-5C diagrammatically illustrate partial enlarged view of splicing exposure area during double exposure；
Fig. 6 is the structural schematic diagram of mask plate according to another embodiment of the present disclosure；
Fig. 7 is the width versus relationship of the first shading strip and the second shading strip that schematically show the mask plate in Fig. 6
Enlarged drawing；
Fig. 8 is to schematically show the schematic diagram for executing splicing exposure technology on substrate using the mask plate in Fig. 6；
Fig. 9 A-9C, which are diagrammatically illustrated, splices exposure area during double exposure in the splicing exposure technology in Fig. 8
Partial enlarged view；
Figure 10 A-10B respectively illustrate the structure of the metal grid electrode with different line widths and spacing；
Figure 11 A and Figure 11 B are diagrammatically illustrated to expose according to the splicing in such a way that label aligns of the embodiment of the present disclosure
Light technology；
Figure 12 is according to the structural schematic diagram of the mask plate of the embodiment of the present disclosure, wherein diagrammatically illustrating can be arranged pair
The region of position label；
Figure 13 diagrammatically illustrates the process for executing splicing exposure technology on 65 cun of substrates using the mask plate of Figure 12；
Figure 14 diagrammatically illustrates the process for executing splicing exposure technology on 75 cun of substrates using the mask plate of Figure 12；
Figure 15 A and Figure 15 B comparisons show the touch panel produced using laser positioning mode and label alignment mode
Moire fringes phenomenon；
Figure 16 is the method flow diagram according to the production OGS touch panels of the embodiment of the present disclosure；
Figure 17 is the structural schematic diagram of touch panel according to another embodiment of the present disclosure；With
Figure 18 is the method flow diagram according to the production GG touch panels of the embodiment of the present disclosure.
It should be noted that attached drawing is not necessarily to scale to draw, but only not influence the schematic of reader's understanding
Mode is shown.
Specific implementation mode
To keep the purpose, technical scheme and advantage of the disclosure clearer, below in conjunction with the attached drawing of the embodiment of the present disclosure,
The technical solution of the disclosure is clearly and completely described.Obviously, described embodiment is an implementation of the disclosure
Example, instead of all the embodiments.Based on described embodiment of the disclosure, those of ordinary skill in the art are without creating
Property labour under the premise of the every other embodiment that is obtained, belong to the range of disclosure protection.
In order to produce large-sized display panel or touch panel, such as the size of the mask plate of mask plate is also required to therewith
Increase.Currently, exposure machine has the size of mask plate certain limitation, and large-sized mask plate that there is also manufactures is difficult,
The defects of of high cost, daily storage is inconvenient to use, therefore, when manufacturing large-sized display panel or touch panel, generally
It needs large-sized substrate being divided into several regions, and each region is exposed successively using mask plate, last split
Large-sized display panel or touch panel are formed, this process is known as splicing exposure technology.For example, with BOE touch panel
For the G6 of factory is for line, the effective exposure area of mask plate is 1100mm × 752mm, and large touch panel, such as 65
Very little appearance and size is 1460mm × 831mm, and 75 cun of appearance and size is 1687mm × 957mm, is covered since appearance and size exceeds
Effective exposure region of template, it is therefore desirable to carry out multiple exposure, that is, carry out above-mentioned splicing exposure technology, could be formed desired
Pattern.
Fig. 1 diagrammatically illustrates the structure of metal grid electrode.With the fast development of touch panel industry, for transparent
Conductor, such as the demand of indium tin oxide (ITO) are also significantly increased.However, the high price of ITO, it is inefficient can, fragility and low
The shortcomings of conductivity, all forces research staff to be constantly trying to find the electrode material or electrode structure that can substitute ITO.Metal
Grid (i.e. metal mesh) electrode is a kind of possible electrode structure for substituting ITO.As shown in Figure 1, metal grill 10 includes more
Metal line 1, a plurality of metal wire 1 are arranged to latticed.Each metal line 1 has the preset width W more than zeroe, every two
There is predetermined gap S between adjacent metal wire 1e.When using the metal grid electrode as when the touch control electrode of touch panel,
Metal wire has low-down resistance, moreover, most of region (region i.e. where gap) on metal grill is all without appointing
What shading object so that light can pass completely through, to increase light transmittance.
Metal grid electrode can be applied in large touch panel, for use as touch drive electrode and touch-control sensing electricity
At least one of pole.By taking OGS touch panels as an example, as shown in Fig. 2, touch panel 20 may include：Substrate 21；It is set to base
Black matrix 22 on plate 21；It is set on substrate 21 and covers the first coating (overcoat, referred to as OC) of black matrix 22
23；The touch-control sensing electrode 24 being set on the first coating 23；The second coating 25 being set on touch-control sensing electrode 24；
The touch drive electrode 26 being set on the second coating 25；With the third coating 27 being set in touch drive electrode 26.
At least one of touch-control sensing electrode 24 and touch drive electrode 26 may include the metal mesh structure shown in Fig. 1.
It should be noted that herein, coating has been the layer of insulation or protective effect, generally transparent optics material
The bed of material.
In order to form touch-control sensing electrode 24 or touch drive electrode 26 on the base plate (21, patterning processes may be used.Example
Such as, the patterning processes may include metal coating, coating photoresist, using mask plate exposure, development and etching and etc..
In in accordance with an embodiment of the present disclosure, substrate 21 can be large-sized substrate, for example, can be 65 cun of base
Plate, appearance and size are 1460mm × 831mm；For another example can be 75 cun of substrate, appearance and size be 1687mm × 957mm.For
Touch-control sensing electrode 24 is formed on large-sized substrate 21 or touch drive electrode 26 in step of exposure needs to carry out
Above-mentioned splicing exposure technology.
In the following, for including 2 exposures, splicing exposure technology is described in detail.Those skilled in the art
It should be understood that the splicing exposure technology in the embodiment of the present disclosure is not limited to 2 exposures, may include exposing more times, such as 3 times expose
Light, 4 exposures, 6 exposures etc..
In order to form touch-control sensing electrode 24 or touch drive electrode 26 on the base plate (21, and touch-control sensing electrode 24 or
Touch drive electrode 26 has the metal mesh structure shown in Fig. 1.In step of exposure, use and metal mesh structure pair are needed
The mask plate answered, Fig. 3 show a kind of mask plate according to the embodiment of the present disclosure.As shown in figure 3, mask plate 30 includes light shielding part
31 and transmittance section 32.Light shielding part 31 includes multiple shading strips 311, and multiple shading strips 311 are arranged to latticed, each shading strip
311 have preset width Wm.Gap made of multiple shading strips 311 surround forms transmittance section 32.Each two adjacent shading strip
There is preset space length S between 311m.In one example, shading strip 311 can be made of light-proof material (such as metal).?
When being exposed using mask plate 30, light can pass through transmittance section 32, but be stopped by light shielding part 31, to be formed on substrate
Pattern corresponding with mask plate 30.
Substrate 21 is divided into two regions, as shown in figure 4, first area 21A and second area 21B.It is exposed in first time
In photoreduction process, first area 21A is exposed using mask plate 30.It is right using mask plate 30 in second of exposure process
Second area 21B is exposed.By double exposure, complete touch-control sensing electrode 24 or touch-control driving are formed on the base plate (21
The pattern of electrode 26, to meet the demand for producing large-sized display panel or touch panel using the production line of small generation.
Inventor has found, in above-mentioned exposure process, region adjacent with second area 21B first area 21A can be by the
Single exposure and second expose double exposure process effect, this region is properly termed as splicing exposure area, on substrate 21
Exposure area in addition to splicing exposure area is properly termed as region of normal exposure.In order to make it easy to understand, schematically showing in Fig. 4
Go out to splice exposure area 21C.Theoretically, after being exposed by splicing, metal grill 10 shown in FIG. 1 can be formed, and every
One metal line 1 has preset width We, there is between every two adjacent metal wires 1 predetermined gap Se.However, in fact, spelling
The line width for connecing the metal wire 1 formed in the 21C of exposure area is less than preset width We.In this way, causing in finally formed display surface
In plate or touch panel, the light transmittance for splicing exposure area is higher than the light transmittance of region of normal exposure so that splices in display
Exposure area is brighter than region of normal exposure, that is, forms Mu La (mura) phenomenon.
Further analysis finds that it is the contraposition deviation between double exposure process that nurse, which draws phenomenon Producing reason,.Specifically,
Fig. 5 A-5C diagrammatically illustrate partial enlarged view of splicing exposure area during double exposure.As shown in Figure 5A, first
In secondary exposure process, due to the interception of the shading strip 311 of mask plate 30, being formed in splicing exposure area has pre- fixed width
Spend WeThe first metal wire 51.Then, as shown in Figure 5 B, in second of exposure process, it is limited to the positioning accuracy of exposure machine
Etc. factors, the shading strip 311 of mask plate 30 will not reappear the position that is aligned completely shown in Fig. 5 A with the first metal wire 51 and close
System, but certain position deviation δ is will produce, in this way, in second of exposure process, the first metal wire 51 is not by shading strip
311 parts blocked can be exposed.Finally formed first metal wire 51 is as shown in Figure 5 C, since the first metal wire 51 is not hidden
The part of striation 311 is exposed in second of exposure process, leads to the line width W of finally formed first metal wire 51e' be less than
Preset width We, difference between the two is directly proportional to the position deviation between double exposure process.
According to the disclosure exemplary embodiment, a kind of mask plate is provided.As shown in fig. 6, mask plate 60 includes hiding
Light portion 61 and transmittance section 62, wherein light shielding part 61 prevents light from passing through from it, and transmittance section 62 allows light to pass through from it.Shading
Portion 61 includes multiple shading strips, and multiple shading strips are arranged to latticed, the gap formation transmittance section 62 between multiple shading strips.It is more
A shading strip may include the first shading strip 611 ' and the second shading strip 611.First shading strip 611 ' and splicing exposure area pair
It answers, there is the first preset width Wm1.Second shading strip 611 is corresponding with region of normal exposure, has the second preset width Wm2.Example
Such as, the first shading strip 611 ' corresponding with splicing exposure area can be the shading at at least one side edge of mask plate 60
Item.In the illustrated embodiment, the first shading strip corresponding with splicing exposure area 611 ' is positioned at mask plate 60 along first
Shading strip in the both sides of the edge in direction (left and right directions in Fig. 6).
Optionally, the first shading strip 611 ' corresponding with splicing exposure area can be positioned at mask plate 60 along first party
To the both sides of the edge of (left and right directions in Fig. 6) and the shading in the both sides of the edge of (upper and lower directions in Fig. 6) in a second direction
Item.
In this embodiment, the first shading strip 611 ' can be located at at least one side edge of mask plate 60, except the first screening
Except striation 611 ', other shading strips are the second shading strip 611, for example, the second shading strip 611 can be located at mask plate 60
Non- lateral edges at.In conjunction with Fig. 6, mask plate 60 includes 4 lateral edges, in addition to 4 lateral edges, other positions of mask plate 60
Set the non-lateral edges position for being properly termed as mask plate 60.
In this embodiment, the first preset width Wm1More than the second preset width Wm2.For example, the second preset width Wm2It can
With equal to above-mentioned preset width Wm, and the first preset width Wm1More than above-mentioned preset width Wm。
Optionally, Fig. 7 shows the enlarged drawing of the first shading strip and the second shading strip.As shown in fig. 7, the second shading strip
611 externally expanding single edge preset width Wp, form the first shading strip 611 '.Herein, " externally expanding single edge " means the second shading strip
The edge of side is extended out along the direction of the center line far from the second shading strip, for example, the left hand edge of the second shading strip 611 is to left outside
Expand or the right hand edge of the second shading strip 611 extends out to the right.In this way, the first preset width W of the first shading strip 611 'm1It is hidden with second
Second preset width W of striation 611m2Between there are following relationships：
Wm1=Wm2+2Wp；
It is pointed out that externally expanding single edge preset width WpPosition deviation between double exposure process is directly proportional.
Fig. 8 is to schematically show the schematic diagram for executing splicing exposure technology on the base plate (21 using mask plate 60, Fig. 9 A-9C
Diagrammatically illustrate partial enlarged view of splicing exposure area during double exposure.In conjunction with Fig. 8 to Fig. 9 C, exposed in first time
In photoreduction process, first area 21A is exposed using mask plate 60.It is right using mask plate 60 in second of exposure process
Second area 21B is exposed.By double exposure, complete touch-control sensing electrode 24 or touch-control driving are formed on the base plate (21
The pattern of electrode 26.As shown in Figure 9 A, in first time exposure process, due to the shading of the first shading strip 611 ' of mask plate 60
Effect, being formed in splicing exposure area 21C has preset width We' the first metal wire 51, due to the first shading strip 611 '
The first preset width Wm1More than above-mentioned preset width Wm, so the preset width W of the first metal wire 51 formede' be more than
Preset width We.Then, as shown in Figure 9 B, in second of exposure process, though be limited to positioning accuracy of exposure machine etc. because
Element, the first shading strip 611 ' of mask plate 60 and the first metal wire 51 will produce certain position deviation 6, due to the first shading strip
611 ' have the first wider preset width Wm1, the first metal wire 51 is with wider preset width We′.In this way, at second
In exposure process, although the case where partly overlapping there are still the first metal wire 51 and the first shading strip 611 ', by designing,
The width for the lap having between the first wider shading strip 611 ' and the first wider metal wire 51 can be made to be equal to
The width of shading strip in region of normal exposure is equal to the second preset width W of the second shading strip 611m2.Finally formed
As shown in Figure 9 C, the line width of finally formed first metal wire 51 is equal to preset width W to one metal wire 51e.Therefore, by covering
The part shading strip of template carries out Widening Design, can compensate the position deviation between double exposure so that finally formed
In display panel or touch panel, splice the metal wire of exposure area line width be equal to region of normal exposure metal wire line
Width even is eliminated Mu La (mura) phenomenon to mitigate.
Using BOE touch panel factory G6 for line as platform, pass through and change multigroup externally expanding single edge preset width Wp, inventor
Multigroup experiment is carried out, as shown in the table.
1 externally expanding single edge preset width W of tablepWith the linewidth difference relation table of metal wire
According to the experimental data of table 1, as externally expanding single edge preset width WpWhen being 10 μm, finally formed region of normal exposure
Metal wire line width and splice exposure area metal wire line width between difference be less than or equal to 1.3 μm, at this point, display when
Nurse draw phenomenon be mitigated.With externally expanding single edge preset width WpGradual increase, finally formed region of normal exposure
Difference between the line width of metal wire and the line width of the metal wire of splicing exposure area tapers into.When the pre- fixed width of externally expanding single edge
Spend WpWhen being 16 μm, the line width of the line width and the metal wire of splicing exposure area of the metal wire of finally formed region of normal exposure
Between difference be less than or equal to 0.5 μm, at this point, in finally formed display panel or touch panel, splice exposure area
Light transmittance is consistent with the light transmittance substrate of region of normal exposure so that splicing exposure area and region of normal exposure in display
Brightness is almost the same, that is, essentially eliminates nurse and draws phenomenon.That is, working as externally expanding single edge preset width WpWhen being 16 μm or more,
In display, the brightness of splicing exposure area and region of normal exposure is substantially or entirely consistent, and phenomenon is drawn to eliminate nurse.
Referring back to Fig. 6, the second shading strip 611 of mask plate 60 is corresponding with region of normal exposure, has the second pre- fixed width
Spend Wm2.In accordance with an embodiment of the present disclosure, second preset width Wm2It can be about 6 μm.In this way, being carried out using mask plate 60
When exposure technology is to form the touch drive electrode or touch-control sensing electrode with metal mesh structure, the metal grill of formation
The line width of metal wire can be less than or equal to 5 μm.Inventor has found, the metal grid electrode wide by forming such filament, can be with
Promote the shadow effect that disappears of touch panel.
Optionally, in mask plate 60, spacing between each two adjacent shading strip 611,611 ' can be 100~
300 μm, it is alternatively possible to be 145~255 μm.When the spacing between each two adjacent shading strip 611,611 ' be 145~
At 255 μm, technique is being exposed using mask plate 60 to form the touch drive electrode or touch-control with metal mesh structure
When induction electrode, the spacing in the metal grill of formation between each two adjacent metal wire can be in 150~250 μ ms
It is interior.The metal grid electrode of wide by formation filament and small spacing, can further promote the shadow effect that disappears of touch panel.
For the relationship of line width and spacing and the shadow effect that disappears, inventor has carried out contrast experiment.The metal of first group of experiment
Grid is as shown in Figure 10 A, has 8 μm of line width and 420 μm of spacing.The metal grill of second group of experiment is as shown in Figure 10 B,
It has 5 μm of line width and 180 μm of spacing.The results are shown in table below by contrast experiment.
The relation table of 2 line width of table and spacing and the shadow effect that disappears
| Line width | Spacing | Disappear shadow effect |
| 8μm | 420μm | Substantially visible |
| 5μm | 180μm | It is invisible |
According to the experimental data of table 2, when metal grill has 8 μm of line width and 420 μm of spacing, the gold of metal grill
It is substantially visible to belong to line naked eyes；When metal grill has 5 μm of line width and 180 μm of spacing, the metal wire naked eyes of metal grill
It is invisible.
Further, it is formed in the technique of large-sized touch panel using splicing exposure traditional, general use is swashed
Light alignment mode comes alignment mask plate and substrate.However, inventor the study found that laser positioning mode presence ± 150 μm pair
Position error, can lead to the metal grill of the metal grill of touch drive electrode and touch-control sensing electrode in the touch panel produced
Relative position it is unstable, to generate moire fringes.
In embodiment of the disclosure, it in splicing exposure technology, is covered by the way of label (mark) contraposition to be aligned
Template and substrate.Referring back to Fig. 6, multiple first alignment marks 64 are provided on mask plate 60, for example, the first alignment mark
64 can be registration holes.Referring back to Fig. 4, it is provided with multiple second alignment marks 214 on the base plate (21, for example, the second contraposition
Label 214 can be cross alignment mark.
1A and Figure 11 B referring to Fig.1 are carried out still by taking 2 exposures as an example to carrying out splicing exposure by the way of being aligned using label
More detailed description.
In first time exposure process, at least side of mask plate 60 is provided with multiple first alignment marks 64, in base
At least one side edge of the first area 21A of plate 21 is provided with multiple second alignment marks 214, and substrate 21 is placed in mask plate 60
Lower section so that the first alignment mark 64 is respectively aligned to corresponding second alignment mark 214, with alignment mask plate 60 and substrate 21
The first exposure area, then, execute for the first time expose.It is then, substrate 21 is mobile towards a predetermined direction (i.e. stitching direction),
Make the more of at least one side edge setting of the second area 21B of multiple first alignment marks 64 and substrate 21 on mask plate 60
A second alignment mark 214 is respectively aligned to, and with the second exposure area of alignment mask plate 60 and substrate 21, then, executes second
Secondary exposure.
By using label alignment mode so that the bit errors between mask plate and substrate are at ± 3 μm, therefore, production
The metal grill of touch drive electrode and the relative position of the metal grill of touch-control sensing electrode are more steady in the touch panel gone out
It is fixed, it is possible to prevente effectively from moire fringes.
In the following, by taking BOE touch panel factory G6 is for line as an example, detailed description label alignment mode is in production large scale
Application in touch panel.G6 is for the region (region that figure bend indicates that alignment mark can be arranged on mask plate in line
1202) it is relatively-stationary, the distance L that can place the region distance mask plate edge of alignment mark is about 858mm, such as Figure 12 institutes
Show.In view of the limiting factors such as placement of camera on the size of alignment mark itself, exposure bench, in addition, in actual processing
In the process, the edge of mask plate generally will not be just aligned with the edge of substrate, so, when the short side dimension of substrate is less than
When 835mm, that is, when can place between the distance L and the short side dimension of substrate at region distance mask plate edge of alignment mark
When difference is more than 20mm, long side direction that can be by the short side of substrate along mask plate is placed, that is, may not need on short side direction
Splicing exposure.
In this embodiment, substrate has long side and a short side, and mask plate 120 has a maximum contraposition distance L, maximum contraposition away from
It is the maximum distance that the side of mask plate 120 with a distance from the position 1202 of alignment mark can be set on mask plate 120 from L, for example,
In fig. 12, distance of 4 positions that alignment mark can be set 1202 apart from 4 sides of mask plate 120 is calculated separately, so
After take its maximum value, as maximum contraposition distance L.Then, in splicing exposure technology, the short side for comparing substrate is aligned with maximum
Distance L.When the maximum difference for aligning length and the maximum length for aligning distance L and short side that distance L is more than short side is more than in advance
When determining threshold value (such as 20mm), the short side direction along substrate is without executing splicing exposure technology, it is only necessary to along the long side direction of substrate
Execution includes the splicing exposure technology of multiple exposure.When maximum contraposition distance L is less than the length of short side or maximum contraposition distance L
It is equal along the short side direction of substrate and the long side direction of substrate when being less than predetermined threshold (such as 20mm) with the difference of the length of short side
It needs to execute splicing exposure technology.
For example, the appearance and size of 65 cun of touch panels is 1460mm × 831mm, at this point it is possible to by 65 cun of touch panel
Substrate along mask plate 120 long side place, may not need on short side direction splicing exposure, in the long side direction carry out 3 times
Exposure, the mode of label contraposition may be used in this 3 times exposures, as shown in figure 13, with the shape on the substrate of 65 cun of touch panels
At the pattern of needs.
For example, the appearance and size of 75 cun of touch panels is 1687mm × 957mm, short side dimension 957mm is more than 835mm, this
When, the substrate of touch panel is also required to carry out splicing exposure along short side direction.Specifically, it needs to carry out 2 exposures along short side direction
Light needs to carry out 3 exposures along long side direction, that is, need to carry out 6 exposures altogether, on the substrate of 75 cun of touch panels
Form the pattern needed.The mode of label contraposition also may be used in this 6 times exposures, as shown in figure 14.
5A referring to Fig.1 shows the 65 cun of touch panels produced using laser positioning mode, it can be seen that：At 65 cun
Occurs apparent moire fringes phenomenon in touch panel.5B referring to Fig.1 shows 65 cun produced using label alignment mode
Touch panel, it can be seen that：Do not occur moire fringes phenomenon in 65 cun of touch panels.
Figure 16 shows the method flow diagram of production OGS touch panels, is provided the process employs the embodiment of the present disclosure
Splice exposure method.In the following, in conjunction with Figure 16 and Fig. 2, the method for detailed description production OGS touch panels.
In step S1601, black matrix 22 is formed on the base plate (21.For example, may be used the first patterning processes formed it is black
The pattern of matrix 22, first patterning processes may include gluing, exposed and developed step.
In step S1602, the first coating 23 is formed on the base plate (21, and the first coating 23 covers black matrix 22.Example
Such as, the pattern that the second patterning processes form the first coating 23 may be used, which may include gluing, exposure
And development step.
In step S1603, touch-control sensing electrode 24 is formed on the first coating 23.Touch-control sensing electrode 24 can have
There is metal mesh structure.For example, the pattern that third patterning processes form touch-control sensing electrode 24 may be used, the third composition work
Skill may include metal coating, coating photoresist, exposure, development and etch step.For example, it is therein exposure may be used it is above-mentioned
Splicing exposure.
In step S1604, the second coating 25 is formed on touch-control sensing electrode 24.For example, the 4th structure may be used
Figure technique forms the pattern of the second coating 25, and the 4th patterning processes may include gluing, exposed and developed step.
In step S1605, touch drive electrode 26 is formed on the second coating 25.Touch drive electrode 26 can have
There is metal mesh structure.For example, the pattern that the 5th patterning processes form touch drive electrode 26 may be used, the 5th composition work
Skill can be identical as third patterning processes, including metal coating, coating photoresist, exposure, development and etch step.For example, its
In exposure above-mentioned splicing exposure may be used.
In step S1606, third coating 27 is formed in touch drive electrode 26.For example, the 6th structure may be used
Figure technique forms the pattern of third coating 27, and the 6th patterning processes may include gluing, exposed and developed step.
By taking GG touch panels as an example, as shown in figure 17, touch panel 170 may include：First substrate 171；It is set to
Touch drive electrode 172 on one substrate 171；The first coating (overcoat, the letter being set in touch drive electrode 172
Referred to as OC) 173；The touch-control sensing electrode 174 being set on the first coating 173；Be set on touch-control sensing electrode 174
Two coatings 175；The bonding material layer 176 being set on the second coating 175；Be set on bonding material layer 176
Two substrates 177.At least one of touch-control sensing electrode 174 and touch drive electrode 172 may include metal mesh structure.The
One substrate 171 and second substrate 177 can be glass substrate.
Figure 18 shows the method flow diagram of production GG touch panels, and the process employs the spellings that the embodiment of the present disclosure provides
Connect exposure technology.In the following, in conjunction with Figure 17 and Figure 18, the method for detailed description production GG touch panels.
In step S1801, touch drive electrode 172 is formed on first substrate 171.Touch drive electrode 172 can be with
With metal mesh structure.For example, the pattern that the first patterning processes form touch drive electrode 172 may be used, first structure
Figure technique may include metal coating, coating photoresist, exposure, development and etch step.For example, exposure therein may be used
Above-mentioned splicing exposure technology.
In step S1802, the first coating 173 is formed in touch drive electrode 172.For example, may be used second
Patterning processes form the pattern of the first coating 173, which may include gluing, exposed and developed step.
In step S1803, touch-control sensing electrode 174 is formed on the first coating 173.Touch-control sensing electrode 174 can
With with metal mesh structure.For example, the pattern that third patterning processes form touch-control sensing electrode 174 may be used, the third
Patterning processes may include metal coating, coating photoresist, exposure, development and etch step.For example, exposure therein can adopt
With above-mentioned splicing exposure technology.
In step S1804, the second coating 175 is formed on touch-control sensing electrode 174.For example, may be used the 4th
Patterning processes form the pattern of the second coating 175, and the 4th patterning processes may include gluing, exposed and developed step.
In step S1805, in 175 adhesive material layer 176 of the second coating.
In step S1806, by bonding material layer 176, second substrate 177 is bonded on first substrate 171.
For embodiment of the disclosure, it is also necessary to explanation, in the absence of conflict, embodiment of the disclosure and reality
The feature in example is applied to can be combined with each other to obtain new embodiment.
Finally it should be noted that above example is only to illustrate the technical solution of the disclosure and it is unrestricted, although reference
The disclosure is described in detail in preferred embodiment, it will be understood by those of ordinary skill in the art that, it can be to the disclosure
Technical solution is modified or equivalent replacement, without departing from the spirit and scope of disclosed technique scheme.
Claims (16)
1. a kind of mask plate, which is characterized in that including：Multiple shading strips, the multiple shading strip is configured to blocking light, described
Multiple shading strips, which surround the gap to be formed, allows light to pass through,
Wherein, the multiple shading strip is arranged to latticed, and the multiple shading strip includes the first shading strip and the second shading strip,
First shading strip is located at at least one lateral edges of the mask plate, and the width of first shading strip is more than described the
The width of two shading strips.
2. mask plate according to claim 1, which is characterized in that the mask plate is used to include the spelling exposed at least twice
It connects in exposure technology, there is first shading strip the first width, second shading strip to have the second width, and described first is wide
The position deviation of mask plate between double exposing in difference between degree and second width and splicing exposure technology is at just
Than.
3. mask plate according to claim 2, which is characterized in that first width and second width satisfaction are as follows
Relational expression：
Wm1=Wm2+2Wp,
Wherein, Wm1For first width, Wm2For second width, WpFor width difference and it is more than zero.
4. mask plate according to claim 3, which is characterized in that the width difference WpMore than or equal to 16 μm.
5. mask plate according to claim 2, which is characterized in that spell on the edge that first shading strip is located at the mask plate
It connects at two lateral edges in direction, alternatively, first shading strip is located at four lateral edges of the mask plate.
6. mask plate according to claim 1, which is characterized in that the width of second shading strip is less than or equal to 6 μm.
7. mask plate according to claim 1, which is characterized in that the spacing between two adjacent second shading strips
In the range of 100~300 μm.
8. mask plate according to claim 1, which is characterized in that the mask plate further includes at least one alignment mark.
9. a kind of exposure method, which is characterized in that the exposure method is existed using the mask plate described in any one of claim 1-8
Splicing exposure technology is executed on substrate, the substrate includes the first exposure area and the second exposure area, which includes
Following steps：
It is directed at the first exposure area of the mask plate and the substrate, is exposed for the first time with executing；
Make the mask plate and the substrate relative motion；With
It is directed at the second exposure area of the mask plate and the substrate, is exposed with executing second.
10. exposure method according to claim 9, which is characterized in that exposure includes for the first time for the execution：
Using the first shading strip of the mask plate, the first pattern is formed in first exposure area；With
Using the second shading strip of the mask plate, the second pattern is formed in first exposure area,
Wherein, the width of first pattern is more than the width of second pattern.
11. exposure method according to claim 10, which is characterized in that in second exposes, the of the mask plate
Orthographic projection of one shading strip on substrate partly overlaps with orthographic projection of first pattern on substrate, the width of lap
Equal to the width of second shading strip.
12. according to the exposure method described in any one of claim 9-11, which is characterized in that be aligned the mask plate with it is described
First exposure area of substrate includes to execute first time exposure technology：
First alignment mark is set on the mask plate；
Second alignment mark is set on the substrate；With
It is directed at first alignment mark and second alignment mark, is exposed with the first of the substrate with being directed at the mask plate
Light region.
13. exposure method according to claim 12, which is characterized in that be directed at the second of the mask plate and the substrate
Exposure area includes to execute second of exposure technology：
Third alignment mark is set on the substrate；With
It is directed at first alignment mark and the third alignment mark, is exposed with the second of the substrate with being directed at the mask plate
Light region.
14. exposure method according to claim 12, which is characterized in that the substrate has long side and short side, described to cover
Template has maximum contraposition distance, and the maximum contraposition distance is that first alignment mark can be arranged on the mask plate
The maximum distance of the side of mask plate described in positional distance, the exposure method further include：
Compare the short side of the substrate and the maximum contraposition distance；With
When the maximum contraposition distance is more than the length of the length of the short side and maximum the contraposition distance and the short side
Difference when being more than predetermined threshold, only execute first time exposure along the long side direction of the substrate and described second expose
Light.
15. a kind of touch panel, including：
Substrate；
The touch drive electrode being set on the substrate；With
The touch-control sensing electrode being set on the substrate,
It is characterized in that, the touch drive electrode and/or the touch-control sensing electrode have metal mesh structure, and it is described
The exposure method manufacture of touch drive electrode and/or the touch-control sensing electrode according to any one of claim 9-14.
16. touch panel according to claim 15, which is characterized in that the metal mesh structure includes in grid arrangement
A plurality of metal wire, the line width of the metal wire is less than or equal to 5 μm, and the spacing between each two adjacent metal wire exists
In 150~250 μ ms.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810642760.0A CN108761995A (en) | 2018-06-21 | 2018-06-21 | Mask plate, exposure method and touch panel |
| PCT/CN2018/124326 WO2019242280A1 (en) | 2018-06-21 | 2018-12-27 | Mask plate, exposure method, and touch panel |
| US16/703,682 US11169438B2 (en) | 2018-06-21 | 2019-12-04 | Mask, exposure method and touch display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810642760.0A CN108761995A (en) | 2018-06-21 | 2018-06-21 | Mask plate, exposure method and touch panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108761995A true CN108761995A (en) | 2018-11-06 |
Family
ID=63979675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810642760.0A Pending CN108761995A (en) | 2018-06-21 | 2018-06-21 | Mask plate, exposure method and touch panel |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US11169438B2 (en) |
| CN (1) | CN108761995A (en) |
| WO (1) | WO2019242280A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019242280A1 (en) * | 2018-06-21 | 2019-12-26 | 京东方科技集团股份有限公司 | Mask plate, exposure method, and touch panel |
| CN110687757A (en) * | 2019-10-10 | 2020-01-14 | 深圳市华星光电技术有限公司 | Splicing exposure system and splicing exposure method adopting same |
| CN111443566A (en) * | 2020-05-08 | 2020-07-24 | 京东方科技集团股份有限公司 | Mask plate |
| WO2021238342A1 (en) * | 2020-05-28 | 2021-12-02 | 京东方科技集团股份有限公司 | Mask, exposure method and touch panel |
| WO2022134020A1 (en) * | 2020-12-25 | 2022-06-30 | 京东方科技集团股份有限公司 | Manufacturing method for touch substrate, touch substrate, substrate, and touch device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11215923B1 (en) * | 2020-08-03 | 2022-01-04 | Young Fast Optoelectronics Co., Ltd. | Method for manufacturing large-scale touch sensing pattern |
| JP6993479B1 (en) | 2020-08-17 | 2022-01-13 | 洋華光電股▲ふん▼有限公司 | Manufacturing method of large touch sensing pattern |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030198878A1 (en) * | 2002-04-23 | 2003-10-23 | Fujitsu Limited | Method of manufacturing semiconductor device |
| JP2007193243A (en) * | 2006-01-23 | 2007-08-02 | Sony Corp | Exposure mask, exposure method, method for manufacturing exposure mask, three-dimensional device, and method for manufacturing three-dimensional device |
| CN102967992A (en) * | 2012-11-15 | 2013-03-13 | 京东方科技集团股份有限公司 | Array substrate, mask plate and manufacturings method thereof, as well as display device |
| CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
| CN106200254A (en) * | 2016-07-11 | 2016-12-07 | 京东方科技集团股份有限公司 | Mask plate and mask exposure system, splicing exposure method, substrate |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8717332B2 (en) * | 2008-07-31 | 2014-05-06 | Gunze Limited | Planar element, and touch switch |
| CN104570611B (en) * | 2013-10-21 | 2016-06-08 | 合肥京东方光电科技有限公司 | Mask plate and improvement splicing exposure nurse thereof draw the method for phenomenon |
| KR102290753B1 (en) * | 2014-09-19 | 2021-08-19 | 삼성디스플레이 주식회사 | Method of forming a pattern and method of manufacturing a display panel using a method of forming a pattern |
| WO2016084232A1 (en) * | 2014-11-28 | 2016-06-02 | 堺ディスプレイプロダクト株式会社 | Liquid crystal display panel, liquid crystal display device, and method for manufacturing liquid crystal display panel |
| CN104808451B (en) * | 2015-05-15 | 2017-07-18 | 合肥京东方光电科技有限公司 | A kind of contraposition exposure method |
| KR101992915B1 (en) * | 2016-09-30 | 2019-06-25 | 엘지디스플레이 주식회사 | Organic light emitting display with touch sensor and fabricating method thereof |
| CN107219720B (en) * | 2017-05-27 | 2020-12-29 | 厦门天马微电子有限公司 | Mask plate, exposure device and film patterning manufacturing method |
| CN108761995A (en) * | 2018-06-21 | 2018-11-06 | 京东方科技集团股份有限公司 | Mask plate, exposure method and touch panel |
-
2018
- 2018-06-21 CN CN201810642760.0A patent/CN108761995A/en active Pending
- 2018-12-27 WO PCT/CN2018/124326 patent/WO2019242280A1/en active Application Filing
-
2019
- 2019-12-04 US US16/703,682 patent/US11169438B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030198878A1 (en) * | 2002-04-23 | 2003-10-23 | Fujitsu Limited | Method of manufacturing semiconductor device |
| JP2007193243A (en) * | 2006-01-23 | 2007-08-02 | Sony Corp | Exposure mask, exposure method, method for manufacturing exposure mask, three-dimensional device, and method for manufacturing three-dimensional device |
| CN102967992A (en) * | 2012-11-15 | 2013-03-13 | 京东方科技集团股份有限公司 | Array substrate, mask plate and manufacturings method thereof, as well as display device |
| CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
| CN106200254A (en) * | 2016-07-11 | 2016-12-07 | 京东方科技集团股份有限公司 | Mask plate and mask exposure system, splicing exposure method, substrate |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019242280A1 (en) * | 2018-06-21 | 2019-12-26 | 京东方科技集团股份有限公司 | Mask plate, exposure method, and touch panel |
| US11169438B2 (en) | 2018-06-21 | 2021-11-09 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Mask, exposure method and touch display panel |
| CN110687757A (en) * | 2019-10-10 | 2020-01-14 | 深圳市华星光电技术有限公司 | Splicing exposure system and splicing exposure method adopting same |
| WO2021068328A1 (en) * | 2019-10-10 | 2021-04-15 | Tcl华星光电技术有限公司 | Spliced exposure system and spliced exposure method using same |
| CN111443566A (en) * | 2020-05-08 | 2020-07-24 | 京东方科技集团股份有限公司 | Mask plate |
| WO2021223569A1 (en) * | 2020-05-08 | 2021-11-11 | 京东方科技集团股份有限公司 | Mask plate |
| WO2021238342A1 (en) * | 2020-05-28 | 2021-12-02 | 京东方科技集团股份有限公司 | Mask, exposure method and touch panel |
| WO2021237552A1 (en) * | 2020-05-28 | 2021-12-02 | 京东方科技集团股份有限公司 | Mask, exposure method and touch panel |
| CN114127631A (en) * | 2020-05-28 | 2022-03-01 | 京东方科技集团股份有限公司 | Mask, exposure method and touch panel |
| US12050397B2 (en) | 2020-05-28 | 2024-07-30 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Mask, exposure method and touch panel |
| WO2022134020A1 (en) * | 2020-12-25 | 2022-06-30 | 京东方科技集团股份有限公司 | Manufacturing method for touch substrate, touch substrate, substrate, and touch device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20200103750A1 (en) | 2020-04-02 |
| WO2019242280A1 (en) | 2019-12-26 |
| US11169438B2 (en) | 2021-11-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108761995A (en) | Mask plate, exposure method and touch panel | |
| CN104267533B (en) | The preparation method of curved surface liquid crystal panel | |
| JP5607078B2 (en) | Liquid crystal display device and manufacturing method thereof | |
| WO2018000949A1 (en) | Mask plate and fabricating method therefor | |
| CN103744214B (en) | A kind of exposure method of the glass substrate of liquid crystal display | |
| JP6985507B2 (en) | Array board, manufacturing method of array board and liquid crystal display panel | |
| US10082701B2 (en) | Liquid crystal display panel and manufacturing method therefor, and display device | |
| CN106200254B (en) | Mask plate and mask exposure system, splicing exposure method, substrate | |
| CN104977745B (en) | Substrate for liquid crystal display panel and liquid crystal display panel cutting method | |
| CN109884830A (en) | Array substrate and preparation method thereof, display device, mask plate | |
| CN110262108A (en) | Display panel and display device | |
| US10345650B2 (en) | Liquid crystal display device, and motherboard of liquid crystal display panel and method for manufacturing the same | |
| CN103034354B (en) | Touch display device and forming method thereof | |
| CN104460150A (en) | Array substrate, liquid crystal display panel and manufacturing method of array substrate | |
| CN105630233B (en) | Touch control display apparatus and preparation method thereof | |
| CN111625143B (en) | Touch substrate and manufacturing method thereof | |
| CN101183213A (en) | Photo mask and manufacturing method of thin-film transistor substrates | |
| CN109376714A (en) | A kind of fingerprint recognition mould group and preparation method thereof | |
| CN108196421A (en) | Gray level mask plate production method | |
| US20160041316A1 (en) | Display substrate and manufacturing method thereof, and display apparatus | |
| CN210573180U (en) | Mask plate | |
| CN105242445A (en) | A manufacture method of a liquid crystal display panel and a liquid crystal display panel | |
| WO2015188539A1 (en) | Grating base plate and manufacturing method therefor, and display device | |
| CN105807522A (en) | Array substrate, production method thereof and display panel | |
| CN107861299A (en) | Display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181106 |