CN105242445A - A manufacture method of a liquid crystal display panel and a liquid crystal display panel - Google Patents
A manufacture method of a liquid crystal display panel and a liquid crystal display panel Download PDFInfo
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- CN105242445A CN105242445A CN201510727490.XA CN201510727490A CN105242445A CN 105242445 A CN105242445 A CN 105242445A CN 201510727490 A CN201510727490 A CN 201510727490A CN 105242445 A CN105242445 A CN 105242445A
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- wall
- substrate
- display panels
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The invention provides a manufacture method of a liquid crystal display panel and a liquid crystal display panel. The methods comprises the steps of coating a first substrate with a black matrix layer with a certain thickness; treating the part, which is located at the edge of the first substrate, of the black matrix layer to form a black matrix barricade with a trench at the edge of the first substrate. In the manufacture method of a liquid crystal display panel, the black matrix barricade is directly formed from the black matrix layer, namely, the black matrix layer not only is used for shading but also serves as an isolation barricade. Therefore, the manufacture procedure for manufacturing a barricade part additionally in the prior art is reduced and the production efficiency is greatly improved.
Description
Technical field
The invention belongs to technical field of liquid crystal display, be specifically related to a kind of method for making of display panels and a kind of display panels.
Background technology
In TFT-LCD (ThinFilmTransistorLiquidCrystalDisplay) field, usually one deck PI layer can be coated with to form tilt angle on color membrane substrates and array base palte, this PI layer is used for that liquid crystal is had and fixedly swings to, thus is conducive to liquid crystal display.
But; because frame glue can be coated on the edge of color membrane substrates usually; and conversion layer is also close to frame glue; therefore the coating of the PI layer at color membrane substrates edge can not exceed the position of frame glue; namely the edge of PI layer must between the edge inside viewing area and frame glue; otherwise there will be frame glue to come off, cause display panels to show abnormal.In the prior art, usually barricade parts can be set at the edge of PI layer and exceed frame glue edge to prevent PI liquid.And current barricade parts are generally formed by one or several roads barricade, the height of barricade parts is more than 10 times of PI layer thickness.
Existing barricade parts can make the wall shape of protrusion type usually; PI liquid can be subject to a larger reacting force when flowing through barricade parts; PI liquid is refluxed and is deposited in the adjacent edges of color membrane substrates viewing area; cause the thickness of edge of display area PI layer to increase, affect the picture display of display panels.
For above-mentioned technology Problems existing, wish the method for making of seeking a kind of display panels in the art, the method can be used for making a kind of barricade parts and prevents PI liquid from refluxing better and be deposited in the adjacent edges of color membrane substrates viewing area, thus improve the picture display effect of display panels further, to solve weak point of the prior art.
Summary of the invention
In order to improve the picture display effect of display panels further, the invention provides a kind of method for making of display panels and a kind of display panels.
According to the method for making of a kind of display panels provided by the invention, comprising:
Apply certain thickness black matrix layer on the first substrate;
The part being positioned at the edge of first substrate of black matrix layer is processed, to form the fluted black matric wall of tool in first substrate edge.
In the method for making of display panels provided by the invention, first certain thickness black matrix layer is applied on the first substrate, open channels process is carried out subsequently to the part being positioned at the edge of first substrate of black matrix layer, its groove formed is for holding the PI liquid flowing through black matric wall, namely when PI flow liquid is through black matric wall, PI liquid can be gathered in groove, and can not be deposited in the edge of viewing area.Different from the barricade parts additionally arranged in black matrix layer in prior art, in the method for making of display panels of the present invention, black matric wall is directly formed by black matrix layer, namely black matrix layer achieves the function of shading and isolation barricade simultaneously, because this reducing the extra processing procedure making barricade parts in prior art, greatly increase production efficiency.
In some embodiments, the groove of black matric wall is formed by multiple protuberance and the recess between adjacent projection.Each protuberance and recess complement each other to form for holding PI liquid, thus avoid the PI liquid flowing through each protuberance and recess reflux and be deposited near viewing area, thus while the production yield improving product, be conducive to the image display quality improving display panels.
In some embodiments, black matric wall is configured to striated by the protuberance of black matric wall and recess.Pass through this set, when the acting force of PI liquid to black matric wall is larger, have relatively large PI liquid cross the protuberance of black matric wall and enter recess, now each recess can realize the quick shunting to the PI liquid crossing each protuberance, each protuberance can stop the PI liquid after shunting simultaneously, thus prevents PI liquid to be back to viewing area.
In some embodiments, black matric wall is configured to latticed by the protuberance of black matric wall and recess.This setting can realize the further acceleration of black matric wall to the PI liquid crossing it and shunt, thus prevents PI liquid to be back to viewing area further.
In some embodiments, the making step of black matric wall comprises:
Black matrix layer applies photoresist layer;
The corresponding light shield of half exposure technique is adopted to expose to obtain the mask pattern of required black matric wall to photoresist layer;
Mask pattern on photoresist layer is developed;
Continue to be etched with photoresist layer to obtain required black matric wall.
Photoresist layer in the program can adopt positivity photoresistance, utilizes half exposure technique, and by corresponding light shield, the positivity photoresistance of full transmission region does not react with light, all stays; Positivity photoresistance and the light part in semi-transparent region react, and leave a part, and the positivity photoresistance of non-transmission region all reacts with light and disappears; The thickness of black matric wall each several part is controlled by controlling exposure.
It should be noted that, black matric wall is fully passed over for preventing PI liquid, the thickness deviating from the protuberance of the side of viewing area of black matric wall can be designed to the thickness higher than other protuberance, the thickness of such as each protuberance is arranged to successively decrease successively on the direction of viewing area on edge.
In some embodiments, etching method adopts the method for ion beam milling.Energy by controlling ion beam in the program controls the degree of depth etched, and subsequently, uses corresponding acidic liquid removal photoresist can complete the making of black matric wall.
In some embodiments, also comprise and the part being positioned at other regions of first substrate of black matrix layer is removed, with the thickness being positioned at other regions of first substrate making the thickness being positioned at the part of the edge of first substrate of black matrix layer be greater than black matrix layer.The program is greater than the thickness being positioned at other regions of first substrate of black matrix layer for the thickness of the part making the edge being positioned at first substrate, thus when spraying PI liquid, the black matric wall being positioned at the edge of first substrate can realize barrier effect better.
In some embodiments, be also included on each protuberance and continue to form certain thickness supporting layer.This supporting layer can be used for the height improving black matric wall protuberance on the one hand, thus makes black matric wall have choked flow function better, can be used on the other hand playing a supportive role between two substrates to display panels.
According to a kind of display panels provided by the invention, made by the method for making of above-mentioned display panels.It comprises first substrate, and the marginal position of first substrate is provided with the fluted black matric wall of tool.Because PI liquid can not be deposited in the edge of viewing area in display panels of the present invention, therefore it can realize the display of better picture.
In some embodiments, display panels also comprises the second substrate be oppositely arranged with first substrate, and black matric wall does not contact with second substrate.This black matric wall is mainly used in blocking PI liquid, blocks act on as long as therefore reach it.
Compared with prior art, the method for making of display panels of the present invention is also more conducive to the image display quality improving display panels while improve the production efficiency of display panels.
Accompanying drawing explanation
Also will be described in more detail the present invention with reference to accompanying drawing based on embodiment hereinafter.Wherein:
Fig. 1 is the Making programme figure of the method for making according to display panels of the present invention;
Fig. 2 is the schematic top plan view of the structure according to the first substrate in the method for making of display panels of the present invention;
Fig. 3 is the Making programme figure of the method for making of black matric wall;
Fig. 4 is the schematic diagram applying photoresist layer in black matrix layer;
Fig. 5 is the schematic diagram exposed photoresist layer;
Fig. 6 continues to etch to photoresist layer the schematic diagram obtaining black matric wall;
Fig. 7 is the schematic diagram forming supporting layer on black matric wall;
Fig. 8 is the schematic top plan view of the structure of the first embodiment of black matric wall according to display panels of the present invention;
Fig. 9 is according to the schematic top plan view of the structure of the second embodiment of the black matric wall of display panels of the present invention;
Figure 10 is the structural representation according to display panels of the present invention.
In the accompanying drawings, identical parts use identical Reference numeral.Accompanying drawing is not according to the scale of reality.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
Details described here is exemplary, and is only used for carrying out illustrative discussion to embodiments of the invention, and their existence is to provide the most useful and the most intelligible description be considered to principle of the present invention and concept aspect.About this point, here do not attempt introduction CONSTRUCTED SPECIFICATION of the present invention being exceeded to basic comprehension degree required for the present invention, those skilled in the art can be expressly understood by instructions and accompanying drawing thereof and implement several form of the present invention how in practice.
Fig. 1 shows the Making programme figure of the method for making according to a kind of display panels 100 provided by the invention.As shown in Figure 1, composition graphs 2, Fig. 4 to Fig. 6, the method comprises the following steps:
Step S100: apply certain thickness black matrix layer 11 on first substrate 10;
Step S200: as shown in Figure 2, the part being positioned at the edge of first substrate 10 of black matrix layer 11 is processed, to form the fluted black matric wall 12 of tool in first substrate 10 edge, this marginal position as shown is the region beyond removing viewing area C.
In the method for making of display panels 100 provided by the invention, first on first substrate 10, certain thickness black matrix layer 11 is applied, open channels process is carried out subsequently to the part being positioned at the edge of first substrate 10 of black matrix layer 11, its groove formed is for holding the PI liquid flowing through black matric wall 12, namely when PI flow liquid is through black matric wall 12, PI liquid can be gathered in groove, and can not be deposited in the edge of viewing area C.Different from the barricade parts additionally arranged in black matrix layer in prior art, in the method for making of display panels 100 of the present invention, black matric wall 12 is directly formed by black matrix layer 11, namely black matrix layer 11 achieves the function of shading and isolation barricade simultaneously, because this reducing the extra processing procedure making barricade parts in prior art, greatly increase production efficiency.
Fig. 3 shows the Making programme figure of black matric wall 12, composition graphs 4 to Fig. 6, and the method comprises the following steps:
Step S201: as shown in Figure 4, black matrix layer 11 applies photoresist layer 111;
Step S202: as shown in Figure 5, adopts corresponding light shield 50 pairs of photoresist layers 111 of half exposure technique to expose to obtain the mask pattern of required black matric wall 12;
Step S203: the mask pattern on photoresist layer 111 is developed;
Step S204: as shown in Figure 6, continues to be etched with photoresist layer 111 to obtain required black matric wall 12.
Photoresist layer 111 in the program can adopt positivity photoresistance, utilizes half exposure technique, and light source 60 is by corresponding light shield 50, and the positivity photoresistance of full transmission region does not react with light, all stays; Positivity photoresistance and the light part in semi-transparent region react, and leave a part, and the positivity photoresistance of non-transmission region all reacts with light and disappears.The thickness of black matric wall 12 each several part is controlled by controlling exposure.
It should be noted that, black matric wall 12 is fully passed over for preventing PI liquid, the thickness deviating from the protuberance of the side of viewing area of black matric wall 12 can be designed to the thickness higher than other protuberance, the thickness of such as each protuberance is arranged to successively decrease successively on the direction of viewing area on edge.Such as, in the embodiment illustrated in fig. 6, the thickness of protruding 122 is greater than the thickness of projection 121.
In step S204, etching method preferably adopts the method for ion beam milling.Energy by controlling ion beam in the program controls the degree of depth etched, and subsequently, uses corresponding acidic liquid removal photoresist can complete the making of black matric wall 12.
Preferably, in the embodiment as shown in figure 7, the method for making of display panels 100 is also included on each protuberance and continues to form certain thickness supporting layer 13.Such as on protuberance 122, form supporting layer 13.This supporting layer 13 1 aspect can be used for the height of the protuberance 122 improving black matric wall 12, thus make black matric wall 12 have choked flow function better, can be used on the other hand playing a supportive role between the first substrate 10 of display panels 100 and second substrate 20.
According to the present invention, the method for making of display panels 100 also comprises to be removed the part being positioned at other regions of first substrate 10 of black matrix layer, with the thickness being positioned at other regions of first substrate 10 making the thickness being positioned at the part of the edge of first substrate 10 of black matrix layer 11 be greater than black matrix layer 11.The program is greater than the thickness being positioned at other regions of first substrate 10 of black matrix layer 11 for the thickness of the part making the edge being positioned at first substrate 10, thus when spraying PI liquid, the black matric wall 12 being positioned at the edge of first substrate 10 can realize barrier effect better.
According to the present invention, the groove of black matric wall 12 is formed by multiple protuberance and the recess between adjacent projection.In the embodiment illustrated in fig. 6, protuberance 122, protuberance 121 and recess 123 complement each other to form the groove for holding PI liquid, thus avoid the PI liquid flowing through each protuberance and recess reflux and be deposited near the C of viewing area, thus while the production yield improving product, be conducive to the image display quality improving display panels 100.
In the present invention, above-mentioned projection and the fit system of recess can be set to multiple.Such as, in the embodiment shown in fig. 8, black matric wall is configured to striated by the protuberance of black matric wall 12 and recess.Pass through this set, when the acting force of PI liquid to black matric wall 12 is larger, have relatively large PI liquid cross the protuberance of black matric wall 12 and enter recess, now each recess can realize the quick shunting to the PI liquid crossing each protuberance, each protuberance can stop the PI liquid after shunting simultaneously, thus prevents PI liquid to be back to viewing area C.
Also such as, in embodiment as shown in Figure 9, black matric wall 12a is configured to latticed by the protuberance of black matric wall 12a and recess.This setting can realize the further acceleration of black matric wall 12 to the PI liquid crossing it and shunt, thus prevents PI liquid to be back to viewing area C further.
Figure 10 shows the structural representation according to a kind of display panels 100 provided by the invention.This display panels is made by the method for making of above-mentioned display panels 100.It comprises first substrate 10, and the marginal position of first substrate 10 is provided with the fluted black matric wall 12 of tool.Shown in composition graphs 2, due in display panels 100 of the present invention because PI liquid can not be deposited in the edge of viewing area C, therefore its can realize better picture display.
Preferably, display panels 100 also comprises the second substrate 20 be oppositely arranged with first substrate 10, and black matric wall 12 does not contact with second substrate 20.This black matric wall 20 is mainly used in blocking PI liquid, blocks act on as long as therefore reach it.
Compared with prior art, the method for making of display panels 100 of the present invention is also more conducive to the image display quality improving display panels 100 while the production efficiency that improve display panels 100.
It should be noted, foregoing example only to be interpreted as object, and can not be thought to limit the present invention.Although invention has been described according to exemplary embodiment, but should be appreciated that used herein is descriptive and illustrative language, instead of restrictive language.Current described with in the scope of the claims of amendment, not departing from the scope of the present invention in the scope with spirit, can change the present invention.Although according to specific mode, material and embodiment, invention has been described here, the present invention is not limited in details disclosed herein; On the contrary, the present invention extends to structure, the methods and applications of such as all identical functions within the scope of the appended claims.
Claims (10)
1. a method for making for display panels, comprising:
Apply certain thickness black matrix layer on the first substrate;
The part being positioned at the edge of described first substrate of described black matrix layer is processed, to form the fluted black matric wall of tool in described first substrate edge.
2. the method for making of display panels according to claim 1, is characterized in that, the groove of described black matric wall is formed by multiple protuberance and the recess between adjacent described protuberance.
3. the method for making of display panels according to claim 2, is characterized in that, described black matric wall is configured to striated by the protuberance of described black matric wall and recess.
4. the method for making of display panels according to claim 2, is characterized in that, described black matric wall is configured to latticed by the protuberance of described black matric wall and recess.
5. the method for making of display panels according to any one of claim 1 to 4, is characterized in that, the making step of described black matric wall comprises:
Black matrix layer applies photoresist layer;
The corresponding light shield of half exposure technique is adopted to expose to obtain the mask pattern of required black matric wall to described photoresist layer;
Mask pattern on described photoresist layer is developed;
Continue to be etched with described photoresist layer to obtain required black matric wall.
6. the method for making of display panels according to claim 5, is characterized in that, described etching method adopts the method for ion beam milling.
7. the method for making of display panels according to any one of claim 1 to 4, it is characterized in that, also comprise and the part being positioned at described other regions of first substrate of described black matrix layer is removed, with the thickness being positioned at described other regions of first substrate making the thickness being positioned at the part of the edge of described first substrate of described black matrix layer be greater than described black matrix layer.
8. the method for making of the display panels according to any one of claim 2 to 4, is characterized in that, is also included on each described protuberance and continues to form certain thickness supporting layer.
9. the display panels that the method for making of the display panels according to any one of claim 1 to 8 is made, comprise first substrate, the marginal position of described first substrate is provided with the fluted black matric wall of tool.
10. display panels according to claim 9, is characterized in that, described display panels also comprises the second substrate be oppositely arranged with described first substrate, and described black matric wall does not contact with described second substrate.
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106990670A (en) * | 2017-05-02 | 2017-07-28 | 深圳市华星光电技术有限公司 | Black matrix light shield, the manufacture method of black matrix and array base palte |
CN107526202A (en) * | 2016-11-09 | 2017-12-29 | 惠科股份有限公司 | Liquid crystal panel, liquid crystal display and manufacturing method of liquid crystal panel |
CN110967861A (en) * | 2018-09-28 | 2020-04-07 | 咸阳彩虹光电科技有限公司 | Liquid crystal display panel, color film substrate and preparation method thereof |
CN111025768A (en) * | 2019-12-05 | 2020-04-17 | Tcl华星光电技术有限公司 | Display panel and liquid crystal display device |
WO2020207160A1 (en) * | 2019-04-08 | 2020-10-15 | 惠科股份有限公司 | Display panel, manufacturing method for display panel, and display device |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1892265A (en) * | 2005-07-08 | 2007-01-10 | 鸿富锦精密工业(深圳)有限公司 | Method for making colour-filter |
CN1904699A (en) * | 2005-07-27 | 2007-01-31 | 中华映管股份有限公司 | Base plate structure for forming alignment layer by ink jet method and liquid crystal panel produced therewith |
CN101089689A (en) * | 2006-06-16 | 2007-12-19 | 群康科技(深圳)有限公司 | Liquid crystal display panel |
CN101290417A (en) * | 2007-04-18 | 2008-10-22 | 奇美电子股份有限公司 | Liquid crystal display panel and its substrate preparation method |
CN201754209U (en) * | 2010-01-20 | 2011-03-02 | 深圳华映显示科技有限公司 | Liquid crystal panel |
WO2014032324A1 (en) * | 2012-08-28 | 2014-03-06 | 深圳市华星光电技术有限公司 | Display panel and liquid crystal display |
CN104007584A (en) * | 2014-06-25 | 2014-08-27 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal box structure for liquid crystal display |
CN104950508A (en) * | 2015-06-17 | 2015-09-30 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
-
2015
- 2015-10-30 CN CN201510727490.XA patent/CN105242445A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1892265A (en) * | 2005-07-08 | 2007-01-10 | 鸿富锦精密工业(深圳)有限公司 | Method for making colour-filter |
CN1904699A (en) * | 2005-07-27 | 2007-01-31 | 中华映管股份有限公司 | Base plate structure for forming alignment layer by ink jet method and liquid crystal panel produced therewith |
CN101089689A (en) * | 2006-06-16 | 2007-12-19 | 群康科技(深圳)有限公司 | Liquid crystal display panel |
CN101290417A (en) * | 2007-04-18 | 2008-10-22 | 奇美电子股份有限公司 | Liquid crystal display panel and its substrate preparation method |
CN201754209U (en) * | 2010-01-20 | 2011-03-02 | 深圳华映显示科技有限公司 | Liquid crystal panel |
WO2014032324A1 (en) * | 2012-08-28 | 2014-03-06 | 深圳市华星光电技术有限公司 | Display panel and liquid crystal display |
CN104007584A (en) * | 2014-06-25 | 2014-08-27 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal box structure for liquid crystal display |
CN104950508A (en) * | 2015-06-17 | 2015-09-30 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107526202A (en) * | 2016-11-09 | 2017-12-29 | 惠科股份有限公司 | Liquid crystal panel, liquid crystal display and manufacturing method of liquid crystal panel |
WO2018086312A1 (en) * | 2016-11-09 | 2018-05-17 | 惠科股份有限公司 | Liquid crystal panel, liquid crystal display, and manufacturing method for liquid crystal panel |
US10642089B2 (en) | 2016-11-09 | 2020-05-05 | HKC Corporation Limited | Liquid crystal display panel, liquid crystal display apparatus and method for manufacturing same |
CN106990670A (en) * | 2017-05-02 | 2017-07-28 | 深圳市华星光电技术有限公司 | Black matrix light shield, the manufacture method of black matrix and array base palte |
CN110967861A (en) * | 2018-09-28 | 2020-04-07 | 咸阳彩虹光电科技有限公司 | Liquid crystal display panel, color film substrate and preparation method thereof |
WO2020207160A1 (en) * | 2019-04-08 | 2020-10-15 | 惠科股份有限公司 | Display panel, manufacturing method for display panel, and display device |
CN111025768A (en) * | 2019-12-05 | 2020-04-17 | Tcl华星光电技术有限公司 | Display panel and liquid crystal display device |
CN111025768B (en) * | 2019-12-05 | 2021-02-26 | Tcl华星光电技术有限公司 | Display panel and liquid crystal display device |
US11402683B2 (en) | 2019-12-05 | 2022-08-02 | Tcl China Star Optoelectronics Technology Co., Ltd. | Display panel and liquid crystal display device |
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