WO2021068328A1

WO2021068328A1 - Spliced exposure system and spliced exposure method using same

Info

Publication number: WO2021068328A1
Application number: PCT/CN2019/117324
Authority: WO
Inventors: 杜鹏
Original assignee: Tcl华星光电技术有限公司
Priority date: 2019-10-10
Filing date: 2019-11-12
Publication date: 2021-04-15
Also published as: CN110687757A

Abstract

A spliced exposure system and a spliced exposure method using same. By redesigning a spliced exposure system suitable for an ultra-large-size display panel, a large-size or curved-surface display panel can be efficiently manufactured, and the influence on costs and production capacity can be reduced.

Description

Splicing exposure system and splicing exposure method using the system

Technical field

The present disclosure relates to the field of semiconductor technology, in particular to a splicing exposure system and a splicing exposure method using the system.

Background technique

In the current panel market, mainstream sizes are becoming larger and larger. The size of the photomask 120 for each era line is fixed, and each photomask 120 has a fixed effective exposure area, as shown in FIG. 1. When the size of the produced panel 110 is relatively small, the panel will be completely located within the effective exposure area of the mask 120 (Mask, or mask). At this time, splicing is not required. Every exposure in the exposure process can be produced. One or several complete panels 110. When the size of the panel 110 is further increased, it may exceed the effective exposure area of the photomask. It is often encountered that the size of the panel in one direction exceeds the effective exposure range of the photomask.

As shown in FIG. 2, when the display panel 110 exceeds the effective exposure range of the photomask 120 in one direction, the display panel needs to be divided during design, and then spliced exposure is performed. It can be seen in Figure 2 that the position of each exposure edge is the splicing area. The main problem in the stitching exposure process comes from the stitching area. Due to the light intensity between different exposure shots, the limitation of machine movement accuracy, the stacking error of source and drain gates, etc., the parasitic capacitance of the thin film transistor of the pixel in the splicing area is often different, and different coupling effects are generated. The brightness display is not uniform (ie Mura). Therefore, some special design methods need to be adopted in these splicing areas.

Different exposure machines have different splicing methods, such as VFS for Nikon machines, SMB for Canon machines and other splicing methods. For the CF (color film substrate) process, a progressive exposure machine is often used, but the exposure machine does not have functions such as VFS or SMB, so special techniques are required to avoid uneven brightness display in the splicing area when designing the mask.

technical problem

Figure 3A and Figure 3B are the two most commonly used design methods to avoid splicing Mura. The first is the subtractive pattern (ie Hyper Shot), its principle is to form a gradual transmittance area at each exposure edge of the mask, the transmittance near the middle of the exposure is the highest, and the transmittance far away from the middle of the exposure is the lowest (here is Take the negative photoresist of the CF process as an example), as shown by the arrow in Figure 3A. The second method is a mosaic pattern, which also forms a pattern density gradient area at the edge position of each exposure, and the density of the mosaic pattern is shown in Figure 3B. These two methods can avoid the light intensity at the junction of different exposures, CD (Critical The sudden change of Dimension, key size) and O/L (Overlay, registration accuracy between different layers), by adopting a gradual transition method, improves the uneven brightness display of the splicing area.

Fig. 4 is a complete large-size panel made by using the mask in Fig. 2. The left side (that is, the area where the mark 101 is located) and the right side (that is, the area where the mark 103 is located) of the display panel in FIG. 4 are made through the mask shown in FIG. 2, and the middle part B of the display panel (where the mark 102 is located) Area) is repeated twice exposure.

A total of 4 exposures were carried out for the production of the display panel, which is also the minimum number of exposures required for Hyper Shot and Mosaic Pattern designs. Compared with models that do not need to be spliced, this production method will increase the number of exposures and the tact time (tact time) and production capacity will also be greatly affected.

In view of this, how to realize the efficient production of large-size or curved display panels and reduce the impact on cost and productivity has become a key research project for related researchers and developers.

Technical solutions

The purpose of the present disclosure is to provide a splicing exposure system and a splicing exposure method using the system. By redesigning a splicing exposure system suitable for a super-large-size display panel, it can realize the efficient production of large-size or curved display panels and reduce the risk of damage. The impact of cost and capacity.

According to one aspect of the present disclosure, the present disclosure provides a splicing exposure system applied to a display panel, the display panel is divided into a plurality of exposure areas, wherein the splicing exposure system includes: a mask, the mask The plate covers one of the multiple exposure areas, the mask plate is used to expose the exposure area; a pair of baffles, the pair of baffles are both set on the mask plate Above, the pair of baffles includes a first baffle and a second baffle, the first baffle and the second baffle are arranged oppositely, and one side of the first baffle has a first transparent Light area, the side of the second baffle close to the first light transmission area has a second light transmission area, the center line of the first light transmission area and the center line of the second light transmission area are One of them coincides with the splicing lines of two adjacent exposure areas; the first light-transmitting area and the second light-transmitting area have complementary gradient patterns; the first light-transmitting area and the second light-transmitting area The width is greater than or equal to 10mm.

According to one aspect of the present disclosure, the present disclosure provides a splicing exposure system applied to a display panel, the display panel is divided into a plurality of exposure areas, the splicing exposure system includes: a mask, the mask The plate covers one of the multiple exposure areas, the mask plate is used to expose the exposure area; a pair of baffles, the pair of baffles are both set on the mask plate Above, the pair of baffles includes a first baffle and a second baffle, the first baffle and the second baffle are arranged oppositely, and one side of the first baffle has a first transparent Light area, the side of the second baffle close to the first light transmission area has a second light transmission area, the center line of the first light transmission area and the center line of the second light transmission area are One of them coincides with the splicing lines of two adjacent exposure areas.

In an embodiment of the present disclosure, the first light-transmitting area and the second light-transmitting area have complementary gradient patterns.

In an embodiment of the present disclosure, the first light-transmitting area and the second light-transmitting area have complementary mosaic patterns.

In an embodiment of the present disclosure, the light transmittance of the first light-transmitting area along a predetermined direction continuously changes from 0 to 100%; the light transmittance of the second light-transmitting area along the predetermined direction Continuously change from 100% to 0.

In an embodiment of the present disclosure, the light transmittance of the first light-transmitting area along a predetermined direction corresponds to a plurality of light transmittances from 0 to 100%; the second light-transmitting area is along the predetermined direction. Let the light transmittance in the direction correspond to multiple light transmittances from 100% to 0, respectively.

In an embodiment of the present disclosure, the widths of the first light-transmitting area and the second light-transmitting area are greater than or equal to 10 mm.

According to another aspect of the present disclosure, a splicing exposure method using the splicing exposure system described above is provided. The method includes the following steps: providing a display panel; dividing the display panel into a plurality of exposure areas; A mask plate is arranged above one of the exposure areas in the area; a pair of baffles are arranged above the mask plate, wherein the pair of baffles includes a first baffle and a second baffle, the first baffle A baffle is arranged opposite to the second baffle, one side of the first baffle has a first light-transmitting area, and a side of the second baffle close to the first light-transmitting area has a first light-transmitting area. Two light transmission areas, one of the center line of the first light transmission area and the center line of the second light transmission area coincides with the splicing line of two adjacent exposure areas; through a pair of baffles and masks After the exposure is completed, the pair of baffles and mask plates are translated to the adjacent exposure area of the exposure area to be exposed for exposure until the exposure area to be exposed is exposed. All exposure areas have completed the exposure operation.

Beneficial effect

The advantage of the present disclosure is that the present disclosure redesigns the splicing exposure system suitable for the super-large-size display panel to realize the efficient production of the large-size or curved display panel and reduce the impact on cost and productivity.

Description of the drawings

In order to explain the technical solutions in the embodiments of the present disclosure more clearly, the following will briefly introduce the drawings needed in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

Fig. 1 is a schematic diagram of a use state of a mask in the prior art.

FIG. 2 is a schematic diagram of the relationship between the mask plate and the display panel in the prior art.

3A and 3B are respectively schematic diagrams of two design methods commonly used in the prior art to avoid splicing Mura (uneven display brightness).

FIG. 4 is a schematic diagram of the display panel in the prior art after four exposures.

FIG. 5 is a schematic diagram of the design of the mask in an embodiment of the present disclosure.

FIG. 6 is a schematic diagram of completing the manufacturing of the display panel using two exposures in an embodiment of the present disclosure.

FIG. 7 is a schematic diagram of manufacturing the left half of the display panel shown in FIG. 6.

FIG. 8 is a schematic diagram of manufacturing the right half of the display panel shown in FIG. 6.

FIG. 9 is a schematic diagram of an exposure process performed by a first baffle, a second baffle and a mask in an embodiment of the present disclosure.

FIG. 10 is a schematic diagram of the corresponding relationship between the first baffle and the second baffle shown in FIG. 9 and the light transmittance.

FIG. 11 is a schematic diagram of the exposure process performed by the first baffle, the second baffle and the mask in another embodiment of the present disclosure.

FIG. 12 is a schematic diagram of the corresponding relationship between the first baffle and the second baffle shown in FIG. 11 and the light transmittance.

FIG. 13 is a flowchart of the steps of the splicing exposure method of the splicing exposure system in an embodiment of the present disclosure.

Embodiments of the present invention

The technical solutions in the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only a part of the embodiments of the present disclosure, rather than all the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those skilled in the art without creative work shall fall within the protection scope of the present disclosure.

The terms "first", "second", "third", etc. (if any) in the specification and claims of the present disclosure and the above-mentioned drawings are used to distinguish similar objects, and not necessarily used to describe a specific order Or precedence. It should be understood that the objects described in this way can be interchanged under appropriate circumstances. In addition, the terms "including" and "having" and any variations of them are intended to cover non-exclusive inclusions.

In this patent document, the accompanying drawings discussed below and various embodiments used to describe the principle of the present disclosure are for illustration only, and should not be construed as limiting the scope of the present disclosure. Those skilled in the art will understand that the principles of the present disclosure can be implemented in any suitably arranged system. Exemplary embodiments will be described in detail, and examples of these embodiments are shown in the drawings. In addition, a terminal according to an exemplary embodiment will be described in detail with reference to the accompanying drawings. The same reference numerals in the drawings refer to the same elements.

The terms used in the specification of the present disclosure are only used to describe specific embodiments, and are not intended to show the concept of the present disclosure. Unless there is a clearly different meaning in the context, the expression used in the singular form encompasses the expression in the plural form. In the specification of this disclosure, it should be understood that terms such as "including", "having" and "containing" are intended to indicate the possibility of the features, numbers, steps, actions or combinations thereof disclosed in the specification of this disclosure, but not The possibility that one or more other features, numbers, steps, actions or combinations thereof may exist or may be added is excluded. The same reference numerals in the drawings refer to the same parts.

The embodiments of the present disclosure provide a splicing exposure system and a splicing exposure method using the system. The detailed description will be given below.

FIG. 5 is a schematic diagram of the design of the mask in an embodiment of the present disclosure. FIG. 6 is a schematic diagram of completing the manufacturing of the display panel using two exposures in an embodiment of the present disclosure. FIG. 7 is a schematic diagram of manufacturing the left half of the display panel shown in FIG. 6. FIG. 8 is a schematic diagram of manufacturing the right half of the display panel shown in FIG. 6.

Since in the prior art, the display panel shown in FIG. 4 needs to be exposed for 4 times in total, this also adopts hyper shot exposure and mosaic pattern exposure. pattern) The minimum number of exposures to expose the design plan. Compared with splicing machines that do not need to be spliced, the above-mentioned production method will increase the number of exposures, and the production cycle time and productivity will also be greatly affected. Therefore, the present disclosure reduces the number of exposures by redesigning the splicing exposure system suitable for super-large display panels.

As shown in FIG. 5, a schematic diagram of the design of the mask 120 above the display panel 110 is shown. Among them, mark A indicates the exposure range of the first exposure. Mark B indicates the second exposure range.

Compared with the display panel shown in FIG. 4, if the mask 120 described in the present disclosure and the baffle described below (including the first baffle 140 and the second baffle 130) are used, only two exposures are required. The production of the display panel 110 is completed. The first exposure completes the left half 101 of the display panel 110, and the second exposure completes the right half 102 of the display panel 110. The pattern at the middle position of the mask 120 will be used in both exposures.

As shown in FIG. 6, during the manufacturing process of the display panel 110 using two exposures, only a splicing line 104 is formed in the middle of the display panel 110. Therefore, compared with the display panel manufacturing shown in FIG. 4 in the prior art, the present disclosure realizes the reduction of the exposure boundary line (ie the splicing line 104 of the splicing area), thereby reducing the probability of splicing Mura and reducing the difficulty of the manufacturing process.

The effect shown in FIG. 6, that is, the reduction of the number of exposures is achieved by using the mask 120 and the corresponding baffle described in the present disclosure.

The working mechanism of the mask plate 120 and the baffle (including the first baffle 140 and the second baffle 130) in cooperation will be described below.

As shown in FIG. 7, in an embodiment of the present disclosure, the production of the left half 101 of the display panel 110 shown in FIG. 6 is taken as an example. At this time, the second baffle 130 covers the right part of the mask 120 Blocked, the left half of the mask 120 is illuminated (for example, ultraviolet light). Therefore, the corresponding patterns on the mask 120 are transferred to the substrate of the display panel 110 at the same time. The left edge of the second baffle 130 located on the right part of the mask 120 has a light transmittance gradient area (that is, the second light transmittance area 131 described below), and the center line of the light transmittance gradient area Corresponding to the center line of the splicing area (ie splicing line m) formed by two adjacent exposure areas of the display panel 110, the right part of the second baffle 130 is opaque, and its light transmittance is zero. When the splicing exposure method of the present disclosure is used, the exposure area of each exposure is larger than the exposure area shown in FIG. 4, and therefore, the number of exposures in the exposure process can be reduced.

Similarly, as shown in FIG. 8, the second exposure is also performed in a similar manner, taking the production of the right half 102 of the display panel 110 shown in FIG. 6 as an example. The first baffle 140 blocks the left part of the mask 120, and the right half of the mask 120 illuminates light (for example, ultraviolet light). Therefore, the corresponding patterns on the mask 120 are transferred to the substrate of the display panel 110 at the same time. At the right edge of the first baffle 140 located on the left side of the mask 120, there is a light transmittance gradient area (that is, the first light transmittance area 141 described below), and the center line of the light transmittance gradient area Corresponding to the center line of the splicing area (ie splicing line n) formed by two adjacent exposure areas of the display panel 110, the left part of the first baffle 140 is opaque, and its light transmittance is zero.

For the substrate of the display panel 110 (not marked in the figure), the light transmittance gradient area of the first baffle 140 in the second exposure and the light transmittance gradient area of the second baffle 130 in the first exposure The projections on the substrate are overlapped, and this area is a splicing area formed by two adjacent exposure areas of the display panel 110.

According to the new design idea of the splicing exposure system described above, the following splicing exposure system is proposed. The splicing exposure system is applied to a display panel 110, wherein the display panel 110 is divided into a plurality of exposure areas (for example, the mark 101 and the mark 102 shown in FIG. 6). The display panel 110 is divided into a plurality of exposure areas, and the area sizes of the exposure areas may be the same or different.

The splicing exposure system includes: a mask 120 and a pair of baffles 170. Wherein, the mask 120 covers one of the multiple exposure areas (for example, the mark 101 or the mark 102 shown in FIG. 6), and the mask 120 is used for exposing the exposure area . That is, the mask 120 is used to expose a certain exposure area in the substrate of the display panel 110.

The pair of baffles are both disposed above the mask plate, and the pair of baffles 170 include a first baffle 140 and a second baffle 130. The first baffle 140 and the second baffle 130 are arranged opposite to each other. Wherein, the first baffle 140 and the second baffle 130 may be arranged at intervals. Further, one side of the first baffle 140 has a first light-transmitting area 141, and a side of the second baffle 130 close to the first light-transmitting area 141 has a second light-transmitting area 131, so The splicing line between one of the center line of the first light-transmitting area and the center line of the second light-transmitting area and two adjacent exposure areas (mark m in FIG. 7 or mark n in FIG. 8) coincide.

FIG. 9 is a schematic diagram of an exposure process in an embodiment of the present disclosure. FIG. 10 is a schematic diagram of the corresponding relationship between the first baffle 140 and the second baffle 130 shown in FIG. 9 and the light transmittance.

In an embodiment shown in FIGS. 9 and 10, the first light-transmitting area 141 and the second light-transmitting area 131 have complementary gradient patterns.

Specifically, during exposure, the first baffle 140 (the left baffle shown in FIG. 9) and the second baffle 130 (the right baffle shown in FIG. 9) are both located above the mask plate 120 . The right side of the first baffle 140 has a first light-transmitting area 141, and the left side of the second baffle 130 has a second light-transmitting area 131.

The first light-transmitting area 141 has a gradual pattern. Therefore, the light transmittance of the first light-transmitting area 141 has a corresponding gradation, such as increasing or decreasing, so that the ultraviolet light passing through the first light-transmitting area 141 can be transmitted. The rate can change accordingly such as increasing or decreasing. Similarly, the second light-transmitting area 131 also has a gradual pattern. Therefore, the light transmittance of the second light-transmitting area 131 has a corresponding gradual change, such as increasing or decreasing, so that the light passing through the second light-transmitting area 131 The transmittance of ultraviolet light can be changed accordingly, such as increasing or decreasing.

Since the first light-transmitting area 141 and the second light-transmitting area 131 have complementary gradual patterns, when the light transmittance of the first light-transmitting area 141 decreases, the light transmittance of the second light-transmitting area 131 increases. When the light transmittance of the first light-transmitting area 141 increases, the light transmittance of the second light-transmitting area 131 decreases.

Further, in a predetermined direction (based on the length direction of the first baffle 140), for example, from left to right, as shown by the arrow direction in FIG. 10, the light transmittance of the first light transmission area 141 is continuous from 0 If it changes to 100%, the light transmittance of the second light-transmitting area 131 along the predetermined direction continuously changes from 100% to 0. Of course, in other embodiments, in a predetermined direction (based on the length of the first baffle 140), for example, from right to left, the light transmittance of the first light-transmitting area 141 can also be continuous from 100%. If it changes to 0, the light transmittance of the second light-transmitting area 131 along the predetermined direction continuously changes from 0 to 100%.

When the left part 101 of the display panel 110 as shown in FIG. 6 is exposed, one of the center line of the first light-transmitting area 141 and the center line of the second light-transmitting area 131 (here, the second light-transmitting area) The center line of the area 131) coincides with the splicing line (mark m as shown in FIG. 7) of two adjacent exposure areas. As shown in FIG. 5 in conjunction with reference, at this time, the first light-transmitting area 141 is located outside the left side of the exposure area, and has exceeded the exposure range and does not work. When the right portion 102 of the display panel 110 as shown in FIG. 6 is exposed, one of the center line of the first light-transmitting area 141 and the center line of the second light-transmitting area 131 (here, the first light-transmitting area) The center line of the area) coincides with the splicing line of two adjacent exposure areas (mark n as shown in Figure 8). With reference to FIG. 5, at this time, the second light-transmitting area 131 is located outside the exposure area on the right side, and has exceeded the exposure range and does not work.

Since the light transmittance of the first light-transmitting area 141 changes linearly along the preset direction (the arrow direction as shown in FIG. 10), that is, it continuously changes from 0 to 100%, and the light transmittance of the second light-transmitting area 131 is along The preset direction also changes linearly, continuously changing from 100% to 0. Therefore, when two oppositely arranged first baffle 140 and second baffle 130 are used and the mask 120 is used for splicing exposure, it can be conveniently The light intensity is controlled so that the full exposure intensity can be reached after two exposures of the first baffle 140 and the second baffle 130.

When the first light-transmitting area 141 and the second light-transmitting area 131 are superimposed in the corresponding splicing area, the sum of the light transmittance of the two is exactly equal to 100%, because the first light-transmitting area 141 and the second light-transmitting area 141 The light transmittance of the two light-transmitting regions 131 changes linearly, so it is beneficial to ensure a uniform transition of the splicing areas corresponding to the first light-transmitting area 141 and the second light-transmitting area 131, thereby effectively reducing the occurrence of splicing Mura. Further, in this embodiment, the widths of the first light-transmitting area 141 and the second light-transmitting area 131 need to meet a certain size, for example, greater than or equal to 10 mm, which can ensure that the transition between two exposures is more relaxed. This reduces the risk of splicing Mura.

In other embodiments of the present disclosure, the first light-transmitting area 141 is along a predetermined direction (based on the length direction of the first baffle 140), for example, from left to right, the light transmittance thereof is intermittently changed from 0 To 100%, which respectively correspond to multiple light transmittances from 0 to 100%, such as 0, 30%, 60%, 100%, and the light transmittance of the second light-transmitting area 131 along the predetermined direction The intermittent change from 100% to 0 corresponds to multiple transmittances from 100% to 0, such as 100%, 70%, 40%, and 0.

In addition to the above-mentioned first baffle 140 and second baffle 130 as shown in FIGS. 9 and 10 having complementary gradient patterns, complementary mosaic patterns may also be formed on the first baffle 140 and the second baffle 130 , As described below.

FIG. 11 is a schematic diagram of an exposure process in another embodiment of the present disclosure. FIG. 12 is a schematic diagram of the corresponding relationship between the first baffle and the second baffle 130 shown in FIG. 11 and the light transmittance.

11 and 12 in combination, the first light-transmitting area and the second light-transmitting area have complementary mosaic patterns.

Specifically, during exposure, the first baffle 140 (the left baffle as shown in FIG. 11) and the second baffle 130 (the right baffle as shown in FIG. 12) are both located above the mask plate 120. . The right side of the first baffle 140 has a first light-transmitting area 141, and the left side of the second baffle 130 has a second light-transmitting area 131.

The first light-transmitting area 141 has a certain width of the mosaic pattern area with a gradual mosaic pattern density. Therefore, the light transmittance of the first light-transmitting area has a corresponding gradation, such as increasing or decreasing, so as to pass through the first light-transmitting area. The ultraviolet light transmittance of the area 141 can correspondingly change, such as increasing or decreasing. Similarly, the second light-transmitting area 131 also has a certain width of the mosaic pattern area with gradual density. Therefore, the light transmittance of the second light-transmitting area 131 has a corresponding gradual change, such as increasing or decreasing, so as to pass through the second light-transmitting area 131. The ultraviolet light transmittance of the two light-transmitting regions 131 can correspondingly change, such as increasing or decreasing.

Since the first light transmission area 141 and the second light transmission area 131 have complementary mosaic patterns, when the light transmittance of the first light transmission area 141 decreases, the light transmittance of the second light transmission area 131 increases. When the light transmittance of the first light-transmitting area 141 increases, the light transmittance of the second light-transmitting area 131 decreases.

Further, in a predetermined direction (based on the length direction of the first baffle 140), for example, from left to right, as shown by the arrow direction in FIG. 12, the density of the left side of the first light-transmitting region 141 is high, and the right If the side density is low, the second light-transmitting area 131 has a low density on the left side and a high density on the right side along the predetermined direction. When the first light-transmitting area 141 and the second light-transmitting area 131 cooperate with the mask 120 for splicing exposure, the effects of the solutions shown in FIGS. 9 and 10 can also be achieved.

FIG. 13 is a flow chart of the steps of the splicing exposure method of the splicing exposure system in an embodiment of the disclosure. Wherein, the splicing exposure system is the system described above, and will not be repeated here.

Referring to Figure 13, the method includes the following steps:

Step S110: Provide a display panel.

Step S120: divide the display panel into multiple exposure areas.

Step S130: setting a mask above one of the multiple exposure areas.

Step S140: Set a pair of baffles above the mask plate, wherein the pair of baffles include a first baffle and a second baffle, and the first baffle and the second baffle are opposite to each other. Provided that one side of the first baffle has a first light-transmitting area, and the side of the second baffle close to the first light-transmitting area has a second light-transmitting area, and the first light-transmitting area One of the center line of the area and the center line of the second light-transmitting area coincides with the splicing line of two adjacent exposure areas.

Step S150: Expose the exposed area to be exposed through a pair of baffles and masks.

During exposure, the first baffle (the left baffle as shown in FIG. 9) and the second baffle (the right baffle as shown in FIG. 9) are both located above the mask plate. The right side of the first baffle has a first light-transmitting area, and the left side of the second baffle has a second light-transmitting area.

The first light-transmitting area has a gradual pattern. Therefore, the light transmittance of the first light-transmitting area has a corresponding gradation, such as increasing or decreasing, so that the transmittance of ultraviolet light passing through the first light-transmitting area can be correspondingly changed. The gradual changes such as increasing or decreasing. Similarly, the second light-transmitting area also has a gradual pattern. Therefore, the light transmittance of the second light-transmitting area has a corresponding gradation, such as increasing or decreasing, so that the ultraviolet light passing through the second light-transmitting area is transparent. The overrate can change accordingly such as increasing or decreasing.

Since the first light transmission area and the second light transmission area have complementary gradual patterns, when the light transmittance of the first light transmission area decreases, the light transmittance of the second light transmission area increases. When the light transmittance of the first light-transmitting area increases, the light transmittance of the second light-transmitting area decreases.

Further, in a preset direction (based on the length direction of the first baffle), for example, from left to right, as shown by the arrow direction in FIG. 10, the light transmittance of the first light transmission area continuously changes from 0 to 100%, the light transmittance of the second light-transmitting area along the predetermined direction continuously changes from 100% to 0. Of course, in other embodiments, in a predetermined direction (based on the length of the first baffle), for example, from right to left, the light transmittance of the first light-transmitting area can also be continuously changed from 100% to 0, the light transmittance of the second light-transmitting area along the predetermined direction continuously changes from 0 to 100%.

When exposing the left part of the display panel as shown in FIG. 6, one of the center line of the first light-transmitting area and the center line of the second light-transmitting area (here is the center of the second light-transmitting area) Line) coincides with the stitching lines of two adjacent exposure areas. With reference to FIG. 5, at this time, the first light-transmitting area is located on the outer side of the left side of the exposure area, which has exceeded the exposure range and does not work. When exposing the right part of the display panel as shown in FIG. 6, one of the center line of the first light-transmitting area and the center line of the second light-transmitting area (here is the center of the first light-transmitting area) Line) coincides with the stitching lines of two adjacent exposure areas. As shown in FIG. 5 in conjunction with reference, at this time, the second light-transmitting area is located outside the exposure area on the right side, which has exceeded the exposure range and has no effect.

Since the light transmittance of the first light-transmitting area changes linearly along the preset direction (such as the arrow direction as shown in Figure 10), that is, it continuously changes from 0 to 100%, while the light transmittance of the second light-transmitting area changes along the predetermined direction. The setting direction also changes linearly, continuously changing from 100% to 0. Therefore, when two oppositely arranged first baffle and second baffle are used and the mask is used for splicing exposure, the light intensity control can be conveniently performed , So that the full exposure intensity can be reached after two exposures of the first baffle and the second baffle.

When the first light-transmitting area and the second light-transmitting area are superimposed in the corresponding splicing area, the sum of the light transmittance of the two is exactly equal to 100%, because the first light-transmitting area and the second light-transmitting area The light transmittance of the area changes linearly, so it is beneficial to ensure a uniform transition of the splicing areas corresponding to the first light-transmitting area and the second light-transmitting area, thereby effectively reducing the occurrence of splicing Mura. Further, in this embodiment, the widths of the first light-transmitting area and the second light-transmitting area need to meet a certain size, for example, greater than or equal to 10 mm, which can ensure that the transition between two exposures is more gradual, thereby reducing The risk of splicing Mura.

In addition to the above-mentioned first baffle 140 and second baffle 130 as shown in FIGS. 9 and 10 having complementary gradient patterns, complementary mosaic patterns may also be formed on the first baffle 140 and the second baffle 130 . When the first light-transmitting area 141 and the second light-transmitting area 131 are combined with the mask for splicing exposure, the effects of the solutions shown in FIGS. 9 and 10 can also be achieved.

Step S160: After the exposure is completed, move the pair of baffle and mask to the adjacent exposure area of the exposure area to be exposed for exposure, until the exposure operation is completed for the multiple exposure areas.

The present disclosure redesigns a splicing exposure system suitable for super-large-size display panels to realize the efficient production of large-size or curved display panels and reduce the impact on cost and productivity.

The above are only the preferred embodiments of the present disclosure. It should be pointed out that for those of ordinary skill in the art, without departing from the principles of the present disclosure, several improvements and modifications can be made, and these improvements and modifications should also be considered The scope of protection of this disclosure.

Industrial applicability

The subject of this application can be manufactured and used in industry and has industrial applicability.

Claims

A splicing exposure system is applied to a display panel, the display panel is divided into a plurality of exposure areas, wherein the splicing exposure system includes:

A mask, the mask covering one of the plurality of exposure regions, and the mask is used for exposing the exposure region;

A pair of baffles, the pair of baffles are both arranged above the mask plate, the pair of baffles include a first baffle and a second baffle, the first baffle and the first baffle Two baffles are arranged opposite to each other, one side of the first baffle has a first light transmission area, and the side of the second baffle close to the first light transmission area has a second light transmission area. One of the center line of the first light-transmitting area and the center line of the second light-transmitting area coincides with the splicing line of two adjacent exposure areas;

The first light-transmitting area and the second light-transmitting area have complementary gradient patterns;

The width of the first light-transmitting area and the second light-transmitting area is greater than or equal to 10 mm.
A splicing exposure system is applied to a display panel, the display panel is divided into a plurality of exposure areas, wherein the splicing exposure system includes:

A mask, the mask covering one of the plurality of exposure regions, and the mask is used for exposing the exposure region;

A pair of baffles, the pair of baffles are both arranged above the mask plate, the pair of baffles include a first baffle and a second baffle, the first baffle and the first baffle Two baffles are arranged opposite to each other, one side of the first baffle has a first light transmission area, and the side of the second baffle close to the first light transmission area has a second light transmission area. One of the center line of the first light transmission area and the center line of the second light transmission area coincides with the splicing line of two adjacent exposure areas.
3. The splicing exposure system according to claim 2, wherein the first light-transmitting area and the second light-transmitting area have complementary gradient patterns.
3. The splicing exposure system according to claim 2, wherein the first light-transmitting area and the second light-transmitting area have complementary mosaic patterns.
The splicing exposure system according to claim 3, wherein the transmittance of the first light-transmitting area along a predetermined direction continuously changes from 0 to 100%; and the light-transmitting area of the second light-transmitting area along the predetermined direction is continuously changed from 0 to 100%. The light transmittance continuously changes from 100% to 0.
The splicing exposure system according to claim 3, wherein the light transmittance of the first light-transmitting area along a predetermined direction respectively corresponds to a plurality of light transmittances from 0 to 100%; the second light-transmitting area is along The light transmittance in the preset direction corresponds to a plurality of light transmittances from 100% to 0, respectively.
3. The splicing exposure system according to claim 2, wherein the widths of the first light-transmitting area and the second light-transmitting area are greater than or equal to 10 mm.
A splicing exposure method using the splicing exposure system of claim 2, which comprises the following steps:

Provide a display panel;

Dividing the display panel into multiple exposure areas;

Setting a mask plate above one of the multiple exposure areas;

A pair of baffles is provided above the mask plate, wherein the pair of baffles includes a first baffle and a second baffle, the first baffle and the second baffle are arranged oppositely, so One side of the first baffle has a first light-transmitting area, the second baffle has a second light-transmitting area on the side close to the first light-transmitting area, and the center of the first light-transmitting area One of the line and the center line of the second light-transmitting area coincides with the splicing line of two adjacent exposure areas;

Expose the exposed area to be exposed through the coordinated arrangement of a pair of baffles and masks; and

After the exposure is completed, the pair of baffles and the mask are translated to the adjacent exposure area of the exposure area to be exposed for exposure, until the exposure operation is completed for the multiple exposure areas.
8. The splicing exposure method according to claim 8, wherein the first light-transmitting area and the second light-transmitting area have complementary gradient patterns.
8. The splicing exposure method according to claim 8, wherein the first light-transmitting area and the second light-transmitting area have complementary mosaic patterns.