CN107390478A - Improve the method that splicing exposure nurse draws phenomenon - Google Patents

Improve the method that splicing exposure nurse draws phenomenon Download PDF

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Publication number
CN107390478A
CN107390478A CN201710739084.4A CN201710739084A CN107390478A CN 107390478 A CN107390478 A CN 107390478A CN 201710739084 A CN201710739084 A CN 201710739084A CN 107390478 A CN107390478 A CN 107390478A
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CN
China
Prior art keywords
exposure
substrate
mask plate
nurse
area
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Granted
Application number
CN201710739084.4A
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Chinese (zh)
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CN107390478B (en
Inventor
雍玮娜
徐向阳
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TCL Huaxing Photoelectric Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to CN201710739084.4A priority Critical patent/CN107390478B/en
Publication of CN107390478A publication Critical patent/CN107390478A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention relates to a kind of method for improving splicing exposure nurse and drawing phenomenon, is related to the manufacturing field of display panel, for solving the brightness disproportionation of the stitching portion obtained present in prior art, the technical problem that splicing nurse is drawn occurs.The method that the improvement splicing exposure nurse of the present invention draws phenomenon, the step of substrate with black matrix" being obtained including the first mask plate, the step of substrate with colour cell unit being obtained with the second mask plate and the step of with substrate of the 3rd mask plate acquisition with spacer material, by using different mask plates to different processing procedures, and due to the first mask plate, the area of exposure region differs on second mask plate and the 3rd mask plate, therefore in different processing procedures, the position of stitching portion differs on substrate, therefore the anomalous exposure amount at stitching position can be weakened, weaken because the deterioration that processing procedure factor is drawn splicing nurse acts on, so as to improve quality of the panel in stitching portion.

Description

Improve the method that splicing exposure nurse draws phenomenon
Technical field
It is particularly a kind of to improve the side for splicing exposure nurse drawing phenomenon the present invention relates to the manufacturing field of light display panel Method.
Background technology
With the fast development of various displays, the requirement of client opposite board size also more and more higher, the size of display Also increasing, in order to reduce production cost, the size of required mask (Mask) still uses smaller chi when producing panel Very little (display area of the area of effective exposure region less than display i.e. on mask plate), becomes to obtain the face of large-size, adopts The panel of large-size is prepared with the mode of mask splicing exposure.
And in actual production process, the precision friendship of the exposure bench used in color film processing procedure (Color Filter, CF) is low, During each road processing procedure of color film processing procedure, due to the precision of baffle plate, baffle edge optical diffraction, and a small amount of repeated exposure etc. are asked Topic, it can make it that light exposure received by stitching portion and non-stitching portion are different, then via each road processing procedure in the repetition being spliced into Superposition, brightness disproportionation of the panel in stitching portion can be ultimately resulted in, splicing nurse occur and draw (Mura).
The content of the invention
The present invention provides a kind of method for improving splicing exposure nurse and drawing phenomenon, for solving to splice present in prior art The brightness disproportionation at place, there is the technical problem that splicing nurse draws (Mura).
The present invention provides a kind of method for improving splicing exposure nurse and drawing phenomenon, comprises the following steps：
The substrate with black matrix" is obtained with the first mask plate；
The substrate with colour cell unit is obtained with the second mask plate；
The substrate with spacer material is obtained with the 3rd mask plate；
The area of exposure region not phase on first mask plate, second mask plate and the 3rd mask plate Together.
In one embodiment, substrate is carried out described in exposure-processed acquisition at least twice using first mask plate Substrate with black matrix", the position exposed every time on substrate differ.
In one embodiment, first mask plate includes different three exposure region of exposure area, using exposure The maximum exposure region of area carries out double exposure processing to substrate.
In one embodiment, second mask plate include be used for obtain red photoresistance unit feux rouges mask plate, For obtaining the green glow mask plate of green photoresistance unit and blue light mask plate for obtaining blue light resistance unit；
The area of exposure region not phase on the feux rouges mask plate, the green glow mask plate and the blue light mask plate Together.
In one embodiment, using the feux rouges mask plate to the substrate row with black matrix" at least twice Exposure-processed obtains the substrate with red photoresistance unit, and the position exposed every time on substrate differs.
In one embodiment, using the green glow mask plate to the substrate row with red photoresistance unit at least Double exposure processing obtains the substrate with green photoresistance unit, and the position exposed every time on substrate differs.
In one embodiment, using the blue light mask plate to the substrate row with green photoresistance unit at least Double exposure processing obtains the substrate with blue light resistance unit, and the position exposed every time on substrate differs.
In one embodiment, the feux rouges mask plate, the green glow mask plate and the blue light mask plate wrap Include three different exposure regions of the area of exposure region.
In one embodiment, at least two are carried out to the substrate with blue light resistance unit using the 3rd mask plate Secondary exposure-processed obtains the substrate with spacer material, and the position exposed every time on substrate differs.
In one embodiment, the 3rd mask plate includes different three exposure region of exposure area, using exposure The maximum exposure region of area carries out double exposure processing to substrate.
Compared with prior art, the advantage of the invention is that：By using different mask plates to different processing procedures, and Because the area of exposure region on the first mask plate, the second mask plate and the 3rd mask plate differs, therefore in different systems Cheng Zhong, the position of stitching portion differs on substrate, therefore can weaken the anomalous exposure amount at stitching position, weakens because of system The deterioration that Cheng Yinsu is drawn splicing nurse acts on, so as to improve quality of the panel in stitching portion.
Brief description of the drawings
The invention will be described in more detail below based on embodiments and refering to the accompanying drawings.
Fig. 1 is the flow chart for improving the method that splicing exposure nurse draws phenomenon in embodiments of the invention；
Fig. 2-1 is the structural representation of the first mask plate in embodiments of the invention；
Fig. 2-2 is the stitching position signal being exposed in embodiments of the invention using the first mask plate on metacoxal plate Figure；
Fig. 3-1 is the structural representation of feux rouges mask plate in embodiments of the invention；
Fig. 3-2 is the stitching position signal being exposed in embodiments of the invention using feux rouges mask plate on metacoxal plate Figure；
Fig. 4-1 is the structural representation of feux rouges mask plate in embodiments of the invention；
Fig. 4-2 is the stitching position signal being exposed in embodiments of the invention using feux rouges mask plate on metacoxal plate Figure；
Fig. 5-1 is the structural representation of feux rouges mask plate in embodiments of the invention；
Fig. 5-2 is the stitching position signal being exposed in embodiments of the invention using feux rouges mask plate on metacoxal plate Figure；
Fig. 6-1 is the structural representation of feux rouges mask plate in embodiments of the invention；
Fig. 6-2 is the stitching position signal being exposed in embodiments of the invention using feux rouges mask plate on metacoxal plate Figure.
In the accompanying drawings, identical part uses identical reference.Accompanying drawing is not drawn according to the ratio of reality.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
As shown in figure 1, the invention provides a kind of method for improving splicing exposure nurse and drawing phenomenon, it is included with the first mask Version obtains the step of substrate with black matrix", i.e. the first processing procedure (BM), is obtained with colour cell unit with the second mask plate The step of substrate, i.e. the second processing procedure (R/G/B) and with the 3rd mask plate obtain with spacer material substrate the step of, i.e., the 3rd Processing procedure (PS), wherein, the area of exposure region not phase on the first mask plate, second mask plate and the 3rd mask plate Together.
In the prior art, due to the stitching position all same in each processing procedure on substrate, then splice nurse and draw (Mura) meeting The stitching portion of same position after every one of processing procedure further it is exacerbated so that splicing nurse draw (Mura) it is more and more brighter It is aobvious.
And in the present invention, then the stitching position in each processing procedure on substrate differs, therefore avoids multiple processing procedure Cause to splice nurse drawing (Mura) more and more obvious phenomenon afterwards, so as to improve quality of the panel in stitching portion.
Illustrated below exemplified by obtaining size as 1440mm × 815mm 65 " panels.Due to using common mask Version (1220mm × 1400mm) is exposed processing to substrate, and its effective exposure region size is 1120mm × 1300mm, therefore nothing Method just produces a complete 65 " panel by single exposure, but needs by exposure-processed at least twice, that is, to need more Secondary splicing is exposed to obtain the viewing area of panel.
In the present embodiment, every processing procedure uses four exposure-processeds.It is described as follows：
The first step, four exposure-processeds are carried out to substrate using the first mask plate, obtain the substrate with black matrix".Its In, the position exposed every time on substrate differs.
As shown in Fig. 2-1 and 2-2, the first mask plate includes different three exposure region of exposure area, i.e. A1、B1And C1, its Middle A1Exposure area SA1、B1Exposure area SB1And C1Exposure area SC1Meet following relationship：
SB1>SA1>SC1
Using the exposure region that exposure area is maximum, i.e. B1Double exposure processing, A are carried out to substrate1With C1Once exposed Light processing.The viewing area area of panel is S, then S meets following expression formula：
S=SA1+2SB1+SC1
Second step, four exposure-processeds are carried out to the substrate with black matrix" using the second mask plate, acquisition has color The substrate of group unit.
Wherein, the second mask plate includes being used to obtain the feux rouges mask plate of red photoresistance unit, for obtaining green photoresistance The green glow mask plate of unit and the blue light mask plate for obtaining blue light resistance unit；And feux rouges mask plate, green glow mask The area of exposure region differs in version and blue light mask plate.
First, as shown in Fig. 3-1 and 3-2, using feux rouges mask plate to four exposures of substrate row with black matrix" at Reason, the substrate with red photoresistance unit is obtained, and the position exposed every time on substrate differs.
Three different exposure regions of area of the feux rouges mask plate including exposure region, i.e. A2、B2And C2, wherein A2Plane of exposure Product SA2、B2Exposure area SB2And C2Exposure area SC2Meet following relationship group：
SB2>SA2>SC2
SA2≠SA1
SB2≠SB1
SC2≠SC1
Using the exposure region that exposure area is maximum, i.e. B2Double exposure processing, A are carried out to the substrate with black matrix"2With C2Carry out single exposure processing.The viewing area area of panel is S, then S meets following expression formula：
S=SA2+2SB2+SC2
Secondly, as shown in Fig. 4-1 and 4-2, using green glow mask plate to four exposures of substrate row with red photoresistance unit Light processing, the substrate with green photoresistance unit is obtained, and the position exposed every time on substrate differs.
Three different exposure regions of area of the green glow mask plate including exposure region, i.e. A3、B3And C3, wherein A3Plane of exposure Product SA3、B3Exposure area SB3And C3Exposure area SC3Meet following relationship group：
SB3>SA3>SC3
SA3≠SA2≠SA1
SB3≠SB2≠SB1
SC3≠SC2≠SC1
Using the exposure region that exposure area is maximum, i.e. B3Substrate with red photoresistance unit is carried out at double exposure Reason, A3With C3Carry out single exposure processing.The viewing area area of panel is S, then S meets following expression formula：
S=SA3+2SB3+SC3
Finally, as shown in Fig. 5-1 and 5-2, using blue light mask plate to four exposures of substrate row with green photoresistance unit Light processing, the substrate with blue light resistance unit is obtained, and the position exposed every time on substrate differs.
Three different exposure regions of area of the blue light mask plate including exposure region, i.e. A4、B4And C4；Wherein A4Plane of exposure Product SA4、B4Exposure area SB4And C4Exposure area SC4Meet following relationship group：
SB4>SA4>SC4
SA4≠SA3≠SA2≠SA1
SB4≠SB3≠SB2≠SB1
SC4≠SC3≠SC2≠SC1
Using the exposure region that exposure area is maximum, i.e. B4Substrate with green photoresistance unit is carried out at double exposure Reason, A4With C4Carry out single exposure processing.The viewing area area of panel is S, then S meets following expression formula：
S=SA4+2SB4+SC4
3rd step, as shown in Fig. 6-1 and 6-2, four are carried out to the substrate with blue light resistance unit using the 3rd mask plate Secondary exposure-processed, the substrate with spacer material is obtained, and the position exposed every time on substrate differs.
Three different exposure regions of area of 3rd mask plate including exposure region, i.e. A5、B5And C5；Wherein A5Plane of exposure Product SA5、B5Exposure area SB5And C5Exposure area SC5Meet following relationship group：
SB5>SA5>SC5
SA5≠SA4≠SA3≠SA2≠SA1
SB5≠SB4≠SB3≠SB2≠SB1
SC5≠SC4≠SC3≠SC2≠SC1
Using the exposure region that exposure area is maximum, i.e. B5Substrate with blue light resistance unit is carried out at double exposure Reason, A4With C4Carry out single exposure processing.The viewing area area of panel is S, then S meets following expression formula：
S=SA5+2SB5+SC5
It should be noted that in the present embodiment, the exposure order of multiple exposure regions of above-mentioned multiple mask plates follows life Produce time most short principle.
In the present invention, by the way that by each processing procedure, the area of the exposure region of mask plate is arranged to different, makes to splice on substrate The position at place is different, draws (Mura) phenomenon so as to weaken caused splicing nurse after multiple processing procedure, is put forward the quality of panel It is high.
Although by reference to preferred embodiment, invention has been described, is not departing from the situation of the scope of the present invention Under, various improvement can be carried out to it and part therein can be replaced with equivalent.Especially, as long as being rushed in the absence of structure Prominent, the every technical characteristic being previously mentioned in each embodiment can combine in any way.The invention is not limited in text Disclosed in specific embodiment, but all technical schemes including falling within the scope of the appended claims.

Claims (10)

  1. A kind of 1. method for improving splicing exposure nurse and drawing phenomenon, it is characterised in that comprise the following steps：
    The substrate with black matrix" is obtained with the first mask plate；
    The substrate with colour cell unit is obtained with the second mask plate；
    The substrate with spacer material is obtained with the 3rd mask plate；
    The area of exposure region differs on first mask plate, second mask plate and the 3rd mask plate.
  2. 2. the method according to claim 1 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that covered using described first Film version carries out exposure-processed at least twice to substrate and obtains the substrate with black matrix", the position exposed every time on substrate Differ.
  3. 3. the method according to claim 2 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that first mask plate Including different three exposure region of exposure area, double exposure processing is carried out to substrate using the maximum exposure region of exposure area.
  4. 4. the method according to claim 1 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that second mask plate Green glow mask plate including the feux rouges mask plate for obtaining red photoresistance unit, for obtaining green photoresistance unit and it is used for Obtain the blue light mask plate of blue light resistance unit；
    The area of exposure region differs on the feux rouges mask plate, the green glow mask plate and the blue light mask plate.
  5. 5. the method according to claim 4 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that covered using the feux rouges To the substrate row with black matrix", exposure-processed obtains the substrate with red photoresistance unit, substrate to film version at least twice On the position that exposes every time differ.
  6. 6. the method according to claim 5 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that covered using the green glow To the substrate row with red photoresistance unit, exposure-processed obtains the substrate with green photoresistance unit to film version at least twice, The position exposed every time on substrate differs.
  7. 7. the method according to claim 6 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that covered using the blue light To the substrate row with green photoresistance unit, exposure-processed obtains the substrate with blue light resistance unit to film version at least twice, The position exposed every time on substrate differs.
  8. 8. the method according to claim 7 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that the feux rouges mask Version, the green glow mask plate and the blue light mask plate three different exposure regions of the area including exposure region.
  9. 9. the method that the improvement splicing exposure nurse according to claim 7 or 8 draws phenomenon, it is characterised in that using described the Three mask plates carry out exposure-processed at least twice to the substrate with blue light resistance unit and obtain the substrate with spacer material, The position exposed every time on substrate differs.
  10. 10. the method according to claim 9 for improving splicing exposure nurse and drawing phenomenon, it is characterised in that the 3rd mask Version includes different three exposure region of exposure area, and substrate is carried out at double exposure using exposure area maximum exposure region Reason.
CN201710739084.4A 2017-08-25 2017-08-25 Method for improving splicing exposure Mura phenomenon Active CN107390478B (en)

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Application Number Priority Date Filing Date Title
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110967915A (en) * 2019-12-16 2020-04-07 深圳市华星光电半导体显示技术有限公司 Mask plate
WO2021068328A1 (en) * 2019-10-10 2021-04-15 Tcl华星光电技术有限公司 Spliced exposure system and spliced exposure method using same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1766723A (en) * 2004-10-26 2006-05-03 Lg.菲利浦Lcd株式会社 Method of manufacturing liquid crystal display device
CN103033975A (en) * 2012-12-12 2013-04-10 京东方科技集团股份有限公司 Mask plate and method for composing a picture with same
CN104407504A (en) * 2014-11-28 2015-03-11 南京中电熊猫液晶材料科技有限公司 Mosaic exposure method for color filter
CN105487333A (en) * 2016-01-04 2016-04-13 重庆京东方光电科技有限公司 Mask group, color film substrate and manufacturing method therefor, detection apparatus, and display apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1766723A (en) * 2004-10-26 2006-05-03 Lg.菲利浦Lcd株式会社 Method of manufacturing liquid crystal display device
CN103033975A (en) * 2012-12-12 2013-04-10 京东方科技集团股份有限公司 Mask plate and method for composing a picture with same
CN104407504A (en) * 2014-11-28 2015-03-11 南京中电熊猫液晶材料科技有限公司 Mosaic exposure method for color filter
CN105487333A (en) * 2016-01-04 2016-04-13 重庆京东方光电科技有限公司 Mask group, color film substrate and manufacturing method therefor, detection apparatus, and display apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021068328A1 (en) * 2019-10-10 2021-04-15 Tcl华星光电技术有限公司 Spliced exposure system and spliced exposure method using same
CN110967915A (en) * 2019-12-16 2020-04-07 深圳市华星光电半导体显示技术有限公司 Mask plate

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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: TCL Huaxing Photoelectric Technology Co.,Ltd.

Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd.