CN110967915A - Mask plate - Google Patents
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- CN110967915A CN110967915A CN201911290041.8A CN201911290041A CN110967915A CN 110967915 A CN110967915 A CN 110967915A CN 201911290041 A CN201911290041 A CN 201911290041A CN 110967915 A CN110967915 A CN 110967915A
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- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 238000000059 patterning Methods 0.000 abstract description 4
- 238000013519 translation Methods 0.000 abstract description 2
- 238000002834 transmittance Methods 0.000 description 30
- 238000000034 method Methods 0.000 description 28
- 238000010586 diagram Methods 0.000 description 10
- 238000012545 processing Methods 0.000 description 8
- 238000013461 design Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
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Abstract
The invention provides a mask, which comprises at least one group of mask groups, wherein each mask group comprises a first edge sub-mask, a second edge sub-mask and at least one middle sub-mask; the lengths of the first edge sub-mask, the second edge sub-mask and the middle sub-mask are the same, and at least two groups of different multiples exist, so that the sum of the width of the middle sub-mask multiplied by the width of the middle sub-mask and the width of the first edge sub-mask and the width of the second edge sub-mask is respectively the same as the lengths of two display panels with different sizes; and the two edges corresponding to the length of the middle sub-mask plate are provided with half-mask regions, one edge corresponding to the length of the first edge sub-mask plate and one edge corresponding to the length of the second edge sub-mask plate are provided with half-mask regions, and the half-mask regions are the same in size. According to the invention, the mask is set into a plurality of small-sized sub-masks, and the patterning of the large-sized display panel is realized by the translation of the sub-masks, so that the problem of high cost and large-sized mask manufacturing in the prior art is solved.
Description
Technical Field
The invention relates to the field of display, in particular to a mask.
Background
Reticles are important tools used in the display panel fabrication process to define panel design patterns. As semiconductor display technology is developed to be large, a larger mask is required for manufacturing a larger display panel, and the manufacturing of the larger mask increases the cost by orders of magnitude.
Therefore, the problem of manufacturing a high-cost large-size mask in the prior art needs to be solved.
Disclosure of Invention
The invention provides a mask plate, which is used for relieving the problem of manufacturing a high-cost large-size mask plate in the prior art.
In order to solve the above problems, the technical scheme provided by the invention is as follows:
the invention provides a mask, which comprises at least one mask group, wherein the mask group comprises:
the mask comprises a first edge sub-mask, a second edge sub-mask and at least one middle sub-mask; the lengths of a group of opposite sides of the first edge sub-mask, the second edge sub-mask and the middle sub-mask are the same, the length of the opposite side is recorded as the length of the sub-mask, and the length of the other opposite side is recorded as the width of the sub-mask; at least two groups of different multiples exist, so that the sum of the width of the middle sub-mask multiplied by the width of the middle sub-mask and the width of the second edge sub-mask is respectively the same as the lengths of two display panels with different sizes; and two edges corresponding to the length of the middle sub-mask are provided with half-mask regions, one edge corresponding to the length of the first edge sub-mask and one edge corresponding to the length of the second edge sub-mask are provided with half-mask regions, and the half-mask regions are the same in size.
In the mask provided by the invention, the width of the first edge sub-mask is equal to that of the second edge sub-mask.
In the mask provided by the invention, the width of the first edge sub-mask is not equal to that of the second edge sub-mask.
In the mask provided by the invention, the mask only comprises one mask group.
In the mask provided by the invention, the mask group only comprises one intermediate sub-mask.
In the mask provided by the invention, a half-mask area is arranged on one side of the first edge sub-mask close to the width corresponding to the middle sub-mask, a half-mask area is arranged on one side of the second edge sub-mask close to the width corresponding to the middle sub-mask, and half-mask areas are arranged on two sides of the middle sub-mask corresponding to the width; and the sizes of the half mask areas are the same.
In the mask provided by the invention, the mask comprises a first mask group, a second mask group and a third mask group.
In the mask provided by the invention, the first mask group, the second mask group and the third mask group only comprise one intermediate sub-mask.
In the mask provided by the invention, the lengths of all the sub-masks in the same grinding group are equal; the widths of the first edge sub-masks in different mask groups are equal, the widths of the second edge sub-masks are equal, and the widths of the middle sub-masks are equal.
In the mask provided by the invention, in the first mask group, a semi-mask area is arranged on one side corresponding to the width of the sub-mask; in the second mask group, two edges corresponding to the widths of the sub-masks are provided with semi-mask regions; in the third mask group, a half-mask area is arranged on one side corresponding to the width of the sub-masks; and the sizes of the half mask regions of the sub-masks with the same width are the same.
The invention provides a mask, which comprises at least one group of mask groups, wherein each mask group comprises a first edge sub-mask, a second edge sub-mask and at least one middle sub-mask; the lengths of a group of opposite sides of the first edge sub-mask, the second edge sub-mask and the middle sub-mask are the same, the length of the opposite side is recorded as the length of the sub-mask, and the length of the other opposite side is recorded as the width of the sub-mask; at least two groups of different multiples exist, so that the sum of the width of the middle sub-mask multiplied by the width of the middle sub-mask and the width of the second edge sub-mask is respectively the same as the lengths of two display panels with different sizes; and the two edges corresponding to the length of the middle sub-mask are provided with half-mask regions, one edge corresponding to the length of the first edge sub-mask and one edge corresponding to the length of the second edge sub-mask are provided with half-mask regions, and the half-mask regions are the same in size. According to the invention, the mask is set into a plurality of small-sized sub-masks, and the small-sized sub-masks are translated, so that patterning treatment of a large-sized display panel is realized, and the problem of high cost and large-sized mask manufacturing in the prior art is solved.
Drawings
The technical solution and other advantages of the present application will become apparent from the detailed description of the embodiments of the present application with reference to the accompanying drawings.
Fig. 1 is a first structural diagram of a mask according to an embodiment of the present invention.
Fig. 2 is a size diagram of a display panel to which a first structure diagram of a mask according to an embodiment of the present invention is applied.
Fig. 3 is a second structural diagram of a mask according to an embodiment of the present invention.
Fig. 4 is a size diagram of a display panel to which a second structure diagram of a mask according to an embodiment of the present invention is applied.
Detailed Description
While the embodiments and/or examples of the present invention will be described in detail and fully with reference to the specific embodiments thereof, it should be understood that the embodiments and/or examples described below are only a part of the embodiments and/or examples of the present invention and are not intended to limit the scope of the invention. All other embodiments and/or examples, which can be obtained by a person skilled in the art without making any inventive step, based on the embodiments and/or examples of the present invention, belong to the scope of protection of the present invention.
Directional terms used in the present invention, such as [ upper ], [ lower ], [ left ], [ right ], [ front ], [ rear ], [ inner ], [ outer ], [ side ], are only referring to the directions of the attached drawings. Accordingly, the directional terminology is used for the purpose of describing and understanding the invention and is in no way limiting. The terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature.
Aiming at the problem of manufacturing a high-cost large-size mask in the prior art, the invention provides the mask which can relieve the problem.
In an embodiment, as shown in fig. 1 and fig. 3, a reticle provided in an embodiment of the present invention includes at least one reticle set, where the reticle set includes:
the mask comprises a first edge sub-mask, a second edge sub-mask and at least one middle sub-mask; the lengths of a group of opposite sides of the first edge sub-mask, the second edge sub-mask and the middle sub-mask are the same, the length of the opposite side is recorded as the length of the sub-mask, and the length of the other opposite side is recorded as the width of the sub-mask; at least two groups of different multiples exist, so that the sum of the width of the middle sub-mask multiplied by the width of the middle sub-mask and the width of the second edge sub-mask is respectively the same as the lengths of two display panels with different sizes; and the two edges corresponding to the length of the middle sub-mask are provided with half-mask regions, one edge corresponding to the length of the first edge sub-mask and one edge corresponding to the length of the second edge sub-mask are provided with half-mask regions, and the half-mask regions are the same in size.
The mask is set into at least one mask set, the mask set comprises a first edge sub-mask, a second edge sub-mask and a middle sub-mask, and the first edge sub-mask, the second edge sub-mask and the middle sub-mask are combined through translation of the middle sub-mask, so that patterning processing of a large-size display panel is achieved, and the problem of manufacturing of a high-cost large-size mask in the prior art is solved.
The mask provided by the invention may only include one mask set or may include a plurality of mask sets, and the mask set may only include one intermediate sub-mask or may include a plurality of intermediate sub-masks, and the mask provided by the invention will be described in detail with reference to specific embodiments.
In an embodiment, as shown in fig. 1, fig. 1 is a first structural diagram of a mask provided in an embodiment of the present invention. In the present embodiment, the reticles only include one reticle set 100, and the reticle set 100 includes a first edge sub-reticle 110, a second edge sub-reticle 120 and a middle sub-reticle 130.
The first edge sub-reticle 110 is rectangular and includes a first edge 111, a second edge 112, a third edge 113 and a fourth edge 114, wherein the first edge 111 and the third edge 113 are long, and the second edge 112 and the fourth edge 114 are wide; the second edge sub-mask 120 is rectangular and includes a fifth edge 121, a sixth edge 122, a seventh edge 123 and an eighth edge 124, wherein the fifth edge 121 and the seventh edge 123 are long, and the sixth edge 122 and the eighth edge 124 are wide; the middle sub-reticle 130 is also rectangular in shape and includes a ninth side 131, a tenth side 132, an eleventh side 133, and a twelfth side 134, wherein the ninth side 131 and the eleventh side 133 are long, and the tenth side 132 and the twelfth side 134 are wide.
The lengths of the first side 111, the third side 113, the fifth side 121, the seventh side 123, the ninth side 131 and the eleventh side 133 are all 928.26mm, the lengths of the second side 112 and the fourth side 114 are 51.57mm, the lengths of the seventh side 123 and the eighth side 124 are 515.7mm, and the lengths of the tenth side 132 and the twelfth side 134 are 51.57 mm. In other embodiments, the lengths of the second side 112 and the tenth side 132 may be set differently, such as the length of the second side 112 and the fourth side 114 being 41.57mm, and the length of the tenth side 132 and the twelfth side 134 being 61.57 mm.
A first half-masked area 115 is arranged on the third edge 113, a second half-masked area 125 is arranged on the fifth edge 121, a third half-masked area 126 is arranged on the seventh edge 123, and a fourth half-masked area 135 is arranged on the ninth edge 131. The size of the first half-masked region 115, the size of the second half-masked region 125, the size of the third half-masked region 126 and the size of the fourth half-masked region 135 are all the same. The transmittance of the first half-masked region 115 and the third half-masked region 126 is equal, the transmittance of the second half-masked region 125 and the fourth half-masked region 135 is equal, and the total transmittance of the first half-masked region 115 and the second half-masked region 125 is equal to the transmittance of the non-half-masked region. The semi-mask area can be any one of a mosaic area, a semi-shading area or a grating area.
The mask provided by the embodiment can be used for carrying out exposure treatment on the display panels in the following table, wherein the display panels respectively comprise 37-inch, 44-inch, 58-inch, 75-inch and 93-inch display panels, and specific data corresponding to the display panels are shown in table 1.
| Panel numbering | Ⅰ | Ⅱ | Ⅲ | Ⅳ | Ⅴ |
| Size of panel | 37 inch (u) | 44 cun (44 cun) | 58 cun (58 cun) | 75 cun below the normal position | 93 cun (93 cun) |
| Long (mm) | 928.26 | 928.26 | 928.26 | 928.26 | 928.26 |
| Width (mm) | 103.14 | 618.84 | 1134.54 | 1650.24 | 2165.94 |
| Aspect ratio | 1:9 | 6:9 | 11:9 | 16:9 | 21:9 |
| Resolution ratio | 240×2160 | 1440×2160 | 2640×2160 | 3840×2160 | 5040×2160 |
| Number of exposures | 2 | 3 | 4 | 5 | 6 |
TABLE 1
Referring to fig. 2 and table 1, fig. 2 is a size diagram of a display panel suitable for the mask provided in the present embodiment. The length of the 37-inch display panel I is 928.26mm, and the width of the display panel I is 103.14 mm; 103.14mm is equal to the sum of the width 51.57mm of the first edge sub-reticle 110 and the width 51.57mm of the second edge sub-reticle 130. Therefore, the display panel i can be subjected to the combined exposure process by the first edge sub-mask 110 and the second edge sub-mask 130.
Specifically, a display panel I to be exposed is placed on an exposure machine table, and the display panel I is aligned; aligning one side of the first edge mask 110, which is not provided with a half mask area, with the upper edge of the display panel I, aligning two sides of the first edge mask 110, where the width is located, with two sides of the display panel I, and performing first exposure treatment on the display panel I; aligning one edge of the second edge mask plate 130, which is not provided with the half-mask area, with the lower edge of the display panel I, aligning two edges of the second edge mask plate 130, where the width is located, with two side edges of the display panel I, aligning the half-mask area of the second edge mask plate 130 with the half-exposure area of the display panel I, and performing exposure treatment on the display panel I for the second time. Namely, the exposure process of the whole display panel I is completed by adopting two times of exposure.
The 44-inch display panel II is 928.26mm long and 618.84mm wide; 618.84mm is equal to the sum of the width of the first edge sub-reticle 110 of 51.57mm, the width of the second edge sub-reticle 130 of 51.57mm, and the width of the middle sub-reticle 120 of 515.7 mm. Therefore, the display panel ii can be subjected to the combined exposure process by the first edge sub-mask 110, the second edge sub-mask 130, and the middle sub-mask 120.
Specifically, a display panel II to be exposed is placed on an exposure machine table, and the display panel II is aligned; aligning one side of the first edge mask 110, which is not provided with the half mask area, with the upper edge of the display panel II, aligning two sides of the first edge mask 110, where the width is located, with two sides of the display panel II, and performing first exposure treatment on the display panel I; placing the second half mask area 125 of the middle sub-mask 120 at the position of the first half mask area 115 of the first edge mask 110 in the previous exposure process, aligning two sides of the middle sub-mask 120 with two sides of the display panel II, and performing second exposure treatment on the display panel II; and (3) placing the fourth half mask area 135 of the second edge mask plate 130 at the position of the third half mask area 126 of the middle sub-mask plate 120 in the previous exposure process, aligning two edges where the width of the second edge mask plate 130 is located with two side edges of the display panel II, aligning one edge of the second edge mask plate 130 without the half mask area with the lower edge of the display panel II, and performing exposure treatment on the display panel II for the third time. Namely, the exposure process of the whole display panel II is completed by adopting three times of exposure.
The length of the 58-inch display panel III is 928.26mm, and the width of the display panel III is 1134.54 mm; 1134.54mm is equal to the sum of the width 51.57mm of the first edge sub-reticle 110, the width 51.57mm of the second edge sub-reticle 130, and the width 515.7mm of the 2 times middle sub-reticle 120. Therefore, the display panel iii can be subjected to the combined exposure process by the first edge sub-mask 110, the second edge sub-mask 130, and the middle sub-mask 120.
Specifically, a display panel III to be exposed is placed on an exposure machine, and the display panel III is aligned; aligning one side of the first edge mask 110, which is not provided with the half mask area, with the upper edge of the display panel III, aligning two sides of the first edge mask 110, where the width is located, with two sides of the display panel II, and performing first exposure treatment on the display panel III; placing the second half mask area 125 of the middle sub-mask 120 at the position of the first half mask area 115 of the first edge mask 110 in the previous exposure process, aligning two sides of the middle sub-mask 120 with two sides of the display panel III, and performing second exposure treatment on the display panel III; the middle sub-mask 120 is translated downwards, the second half-mask area 125 of the middle sub-mask 120 is placed at the position of the third half-mask area 126 of the middle sub-mask 120 in the previous exposure process, two sides of the middle sub-mask 120 where the width is located are aligned with two sides of the display panel III, and third exposure processing is carried out on the display panel III; the fourth half mask area 135 of the second edge mask plate 130 is placed at the position of the third half mask area 126 of the middle sub-mask plate 120 in the previous exposure process, two edges where the width of the second edge mask plate 130 is located are aligned with two side edges of the display panel III, one edge of the second edge mask plate 130 where the half mask area is not arranged is aligned with the lower edge of the display panel III, and fourth exposure processing is carried out on the display panel III. Namely, four exposures are adopted, and the exposure process of the whole display panel III is completed.
The 75-inch display panel IV is 928.26mm long and 1650.24mm wide; 1650.24mm is equal to the sum of the width 51.57mm of the first edge sub-reticle 110, the width 51.57mm of the second edge sub-reticle 130, and the width 515.7mm of the 3 times middle sub-reticle 120. Therefore, the display panel iii can be subjected to the combined exposure process by the first edge sub-mask 110, the second edge sub-mask 130, and the middle sub-mask 120.
Specifically, a display panel III to be exposed is placed on an exposure machine, and the display panel III is aligned; aligning one side of the first edge mask 110, which is not provided with the half mask area, with the upper edge of the display panel III, aligning two sides of the first edge mask 110, where the width is located, with two sides of the display panel II, and performing first exposure treatment on the display panel III; placing the second half mask area 125 of the middle sub-mask 120 at the position of the first half mask area 115 of the first edge mask 110 in the previous exposure process, aligning two sides of the middle sub-mask 120 with two sides of the display panel III, and performing second exposure treatment on the display panel III; the middle sub-mask 120 is translated downwards, the second half-mask area 125 of the middle sub-mask 120 is placed at the position of the third half-mask area 126 of the middle sub-mask 120 in the previous exposure process, two sides of the middle sub-mask 120 where the width is located are aligned with two sides of the display panel III, and third exposure processing is carried out on the display panel III; repeating the previous step, and carrying out fourth exposure treatment on the display panel III; the fourth half mask area 135 of the second edge mask plate 130 is placed at the position of the third half mask area 126 of the middle sub-mask plate 120 in the previous exposure process, two edges where the width of the second edge mask plate 130 is located are aligned with two side edges of the display panel III, one edge of the second edge mask plate 130 where the half mask area is not located is aligned with the lower edge of the display panel III, and fifth exposure processing is performed on the display panel III. Namely, five exposures are adopted, and the exposure process of the whole display panel III is completed.
The 93-inch display panel V is 928.26mm long and 2165.94mm wide; 2165.94mm is equal to the sum of the width 51.57mm of the first edge sub-reticle 110, the width 51.57mm of the second edge sub-reticle 130, and the width 515.7mm of the 4 times middle sub-reticle 120. Therefore, the display panel iii can be subjected to the combined exposure process by the first edge sub-mask 110, the second edge sub-mask 130, and the middle sub-mask 120.
Specifically, a display panel III to be exposed is placed on an exposure machine, and the display panel III is aligned; aligning one side of the first edge mask 110, which is not provided with the half mask area, with the upper edge of the display panel III, aligning two sides of the first edge mask 110, where the width is located, with two sides of the display panel II, and performing first exposure treatment on the display panel III; placing the second half mask area 125 of the middle sub-mask 120 at the position of the first half mask area 115 of the first edge mask 110 in the previous exposure process, aligning two sides of the middle sub-mask 120 with two sides of the display panel III, and performing second exposure treatment on the display panel III; the middle sub-mask 120 is translated downwards, the second half-mask area 125 of the middle sub-mask 120 is placed at the position of the third half-mask area 126 of the middle sub-mask 120 in the previous exposure process, two sides of the middle sub-mask 120 where the width is located are aligned with two sides of the display panel III, and third exposure processing is carried out on the display panel III; repeating the previous step twice, and respectively carrying out fourth exposure treatment and fifth exposure treatment on the display panel III; the fourth half mask area 135 of the second edge mask plate 130 is placed at the position of the third half mask area 126 of the middle sub-mask plate 120 in the previous exposure process, two edges where the width of the second edge mask plate 130 is located are aligned with two side edges of the display panel III, one edge of the second edge mask plate 130 where the half mask area is not arranged is aligned with the lower edge of the display panel III, and sixth exposure processing is performed on the display panel III. Namely, six exposures are adopted, and the exposure process of the whole display panel III is completed.
In an embodiment, as shown in fig. 3, fig. 3 is a second structural diagram of a mask provided in an embodiment of the invention. In this embodiment, the masks include three mask sets, including a first mask set 310, a second mask set 320, and a third mask set 330, where the first mask set 310 includes a first edge sub-mask 311, a second edge sub-mask 313, and a first middle sub-mask 312, the second mask set 320 includes a third edge sub-mask 321, a fourth edge sub-mask 323, and a second middle sub-mask 322, and the third mask set 330 includes a fifth edge sub-mask 331, a sixth edge sub-mask 333, and a third middle sub-mask 332.
The lengths of the first edge sub-mask 311, the second edge sub-mask 313 and the first intermediate sub-mask 312 are 20.2mm, the lengths of the third edge sub-mask 321, the fourth edge sub-mask 323 and the second intermediate sub-mask 322 are 887.86mm, and the lengths of the fifth edge sub-mask 331, the sixth edge sub-mask 333 and the third intermediate sub-mask 332 are 20.2 mm. The widths of the first edge sub-mask 311, the third edge sub-mask 321 and the fifth edge sub-mask 331 are 51.57mm, the widths of the second edge sub-mask 313, the fourth edge sub-mask 323 and the sixth edge sub-mask 333 are also 51.57mm, and the widths of the first middle sub-mask 312, the second middle sub-mask 322 and the third middle sub-mask 332 are 515.7 mm.
In the first mask set 310, the first edge sub-mask 311 has a first half-mask region 3111 on the side close to the first middle sub-mask 312, and a second half-mask region 3112 on the side close to the third edge sub-mask 321; the first middle sub-mask 312 is provided with a third half-mask region 3121 on the side close to the first edge sub-mask 311, a fourth half-mask region 3122 on the side close to the second middle sub-mask 322, and a fifth half-mask region 3123 on the side close to the second edge sub-mask 313; the second edge sub-mask 313 is provided with a sixth half-masked region 3131 on the side close to the first middle sub-mask 312, and a seventh half-masked region 3132 on the side close to the fourth edge sub-mask 323.
In the second mask group 320, the third edge sub-mask 321 is provided with an eighth half mask region 3211 on the side close to the second middle sub-mask 322, a ninth half mask region 3212 on the side close to the first edge sub-mask 311, and a tenth half mask region 3213 on the side close to the fifth edge sub-mask 331; an eleventh half mask region 3221 is arranged on the edge, close to the third edge sub-mask plate 321, of the second middle sub-mask plate 322, a twelfth half mask region 3222 is arranged on the edge, close to the first middle sub-mask plate 312, a thirteenth half mask region 3223 is arranged on the edge, close to the fourth edge sub-mask plate 323, and a fourteenth half mask region 3224 is arranged on the edge, close to the third middle sub-mask plate 332; the fourth edge sub-mask 323 is provided with a fifteenth half mask area 3231 on the edge close to the second middle sub-mask 322, a sixteenth half mask area 3232 on the edge close to the second edge sub-mask 313, and a seventeenth half mask area 3233 on the edge close to the sixth edge sub-mask 333.
In the third mask group 330, an eighteenth half mask region 3311 is arranged on the fifth edge sub-mask 331 near the third middle sub-mask 332, and a nineteenth half mask region 3312 is arranged on the edge near the third edge sub-mask 321; the third middle sub-mask 332 is provided with a twentieth half mask region 3321 on the side close to the fifth edge sub-mask 331, a twentieth half mask region 3322 on the side close to the second middle sub-mask 322, and a twenty-twelfth half mask region 3323 on the side close to the sixth edge sub-mask 33; the sixth edge sub-mask 333 is provided with a twenty-third half-mask region 3331 on the side close to the third middle sub-mask 332, and a twenty-fourth half-mask region 3332 on the side close to the fourth edge sub-mask 323.
The first half-masked zone 3111, the third half-masked zone 3121, the fifth half-masked zone 3123, and the sixth half-masked zone 3131 are the same in size, the transmittances of the first half-masked zone 3111 and the fifth half-masked zone 3123 are equal, the transmittances of the third half-masked zone 3121 and the sixth half-masked zone 3131 are equal, and the total transmittance of the first half-masked zone 3111 and the third half-masked zone 3121 is equal to the transmittance of the non-half-masked zone.
The eighth half-masked region 3211, the eleventh half-masked region 3221, the fifteenth half-masked region 3223 and the seventeenth half-masked region 3231 have the same size, the transmittances of the eighth half-masked region 3211 and the fifteenth half-masked region 3223 are equal, the transmittances of the eleventh half-masked region 3221 and the seventeenth half-masked region 3231 are equal, and the total transmittances of the eighth half-masked region 3211 and the eleventh half-masked region 3221 are equal to the transmittance of the non-half-masked region.
The eighteenth half mask region 3311, the twentieth half mask region 3221, the twenty-second half mask region 3323, and the twenty-third half mask region 3331 are the same in size, the transmittances of the eighteenth half mask region 3311 and the twenty-second half mask region 3323 are equal, the transmittances of the twentieth half mask region 3221 and the twenty-third half mask region 3331 are equal, and the total transmittance of the eighteenth half mask region 3311 and the twentieth half mask region 3221 is equal to the transmittance of the non-half mask region.
The sizes of the second half-masked region 3112, the ninth half-masked region 3212, the tenth half-masked region 3213 and the nineteenth half-masked region 3213 are the same, the transmittances of the second half-masked region 3112 and the tenth half-masked region 3213 are equal, the transmittances of the ninth half-masked region 3212 and the nineteenth half-masked region 3213 are equal, and the total transmittances of the second half-masked region 311 and the ninth half-masked region 3212 are equal to the transmittance of the non-half-masked region.
The fourth half-masked region 3122, the twelfth half-masked region 3222, the fourteenth half-masked region 3224 and the twentieth half-masked region 3322 have the same size, the transmittance of the fourth half-masked region 3122 and the transmittance of the fourteenth half-masked region 3224 are equal, the transmittance of the twelfth half-masked region 3222 and the transmittance of the twentieth half-masked region 3322 are equal, and the total transmittance of the fourth half-masked region 3122 and the twelfth half-masked region 3222 is equal to the transmittance of the non-half-masked region.
The seventh half masked zone 3132, the sixteenth half masked zone 3232, the seventeenth half masked zone 3233, the twenty-fourth half masked zone 3332 are the same size, the transmittances of the seventh half masked zone 3132 and the seventeenth half masked zone 3233 are equal, the transmittances of the sixteenth half masked zone 3232 and the twenty-fourth half masked zone 3332 are equal, and the total transmittances of the seventh half masked zone 3132 and the sixteenth half masked zone 3232 are equal to the transmittance of the non-half masked zone.
The semi-mask area can be any one of a mosaic area, a semi-shading area or a grating area.
The mask provided by the embodiment can be used for carrying out exposure treatment on the display panels in the following table, wherein the display panels comprise 65-inch display panels and 75-inch display panels, and specific data corresponding to the display panels are shown in table 2.
| Panel numbering | ⅰ | ⅱ |
| Size of panel | 65 cun in the front of the body | 75 cun below the normal position |
| Long (mm) | 40.4 | 928.26 |
| Width (mm) | 1650.24 | 1650.24 |
| Aspect ratio | Strip screen | 9:16 |
| Resolution ratio | 3840×94 | 3840×2160 |
| Number of exposures | 10 | 15 |
TABLE 2
Referring to fig. 4 and table 2, fig. 4 is a size diagram of a display panel suitable for the mask provided in the present embodiment. The length of the display panel i is 40.4mm, and the width is 1650.24 mm; 40.4mm is equal to the sum of the length of 20.2mm for the first reticle set 310 and the length of 20.2mm for the third reticle set 330; 1650.24mm is equal to the sum of the width of the first edge sub-reticle 311, 51.57mm, the width of the second edge sub-reticle 313, and 3 times the width of the first center sub-reticle, 51.57 mm. Therefore, the display panel i can be subjected to the combined exposure process by the first reticle set 310 and the third reticle set 330.
The specific exposure method is similar to the exposure method of the display panel iii in the above embodiment, and the exposure process of the whole display panel i is completed by one exposure of the first edge sub-mask 311, three exposures of the first middle sub-mask 312, one exposure of the second edge sub-mask 313, one exposure of the fifth edge sub-mask 331, three exposures of the third middle sub-mask 332, and one exposure of the sixth edge sub-mask 333, which are ten exposures.
The difference is that when the first edge sub-mask 311, the second edge sub-mask 313 and the first middle sub-mask 312 are used for exposure, the width of the left side of the sub-mask is aligned with the left side of the display panel, and the width of the right side of the sub-mask has no alignment requirement; when the fifth edge sub-mask 331, the sixth edge sub-mask 333 and the third middle sub-mask 332 are exposed, the width of the right side of the sub-mask is aligned with the right side of the display panel, and the half-mask regions on the left side of the sub-mask are respectively overlapped with the corresponding sub-masks in the first mask group at the positions of the half-mask regions in the previous exposure process. Specific reference is made to the above embodiments, which are not described herein again.
The length of the display panel ii is 928.26mm, and the width of the display panel ii is 1650.24 mm; 928.26mm is equal to the sum of the length of 20.2mm for first reticle set 310, the length of 887.86mm for second reticle set 320, and the length of 20.2mm for third reticle set 330; 1650.24mm is equal to the sum of the width of the first edge sub-reticle 311, 51.57mm, the width of the second edge sub-reticle 313, and 3 times the width of the first center sub-reticle, 51.57 mm. Therefore, the display panel ii can be exposed by the first reticle set 310, the second reticle set 320 and the third reticle set 330. The specific exposure method is similar to that of the display panel i in the above embodiment, and reference may be made to the above embodiment for details, which are not described herein again.
According to the above embodiments:
the embodiment of the invention provides a mask, which comprises at least one mask group, wherein the mask group comprises a first edge sub-mask, a second edge sub-mask and at least one middle sub-mask; the lengths of a group of opposite sides of the first edge sub-mask, the second edge sub-mask and the middle sub-mask are the same, the length of the opposite side is recorded as the length of the sub-mask, and the length of the other opposite side is recorded as the width of the sub-mask; at least two groups of different multiples exist, so that the sum of the width of the middle sub-mask multiplied by the width of the middle sub-mask and the width of the second edge sub-mask is respectively the same as the lengths of two display panels with different sizes; and the two edges corresponding to the length of the middle sub-mask are provided with half-mask regions, one edge corresponding to the length of the first edge sub-mask and one edge corresponding to the length of the second edge sub-mask are provided with half-mask regions, and the half-mask regions are the same in size. According to the embodiment of the invention, the mask is set into the plurality of small-sized sub-masks, and the small-sized sub-masks are translated, so that patterning processing of the large-sized display panel is realized, and the problem of high cost and large-sized mask manufacturing in the prior art is solved.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.
Claims (10)
1. A mask, comprising at least one set of mask group, the mask group comprising:
the mask comprises a first edge sub-mask, a second edge sub-mask and at least one middle sub-mask; the lengths of a group of opposite sides of the first edge sub-mask, the second edge sub-mask and the middle sub-mask are the same, the length of the opposite side is recorded as the length of the sub-mask, and the length of the other opposite side is recorded as the width of the sub-mask; at least two groups of different multiples exist, so that the sum of the width of the middle sub-mask multiplied by the width of the middle sub-mask and the width of the second edge sub-mask is respectively the same as the lengths of two display panels with different sizes; and two edges corresponding to the length of the middle sub-mask are provided with half-mask regions, one edge corresponding to the length of the first edge sub-mask and one edge corresponding to the length of the second edge sub-mask are provided with half-mask regions, and the half-mask regions are the same in size.
2. The reticle of claim 1, wherein the width of the first edge sub-reticle and the width of the second edge sub-reticle are equal.
3. The reticle of claim 1, wherein a width of the first edge sub-reticle and a width of the second edge sub-reticle are not equal.
4. The reticle of claim 1, wherein the reticle comprises only one set of reticle sets.
5. The reticle of claim 4, wherein the set of reticles includes only one intermediate reticle.
6. The mask according to claim 5, wherein a half-mask region is arranged on one side of the first edge sub-mask corresponding to the width of the middle sub-mask, a half-mask region is arranged on one side of the second edge sub-mask corresponding to the width of the middle sub-mask, and a half-mask region is arranged on both sides of the middle sub-mask corresponding to the width; and the sizes of the half mask areas are the same.
7. The reticle of claim 1, wherein the reticle comprises a first reticle set, a second reticle set, and a third reticle set.
8. The reticle of claim 7, wherein the first reticle set, the second reticle set, and the third reticle set all comprise only one intermediate reticle.
9. The reticle of claim 8, wherein the length of each sub-reticle in a same grinding group is equal; the widths of the first edge sub-masks in different mask groups are equal, the widths of the second edge sub-masks are equal, and the widths of the middle sub-masks are equal.
10. The mask according to claim 9, wherein a half-masked area is provided on one side corresponding to the width of the sub-masks in the first mask group; in the second mask group, two edges corresponding to the widths of the sub-masks are provided with semi-mask regions; in the third mask group, a half-mask area is arranged on one side corresponding to the width of the sub-masks; and the sizes of the half mask regions of the sub-masks with the same width are the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911290041.8A CN110967915A (en) | 2019-12-16 | 2019-12-16 | Mask plate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911290041.8A CN110967915A (en) | 2019-12-16 | 2019-12-16 | Mask plate |
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| CN101986206A (en) * | 2010-07-30 | 2011-03-16 | 南京中电熊猫液晶显示科技有限公司 | Method for utilizing functional mask board to manufacture mask substrate for solidifying sealing glue |
| WO2014040304A1 (en) * | 2012-09-12 | 2014-03-20 | 深圳市华星光电技术有限公司 | Mask and manufacturing method therefor |
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| CN106200254A (en) * | 2016-07-11 | 2016-12-07 | 京东方科技集团股份有限公司 | Mask plate and mask exposure system, splicing exposure method, substrate |
| CN107390478A (en) * | 2017-08-25 | 2017-11-24 | 深圳市华星光电技术有限公司 | Improve the method that splicing exposure nurse draws phenomenon |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101986206A (en) * | 2010-07-30 | 2011-03-16 | 南京中电熊猫液晶显示科技有限公司 | Method for utilizing functional mask board to manufacture mask substrate for solidifying sealing glue |
| WO2014040304A1 (en) * | 2012-09-12 | 2014-03-20 | 深圳市华星光电技术有限公司 | Mask and manufacturing method therefor |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
| CN106200254A (en) * | 2016-07-11 | 2016-12-07 | 京东方科技集团股份有限公司 | Mask plate and mask exposure system, splicing exposure method, substrate |
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