CN106200254B - Mask plate and mask exposure system, splicing exposure method, substrate - Google Patents
Mask plate and mask exposure system, splicing exposure method, substrate Download PDFInfo
- Publication number
- CN106200254B CN106200254B CN201610543835.0A CN201610543835A CN106200254B CN 106200254 B CN106200254 B CN 106200254B CN 201610543835 A CN201610543835 A CN 201610543835A CN 106200254 B CN106200254 B CN 106200254B
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- exposure
- exposure area
- light
- shielding pattern
- mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The present invention provides a kind of mask plate and mask exposure systems, splicing exposure method, in the present invention, the first exposure area is arranged in first side edge in main body exposure area, third exposure area is arranged in second side edge, also sets up the second exposure area between the first exposure area and third exposure area；Wherein, the light-shielding pattern of first exposure area is identical as the light-shielding pattern of second side edge of second exposure area, and the light-shielding pattern suitable for the second side edge to the second exposure area blocks；The light-shielding pattern of the third exposure area is identical as the light-shielding pattern of first side edge of second exposure area, and the light-shielding pattern suitable for the first side edge to the second exposure area blocks；First side and described second side are opposite two sides.Scheme provided by the invention can make the utilization rate of mask plate be improved, to promote the efficiency of exposure mask.
Description
Technical field
The present invention relates to mask exposure technical field more particularly to a kind of mask plate and mask exposure systems, splicing exposure
Method, substrate.
Background technique
In order to meet the needs of large-area displays, show that the size of touch panel is increasing, display therein/touch-control base
The manufacturing process of plate is also more complicated.In order to increase display/touch base plate size, the size of mask is also required to increase therewith
Greatly, but manufacture is difficult, cost is excessively high, day since exposure machine has the restriction of mask size and large scale mask
The problems such as inconvenient for use is often stored, so that needing to draw large-sized display/touch base plate when manufacturing display/touch base plate
It is divided into several regions, and successively each region is exposed using mask plate, finally pieces together large-sized display/touch-control base
Plate.Progress in splicing exposure process, usually using baffle to splicing exposure area has been completed on display/touch base plate
It blocks, to avoid exposing exposed region again.But since baffle is generally positioned at the top of mask plate,
Farther out apart from display/touch base plate, therefore at the edge of baffle diffraction phenomena can be generated, the light of diffraction still may be to
The region of exposure is exposed again.In order to avoid such case, metal screening can be generally set on mask plate in the prior art
Striation is blocked.
It referring to Fig. 1 and Fig. 2, is a kind of structural schematic diagram of mask plate in the prior art, including display/touch-control exposure region
Domain A (for being exposed to display/touch area) and positioned at display/touch-control exposure area two sides cabling exposure area B1 and
B2；It wherein is provided with metal strip C1 and C2 on display/touch-control exposure area A, for blocking light, avoids having exposed
The region of light is exposed again, and display/touch-control exposure area A is divided into the region A1, A2 and A3 by metal strip C1 and C2.First
In secondary exposure process, in order to avoid metal strip C is exposed on display/touch base plate, by the metal strip C1 and metal strip in left side
Mask plate on the right side of C1 blocks, and realizes the exposure of the part touch-control figure in left side cabling and left side, except for the first time and most
Afterwards in primary exposure process, in order to avoid metal strip influences to expose, it is both needed to the area on the left of metal strip C1 and metal strip C1
Region on the right side of domain and metal strip C2 and metal strip C2 is blocked, and is only able to use the region A2 in this way and is exposed, and is exposed
Low efficiency.
And if metal strip C1 and C2 are produced on display/touch-control exposure area edge, in the first exposure process
In, in order to avoid metal strip C1 influences to expose, need all to block the part on the right side of metal strip C1 and metal strip C1, namely
It is only to expose cabling exposure area, and entire display/touch-control exposure area A is all blocked, also will affect the efficiency of exposure.
Summary of the invention
It is an object of the present invention to improve exposure efficiency when splicing exposure.
In a first aspect, the mask plate includes main body exposure area and walks line exposing the present invention provides a kind of mask plate
Region；The cabling exposure area is located at the first side and second side of the main body exposure area；The main body exposure area packet
Include the first exposure area, the second exposure area and third exposure area；Wherein the first exposure area is located at the main body exposure region
The first side edge in domain, the third exposure area are located at the second side edge of the main body exposure area；First exposure
Region and the third exposure area are adjacent with second exposure area；
Wherein, the shading figure of the second side edge of the light-shielding pattern of first exposure area and second exposure area
Case is identical, and the light-shielding pattern suitable for the second side edge to the second exposure area blocks；The screening of the third exposure area
Light pattern is identical as the light-shielding pattern of first side edge of second exposure area, suitable for the first side to the second exposure area
The light-shielding pattern at edge is blocked；First side and described second side are opposite two sides.
Further, the width of first exposure area and the third exposure area is respectively less than 5-10mm.
Further, the width of the shading strip in the light-shielding pattern in first exposure area is the second exposure area the
1-1.1 times of the width of correspondence shading strip in the light-shielding pattern of dual side-edge edge；And/or the screening in the third exposure area
The width of shading strip in light pattern is the width of the correspondence shading strip in the light-shielding pattern of the second exposure area first side edge
1-1.1 times.
Further, the width of the shading strip in the light-shielding pattern in first exposure area is the second exposure area the
1.05 times of the width of correspondence shading strip in the light-shielding pattern of dual side-edge edge；In light-shielding pattern in the third exposure area
The width of shading strip be 1.05 times of width of the correspondence shading strip in the light-shielding pattern of the second exposure area first side edge.
Further, the mask plate is metal mask version.
Second aspect, the present invention provides a kind of mask exposure system, including exposure machine and described in any of the above embodiments
Mask plate.
Further, the exposure machine is for generating ultraviolet light.
The third aspect, the present invention provides a kind of splicing exposure methods characterized by comprising utilizes any of the above-described
The mask exposure system carries out splicing exposure to substrate；Splice exposure process packet from the first side direction to the second side direction
It includes:
In other exposure process in addition to first time exposure process, hidden using the first exposure area of the mask plate
Keep off the first exposure area on substrate, first exposure area be in upper primary exposure process corresponding to the mask plate
The region at the edge of the second exposure area, and first exposure area is blocked using baffle；Except last time exposure process it
In other outer exposure process, third exposure area is blocked using baffle and second side positioned at third exposure area is walked
Line exposing region.
Fourth aspect, the present invention provides a kind of substrate, the substrate is to utilize splicing exposure method system described above
The array substrate of work.
Further, the substrate is touch base plate.
In mask plate and mask exposure system provided by the invention, splicing exposure method, the utilization of mask plate can be made
Rate is improved, to promote the efficiency of exposure mask.
Detailed description of the invention
Can be more clearly understood characteristic information and advantage of the invention by reference to attached drawing, attached drawing be schematically without
It is interpreted as carrying out any restrictions to the present invention, in the accompanying drawings:
Fig. 1 is the structural schematic diagram of mask plate in the prior art；
Fig. 2 is to be shown using display/touch base plate structure that mask plate in the prior art obtain after splicing exposure
It is intended to；
Fig. 3 is a kind of structural schematic diagram of mask plate provided by the invention；
Fig. 4, Fig. 5 are the flow diagram of splicing exposure method provided by the invention；
Fig. 6 is the display/touch base plate structural schematic diagram obtained using splicing exposure method provided by the invention.
Specific embodiment
To better understand the objects, features and advantages of the present invention, with reference to the accompanying drawing and specific real
Applying mode, the present invention is further described in detail.It should be noted that in the absence of conflict, the implementation of the application
Feature in example and embodiment can be combined with each other.
In the following description, numerous specific details are set forth in order to facilitate a full understanding of the present invention, still, the present invention may be used also
To be implemented using other than the one described here other modes, therefore, protection scope of the present invention is not by described below
Specific embodiment limitation.
The structural schematic diagram for the mask plate that one embodiment of the invention provides can refer to Fig. 3, let it be assumed, for the purpose of illustration, that should
For the mask plate that embodiment provides for being exposed to touch base plate, which includes for being exposed to touch area
A-quadrant and the region B1 and B2 for being exposed to routing region；The two sides of the region B1 and B2 point column and a-quadrant, and with the area A
Domain is adjacent；A-quadrant can be divided into three regions, be followed successively by the region A1, the region A2 and the region A3 from left to right；The wherein area A1 and A3
Domain be can be used to implement from the exposure area blocked, and with the region A1 and A2 area adjacency, specifically, when using exposure mask
When version is exposed to the right from left side, the region A2 is corresponded to the exposure figure that last exposure process is formed using the region A1
The figure of right border region A1 ' blocked, the region A3 is then to left side edge when exposing next time corresponding to the region A2
The figure of region A3 ' is blocked；In order to meet such demand, the width in the region A1 needs and the equivalent width in the region A1 ',
And the light-shielding pattern in the region A1 is consistent with the light-shielding pattern in the region A1 ', and the shading in the light-shielding pattern in the region A1
The width of item be larger than the corresponding shading strip in the light-shielding pattern in the region A1 ' width (such as the former be the latter 1-
1.1 times, preferably 1.05 times)；Likewise, the width in the region A3 needs and the equivalent width in the region A3 ', and in the region A3
Light-shielding pattern is consistent with the light-shielding pattern in the region A3 ', and the width outline of the shading strip in the light-shielding pattern in the region A3
Greater than the width (for example it is preferably 1.05 times that the former, which is the latter) of the corresponding shading strip in the light-shielding pattern in the region A3 '.
It is understandable to be, the region A1 here, the region A2 and the region A3 block figure be have it is continuous consistent.
Referring to fig. 4, Fig. 5, Fig. 6, schematic diagram when to be exposed using the mask plate M in Fig. 3 to touch base plate TP；?
When exposing for the first time, the region A3 and the region B2 on the right side of the region A3 are blocked using baffle S；Expose it for the first time
Afterwards, it will form the figure corresponding to the region B1, the region A1 and the region A2 on touch base plate TP；Later when exposing for second,
Using the region A1 in mask plate M on touch base plate TP for the first time expose after formation figure in correspond to the region A1 '
Pattern blocked, avoid to the pattern re-expose exposed；And use the region A1 to baffle S and the area on the left of it
Domain is blocked, and is blocked using B2 region of the baffle S to the region A3 and on the right side of it；It is understandable to be, for the first time
The area A3 ' in the region A3 of mask plate M corresponding region and this exposure process mask plate M on touch base plate TP in exposure process
Domain corresponding region on touch base plate TP is the same area, since the shading graph in the region A3 can block in the region A3 '
Shading graph, in this way in first time exposure process, the shading graph in the region A3 be can be realized to this is same on touch base plate TP
Region answer light position (in this exposure process corresponding to the region A3 ' shading graph position) block, avoid pair
The same area carries out re-expose；Repeatedly splicing exposure is successively carried out from left to right in such a way that second exposes until falling
Several second of exposure process；In last time exposure process, referring to Fig. 5, using the region A1 in mask plate M in touch-control base
The region A1 ' in the region A2 of formation in plate TP after last exposure is blocked, and using baffle S to mask plate M's
The region A1 and the region on the left of it are blocked, but do not use B2 region of the baffle S to the region A3 and on the right side of it into
Row blocks；It is enabled on the region A3 and B2 regional exposure to touch base plate TP on the right side of it in this way, to complete entire
Splice exposure process.
It can be seen that in mask plate M provided by the invention and corresponding splicing exposure method from above-mentioned splicing,
It is not provided with metal strip, and uses the exposure area at main body exposure area edge as shading strip, so that being exposed in splicing exposure process
The area in the region A2 on light to touch base plate TP is larger, and the region A1 as occlusion area and the region A3 are also respectively
Be exposed on touch base plate TP in single exposure process and last time exposure process, compared with the prior art in exposure side
Formula can be good at the utilization rate for increasing mask plate M.
In the specific implementation, the width in the above-mentioned region A1 and the region A3 can be respectively less than 10mm, in this way can be can
Preferably improve the utilization rate of mask plate M.In addition in the specific implementation, in above-mentioned any embodiment, mask plate M can
To specifically refer to metal mask version, metal mask version is not easy to deform, and can be improved the accuracy of exposure, certainly specific real
Shi Shi may also mean that the mask plate of other materials.
It is understandable to be, although being to form touch-control figure for being exposed to touch base plate with mask plate and cover above
The explanation that film version carries out, but in practical applications, above-mentioned mask plate can also be specifically referred to for carrying out to other substrates
The mask plate of exposure.When for mask plate for being exposed to touch base plate, the shading strip in light-shielding pattern can be specific
It is used to form the shading strip of touch control electrode.
It should be pointed out that the mask pattern for showing strip in each attached drawing is for the ease of indicating design structure of the invention
Think, in practical applications, the figure on mask plate may be more more than each complexity shown in the accompanying drawings, such as to expose shape
At the exposure mask in the mask plate of the touch control electrode figure on touch base plate generally in periodic reticular structure.But it no matter covers
Film version is to be exposed to which kind of figure in display/touch panel, as long as using design disclosed in this invention, accordingly
Technical solution can fall into protection scope of the present invention.
It is to be used to expose saying for the touch control electrode figure formed on touch base plate progress with mask plate in the embodiment of the present invention
It is bright, since touch control electrode figure is generally in the mesh pattern of rule, it can be good at reducing the first exposure on mask plate in this way
The design difficulty in region and third exposure area, and during post-exposure, it can also be preferably aligned accordingly.When
So in practical applications, the mask plate for being exposed to the figure in other substrates can also use design of the invention,
Corresponding technical solution can achieve general object of the present invention, should all fall into protection scope of the present invention.
On the other hand, the present invention also provides a kind of mask exposure system, the mask exposure system include exposure machine and
Mask plate as described in any one of the above embodiments.Here exposure machine is that light required for referring to generation exposure is (usually ultraviolet
Light) machine.
In another aspect, the substrate can use the exposure of splicing described in any of the above item the present invention also provides a kind of substrate
The production of light method.Specifically, splicing exposure method described in can use above-mentioned one exposes in the substrate of the substrate
Form corresponding pattern, such as touch control electrode pattern etc.；To form the substrate at least one pattern.Optionally, here
Substrate can be touch base plate.
It should be noted that the above-mentioned embodiments illustrate rather than limit the invention, and ability
Field technique personnel can be designed alternative embodiment without departing from the scope of the appended claims.In the claims,
Any reference symbol between parentheses should not be configured to limitations on claims.Word "comprising" does not exclude the presence of not
Element or step listed in the claims.Word "a" or "an" located in front of the element does not exclude the presence of multiple such
Element.The present invention can be by means of including the hardware of several different elements and being come by means of properly programmed computer real
It is existing.In the unit claims listing several devices, several in these devices can be through the same hardware branch
To embody.The use of word first, second, and third does not indicate any sequence.These words can be explained and be run after fame
Claim.
Claims (10)
1. a kind of mask plate, which is characterized in that the mask plate includes main body exposure area and cabling exposure area；The cabling
Exposure area is located at the first side and second side of the main body exposure area；The main body exposure area includes the first exposure region
Domain, the second exposure area and third exposure area；Wherein the first exposure area is located at the first side of the main body exposure area
Edge, the third exposure area are located at the second side edge of the main body exposure area；First exposure area and described
Three exposure areas are adjacent with second exposure area；
Wherein, the light-shielding pattern phase of the light-shielding pattern of first exposure area and the second side edge of second exposure area
Together, the light-shielding pattern suitable for the second side edge to the second exposure area blocks；The shading figure of the third exposure area
Case is identical as the light-shielding pattern of first side edge of second exposure area, suitable for the first side edge to the second exposure area
Light-shielding pattern blocked；First side and described second side are opposite two sides.
2. mask plate according to claim 1, which is characterized in that first exposure area and the third exposure area
Width be respectively less than 10mm.
3. mask plate according to claim 1, which is characterized in that the screening in light-shielding pattern in first exposure area
The width of striation is 1-1.1 times of the width of the correspondence shading strip in the light-shielding pattern of the second exposure area second side edge；With/
Or, the width of the shading strip in light-shielding pattern in the third exposure area is the shading of the second exposure area first side edge
1-1.1 times of the width of correspondence shading strip in pattern.
4. mask plate according to claim 3, which is characterized in that
The width of the shading strip in light-shielding pattern in first exposure area is the screening of the second exposure area second side edge
1.05 times of the width of correspondence shading strip in light pattern；The width of the shading strip in light-shielding pattern in the third exposure area
Degree is 1.05 times of the width of the correspondence shading strip in the light-shielding pattern of the second exposure area first side edge.
5. mask plate according to claim 1, which is characterized in that the mask plate is metal mask version.
6. a kind of mask exposure system, which is characterized in that including exposure machine and exposure mask as described in any one in claim 1-5
Version.
7. exposure system according to claim 6, which is characterized in that the exposure machine is for generating ultraviolet light.
8. a kind of splicing exposure method characterized by comprising utilize mask exposure system pair as claimed in claims 6 or 7
Substrate carries out splicing exposure；Include: from the first side direction to the second side direction splicing exposure process
In other exposure process in addition to first time exposure process, base is blocked using the first exposure area of the mask plate
The first exposure area on plate, first exposure area be to correspond to the second of the mask plate in upper primary exposure process
The region at the edge of exposure area, and first exposure area is blocked using baffle；In addition to last time exposure process
In other exposure process, exposed using the cabling that baffle blocks third exposure area and second side positioned at third exposure area
Light region.
9. a kind of substrate, which is characterized in that the substrate is the base using splicing exposure method production as claimed in claim 8
Plate.
10. substrate according to claim 9, which is characterized in that the substrate is touch base plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610543835.0A CN106200254B (en) | 2016-07-11 | 2016-07-11 | Mask plate and mask exposure system, splicing exposure method, substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610543835.0A CN106200254B (en) | 2016-07-11 | 2016-07-11 | Mask plate and mask exposure system, splicing exposure method, substrate |
Publications (2)
| Publication Number | Publication Date |
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| CN106200254A CN106200254A (en) | 2016-12-07 |
| CN106200254B true CN106200254B (en) | 2019-06-25 |
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ID=57477737
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610543835.0A Active CN106200254B (en) | 2016-07-11 | 2016-07-11 | Mask plate and mask exposure system, splicing exposure method, substrate |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761995A (en) | 2018-06-21 | 2018-11-06 | 京东方科技集团股份有限公司 | Mask plate, exposure method and touch panel |
| CN111736422A (en) * | 2019-03-25 | 2020-10-02 | 上海微电子装备（集团）股份有限公司 | Mask plate and splicing exposure method |
| KR20210000922A (en) * | 2019-06-26 | 2021-01-06 | 동우 화인켐 주식회사 | Mask for Stitch Exposure and Stitch Exposing Method Using the Same |
| CN110441985B (en) * | 2019-08-15 | 2022-10-25 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof, and method for patterning by adopting mask plate |
| CN110687757A (en) * | 2019-10-10 | 2020-01-14 | 深圳市华星光电技术有限公司 | Splicing exposure system and splicing exposure method adopting same |
| CN110967915A (en) * | 2019-12-16 | 2020-04-07 | 深圳市华星光电半导体显示技术有限公司 | Mask plate |
| CN113671789B (en) * | 2020-05-14 | 2024-09-03 | 咸阳彩虹光电科技有限公司 | Photomask, exposure method and exposure system |
| WO2021237552A1 (en) * | 2020-05-28 | 2021-12-02 | 京东方科技集团股份有限公司 | Mask, exposure method and touch panel |
| CN113066715B (en) * | 2021-03-19 | 2022-07-05 | 长鑫存储技术有限公司 | Photomask component, patterned mask and forming method thereof, and forming method of active region |
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| JP2003156831A (en) * | 2001-11-21 | 2003-05-30 | Toshiba Corp | Mask, method for producing mask and apparatus therefor |
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| JP2003156831A (en) * | 2001-11-21 | 2003-05-30 | Toshiba Corp | Mask, method for producing mask and apparatus therefor |
| JP2005003949A (en) * | 2003-06-12 | 2005-01-06 | Renesas Technology Corp | Photomask and its manufacturing method |
| CN201974631U (en) * | 2011-04-12 | 2011-09-14 | 京东方科技集团股份有限公司 | Mask plate and mask plate group |
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|---|---|
| CN106200254A (en) | 2016-12-07 |
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