CN101609238A - Image element array substrates and display panel with colour filter array - Google Patents
Image element array substrates and display panel with colour filter array Download PDFInfo
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- CN101609238A CN101609238A CNA2009101576332A CN200910157633A CN101609238A CN 101609238 A CN101609238 A CN 101609238A CN A2009101576332 A CNA2009101576332 A CN A2009101576332A CN 200910157633 A CN200910157633 A CN 200910157633A CN 101609238 A CN101609238 A CN 101609238A
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Abstract
The invention provides a kind of image element array substrates and display panel with colour filter array, described image element array substrates comprises substrate, active cell array, colour filter array and pixel electrode layer.Have a plurality of pixel regions and a shading region on the substrate.Active cell array is positioned on the substrate.Colour filter array is arranged on the substrate.Colour filter array comprises shielding pattern layer and a plurality of color filter patterns, and wherein shielding pattern layer is positioned at shading region.Color filter patterns lays respectively in the pixel region and from pixel region and extends to shading region, wherein constitutes a layered structure from the extended color filter patterns in adjacent pixels district in shading region.Pixel electrode layer is electrically connected with described active cell array.By this, the image element array substrates with colour filter array is taken into account the optical density (OD) of process requirements and product.
Description
Technical field
The invention relates to a kind of substrate and display device panel, and particularly relevant for a kind of image element array substrates and display panel with colour filter array.
Background technology
Advantages such as LCD has that high image quality, volume are little, in light weight, low voltage drive, low consumpting power and applied range, so it has replaced cathode-ray tube (CRT), and (cathode ray tube CRT) becomes the main flow of display of new generation.Traditional display panels is to be made of a colored optical filtering substrates (color filter), a thin-film transistor array base-plate (thin film transistor array substrate, TFT array substrate) and a liquid crystal layer (liquid crystal layer) that is disposed between this two substrates.Yet this kind display panels is carrying out that bit errors (misalignment) is arranged when colored optical filtering substrates engages with thin-film transistor array base-plate easily.
In order to improve the problems referred to above, known technology has proposed a kind of display panels of being made up of thin-film transistor array base-plate (color filter on array substrate, COA substrate), a subtend substrate, a plurality of separation material and the liquid crystal layer with chromatic filter layer.Separation material and liquid crystal layer are disposed between the thin-film transistor array base-plate and subtend substrate with chromatic filter layer, and separation material can be in order to keep thin-film transistor array base-plate with chromatic filter layer and the gap between the subtend substrate.In this kind display panels, because chromatic filter layer is directly to be formed on the thin-film transistor array base-plate, the bit errors on therefore can the generation group not upright.
It should be noted that, in the manufacture process of this kind display panels, based on considering of aligning accuracy on the technology, the black-matrix material layer need use has the material of penetrability slightly, so that the technology board is before the Patternized technique that carries out the black-matrix material layer, the alignment mark (alignmentmark) that is positioned at rete under it still can by have slightly penetrability the black-matrix material layer and grasped by board, can guarantee the aligning accuracy between the different retes by this.Yet, when the black-matrix material layer is selected for use based on aforementioned considering when having the material of penetrability slightly.Black matrix" behind the patterning often can't reach the effect of complete shading, causes the contrast decline of display panels and influences display quality.
Summary of the invention
The invention provides a kind of image element array substrates with colour filter array, it can improve the contraposition degree of accuracy in manufacturing process, and then promotes yield and reduce cost.
The invention provides a kind of display panel, it has excellent contraposition degree of accuracy and produces the product of high-contrast in manufacturing process.
The invention provides a kind of image element array substrates with colour filter array, it comprises substrate, active cell array, colour filter array and pixel electrode layer.Have a plurality of pixel regions and a shading region on the substrate.Active cell array is positioned on the substrate.Colour filter array is arranged on the substrate, and wherein colour filter array comprises shielding pattern layer and a plurality of color filter patterns.Shielding pattern layer is positioned at shading region.A plurality of color filter patterns lay respectively in the pixel region and from pixel region and extend to shading region, wherein constitute a layered structure from the extended color filter patterns in adjacent pixels district in shading region.Pixel electrode layer is electrically connected with active cell array.
The present invention proposes a kind of display panel in addition, and it comprises image element array substrates, subtend substrate and the display medium with colour filter array.Image element array substrates with colour filter array comprises substrate, active cell array, colour filter array and pixel electrode layer.Have a plurality of pixel regions and a shading region on the substrate.Active cell array is positioned on the substrate.Colour filter array is arranged on the substrate, and wherein colour filter array comprises shielding pattern layer and a plurality of color filter patterns.Shielding pattern layer is positioned at shading region.A plurality of color filter patterns lay respectively in the pixel region and from pixel region and extend to shading region, wherein constitute a layered structure from the extended color filter patterns in adjacent pixels district in shading region.Pixel electrode layer is electrically connected with active cell array.The subtend substrate is positioned at the subtend of the image element array substrates with colour filter array.Display medium is between image element array substrates with colour filter array and subtend substrate.
Beneficial effect of the present invention is, according to technical scheme provided by the invention, can select for use the low slightly material of optical density (OD) to make in the manufacturing process of shielding pattern layer, to improve the contraposition degree of accuracy between rete in the technology.On the other hand, on the correspondence position of the shielding pattern layer of shading region, utilization constitutes a layered structure from the extended color filter patterns in adjacent pixels district in shading region, can assist the shaded effect of shielding pattern layer in the shading region, improves the contrast of product.
Description of drawings
Fig. 1 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.
Fig. 2 A to Fig. 2 C is respectively the diagrammatic cross-section of the different kenels of layered structure in one embodiment of the invention.
Fig. 3 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.
Fig. 4 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.
Fig. 5 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.
Fig. 6 is the partial cutaway schematic of a kind of display panel of one embodiment of the invention.
Drawing reference numeral
200,300,400,500,600: image element array substrates with colour filter array
210: substrate
212: pixel region
214: shading region
220: active cell array
222: active member
230: colour filter array
232: shielding pattern layer
234: color filter patterns
234B: blue filter pattern
234G: green filter pattern
234R: red filter pattern
240: pixel electrode layer
250,250A, 250B, 250C: layered structure
720: the subtend substrate
710: display medium
722: common electrode
Embodiment
For above-mentioned feature and advantage of the present invention can be become apparent, embodiment cited below particularly, and cooperate appended accompanying drawing to be described in detail below.
Fig. 1 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.Please refer to Fig. 1, the image element array substrates with colour filter array 200 of present embodiment comprises substrate 210, active cell array 220, colour filter array 230 and pixel electrode layer 240.Particularly, have a plurality of pixel regions 212 and a shading region 214 on the substrate 210.Particularly, shading region 214 be centered around each pixel region 212 around.Active cell array 220 is positioned on the substrate 210.Colour filter array 230 is arranged on the substrate 210, wherein colour filter array 230 comprises shielding pattern layer 232 and a plurality of color filter patterns 234 that is positioned at shading region 214, these color filter patterns 234 lay respectively in the pixel region 212 and from pixel region 212 and extend to shading region 214, and wherein 212 extended color filter patterns 234 constitute a layered structure 250 in shading region 214 from the adjacent pixels district.Pixel electrode layer 240 is electrically connected the pixel region 212 on the substrate 210 with active cell array 220.More specifically, the a plurality of active members 222 that have arrayed in the active cell array 220, and each active member 222 is arranged in each pixel region 212 accordingly, and pixel electrode layer 240 has a plurality of pixel electrodes 242, is arranged at accordingly in each pixel region 212 and is electrically connected with corresponding active member 222.
Furthermore, in the present embodiment, shielding pattern layer 232 for example is between active cell array 220 and color filter patterns 234.And the manufacturing process with image element array substrates 200 of colour filter array comprises the following steps.At first, on substrate 210, form active cell array 220, and on the ad-hoc location of the specific rete of active cell array 220, make alignment mark.Afterwards, on active cell array 220, form a light-shielding material layers all sidedly, and produce shielding pattern layer 232, for example black matrix" via a Patternized technique.It should be noted that, in the Patternized technique of above-mentioned shielding pattern layer 232, carry out an exposure technology after capturing the alignment mark that is positioned at its bottom via exposure bench by light-shielding material layers earlier, then carrying out a developing process again forms black matrix" with the described light-shielding material layers of patterning.In the present embodiment, light-shielding material layers can be selected the low slightly material of optical density (OD) value for use, to increase the discrimination power of board to alignment mark.
In detail, the optical density (OD) value of shielding pattern layer 232 (optical density) is for example between 0.6～3.4.By this, when board acquisition is positioned at the alignment mark of bottom of light-shielding material layers, can be more easily and pick out alignment mark comparatively clearly more efficiently, avoid the bad problems such as aperture opening ratio reduction that caused because of the contraposition skew between rete up and down.Therefore, the image element array substrates with colour filter array 200 of present embodiment can improve contraposition degree of accuracy, the saving process time of technology in manufacturing process, and in the selection of light-shielding material layers, can select the low slightly material of optical density (OD) value that more easily obtains for use, so will help to save material cost.
On the other hand, the image element array substrates with colour filter array 200 of present embodiment has the layered structure 250 that is made of color filter patterns 234 in shading region 214, because this layered structure 250 also can provide the effect of shading for light.Thus, the shaded effect that the layered structure 250 that color filter patterns 234 constitutes provides shading region 214 can further strengthen shielding pattern layer 232 is blocked light really by shading region 214.In detail, the optical density (OD) value of layered structure 250 (optical density) is for example between 0.6～1.2.And in the present embodiment, the optical density (OD) value in the overlapping zone of shielding pattern layer 232 and layered structure 250 is for example between 1.8～4.0, and the optical density (OD) value is high more, represents shaded effect good more.Therefore, the image element array substrates with colour filter array 200 of present embodiment still can be kept to a certain degree shaded effect at shading region 214 after completing, so will help to promote the contrast of product.
Fig. 2 A to Fig. 2 C is respectively the diagrammatic cross-section of the different kenels of layered structure in one embodiment of the invention.Please refer to Fig. 2 A, color filter patterns 234 is made of red filter pattern 234R, green filter pattern 234G and blue filter pattern 234B, and in the present embodiment, layered structure 250A is made of green filter pattern 234G and red filter pattern 234R.Please follow the B with reference to Fig. 2, in the present embodiment, layered structure 250B is made of green filter pattern 234G and blue filter pattern 234B.Referring again to Fig. 2 C, in the present embodiment, layered structure 250C is made of blue filter pattern 234B and red filter pattern 234R.Table 1 is stated layered structure 250A, the 250B of different kenels, the optical density (OD) value measured value sorting table before and after the 250C in the use for shielding pattern layer 232, and wherein tested shielding pattern layer 232 is respectively 1 micron (μ m) with the thickness of each color filter patterns 234.
Table 1
| The optical density (OD) value | |
|
|
|
|
|
| ??1 | ??1.843 | ??2.627 | ??1.864 | ??2.490 | ??1.824 | ??3.032 |
| ??2 | ??1.820 | ??2.620 | ??1.855 | ??2.491 | ??1.811 | ??3.020 |
| ??3 | ??1.806 | ??2.621 | ??1.854 | ??2.500 | ??1.839 | ??3.006 |
| ??4 | ??1.819 | ??2.633 | ??1.859 | ??2.475 | ??1.813 | ??2.994 |
| ??5 | ??1.823 | ??2.623 | ??1.862 | ??2.475 | ??1.863 | ??3.030 |
| On average | ??1.822 | ??2.625 | ??1.859 | ??2.486 | ??1.830 | ??3.016 |
As shown in table 1, make the aligning accuracy in the flow process and reduce the bad problems such as aperture opening ratio reduction that the contraposition skew is caused by suitably selecting for use shielding pattern layer 232 optical density (OD) values own to improve, and then make technology enjoy higher technology margin (process margin).On the other hand, utilization extends to shading region 214 formation layered structures 250 from pixel region 212 respectively with the color filter patterns 234 of different colours, can significantly promote the optical density (OD) value of shading region 214, in other words, layered structure 250 of the present invention helps to promote the shaded effect of shading region 214, and obtains the product of high-contrast.As shown in table 1, in the present embodiment, layered structure 250A, 250B, 250C all can promote shaded effect effectively.Wherein, be preferable with the shaded effect that can reach again by the layered structure 250C that blue filter pattern 234B and red filter pattern 234R constituted.
Fig. 3 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.Please refer to Fig. 3, the image element array substrates with colour filter array 300 of present embodiment is similar with the image element array substrates with colour filter array 200 of previous embodiment, only, the image element array substrates with colour filter array 300 of present embodiment can also more comprise another color filter patterns 310, stacks on the layered structure 250 of shading region 214.In other words, the material that stacks another color filter patterns 310 on layered structure 250 is different from the material of the colored filter film that constitutes layered structure 250.For instance, select for use blue filter pattern 234B to stack on by the layered structure 250A that green filter pattern 234G and red filter pattern 234R constituted, select for use red filter pattern 234R to stack in by the layered structure 250B that green filter pattern 234G and blue filter pattern 234B constituted, perhaps select for use red filter pattern 234R to stack on by the layered structure 250C that blue filter pattern 234B and red filter pattern 234R constituted.Because the filter wavelength difference of the color filter patterns 234 of different colours, by above-mentioned stacking structure, not only can promote the shaded effect of shading region 214 significantly, and above-mentioned technology is identical with original technology, only need original mask is carried out local modification, can't additionally increase masking process.
Certainly, the present invention does not limit layered structure and light-shielding pattern, relative position between active array substrate and the pixel electrode layer, the position and the size of layered structure are not limited to, for example, substrate 210 has more periphery circuit region (not illustrating) and fanout area (not illustrating), described periphery circuit region centers on described pixel region and described shading region substantially and is adjacent to a side of described substrate, described fanout area links to each other with described peripheral circuit, and color filter patterns 234 more constitutes another layered structure (not illustrating) in described periphery circuit region or described fanout area.Below enumerate several enforcement kenels with image element array substrates of colour filter array of the present invention again, but not in order to limit the present invention.
Fig. 4 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.Please refer to Fig. 4, in the image element array substrates with colour filter array 400 of present embodiment, shielding pattern layer 232 is positioned on the pixel electrode layer 240, in other words, in the present embodiment, the layered structure 250 that is made of color filter patterns 234 is between shielding pattern layer 232 and active cell array 220.So, also can reach the effect that in technology, improves the contraposition precision and in product, improve contrast equally.All the other members are similar in previous embodiment, repeat no more.
Fig. 5 is a kind of partial cutaway schematic with image element array substrates of colour filter array of one embodiment of the invention.Please refer to Fig. 5, in the image element array substrates with colour filter array 500 of present embodiment, shielding pattern layer 232 is between pixel electrode layer 240 and colour filter array 220.So, also can reach the effect that in technology, improves the contraposition precision and in product, improve contrast equally.All the other members are similar in previous embodiment, repeat no more.
Fig. 6 is the partial cutaway schematic of a kind of display panel of one embodiment of the invention.Please refer to Fig. 6, on the application of reality, display panel 700 comprises above-mentioned image element array substrates 600, subtend substrate 720 and display medium 710 with colour filter array, the image element array substrates 600 that wherein has a colour filter array is the arbitrary kenel among the embodiment as described above, as has an image element array substrates 200,300,400,500 of colour filter array, identical components is represented with same-sign, repeats no more in this.In addition, subtend substrate 720 is positioned at the subtend of the image element array substrates 600 with colour filter array, and in the present embodiment, subtend substrate 720 has a common electrode 722 towards the image element array substrates 600 with colour filter array.Display medium 710 is between image element array substrates 600 with colour filter array and subtend substrate 720, and wherein display medium 710 presents different display effects by common electrode 722 with voltage difference between the pixel electrode layer 240.
As aforementioned, in the present embodiment, layered structure 250 is set, when promoting the contraposition precision of technology by shading region 214 at image element array substrates 600 with colour filter array, can strengthen the shaded effect of shielding pattern layer in the lump, to improve the contrast of display panel 700.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; any technician with the technical field of the invention; without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is when being as the criterion with claim institute confining spectrum.
Claims (10)
1. the image element array substrates with colour filter array is characterized in that, described image element array substrates comprises:
One substrate has a plurality of pixel regions and a shading region on the described substrate;
One active cell array is positioned on the described substrate;
One colour filter array is arranged on the described substrate, and wherein said colour filter array comprises:
One shielding pattern layer is positioned at described shading region; And
A plurality of color filter patterns lay respectively in described these pixel regions and from described these pixel regions and extend to described shading region, and wherein extended described these color filter patterns constitute a layered structure in described shading region from the adjacent pixels district; And
One pixel electrode layer is electrically connected with described active cell array.
2. the image element array substrates with colour filter array as claimed in claim 1 is characterized in that described image element array substrates more comprises another color filter patterns, stacks on the described layered structure of described shading region.
3. the image element array substrates with colour filter array as claimed in claim 1 is characterized in that, the optical density (OD) value of described shielding pattern layer is between 0.6～3.4.
4. the image element array substrates with colour filter array as claimed in claim 1, it is characterized in that described shielding pattern layer is between described active cell array and described these color filter patterns, between described these color filter patterns and the described pixel electrode layer or on the described pixel electrode layer.
5. the image element array substrates with colour filter array as claimed in claim 1, it is characterized in that, described substrate has more a periphery circuit region and a fanout area, described periphery circuit region centers on described pixel region and described shading region substantially and is adjacent to a side of described substrate, described fanout area links to each other with described peripheral circuit, and wherein said a plurality of color filter patterns more constitute another layered structure in described periphery circuit region or described fanout area.
6. the image element array substrates with colour filter array is characterized in that, described image element array substrates comprises:
One substrate has a plurality of pixel regions, a periphery circuit region and a fanout area on the described substrate, described periphery circuit region centers on described pixel region substantially and is adjacent to a side of described substrate, and described fanout area links to each other with described peripheral circuit;
One active cell array is positioned on the described substrate;
One colour filter array, be arranged on the described substrate, wherein said colour filter array comprises a plurality of color filter patterns, lays respectively in described these pixel regions, and described these color filter patterns more are positioned at described periphery circuit region or described fanout area constitutes a layered structure; And
One pixel electrode layer is electrically connected with described active cell array.
7. a display panel is characterized in that, described display panel comprises:
One has the image element array substrates of colour filter array, comprising:
One substrate has a plurality of pixel regions and a shading region on the described substrate;
One active cell array is positioned on the described substrate;
One colour filter array is arranged on the described substrate, and wherein said colour filter array comprises:
One shielding pattern layer is positioned at described shading region; And
A plurality of color filter patterns lay respectively in described these pixel regions and from described these pixel regions and extend to described shading region, and wherein extended described these color filter patterns constitute a layered structure in described shading region from the adjacent pixels district; And
One pixel electrode layer is electrically connected with described active cell array;
One subtend substrate is positioned at described subtend with image element array substrates of colour filter array; And
One display medium is between described image element array substrates and described subtend substrate with colour filter array.
8. display panel as claimed in claim 7 is characterized in that described display panel more comprises another color filter patterns, stacks on the described layered structure of described shading region.
9. display panel as claimed in claim 7 is characterized in that, the optical density (OD) value of described shielding pattern layer is between 0.6～3.4.
10. display panel as claimed in claim 7, it is characterized in that described shielding pattern layer is between described active cell array and described these color filter patterns, between described these color filter patterns and the described pixel electrode layer or on the described pixel electrode layer.
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| CN2009101576332A CN101609238B (en) | 2009-07-21 | 2009-07-21 | Pixel array baseplate with color filter array as well as display panel |
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| CN2009101576332A CN101609238B (en) | 2009-07-21 | 2009-07-21 | Pixel array baseplate with color filter array as well as display panel |
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| CN101950114A (en) * | 2010-08-17 | 2011-01-19 | 友达光电股份有限公司 | Electrophoresis display panel and manufacturing method thereof |
| CN102693995A (en) * | 2012-06-20 | 2012-09-26 | 上海中科高等研究院 | Image sensor |
| CN102778797A (en) * | 2012-08-07 | 2012-11-14 | 深圳市华星光电技术有限公司 | Array substrate and liquid crystal display panel |
| CN102800630A (en) * | 2012-07-26 | 2012-11-28 | 京东方科技集团股份有限公司 | Array substrate and preparation method and display device thereof |
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| CN100510884C (en) * | 2004-01-05 | 2009-07-08 | 友达光电股份有限公司 | Colour optical filter and manufacturing method thereof |
| CN100495157C (en) * | 2006-07-07 | 2009-06-03 | 中华映管股份有限公司 | Shading structure, Colorful light filtering substrate, positive element array substrate and liquid crystal panel |
| JP5046014B2 (en) * | 2007-09-13 | 2012-10-10 | Ｎｌｔテクノロジー株式会社 | Color filter substrate and liquid crystal display device |
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| CN101950114A (en) * | 2010-08-17 | 2011-01-19 | 友达光电股份有限公司 | Electrophoresis display panel and manufacturing method thereof |
| CN102693995A (en) * | 2012-06-20 | 2012-09-26 | 上海中科高等研究院 | Image sensor |
| CN102693995B (en) * | 2012-06-20 | 2015-06-03 | 中国科学院上海高等研究院 | Image sensor |
| CN102800630A (en) * | 2012-07-26 | 2012-11-28 | 京东方科技集团股份有限公司 | Array substrate and preparation method and display device thereof |
| US9804463B2 (en) | 2012-07-26 | 2017-10-31 | Boe Technology Group Co., Ltd. | Array substrate and fabrication method thereof and display device |
| CN102778797A (en) * | 2012-08-07 | 2012-11-14 | 深圳市华星光电技术有限公司 | Array substrate and liquid crystal display panel |
| WO2014023010A1 (en) * | 2012-08-07 | 2014-02-13 | 深圳市华星光电技术有限公司 | Array substrate and liquid crystal display panel |
| WO2018223481A1 (en) * | 2017-06-08 | 2018-12-13 | 惠科股份有限公司 | Display panel and display device using same |
| CN109613741A (en) * | 2019-01-11 | 2019-04-12 | 惠科股份有限公司 | Display panel and method for manufacturing the same |
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| CN101609238B (en) | 2012-10-31 |
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