CN108728006A - 一种光学薄膜保护膜及其制备方法 - Google Patents

一种光学薄膜保护膜及其制备方法 Download PDF

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CN108728006A
CN108728006A CN201810575615.5A CN201810575615A CN108728006A CN 108728006 A CN108728006 A CN 108728006A CN 201810575615 A CN201810575615 A CN 201810575615A CN 108728006 A CN108728006 A CN 108728006A
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费志豪
王陈
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Wuhu Xia Xin New Mstar Technology Ltd
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Abstract

本发明公开了一种光学薄膜保护膜及其制备方法，所述保护膜包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述PE基膜层包括A层和B层，A层为PE层，B层为添加了有机或无机粒子的PE层，A层和B层通过共挤方式形成PE基膜层；所述胶水包括以下重量份的原料：丙烯酸酯类树脂26～36份；乙酸乙酯60～70份；异氰酸酯类固化剂3～6份；抗静电剂0.5～1份。本发明通过对PE基膜层的层结构、胶水原料及配比以及制备工艺进行综合控制，得到了具有抗静电性能、耐刮性良好、剥离力合适、物残胶的保护膜，其阻抗值在107～1011Ω范围内，剥离力为1.6～2.5N/m。

Description

一种光学薄膜保护膜及其制备方法
技术领域
本发明涉及一种光学薄膜保护膜及其制备方法。
背景技术
目前背光模组中的使用的光学膜，如增光膜、扩散膜等，要求比较高，在其生产、运输、裁切时需要对其进行必要的保护，避免其被刮伤和污染。传统保护膜主要是使用PE单层涂胶的保护膜，它的缺点在于：PE膜薄且耐刮性差。
发明内容
本发明的目的在于提供一种光学薄膜保护膜及其制备方法。通过在PE基膜层中添加有机或无机粒子，和在基膜层表面涂覆特定成分的胶水，提高保护膜的耐刮性能和防静电性能。
本发明采取的技术方案为：
一种光学薄膜保护膜，包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述胶水包括以下重量份的原料：丙烯酸酯类树脂26～36份；乙酸乙酯60～70份；异氰酸酯类固化剂3～6份；抗静电剂0.5～1份。
所述PE基膜层包括A层和B层，A层为PE层，B层为添加了有机或无机粒子的PE层；所述有机或无机粒子的粒径为5～10μm。在PE基膜层的B层的原料中添加有机或无机粒子从而在B层的表面形成突起的颗粒，增加了PE薄膜表面的抗黏连性与耐刮性，由于其处在PE基膜层的下层因此不会影响PE表面胶水的流平性和胶层的光滑性。
所述有机或无机粒子为有机硅、二氧化硅、PMMA、PBMA中的一种；
所述有机或无机粒子的重量为B层中PE重量的5～8％；其用量较小的话产品的耐刮性能越差，较多的话会导致保护膜的外观较差，因此综合考虑将其用量限定在5～8％。
A层和B层通过共挤方式形成PE基膜层。
所述有机或无机粒子优选为有机硅。
所述胶水涂布在PE基膜层的A层表面；所述胶层的厚度为8～12μm，一般胶层的厚度在5μm左右，本发明通过增加胶层的厚度可以让保护膜在受到外力冲击时起到一定的缓冲作用，保护产品不受损害；但是如果胶层太厚，会导致粘力过高，不易揭下，并且会产生残胶，因此本发明将胶层厚度控制在8～12μm。
所述丙烯酸酯类树脂选自聚2-甲基丙烯酸甲酯、聚甲基丙烯酸甲酯、环氧丙烯酸甲酯、聚氨酯丙烯酸酯中的一种或多种；优选为聚2-甲基丙烯酸甲酯。
根据权利要求1所述的光学薄膜保护膜，其特征在于，所述异氰酸酯类固化剂选自六亚甲基二异氰酸酯、异佛尔酮二异氰酸酯、二苯基甲烷二异氰酸酯、二环己基甲烷二异氰酸酯、甲苯二异氰酸酯中的一种或多种；优选为六亚甲基二异氰酸酯。
所述抗静电剂选自硬脂基三甲基季铵盐酸盐、脂酰胺丙基羟乙基季胺硝酸盐、硬脂酸单甘油酯、烷基二羧甲基铵乙内酯中的一种或多种；优选为硬脂基三甲基季铵盐酸盐。
本发明还提供了所述光学薄膜保护膜的制备方法，包括以下步骤：按照配方量将各原料混合均匀配制胶水，在PE基膜层的表面涂覆胶水，经70～95℃分段烘干即可得到所述耐高温耐紫外线保护膜。
所述分段烘干工艺具体包括：依次经过70～80℃、22～26Hz风量；80～90℃、26～30Hz风量；85～95℃、33～37Hz风量、85～95℃、33～37Hz风量；75～85℃、24～28Hz风量的烘箱进行烘干。
所述烘箱的长度均为4m，线速度均为35～45m/min。
本发明提供的光学薄膜保护膜，使用具有两层结构的PE薄膜作为基膜，并在下层中添加有机或无机粒子，下层不直接接触压敏胶胶水，在提高保护膜耐刮性和抗粘连性的同时，保证了胶层表面的光滑性。并在PE基膜层的表面涂覆特定成分的胶水形成8～12μm厚度的胶层，此厚度的胶层在使用时不会产生残胶且在受到外力冲击时能够起到一定的缓冲作用。
在胶水配方中，没有额外添加催化剂，在分段烘干工艺进行的同时实现丙烯酸酯类树脂和异氰酸酯类固化剂的交联。且丙烯酸酯类树脂和异氰酸酯类固化剂两者的用量会直接影响到保护膜的剥离力，丙烯酸酯类树脂的用量越高，保护膜的剥离力越高，残胶现象越严重；异氰酸酯类固化剂占丙烯酸酯类树脂树脂的用量越小，保护膜的剥离力越大，因此为了确保保护膜在剥离后无残胶，本发明将丙烯酸酯类树脂和异氰酸酯类固化剂的用量分别限定在26～36份、3～6份。而抗静电剂主要影响保护膜的阻抗，其用量越大，抗静电效果越好，但是这样会导致保护膜的粘性越低、外观较差，因此本发明将抗静电剂的用量控制在0.5～1份。
在制备工艺中，采用分段烘干工艺对涂覆了胶水的PE基膜进行烘干，可在不同的温度和风量下达到最好的溶剂挥发效果与胶层原料中的丙烯酸酯类树脂与异氰酸酯类固化剂的交联反应效果，提高胶层在基膜层上的附着力，从而使保护膜具备不脱胶、整体性良好的特性。
本发明通过对PE基膜层的层结构、胶水原料及配比以及制备工艺进行综合控制，得到了具有抗静电性能、耐刮性良好、剥离力合适、物残胶的保护膜，其阻抗值在107～1011Ω范围内，剥离力为1.6～2.5N/m。
具体实施方式
实施例1
一种光学薄膜保护膜，包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述PE基膜层包括A层和B层，A层为PE层，B层为添加了6％粒径在5～10μm的有机硅的PE层，A层和B层通过共挤方式形成PE基膜层；所述胶水包括以下重量份的原料：聚2-甲基丙烯酸甲酯30份；乙酸乙酯65份；六亚甲基二异氰酸酯4.8份；硬脂基三甲基季铵盐酸盐0.8份。
所述光学薄膜保护膜的制备方法为：按照配方量将各原料混合均匀配制胶水，在PE基膜层的表面涂覆胶水，依次经过75℃、24Hz风量；85℃、28Hz风量；90℃、35Hz风量、90℃、35Hz风量；80℃、26Hz风量的烘箱进行烘干，所述烘箱的长度均为4m，线速度均为40m/min。
根据本实施例中的方法得到的光学薄膜保护膜的剥离力为2.2N/m；阻抗：109Ω；铅笔硬度≥HB；且无残胶。
实施例2
一种光学薄膜保护膜，包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述PE基膜层包括A层和B层，A层为PE层，B层为添加了5％二氧化硅的PE层，A层和B层通过共挤方式形成PE基膜层；所述胶水包括以下重量份的原料：环氧丙烯酸甲酯27份；乙酸乙酯62份；二苯基甲烷二异氰酸酯4份；硬脂酸单甘油酯0.6份。
所述光学薄膜保护膜的制备方法为：按照配方量将各原料混合均匀配制胶水，在PE基膜层的表面涂覆胶水，依次经过70℃、26Hz风量；80℃、30Hz风量；85℃、37Hz风量、85℃、37Hz风量；75℃、28Hz风量的烘箱进行烘干，所述烘箱的长度均为4m，线速度均为35m/min。
根据本实施例中的方法得到的光学薄膜保护膜的剥离力为1.8N/m；阻抗：1010Ω；铅笔硬度≥HB；且无残胶。
实施例3
一种光学薄膜保护膜，包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述PE基膜层包括A层和B层，A层为PE层，B层为添加了8％PMMA的PE层，A层和B层通过共挤方式形成PE基膜层；所述胶水包括以下重量份的原料：聚氨酯丙烯酸酯10、聚甲基丙烯酸甲酯25份；乙酸乙酯68份；甲苯二异氰酸酯2、异佛尔酮二异氰酸酯3.4份；烷基二羧甲基铵乙内酯0.9份。
所述光学薄膜保护膜的制备方法为：按照配方量将各原料混合均匀配制胶水，在PE基膜层的表面涂覆胶水，依次经过80℃、228Hz风量；90℃、26Hz风量；95℃、33Hz风量、95℃、33Hz风量；85℃、24Hz风量的烘箱进行烘干，所述烘箱的长度均为4m，线速度均为45m/min。
根据本实施例中的方法得到的光学薄膜保护膜的剥离力为2.3N/m；阻抗：108Ω；铅笔硬度≥HB；且无残胶。
比较例1
其他同实施例1，只是其中的作为PE基膜层的两层均为同样材质的纯PE层。根据本实施例中的方法得到的光学薄膜保护膜的剥离力为2.3N/m；阻抗：109Ω；铅笔硬度为2B；且无残胶。
比较例2
一种光学薄膜保护膜，包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述PE基膜层包括A层和B层，A层为PE层，B层为添加了3％粒径在5～10μm的有机硅的PE层，A层和B层通过共挤方式形成PE基膜层；所述胶水包括以下重量份的原料：聚2-甲基丙烯酸甲酯40份；乙酸乙酯70份；六亚甲基二异氰酸酯4.8份；硬脂基三甲基季铵盐酸盐1.0份。
所述光学薄膜保护膜的制备方法为：按照配方量将各原料混合均匀配制胶水，在PE基膜层的表面涂覆胶水，依次经过温度和风量均为85℃、28Hz的烘箱进行烘干，所述烘箱的长度均为4m，线速度均为40m/min。
根据本实施例中的方法得到的光学薄膜保护膜的剥离力为3.2N/m；阻抗：107Ω；铅笔硬度1B；有残胶。
上述参照实施例对一种光学薄膜保护膜及其制备方法进行的详细描述，是说明性的而不是限定性的，可按照所限定范围列举出若干个实施例，因此在不脱离本发明总体构思下的变化和修改，应属本发明的保护范围之内。

Claims (10)

1.一种光学薄膜保护膜，其特征在于，包括PE基膜层和胶层，所述胶层由胶水涂布在PE基膜层的表面经烘干而形成，所述胶水包括以下重量份的原料：丙烯酸酯类树脂26～36份；乙酸乙酯60～70份；异氰酸酯类固化剂3～6份；抗静电剂0.5～1份。
2.根据权利要求1所述的光学薄膜保护膜，其特征在于，所述PE基膜层包括A层和B层，A层为PE层，B层为添加了有机或无机粒子的PE层；所述有机或无机粒子的粒径为5～10μm。
3.根据权利要求2所述的光学薄膜保护膜，其特征在于，所述有机或无机粒子为有机硅、二氧化硅、PMMA、PBMA中的一种；其重量为B层中PE重量的5～8％；A层和B层通过共挤方式形成PE基膜层。
4.根据权利要求3所述的光学薄膜保护膜，其特征在于，所述有机或无机粒子为有机硅。
5.根据权利要求2所述的光学薄膜保护膜，其特征在于，所述胶水涂布在PE基膜层的A层表面；所述胶层的厚度为8～12μm。
6.根据权利要求1所述的光学薄膜保护膜，其特征在于，所述丙烯酸酯类树脂选自聚2-甲基丙烯酸甲酯、聚甲基丙烯酸甲酯、环氧丙烯酸甲酯、聚氨酯丙烯酸酯中的一种或多种。
7.根据权利要求1所述的光学薄膜保护膜，其特征在于，所述异氰酸酯类固化剂选自六亚甲基二异氰酸酯、异佛尔酮二异氰酸酯、二苯基甲烷二异氰酸酯、二环己基甲烷二异氰酸酯、甲苯二异氰酸酯中的一种或多种。
8.根据权利要求1所述的光学薄膜保护膜，其特征在于，所述抗静电剂选自硬脂基三甲基季铵盐酸盐、脂酰胺丙基羟乙基季胺硝酸盐、硬脂酸单甘油酯、烷基二羧甲基铵乙内酯中的一种或多种。
9.根据权利要求1所述的光学薄膜保护膜的制备方法，其特征在于，包括以下步骤：按照配方量将各原料混合均匀配制胶水，在PE基膜层的表面涂覆胶水，经70～95℃分段烘干即可得到所述耐高温耐紫外线保护膜。
10.根据权利要求9所述的制备方法，其特征在于，所述分段烘干工艺具体包括：依次经过70～80℃、22～26Hz风量；80～90℃、26～30Hz风量；85～95℃、33～37Hz风量、85～95℃、33～37Hz风量；75～85℃、24～28Hz风量的烘箱进行烘干。
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CN110564330A (zh) * 2019-09-18 2019-12-13 上海精珅新材料有限公司 一种可高速出货的亚克力保护膜胶水及其保护膜生产方法
CN111808348A (zh) * 2020-06-29 2020-10-23 深圳市象形科技有限公司 一种耐划pe光学保护膜及其制备方法
CN111925742A (zh) * 2020-08-06 2020-11-13 东莞市勤乐电子有限公司 一种涂布胶水及其制备方法及应用
CN113201158A (zh) * 2021-04-29 2021-08-03 江西昊泽光学膜科技有限公司 一种tpu保护膜及其tpu基膜、制备方法
CN114656885A (zh) * 2022-03-16 2022-06-24 腕美表现(深圳)科技有限公司 一种手表保护膜及其制造方法

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CN110564330A (zh) * 2019-09-18 2019-12-13 上海精珅新材料有限公司 一种可高速出货的亚克力保护膜胶水及其保护膜生产方法
CN111808348A (zh) * 2020-06-29 2020-10-23 深圳市象形科技有限公司 一种耐划pe光学保护膜及其制备方法
CN111925742A (zh) * 2020-08-06 2020-11-13 东莞市勤乐电子有限公司 一种涂布胶水及其制备方法及应用
CN111925742B (zh) * 2020-08-06 2022-04-19 东莞市勤乐电子有限公司 一种涂布胶水及其制备方法及应用
CN113201158A (zh) * 2021-04-29 2021-08-03 江西昊泽光学膜科技有限公司 一种tpu保护膜及其tpu基膜、制备方法
CN113201158B (zh) * 2021-04-29 2022-12-13 江西昊泽光学膜科技有限公司 一种tpu保护膜及其制备方法
CN114656885A (zh) * 2022-03-16 2022-06-24 腕美表现(深圳)科技有限公司 一种手表保护膜及其制造方法

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