CN108681213A - Digitize lithography system and method - Google Patents
Digitize lithography system and method Download PDFInfo
- Publication number
- CN108681213A CN108681213A CN201810456416.2A CN201810456416A CN108681213A CN 108681213 A CN108681213 A CN 108681213A CN 201810456416 A CN201810456416 A CN 201810456416A CN 108681213 A CN108681213 A CN 108681213A
- Authority
- CN
- China
- Prior art keywords
- light engine
- mission area
- area
- array
- engine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 121
- 238000001459 lithography Methods 0.000 title claims abstract description 85
- 239000000758 substrate Substances 0.000 claims abstract description 131
- 230000008569 process Effects 0.000 claims abstract description 48
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000001259 photo etching Methods 0.000 claims description 17
- 238000013519 translation Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 36
- 238000013461 design Methods 0.000 abstract description 19
- 238000010586 diagram Methods 0.000 description 19
- 238000003384 imaging method Methods 0.000 description 18
- 230000006870 function Effects 0.000 description 10
- 230000033001 locomotion Effects 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- 230000006399 behavior Effects 0.000 description 6
- 238000004590 computer program Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 230000033228 biological regulation Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003550 marker Substances 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 230000001360 synchronised effect Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 238000004422 calculation algorithm Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 230000023077 detection of light stimulus Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
This application provides a kind of digitlization lithography system and method, which includes：Substrate, including multiple tasks region, wherein each mission area is for placing one or more products to be exposed；Light engine array is arranged in the top of the substrate；Mobile platform is fixed on the pedestal of the digitlization lithography system, for carrying the substrate and the substrate being driven to translate；Engine position adjusting apparatus, for driving the light engine in the light engine array to translate；Control system controls the mobile platform and the engine position adjusting apparatus according to the information of multiple mission area, so that each mission area is exposed by the single light engine in the light engine array.Digitlization lithography system provided by the present application can effectively reduce the production difficulty of exposure process, while reducing the design cost and debugging cost of lithography system, improve the stability of the digitlization lithography system to avoid optics Mura streaks are generated in exposure process.
Description
Technical field
This application involves digitlization field of lithography, more specifically, are related to a kind of digitlization lithography system and method.
Background technology
Flat-panel monitor (Flat Panel Display, FPD) is widely used in smart mobile phone, consumer electronics, personal electricity
In the products such as brain, television set.FPD include organic light emitting diode display (Organic Light-Emitting Diode,
OLED) and liquid crystal display (Liquid Crystal Display, LCD), be coated on glass or flexible membrane positivity or
Negativity photosensitive material is prepared by multiple graph exposure or circuit photoetching.In order to realize graph exposure, thrown by optics
Shadow system has been given birth to the exposure sources (or being exposure system) for the photoresist that die plate pattern projects on glass substrate extensively
Production and use.
By the way of a large area exposure, the uniformity of exposure light source is difficult to ensure, this makes figure in large area
The uniformity of line width is difficult to unanimously.In order to comply with market mobile phone, flat-type shows the skill of product high-resolution and consistency of line width
Art demand generally uses stepping-scanning type exposure system on the basis of traditional masks photoetching at present.Utilize stepping-scan-type
When exposure system carries out the exposure of pattern, single independent display product is not it is possible that be disposably to expose entire product width
The case where face.The optics Mura streaks of scanning direction can be formed in parallel in single independent display product surface in this way so that
Show the brightness irregularities of product.Since human eye is very high to optical sensibility, the optics of energy uniformity deviation formation
Mura streaks can seriously affect user experience.
The consistency of exposure light source energy directly determines that the quality for the display products being exposed, exposure system are most crucial
Technology be ensuring that the consistency of exposure light source energy.Therefore, industry generally takes a large amount of design costs, processing cost and tune
Cost is tried to ensure the long-time stability of exposure light source energy coincidence and exposure system.How to avoid generating in exposure process
How optics Mura streaks and while ensure that production efficiency does not reduce, effectively reduce design difficulty, the difficult processing of lithography system
Degree and debugging difficulty become current urgent problem.
Invention content
The application provides a kind of digitlization lithography system and method, can to avoid in exposure process on product to be exposed
Optics Mura streaks are generated, the product quality of exposure is improved, effectively reduce the production difficulty of exposure process.Reduce digitlization simultaneously
The design cost and debugging cost of lithography system, improve the stability of the digitlization lithography system.
In a first aspect, a kind of digitlization lithography system is provided, including：Substrate, including multiple tasks region, wherein each
Mission area is for placing one or more products to be exposed, and any one product to be exposed is only positioned at a mission area
In；Light engine array is arranged in the top of the substrate, which includes multiple light engines；Mobile platform, Gu
It is scheduled on the pedestal of the digitlization lithography system, for carrying the substrate and the substrate being driven to translate；Engine position adjusting apparatus,
For driving the light engine in the light engine array to translate；Control system, according to the information of multiple mission area, control
The mobile platform and the engine position adjusting apparatus, so that each light engine in the light engine array exposes corresponding
Business region, wherein each mission area is exposed by the single light engine in the light engine array.
The digitlization lithography system that first aspect provides, since each mission area is exposed by individual light engine
Light can improve the product quality of exposure to avoid optics Mura streaks are generated on product to be exposed in exposure process.May be used also
Effectively to reduce the production difficulty of exposure process, can avoid expending excessive design cost in exposure light source energy coincidence
And debugging cost, production cost can be greatly reduced.
In a kind of possible realization method of first aspect, the mission area include it is multiple go out graph region, which draws
Array is held up to be exposed multiple mission area；When this goes out graph region and is less than the scanning area of the light engine, the control
The part number minitype reflector DMD that system controls the light engine is closed, so that the light engine is completed to the areas Chu Tu
The exposure in domain.In the realization method, the part number minitype reflector DMD by controlling the light engine is closed, so that
The light engine is completed this exposure of graph region, realizes that each mission area is exposed by individual light engine, keeps away
Exempt to generate optics Mura streaks in the same mission area in exposure process, improves the product quality of exposure.
In a kind of possible realization method of first aspect, which controls engine position adjusting apparatus adjustment
The initial position of each light engine in the light engine array so that the transverse direction in the light engine array between light engine
Spacing is the integral multiple of the length of the mission area.In the realization method, avoiding generating optics in exposure process
On the basis of Mura streaks, further reduce exposure frequency, improves production efficiency, reduce being designed to for the digitlization lithography system
Sheet and debugging cost, improve the stability of the digitlization lithography system.
In a kind of possible realization method of first aspect, which controls engine position adjusting apparatus adjustment
The initial position of each light engine in the light engine array so that the longitudinal direction in the light engine array between light engine
Spacing is the integral multiple of the width of the mission area.In the realization method, avoiding generating optics Mura in exposure process
On the basis of streak, further reduce exposure frequency, improve production efficiency, reduce the digitlization lithography system design cost and
Debugging cost improves the stability of the digitlization lithography system.
In a kind of possible realization method of first aspect, which controls engine position adjusting apparatus adjustment
The initial position of each light engine in the light engine array so that each corresponding mission area of light engine is in length side
Include upwards most one and goes out graph region less than the scanning area.In the realization method, avoiding generating in exposure process
On the basis of optics Mura streaks, further reduce exposure frequency, improves production efficiency, reduce setting for the digitlization lithography system
Cost and debugging cost are counted, the stability of the digitlization lithography system is improved.
In a kind of possible realization method of first aspect, which controls engine position adjusting apparatus adjustment
The initial position of each light engine in the light engine array so that the corresponding mission area of each light engine is in width
On direction include most one and goes out graph region less than the scanning area.In the realization method, avoiding producing in exposure process
On the basis of third contact of a total solar or lunar eclipse Mura streaks, further reduce exposure frequency, improves production efficiency, reduce the digitlization lithography system
Design cost and debugging cost improve the stability of the digitlization lithography system.
In a kind of possible realization method of first aspect, in exposure process, the substrate is along first direction and second
Direction translates, which remains unchanged, and the first direction is vertical with the second direction.In the realization method
In, since substrate moves in exposure process, which remains unchanged.The life of exposure process can effectively be reduced
Difficulty is produced, while reducing the design cost and debugging cost of the digitlization lithography system, improves the steady of the digitlization lithography system
It is qualitative.
Second aspect, provides a kind of method of digitlization photoetching, and this method is applied to above-mentioned first aspect or first
In the digitlization lithography system of any one realization method of aspect, this method includes：Determine the multiple tasks region of substrate,
In, each mission area includes one or more products to be exposed, and any one product to be exposed is only positioned at a mission area
In domain；Control light engine array is exposed multiple mission area, and each mission area is by the light engine array
In single light engine be exposed.
The method of digitlization photoetching provided by the present application, since each mission area is exposed by individual light engine
Light can improve the product quality of exposure to avoid optics Mura streaks are generated on product to be exposed in exposure process.May be used also
Effectively to reduce the production difficulty of exposure process, can avoid expending excessive design cost in exposure light source energy coincidence
And debugging cost, production cost can be greatly reduced.
In a kind of possible realization method of second aspect, the mission area include it is multiple go out graph region, the control should
Light engine array is exposed multiple mission area, including：This go out graph region be less than the light engine scanning area
When domain, the part number minitype reflector DMD of the light engine is closed, so that light engine completion goes out graph region to this
Exposure.In the realization method, the part number minitype reflector DMD by controlling the light engine is closed, so that the light
It learns engine to complete this exposure of graph region, realizes that each mission area is exposed by individual light engine, avoid
Optics Mura streaks are generated in exposure process in the same mission area, improve the product quality of exposure.
In a kind of possible realization method of second aspect, between the transverse direction in the light engine array between light engine
Integral multiple away from the length for being the mission area.In the realization method, avoiding generating optics Mura in exposure process
On the basis of streak, further reduce exposure frequency, improves production efficiency.Reduce the digitlization lithography system design cost and
Debugging cost.
In a kind of possible realization method of second aspect, between the longitudinal direction in the light engine array between light engine
Integral multiple away from the width for being the mission area.In the realization method, avoiding generating optics Mura in exposure process
On the basis of streak, further reduce exposure frequency, improves production efficiency.Reduce the digitlization lithography system design cost and
Debugging cost.
In a kind of possible realization method of second aspect, respectively the mission area of the light engine wraps in the longitudinal direction
It includes most one and goes out graph region less than the scanning area.In the realization method, avoiding generating optics in exposure process
On the basis of Mura streaks, further reduce exposure frequency, improves production efficiency, reduce design cost and the debugging of lithography system
Cost improves the stability of lithography system.In the realization method, avoiding generating optics Mura streaks basis in exposure process
On, further reduce exposure frequency, improve production efficiency, reduce the digitlization lithography system design cost and debugging at
This, improves the stability of the digitlization lithography system.
In a kind of possible realization method of second aspect, respectively the mission area of the light engine wraps in the direction of the width
It includes most one and goes out graph region less than the scanning area.In the realization method, avoiding generating optics in exposure process
On the basis of Mura streaks, further reduce exposure frequency, improves production efficiency, reduce being designed to for the digitlization lithography system
Sheet and debugging cost.Improve the stability of the digitlization lithography system.
In a kind of possible realization method of second aspect, in exposure process, the substrate is along first direction and second
Direction translates, which remains unchanged, and the first direction is vertical with the second direction.In the realization method
In, since substrate moves in exposure process, which remains unchanged.The life of exposure process can effectively be reduced
Difficulty is produced, while reducing the design cost and debugging cost of the digitlization lithography system, improves the steady of the digitlization lithography system
It is qualitative.
The third aspect provides a kind of computer readable storage medium, for storing computer program, the computer program
It include the instruction of the method for executing the possible realization method of any one of above-mentioned second aspect or second aspect.
Fourth aspect provides a kind of System on Chip/SoC, including：Processing unit and communication unit, the processing unit, the processing
Unit can perform computer instruction, so that the chip executes the possible realization of any one of above-mentioned second aspect or second aspect
The method of mode.
5th aspect, provides a kind of computer program product, which includes for executing above-mentioned second aspect or second
The instruction of the method for the possible realization method of any one of aspect.
Description of the drawings
Fig. 1 is the schematic block diagram of digitlization lithography system structure provided by the present application.
Fig. 2 is the schematic block diagram in the multiple tasks region that the substrate of one embodiment of the application includes.
Fig. 3 is the schematic block diagram of the digitlization lithography system structure of the application another embodiment offer.
Fig. 4 is the mission area of the application one embodiment, goes out graph region and the schematic diagram of scanning area.
Fig. 5 is the schematic diagram for the region that graph region, scanning area and DMD are closed of the application one embodiment.
Fig. 6 is the schematic diagram of mission area and scanning area on the substrate of the application one embodiment.
Fig. 7 is the schematic diagram of mission area and scanning area on the substrate of the application one embodiment.
Fig. 8 is mission area on the substrate of the application one embodiment, goes out the schematic diagram of graph region and scanning area.
Fig. 9 is mission area on the substrate of another embodiment of the application, goes out the schematic diagram of graph region and scanning area.
Figure 10 is the schematic diagram of the light engine structure of the application one embodiment.
Figure 11 is the schematic diagram of the light engine structure including vision system in the application one embodiment.
Figure 12 is the perspective schematic view of the digitlization lithography system of the application one embodiment.
Figure 13 is the schematic flow chart of the method for the digitlization photoetching that the application one embodiment provides.
Figure 14 is the schematic flow chart of the method for the digitlization photoetching of the application another embodiment offer.
Specific implementation mode
Below in conjunction with attached drawing, the technical solution in the application is described.
It should be understood that digitlization lithography system provided by the present application and method, be related to photoelectric display class, light emitting diode
(Light Emitting Diode, LED) class, chip integrated circuit (Integrated circuit, IC) electronic product etc..
The display area of these electronic products is smaller, and multiple product individuals can be once exposed on substrate.When product individual is to light
When learning splicing or more sensitive consistency of line width requirement, list can effectively avoid using the digitlization lithography system and method for the application
A product individual in exposure due to optic splice generate optics Mura, while be greatly reduced digitlization lithography system design
Difficulty, difficulty of processing and debugging difficulty.Use the digitlization lithography system of the application other on exposure technology processing procedure to solve
Problem is also fallen in the application protection domain.In addition, the digitlization lithography system and method for the application can be used for file print
The technical fields such as brush, photocopying, laser patterning.It will hereinafter be illustrated by taking the exposure of photoelectric display class application as an example, but
The application is not limited to this.
This application provides a kind of digitlization lithography system, which can be to avoid same in exposure process
Optics Mura streaks are generated on a product to be exposed, effectively reduce the production difficulty of exposure process, while reducing digitlization light
The design cost and debugging cost of etching system improve the stability of digitlization lithography system.Fig. 1 is the application one embodiment
Digitize the schematic block diagram of lithography system 100.As shown in Figure 1, the digitlization lithography system 100 may include substrate 101, light
Learn engine array, mobile platform 106, engine position adjusting apparatus 108 and control system (not shown in figure 1).
Substrate 101 includes multiple tasks region, wherein each mission area is used to place one or more products to be exposed,
And any one product to be exposed is only positioned in a mission area.Substrate 101 includes 8 tasks in example shown in Fig. 1
Region, number are followed successively by 1 to 8.It should be understood that according to the size etc. of production requirement and product to be exposed, which can wrap
Include more or less mission area.
Light engine array is arranged in the top of the substrate 101, which may include multiple light engines.
Each light engine in light engine array, can (such as directions x shown in Fig. 3) and second direction (example in a first direction
The directions y as shown in Figure 3) on translate, to guarantee to realize each mission area by single in the light engine array
Light engine is exposed.Wherein first direction and second direction can be vertical.
The light engine array includes 4 light engines, the block in 4 light engines such as Fig. 1 in example shown in FIG. 1
102 to shown in block 105.The light engine array is for generating exposing patterns and exposing patterns being transformed into substrate 101.Ying Li
Solution, the scanning area of light engine can be a rectangular area.The pattern that different light engines are exposed in synchronization can be with
It is identical, it can also be different.Pattern on different products to be exposed may be the same or different.
Mobile platform 106 is fixed on the pedestal 107 of the digitlization lithography system 100, for carrying the substrate 101 and driving
Move the substrate 101 translation.
Engine position adjusting apparatus 108 (as shown in dotted line frame in Fig. 1) is used to drive the light in the light engine array
Engine 102 to 105 is learned to translate.Optionally, the light engine array load is in the engine position adjusting apparatus 108.
The control system can be arranged on the substrate 101 of the digitlization lithography system 100, or can and engine position
Adjusting apparatus 108 is set together, or can also be arranged in the other positions of digitlization lithography system.The control system root
According to the information of multiple mission area, the mobile platform 106 and the engine position adjusting apparatus 108 are controlled, is moved by controlling
Platform 106 and the engine position adjusting apparatus 108 so that light engine and/or substrate 101 in the light engine array move
It is dynamic, the relative position of the light engine and mission area in the light engine array is adjusted, so as to appoint each of on the substrate 101
Business region is exposed by the single light engine in the light engine array.
Digitlization lithography system provided by the present application can control movement according to the information in multiple tasks region on substrate
Platform and engine position adjusting apparatus make the light engine array and/or substrate translate, adjust the light in the light engine array
The relative position of engine and mission area is learned, so that each light engine in the light engine array exposes corresponding mission area
Domain realizes that each mission area is exposed by individual light engine, since each mission area is to use the same light
Engine exposure is learned, completes to expose by multiple engines without being divided, optics Mura items are generated in exposure process to solve
The problem of trace, while individual task region is exposed using single light engine, can be avoided between multiple exposure light sources due to energy
System instability caused by difference in attenuation is measured, the stability of the product quality and the digitlization lithography system of exposure is improved.
Based on the thought that each mission area is exposed by individual light engine, mission area and light are rationally designed
Learn the parameter of engine, it is ensured that do not reduce production efficiency, while avoiding generating optics Mura streaks.
Digitlization lithography system provided by the present application can effectively reduce the production difficulty of exposure process, can avoid exposing
Excessive design cost and debugging cost are expended in radiant energy coincidence, and production cost can be greatly reduced.
Fig. 2 is the schematic block diagram in the multiple tasks region that the substrate of one embodiment of the application includes.
In example shown in Fig. 2, substrate includes 8 mission areas, and each mission area includes 4 products to be exposed, and
Any one product to be exposed is only positioned in a mission area.The process of image exposure is carried out in the digitlization lithography system
In, each mission area is exposed by individual light engine.
It should be understood that Fig. 2 is only exemplary, any restrictions should not be caused to embodiments herein.For example, the substrate
Can also include more mission areas.The size in multiple tasks region may be the same or different.Each mission area can
To include more or less product to be exposed etc..This is not restricted for the embodiment of the present application.
Digitlization lithography system provided by the present application is described in detail below in conjunction with Fig. 3.Fig. 3 show the application another
The schematic block diagram of the digitlization lithography system of embodiment, as shown in figure 3, digitlization lithography system 200 includes substrate 201, light
Learn engine array, mobile platform 206, engine position adjusting apparatus 208 and control system (not shown in figure 1).The digitlization light
The corresponding component of etching system 200 and the corresponding component setting of digitlization lithography system 100 are similar with function.
Substrate 201, including multiple tasks region, wherein each mission area is for placing one or more productions to be exposed
Product, and any one product to be exposed is only positioned in a mission area.Substrate 201 includes 8 in example shown in Fig. 3
It is engaged in region, numbering and being followed successively by 1 to 8.
Light engine array is arranged in the top of the substrate 201, which includes multiple light engines.With
It is corresponded on mission area in generating exposing patterns under control of the control system and exposing patterns being transformed into the substrate.It is optional
, the light engine which includes is with (M, N) array arrangement, and M and N are natural number, and the product of M and N is more than
Or it is equal to 2.The light engine array includes 4 light engines in example shown in Fig. 1, with (Isosorbide-5-Nitrae) array arrangement, such as Fig. 3
In block 202 to block 205 shown in.
The light engine array can be loaded in engine position adjusting apparatus 208, and engine position adjusting apparatus 208 is used for
The light engine in the light engine array is driven to translate.Each light engine in light engine array, can be in first party
It is translated on (such as directions x shown in Fig. 3) and second direction (such as directions y shown in Fig. 3).Optionally, engine position tune
Engagement positions 208 can be crossbeam arm configuration.On the light engine carry crossbeam arm configuration.Wherein, light engine is in the flat of the directions x
Shifting can realize that translation of the light engine in the directions y can pass through entirety by adjusting position of the light engine on crossbeam arm
Moving beam arm is realized.
Mobile platform 206 is fixed on the pedestal 207 of the digitlization lithography system 200.Mobile platform 206 includes platform,
For carrying the substrate 201, mobile platform 206 may include that two the linear guides 218 and 219 are used to support platform, mobile flat
Platform 206 can also include motor (being not shown in Fig. 3) for driving the substrate 201 to translate so that substrate 201 can in x and/or
Y is moved on direction.The linear guide 218 and 219 is located at the upper of pedestal 207, which can carry shock isolator etc..
Two linear encoders 220 and 221 are also provided at the both ends of mobile platform 206, are used for mobile platform
206 location information in the directions y feeds back to control system and linear encoder 222 and 224, for mobile platform 206 to exist
The location information in the directions x feeds back to control system.
In exposure process, it is possible that there is error or mobile route error etc. in position when substrate 201 moves, because
This, which is also provided with two position sensors 210 and 212, mobile platform when for detecting exposure
The location information of 206 movements.Two position sensors 210 and 212 can be two directions y position sensor, for detecting
Location information of the mobile platform 206 when the directions y are moved, and testing result is fed back into control system.So that control system is same
Walk each light engine in the light engine array.The mobile platform 206 is also provided with the position sensor in two directions x
223 and 225, feed back to control system for detecting location information of the mobile platform 206 when the directions x are moved, and by testing result
System.So that control system synchronizes each light engine in the light engine array.
The digitlization lithography system 200 can also include the position reference system 213 and 214 in two directions x, reference by location
System 213 and 214 can be fixed on crossbeam arm.Two can be arranged on mobile platform 206 or substrate 201 to put down with the directions y
Row reference baseline 215 and 216, reference baseline 215 and 216 are located at the lower section of position reference system 213 and 214.Join position
Test system 213 and 214 is used for when the mobile platform 206 moves, and detects the light engine array relative to substrate 201 in the side x
Upward site error, and testing result is fed back into control system.
Optionally, it is also provided with start mark 217 on the mobile platform 206 or the substrate 201, for identifying the light
The initial sweep position of each light engine in engine array is learned, each light engine includes vision in the light engine array
System.The vision system calibrates the relative position of the light engine and the substrate according to start mark 217, and the vision system is also
The information of multiple mission area can be obtained, and the information of multiple mission area is fed back into control system.
Optionally, which can also include reference marker tablet, for identifying the light engine battle array
The movement locus of row, the movement locus include start mark, the stop flag of each light engine in the light engine array
With scanning route.The vision system that each light engine of the light engine array includes, for according to the reference marker tablet
In movement locus calibrate the relative position of the light engine and the substrate.
Control system can be arranged on the substrate 201 of the digitlization lithography system 200, or can be with engine position tune
Engagement positions 208 are set together, or can also be arranged in the other positions of digitlization lithography system 200.Control system can
It is obtained with the vision system etc. by above-mentioned position reference system, origin identification, reference baseline, reference by location device, light engine
The relative position for taking each light engine array in the substrate 201 and light engine array, in conjunction with the letter of multiple mission area
Breath controls the mobile platform 206 and the engine position adjusting apparatus when replacement product type needs to adjust light engine spacing
208, to adjust the initial position of each light engine so that the position of each light engine and the matching of corresponding mission area.
When adjusting light engine spacing, the information in conjunction with multiple mission area and light engine corresponding with each mission area
Information, control the mobile platform 206 and the engine position adjusting apparatus 208, make the light engine array and/or substrate 201
Translation, adjusts the relative position of the light engine and mission area in the light engine array, so that in the light engine array
Each light engine expose corresponding mission area so that each mission area is by the single optics in the light engine array
Engine is exposed, and handles exposure pattern data.
When adjusting light engine spacing, control system is first according to the information of the mission area that sets (such as task
The location information in region, length and width information of mission area etc.), need on each mission area the pattern-information exposed,
The information etc. of light engine corresponding with each mission area, control mobile platform 206 and the engine position adjusting apparatus 208 are moved
It is dynamic so that the position of each light engine and the matching of corresponding mission area.And according to position sensor, position reference system with
And reference baseline etc. obtains substrate 201 or the mission area on substrate 201 and the relative position between corresponding light engine
Information, control light engine array and 201 relative motion of substrate.Light engine in light engine array generates and respective task
The corresponding exposing patterns in region, and exposing patterns are imaged on corresponding mission area.The position of light engine with it is corresponding
The position of the mission area on substrate 201 there is error and lead to the mission area it is also possible to being exposed by other light engine
Light time, control system adjust light engine in the light engine array and mission area according to the information of the mission area
Relative position, locking system parameter after the completion of adjustment, in exposure process can control each light engine throws exposing patterns
On shadow to corresponding mission area.
In the embodiment of the present application, the information of multiple mission area may include the length and width of multiple mission area
Spend information.The information in multiple tasks region can be by using the staff of digitlization lithography system 200 exposed
It is inputted before journey.
In one possible implementation, one or more reference points (such as base can be prestored in control system
The region that can be worked on plate referring initially to point and end reference point) location information.Control system is according to the length and width
Information can determine the position of each mission area in conjunction with the location information of reference point.
In alternatively possible realization method, the information in multiple tasks region include multiple mission area length and
Width information further includes the location information of reference point.I.e. the location information of reference point can not prestore in the controls,
But by using the staff of digitlization lithography system to be inputted before exposure process.Control system according to the length and
Width information can determine the position of each mission area in conjunction with the location information of reference point.
For example, as shown in Fig. 2, any with the most upper left corner of first mission area on the substrate upper left corner is reference
Point, it is assumed that the coordinate of the reference point is (0,0), and the length and width of each mission area is respectively 1 and 2, then the first row second
Four points of a mission area can be ((0,1), (0,2) (2,1), (2,2)) relative to the location information of reference point, control system
System can determine the mission area according to the coordinate of four points.The length and width information can also be relative to start mark
Location information, that is, carry start mark length and width information.Since there are one initial positions to mark for each light engine
Note, control system can obtain the initial position relative to the light engine that each light engine needs the mission area exposed
The coordinate information of label determines that the light engine needs the information of the mission area exposed by the coordinate information.
In another possible realization method, the information in multiple tasks region can be that correspondence waits exposing with various sizes of
The number of the substrate of light product.Assuming that certain substrate is served only for 4.7 cun of display screens of exposure, the number of the substrate is 047.In the number
Before changing lithography system exposure, the mission area on substrate is divided, how many of the typesetting of each mission area waits exposing
Light product is determined, and each engine has needed the information (such as location information on substrate) of the mission area exposed
It determines, control system in advance gets up these information storages.Staff using the digitlization lithography system is starting to expose
Before photoreduction process, it is only necessary to which either information control information is assured that this to the number of input substrate according to the number or information
The position of each mission area on substrate.
It should also be understood that the information of the mission area is also possible to before the digitlization lithography system dispatches from the factory, there is no determine.
For example, the substrate can be adapted for exposing various sizes of product.For various sizes of product, the size of mission area may
It can be different.Before being exposed, the various sizes of product exposed as needed, by the information input of ready-portioned mission area
Into the control system, control system combines information (such as mission area location information on substrate of different mission areas
Deng), according to the starting relative position of the calibration substrates such as position sensor, reference baseline, vision system and light engine array, so
Locking parameter carries out bulk article exposure afterwards, to realize that each mission area is exposed by individual light engine.
It should also be understood that the information of the mission area can also be other forms or can also include the mission area
Other information.For example, the position relative to opposite reference point absolute growth and absolute width, the mission area of the mission area
Information etc..This is not restricted for the embodiment of the present application.
Control system is filled according to the position of each mission area to control the mobile platform 206 and engine position adjustment
208 are set, to realize that each mission area on substrate 201 is exposed by the single light engine in the light engine array.
In the embodiment of the present application, each light engine can be with multiple functions.One of function is just
It is that each light engine can be including position sensor, which may be charge coupling device (Charge
Coupled Device, CCD) camera, laser position detector or other positions detector, it is fixed on mobile platform for reading
Or the position of the reference line or label on substrate.Second function is that the existing control system of specific position is identifiable on substrate
Pattern, the wherein location information of pattern are by the controller of light engine from the CCD and grating scale and position detection of light engine
Device is read.Third function is the autofocus system of light engine can detect the focal length of substrate surface automatically, to adjust light
The position for learning engine, so as to obtain pinpointed focus at any time.
In the embodiment of the present application, optionally, each light engine of the light engine array includes focusing mechanism, is used for
The light engine is driven along the direction vertical with the substrate, so that the exposing patterns of light engine output are imaged on the substrate
Surface on.
In the specific production instance of the application, in six generation line flexibility OLED producing lines, the size of substrate can be
It 1.8x1.5 meters, on the substrate can be with 5.5 cun of mobile phone display screens to 6 cun of equidimensions of 300 to 400 small pieces of typesetting.For this
Kind situation, digitlization lithography system provided by the embodiments of the present application can be with the more light engines of design configurations so that substrate can
To be divided into more mission areas, the subregion synchronous scanning of engine array implement, synchronous scanning is combined into the exposure figure of full page.
Each light engine completes independent mission area exposure, and the mission area area of single light engine exposure is small so that optics
Engine scanning completes individual task region and takes the production efficiency that digitlization lithography system can be substantially improved less.
Optionally, as one embodiment, the mission area include it is multiple go out graph region, the light engine array is more to this
A mission area is exposed；
When this goes out graph region and is less than the scanning area of the light engine, which controls the part of the light engine
Digital minitype reflector DMD is closed, so that the light engine is completed this exposure of graph region.
Specifically, multiple tasks region can be divided, graph region is obtained out.For a mission area
Speech, which can be divided into it is multiple go out graph region, it is multiple go out graph region size may be the same or different.
During light engine in the light engine array is exposed.Each light engine includes to corresponding mission area
It is multiple go out graph region be exposed.Control system can obtain the letter for going out graph region obtained after each mission area divides
Breath, for example, this goes out length and width information of graph region etc..The scanning area of light engine can be understood as light engine single
The region of exposure, since the area of a mission area may be bigger, it is thus possible to light engine be needed to scan multiple ability
The mission area is exposed and is completed.The region scanned each time is scanning area, and scanning area can be understood as light engine light
The region of spot exposure.The size for going out graph region can be identical with the size of scanning area, can also be different.
It is illustrated for shown in Fig. 4, Fig. 4 is that the application one embodiment goes out showing for graph region and scanning area
It is intended to.Include four mission areas on substrate shown in Fig. 4, number is respectively 1-1,1-2,2-1,2-2.Mission area 1-1 is drawn
Be divided into 9 and go out graph region, number is followed successively by 1 to 9, wherein 1,2,4 go out with No. 5 graph region size it is identical, 3 and No. 6 areas Chu Tu
The size in domain is identical, 7 go out with No. 8 graph region size it is identical, No. 9 sizes for going out graph region and other be in region size it is equal
It differs.Mission area 1-1 it is corresponding also include 9 scanning areas, that is, need scanning 9 times could will complete to mission area 1-
1 exposure.Wherein, 1,2,4 go out graph region and scanning area coincidence (size is identical) with No. 5, and others go out the big of graph region
It is small to be respectively less than scanning area (going out the part that graph region only accounts for scanning area).For example, 3,6,9,8 and No. 7 go out graph region point
Not Zhi Shi corresponding scanning area a part.And 3,6,9,8 and No. 7 scanning areas cover two mission areas, i.e.,
Cover mission area 1-1 and 1-2.It should be understood that in the example shown in Figure 4, mission area 1-1 can also include other numbers
Scanning area.The number for the scanning area that mission area includes can be originated according to the size of the mission area, light engine
Scan position etc. determines.
As shown in figure 4, for example, some light engine when going out graph region to 3,6 and No. 9 and being scanned, due to 3,6 and
No. 9 go out graph region and are less than scanning area, and the scanning area of the light engine has covered on another mission area, and another
This outer mission area is to be responsible for scanning by an other light engine.It will appear another mission area in this way
The problem of domain is exposed by two light engines.Therefore, when the light engine pair 3,6 and 9 goes out graph region and is scanned,
Go out the part of graph region beyond this for scanning area, which can control the light engine, and the number of this part is micro-
Type speculum (Digital Micro mirror Device, DMD) is closed, so that the scanning area of the light engine does not surpass
Go out this and go out graph region, to complete to go out the exposure of graph region to this.For example, as shown in figure 5, to 3,6 and No. 9 go out graph region into
When row scanning, control system is according to the information (such as position of scanning area) of the light engine scanning area and goes out graph region
Information (such as going out the position of graph region or the location information of mission area) determines that scanning area exceeds the mission area
Part controls the DMD that the light engine closes the part.As shown in figure 5, region shown in dash area is what DMD was closed
Region, so that the scanning area of the light engine goes out graph region without departing from this, to complete to go out the exposure of graph region to this.It is right
When 7 and No. 8 scanning for going out graph region, since scanning area is more than graph region, it is also desirable in a similar way,
Go out the part of graph region beyond this for scanning area, which can control the light engine and close the DMD of this part
It closes, so that the scanning area of the light engine goes out graph region without departing from this, to complete to go out the exposure of graph region to this.
It should be understood that Fig. 4 and Fig. 5 are only exemplary, without that should cause any restrictions to embodiments herein.Example
Such as, can also include more mission areas etc. on the substrate, this is not restricted by the application.
It should also be understood that mission area is divided into it is multiple go out graph region after, control system can obtain it is multiple go out figure
The information in region, it is multiple go out graph region information can be it is each go out graph region length and width information, the length and width
Degree information can be the location information of opposite reference point, that is, carry the length and width information of opposite reference point.The length and width
Degree information can also be the location information relative to start mark, that is, carry the length and width information of start mark.For example, by
In each light engine there are one initial position mark, control system can obtain it is each go out graph region relative to the optics
The coordinate information of the initial position label of engine determines the graph region that goes out that the light engine needs to expose by the coordinate information
Information.Control system according to it is above-mentioned it is multiple go out graph region length and width information, and each light engine scanning area
The information in domain, the part DMD for controlling light engine are closed.
It should also be understood that the control system can also directly according to the information of each mission area and with the mission area pair
The information of the scanning area for the light engine answered.It is determining that scanning area part falls in the mission area, is partly falling at this
When being engaged in outside region, controls the light engine and close the DMD for falling the part light engine outside the mission area.So that should
The scanning area of light engine is without departing from the mission area, to complete the exposure to the mission area.
Whether DMD is closed, it can be that control system determines in advance when to close DMD.For example, control system is more in acquisition
After the information of a mission area, the figure that goes out of the parameters such as the movement speed of integrated planning substrate and route and each light engine is joined
Number (including DMD closes associated control parameters).In exposure process, parameter that substrate and light engine have been planned in advance according to these
Execute action.
Whether DMD is closed, it can also be to be calculated and determined in real time in exposure process when to close DMD.Control system
The position of substrate and light engine can be monitored in real time, it is determined whether need to close DMD and close which DMD etc..
Optionally, as one embodiment, which controls the engine position adjusting apparatus and adjusts the light engine
The initial position of each light engine in array so that the horizontal spacing in the light engine array between light engine is this
The integral multiple of the length of mission area.
Specifically, according to the information of the light engine array and the mission area being each mission area in control system
When distributing light engine, in fact it could happen that because the increased feelings of exposure frequency occurs in the unreasonable of exposure task distribution of light engine
Condition.As shown in fig. 6, Fig. 6 is since the case where exposure frequency increase occurs in the unreasonable of exposure task distribution of light engine
Schematic diagram, shown in fig. 6 includes 6 mission areas, and the number of 6 mission areas is 1-1,1-2,1-3,2-1,2-2,2- respectively
3.Point A is expressed as the initial sweep position of the corresponding light engines of mission area 1-1.It can be seen that, for mission area 1-1, need
It scans 9 times, that is, needs to scan 3 times in the directions x and region 1-1 could be covered comprehensively.Point D is expressed as mission area 1-3 and corresponds to
Light engine array initial sweep position.For mission area 1-3, it is also desirable to which scanning 3 times in the directions x could be by region 1-
3 cover comprehensively.And the initial sweep position of the corresponding light engines of mission area 2-2 is expressed as mission area 2-2, point B
It sets, it can be seen that need to scan 4 times in the directions x and region 2-2 could all be scanned through.Due to the size of each mission area
It is identical, but region 2-2 but than region 1-1 more than the directions x run-down.And mission area 1-2, point C are expressed as appointing
The initial sweep position of the corresponding light engines of business region 1-2, it can be seen that, it is also desirable to scanning 4 times in the directions x could be by region
1-2 is all scanned through, that is, the number scanned is identical with the scanning times of mission area 2-2.The increase of scanning times, it is meant that production
The reduction of energy.For example, in above-mentioned example, mission area identical for size, some mission areas need scanning 3 times, and
Some mission areas but need scanning four times, cause production capacity and directly reduce 25%.Affect the digitlization lithography system
Working efficiency.
Therefore, before being exposed, the control system is according to the information of mission area (such as the size of mission area and position
Set), the information (such as size and location of scanning area) etc. of scanning area, calculated by simulating, control the engine position
Adjusting apparatus adjusts the initial position (initial sweep position) of each light engine in the light engine array so that the optics draws
Hold up the integral multiple that the horizontal spacing in array between light engine is the length of the mission area so that each light engine
It is scanned since the zone boundary of corresponding task.For example, in the directions x between A points and C points (or B points) shown in Fig. 6
Distance (horizontal spacing) be less than the length (directions x) of mission area, the i.e. start bit of the corresponding light engines of mission area 1-1
The horizontal spacing set between the initial position of light engine corresponding with mission area 1-2 (or 2-2) is less than mission area
Length.Therefore, control system can be calculated by simulating according to information such as length, the positions of mission area, control the engine position
Set the horizontal spacing between adjusting apparatus adjustment A points and C points (or B points) so that the transverse direction between A points and C points (or B points)
Spacing is the integral multiple of the length of mission area.For example, as shown in fig. 6, control the engine position adjusting apparatus by C points adjust to
C ' points, it is similar, B points can also be adjusted to B ' points.I.e. by adjusting the initial sweep position of light engine so that the optics
Horizontal spacing in engine array between light engine is 1 times of the length of the mission area, i.e., in the light engine array
The equal length of horizontal spacing and the mission area between light engine.It is right after the horizontal spacing between engine
In mission area 1-2 and 2-2, since the initial position that engine starts scanning changes.For only needing for the two regions
It scans and the two mission areas can be covered comprehensively in the directions x for 3 times so that each light engine is from corresponding task
Zone boundary starts to scan, and to increase the scanning times of needs, improves scan efficiency.
It should be understood that Fig. 6 is only exemplary, without that should cause any restrictions to embodiments herein.For example, the base
Can also include more mission areas etc. on plate, this is not restricted by the application.
It should be noted that in the digitlization lithography system of the embodiment of the present application, engine spacing can keep micron or receive
The other precision of meter level.In order to ensure to digitize the stability of lithography system, light engine position is generally remained not in production process
Become.
The case where for producing in batches, engine spacing can be only in producing line product type change, product typesetting size
It changes greatly, and original engine spacing is not content with when individual task region is exposed using single light engine and just makes the tune
It is whole.According to product type/dimension modifying, i.e. lockable engine spacing is made after the adjustment of engine spacing, in subsequent product type
Continuous production in no longer adjust engine spacing.
When product size variation is little, for example, product size from 5.6 cun of variations be 5.7/5.8 cun when, mission area
Size may be varied from, it is also possible to be remained unchanged, but be kept engine spacing constant, only adjust the opening and closing of the DMD of light engine
Just it still is able to be satisfied with individual task region using the exposure of single light engine, then engine spacing is not adjusted.This feelings
Under condition, the horizontal spacing between light engine can not be the integral multiple of the length of mission area, the longitudinal direction between light engine
Spacing can not be the integral multiple of the width of mission area.Digitlization photoetching can be effectively ensured by not adjusting the position of light engine
The stability of system.
Alternatively, work as product size multiplying power relationship change, such as product size from 5.6 cun variation for 2.8 cun or 11.2 cun when,
Product typesetting and mission area may have no need to change, and at this time without adjustment engine spacing, and only adjust light engine
The middle width for needing to close DMD, so that it may to realize that the single light engine in individual task region exposes.
It should also be understood that control system can according to light engine initial sweep position, in conjunction with mission area information and
The information (such as length and width information) of light engine scanning area, is calculated by simulating, and the starting for adjusting light engine is swept
Retouch position so that complete the scanning to mission area using minimum scanning times.For example, it is shown in fig. 6, for mission area
1-3, control system can be adjusted according to the length and width information of mission area 1-3 in conjunction with the information of light engine scanning area
The initial sweep position of whole light engine.For example, by adjusting rear so that light engine is scanned since D points, although D points are not
Mission area 1-3 boundary positions, but also only need to scan 3 times and mission area 1-3 can be completely covered in the directions x.I.e.
It can so that the horizontal spacing in the light engine array between light engine is not the integral multiple of the length of the mission area.
Optionally, as one embodiment, which controls the engine position adjusting apparatus and adjusts the light engine
The initial position of each light engine in array so that the longitudinal pitch in the light engine array between light engine is this
The integral multiple of the width of mission area.
Specifically, according to the information of the light engine array and the mission area being each mission area in control system
When distributing light engine, in fact it could happen that because the increased feelings of exposure frequency occurs in the unreasonable of exposure task distribution of light engine
Condition.It is illustrated for shown in Fig. 7, Fig. 7 is since exposure frequency occurs in the unreasonable of exposure task distribution of light engine
The schematic diagram of the case where increase, shown in Fig. 7 includes 6 mission areas, and the number of 6 mission areas is 1-1,1-2,1- respectively
3,2-1,2-2,2-3.Point A is expressed as the initial sweep position of the corresponding light engine of 1-1 mission areas.It can be seen that, for 1-1
Region needs scanning 9 times, that is, needs to scan 3 times in the directions y and could cover mission area 1-1 comprehensively.And for mission area
2-1, point F are expressed as the initial sweep position of the corresponding light engines of mission area 2-1.Mission area 2-3, point E are indicated
For the initial sweep position of the corresponding light engines of mission area 2-3, it can be seen that for mission area 2-1 and 2-3, all need
It to scan 4 times and the two mission areas could be covered comprehensively in the directions y.Since the size of each mission area is identical, but
Be mission area 2-1 and 2-3 but than mission area 1-1 more than the directions y run-down.The increase of scanning times means production capacity
It reduces.For example, in above-mentioned example, mission area identical for size, some mission areas need to scan 3 times in the directions y,
And some mission areas need to scan four times in the directions y, cause production capacity and directly reduce 25%.Affect the digitlization light
The working efficiency of etching system.
Therefore, before being exposed, the control system is according to the information of mission area (such as the size of mission area and position
Set), the information (such as size and location of scanning area) etc. of scanning area, calculated by simulating, control the engine position
Adjusting apparatus adjusts the initial position of each light engine in the light engine array so that optics draws in the light engine array
Longitudinal pitch (directions y) between holding up is the integral multiple of the mission area width so that each light engine is from corresponding
The zone boundary of task starts to scan.For example, the longitudinal pitch shown in fig. 7 between A points and F points (or E points) is less than
The width (width of mission area is put for A points and F ' at a distance from y-direction) of mission area, i.e. mission area 1-1 is corresponding
Between longitudinal direction between the initial position of the initial position of light engine light engine corresponding with mission area 2-1 (or 2-3)
Away from the width less than mission area.Therefore, control system can pass through simulation according to information such as width, the positions of mission area
It calculates, controls the longitudinal pitch between engine position adjusting apparatus adjustment A points and F points (or E points) so that A points and F points
Longitudinal pitch between (or E points) is the integral multiple of the width of mission area.For example, as shown in fig. 7, controlling the engine position
Adjusting apparatus adjusts F points to F ' points, similar, can also adjust E points to E ' points.I.e. by adjusting the starting of light engine
Scan position so that the longitudinal pitch in the light engine array between light engine is 1 times of the width of the mission area.
After the longitudinal pitch between engine, for mission area 2-1 and 2-3, since engine starts the initial position of scanning
It changes.The two regions are only needed to scan 3 times in the directions y and can cover the two mission areas comprehensively.
So that each light engine is scanned since the zone boundary of corresponding task, to which the scanning times of needs will not be increased,
Improve scan efficiency.
It should be understood that Fig. 7 is only exemplary, without that should cause any restrictions to embodiments herein.For example, the base
Can also include more mission areas etc. on plate, this is not restricted by the application.
It should also be understood that control system can according to light engine initial sweep position, in conjunction with mission area information and
The information (such as length and width information) of light engine scanning area, is calculated by simulating, and the starting for adjusting light engine is swept
Retouch position so that complete the scanning to mission area using minimum scanning times.For example, in above-mentioned example, by calculating,
F points can also not adjusted to F ' points, and F points are adjusted into downwards a certain distance so that light engine only needs to sweep in the directions y
Retouching 3 times can cover mission area 2-1 comprehensively.I.e. it is also possible that in the light engine array between light engine
Longitudinal pitch be the mission area width integral multiple.
It should also be understood that only controlling the engine position adjusting apparatus with control system in two above-mentioned examples adjusts the optics
The initial position of each light engine in engine array so that longitudinal pitch in the light engine array between light engine or
Person's horizontal spacing is respectively that the width of the mission area or 1 times of length illustrate, in the embodiment of the present application, in the optics
In the range that longitudinal pitch and horizontal spacing in engine array between light engine are adjustable, control system can also control this and draw
Hold up the initial position that position regulator adjusts each light engine in the light engine array so that in the light engine array
Longitudinal pitch and horizontal spacing between light engine are respectively the width of the mission area and other integral multiples of length, example
Such as, 2 times or 3 times etc., this is not restricted for the embodiment of the present application.
Optionally, as one embodiment, which controls the engine position adjusting apparatus and adjusts the light engine
The initial position of each light engine in array so that the corresponding mission area of each light engine includes in the longitudinal direction
Most one go out graph region less than the scanning area.
Specifically, being illustrated for shown in Fig. 8.Fig. 8 is mission area on substrate, goes out graph region and scanning
The schematic diagram in region.As depicted in figure 8 include 6 mission areas, number be respectively 1-1,1-2,1-3,2-1,2-2,2-2.Task
Region 1-1 is divided into 9 and goes out graph region, and number is followed successively by 1 to 9, wherein 1,2,4 go out with No. 5 graph region size it is identical, 3 Hes
No. 6 sizes for going out graph region are identical, 7 go out with No. 8 graph region size it is identical, No. 9 sizes for going out graph region and other be in area
The size in domain is all different.It is corresponding also to have 9 scanning areas, the size of 9 scanning areas identical.Scanning sequency is arrow institute
The sequence shown, scanning direction are the directions y.Wherein, 1,2,4 go out graph region and scanning area with No. 5 and overlap (size is identical), and its
The size that he goes out graph region is respectively less than scanning area (going out the part that graph region only accounts for scanning area).For example, 3,6,9,8 and
No. 7 go out graph region respectively be corresponding scanning area a part.And 3,6,9,8 and No. 7 scanning areas cover two
A mission area.
Mission area 1-1 shown in fig. 8, mission area 1-1 include three areas Hang Chutu on length direction (directions x)
Domain.First behavior goes out graph region 1,2 and 3, and the second behavior goes out graph region 4,5 and 6, and third behavior goes out graph region 7,8 and 9.Optics
Engine needs scan the scanning for completing three row graph region three times on length direction (directions x).Due to go out graph region 3,
6,9 be that this three row goes out the last one of graph region and goes out graph region respectively.As can be seen that for this last three length for going out graph region
Degree is respectively less than the length of scanning area.I.e. the corresponding mission area of the light engine only includes one in every a line of length direction
It is a to go out graph region less than the scanning area.
Mission area 1-3 shown in fig. 8, mission area 1-3 are divided into 12 and go out graph region, number be followed successively by 10 to
21, wherein 10 go out with No. 14 graph region size it is identical, 11,12,15 go out with No. 16 graph region size it is identical, 13 and No. 17
The size for going out graph region is identical, 19 go out with No. 20 graph region size it is identical, 18 and No. 21 sizes for going out graph region and its elsewhere
Size in region is all different.It is corresponding also to have 12 scanning areas, the size of 12 scanning areas identical.Wherein, 11,
12,15 go out graph region and scanning area coincidence (size is identical) with No. 16, and the size that others go out graph region is respectively less than scanning
Region (goes out the part that graph region only accounts for scanning area).For example, it is corresponding sweep that 10,14 and No. 18, which go out graph region respectively,
Retouch the part in region.And 10,14 and No. 18 scanning areas cover two mission areas, that is, cover mission area 1-
2 and 1-3.
Mission area 1-3 shown in fig. 8, mission area 1-3 include three areas Hang Chutu on length direction (directions x)
Domain.First behavior goes out graph region 10 to 13, and the second behavior goes out 13 value 17 of graph region, and third behavior goes out graph region 18 to 21.Optics
Engine needs to scan the scanning for completing three row graph region three times in the longitudinal direction.Going out graph region 10,14,18 is respectively
This three row go out graph region first goes out graph region, go out graph region 13,17,21 be respectively this three row go out graph region the last one
Go out graph region, for the first row goes out graph region, the length for going out graph region 10 is less than the length of scanning area, goes out graph region 13
Length again smaller than scanning area length.I.e. the corresponding mission area of the light engine includes in every a line of length direction
Two go out graph region less than the scanning area.For the regions 1-3, need the directions x scan 4 times could be by mission area 1-3
It covers comprehensively.And for above-mentioned 1-1 mission areas, it is only necessary to scan 3 times and can cover region 1-1 comprehensively in the directions x
It arrives.I.e. compared to mission area 1-1, in the case where task area size is constant, scanning times increase once, scanning times
Increase, it is meant that the reduction of production capacity.When control system according to the initial sweep position of light engine, scanning area information,
The information etc. of mission area is determined by calculation when will appear this scanning situations of mission area 1-3 as shown in Figure 8, into
Before row exposure, in this case, the control system is according to the information of mission area 1-3 (such as mission area 1-3 start bits
Confidence cease) or mission area 1-3 the information (such as going out graph region start position information) for going out graph region, control the engine position
The initial position that adjusting apparatus adjusts this light engine is set, that is, adjusts the initial sweep position of the light engine so that the light
The corresponding mission area 1-3 of engine at most only includes one in every a line of length direction and goes out figure less than the scanning area
Region.For example, the initial sweep position that can adjust the light engine is located on the boundary of corresponding mission area.For task
Region 1-3, control system can control the initial position that the engine position adjusting apparatus adjusts the light engine so that the optics
Engine is scanned since on the left margin of mission area 1-3.So that the corresponding mission area 1-3 of the light engine is in length direction
Every a line on only include one and be less than the scanning area and go out graph region.In this way, for mission area 1-3, it is only necessary in the side x
Mission area 1-3 can be covered comprehensively to scanning 3 times.Improve efficiency and production capacity.
It is adjusted in the light engine array each it should be understood that the control system can also control the engine position adjusting apparatus
The initial position of light engine so that for a mission area, at most only there are one scanning areas in the longitudinal direction
It does not fully fall in the mission area.Such as in mission area 1-1 shown in Fig. 8, for every a line, only there are one scanning areas
Domain is not fully fallen in the mission area.
It should also be understood that Fig. 8 is only exemplary, without that should cause any restrictions to embodiments herein.For example, should
Can also include more mission areas etc. on substrate, this is not restricted by the application.
Optionally, as one embodiment, which controls the engine position adjusting apparatus and adjusts the light engine
The initial position of each light engine in array so that the corresponding mission area of each light engine includes in the direction of the width
Most one go out graph region less than the scanning area.
Specifically, being illustrated for shown in Fig. 9.Fig. 9 is mission area on substrate, goes out graph region and scanning area
The schematic diagram in domain.Shown in Fig. 9 includes 6 mission areas, and the number of 6 mission areas is 1-1,1-2,1-3,2-1,2- respectively
2,2-3.Mission area 1-1 is divided into 9 and goes out graph region, and number is followed successively by 1 to 9, wherein 1,2,4 and No. 5 goes out the big of graph region
It is small identical, 3 go out with No. 6 graph region size it is identical, 7 go out with No. 8 graph region size it is identical, No. 9 sizes for going out graph region and
Other sizes for being in region are all different.It is corresponding also to have 9 scanning areas, the size of 9 scanning areas identical.It scans suitable
Sequence is sequence shown in arrow, and scanning direction is the directions x.Wherein, 1,2,4 and No. 5 goes out graph region and scanning area coincidence (size
It is identical), and the size that others go out graph region is respectively less than scanning area (going out the part that graph region only accounts for scanning area).Example
Such as, 3,6,9,8 and No. 7 go out graph region respectively be corresponding scanning area a part.And 3,6,9,8 and No. 7 scanning areas
Domain covers two mission areas.Mission area 1-1 lists graph region in width direction (directions y) comprising three.For
For one lists graph region, the width for going out graph region 3 is less than the width of scanning area, the i.e. corresponding mission area of the light engine
The width for being less than the scanning area including 1 on each row of width direction goes out graph region.It needs in the directions y (task
In the width direction in region) it scans 3 times and region 1-1 can be covered comprehensively.
Mission area 2-3 shown in Fig. 9, mission area 2-3 are divided into 12 and go out graph region, number be followed successively by 10 to
21, it is corresponding also to have 12 scanning areas, the size of 12 scanning areas identical.Wherein, 13,14,16 and No. 17 go out graph region
Overlap (size is identical) with scanning area, and it is other go out graph region size be respectively less than scanning area and (go out graph region only to account for
A part for scanning area).For example, 10,11 and No. 12 go out graph region respectively be corresponding scanning area a part.And
10,11 and No. 12 corresponding scanning areas cover two mission areas, that is, cover mission area 1-3 and 2-3.
Mission area 2-3 shown in Fig. 9, mission area 2-3 list figure area in width direction (directions y) comprising three
Domain.For first lists graph region, the width for going out graph region 10 is less than the width of scanning area, goes out the width of graph region 19
Again smaller than the width of scanning area.I.e. the corresponding mission area of the light engine includes two small on each row of width direction
Go out graph region in the width of the scanning area.For mission area 2-3, need in the directions the y (width direction of mission area
On) scan 4 times and mission area 2-3 could be covered comprehensively.And for above-mentioned 1-1 mission areas, it is only necessary to be swept in the directions y
Retouching 3 times can cover region 1-1 comprehensively.I.e. compared to mission area 1-1, in the case where task area size is constant,
Scanning times increase once, and the increase of scanning times means the reduction of production capacity.When control system rising according to light engine
Beginning scan position, the information of scanning area, information of mission area etc., which are determined by calculation, will appear 2-3 as shown in Figure 9
When this scanning situation, before being exposed, the control system is according to the information of mission area 2-3 (such as mission area 2-3
Start position information) or mission area 2-3 the information (such as going out graph region start position information) for going out graph region, control should
Engine position adjusting apparatus adjusts the initial position of this light engine, that is, adjusts the initial sweep position of the light engine, make
The initial sweep position for obtaining the light engine is located on the boundary of corresponding mission area.For example, for mission area 2-3, control
System processed can control the initial position that the engine position adjusting apparatus adjusts the light engine so that the light engine is from task
The coboundary of region 2-3 starts to scan.The corresponding mission area 2-3 of the light engine in this way on each row of width direction only
Go out graph region less than the scanning area including one.In this way, for mission area 2-3, it is only necessary to scan 3 times just in the directions y
Mission area 2-3 can be covered comprehensively.Improve efficiency and production capacity.
It is adjusted in the light engine array each it should be understood that the control system can also control the engine position adjusting apparatus
The initial position of light engine so that for a mission area, at most only there are one scanning areas in the direction of the width
It does not fully fall in the mission area.Such as in mission area 1-1 shown in Fig. 9, for each row, only there are one scanning areas
Domain is not fully fallen in the mission area.
It should also be understood that Fig. 9 is only exemplary, without that should cause any restrictions to embodiments herein.For example, should
Can also include more mission areas etc. on substrate, this is not restricted by the application.
Optionally, as one embodiment, in exposure process, which translates along first direction and second direction, should
Light engine array position remains unchanged, and the first direction is vertical with the second direction.
Specifically, as shown in Figure 3.Since substrate 201 is arranged on mobile platform 206, mobile platform 206 is for holding
It carries the substrate 201 and the substrate 201 is driven to translate.In exposure process, control system can control the mobile platform 2063 shifting
It is dynamic, drive substrate first direction and second direction translation.The light engine array position remains unchanged, i.e. the light engine array
It does not move.The first direction is vertical with the second direction.For example, the first direction can be the directions x, which can be
The directions y.It is translated along first direction and second direction by control base board 201, makes the opposite position with light engine of substrate adjustment,
So that each light engine in the light engine array exposes corresponding mission area, so that each mission area is by this
Single light engine in light engine array is exposed.
It should be understood that in the embodiment of the present application, in exposure process, which translates along first direction and second direction,
The light engine array can also along a first direction and/or second direction translation.This is not restricted for the embodiment of the present application.
In the embodiment of the present application, when the first direction is perpendicular to the substrate, optionally, which is additionally operable to drive
It moves the substrate to move along third direction, the third direction is vertical with the second direction, and the third direction is parallel to the substrate；
The mobile platform is additionally provided at least one third direction position sensor, along the third when for detecting mobile platform movement
The location information in direction, so that control system synchronizes each light engine that the light engine array includes.
In each embodiment of the application, optionally, as shown in Figure 10, each optics in the light engine array draws
Hold up including：
Exposure light source 301 provides exposing light beam to the light engine 300；
Spatial light modulator 303, for generating exposing patterns；
Be imaged converting system 305, for the exposing patterns to be transformed into the substrate 301, the imaging converting system 105 its
In an imaging conjugate point be located on the surface of the substrate 307.
It should be understood that in the embodiment of the present application, which provides ultraviolet light (Ultraviolet Rays, UV),
It is exposed with the substrate 307 of the light-sensitive material to being coated with such as photoresist.The exposure light source 301 can also include optical fiber and
Light collimates homogenizer, and the exposing light beam that exposure light source 301 emits enters light by optical fiber and collimates homogenizer, with to exposing light
Shu Jinhang is collimated and/or Homogenization Treatments.It should be understood that exposure light source 301 can only include individual exposure light source, can also wrap
The exposure light source that output beam has already passed through collimation and/or Homogenization Treatments is included, the application is not limited to this.
Specifically, as shown in Figure 10, light engine includes the exposure light source 301 with optical fiber 309, optical collimator and
The output light of light device 302, optical collimator and light device 302 is reflected into spatial light modulator (Spatial Light by minute surface 304
Modulator, SLM) 303, SLM 303 is imaged onto on substrate 307 by lens 305.There is photoresist painting on the surface of substrate 307
Layer.Optical collimator and light device 302 are that SLM 303 provides a branch of uniform beam, and mobile platform 308 is used for supporting substrate 307.
Tablet 308 can move under control of the control system in the directions XY.Spatial light modulator 303 generates the pattern of pixels needed.
It is simultaneously synchronous with the movement of mobile platform 308 that pattern of pixels can retain one specific time in spatial light modulator 303.From
By imaging converting system 305, the light come out from imaging converting system 305 is then focused into substrate 307 light that SLM303 is sent out
Surface on.306 be the optical axis of the light engine 300.Substrate 307 can be LCD glass plates, printed circuit board (Printed
Circuit Board, PCB) plate or semiconductor wafer.Include multiple tasks region on substrate 307, wherein each mission area
Domain is for placing one or more products to be exposed, and any one product to be exposed is only positioned in a mission area.The number
The mobile mechanism for having Z-direction in word lithography system, in the focus adjustment of light engine 100.
In the embodiment of the present application, optionally, which can be provided including ultraviolet light, infrared light, visible
At least one of light, electron beam, ion beam and X-ray energy radiates.Optionally, which includes：In the future
It is transformed into the imaging len on the substrate from the exposing patterns of the spatial light modulator；Or it will be from the every of the spatial light modulator
The lattice array imaging system that the light of a pixel is focused to lattice array and is transformed on the substrate；Or the spatial light modulator will be come from
The exposing patterns subgraph array imaging system that is divided into subgraph array and is transformed on the substrate.
The imaging converting system 305 includes projecting to the exposing patterns from the spatial light modulator 303 on substrate 307
Imaging len；That is imaging converting system 305 uses direct imaging method；Optionally, which includes that will come from
The lattice array imaging system that the light of each pixel of the spatial light modulator 303 is focused to lattice array and is imaged onto on the substrate 307
System；That is imaging converting system 305 uses lattice array method.Optionally, which includes that will come from the spatial light tune
The subgraph array imaging system that the exposing patterns of device 303 processed are divided into subgraph array and are imaged onto on the substrate 307；
As converting system 305 uses subgraph Array Method.
It should be understood that in the embodiment of the present application, the light engine which includes can also specific other knots
Structure.Such as the light engine in the embodiment of the present application can also use Patent No. US6379867, US6473237,
Light engine described in US6493867 or US7932993, the embodiment of the present application are not limited to this.
Figure 11 is the schematic block diagram of the light engine including vision system in the embodiment of the present application.As shown in figure 11,
The vision system can be made of following components：Camera 310, imaging len 311, regulation light source 312 (will not be to substrates
Light-sensitive material exposure on 307, such as yellow light or feux rouges), collimation lens 313 and beam splitter 314.Wherein collimation lens 313 is used
To assemble the light from regulation light source 312, and it is irradiated on substrate 307 by a beam splitter 314, the beam splitter 314
Reflectivity and light transmittance be generally 50% and 50% so that light can be reflected from substrate 307, into imaging len
311 and camera 310.Therefore, if having exposing patterns on substrate 307, camera 310 can read in the exposing patterns.
In the embodiment of the present application, optionally, the vision system in the light engine includes：First regulation light source, first
Beam splitting arrangement and the first imaging device；Wherein, which has the light insensitive to the light-sensitive material on the substrate
Wavelength, the calibration beam of first regulation light source transmitting is after through first beam splitting arrangement, by the scanning platform or the substrate
It is reflected back first beam splitting arrangement, and first imaging device is reflected into via first beam splitting arrangement.
Figure 12 is the perspective schematic view of the digitlization lithography system of the application one embodiment.As shown in figure 12, the number
Word lithography system includes 8 light engines on XYZ platforms, and 8 light engines are respectively 411,412,413,415,
420,421,422,423.Wherein, it is mounted with light engine 411,412,413,415 on beam 417.Optics is mounted on beam 406 to draw
Hold up 420,421,422,423.Each light engine can there are one individual Z platforms, for focusing automatically.Substrate 405 is arranged
On mobile platform 404.It includes one or more products to be exposed to have multiple tasks region, each mission area on substrate 405,
And any one product to be exposed is only positioned in a mission area.Mobile platform 404 can with drive substrate 405 along X and/or
Y-direction moves.These engines are scanned relative to substrate 405.Beam 417 and beam 406 pass through two linear motors in the Y direction
403 and 407 drivings so that each light engine can move in the Y direction.Mobile device in X direction is additionally provided on beam 406
425, beam 417 is also equipped with the mobile device 414 of setting in X direction, each optics being respectively used in driving beam 406 and beam 417
Engine is moved in X-direction.Two linear motors 403 and 407 are respectively set on the linear guide 402 and 408, and respectively
With linear encoder 401 and 409, linear encoder 401 and 409 is used for the location information of mobile platform 404 in the Y direction is anti-
It feeds control system.There are two position sensor 410 and 416 on beam 417, there are two position sensor 419 and 418 on beam 406,
Be respectively intended to detect light engine on each beam relative to reference line site error.Reference marker is fixed on mobile platform
On 404.Spacing between two groups or multigroup beam can adjust, and the spacing between the light engine on each beam also may be used
With adjustment, so that the spacing between each light engine can be adjusted in X and Y-direction.Control system is according to mission area
The information in domain, by adjusting the spacing between the relative position of light engine and substrate, and adjustment light engine so that substrate
On each mission area be exposed by the single light engine in the light engine array.
It should be understood that Figure 12 is only exemplary, any restrictions, example should not be caused to the digitlization lithography system of the application
Such as, which can also include more engines etc..This is not restricted for the embodiment of the present application.
Present invention also provides a kind of method of digitlization photoetching, this method can be applied in above-mentioned number provided by the present application
In word lithography system, Figure 13 is that the schematic flow chart of the method for digitlization photoetching provided by the present application as shown in figure 13 should
Method 500 includes：
S510 determines the multiple tasks region of substrate, wherein each mission area includes one or more productions to be exposed
Product, and any one product to be exposed is only positioned in a mission area.
S520, control light engine array are exposed multiple mission area, and each mission area is drawn by the optics
The single light engine held up in array is exposed.
The method of digitlization photoetching provided by the present application, can be according to the information in multiple tasks region on substrate, and adjusting should
The relative position of light engine and mission area in light engine array, so that each optics in the light engine array draws
The corresponding mission area of exposure is held up, realizes that each mission area is exposed by individual light engine, is not reducing production effect
While rate, since each mission area is exposed using the same laser engine, without being divided by multiple engines Lai complete
At exposure, to solve the technical barrier of graph exposure Mura.
Optionally, as one embodiment, the mission area include it is multiple go out graph region, in S520, the control light
Engine array is learned to be exposed multiple mission area, including：
When this goes out graph region and is less than the scanning area of the light engine, the part number for closing the light engine is miniature anti-
Mirror DMD is penetrated, so that the light engine is completed this exposure of graph region.
Optionally, as one embodiment, the horizontal spacing in the light engine array between light engine is this
The integral multiple of the length in business region.
Optionally, as one embodiment, the longitudinal pitch in the light engine array between light engine is this
The integral multiple of the width in business region.
Optionally, as one embodiment, respectively the mission area of the light engine includes most one in the longitudinal direction
Go out graph region less than the scanning area.
Optionally, as one embodiment, respectively the mission area of the light engine includes most one in the direction of the width
Go out graph region less than the scanning area.
Optionally, as one embodiment, in exposure process, which translates along first direction and second direction, should
Light engine array position remains unchanged, and the first direction is vertical with the second direction.
It should be understood that each implementation of each embodiment and above-mentioned digitlization lithography system in the method for digitlization photoetching
Example is corresponding, and similar description can refer to the above-mentioned description for digitizing the embodiment of lithography system, for sake of simplicity, herein not
It is repeating.
Below in conjunction with specific example, illustrate the method for digitlization photoetching provided by the present application.
Figure 14 is the method schematic flow chart of digitlization photoetching provided by the present application.As shown in figure 14, this Shen is being utilized
Before the digitlization lithography system that please be provided is exposed, the product to be exposed on substrate is determined according to the drawing of product first,
Then division that product to be exposed on substrate is carried out to mission area, that is, carry out according to the sized divisions exposure area of product
It is only by single engine to determine whether the region of the DMD closings by adjusting light engine can meet individual task region for process
Vertical exposure, if the region by adjusting the DMD closings of light engine can meet individual task region by single engine independence
Exposure requires, then starts to expose.If by adjusting light engine DMD close region cannot meet individual task region by
Single engine separate exposures requirement needs the spacing adjusted between calculating engine by simulation, and is light engine again
Corresponding mission area is distributed, and determines to close the information in region by adjusting the DMD of light engine so that individual task area
Domain is by single engine separate exposures.Later, the spacing between (matching) engine is adjusted according to the result that simulation calculates, according to each
The exposure parameter (exposure parameter of splicing parameter and figure entirety between each engine) of the pattern of light engine exposure, by these
Reference record is simultaneously stored in the digitlization lithography system (systematic parameter locking), can be produced later according to these parameters
The exposure of product.
It should be understood that in the embodiment of the present application, term " first ", " second " are only for distinguishing different devices, without answering
Any restriction is constituted to the quantity of device, and " first " and " second " can be interchanged, the embodiment of the present application is not limited to this.
It should also be understood that above-mentioned be intended merely to that those skilled in the art is helped to more fully understand the embodiment of the present application, and have to
Limit the range of the embodiment of the present application.Those skilled in the art are according to given above-mentioned example, it is clear that can carry out various etc.
The modification or variation of valence, or certain steps etc. can newly be added.Either above-mentioned arbitrary two kinds or arbitrary various embodiments
Combination.Scheme after such modification, variation or combination is also fallen into the range of the embodiment of the present application.
It should also be understood that the difference between emphasizing each embodiment is focused on to the description of the embodiment of the present application above,
The same or similar place that do not mention can refer to mutually, for sake of simplicity, which is not described herein again.
It should also be understood that size of the sequence numbers of the above procedures is not meant that the order of the execution order, the execution of each process
Sequence should be determined by its function and internal logic, and the implementation process without coping with the embodiment of the present application constitutes any restriction.
The embodiment of the present application also provides a kind of computer-readable mediums, for storing computer program code, the calculating
Machine program includes the instruction of the method for the digitlization photoetching for executing above-mentioned the application.The readable medium can be read-only storage
Device (Read-Only Memory, ROM) or random access memory (Random Access Memory, RAM), the application are implemented
Example is without limitation.
The embodiment of the present application also provides a kind of computer program product, which includes above-mentioned for executing
The instruction of the method for digitlization photoetching in any embodiment.
Those of ordinary skill in the art may realize that lists described in conjunction with the examples disclosed in the embodiments of the present disclosure
Member and algorithm steps can be realized with the combination of electronic hardware or computer software and electronic hardware.These functions are actually
It is implemented in hardware or software, depends on the specific application and design constraint of technical solution.Professional technician
Each specific application can be used different methods to achieve the described function, but this realization is it is not considered that exceed
Scope of the present application.
It is apparent to those skilled in the art that for convenience and simplicity of description, the system of foregoing description,
The specific work process of device and unit, can refer to corresponding processes in the foregoing method embodiment, and details are not described herein.
In several embodiments provided herein, it should be understood that disclosed systems, devices and methods, it can be with
It realizes by another way.For example, the apparatus embodiments described above are merely exemplary, for example, the unit
It divides, only a kind of division of logic function, formula that in actual implementation, there may be another division manner, such as multiple units or component
It can be combined or can be integrated into another system, or some features can be ignored or not executed.Another point, it is shown or
The mutual coupling, direct-coupling or communication connection discussed can be the indirect coupling by some interfaces, device or unit
It closes or communicates to connect, can be electrical, machinery or other forms.
The unit illustrated as separating component may or may not be physically separated, aobvious as unit
The component shown may or may not be physical unit, you can be located at a place, or may be distributed over multiple
In network element.Some or all of unit therein can be selected according to the actual needs to realize the mesh of this embodiment scheme
's.
In addition, each functional unit in each embodiment of the application can be integrated in a processing unit, it can also
It is that each unit physically exists alone, it can also be during two or more units be integrated in one unit.
It, can be with if the function is realized in the form of SFU software functional unit and when sold or used as an independent product
It is stored in a computer read/write memory medium.Based on this understanding, the technical solution of the application is substantially in other words
The part of the part that contributes to existing technology or the technical solution can be expressed in the form of software products, the meter
Calculation machine software product is stored in a storage medium, including some instructions are used so that a computer equipment (can be
People's computer, server or network equipment etc.) execute each embodiment the method for the application all or part of step.
And storage medium above-mentioned includes：USB flash disk, mobile hard disk, read-only memory (Read-Only Memory, ROM), arbitrary access are deposited
The various media that can store program code such as reservoir (Random Access Memory, RAM), magnetic disc or CD.
The above, the only specific implementation mode of the application, but the protection domain of the application is not limited thereto, it is any
Those familiar with the art can easily think of the change or the replacement in the technical scope that the application discloses, and should all contain
It covers within the protection domain of the application.Therefore, the protection domain of the application should be based on the protection scope of the described claims.
Claims (14)
1. a kind of digitlization lithography system, which is characterized in that including：
Substrate, including multiple tasks region, wherein each mission area is used to place one or more products to be exposed, and it is arbitrary
One product to be exposed is only positioned in a mission area；
Light engine array is arranged in the top of the substrate, and the light engine array includes multiple light engines；
Mobile platform is fixed on the pedestal of the digitlization lithography system, for carrying the substrate and driving the substrate
Translation；
Engine position adjusting apparatus, for driving the light engine in the light engine array to translate；
Control system controls the mobile platform and engine position adjustment dress according to the information of the multiple mission area
Set, so that each light engine in the light engine array exposes corresponding mission area, wherein each mission area by
Single light engine in the light engine array is exposed.
2. system according to claim 1, which is characterized in that
The mission area include it is multiple go out graph region, the light engine array is exposed the multiple mission area；
It is described go out graph region be less than the light engine scanning area when, the control system controls the light engine
Part number minitype reflector DMD is closed so that the light engine complete to it is described go out graph region exposure.
3. system according to claim 1 or 2, which is characterized in that the control system controls the engine position adjustment
Device adjusts the initial position of each light engine in the light engine array so that optics draws in the light engine array
Horizontal spacing between holding up is the integral multiple of the length of the mission area.
4. system according to claim 1 or 2, which is characterized in that the control system controls the engine position adjustment
Device adjusts the initial position of each light engine in the light engine array so that optics draws in the light engine array
Longitudinal pitch between holding up is the integral multiple of the width of the mission area.
5. system according to claim 2, which is characterized in that the control system controls the engine position adjusting apparatus
Adjust the initial position of each light engine in the light engine array so that the corresponding mission area of each light engine
Domain includes in the longitudinal direction most one and goes out graph region less than the scanning area.
6. the system according to claim 2 or 5, which is characterized in that the control system controls the engine position adjustment
Device adjusts the initial position of each light engine in the light engine array so that corresponding of each light engine
Business region includes in the direction of the width most one and goes out graph region less than the scanning area.
7. system according to claim 1 or 2, which is characterized in that in exposure process, the substrate along first direction and
Second direction translates, and the light engine array position remains unchanged, and the first direction and the second direction are vertical.
8. a kind of method of digitlization photoetching, the method are applied to the digitlization photoetching described in any one of claim 1 to 7
In system, which is characterized in that including：
Determine the multiple tasks region of substrate, wherein each mission area includes one or more products to be exposed, and any one
A product to be exposed is only positioned in a mission area；
Control light engine array is exposed the multiple mission area, and each mission area is by the light engine
Single light engine in array is exposed.
9. according to the method described in claim 8, it is characterized in that, the mission area include it is multiple go out graph region, the control
The light engine array is made to be exposed the multiple mission area, including：
It is described go out graph region be less than the light engine scanning area when, the part number for closing the light engine is miniature
Speculum DMD so that the light engine complete to it is described go out graph region exposure.
10. method according to claim 8 or claim 9, which is characterized in that in the light engine array between light engine
Horizontal spacing is the integral multiple of the length of the mission area.
11. method according to claim 8 or claim 9, which is characterized in that in the light engine array between light engine
Longitudinal pitch is the integral multiple of the width of the mission area.
12. according to the method described in claim 9, it is characterized in that,
The mission area of each light engine includes most one areas Chu Tu for being less than the scanning area in the longitudinal direction
Domain.
13. the method according to claim 9 or 12, which is characterized in that
The mission area of each light engine includes most one areas Chu Tu for being less than the scanning area in the direction of the width
Domain.
14. method according to claim 8 or claim 9, which is characterized in that in exposure process, the substrate is along first direction
It is translated with second direction, the light engine array position remains unchanged, and the first direction and the second direction are vertical.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810456416.2A CN108681213B (en) | 2018-05-14 | 2018-05-14 | Digital photoetching system and method |
| PCT/CN2018/123081 WO2019218676A1 (en) | 2018-05-14 | 2018-12-24 | Digital photoetching system and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810456416.2A CN108681213B (en) | 2018-05-14 | 2018-05-14 | Digital photoetching system and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108681213A true CN108681213A (en) | 2018-10-19 |
| CN108681213B CN108681213B (en) | 2020-01-31 |
Family
ID=63806005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810456416.2A Active CN108681213B (en) | 2018-05-14 | 2018-05-14 | Digital photoetching system and method |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN108681213B (en) |
| WO (1) | WO2019218676A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019218676A1 (en) * | 2018-05-14 | 2019-11-21 | 中山新诺科技股份有限公司 | Digital photoetching system and method |
| CN112731772A (en) * | 2020-12-30 | 2021-04-30 | 中山新诺科技股份有限公司 | Alignment method of double-table laser direct writing exposure machine |
| CN113031405A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production double-sided laser direct writing photoetching machine and control method thereof |
| CN113031404A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production laser direct writing lithography machine and control method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005332861A (en) * | 2004-05-18 | 2005-12-02 | Nikon Corp | Projection aligner and exposure method |
| CN102362223A (en) * | 2009-03-21 | 2012-02-22 | 派因布鲁克成像系统公司 | Optical imaging writer system |
| CN103048885A (en) * | 2011-10-11 | 2013-04-17 | 中山新诺科技有限公司 | Ultra-large size flat panel display maskless photolithography system and method |
| US9091943B2 (en) * | 2012-12-28 | 2015-07-28 | Globalfoundries Inc. | Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods |
| CN105223783A (en) * | 2015-09-23 | 2016-01-06 | 武汉华星光电技术有限公司 | A kind of exposure method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102207690A (en) * | 2011-05-20 | 2011-10-05 | 合肥芯硕半导体有限公司 | Multi-SLM (Spatial Light Modulator) exposure and data processing method |
| JP6250415B2 (en) * | 2014-01-31 | 2017-12-20 | 株式会社Ｓｃｒｅｅｎホールディングス | Pattern drawing apparatus and pattern drawing method |
| CN104298080B (en) * | 2014-11-06 | 2016-08-31 | 苏州苏大维格光电科技股份有限公司 | A kind of without mask laser direct-writing superposition exposure method |
| CN106023069B (en) * | 2016-05-31 | 2019-04-16 | 西安嵌牛电子科技有限公司 | A kind of more DMD exposure methods based on video flowing |
| CN106647189B (en) * | 2017-02-24 | 2019-07-09 | 西安电子科技大学 | A kind of large area exposure method for maskless scanning photoetching |
| CN108681213B (en) * | 2018-05-14 | 2020-01-31 | 中山新诺科技股份有限公司 | Digital photoetching system and method |
-
2018
- 2018-05-14 CN CN201810456416.2A patent/CN108681213B/en active Active
- 2018-12-24 WO PCT/CN2018/123081 patent/WO2019218676A1/en active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005332861A (en) * | 2004-05-18 | 2005-12-02 | Nikon Corp | Projection aligner and exposure method |
| CN102362223A (en) * | 2009-03-21 | 2012-02-22 | 派因布鲁克成像系统公司 | Optical imaging writer system |
| CN103048885A (en) * | 2011-10-11 | 2013-04-17 | 中山新诺科技有限公司 | Ultra-large size flat panel display maskless photolithography system and method |
| US9091943B2 (en) * | 2012-12-28 | 2015-07-28 | Globalfoundries Inc. | Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods |
| CN105223783A (en) * | 2015-09-23 | 2016-01-06 | 武汉华星光电技术有限公司 | A kind of exposure method |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019218676A1 (en) * | 2018-05-14 | 2019-11-21 | 中山新诺科技股份有限公司 | Digital photoetching system and method |
| CN112731772A (en) * | 2020-12-30 | 2021-04-30 | 中山新诺科技股份有限公司 | Alignment method of double-table laser direct writing exposure machine |
| CN112731772B (en) * | 2020-12-30 | 2022-04-12 | 中山新诺科技股份有限公司 | Alignment method of double-table laser direct writing exposure machine |
| CN113031405A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production double-sided laser direct writing photoetching machine and control method thereof |
| CN113031404A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production laser direct writing lithography machine and control method thereof |
| CN113031404B (en) * | 2021-03-23 | 2023-08-15 | 合肥芯碁微电子装备股份有限公司 | Mass production type laser direct writing lithography machine and control method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108681213B (en) | 2020-01-31 |
| WO2019218676A1 (en) | 2019-11-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108681213A (en) | Digitize lithography system and method | |
| CN107272353B (en) | Substrate processing method using same and substrate board treatment | |
| CN106164779B (en) | Substrate board treatment | |
| CN103048885B (en) | Ultra-large size flat panel display maskless photolithography system and method | |
| CN209297103U (en) | Digitize dual surface lithography or exposure system | |
| US7268856B2 (en) | Pattern writing apparatus and block number determining method | |
| US7083405B2 (en) | Photo-fabrication apparatus | |
| CN102601519A (en) | Adjustment apparatus, laser machining apparatus, and adjustment method | |
| CN112533748A (en) | Multi-image projection system for additive manufacturing | |
| CN109478024A (en) | Equipment for writing direct maskless lithography | |
| CN105319862A (en) | Light source device and exposure device | |
| JP5336036B2 (en) | Drawing system | |
| CN108062003A (en) | A kind of write-through screen printing system and method for platemaking | |
| WO2020151000A1 (en) | Digital double-sided photolithography or exposure system and method | |
| CN107664924A (en) | A kind of exposure device and method | |
| TW200540577A (en) | Pattern writing apparatus and pattern writing method | |
| CN102854754B (en) | Exposing method and device thereof | |
| CN206557525U (en) | A kind of two-sided write-through exposure machine system | |
| KR20160038788A (en) | Drawing method | |
| CN101082781A (en) | Tracing system | |
| CN105992997B (en) | GUI device, pattern image forming system, job ticket update method and the recording medium of pattern describing device | |
| CN110930316B (en) | Gray image processing exposure method, device, system and equipment | |
| CN108648166A (en) | The method and system of exposure figure processing | |
| KR102456281B1 (en) | Auxiliary exposure device | |
| US20230025234A1 (en) | 3d printer and 3d printing method using cumulative illumination along a specific path |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20240119 Address after: 528400 No. 3 Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee after: Zhongshan Xinnuo Microelectronics Co.,Ltd. Address before: No. 3 Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province, 528437 Patentee before: ZHONGSHAN AISCENT TECHNOLOGIES Co.,Ltd. |