CN102207690A - Multi-SLM (Spatial Light Modulator) exposure and data processing method - Google Patents
Multi-SLM (Spatial Light Modulator) exposure and data processing method Download PDFInfo
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- CN102207690A CN102207690A CN2011101307742A CN201110130774A CN102207690A CN 102207690 A CN102207690 A CN 102207690A CN 2011101307742 A CN2011101307742 A CN 2011101307742A CN 201110130774 A CN201110130774 A CN 201110130774A CN 102207690 A CN102207690 A CN 102207690A
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Abstract
The invention discloses a multi-SLM (Spatial Light Modulator) exposure and data processing method, comprising the steps of installation of multiple SLMs, division of layout, simultaneous scanning and exposure by using multiple SLMs, data processing of invalid overlapping area among multiple SLMs, processing of splicing area among multiple SLMs, and magnification difference compensation processing for object lens of multiple SLMs. According to the invention, multiple SMLs are utilized to modulate images simultaneously and have the capacity increased manyfold compared with the capacity of the single SLM.
Description
Technical field
The present invention relates to laser direct imaging equipment exposure method field, be specially a kind of many SLM exposures and data processing method.
Background technology
Digital micromirror device is a kind of spatial light modulator (SLM), can generate exposure image, reflexes on to be processed that is on the motion platform by optical system.
Laser direct imaging is a kind of advanced person's a exposure technique, the equipment that laser direct imaging equipment is to use this technology that photosensitive material is exposed.
Photoetching technique is the technology that printing has the composition of feature on substrate surface, mask-free photolithography technology involved in the present invention uses the digital micro-mirror system to generate image, by the optical projection element, image projects on the light activated substrate with certain multiplying power, produces the composition of feature.
Summary of the invention
The purpose of this invention is to provide a kind of many SLM exposures and data processing method, to realize improving the production capacity of laser direct imaging exposure sources.
In order to achieve the above object, the technical solution adopted in the present invention is:
A kind of many SLM exposures and data processing method is characterized in that: may further comprise the steps:
(1) installation of many SLM: a plurality of SLM are installed on the direction vertical with exposure directions simultaneously, each SLM has the light path system of oneself, each SLM parameters needs accurately to demarcate, and drives by mobile platform and treats that photosensitive surface moves to realize complete exposure;
(2) domain is carried out dividing processing: according to the relative coordinate position of a plurality of SLM levels and vertical direction, determine the starting point and the terminal point of the layout area that each SLM need expose, the distance of platform motion must guarantee that the actual exposure zone of each SLM can the desirable exposure area of complete covering, moves to the graph data that the tram of each DMD must be mail in a certain position from the actual exposure zone computing platform of each SLM;
(3) many SLM while scan exposures: many SLM expose simultaneously, and the part of the domain that exposes separately, the result that finally exposes are the whole domains of complete exposure;
(4) data processing of invalid overlapping region between many SLM: increase the attribute in valid data district, to being positioned at the figure of certain SLM monoscopic, the part that is in outside the valid data district is given up;
(5) processing of splicing regions between many SLM: setting a zone between many SLM is splicing regions, and image successively decreases from the center to the edge sublevel in this area grayscale value, and the pixel count on exponent number and every rank can be provided with;
(6) processing of many SLM object lens multiplying power difference compensation: image mails to before the SLM, according to calibration value image is carried out the convergent-divergent compensation, and the image after the compensation exposes.
Described a kind of many SLM exposures and data processing method, it is characterized in that: also comprise the domain subregion is handled: for the huge domain of graph data, figure is divided into several region, carries out the extraction of figure after this again and handle, concrete subregion number is the square root near graph data.
Described a kind of many SLM exposures and data processing method, it is characterized in that: data processing is separated with client control, and each SLM has the data processing service computer of oneself, makes that work of treatment is shared.
Scanning type exposure of the present invention digital micro-mirror system when platform moves turns over figure simultaneously line by line, finishes exposure process jointly.Require to provide in real time the required layout data that exposes in this process.
The present invention has used a large amount of graph and image processing technology, and this technology is to use computing machine that digitized graph image is analyzed, calculates, revises, generated, to reach needed net result.The vector data informational needs of domain is through a large amount of graph and image processing such as cutting, rasterizing, gray scale processing, template processing required data of just finally being exposed.
The present invention has used distributed computing technology, and distributed computing technology is that many computing machines are coupled together by network, coordinates mutually, finishes tasks such as control, calculating, processing jointly.Use distributed computing technology can finish the huge task that single computer can't be finished.
The present invention utilizes a plurality of SLM, and modulation image under the cooperation of exposure light source, exposes to the dry film on the pcb board simultaneously, can greatly improve the production capacity of laser direct imaging exposure sources.The single SLM of its productivity ratio increases exponentially.
Description of drawings
Fig. 1 is many SLM exposure schematic diagrams.
Fig. 2 is many SLM scan exposure vertical view.
Fig. 3 is many SLM splicing processing figure.
Fig. 4 is invalid overlapping region figure between many SLM.
Fig. 5 is that deal with data adapts to multiplying power difference between many SLM.
Fig. 6 adapts to many SLM high speed data requirements, and domain is carried out subregion.
Fig. 7 adapts to many SLM high speed data requirements, and data are carried out distributed treatment.
Embodiment
Among Fig. 1-Fig. 7, the 1st, SLM, the 2nd, exposure light source, the 3rd, optical subsystem, the 4th, platform, the 5th, pcb board, the 6th, exposure image, the 7th, direction of scanning, the 8th, desirable SLM scanning area, the 9th, actual SLM scanning area, the 10th, exposure domain, the 11st, splicing regions, the 12nd, the gray scale sublevel, the 13rd, the inactive area of previous SLM, the 14th, the lines data of waiting to expose, the 15th, multiplying power difference is demarcated and compensation deals, the 16th, arbitrary graphic in the domain, the 17th, the domain subregion is handled, and the 18th, control end, the 19th, data processing service end
The principle of many SLM exposures is installed a plurality of SLM as shown in Figure 1, and each SLM model is in full accord, accurately demarcates the direction of scanning of each SLM and the position of non-direction of scanning, and each SLM has the data source of oneself to the optical system of oneself should be arranged.Requirement is demarcated and is proofreaied and correct the lens ratio error is reduced as far as possible by optics.
When platform moved, a plurality of SLM turned over figure simultaneously, and by exposure system, exposure is realized in a plurality of zones of the pcb board on platform simultaneously.During end exposure, the complete amalgamation in each exposure area, the realization overall exposing is finished.
SLM 1 is a kind of digital micro-mirror device among Fig. 1, and it generates exposure figure by the control to inner micro mirror.Exposure light source 2 is the LASER Light Source that make the dry film exposure.Optical subsystem 3 can be by certain multiplying power with image zoom.After platform 4 loads pcb board, when exposure, realize the exposure of justifying by constantly moving.
Fig. 2 has demonstrated the process with four SLM scan exposure domains 10.The horizontal level of four SLM has determined the starting point and the terminal point of the layout area 8 that will expose separately.Because be moving of same platform, so actual scanning scope 9 sizes of each SLM are consistent, shown in four dash areas 9 among Fig. 2.But because the direction of scanning can't guarantee that the position of each SLM is in full accord, so the physical scan area 9 of each SLM is not at same horizontal level.But the physical scan area of each SLM 9 all must cover the theoretical scanning area on each comfortable domain 10 fully, thus final exposed plate Figure 10 fully.
When mailing to the data of each SLM, must consider the direction of scanning of each SLM and the position difference of non-direction of scanning, send the graph data of tram on the domain, guarantee exposure result's correctness in a certain moment of processing.
When SLM scans by direction of scanning 7 among Fig. 2, the overlapping region can occur between every adjacent two SLM, the figure in the overlapping region can be exposed twice, forms overexposure.
The overlapping region is divided into two among Fig. 4, the inactive area 13 of splicing regions 11 and previous SLM.Splicing regions 11 is used to perfectly splice, and 13 of inactive area must be changed into only exposure once from original exposure twice.
In the data processing, can not from domain, extract graph data in order, must increase valid data width attribute and replace the SLM width according to the width of SLM.Figure in a SLM visual field only intercepts the part that it is positioned at the valid data width during data processing, give up remaining part.For two overlapping SLM, the visuals in the inactive area 13 of first SLM will be rejected when data processing among Fig. 4, guarantee that finally this zone only is exposed once.
When splicing regions 11 does not process among Fig. 4, will directly simply expose twice, form overexposure.Fig. 3 carries out the schematic diagram that the gray scale sublevel is handled to splicing regions.At splicing part, the gray scale sublevel from the center to the edge data successively decreases.The pixel number average that the exponent number that is divided and every rank comprise can be provided with, and is convenient to adjust when process conditions change splicing effect.After double exposure, splicing part exposure energy everywhere is equal to the exposure energy of other parts of figure substantially, forms good splicing.
The magnification error of the epitome object lens of each SLM is inevitable, may cause problem shown in Fig. 5.The left side exposure image 6 of former lines data 14 after overexposure among Fig. 5, owing to the reason of magnification error can't be good be stitched together.This magnification error after demarcate determining by optics, carries out the convergent-divergent compensation to former lines data, and the SLM that the graph data after the compensation re-sends to separately exposes.
Many SLM and the single SLM maximum difference on data is that many SLM need to send data to a plurality of SLM simultaneously.Must faster extraction graph data.Fig. 6 Central Plains domain has 100 graph datas, and the graph data that extracts a zone need compare 100 times, handles 17 through the domain subregion, and the graph data that extracts a zone only need compare 20 times, and speed is original 5 times.
In the exposure process of whole laser direct imaging equipment, a large amount of control and data processing operation are arranged.Platform control, data extract, bitmap processing etc. are all very high to the occupancy of resource.These work can't focus on the computing machine and finish.
Fig. 7 is the synoptic diagram that data is carried out distributed treatment.The client is by client computer 18 various control commands of input and original layout datas.Client computer with these orders and data distribution to the computing machine 19 that provides data processing to serve.Each data processing service computer is born data processing work separately.The data processing work that takies CPU and internal memory in a large number is distributed on many computing machines, improves the speed of data processing.
Mode connects total system at first as shown in Figure 7, and it is reliable and stable that the assurance system connects.
The parameters of equipment in the calibration maps 1 then is as SLM height, width, pixel size, multiplying power of object lens or the like.Use these parameters according to method shown in Figure 2, calculate the scanning area of each SLM, scan line columns etc.When beginning to expose, the data of handling the relevant position according to the setting of direction of scanning and parameters re-send to corresponding SLM.
When deal with data, at first before extracting domain, domain is carried out subregion and handle by Fig. 6, figure compensates multiplying power difference after taking out as shown in Figure 5, and Fig. 4 judges inactive area and splicing regions for another example, according to the method for Fig. 3 splicing regions is spliced processing.
Claims (3)
1. SLM more than a kind exposes and data processing method, it is characterized in that: may further comprise the steps:
(1) installation of many SLM: a plurality of SLM are installed on the direction vertical with exposure directions simultaneously, each SLM has the light path system of oneself, each SLM parameters needs accurately to demarcate, and drives by mobile platform and treats that photosensitive surface moves to realize complete exposure;
(2) domain is carried out dividing processing: according to the relative coordinate position of a plurality of SLM levels and vertical direction, determine the starting point and the terminal point of the layout area that each SLM need expose, the distance of platform motion must guarantee that the actual exposure zone of each SLM can the desirable exposure area of complete covering, moves to the graph data that the tram of each DMD must be mail in a certain position from the actual exposure zone computing platform of each SLM;
(3) many SLM while scan exposures: many SLM expose simultaneously, and the part of the domain that exposes separately, the result that finally exposes are the whole domains of complete exposure;
(4) data processing of invalid overlapping region between many SLM: increase the attribute in valid data district, to being positioned at the figure of certain SLM monoscopic, the part that is in outside the valid data district is given up;
(5) processing of splicing regions between many SLM: setting a zone between many SLM is splicing regions, and image successively decreases from the center to the edge sublevel in this area grayscale value, and the pixel count on exponent number and every rank can be provided with;
(6) processing of many SLM object lens multiplying power difference compensation: image mails to before the SLM, according to calibration value image is carried out the convergent-divergent compensation, and the image after the compensation exposes.
2. a kind of many SLM exposures according to claim 1 and data processing method, it is characterized in that: also comprise the domain subregion is handled: for the huge domain of graph data, figure is divided into several region, carry out the extraction of figure after this again and handle, concrete subregion number is the square root near graph data.
3. a kind of many SLM exposures according to claim 1 and data processing method, it is characterized in that: data processing is separated with client control, and each SLM has the data processing service computer of oneself, makes that work of treatment is shared.
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|---|---|---|---|---|
| CN102674241A (en) * | 2012-05-31 | 2012-09-19 | 东南大学 | Method for manufacturing variable-height micro flow channel based on maskless gray-scale lithography |
| CN103901730A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Exposure device and exposure method |
| CN104516216A (en) * | 2015-01-15 | 2015-04-15 | 厦门理工学院 | Exposure system spliced by plurality of DMD (Digital Mirror Devices) and method |
| CN104865800A (en) * | 2015-05-27 | 2015-08-26 | 中山新诺科技股份有限公司 | Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system |
| CN105278262A (en) * | 2015-11-20 | 2016-01-27 | 合肥芯碁微电子装备有限公司 | Method of demarcating positional relation of optical paths of exposure machine through chuck camera |
| CN106023069A (en) * | 2016-05-31 | 2016-10-12 | 西安嵌牛电子科技有限公司 | Multi-DMD exposure method based on video streams |
| CN106802538A (en) * | 2017-03-16 | 2017-06-06 | 无锡影速半导体科技有限公司 | Super large plate direct-write type lithography machine scanning exposure method |
| CN107561876A (en) * | 2017-10-19 | 2018-01-09 | 苏州源卓光电科技有限公司 | A kind of new mask-free photolithography system and its technological process |
| CN109116686A (en) * | 2018-09-29 | 2019-01-01 | 苏州源卓光电科技有限公司 | A kind of DMD multizone laser projection system and exposure method |
| CN109270803A (en) * | 2018-10-22 | 2019-01-25 | 上海理工大学 | A kind of composing system of more editions photoetching arranged side by side |
| WO2019218676A1 (en) * | 2018-05-14 | 2019-11-21 | 中山新诺科技股份有限公司 | Digital photoetching system and method |
| CN110531590A (en) * | 2019-08-30 | 2019-12-03 | 合肥芯碁微电子装备有限公司 | A kind of direct-write type lithography machine joining method |
| CN110716398A (en) * | 2019-11-07 | 2020-01-21 | 京东方科技集团股份有限公司 | Control method and device of digital exposure machine |
| CN113560602A (en) * | 2021-08-09 | 2021-10-29 | 中国航空制造技术研究院 | Splicing area forming precision compensation method for multi-laser powder bed additive manufactured part |
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| CN101408716A (en) * | 2008-11-19 | 2009-04-15 | 深圳市大族激光科技股份有限公司 | Auxiliary correcting device of exposure image partial difference |
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Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102674241B (en) * | 2012-05-31 | 2015-01-28 | 东南大学 | Method for manufacturing variable-height micro flow channel based on maskless gray-scale lithography |
| CN102674241A (en) * | 2012-05-31 | 2012-09-19 | 东南大学 | Method for manufacturing variable-height micro flow channel based on maskless gray-scale lithography |
| CN103901730B (en) * | 2012-12-28 | 2016-08-24 | 上海微电子装备有限公司 | Exposure device and exposure method |
| CN103901730A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Exposure device and exposure method |
| CN104516216A (en) * | 2015-01-15 | 2015-04-15 | 厦门理工学院 | Exposure system spliced by plurality of DMD (Digital Mirror Devices) and method |
| CN104865800A (en) * | 2015-05-27 | 2015-08-26 | 中山新诺科技股份有限公司 | Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system |
| CN105278262A (en) * | 2015-11-20 | 2016-01-27 | 合肥芯碁微电子装备有限公司 | Method of demarcating positional relation of optical paths of exposure machine through chuck camera |
| CN106023069A (en) * | 2016-05-31 | 2016-10-12 | 西安嵌牛电子科技有限公司 | Multi-DMD exposure method based on video streams |
| CN106023069B (en) * | 2016-05-31 | 2019-04-16 | 西安嵌牛电子科技有限公司 | A kind of more DMD exposure methods based on video flowing |
| CN106802538A (en) * | 2017-03-16 | 2017-06-06 | 无锡影速半导体科技有限公司 | Super large plate direct-write type lithography machine scanning exposure method |
| CN106802538B (en) * | 2017-03-16 | 2019-01-29 | 无锡影速半导体科技有限公司 | Super large plate direct-write type lithography machine scanning exposure method |
| CN107561876A (en) * | 2017-10-19 | 2018-01-09 | 苏州源卓光电科技有限公司 | A kind of new mask-free photolithography system and its technological process |
| WO2019218676A1 (en) * | 2018-05-14 | 2019-11-21 | 中山新诺科技股份有限公司 | Digital photoetching system and method |
| CN109116686A (en) * | 2018-09-29 | 2019-01-01 | 苏州源卓光电科技有限公司 | A kind of DMD multizone laser projection system and exposure method |
| CN109116686B (en) * | 2018-09-29 | 2021-05-07 | 苏州源卓光电科技有限公司 | DMD multi-area laser projection system and exposure method |
| CN109270803A (en) * | 2018-10-22 | 2019-01-25 | 上海理工大学 | A kind of composing system of more editions photoetching arranged side by side |
| CN109270803B (en) * | 2018-10-22 | 2020-08-11 | 上海理工大学 | Typesetting system for multi-plate parallel photoetching |
| CN110531590A (en) * | 2019-08-30 | 2019-12-03 | 合肥芯碁微电子装备有限公司 | A kind of direct-write type lithography machine joining method |
| CN110716398A (en) * | 2019-11-07 | 2020-01-21 | 京东方科技集团股份有限公司 | Control method and device of digital exposure machine |
| CN113560602A (en) * | 2021-08-09 | 2021-10-29 | 中国航空制造技术研究院 | Splicing area forming precision compensation method for multi-laser powder bed additive manufactured part |
| CN114820430A (en) * | 2022-02-18 | 2022-07-29 | 成都飞机工业（集团）有限责任公司 | 3D printing nondestructive testing method for multi-light source collaborative exposure |
| CN114820430B (en) * | 2022-02-18 | 2023-10-03 | 成都飞机工业（集团）有限责任公司 | Multi-light source collaborative exposure 3D printing nondestructive testing method |
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