CN110716398A - Control method and device of digital exposure machine - Google Patents
Control method and device of digital exposure machine Download PDFInfo
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- CN110716398A CN110716398A CN201911080927.XA CN201911080927A CN110716398A CN 110716398 A CN110716398 A CN 110716398A CN 201911080927 A CN201911080927 A CN 201911080927A CN 110716398 A CN110716398 A CN 110716398A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a control method and a device of a digital exposure machine, wherein the control method comprises the following steps: acquiring a pattern on a panel to be exposed; determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, and enabling the splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area; and controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule. The invention determines the first effective exposure area in the digital exposure machine aiming at the pattern arrangement rule in each panel to be exposed, and enables the splicing boundary of the first effective exposure area in two adjacent scans to be positioned in the first gap area between each pattern.
Description
Technical Field
The invention relates to the technical field of display, in particular to a control method and a control device of a digital exposure machine.
Background
With the development of display technologies, display panels are developed towards high resolution, which correspondingly increases the complexity of the manufacturing process of the driving circuit corresponding to each pixel, and specifically, by increasing the photolithography sub-process, the resolution of the product is improved while the yield of the product is ensured while the pixel size is reduced.
Among them, the traditional optical lithography process: the pattern of the design layout is converted into a solid mask plate, then the solid mask plate is irradiated by ultraviolet light on the precise photoetching mask plate, and the ultraviolet light penetrating through the pattern gap of the mask plate and the photoresist are subjected to optical reaction, so that the pattern on the photoetching mask plate is completely transferred to the glass substrate. The digital photoetching process is characterized in that the pattern of the design layout is converted into a virtual mask plate, and the pattern on the virtual mask plate is transferred onto the glass substrate through a digital exposure machine, so that the production cost can be greatly reduced.
The micro-mirror array in the digital exposure machine comprises a plurality of micro-mirrors which are arranged in an array, and the exposure process is completed by controlling each micro-mirror. However, due to the limitation of the process level, a certain angle difference exists between the micromirrors, and the difference causes a large difference between the exposure effect at the splicing boundary of two adjacent scans and other positions, so that the whole panel has a regular defect, and finally, the display panel has a regular brightness defect, which affects the display quality.
Therefore, how to optimize the exposure process of the digital exposure machine and improve the display quality of the display panel is a technical problem to be solved urgently by those skilled in the art.
Disclosure of Invention
In view of this, embodiments of the present invention provide a control method and a control device for a digital exposure machine, so as to optimize an exposure process, reduce the defect of regularity of a driving circuit, and improve the display quality of a display panel.
In one aspect, an embodiment of the present invention provides a method for controlling a digital exposure machine, where the method includes:
acquiring a pattern on a panel to be exposed, wherein the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns;
determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, and enabling the splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area;
and controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule.
In a possible implementation manner, in the method for controlling a digital exposure machine according to an embodiment of the present invention, the acquiring a pattern on a panel to be exposed specifically includes:
acquiring identification information corresponding to the panel to be exposed;
and determining the pattern on the panel to be exposed according to the corresponding relationship between the pre-stored identification information and the pattern.
In a possible implementation manner, in the control method of a digital exposure machine provided in an embodiment of the present invention, when the same panel to be exposed is scanned multiple times, the first effective exposure areas corresponding to each scanning are the same.
In a possible implementation manner, in the method for controlling a digital exposure machine according to an embodiment of the present invention, the determining, according to the pattern and an arrangement rule of each micromirror in the digital exposure machine, a first effective exposure area corresponding to the digital exposure machine in multiple scans, and enabling a splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area specifically includes:
judging whether the splicing boundary of every two adjacent scans is positioned in the first gap area when the areas occupied by all the micromirrors are scanned according to the pattern and the arrangement rule of each micromirror in the digital exposure machine;
when the areas occupied by all the micromirrors are scanned and the splicing boundary of every two adjacent scans is located in the first gap area, determining that the areas occupied by all the micromirrors are the first effective exposure area;
when the areas occupied by all the micromirrors are scanned and splicing boundaries of two adjacent scans are located at the corresponding positions of the pattern, reducing the effective number of the micromirrors in a first direction, and determining that the areas occupied by the micromirrors with the largest number in the first direction are the first effective exposure areas when the splicing boundaries of two adjacent scans are located in the first gap areas;
wherein the first direction is a direction of two adjacent scanning translations.
In a possible implementation manner, in the method for controlling a digital exposure machine provided by the embodiment of the present invention, a second gap region exists between two adjacent panels to be exposed, and when the digital exposure machine passes through the second gap region, the method further includes:
and adjusting the effective number of the micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is an integral multiple of the width of the second effective exposure area in the first direction.
In a possible implementation manner, in the method for controlling a digital exposure machine according to an embodiment of the present invention, the adjusting an effective number of the micromirrors in the first direction in the first effective exposure area according to a width of the second gap area in the first direction to form a second effective exposure area, so that a width of the second gap area in the first direction is an integer multiple of a width of the second effective exposure area in the first direction specifically includes:
when the digital exposure machine passes through the second gap area, judging whether the width of the second gap area in the first direction is an integral multiple of the width of the first effective exposure area in the first direction;
determining that the second effective exposure area is the same as the first effective exposure area when the width of the second gap area in the first direction is an integer multiple of the width of the first effective exposure area in the first direction;
when the width of the second gap area in the first direction is not integral multiple of the width of the first effective exposure area in the first direction, adjusting the effective number of the micromirrors of the first effective exposure area in the first direction to form the second effective exposure area.
On the other hand, an embodiment of the present invention further provides a control device for a digital exposure machine, including:
the exposure device comprises an acquisition module, a processing module and a control module, wherein the acquisition module is used for acquiring a pattern on a panel to be exposed, the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns;
the determining module is used for determining a first effective exposure area corresponding to the digital exposure machine in multiple scanning according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, so that the splicing boundary of the first effective exposure area in two adjacent scanning is positioned in the first gap area;
and the control module is used for controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule.
In a possible implementation manner, in the control device of a digital exposure machine provided by an embodiment of the present invention, the obtaining module is specifically configured to:
acquiring identification information corresponding to the panel to be exposed;
and determining the pattern on the panel to be exposed according to the corresponding relationship between the pre-stored identification information and the pattern.
In a possible implementation manner, in the control device of a digital exposure machine provided by an embodiment of the present invention, the determining module is specifically configured to:
judging whether the splicing boundary of every two adjacent scans is positioned in the first gap area when the areas occupied by all the micromirrors are scanned according to the pattern and the arrangement rule of each micromirror in the digital exposure machine;
when the areas occupied by all the micromirrors are scanned and the splicing boundary of every two adjacent scans is located in the first gap area, determining that the areas occupied by all the micromirrors are the first effective exposure area;
when the areas occupied by all the micromirrors are scanned and splicing boundaries of two adjacent scans are located at the corresponding positions of the pattern, reducing the effective number of the micromirrors in a first direction, and determining that the areas occupied by the micromirrors with the largest number in the first direction are the first effective exposure areas when the splicing boundaries of two adjacent scans are located in the first gap areas;
wherein the first direction is a direction of two adjacent scanning translations.
In a possible implementation manner, in the control device of the digital exposure machine provided in the embodiment of the present invention, the control device further includes:
and the adjusting module is used for adjusting the effective number of the micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is an integral multiple of the width of the second effective exposure area in the first direction.
The invention has the beneficial effects that:
the embodiment of the invention provides a control method and a device of a digital exposure machine, wherein the control method comprises the following steps: acquiring a pattern on a panel to be exposed, wherein the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns; determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, and enabling the splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area; and controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule. The invention determines the first effective exposure area in the digital exposure machine aiming at the pattern arrangement rule in each panel to be exposed, and enables the splicing boundary of the first effective exposure area in two adjacent scans to be positioned in the first gap area between each pattern.
Drawings
FIG. 1 is a schematic diagram illustrating an arrangement structure of micromirrors in a digital exposure machine according to the related art;
FIG. 2 is a schematic view showing the structure of a scanning path in the digital exposure machine shown in FIG. 1, when performing a plurality of scans;
FIG. 3 is a schematic structural diagram of a splicing region between two adjacent scans of the digital exposure machine shown in FIG. 1;
FIG. 4 is a schematic structural view showing a relative positional relationship between a digital exposure machine and a panel to be exposed in the related art;
FIG. 5 is a flowchart of a method for controlling a digital exposure machine according to an embodiment of the present invention;
FIG. 6 is a diagram illustrating a relative position relationship between a digital exposure machine and a panel to be exposed according to an embodiment of the present invention;
FIG. 7 is a schematic structural diagram of a relative position relationship between the digital exposure machine and the second gap region according to an embodiment of the present invention.
Detailed Description
As shown in fig. 1, a digital exposure machine in the related art includes a micro mirror matrix including a plurality of micro mirrors 01, and exposure of a panel to be exposed is realized by controlling on or off of each micro mirror 01. Usually, the size of the micromirror matrix is smaller than that of the panel to be exposed, the exposure of the panel to be exposed can be completed only by carrying out scanning for many times, and the digital exposure machine is fixed in position in the exposure process and used for bearing the glass substrate of the panel to be exposed to move according to a preset rule so as to complete the scanning for many times of the panel to be exposed. As shown in fig. 2, in the process of one scanning (such as Scan1), the glass substrate moves along the second direction, so that the digital exposure machine exposes the corresponding region (region corresponding to Scan1) extending along the second direction, after the exposure of the region is completed, the glass substrate translates along the first direction, translates to the next adjacent exposure region (region corresponding to Scan 2), continues to move along the second direction, completes the exposure of the region, and completes the exposure of the region corresponding to Scan3 and the region corresponding to Scan4 and Scan … according to Scan n according to the above rule.
However, due to the process limitation, there is a certain angle difference between the micromirrors 01 in the micromirror matrix of the digital exposure machine, as shown in fig. 3, there is an angle α between the micromirror matrix and the horizontal plane, which results in a height difference of h between the left side boundary and the right side boundary of the micromirror matrix, and due to the height difference, there is a large difference in the exposure amount received at the intersection of the right side boundary of the first scan and the left side boundary of the second scan (hereinafter, referred to as the splicing boundary of two adjacent scans). When the stitching boundary 11 is located at a position corresponding to the pattern 02 in the panel to be exposed, as shown in fig. 4, the pattern 02 on the formed panel has a defect of regularity, which results in a decrease in the display quality of the display panel.
Based on the above problems of the digital exposure process in the related art, the embodiments of the present invention provide a method and an apparatus for controlling a digital exposure machine. In order to make the objects, technical solutions and advantages of the present invention clearer, specific embodiments of a method and an apparatus for controlling a digital exposure machine according to an embodiment of the present invention are described in detail below with reference to the accompanying drawings. It should be understood that the preferred embodiments described below are only for illustrating and explaining the present invention and are not to be used for limiting the present invention. And the embodiments and features of the embodiments in the present application may be combined with each other without conflict.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. The use of "first," "second," and similar terms in the present application do not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
The shapes and sizes of the various elements in the drawings are not to scale and are merely intended to illustrate the invention.
As shown in fig. 5, an embodiment of the present invention provides a method for controlling a digital exposure machine, including:
s501, obtaining a pattern on the panel to be exposed, wherein the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns.
S502, determining a first effective exposure area corresponding to the digital exposure machine in multiple scanning according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, and enabling the splicing boundary of the first effective exposure area in two adjacent scanning to be located in a first gap area;
s503, controlling the micro-mirrors in the first effective exposure area to expose the panel for multiple times according to the preset rule.
Specifically, in the control method of the digital exposure machine provided by the embodiment of the present invention, for the rule of the arrangement of the patterns in each panel to be exposed (the size of the pattern size, and the width of the first gap region between adjacent patterns in the first direction), the first effective exposure region in the digital exposure machine is determined, and the splicing boundary of the first effective exposure region in two adjacent scans is located in the first gap region between the patterns.
For example, as shown in fig. 6, the rightmost boundary a1 of the digital exposure machine is located in the area corresponding to the pattern 02 of the panel to be exposed, and if the area where all the micromirrors are located is the first effective exposure area, a defect is caused at the position of the pattern 02, so that the micromirrors in the rightmost column are set as the non-turned-on micromirrors 13, and the other micromirrors are set as the turned-on micromirrors 12, thereby determining the width M1 of the first effective area in the first direction, and making the stitching boundary 11 of two adjacent scans located in the first gap area without affecting the pattern 02.
It should be noted that fig. 6 is only one embodiment, the number of columns of the unopened micromirrors is determined according to the pattern in the panel to be exposed, and when the number of columns of the unopened micromirrors is multiple columns (greater than or equal to 2 columns), the unopened micromirrors may be located at one side boundary (left boundary or right boundary) of the micromirror matrix, or may be located at two boundaries of the micromirror matrix, and are selected according to the actual use condition, which is not limited herein.
Optionally, in the control method of the digital exposure machine provided in the embodiment of the present invention, obtaining the pattern on the panel to be exposed may be implemented by:
acquiring identification information corresponding to a panel to be exposed;
and determining the pattern on the panel to be exposed according to the corresponding relation between the pre-stored identification information and the pattern.
Specifically, in the control method of the digital exposure machine provided by the embodiment of the present invention, the pattern on the panel to be exposed may be obtained by acquiring the identification information corresponding to the panel to be exposed. For example, the name of the acquired panel to be exposed is cell1, and the pattern corresponding to cell1 is already stored in the pre-stored information, so that information such as the size of each pattern in the corresponding pattern, the arrangement rule of the patterns, and the size of the first gap between adjacent patterns can be obtained by the name of the panel to be exposed, thereby providing a basis for determining the first effective exposure area in the digital exposure machine.
Optionally, in the method for controlling a digital exposure machine provided in the embodiment of the present invention, when the same panel to be exposed is scanned for multiple times, the first effective exposure areas corresponding to each scanning are the same.
Specifically, in the control method of the digital exposure machine provided by the embodiment of the invention, in order to simplify the design difficulty, the first effective exposure areas corresponding to multiple scans can be the same when the same panel to be exposed is exposed, so that the first effective exposure areas do not need to be adjusted. For example, the width of the pattern in the panel to be exposed in the first direction may be calculated so that the width is an integral multiple of the width of the first effective exposure area in the first direction, i.e., the first effective exposure areas may be the same for each scan.
Optionally, in the method for controlling a digital exposure machine provided in the embodiment of the present invention, the determining, according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, a first effective exposure area corresponding to the digital exposure machine in multiple scans, and enabling a splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area specifically includes:
judging whether the splicing boundary of every two adjacent scans is positioned in a first gap area when the areas occupied by all the micromirrors are scanned according to the pattern and the arrangement rule of each micromirror in the digital exposure machine;
when the areas occupied by all the micromirrors are scanned and the splicing boundary of every two adjacent scans is located in the first gap area, determining that the areas occupied by all the micromirrors are all provided with a first effective exposure area;
when the areas occupied by all the micromirrors are scanned and the splicing boundaries of two adjacent scans are located at the corresponding positions of the pattern, reducing the effective number of the micromirrors in the first direction, and determining that the areas occupied by the micromirrors with the largest number in the first direction are the first effective exposure areas when the splicing boundaries of two adjacent scans are located in the first gap areas;
the first direction is the direction of the adjacent two scanning translations.
Specifically, in the method for controlling a digital exposure machine according to the embodiment of the present invention, when determining the width of the first effective exposure area in the first direction, it is first determined whether the splicing boundary between two adjacent scans is located in the first gap area when the area occupied by all micromirrors is scanned, and if the splicing boundary can be located in the first gap area, it is determined that the area occupied by all micromirrors is the first effective exposure area; if the splicing boundary does not fall in the first gap area but falls in the area corresponding to the pattern, the effective number of the micromirrors in the first direction needs to be reduced, and the area occupied by the micromirrors corresponding to the splicing boundary falling in the first gap area is determined as the first effective exposure area. The area occupied by the largest number of micromirrors in the first direction is generally determined as the first effective exposure area because such an arrangement can reduce the number of scans, thereby saving production costs.
Optionally, in the method for controlling a digital exposure machine provided in the embodiment of the present invention, a second gap region exists between two adjacent panels to be exposed, and when the digital exposure machine passes through the second gap region, the method further includes:
and adjusting the effective number of the micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is integral multiple of the width of the second effective exposure area in the first direction.
Specifically, in the control method of the digital exposure machine provided in the embodiment of the present invention, in order to increase the utilization rate of the glass substrate, the space between the adjacent panels is reduced as much as possible, so that when the digital exposure machine passes through the second gap region and is exposed by the first effective exposure area when the exposure panel is adopted again, a mismatch phenomenon exists, that is, the first effective exposure area falls on the graphic position of the panel at the splicing boundary between two adjacent scans, which causes a defect that a next panel is scanned or a regular defect occurs.
Therefore, when the digital exposure machine passes through the second gap area, the effective number of the micromirrors of the first effective exposure area in the first direction is adjusted according to the width of the second gap area in the first direction, so that the determined second effective exposure area is matched with the second gap area, and the influence on the next panel to be exposed is avoided.
Specifically, as shown in fig. 6, when the digital exposure machine exposes the region corresponding to the pattern 02 of the panel to be exposed, only the right column is set as the non-activated micromirrors 13, and if the second gap region is exposed by using the first effective exposure region in fig. 6, the boundary of the first effective exposure region falls on the region corresponding to the pattern 02, so that the number of the activated micromirrors 12 in the first direction needs to be adjusted in order to prevent the stitching boundary of two adjacent scans from falling on the region corresponding to the pattern 02. As shown in fig. 7, when the digital exposure machine exposes the second gap region, the row of micromirrors 13 at the left and right boundaries is set to be turned off so as to adapt to the width of the second gap region in the first direction, i.e. so that the boundary of the second effective exposure region does not fall on the region corresponding to the pattern 02, and thus the formed pattern 02 is not affected.
Optionally, in the method for controlling a digital exposure machine according to the embodiment of the present invention, the adjusting the effective number of micromirrors in the first direction in the first effective exposure area according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is an integer multiple of the width of the second effective exposure area in the first direction includes:
when the digital exposure machine passes through the second gap area, judging whether the width of the second gap area in the first direction is an integral multiple of the width of the first effective exposure area in the first direction;
when the width of the second gap area in the first direction is an integral multiple of the width of the first effective exposure area in the first direction, determining that the second effective exposure area is the same as the first effective exposure area;
and when the width of the second gap area in the first direction is non-integral multiple of the width of the first effective exposure area in the first direction, adjusting the effective number of the micromirrors of the first effective exposure area in the first direction to form a second effective exposure area.
Specifically, in the method for controlling a digital exposure machine according to the embodiment of the present invention, when the digital exposure machine passes through the second gap region, it is first determined whether the first effective exposure area matches the second gap region, and if so, the first effective exposure area is directly determined as the second effective exposure area without adjustment. If the first effective exposure area is not matched with the second gap area, the effective number of the micromirrors in the first direction needs to be adjusted, so that the width of the second gap area in the first direction is an integral multiple of the width of the effective micromirrors in the first direction, thereby avoiding affecting the pattern of the next panel to be exposed.
When exposing the panel to be exposed, if the pattern of the panel to be exposed is the same as that of the panel to be exposed, the micromirror in the first effective exposure area can be directly utilized to expose the panel to be exposed; if the pattern of the panel to be exposed is different from the pattern of the panel to be exposed, the effective number of micromirrors in the first direction needs to be readjusted according to the pattern corresponding to the panel to be exposed.
Based on the same inventive concept, the embodiment of the present invention further provides a control device of a digital exposure machine, comprising:
the exposure device comprises an acquisition module, a processing module and a control module, wherein the acquisition module is used for acquiring patterns on a panel to be exposed, the patterns comprise a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns;
the determining module is used for determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, so that the splicing boundary of the first effective exposure area in two adjacent scans is positioned in a first gap area;
and the control module is used for controlling the micro-mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule.
Optionally, in the control device of the digital exposure machine provided in the embodiment of the present invention, the obtaining module is specifically configured to:
acquiring identification information corresponding to a panel to be exposed;
and determining the pattern on the panel to be exposed according to the corresponding relation between the pre-stored identification information and the pattern.
Optionally, in the control device of a digital exposure machine provided in the embodiment of the present invention, the determining module is specifically configured to:
judging whether the splicing boundary of every two adjacent scans is positioned in a first gap area when the areas occupied by all the micromirrors are scanned according to the pattern and the arrangement rule of each micromirror in the digital exposure machine;
when the areas occupied by all the micromirrors are scanned and the splicing boundary of every two adjacent scans is located in the first gap area, determining that the areas occupied by all the micromirrors are all provided with a first effective exposure area;
when the areas occupied by all the micromirrors are scanned and the splicing boundaries of two adjacent scans are located at the corresponding positions of the pattern, reducing the effective number of the micromirrors in the first direction, and determining that the areas occupied by the micromirrors with the largest number in the first direction are the first effective exposure areas when the splicing boundaries of two adjacent scans are located in the first gap areas;
the first direction is the direction of the adjacent two scanning translations.
Optionally, in the control device of a digital exposure machine provided in an embodiment of the present invention, further including:
and the adjusting module is used for adjusting the effective number of the micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is integral multiple of the width of the second effective exposure area in the first direction.
The control device of the digital exposure machine provided by the embodiment of the present invention has all the advantages of the control method of the digital exposure machine provided by the above embodiment, the principle and the implementation are the same, and the implementation can be specifically performed with reference to any embodiment of the control method of the digital exposure machine provided by the above embodiment, and details are not described herein.
The embodiment of the invention provides a control method and a device of a digital exposure machine, wherein the control method comprises the following steps: acquiring a pattern on a panel to be exposed, wherein the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns; determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, and enabling the splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area; and controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule. The invention determines the first effective exposure area in the digital exposure machine aiming at the pattern arrangement rule in each panel to be exposed, and enables the splicing boundary of the first effective exposure area in two adjacent scans to be positioned in the first gap area between each pattern.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (10)
1. A method of controlling a digital exposure machine, the method comprising:
acquiring a pattern on a panel to be exposed, wherein the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns;
determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, and enabling the splicing boundary of the first effective exposure area in two adjacent scans to be located in the first gap area;
and controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule.
2. The method for controlling a digital exposure machine according to claim 1, wherein the acquiring the pattern on the panel to be exposed specifically comprises:
acquiring identification information corresponding to the panel to be exposed;
and determining the pattern on the panel to be exposed according to the corresponding relationship between the pre-stored identification information and the pattern.
3. The method as claimed in claim 1, wherein the first effective exposure area is the same for each scan when the same panel to be exposed is scanned multiple times.
4. The method according to claim 3, wherein the determining a first effective exposure area corresponding to the digital exposure machine in multiple scans according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, so that the splicing boundary of the first effective exposure area in two adjacent scans is located in the first gap area, specifically comprises:
judging whether the splicing boundary of every two adjacent scans is positioned in the first gap area when the areas occupied by all the micromirrors are scanned according to the pattern and the arrangement rule of each micromirror in the digital exposure machine;
when the areas occupied by all the micromirrors are scanned and the splicing boundary of every two adjacent scans is located in the first gap area, determining that the areas occupied by all the micromirrors are the first effective exposure area;
when the areas occupied by all the micromirrors are scanned and splicing boundaries of two adjacent scans are located at the corresponding positions of the pattern, reducing the effective number of the micromirrors in a first direction, and determining that the areas occupied by the micromirrors with the largest number in the first direction are the first effective exposure areas when the splicing boundaries of two adjacent scans are located in the first gap areas;
wherein the first direction is a direction of two adjacent scanning translations.
5. The method for controlling a digital exposure machine according to claim 4, wherein a second gap region exists between two adjacent panels to be exposed, and when the digital exposure machine passes through the second gap region, the method further comprises:
and adjusting the effective number of the micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is an integral multiple of the width of the second effective exposure area in the first direction.
6. The method of claim 5, wherein the adjusting the effective number of micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, such that the width of the second gap area in the first direction is an integer multiple of the width of the second effective exposure area in the first direction, comprises:
when the digital exposure machine passes through the second gap area, judging whether the width of the second gap area in the first direction is an integral multiple of the width of the first effective exposure area in the first direction;
determining that the second effective exposure area is the same as the first effective exposure area when the width of the second gap area in the first direction is an integer multiple of the width of the first effective exposure area in the first direction;
when the width of the second gap area in the first direction is not integral multiple of the width of the first effective exposure area in the first direction, adjusting the effective number of the micromirrors of the first effective exposure area in the first direction to form the second effective exposure area.
7. A control device of a digital exposure machine, comprising:
the exposure device comprises an acquisition module, a processing module and a control module, wherein the acquisition module is used for acquiring a pattern on a panel to be exposed, the pattern comprises a plurality of patterns which are arranged according to a preset rule, and a first gap area is arranged between every two patterns;
the determining module is used for determining a first effective exposure area corresponding to the digital exposure machine in multiple scanning according to the pattern and the arrangement rule of each micromirror in the digital exposure machine, so that the splicing boundary of the first effective exposure area in two adjacent scanning is positioned in the first gap area;
and the control module is used for controlling the micro mirror in the first effective exposure area to carry out multiple exposure on the panel to be exposed according to a preset rule.
8. The control device of digital exposure machine of claim 7, wherein the acquisition module is specifically configured to:
acquiring identification information corresponding to the panel to be exposed;
and determining the pattern on the panel to be exposed according to the corresponding relationship between the pre-stored identification information and the pattern.
9. The control apparatus of digital exposure machine of claim 7, wherein the determining module is specifically configured to:
judging whether the splicing boundary of every two adjacent scans is positioned in the first gap area when the areas occupied by all the micromirrors are scanned according to the pattern and the arrangement rule of each micromirror in the digital exposure machine;
when the areas occupied by all the micromirrors are scanned and the splicing boundary of every two adjacent scans is located in the first gap area, determining that the areas occupied by all the micromirrors are the first effective exposure area;
when the areas occupied by all the micromirrors are scanned and splicing boundaries of two adjacent scans are located at the corresponding positions of the pattern, reducing the effective number of the micromirrors in a first direction, and determining that the areas occupied by the micromirrors with the largest number in the first direction are the first effective exposure areas when the splicing boundaries of two adjacent scans are located in the first gap areas;
wherein the first direction is a direction of two adjacent scanning translations.
10. The control apparatus of digital exposure machine according to claim 9, further comprising:
and the adjusting module is used for adjusting the effective number of the micromirrors of the first effective exposure area in the first direction according to the width of the second gap area in the first direction to form a second effective exposure area, so that the width of the second gap area in the first direction is an integral multiple of the width of the second effective exposure area in the first direction.
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| CN113777888A (en) * | 2020-06-10 | 2021-12-10 | 京东方科技集团股份有限公司 | Digital exposure control method and device |
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| CN110716398B (en) | 2021-10-19 |
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