CN101082781A - Tracing system - Google Patents

Tracing system Download PDF

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Publication number
CN101082781A
CN101082781A CNA2007101046801A CN200710104680A CN101082781A CN 101082781 A CN101082781 A CN 101082781A CN A2007101046801 A CNA2007101046801 A CN A2007101046801A CN 200710104680 A CN200710104680 A CN 200710104680A CN 101082781 A CN101082781 A CN 101082781A
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China
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mentioned
exposure
tracing
formula
actions
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CNA2007101046801A
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Chinese (zh)
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CN101082781B (en
Inventor
鹫山裕之
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Orc Manufacturing Co Ltd
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Orc Manufacturing Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

The present invention provides a tracing system, thereby in the tracing treating, it will not form proper tracing pattern according to the setting of the knowledge of know-how. According to the prearranged radiation length, it calculates the exposure actuating pitch interval (Epm) and the scanning velocity (Vm) according to the second formula. Afterwards, in the various exposure value and radiation length and the corresponding scanning velocity and exposure actuating pitch interval, it determines the scanning velocity and exposure actuating pitch interval corresponding to the selected exposure value and radiation length, and do setting in the tracing treating as the exposure parameter.

Description

Tracing system
Technical field
Present invention is directed to a kind of with as the light shield (crux) of former figure or directly to the tracing device of the pattern that is formed circuit pattern etc. by the tracing body of printed base plate and Silicon Wafer etc.Particularly, use the light modulation unit that light modulation assembly systematicness such as DMD (Digital Micro-mirror Device), LCD ground is arranged and the tracing system that traces designs and handle relevant for a kind of.
Background technology
Substrate etc. by the processing procedure of tracing body in, the tracing that is formed pattern by the tracing body for the sensing optical activity material that is being coated with photoresistance etc. is handled, processing procedure through peeling off of video picture processing, etching or electroplating processes and photoresistance etc. forms pattern on by the tracing body.In the tracing system of light modulation unit of LCD, DMD, SLM light modulation assemblies such as (Spatial Light Modulators) using assortment, the irradiation area of light modulation unit (to call exposure range in the following text) scans simultaneously with set speed with respect to substrate, corresponding to the pattern of being described with each light modulation assembly of set sequential control.
Owing to the influence that is not subjected to light modulation size of components forms fine pattern, the irradiation area (tiny area) of each light modulation assembly overlaps each other and carries out exposure actions (with reference to patent documentation 1) simultaneously along scan direction.For the scan speed of the relativity of substrate, make the overlapping exposure actions cycle (time interval) of tiny area, during exposure actions once in the irradiation time etc. of Continuous irradiation in fact, in handling, tracing sets necessary parameter, control according to the parameter that the light modulation assembly of DMD etc. is set, form the pattern of tracing.
[patent documentation 1] TOHKEMY 2003-084444 communique
About above-mentioned exposure parameter, must consider and set the light source cell of the photosensitive material characteristic of photoresistance, the included laser of device that traces designs etc., the characteristic of optical system even the precision of tracing pattern etc.Be not only that pattern form to be handled and processing procedure that GPRS video picture processing, etching, photoresistance such as peel off at loop substrate all monitors manufacture process, by the operator who controls, with reference to detailed tracing treatment conditions and to set suitable exposure parameter be difficult.
Summary of the invention
Tracing system of the present invention is in the tracing system that carries out overlapping exposure actions, do not need to have the knowledge of know how and can set exposure parameter, the tracing system that can trace designs and handle according to the exposure parameter of automatic setting.
Tracing system of the present invention, the light modulation assembly ON/OFF that stepless control enters successively according to scanning, mobile irradiation area and the overlapping tracing of exposure is handled, use is disposed the light modulation unit of arranging on the scan direction of a plurality of smooth modulation assembly systematicness, scan for being done with the set speed of relativity by the exposure range of light modulation unit, make the exposure range territory overlapping and along with the exposure actions time interval is implemented exposure actions by each light modulation assembly by the tracing body.For example the light modulation unit of DMD etc. is done the two-dimentional assortment of array shape and is made substrate etc. do moving of relativity, make by this from the beam area relativity of light source radiation to scan, the system expression of the exposure actions time interval makes with light modulation assembly and the cycle of the action (exposure actions) of throw light.In order to implement multiple-exposure,, promptly control exposure actions overlappingly though, aim at this ground, zone this moment again same position is shifted in the position along with scanning (relativity of exposure range moves) light modulation assembly successively to set scope irradiation.
Tracing system of the present invention has calculation element and setting device.Calculation element ties up in three exposure parameters of scan speed, exposure spacing and luminous continuity distance, according to default any parameter, calculates and removes the parameter that sets and two remaining parameters.The expression of scan speed system is for the scan speed of the relativity of the exposure range of the body that traced designs.Again, between the exposure actions time interval (cycle), the distance that exposure range moves multiply by the cycle of exposure actions with scan speed and with the distance expression to the system expression of exposure actions spacing with scan speed.The cycle that begins projection (irradiation) sequential of this exposure actions spacing system expression light.Luminous continuity distance system is illustrated in exposure actions in the time interval, at irradiates light in fact to during by the irradiation of tracing body, the distance that exposure range moves.The scan speed that setting device system will be calculated in default and calculation element, the exposure actions time interval, luminous continuity are set apart from the exposure parameter of handling as tracing.
The present invention's calculation element system according to 1st formula relevant with light quantity and with data processing speed the 2nd relevant formula calculate exposure parameter.The traced designs arrival irradiation light quantity system of body of the arrival that the 1st formula determines for the characteristic of learning system according to light source and exposure light satisfies conditional corresponding to the exposure that is determined by the photosensitive material characteristic of tracing body, have with respect to scan speed, luminous continuity distance is directly proportional, and the relation that the exposure actions spacing is inversely proportional to.On the other hand, the restriction of the data processing speed handled about tracing of the 2nd formula system expression and defined terms formula.When in scan speed, exposure actions spacing, the luminous continuity distance any one determined, because two variablees (parameter) represent that with the 1st, the 2nd formula with separating of simultaneous equations, two remaining exposure parameters can calculate uniquely.Then, when exposure actions spacing, scan speed and luminous continuity processing are set, move to light modulation unit or quilt tracing body relativity, exposure range is moved with the scan speed after being set, the exposure actions spacing of setting with light modulation unit repeatedly and rapid alternation (projection), and its luminous being controlled as when scanning in exposure actions once, only to luminous continuity distance irradiation light (for example, keeping the state of DMD) continuously at ON.
For example the 1st formula such as following equation are represented:
V＝((P0)×α×Ld)/(EP×C×E) ....(3)
Wherein, V represents scan speed, Ld represents luminous continuity distance, EP represents the exposure actions spacing, P0 represents to give the illumination light of the light source of a smooth modulation unit and represents with power (W), α represents in fact to arrive in the lighting power of light source the power of the ratio of substrate SW, for example disperses to be supplied under the situation of n light modulation unit in illumination, and P0 is divided into the individual value of n for the power P with light source.E is the photosensitive material characteristic of expression quilt tracing body, the i.e. exposure of the per unit area of expression exposure sensitivity.C is the size of light modulation assembly irradiation area.
The 2nd formula is for example represented by following equation again:
V＝(EP/tp)....(4)
Wherein, V represents scan speed, and EP represents the exposure actions spacing.Tp represents to transmit to light modulation unit the transfer rate of tracing data, or a slower side's data processing speed in the data processing time in the tracing system.
Luminous continuity distance is relevant with the precision of tracing pattern, becomes the key element of decision live width, and is in the majority with default situation.Therefore, constitute by default luminous continuity distance such as keyboard operation, calculation element system according to the luminous continuity of setting apart from calculating exposure actions spacing and scan speed.
Exposure system is according to being determined by the photosensitive material characteristic of tracing body.Therefore, various by the exposures of tracing bodies in advance with the input of a plurality of values, cooperate this situation and corresponding to exposure parameter, the exposure of using according to reality again by the tracing body determines exposure parameter afterwards.In the case, calculation element is according to default luminous continuity distance and a plurality of exposures that set, and calculate two parameters, be film speed and exposure actions spacing, that setting device will be calculated and default film speed, exposure actions spacing and luminous continuity distance are recorded in the internal memory corresponding to the value of this exposure.Then, setting device is read from internal memory corresponding to the scan speed of the selected exposure of operator, exposure actions spacing and luminous continuity distance, and sets exposure parameter.For example, can be provided with display device, on display device, the operator can import exposure with the value representation of a plurality of sensitivity exposures.
Or under the state that exposure is determined the luminous continuity distance of predeterminable any amount, cooperate corresponding two the remaining parameters of this situation, set then corresponding to the exposure parameter of selecteed luminous continuity distance and also can.In the case, calculation element is according to the default exposure and a plurality of luminous continuity distance of setting, calculate two parameters respectively, be film speed and exposure actions spacing, that setting device will calculate and default film speed, exposure actions spacing and luminous continuity distance, be recorded in the internal memory corresponding to this exposure value, setting device is read scan speed, exposure actions spacing corresponding to the selected luminous continuity distance of operator from internal memory, and sets exposure parameter.In order to select for the operator, can be provided with display device, with a plurality of luminous continuity distance display on display device.
The present invention's tracing method system uses on the scan direction of a plurality of smooth modulation assembly systematicness and disposes the light modulation unit of arranging, exposure range by above-mentioned smooth modulation unit scans for being done with the set speed of relativity by the tracing body, make the exposure range territory overlapping and by each light modulation assembly along with the exposure actions time interval is implemented exposure actions, comprise the following steps: the scan speed of basis with respect to the relativity of the exposure range of the above-mentioned body that traced designs, expression is with the exposure actions spacing of above-mentioned scan speed in the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, default arbitrary parameter in the luminous continuity distance that above-mentioned exposure range moves during irradiates light is in fact to the above-mentioned body irradiation that traced designs is from above-mentioned exposure actions spacing, above-mentioned scan speed, relational expression between the above-mentioned luminous continuity distance is removed an above-mentioned parameter and is calculated two remaining parameters; Scan speed in default and the aforementioned calculation device, the exposure actions time interval, luminous continuity are set apart from the exposure parameter of handling as tracing; Satisfied two conditionals solve and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
The present invention's exposure parameter calculation element comprises a parameter detection device and a calculation element; Parameter detection device above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during among the luminous continuity distance that moves of above-mentioned exposure range, detect a parameter by operator's setting; Calculation element system is according to a parameter that sets, from above-mentioned exposure actions spacing, above-mentioned scan speed, relational expression between the above-mentioned luminous continuity distance is removed an above-mentioned parameter and is calculated two remaining parameters, wherein the aforementioned calculation device satisfies two conditionals and solves and calculate above-mentioned two remaining parameters, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that system is learned according to the light source and the exposure light of tracing system by this two conditional system determines satisfies the exposure that is determined by the photosensitive material characteristic of tracing body corresponding to above-mentioned, above-mentioned two conditionals comprise one the 1st formula and one the 2nd formula, the expression of the 1st formula system is with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
The present invention's exposure parameter computing method, comprise the following steps: above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during among the luminous continuity distance that moves of above-mentioned exposure range, detect a parameter by operator's setting; According to a parameter that sets, remove an above-mentioned parameter and calculate two remaining parameters from the relational expression between above-mentioned exposure actions spacing, above-mentioned scan speed, the above-mentioned luminous continuity distance; Satisfied two conditionals solve and calculate above-mentioned two remaining parameters, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that system is learned according to the light source and the exposure light of tracing system by this two conditional system determines satisfies the exposure that is determined by the photosensitive material characteristic of tracing body corresponding to above-mentioned, above-mentioned two conditionals comprise one the 1st formula and one the 2nd formula, the expression of the 1st formula system is with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
Program of the present invention, make a pick-up unit and a calculation element effect, this pick-up unit above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during among the luminous continuity distance that moves of above-mentioned exposure range, detect a parameter by operator's setting; This calculation element is according to a parameter that sets, from above-mentioned exposure actions spacing, above-mentioned scan speed, relational expression between the above-mentioned luminous continuity distance is removed an above-mentioned parameter and is calculated two remaining parameters, wherein make the effect of aforementioned calculation device, satisfied two conditionals solve and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
The manufacture method of substrate of the present invention comprises the following steps: 1) on the substrate of blank, be coated with photosensitive material; 2) for the processing that traces designs of applied substrate; 3) doing video picture for the substrate after the tracing processing handles; 4) substrate after handling for video picture is done the processing of etching or plating; 5) carry out the lift-off processing of photosensitive material for the substrate after etching or the electroplating processes, wherein in tracing is handled, use is disposed the light modulation unit of arranging on the scan direction of a plurality of smooth modulation assembly systematicness, do to scan by the exposure range of above-mentioned smooth modulation unit for substrate with the set speed of relativity, make the exposure range territory overlapping and along with the exposure actions time interval is implemented exposure actions by each light modulation assembly; According to respect to the scan speed of the relativity of the exposure range of substrate, expression with above-mentioned scan speed default arbitrary parameter in the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, above-mentioned exposure range moves during irradiates light is in fact to the substrate irradiation luminous continuity distance, remove an above-mentioned parameter and calculate two remaining parameters from the relational expression between above-mentioned exposure actions spacing, above-mentioned scan speed, the above-mentioned luminous continuity distance; Scan speed in default and the aforementioned calculation device, the exposure actions time interval, luminous continuity are set apart from the exposure parameter of handling as tracing; Satisfied two conditionals solve and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the irradiation light quantity system of the arrival substrate that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies the conditional of the exposure that the photosensitive material characteristic corresponding to aforesaid substrate determines, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
Tracing system of the present invention uses on the scan direction of a plurality of smooth modulation assembly systematicness and disposes the light modulation unit of arranging, exposure range by above-mentioned smooth modulation unit scans for being done with the set speed of relativity by the tracing body, make the exposure range territory overlapping and along with the exposure actions time interval is implemented exposure actions, this tracing system comprises: a calculation element and an exposure parameter setting device by each light modulation assembly; Calculation element, calculates with respect to above-mentioned by the relativity scan speed of the above-mentioned exposure range of tracing body, the above-mentioned exposure actions time interval in expression exposure actions cycle or in this exposure actions exposure actions spacing that above-mentioned exposure range moves in the time interval in fact between by the luminous duration of tracing body irradiation according to predetermined irradiates light; The exposure parameter setting device is between the luminous duration that will preset and the scan speed that is calculated in the aforementioned calculation device, the exposure parameter that the exposure actions time interval handles as tracing and do setting, wherein aforementioned calculation device system satisfies two conditionals and solves and calculate above-mentioned scan speed, the exposure actions time interval and exposure actions spacing, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, the restriction of the data processing speed that the expression of the 2nd formula system is handled about tracing and defined terms formula.
Tracing method of the present invention is to use on the scan direction of a plurality of smooth modulation assembly systematicness to dispose the light modulation unit of arranging, exposure range by above-mentioned smooth modulation unit scans for being done with the set speed of relativity by the tracing body, make the exposure range territory overlapping and by each light modulation assembly along with the exposure actions time interval is implemented exposure actions, comprise the following steps: according to predetermined irradiates light to calculate with respect to above-mentioned by the relativity scan speed of the above-mentioned exposure range of tracing body in fact between by the luminous duration of tracing body irradiation, the above-mentioned exposure actions time interval in expression exposure actions cycle, or in this exposure actions exposure actions spacing that above-mentioned exposure range moves in the time interval; With between default luminous duration and the exposure parameter handled as tracing of the scan speed that in the aforementioned calculation device, is calculated, the exposure actions time interval and do setting; Satisfied two conditionals solve and calculate above-mentioned scan speed, the exposure actions time interval and exposure actions spacing, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, the restriction of the data processing speed that the expression of the 2nd formula system is handled about tracing and defined terms formula.
The manufacture method of the present invention's substrate comprises the following steps: 1) on the substrate of blank, be coated with photosensitive material; 2) for the processing that traces designs of applied substrate; 3) doing video picture for the substrate after the tracing processing handles; 4) substrate after handling for video picture is done the processing of etching or plating; 5) carry out the lift-off processing of photosensitive material for the substrate after etching or the electroplating processes, wherein in tracing is handled, use is disposed the light modulation unit of arranging on the scan direction of a plurality of smooth modulation assembly systematicness, do to scan by the exposure range of above-mentioned smooth modulation unit for substrate with the set speed of relativity, make the exposure range territory overlapping and along with the exposure actions time interval is implemented exposure actions by each light modulation assembly; In fact between the luminous duration of substrate irradiation, calculate relativity scan speed with respect to the above-mentioned exposure range of aforesaid substrate, the above-mentioned exposure actions time interval in expression exposure actions cycle or according to predetermined irradiates light in this exposure actions exposure actions spacing that above-mentioned exposure range moves in the time interval; With between default luminous duration and the exposure parameter handled as tracing of the scan speed that in the aforementioned calculation device, is calculated, the exposure actions time interval and do setting; Satisfied two conditionals solve and calculate above-mentioned scan speed, the exposure actions time interval and exposure actions spacing, two conditionals comprise one the 1st formula and one the 2nd formula, the irradiation light quantity system of the arrival substrate that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies the conditional of the exposure that the photosensitive material characteristic corresponding to aforesaid substrate determines, the restriction of the data processing speed that the expression of the 2nd formula system is handled about tracing and defined terms formula.
The effect of invention
According to the present invention, do not do setting and also can form suitable tracing pattern according to the knowledge of know-how.
Description of drawings
The 1st figure is the schematic isometric of the tracing system of this example.
The 2nd figure is a synoptic diagram of being located at the exposing unit of tracing device.
The 3rd figure is relatively moving of exposure range, i.e. the synoptic diagram that scans of exposure range.
The 4th figure is the synoptic diagram of the position relation in expression projection (irradiation) zone.
The 5th figure is the calcspar of tracing system.
The 6th figure is the process flow diagram of expression exposure parameter computing.
The 7th figure is the figure of the relation of expression scan speed and exposure actions spacing.
The 8th figure is that the expression exposure parameter is set the process flow diagram of handling.
Label declaration
10～tracing device
20～exposing unit
21～light source
22～DMD (light modulation unit)
30～tracing control part
30A～control module
30B～keyboard
30C～screen
31～internal memory
32～system, control circuit
34～DMD control part
38～pedestal control part
39～display process circuit
40～pedestal position inspection sidepiece
EP～exposure actions spacing
V～scan speed
Ld～length of illumination (luminous continuity distance)
E～exposure
SW～substrate
EA～exposure range
Xij～digital micro-mirror (light modulation assembly)
Yij～tiny area (exposure range territory)
Embodiment
Below, with reference to graphic explanation the present invention's example.
The 1st figure is the stereographic map of signal of the tracing system of this example.The 2nd figure is a synoptic diagram of being located at the exposing unit of tracing device.The 3rd figure is relatively moving of exposure range EA, promptly represents the synoptic diagram that exposure range EA scans.The 4th figure is the synoptic diagram of the position relation in projection (irradiation) zone.
Tracing system comprises tracing device 10.Tracing device 10 is the device that forms circuit pattern by the substrate of the photosensitive material that irradiate light is had photoresistance etc. to surface coated, comprises gate columnar structure body 12 and base station 14.On base station 14, carrying the X-Y pedestal driving mechanism 19 of supporting X-Y pedestal 18, substrate SW is being set on X-Y pedestal 18.On gate columnar structure 12, be provided with the exposing unit 20 that is used on the surface of substrate SW, forming circuit pattern, exposing unit 20 cooperates moving of X-Y pedestal 18 and moves.
Again, tracing system comprises the tracing control part 30 of the action of moving of control X-Y pedestal 18 and exposing unit 20.Tracing control part 30 is to be made of control module 30A, keyboard 30B and monitor 30C, and the operator sets conditions of exposure etc.Substrate SW for example is Silicon Wafer, film, glass substrate or copper-surfaced laminated plates, is implementing roastingly to handle in advance, under the space state (blanks) of the processing of the coating of photoresistance etc., is being equipped on the X-Y pedestal 18.In this, the photoresistance of minus is formed at the surface of substrate SW.
Shown in the 2nd figure, exposing unit 20 comprises light source 21, DMD (Digital Micro-mirrorDevice) 22 and learns the illumination optical system 24, the image optics that are as exposure light is 26.Configuration illumination optical system 24 between light source 21 and DMD22 is configured to picture optical system 26 between DMD22 and substrate SW.The light source 21 of other semiconductor lasers etc. is with the continuous radiotherapy beam of certain intensity, and the photoconduction that is radiated is to illumination optical system 24.Illumination optical system 24 is made of diffuser plate 24A and collimation lens 24B.When light beam LB passes through illumination optical system 24, form the light of forming by the light beam of all property ground illumination DMD22.And, being not only the DMD22 shown in the 2nd figure, a plurality of DMD are along main scan direction (directions X) configuration, and the light beam that radiates from light source 22 transmits to each DMD via optical fiber (not icon).
DMD 22 is the light modulation unit that the small micro mirror of micron (μ m) grade is configured to the array shape, and each micro mirror rotates by the effect of electrostatic field.In the present embodiment, DMD 22 forms for M * N arrangement of micro mirrors becomes the array shape, below, (i, j) micro mirror of position is with X corresponding to assortment Ij(1≤i≤M, 1≤j≤N) expression.For example 1024 * 768 micro mirror constitutes DMD22.
Micro mirror X IjSystem is positioned the wherein arbitrary posture towards the prime and the second that the direction towards plane of exposure SU outside reflects of the direction reflection of the plane of exposure SU of substrate SW from the light beam LB of light source 21, according to switching posture from the controlling signal of control module 30A.As micro mirror X IjWhen being positioned prime, by micro mirror X IjThe light of reflection is guided to the direction of picture optical system 26.Schematically Biao Shi image optics 26 is made of two convex lens and mirror lens (not icon), is that 26 rayed is to the set zone of the plane of exposure SU that forms photoresist layer by image optics.
On the other hand, as micro mirror X IjWhen being positioned second, by micro mirror X IjThe light of reflection is directed to the direction of light absorption plate (not icon), and light can not be irradiated to plane of exposure SU.Below, micro mirror X IjState in the prime support is the ON state, and the state of second support is the OFF state.
Image optics is that 26 multiplying power is owing to be decided to be 1 times at this, a micro mirror X IjIrradiation area Y IjSize (width, highly) and micro mirror X IjConsistent size.Corresponding to micro mirror X IjThe height indicator of secondary scan direction (Y direction) be shown h, be 1 corresponding to the width means of scan direction (directions X), have the irradiation area (to call tiny area in the following text) of the size of 1 * h.Micro mirror X IjBe square (h=1), again, with respect to the live width of pattern, micro mirror X IjSize very small, the length of a slice is number μ m～tens of μ m.
The size system of DMD22 decides according to the demonstration specification of TV, regulation is a transverse direction corresponding to the direction of DMD22 master's scan direction, direction corresponding to secondary scan direction is a longitudinal direction, width (transverse direction length) and height (longitudinal direction length) are respectively with " W ", " K " expression, and (horizontal vertical than W: K) order is 3: 4 to the length breadth ratio of DMD22.
Under the state that X-Y pedestal 18 stops, all micro mirrors all are in the state of ON, and this moment, aligning had both the area E A of sizing (is exposure range to call this zone in the following text) on plane of exposure SU.Because image optics is 26 multiplying power is 1 times, the relation of D * R=K * W (=(M * h) * (N * 1)) is set up.
Because at DMD22 micro mirror X IjBe respectively independent control ON/OFF, expose to all light of DMD22, be the light that light beam constituted of the light that optionally reflects at each micro mirror.The result is on the arbitrary region Ew at exposure range EA place on the plane of exposure SU, X-Y pedestal 18 moves with certain speed, move with certain speed along main scan direction (directions X) relativity ground on plane of exposure SU with this exposure range EA system, circuit pattern system forms along main scan direction (directions X).
X-Y pedestal 18 with certain speed move during, the irradiation position of skew tiny area promptly, makes it overlapping and implement exposure actions.That is, in the set exposure actions time interval (exposure cycle), implement the micro mirror X of beginning throw light repeatedly IjThe ON switching controls simultaneously, the digital micro-mirror that is arranged in directions X is in order when set scope throw light, the identical and decision exposure actions in the position that makes the tiny area of irradiation successively at interval and scan speed.In this, than corresponding to micro mirror X IjTiny area Y IjThe interval 1 exposure range EA of width 1 move in also short time interval required time and carry out exposure actions.
By so sequential control of exposure actions, shown in the 4th figure, substrate SW with certain speed do relativity move during, the every forward travel distance of exposure range EA (to call the exposure actions spacing in the following text) d (＜1) then carries out exposure actions repeatedly.And, in exposure actions successively, the time weak point that the time ratio exposure range EA forward travel distance d that each micro mirror continues at the ON state is required.In this, only in the time of exposure range EA forward travel distance Ld, micro mirror maintains the state of ON, exposure range move remaining distance during, each micro mirror switches to the state (with reference to the 4th figure) of OFF.And exposure actions spacing d can set (1+d) for.
When scan along one band scan finish after, X-Y pedestal 18 is towards Y direction (secondary scan direction) displacement D, and the next one that relatively moves scans band (reference the 3rd figure).When exposure range EA toward redoubling with all when scanning band and scanning, tracing is finished dealing with.After tracing is handled, implement video picture processing, etching or plating, photoresistance lift-off processing etc., produce the substrate that forms circuit pattern.
The 5th figure is the calcspar of tracing system.
The control module 30A of tracing control part 30 comprises, system, control circuit 32, DMD control part 34, pedestal control part 38, the inspection of pedestal position sidepiece 40, raster transform portion 42 and light source control portion 44, the system, control circuit 32 control tracing devices 10 that comprise CPU, RAM, ROM etc. are all, handle the program of using according to the tracing that is stored in advance in the ROM, DMD control part 34 control DMD22.
When corresponding to the circuit pattern data of tracing device 10 as CAM data (vectorial data) when workstation (not icon) is sent to the raster transform portion 42 of control module 30A, pattern data converts the grating data corresponding to raster scans to, and temporarily is stored in the dot matrix internal memory 43 of DMD control part 34.Raster data is one of them the data of binarization of the ON/OFF of expression micro mirror, is expressed as the two-dimensional points pattern of circuit pattern.
Being stored in grating data system in the dot matrix internal memory 43 cooperates the relative position of exposure range EA and reads with set sequential.The relative position information of the exposure range EA that sends according to the dot matrix data of reading and from pedestal position detection part 40 exports the controlling signal of control micro mirror ON/OFF to DMD22.Pedestal control part 38 is the X-Y pedestal driving mechanism 19 that control comprises motor (not icon), controls the translational speed of X-Y pedestal 18 etc. by this.Pedestal position inspection sidepiece 40 detects the relativity position with respect to the X-Y pedestal 18 of exposure range EA.
System, control circuit 32 is sent controlling signal in order to emit from the light of light source 21 towards light source control portion 44, exports the controlling signal of control exposure time series simultaneously for DMD control part 34.In internal memory 31, noting down the data of exposure parameter, write, read as required.
In display process circuit, 39, supply the signal of screen 30C display frame to handle.When tracing system is disposed at the substrate manufacturing equipment,, automatically calculate the selection group of exposure parameter by input operation to keyboard 30B.Then, make in the situation of substrate in reality, the selection group of the exposure parameter of calculating in advance shows by display process circuit 39, by determining exposure parameter for the input operation of keyboard 30B.
The 6th figure represents the process flow diagram of the exposure parameter computing implemented by system, control circuit 52.The 7th figure is the scan speed of expression in the exposure parameter and the figure of the relation of exposure actions spacing.Processing shown in the 6th figure is to be implemented by the expert's who is familiar with tracing system input operation to handle, and the setting-up time when being equipped with tracing system at the manufacturing scene of substrate carries out.
In this example, owing to, calculate following exposure parameter in advance implementing the just necessary exposure parameter of decision of tracing processing.At first, in tracing is handled, must decision along the relative velocity corresponding to the main scan direction (directions X) of the exposing unit 20 of substrate SW, i.e. scan speed (following) with V (mm/s) expression.The value of scan speed V can be all influential to the processing procedure of substrate, and scan speed V is faster, and the tracing processing speed all with respect to substrate is higher, can improve production capacity.
On the other hand, relevant for scan speed V, the speed limit that is produced by the exposure sensitivity of the light intensity (luminous power) of light source and substrate SW, and the speed limit that data processing speed produced in the hardware of tracing system exists.In speed limit relevant for exposure, determine to form the necessary exposure of pattern by the sensitivity characteristic of the photoresistance of coating substrate, the power of light source of device of tracing designs on the other hand is predetermined, and limits scan speed V in order to obtain necessary exposure.Again, in speed limit relevant for data processing speed, the data processing speed in control module 30 or transmit to DMD22 the tracing data the necessary processing time restriction and limit scan speed V.
In this example, the speed limit relevant with light quantity and with data processing speed relevant speed limit defines two formulas, scan speed V and exposure actions spacing EP be two separating of formula and obtaining the most.The operator imports the exposure sensitivity (and exposure) of luminous continuity distance (being the distance (hereinafter referred to as length of illumination) that interior exposure range EA of the time of the actual irradiation of light advanced during single exposure moved), substrate SW.
In step S101, exposure (W sec/mm 2) and length of illumination (μ m=10 -3Mm) judge whether input by the operator.Exposure is for forming the necessary light summation of pattern, looks the kind of substrate SW of use and different.The exposure little sensitivity that heals is higher.In this, the value of exposure is set at 10～90 (W sec/mm 2) scope.On the other hand, length of illumination system according to the tracing pattern through degree of being, the fine pattern of healing, length of illumination are shorter.Length of illumination is set in the scope of 5～30 (μ m) in this.
In step S102, two separating of formula shown below and calculate exposure actions spacing EP (mm) and scan speed V (mm/sec).
V＝a×((P/n)×α×Ld)/(EP×C×E)....(5)
V＝b×(EP/tp)....(6)
Wherein, P is the lighting power (light intensity) with power (W) expression laser unit.α represents in fact to arrive among the lighting power P of light source the power of the ratio of substrate SW.Is 26 and in fact arrive substrate SW from the some of the light of laser unit radiation through illumination optical system 24, image optics, the value of α in this is set at 0.2～0.4 scope.N is the numeral of expression DMD unit, and lighting power is disperseed by the quantity of DMD.C represents tiny area Y IjUnit size.E is exposure (W sec/mm 2), Ld is length of illumination (mm).
On the other hand, tp represents to transmit to DMD22 the speed of tracing data, or the slower side's of data processing time data processing speed in the grating data conversion among the control module 30A, the output of tracing data, and it is 10 -6The value of the grade of second (μ sec).A, b represent safety coefficient, and in this, ordering is 0.8～0.9.
In formula (5), the light that the light of light source 21 is disperseed by the quantity of DMD and considers in fact to arrive substrate SW, represent that simultaneously the exposure that in fact interval with respect to length of illumination Ld gives substrate SW satisfies the condition of the exposure of being decided by the photosensitive material characteristic of substrate SW, and be expanded to the formula of trying to achieve scan speed V.Exposure actions spacing EP is set under the long situation, in order to obtain the exposure of substrate SW, at identical scope irradiates light as far as possible for a long time.Therefore, scan speed is slowed down.As seen from formula (5), the relation that is inversely proportional to of exposure actions spacing EP and scan speed V.
In formula (6), scan speed V that expression is determined by data processing speed tp and the relation of exposure actions spacing EP are expanded in the formula of trying to achieve scan speed V.In formula (6), scan speed V is directly proportional with exposure actions spacing EP.
Shown in the 7th figure, transverse axis is ordered and is that exposure actions spacing EP, the longitudinal axis order and is scan speed V, and formula (5), formula (6) are represented with coefficient F (EP), G (EP) respectively.The intersection point Z of coefficient F, G for the condition that satisfies the scan speed V relevant simultaneously with exposure and with data processing speed relevant scan speed V condition separate (V, EP), in step S102, calculate the scan speed and the exposure actions spacing (Vm, EPm) that satisfy formula (5), (6).In step 102, when obtaining scan speed Vm and exposure actions spacing EPm, enter step S103, scan speed Vm and the exposure actions spacing EPm that has calculated is recorded in the internal memory 31.At this moment, scan speed Vm and exposure actions spacing EPm system is corresponding to length of illumination Ld that has imported and exposure E.
In step S104, whether the input operation of judging exposure E, length of illumination Ld finishes, when the operator imports the value of new exposure E and length of illumination Ld, get back to step S101, calculate scan speed V and exposure actions spacing EP corresponding to the exposure E that has imported, length of illumination Ld, and be recorded in the internal memory 31.When being judged as when being finished by operator's implementation and operation, handling procedure finishes on the other hand.
The 8th figure is that the exposure parameter that expression is implemented by system, control circuit 52 is set the process flow diagram of handling.This setting is treated to the manufacturing field monitor manufacturing engineering at substrate, and in fact the processing of being implemented by the operator of operation control is handled according to the sensitivity characteristic of the substrate of tracing device carrying and the precision of tracing pattern.
In step S201, the menu picture of selective exposure parameter is shown in screen 30C.In this, by exposure E with arranging a plurality of as the tracing project of the combination of the pattern precision (μ m) of length of illumination Ld and showing, from the combination of the exposure E of various values and pattern fineness (length of illumination Ld), revolve then and show.In step S102, judged whether to select the combination of exposure E and length of illumination Ld.The operator selects to be selected by the operation of keyboard 30B corresponding to the exposure of the exposure sensitivity of the substrate SW that makes and corresponding to the combination of the length of illumination of the fineness of the pattern that is formed at substrate.
In step S202, when selecting the combination of an exposure E and length of illumination Ld, enter step S203, from internal memory 31, read scan speed V, exposure actions spacing EP corresponding to selected exposure E and length of illumination Ld, and determine exposure parameter.Then, carrying out in the process that tracing is handled, controlling signal is exported to DMD control part 34 and systems control division 38 from system, control circuit 32, by the scan speed V that has set substrate SW is relatively moved simultaneously, carry out exposure actions repeatedly by the exposure actions spacing EP that sets, and the cycle that decision tracing data (map grid) is switched.And, only along with during the length of illumination Ld that sets, micro mirror X IjMaintain the state of ON, and controlling signal is exported towards DMD 22.
According to this example, the length of illumination Ld according to default according to formula (5) (6), calculates exposure actions spacing EPm and scan speed Vm.Then, with various exposure E and length of illumination Ld and with it among the corresponding scan speed V and exposure actions spacing EP, decision is done setting as exposure parameter for the tracing processing corresponding to scan speed V and the exposure actions spacing EP of selected exposure E and length of illumination Ld.
And, in this example,, length of illumination is made as the value of certain and change exposure and calculates the exposure actions spacing and scan speed also can though form to select the structure of exposure and length of illumination.Under this situation, show the picture of selecting exposure, decision is as the scan speed and the exposure actions spacing corresponding to selected exposure of exposure parameter.
Again,, replace the exposure actions spacing and limit the exposure actions cycle (the exposure actions time interval), and the structure of calculating exposure actions cycle and scan speed also can corresponding to the formula of formula (5), (6).

Claims (16)

1. tracing system, this tracing system uses the light modulation unit that configuration is arranged on the scan direction of a plurality of smooth modulation assembly systematicness, exposure range by above-mentioned smooth modulation unit scans with doing of certain speed relativity for the body that traced designs, implementing exposure actions with certain exposure actions time interval makes the exposure range territory of each light modulation assembly overlapping, this tracing system is characterised in that this tracing system comprises:
Calculation element, its according to respect to above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during default arbitrary parameter in the luminous continuity distance that moves of above-mentioned exposure range, remove an above-mentioned parameter and calculate two remaining parameters from the relational expression between above-mentioned exposure actions spacing, above-mentioned scan speed, the above-mentioned luminous continuity distance; And
The exposure parameter setting device, the scan speed that it will be preset and the aforementioned calculation device is calculated, the exposure actions time interval, luminous continuity is set apart from the exposure parameter of handling as tracing, wherein the aforementioned calculation device satisfies two conditionals and solves and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
2. tracing system as claimed in claim 1, wherein, the aforementioned calculation device goes out exposure actions spacing and scan speed according to default luminous continuity distance calculation.
3. tracing system as claimed in claim 1, wherein, above-mentioned the 1st formula is to represent with following equation:
V＝((P0)×α×Ld)/(EP×C×E) ....(1)
Wherein, V represents scan speed (mm/sec), Ld represents luminous continuity distance (mm), EP represents exposure actions spacing (mm), P0 represents the lighting power (W) of light source, and α represents in fact to arrive in the lighting power of light source the power of the ratio of substrate SW, for example disperses to be supplied under the situation of n light modulation unit in illumination, P0 is divided into n value for the power P with light source, and E is exposure (the W sec/mm of the photosensitive material characteristic (exposure sensitivity) of expression quilt tracing body 2), the light summation of the necessary per unit area of formation pattern, C is the size (mm) of light modulation assembly point of irradiation.
4. tracing system as claimed in claim 1, wherein, above-mentioned the 2nd formula is to represent with following equation:
V＝(EP/tp) ....(2)
Wherein, V represents scan speed (mm/sec), and EP represents exposure actions spacing (mm), and tp represents the tracing data transmission speed to light modulation unit, or a slower side's data processing speed in the data processing time in the tracing system.
5. tracing system as claimed in claim 1, wherein, aforementioned calculation device system calculates two parameters of film speed and exposure actions spacing respectively with a plurality of exposures of setting according to default luminous continuity distance; Above-mentioned setting device will calculate and default film speed, exposure actions spacing and luminous continuity distance corresponding with the value of this exposure and be recorded in the internal memory; Above-mentioned setting device is read from above-mentioned internal memory corresponding to the pairing scan speed of the exposure of being selected by the operator, exposure actions spacing and luminous continuity distance, and sets exposure parameter.
6. tracing system as claimed in claim 5, this tracing system also comprises display device, this display device is shown in the value of above-mentioned a plurality of sensitivity exposures on the display device.
7. tracing system as claimed in claim 1, wherein, the aforementioned calculation device is two parameters that calculate film speed and exposure actions spacing according to a plurality of luminous continuity distance of default exposure and setting respectively,
Above-mentioned setting device will calculate and default film speed, exposure actions spacing and luminous continuity distance corresponding with the value of this exposure and be recorded in the internal memory,
Above-mentioned setting device is read from above-mentioned internal memory corresponding to luminous continuity pairing scan speed of distance and the exposure actions spacing selected by the operator, and sets exposure parameter.
8. tracing system as claimed in claim 7, this tracing system also comprises display device, this display device is shown in the value of above-mentioned a plurality of luminous continuity distances on the display device.
9. tracing method, this tracing method is used the light modulation unit that configuration is arranged on the scan direction of a plurality of smooth modulation assembly systematicness, exposure range by above-mentioned smooth modulation unit scans with doing of certain speed relativity for the body that traced designs, implementing exposure actions with certain exposure actions time interval makes the exposure range territory of each light modulation assembly overlapping, this tracing method is characterised in that this tracing method comprises the following steps:
According to respect to above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during default arbitrary parameter in the luminous continuity distance that moves of above-mentioned exposure range, remove an above-mentioned parameter and calculate two remaining parameters from the relational expression between above-mentioned exposure actions spacing, above-mentioned scan speed, the above-mentioned luminous continuity distance;
Scan speed, the exposure actions time interval, luminous continuity that default and aforementioned calculation device are calculated are set apart from the exposure parameter of handling as tracing; And
Satisfied two conditionals solve and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
10. an exposure parameter calculation element is characterized in that,
This exposure parameter calculation element comprises:
Parameter detection device, its to above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during among the luminous continuity distance that moves of above-mentioned exposure range, detect a parameter by operator's setting; And
Calculation element, it is according to a parameter that sets, from above-mentioned exposure actions spacing, above-mentioned scan speed, relational expression between the above-mentioned luminous continuity distance calculates removes an above-mentioned parameter that sets and two remaining parameters, wherein the aforementioned calculation device satisfies two conditionals and solves and calculate above-mentioned two remaining parameters, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that system is learned according to the light source and the exposure light of tracing system by this two conditional system determines satisfies the exposure that is determined by the photosensitive material characteristic of tracing body corresponding to above-mentioned, above-mentioned two conditionals comprise one the 1st formula and one the 2nd formula, the expression of the 1st formula system is with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
11. exposure parameter computing method is characterized in that, these exposure parameter computing method comprise the following steps:
Above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during among the luminous continuity distance that moves of above-mentioned exposure range, detect a parameter by operator's setting;
According to a parameter that sets, calculate and remove an above-mentioned parameter that sets and two remaining parameters from above-mentioned exposure actions spacing, above-mentioned scan speed, the above-mentioned luminous relational expression that continues between the distance; And
Satisfied two conditionals solve and calculate above-mentioned two remaining parameters, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that system is learned according to the light source and the exposure light of tracing system by this two conditional system determines satisfies the exposure that is determined by the photosensitive material characteristic of tracing body corresponding to above-mentioned, above-mentioned two conditionals comprise one the 1st formula and one the 2nd formula, the expression of the 1st formula system is with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
12. program, this program makes pick-up unit and calculation element carry out work, this pick-up unit above-mentioned by the scan speed of the relativity of the exposure range of tracing body, expression with above-mentioned scan speed the exposure actions spacing of the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, irradiates light in fact to above-mentioned by the irradiation of tracing body during among the luminous continuity distance that moves of above-mentioned exposure range, detect a parameter by operator's setting; This calculation element is according to a parameter that sets, and calculates from the relational expression between above-mentioned exposure actions spacing, above-mentioned scan speed, the above-mentioned luminous continuity distance and removes an above-mentioned parameter that sets and two remaining parameters, and this program is characterised in that,
This program makes the aforementioned calculation device carry out work, solve as satisfied two conditionals and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
13. the manufacture method of a substrate, this manufacture method comprises the following steps:
1) on the substrate of blank, is coated with photosensitive material;
2) for the processing that traces designs of applied substrate;
3) doing video picture for the substrate after the tracing processing handles;
4) substrate after handling for video picture is done the processing of etching or plated film; And
5) carry out the lift-off processing of photosensitive material for the substrate after etching or the coating film treatment, the manufacture method of described substrate is characterised in that,
In tracing is handled,
That uses a plurality of smooth modulation assembly systematicness disposes the light modulation unit of arranging on scan direction, exposure range by above-mentioned smooth modulation unit scans with doing of certain speed relativity for substrate, implementing exposure actions with certain exposure actions time interval makes the exposure range territory of each light modulation assembly overlapping
According to scan speed with respect to the relativity of the exposure range of aforesaid substrate, expression is with the exposure actions spacing of above-mentioned scan speed in the above-mentioned exposure actions distance that above-mentioned exposure range moves between the time interval, default arbitrary parameter in the luminous continuity distance that above-mentioned exposure range moves during irradiates light is in fact to the aforesaid substrate irradiation, from above-mentioned exposure actions spacing, above-mentioned scan speed, relational expression between the above-mentioned luminous continuity distance calculates removes an above-mentioned parameter that sets and two remaining parameters
Scan speed in default and the aforementioned calculation device, the exposure actions time interval, luminous continuity are set apart from the exposure parameter of handling as tracing,
Satisfied two conditionals solve and calculate above-mentioned two remaining parameters, two conditionals comprise one the 1st formula and one the 2nd formula, the arrival irradiation light quantity system of the arrival substrate that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies the conditional of the exposure that the photosensitive material characteristic corresponding to aforesaid substrate determines, with respect to above-mentioned scan speed, above-mentioned luminous continuity distance is directly proportional, and above-mentioned exposure actions spacing is inversely proportional to, the restriction of the data processing speed that the system expression of the 2nd formula is handled about tracing and defined terms formula, with respect to above-mentioned scan speed, the relation that above-mentioned exposure actions spacing is directly proportional.
14. tracing system, this tracing system uses the light modulation unit that configuration is arranged on the scan direction of a plurality of smooth modulation assembly systematicness, exposure range by above-mentioned smooth modulation unit scans with doing of certain speed relativity for the body that traced designs, implementing exposure actions with certain exposure actions time interval makes the exposure range territory of each light modulation assembly overlapping, this tracing system is characterised in that this tracing system comprises:
Calculation element, it, calculates with respect to above-mentioned by the relativity scan speed of the above-mentioned exposure range of tracing body, the above-mentioned exposure actions time interval in expression exposure actions cycle or in this exposure actions exposure actions spacing that above-mentioned exposure range moves in the time interval in fact between by the luminous duration of tracing body irradiation according to predetermined irradiates light; And
The exposure parameter setting device, between its luminous duration that will preset and the scan speed that in the aforementioned calculation device, is calculated, the exposure parameter that the exposure actions time interval handles as tracing and do setting, wherein aforementioned calculation device system satisfies two conditionals and solves and calculate above-mentioned scan speed, the exposure actions time interval and exposure actions spacing, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, the restriction of the data processing speed that the expression of the 2nd formula system is handled about tracing and defined terms formula.
15. tracing method, this tracing method is used the light modulation unit that configuration is arranged on the scan direction of a plurality of smooth modulation assembly systematicness, exposure range by above-mentioned smooth modulation unit scans with doing of certain speed relativity for the body that traced designs, implementing exposure actions with certain exposure actions time interval makes the exposure range territory of each light modulation assembly overlapping, this tracing method is characterised in that this tracing method comprises the following steps:
, calculate with respect to above-mentioned in fact between according to predetermined irradiates light by the relativity scan speed of the above-mentioned exposure range of tracing body, the above-mentioned exposure actions time interval in expression exposure actions cycle or in this exposure actions exposure actions spacing that above-mentioned exposure range moves in the time interval by the luminous duration of tracing body irradiation;
With between default luminous duration and the exposure parameter handled as tracing of the scan speed that in the aforementioned calculation device, is calculated, the exposure actions time interval and do setting; And
Satisfied two conditionals solve and calculate above-mentioned scan speed, the exposure actions time interval and exposure actions spacing, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, the restriction of the data processing speed that the expression of the 2nd formula system is handled about tracing and defined terms formula.
16. the manufacture method of a substrate, this manufacture method comprises the following steps:
1) on the substrate of blank, is coated with photosensitive material;
2) for the processing that traces designs of applied substrate;
3) doing video picture for the substrate after the tracing processing handles;
4) substrate after handling for video picture is done the processing of etching or plated film; And
5) carry out the lift-off processing of photosensitive material for the substrate after etching or the coating film treatment, the manufacture method of described substrate is characterised in that,
In tracing is handled,
That uses a plurality of smooth modulation assembly systematicness disposes the light modulation unit of arranging on scan direction, exposure range by above-mentioned smooth modulation unit scans with doing of certain speed relativity for the body that traced designs, and implements exposure actions with certain exposure actions time interval and makes the exposure range territory of each light modulation assembly overlapping;
, calculate with respect to above-mentioned in fact between according to predetermined irradiates light by the relativity scan speed of the above-mentioned exposure range of tracing body, the above-mentioned exposure actions time interval in expression exposure actions cycle or in this exposure actions exposure actions spacing that above-mentioned exposure range moves in the time interval by the luminous duration of tracing body irradiation;
With between default luminous duration and the exposure parameter handled as tracing of the scan speed that in the aforementioned calculation device, is calculated, the exposure actions time interval and do setting; And
Satisfied two conditionals solve and calculate above-mentioned scan speed, the exposure actions time interval and exposure actions spacing, two conditionals comprise one the 1st formula and one the 2nd formula, the traced designs arrival irradiation light quantity system of body of the arrival that the characteristic that the system expression of the 1st formula is learned system according to the light source and the exposure light of tracing system determines satisfies conditional corresponding to the above-mentioned exposure that is determined by the photosensitive material characteristic of tracing body, the restriction of the data processing speed that the expression of the 2nd formula system is handled about tracing and defined terms formula.
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