CN108535909A - Bps型阵列基板的制作方法及bps型阵列基板 - Google Patents
Bps型阵列基板的制作方法及bps型阵列基板 Download PDFInfo
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Abstract
本发明提供一种BPS型阵列基板的制作方法及BPS型阵列基板。本发明的BPS型阵列基板的制作方法,利用第一色阻层和第二色阻层形成的双层色阻结构分别用于垫高主隔垫物和辅助隔垫物的主衬垫部和辅助衬垫部,使得所述主衬垫部和辅助衬垫部凸起明显,从而使得主隔垫物和辅助隔垫物自身的厚度减小,进而可以减少形成主隔垫物和辅助隔垫物的BPS材料用量,降低生产成本,通过半曝光工艺减薄辅助衬垫部下方第一色阻层的厚度即可实现所述主隔垫物和辅助隔垫物之间的高度差,制作方法简单。
Description
技术领域
本发明涉及显示技术领域,尤其涉及一种BPS型阵列基板的制作方法及BPS型阵列基板。
背景技术
液晶显示器(Liquid Crystal Display,LCD)是目前市场上应用最为广泛的显示产品,其生产工艺技术十分成熟,产品良率高,生产成本相对较低,市场接受度高。现有市场上的液晶显示器大部分为背光型液晶显示装置,其包括液晶显示面板及背光模组。通常液晶显示面板由彩膜(Color Filter,CF)基板、阵列(Array)基板、夹于彩膜基板与阵列基板之间的液晶及密封框胶(Sealant)组成,其中,CF基板主要包括用于通过色阻单元(R/G/B)形成有色光的彩色滤光层、用于防止像素边缘漏光的黑色矩阵(Black Matrix,BM)、以及用于维持盒厚的隔垫物(Photo Spacer,PS),在大尺寸液晶显示面板中,通常会使用两种类型以上的隔垫物,如在CF基板上设置主隔垫物(Main PS)、及辅助隔垫物(Sub PS),起到多级缓冲的作用,以防止各种Mura或者不良的发生。
黑色隔垫物(Black Photo Spacer,BPS)材料是一种新型材料,它既具有传统技术中隔垫物材料的特性,如较优秀的弹性回复力及对液晶较低的污染等,而且还具有黑色矩阵材料的特性,如较高的光学密度(optical density,OD)值,可以起到遮光作用,因此,能够用于将BM与PS两种工艺制程合二为一,减少一道黄光制程,减少材料成本及生产时间(tact time),从而降低整个生产成本。
COA(Color Filter on Array)技术是将彩色滤光层制备在阵列基板上的技术。由于COA结构的显示面板不存在彩膜基板与阵列基板的对位问题,因此可以降低显示面板制备过程中对盒制程的难度,避免了对盒时的误差,因此黑色矩阵可以设计为窄线宽,提高了开口率。一种新型的BM-Less技术是基于COA技术上将BM与PS集合于同一BPS材料且同一制程完成并设计在Array基板上的一种技术,与传统的液晶显示技术比较,将黑色矩阵、主隔垫物、辅助隔垫物、及彩色滤光膜全部设计在阵列基板侧,这样不仅可以避免对组制程中由于对组精度的误差,或者曲面显示技术中由于面板弯曲造成的平移带来的露光,更重要的是节省一道材料及制程,缩短生产时间,降低了产品成本。
但是目前BPS材料的技术难度较大,尚未大量量产,价格昂贵,而现有BPS型产品结构中,如图1所示,主隔垫物101和辅助隔垫物102下方使用单层的第一色阻201和第二色阻202作为衬垫载台,主隔垫物101和辅助隔垫物102之间的高度差由第一色阻201和第二色阻202的厚度差所构成,主隔垫物101和辅助隔垫物102自身的厚度h1与液晶面板的盒厚(Cellgap)H1相近,主隔垫物101和辅助隔垫物102对BPS材料的用量较大,成本较高。
发明内容
本发明的目的在于提供一种BPS型阵列基板的制作方法,主隔垫物和辅助隔垫物自身的厚度较小,从而可以减少BPS材料的用量,降低生产成本。
本发明的目的在于提供一种BPS型阵列基板,主隔垫物和辅助隔垫物自身的厚度较小,从而可以减少BPS材料的用量,降低生产成本。
为实现上述目的,本发明提供一种BPS型阵列基板的制作方法,包括如下步骤:
步骤S1、提供一衬底基板,在衬底基板上形成TFT层,在所述衬底基板上形成覆盖TFT层的保护层;
步骤S2、在所述保护层上形成彩色光阻层,所述彩色光阻层包括不同颜色的第一色阻层和第二色阻层,所述第一色阻层包括并列的第一像素单元、第一主衬垫单元及第一辅助衬垫单元,所述第二色阻层包括并列的第二像素单元、第二主衬垫单元及第二辅助衬垫单元,其中,所述第一像素单元、第二像素单元并列排布于保护层上,所述第一主衬垫单元和第二主衬垫单元堆叠于保护层上并共同构成主衬垫部,所述第一辅助衬垫单元和第二辅助衬垫单元堆叠于保护层上并共同构成辅助衬垫部,通过半曝光工艺制作所述第一色阻层,经一次曝光得到厚度不同的第一主衬垫单元和第一辅助衬垫单元,使得所述第一辅助衬垫单元的厚度小于所述第一主衬垫单元的厚度,从而使得所述主衬垫部的高度大于所述辅助衬垫部的高度;
步骤S3、在所述保护层上形成覆盖所述彩色光阻层的有机绝缘层,在所述有机绝缘层上涂布BPS材料,并对所述BPS材料进行曝光、显影,得到BPS遮光层,所述BPS遮光层包括黑色矩阵、以及设于所述黑色矩阵上的主隔垫物与辅助隔垫物,所述主隔垫物和辅助隔垫物分别对应位于所述主衬垫部和辅助衬垫部的上方,所述主隔垫物的高度大于所述副隔垫物的高度,所述副隔垫物的高度大于所述黑色矩阵的高度。
所述步骤S2中,采用半透式掩膜板或灰色调掩膜板进行半曝光工艺制作所述第一色阻层,从而经一次曝光得到厚度不同的第一主衬垫单元和第一辅助衬垫单元;
所述步骤S3中,采用全曝光方式对所述BPS材料进行曝光,得到黑色矩阵、主隔垫物与辅助隔垫物,所述第一主衬垫单元和第一辅助衬垫单元之间的厚度差构成所述主衬垫部和辅助衬垫部之间的高度差。
所述步骤S2中,所述第一主衬垫单元对应位于第二主衬垫单元之上,所述第一辅助衬垫单元对应位于第二辅助衬垫单元之上;或者,
所述第二主衬垫单元对应位于第一主衬垫单元之上,所述第二辅助衬垫单元对应位于第一辅助衬垫单元之上。
所述步骤S2中,所述彩色光阻层还包括第三色阻层;
所述第三色阻层包括与所述第一像素单元和第二像素单元并列排布于保护层上的第三像素单元;
所述第一色阻层、第二色阻层及第三色阻层分别为红色色阻层、绿色色阻层及蓝色色阻层中的一种。
所述步骤1中,所述的TFT层包括扫描线及与所述扫描线垂直交叉且绝缘的数据线;
所述黑色矩阵对应设于所述扫描线上方。
本发明还提供一种BPS型阵列基板,包括衬底基板、设于所述衬底基板上的TFT层、覆盖所述衬底基板及TFT层的保护层、设于所述保护层上的彩色光阻层、覆盖于所述彩色光阻层和保护层上的有机绝缘层及设于所述有机绝缘层上的BPS遮光层;
所述BPS遮光层包括黑色矩阵及设于所述黑色矩阵上的主隔垫物与辅助隔垫物;
所述彩色光阻层包括不同颜色的第一色阻层和第二色阻层,所述第一色阻层包括并列的第一像素单元、第一主衬垫单元及第一辅助衬垫单元,所述第二色阻层包括并列的第二像素单元、第二主衬垫单元及第二辅助衬垫单元,其中,所述第一像素单元、第二像素单元并列排布于保护层上,所述第一主衬垫单元和第二主衬垫单元堆叠于保护层上并共同构成主衬垫部,所述第一辅助衬垫单元和第二辅助衬垫单元堆叠于保护层上并共同构成辅助衬垫部,所述第一辅助衬垫单元的厚度小于所述第一主衬垫单元的厚度,所述主衬垫部的高度大于所述辅助衬垫部的高度;
所述主隔垫物和辅助隔垫物分别对应位于所述主衬垫部和辅助衬垫部的上方,所述主隔垫物的高度大于所述副隔垫物的高度,所述副隔垫物的高度大于所述黑色矩阵的高度。
所述第一主衬垫单元和第一辅助衬垫单元之间的厚度差构成所述主衬垫部和辅助衬垫部之间的高度差。
所述第一主衬垫单元对应位于第二主衬垫单元之上,所述第一辅助衬垫单元对应位于第二辅助衬垫单元之上;或者,
所述第二主衬垫单元对应位于第一主衬垫单元之上,所述第二辅助衬垫单元对应位于第一辅助衬垫单元之上。
所述彩色光阻层还包括第三色阻层;
所述第三色阻层包括与所述第一像素单元和第二像素单元并列排布于保护层上的第三像素单元;
所述第一色阻层、第二色阻层及第三色阻层分别为红色色阻层、绿色色阻层及蓝色色阻层中的一种。
所述的TFT层包括扫描线及与所述扫描线垂直交叉且绝缘的数据线;
所述黑色矩阵对应设于所述扫描线上方。
本发明的有益效果:本发明提供的一种BPS型阵列基板的制作方法,利用第一色阻层和第二色阻层形成的双层色阻结构分别用于垫高主隔垫物和辅助隔垫物的主衬垫部和辅助衬垫部,使得所述主衬垫部和辅助衬垫部凸起明显,从而使得主隔垫物和辅助隔垫物自身的厚度减小,进而可以减少形成主隔垫物和辅助隔垫物的BPS材料用量,降低生产成本,通过半曝光工艺减薄辅助衬垫部下方第一色阻层的厚度即可实现所述主隔垫物和辅助隔垫物之间的高度差,制作方法简单。本发明的BPS型阵列基板,分别用于垫高主隔垫物和辅助隔垫物的主衬垫部和辅助衬垫部均是利用第一色阻层和第二色阻层所形成的双层色阻结构,使得所述主衬垫部和辅助衬垫部凸起明显,从而使得主隔垫物和辅助隔垫物自身的厚度减小,进而可以减少形成主隔垫物和辅助隔垫物的BPS材料用量,降低生产成本。
为了能更进一步了解本发明的特征以及技术内容,请参阅以下有关本发明的详细说明与附图,然而附图仅提供参考与说明用,并非用来对本发明加以限制。
附图说明
下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其它有益效果显而易见。
附图中,
图1为现有BPS型液晶面板的剖面结构示意图;
图2为本发明的BPS型阵列基板的制作方法的流程示意图;
图3为本发明的BPS型阵列基板的制作方法的步骤S1的示意图;
图4为本发明的BPS型阵列基板的制作方法的步骤S2的示意图;
图5为本发明的BPS型阵列基板的制作方法的步骤S3的示意图;
图6为本发明的BPS型阵列基板的平面结构示意图;
图7为本发明的BPS型阵列基板沿图6中a-a’线的剖面结构示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果,以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图2,本发明首先提供一种BPS型阵列基板的制作方法,包括如下步骤:
步骤S1、如图3所示,提供一衬底基板10,在衬底基板10上形成TFT层20,在所述衬底基板10上形成覆盖TFT层20的保护层30。
具体地,所述步骤1中,所述的TFT层20包括扫描线21及与所述扫描线21垂直交叉且绝缘的数据线22。
步骤S2、如图4和图6所示,在所述保护层30上形成彩色光阻层40,所述彩色光阻层40包括不同颜色的第一色阻层41、第二色阻层42及第三色阻层43,所述第一色阻层41包括并列的第一像素单元411、第一主衬垫单元412及第一辅助衬垫单元413,所述第二色阻层42包括并列的第二像素单元421、第二主衬垫单元422及第二辅助衬垫单元423,其中,所述第一像素单元411、第二像素单元421并列排布于保护层30上,所述第一主衬垫单元412和第二主衬垫单元422堆叠于保护层30上并共同构成主衬垫部45,所述第一辅助衬垫单元413和第二辅助衬垫单元423堆叠于保护层30上并共同构成辅助衬垫部46,通过半曝光工艺制作所述第一色阻层41,经一次曝光得到厚度不同的第一主衬垫单元412和第一辅助衬垫单元413,使得所述第一辅助衬垫单元413自身的厚度小于同层的所述第一主衬垫单元412自身的厚度,从而使得所述主衬垫部45在衬底基板10上的高度大于所述辅助衬垫部46在衬底基板10上的高度。
具体地,所述第三色阻层43包括与所述第一像素单元411和第二像素单元421并列排布于保护层30上的第三像素单元431。
具体地,所述第一色阻层41、第二色阻层42及第三色阻层43分别为红色色阻层、绿色色阻层及蓝色色阻层中的一种。
具体地,所述步骤S2中,采用半透式掩膜板(Half Tone Mask,HTM)或灰色调掩膜板(Gray Tone Mask,GTM)进行半曝光工艺制作所述第一色阻层41,从而经一次曝光得到厚度不同的第一主衬垫单元412和第一辅助衬垫单元413。
具体地,所述步骤S2中,所述第一色阻层41形成在第二色阻层42之后,所述第一主衬垫单元412对应位于第二主衬垫单元422之上,所述第一辅助衬垫单元413对应位于第二辅助衬垫单元423之上;或者,
所述第一色阻层41形成在第二色阻层42之前,所述第二主衬垫单元422对应位于第一主衬垫单元412之上,所述第二辅助衬垫单元423对应位于第一辅助衬垫单元413之上。
步骤S3、如图5所示,在所述保护层30上形成覆盖所述彩色光阻层40的有机绝缘层50,在所述有机绝缘层50上涂布BPS材料,并对所述BPS材料进行曝光、显影,得到BPS遮光层60,所述BPS遮光层60包括黑色矩阵61、以及设于所述黑色矩阵61上的主隔垫物62与辅助隔垫物63,所述主隔垫物62和辅助隔垫物63分别对应位于所述主衬垫部45和辅助衬垫部46的上方,所述主隔垫物62的高度大于所述副隔垫物63的高度,所述副隔垫物63的高度大于所述黑色矩阵61的高度。
具体地,所述黑色矩阵61对应设于所述扫描线21上方。
具体地,所述步骤S3中,利用全透式(Full tone)设计的掩膜板采用全曝光方式对所述BPS材料进行曝光而得到黑色矩阵61、主隔垫物62与辅助隔垫物63,因此,所述主隔垫物62的厚度与辅助隔垫物63的厚度均相同,使所述第一主衬垫单元412和第一辅助衬垫单元413之间的厚度差构成所述主衬垫部45和辅助衬垫部46之间的高度差。
本发明的BPS型阵列基板的制作方法,利用第一色阻层41和第二色阻层42形成的双层色阻结构分别用于垫高主隔垫物62和辅助隔垫物63的主衬垫部45和辅助衬垫部46,使得所述主衬垫部45和辅助衬垫部46凸起明显,从而使得主隔垫物62和辅助隔垫物63自身的厚度减小,进而可以减少形成主隔垫物62和辅助隔垫物63的BPS材料用量,降低生产成本,通过半曝光工艺减薄辅助衬垫部63下方第一色阻层41的厚度即可实现所述主隔垫物62和辅助隔垫物63之间的高度差,制作方法简单。
请参阅图6-7,基于上述的BPS型阵列基板的制作方法,本发明还提供一种BPS型阵列基板,包括衬底基板10、设于所述衬底基板10上的TFT层20、覆盖所述衬底基板10及TFT层20的保护层30、设于所述保护层30上的彩色光阻层40、覆盖于所述彩色光阻层40和保护层30上的有机绝缘层50及设于所述有机绝缘层50上的BPS遮光层60;
所述BPS遮光层60包括黑色矩阵61及设于所述黑色矩阵61上的主隔垫物62与辅助隔垫物63;
所述彩色光阻层40包括不同颜色的第一色阻层41和第二色阻层42,所述第一色阻层41包括并列的第一像素单元411、第一主衬垫单元412及第一辅助衬垫单元413,所述第二色阻层42包括并列的第二像素单元421、第二主衬垫单元422及第二辅助衬垫单元423,其中,所述第一像素单元411、第二像素单元421并列排布于保护层30上,所述第一主衬垫单元412和第二主衬垫单元422堆叠于保护层30上并共同构成主衬垫部45,所述第一辅助衬垫单元413和第二辅助衬垫单元423堆叠于保护层30上并共同构成辅助衬垫部46,所述第一辅助衬垫单元413的厚度小于同层的所述第一主衬垫单元412的厚度,所述主衬垫部45的高度大于所述辅助衬垫部46的高度;
所述主隔垫物62和辅助隔垫物63分别对应位于所述主衬垫部45和辅助衬垫部46的上方,所述主隔垫物62的高度大于所述副隔垫物63的高度,所述副隔垫物63的高度大于所述黑色矩阵61的高度。
具体地,所述第一主衬垫单元412和第一辅助衬垫单元413之间的厚度差构成所述主衬垫部45和辅助衬垫部46之间的高度差。
具体地,所述第一主衬垫单元412对应位于第二主衬垫单元422之上,所述第一辅助衬垫单元413对应位于第二辅助衬垫单元423之上;或者,
所述第二主衬垫单元422对应位于第一主衬垫单元412之上,所述第二辅助衬垫单元423对应位于第一辅助衬垫单元413之上。
具体地,所述彩色光阻层40还包括第三色阻层43;所述第三色阻层43包括与所述第一像素单元411和第二像素单元421并列排布于保护层30上的第三像素单元431。
具体地,所述第一色阻层41、第二色阻层42及第三色阻层43分别为红色色阻层、绿色色阻层及蓝色色阻层中的一种。
具体地,所述的TFT层20包括扫描线21及与所述扫描线21垂直交叉且绝缘的数据线22。
具体地,所述黑色矩阵61对应设于所述扫描线21上方。
本发明的BPS型阵列基板,分别用于垫高主隔垫物62和辅助隔垫物63的主衬垫部45和辅助衬垫部46均是利用第一色阻层41和第二色阻层42所形成的双层色阻结构,使得所述主衬垫部45和辅助衬垫部46凸起明显,从而使得主隔垫物62和辅助隔垫物63自身的厚度减小,进而可以减少形成主隔垫物62和辅助隔垫物63的BPS材料用量,降低生产成本。
综上所述,本发明提供的一种BPS型阵列基板的制作方法,利用第一色阻层和第二色阻层形成的双层色阻结构分别用于垫高主隔垫物和辅助隔垫物的主衬垫部和辅助衬垫部,使得所述主衬垫部和辅助衬垫部凸起明显,从而使得主隔垫物和辅助隔垫物自身的厚度减小,进而可以减少形成主隔垫物和辅助隔垫物的BPS材料用量,降低生产成本,通过半曝光工艺减薄辅助衬垫部下方第一色阻层的厚度即可实现所述主隔垫物和辅助隔垫物之间的高度差,制作方法简单。本发明的BPS型阵列基板,分别用于垫高主隔垫物和辅助隔垫物的主衬垫部和辅助衬垫部均是利用第一色阻层和第二色阻层所形成的双层色阻结构,使得所述主衬垫部和辅助衬垫部凸起明显,从而使得主隔垫物和辅助隔垫物自身的厚度减小,进而可以减少形成主隔垫物和辅助隔垫物的BPS材料用量,降低生产成本。
以上所述,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明权利要求的保护范围。
Claims (10)
1.一种BPS型阵列基板的制作方法,其特征在于,包括如下步骤:
步骤S1、提供一衬底基板(10),在衬底基板(10)上形成TFT层(20),在所述衬底基板(10)上形成覆盖TFT层(20)的保护层(30);
步骤S2、在所述保护层(30)上形成彩色光阻层(40),所述彩色光阻层(40)包括不同颜色的第一色阻层(41)和第二色阻层(42),所述第一色阻层(41)包括并列的第一像素单元(411)、第一主衬垫单元(412)及第一辅助衬垫单元(413),所述第二色阻层(42)包括并列的第二像素单元(421)、第二主衬垫单元(422)及第二辅助衬垫单元(423),其中,所述第一像素单元(411)、第二像素单元(421)并列排布于保护层(30)上,所述第一主衬垫单元(412)和第二主衬垫单元(422)堆叠于保护层(30)上并共同构成主衬垫部(45),所述第一辅助衬垫单元(413)和第二辅助衬垫单元(423)堆叠于保护层(30)上并共同构成辅助衬垫部(46),通过半曝光工艺制作所述第一色阻层(41),经一次曝光得到厚度不同的第一主衬垫单元(412)和第一辅助衬垫单元(413),使得所述第一辅助衬垫单元(413)的厚度小于所述第一主衬垫单元(412)的厚度,从而使得所述主衬垫部(45)的高度大于所述辅助衬垫部(46)的高度;
步骤S3、在所述保护层(30)上形成覆盖所述彩色光阻层(40)的有机绝缘层(50),在所述有机绝缘层(50)上涂布BPS材料,并对所述BPS材料进行曝光、显影,得到BPS遮光层(60),所述BPS遮光层(60)包括黑色矩阵(61)、以及设于所述黑色矩阵(61)上的主隔垫物(62)与辅助隔垫物(63),所述主隔垫物(62)和辅助隔垫物(63)分别对应位于所述主衬垫部(45)和辅助衬垫部(46)的上方,所述主隔垫物(62)的高度大于所述副隔垫物(63)的高度,所述副隔垫物(63)的高度大于所述黑色矩阵(61)的高度。
2.如权利要求1所述的BPS型阵列基板的制作方法,其特征在于,所述步骤S2中,采用半透式掩膜板或灰色调掩膜板进行半曝光工艺制作所述第一色阻层(41),从而经一次曝光得到厚度不同的第一主衬垫单元(412)和第一辅助衬垫单元(413);
所述步骤S3中,采用全曝光方式对所述BPS材料进行曝光,得到黑色矩阵(61)、主隔垫物(62)与辅助隔垫物(63),所述第一主衬垫单元(412)和第一辅助衬垫单元(413)之间的厚度差构成所述主衬垫部(45)和辅助衬垫部(46)之间的高度差。
3.如权利要求1所述的BPS型阵列基板的制作方法,其特征在于,所述步骤S2中,所述第一主衬垫单元(412)对应位于第二主衬垫单元(422)之上,所述第一辅助衬垫单元(413)对应位于第二辅助衬垫单元(423)之上;或者,
所述第二主衬垫单元(422)对应位于第一主衬垫单元(412)之上,所述第二辅助衬垫单元(423)对应位于第一辅助衬垫单元(413)之上。
4.如权利要求1所述的BPS型阵列基板的制作方法,其特征在于,所述步骤S2中,所述彩色光阻层(40)还包括第三色阻层(43);
所述第三色阻层(43)包括与所述第一像素单元(411)和第二像素单元(421)并列排布于保护层(30)上的第三像素单元(431);
所述第一色阻层(41)、第二色阻层(42)及第三色阻层(43)分别为红色色阻层、绿色色阻层及蓝色色阻层中的一种。
5.如权利要求1所述的BPS型阵列基板的制作方法,其特征在于,所述步骤1中,所述的TFT层(20)包括扫描线(21)及与所述扫描线(21)垂直交叉且绝缘的数据线(22);
所述黑色矩阵(61)对应设于所述扫描线(21)上方。
6.一种BPS型阵列基板,其特征在于,包括衬底基板(10)、设于所述衬底基板(10)上的TFT层(20)、覆盖所述衬底基板(10)及TFT层(20)的保护层(30)、设于所述保护层(30)上的彩色光阻层(40)、覆盖于所述彩色光阻层(40)和保护层(30)上的有机绝缘层(50)及设于所述有机绝缘层(50)上的BPS遮光层(60);
所述BPS遮光层(60)包括黑色矩阵(61)及设于所述黑色矩阵(61)上的主隔垫物(62)与辅助隔垫物(63);
所述彩色光阻层(40)包括不同颜色的第一色阻层(41)和第二色阻层(42),所述第一色阻层(41)包括并列的第一像素单元(411)、第一主衬垫单元(412)及第一辅助衬垫单元(413),所述第二色阻层(42)包括并列的第二像素单元(421)、第二主衬垫单元(422)及第二辅助衬垫单元(423),其中,所述第一像素单元(411)、第二像素单元(421)并列排布于保护层(30)上,所述第一主衬垫单元(412)和第二主衬垫单元(422)堆叠于保护层(30)上并共同构成主衬垫部(45),所述第一辅助衬垫单元(413)和第二辅助衬垫单元(423)堆叠于保护层(30)上并共同构成辅助衬垫部(46),所述第一辅助衬垫单元(413)的厚度小于所述第一主衬垫单元(412)的厚度,所述主衬垫部(45)的高度大于所述辅助衬垫部(46)的高度;
所述主隔垫物(62)和辅助隔垫物(63)分别对应位于所述主衬垫部(45)和辅助衬垫部(46)的上方,所述主隔垫物(62)的高度大于所述副隔垫物(63)的高度,所述副隔垫物(63)的高度大于所述黑色矩阵(61)的高度。
7.如权利要求6所述的BPS型阵列基板,其特征在于,所述第一主衬垫单元(412)和第一辅助衬垫单元(413)之间的厚度差构成所述主衬垫部(45)和辅助衬垫部(46)之间的高度差。
8.如权利要求6所述的BPS型阵列基板,其特征在于,所述第一主衬垫单元(412)对应位于第二主衬垫单元(422)之上,所述第一辅助衬垫单元(413)对应位于第二辅助衬垫单元(423)之上;或者,
所述第二主衬垫单元(422)对应位于第一主衬垫单元(412)之上,所述第二辅助衬垫单元(423)对应位于第一辅助衬垫单元(413)之上。
9.如权利要求6所述的BPS型阵列基板,其特征在于,所述彩色光阻层(40)还包括第三色阻层(43);
所述第三色阻层(43)包括与所述第一像素单元(411)和第二像素单元(421)并列排布于保护层(30)上的第三像素单元(431);
所述第一色阻层(41)、第二色阻层(42)及第三色阻层(43)分别为红色色阻层、绿色色阻层及蓝色色阻层中的一种。
10.如权利要求6所述的BPS型阵列基板,其特征在于,所述的TFT层(20)包括扫描线(21)及与所述扫描线(21)垂直交叉且绝缘的数据线(22);
所述黑色矩阵(61)对应设于所述扫描线(21)上方。
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