CN108524315A - A kind of novel anti-pollution moisturizing skin makeup liquid and preparation method thereof - Google Patents
A kind of novel anti-pollution moisturizing skin makeup liquid and preparation method thereof Download PDFInfo
- Publication number
- CN108524315A CN108524315A CN201810698864.3A CN201810698864A CN108524315A CN 108524315 A CN108524315 A CN 108524315A CN 201810698864 A CN201810698864 A CN 201810698864A CN 108524315 A CN108524315 A CN 108524315A
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- CN
- China
- Prior art keywords
- pollution
- ammonium salt
- quaternary ammonium
- moisturizing
- novel anti
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- DTTVNCZEOYSFFF-UHFFFAOYSA-N ethoxyurea Chemical compound CCONC(N)=O DTTVNCZEOYSFFF-UHFFFAOYSA-N 0.000 claims abstract description 31
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Classifications
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- B01D2257/7027—Aromatic hydrocarbons
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Abstract
The invention discloses a kind of novel anti-pollution moisturizing skin makeup liquid and preparation method thereof, the novel anti-pollution moisturizing skin makeup liquid includes organosilicon quaternary ammonium salt, the chemical formula (C of the organosilicon quaternary ammonium salt2H5O)2SiCH3(CH2)3N+(CH3)2C18H37Cl‑.The present invention replaces fungicide, preservative in existing skin makeup liquid class product by using a kind of new organosilicon quaternary ammonium salt, and then realizes using chemical raw material as few as possible, achievees the purpose that anti-pollution moisturizing.It is known that the fungicide, preservative in cosmetics are the sources for causing the skin problems such as skin allergy, these materials are not used, reduce skin problem to a certain extent.The present invention uses glycerine as hygroscopic agent simultaneously, sorbierite is as moisturizer, ethoxy urea is as natural moisturizing factor, and then achieve the effect that triple moisturizings, moisture is absorbed from air using glycerine, the film being split into using sorbierite and organosilicon ammonium salt is slowed down moisture and volatilized outward, and cell water shortage is supplemented using ethoxy urea, is so-called triple moisturizings.
Description
Technical field
The invention belongs to skin care fields, and in particular to a kind of novel anti-pollution moisturizing skin makeup liquid and preparation method thereof.
Background technology
We saw the case where more and more hormone faces, allergic skin on the market in recent years.These are all to use
Caused by improper cosmetics.
Hormone face is to belong to Facial Corticosteroid Addictive Dermatitis, and main problem is shown as:Facial large area ponding type
Erythema, papule, blister, warts, periodicity or repeatability flush are expanded with drying, furfur, incrustation, atrophoderma pore,
There are itch, cusalgia sense.After external application glucocorticoid, can rapid relief of symptoms, but can cyclicity aggravate, cause to glucocorticoid
Dependence.After country disables steroids material, alleviates due to can not find external application glucocorticoid, still have in the market illegal
The case where addition, while also having the various so-called materials for repairing such damaged skin in the market, but cannot be preferably
Solve such skin problem.
There is erythema, papule, telangiectasis etc., skin in allergic skin when being mainly shown as skin by outside stimulus
Have shouting pain, itch, calcination, tight feeling.The skin allergy person caused by using cosmetics is being continuously increased in recent years, especially
Allergic human population.In the fabrication process, other than thickener and functional component is added, preservative, essence, breast can be also added in cosmetics
The chemical substances such as agent.These substances can become anaphylactogen.Preservative currently on the market is mostly the material in 2015 editions catalogues
Material (such as methyl esters, propyl ester, DMDMH about more than 50 are planted altogether), in the market it is so-called be not added with aseptic production approximately as:
The first be with polyalcohol, acids, esters cooperation protective system, deficiency is that smell is bad and need to be with relatively large
Polyalcohol, the superposition of polyalcohol can be caused, cause skin to generate heat and tingling sensation, or even cause allergy.
Second is the protective system mixed with a variety of essential oils, but it can not be added in aqua system, and antibacterial anti-corrosion
Ability is inadequate, with the extension of time, protective system can disintegrate.
The third is the protective system mixed with various plants extract, but plant extract is extracted by season, the place of production, processing
Differentia influence keeps anti-corrosion dosage inaccurate.
The allergy caused by the factors such as adding preservative agent in order to prevent, cosmetic industry are all being found anti-corrosion and are being sterilized most always
Good method.
In recent years, with the fast development of Chinese economy, air pollution is increasingly severe, the formation such as vehicle exhaust
PM2.5, PM2.5To the damage necessary being of human skin.PM2.5Refer in surrounding air, it is micro- that aerodynamic diameter is less than 2.5
The particulate matter of rice, its surface area is big, and activity is strong, has tiny porous structure, easily poisonous and harmful substances (such as micro- life of absorption band
Object, heavy metal etc.), PM2.5Constantly release poisonous and harmful substances, the skins such as initiation allergy, dermatitis, color spot are asked on the skin for absorption
Topic forms the damage of similar small pox class.
, there are hair in the common formaldehyde of interior decoration, when dermatitis and skin allergy that the formaldehyde of cloth textile separate out causes
It is raw.It is indoor also skin problem to be allowed to aggravate with bacterium, virus and dust mite etc. that contain in the suspended particulate brought into central air-conditioning.
Family kitchen generate oil smoke, equally can by skin adsorption generate bacterium the problems such as.Pole need are a kind of in the market can effective antifouling guarantor
Wet cosmetics.
In recent years, with the aggravation of social competition, some crowd is in the weight of heart for a long time, and weight can produce
Raw more radical damage skins.It is in the teenager of adolescence, point secret imbalance, also can grow acne on the face because in
Acne.Although it because its photostability is poor and toxic is not ideal to have some materials as polyquaternium 73 etc at present
Skincare material.A kind of safer and more effective anti-pollution moisturizing cosmetics are needed in the market.
In human skin in addition to face, people nurse and think little of to the anti-pollution moisturizing of oxter and body skin and pedal skin,
Lack effective care product in the market.We are visible as Da Kening this kind of product, but because it can allow skin to develop immunity to drugs
And it not is that very effectively, a kind of energy Reusability and safe moisturizing skin makeup product are expected in market to become.
Invention content
In order to solve the above problem of the existing technology, the present invention provides a kind of novel anti-pollution moisturizing skin makeup liquid and its
Preparation method.
Present invention uses a kind of new organosilicon quaternary ammonium salts, and band is formed in skin surface by this organosilicon quaternary ammonium salt
Have a film with surface-active of positive charge reticular structure, prevent adherency of the environmental contaminants to skin, achieve the purpose that it is antibacterial,
Slow down speed of the moisture of skin to external diffusion, has synergy to the moisture-keeping function of skin to other materials in technical solution.
The present invention is by using a kind of new organosilicon quaternary ammonium salt instead of the fungicide in existing skin makeup liquid class product, anti-corrosion
Agent, and then realize using chemical raw material as few as possible, achieve the purpose that anti-pollution moisturizing.It is known that the sterilization in cosmetics
Agent, preservative are the sources for causing the skin problems such as skin allergy, do not use these materials, reduce skin to a certain extent
Problem.The present invention uses glycerine as hygroscopic agent simultaneously, sorbierite as moisturizer, ethoxy urea as natural moisturizing factor,
And then achieve the effect that triple moisturizings (are absorbed moisture using glycerine from air, are split into using sorbierite and organosilicon ammonium salt
Film slow down moisture and volatilize outward, prevent cuticula from blocking pore using ethoxy urea, be so-called triple moisturizings).
The technical solution adopted in the present invention is:
A kind of novel anti-pollution moisturizing skin makeup liquid, including a kind of new organosilicon quaternary ammonium salt;The change of the organosilicon quaternary ammonium salt
Formula is (C2H5O)2SiCH3(CH2)3N+(CH3)2C18H37Cl-。
The organosilicon quaternary ammonium salt is by chloropropyl diethoxy silane and octadecyldimethyl tertiary amine in polarity
It is obtained within 10~50 hours in 70~220 DEG C of reactions in solvent.
The preparation method of heretofore described organosilicon quaternary ammonium salt specifically can refer to the paper of Peng Zhongli, Wu little Juan《Methyl
The synthesis of diethoxy silane quaternary ammonium salt》(fine chemistry industry, in September, 2006 the 9th phase of volume 23), i.e.,:In 50-500mL equipped with temperature
It spends in the drying three-necked flask of meter, nitrogen access tube, condensing unit, by chloropropyl diethoxy silane, octadecyl two
Methyl tertiary amine, catalyst are (1-1.5) in molar ratio:1:(0.005-0.015) is added, and adds chloropropyl diethoxy
The ethyl alcohol of 5-10 times of silane weight, reaction vessel is fixed on magnetic stirring apparatus, leads to nitrogen, and stirring is warming up to solvent boiling,
It is stirred at reflux reaction 30-50h, stops leading to nitrogen, be cooled to room temperature, the mixture of reactor is filtered and removes sodium iodide, then will
Etoh solvent is distilled off to get organosilicon quaternary ammonium salt in filtrate decompression.
For the organosilicon quaternary ammonium salt of the present invention through Guangdong Province's microorganism detection Spot detection, result is as follows:
One, various mould to various fungies such as Candida albicans to various bacteriums such as staphylococcus aureus, Escherichia coli
Bacterium has good bacteriostasis antibiosis to act on, as shown in table 1 below:
Table 1
Two, the acute oral toxicity experiment through white mouse, the toxicity of the organosilicon quaternary ammonium salt are less than salt and ascorbic poison
Property, true border is nontoxic, as shown in table 2 below:
Table 2
Three, the aqueous solution of the organosilicon quaternary ammonium salt is nonirritant to eyes and skin, as shown in table 3 below, in table, sample
Group is the organosilicon quaternary ammonium salt in the present invention, and control group is blank control group." 0 " represent it is non-stimulated, " 1 " represent have stimulation.
Table 3
Four, the organosilicon quaternary ammonium salt PARA FORMALDEHYDE PRILLS(91,95), ammonia, clearance rate are shown in Table 4.
Table 4
In conclusion this novel organosilicon quaternary ammonium salt is nontoxic, non-stimulated, Escherichia coli, golden yellow can be effectively inhibited
Color staphylococcus, Candida albicans, propionibacterium acnes, Kang Blighted chlosmas.Formaldehyde, ammonia, benzene, the TVOC in air can be removed
Deng with apparent antibacterial, removal skin nuisance anti-pollution.
Hormone face, allergic skin etc. are substantially skin contamination problems, remove pollution, and implementing moisturizing to skin can be effective
Ground nursing skin restores skin health.
The present invention realizes moisture-keeping efficacy without using preservative etc., use raw material as few as possible.The present invention is in its basic components
In at most only used four kinds of organosilicon quaternary ammonium salt, ethoxy urea, sorbierite, glycerine raw materials, and realize antifouling moisture-keeping efficacy.
We have carried out moisturizing using moisture of skin tester (Corneometer825) to the women of 10 all ages and classes
Measure of merit.The method used is:
Test philosophy:(capacitance method) is based on water and other aobvious plays of the D-value of dielectric constant opposite sex, not according to moisture content of skin
Together, the capacitance for measuring skin is different, and observation can represent skin moisture value.
Experiment condition and volunteer:Environmental condition, 22 DEG C ± 1 of temperature, humidity 50% ± 5, and monitored in real time.Aspiration
Person requires, 10 people, age 16-65 Sui, and for forearm test zone capacitance method basic value between 15-45, no serious disease, nothing are immune
Defect, no active anaphylactia, without serious skin care item allergies, nearly one month without using steroids and immunosuppressor
Person does not participate in other clinical trials person.
Other any products (cosmetics or externally applied drug) are not used within 2-3 days before preparing recipient site before test, it is tested before examination
Person need to clean in double forearms and survey, and wipe clean, while carry out area identification, while stationary seat 30 minutes, not drink water, recipient site is wanted
Exposure is in test mode.
Test procedure, left and right inner arm identify the trial zones 3cm × 3cm, and same arm can identify multiple regions, interval simultaneously
1cm tests instrument using capacitance method skin test and carries out tested region and control test, each region parallel testing 5 times, first test section
Domain blank value after smearing, tests 1h, 2h, 4h respectively then according to the dosage of 2.0mg ± 0.1mg samples/square centimeter,
Test data empirically records (note respectively:The plant resources research of Beijing Technology and Business University of this test method system is opened
Send out the method described in key lab's household chemicals scientific paper in 2010-cosmetics moisture-keeping efficacy evaluation study).
Preparation of samples:Blank sample (sample 1) plus hyaluronic acid sample (sample 2) plus organosilicon quaternary ammonium salt sample (sample 3) sample
Product preparation refers to the following table 5.Each raw material is uniformly mixed up to test sample.
Table 5
Raw material name | Sample 1 | Sample 2 | Sample 3 |
Glycerine | 0 | 3% | 3% |
Water | 100% | 87.9% | 86.5% |
Sorbierite | 0 | 4% | 4% |
Urea | 0 | 5% | 5% |
Hyaluronic acid | 0 | 0.1% | 0 |
Organosilicon quaternary ammonium salt | 0 | 0 | 1.5% |
By measuring and calculation MMV mean values, 6 are as a result see the table below.Skin background initial value is 35.6.
Table 6
As can be seen from the above table:As time increases, the sequence of moistening effect is blank sample 1<Add the sample of hyaluronic acid
Product 2<Add the sample 3 of organosilicon quaternary ammonium salt.Illustrate after organosilicon quaternary ammonium salt is added, moisture retention can be quite a lot of.By the 4th hour, added with
The sample of organosilicon quaternary ammonium salt still has 46.3 explanations, and it can also maintain the preferable comfort of skin.
Novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Sorbierite 1%
~10%, glycerine 1%~5%, ethoxy urea 0-8%, organosilicon quaternary ammonium salt 0.3-4%, other raw materials 0-5%, surplus is water
And/or flower water.
Preferably, novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Mountain
Pears alcohol 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, other raw materials 0.1-5%,
Surplus is water and/or flower water.
Other described raw materials are borneol or essential oil or camphor or essence or boric acid or moisturizing additive etc..The essential oil is to smoke
Clothing grass essential oil or tea tree ethereal oil or Rosemary Oil or Rosa Damascana.The essence is jasmine flower essence or lavender oil or rose
Rare essence.
Preferably, novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Mountain
Pears alcohol 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, borneol 0.05-0.5%,
Surplus is flower water.
Preferably, novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Mountain
Pears alcohol 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, surplus are flower water.
Preferably, novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Mountain
Pears alcohol 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, Hua Shui 6%~12%, it is remaining
Amount is water.
Preferably, novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Mountain
Pears alcohol 1%~10%, glycerine 1%~5%, boric acid 0.1-1%, organosilicon quaternary ammonium salt 0.3-4%, surplus are water.
Preferably, novel anti-pollution moisturizing skin makeup liquid of the present invention, is grouped as by the group of following weight percent content:Mountain
Pears alcohol 1%~10%, glycerine 1%~5%, ethoxy urea urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, surplus is water.
The moisturizing additive is mussel polysaccharide modifier and/or agar oligosaccharide.Preferably, the moisturizing additive is
Mussel polysaccharide modifier, agar oligosaccharide are 1 in mass ratio:(0.2-0.3) is mixed.
The preparation method of the mussel polysaccharide modifier:It is 10- that 120-140g mass fractions, which are added, in 9-11g mussel polysaccharides
It is 20-40 DEG C in temperature in 20% sodium hydrate aqueous solution and stirs 30-50min, it is 60- that 10-20g monoxones, which are added, in temperature
70 DEG C of stirring 1-4h, are cooled to room temperature, with 0.1-0.5mol/L vinegar acid for adjusting pH to 6-8, obtain reaction solution;By reaction solution 4-
The 95wt% ethyl alcohol alcohol precipitations of 5 times of volumes, are collected after centrifugation precipitation, and the precipitation water dissolution of 2-4 times of volume of Sediment weight obtains
Lysate;By the lysate 95wt% ethyl alcohol alcohol precipitations of 4-5 times of volume, precipitation is collected after centrifugation, is 40-60 DEG C of drying in temperature
15-25h to get.
The present invention also provides the preparation methods of above-mentioned novel anti-pollution moisturizing skin makeup liquid, and each raw material is stirred evenly to obtain the final product.
The present invention is by using a kind of new organosilicon quaternary ammonium salt instead of the fungicide in existing skin makeup liquid class product, anti-corrosion
Agent, and then realize using chemical raw material as few as possible, achieve the purpose that anti-pollution moisturizing.It is known that the sterilization in cosmetics
Agent, preservative are the sources for causing the skin problems such as skin allergy, do not use these materials, reduce skin to a certain extent
Problem.The present invention uses glycerine as hygroscopic agent simultaneously, and sorbierite is as moisturizer, and urea is as natural moisturizing factor, in turn
Achieve the effect that triple moisturizings (absorb moisture, the film being split into using sorbierite and organosilicon ammonium salt using glycerine from air
Slow down moisture to volatilize outward, prevent cuticula from blocking pore using urea, be so-called triple moisturizings).
Specific implementation mode
Each raw material introduction in embodiment:
Agar oligosaccharide is prepared according to method shown in preparation example in the Chinese patent application No. is 200910099054.7 1.
Mussel polysaccharide is prepared according to method shown in embodiment in the Chinese patent application No. is 201711043035.3 2.
The preparation method of heretofore described organosilicon quaternary ammonium salt specifically can refer to the paper of Peng Zhongli, Wu little Juan《Methyl
The synthesis of diethoxy silane quaternary ammonium salt》(fine chemistry industry, in September, 2006 the 9th phase of volume 23), i.e.,:Temperature is housed in 100mL
Meter, nitrogen access tube, condensing unit drying three-necked flask in, by chloropropyl diethoxy silane, hexadecyldimethylamine
Base tertiary amine, catalyst are 1.1 in molar ratio:1:0.01 is added, and adds the second of 7 times of chloropropyl diethoxy silane weight
Reaction vessel is fixed on magnetic stirring apparatus by alcohol, leads to nitrogen, is stirred for 180r/min with rotating speed, and etoh solvent boiling is warming up to
It rises, is that 180r/min is stirred at reflux reaction 40h with rotating speed, stops leading to nitrogen, be cooled to room temperature, it will be in reactor three-necked flask
Mixture, which filters, removes sodium iodide, then etoh solvent is distilled off to get organosilicon quaternary ammonium salt in filtrate decompression.
Ethoxy urea is the cosmetics-stage ethoxy urea that Guangzhou Bo Feng Chemical Industry Science Co., Ltd provides.
The food-grade sorbierite that sorbierite provides for Wuhan La Nabai medication chemistries Co., Ltd, No. CAS:50-70-4.
Tea tree ethereal oil is provided by Jishui County poly- source hall natural perfume material oil Co., Ltd.
Glycerine is the pharmaceutical grade glycerine that Zhejiang elegance and talent Chemical Co., Ltd. provides.
Embodiment one:(being suitble to spring and summer use)
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Hua Shui | 91.49 |
2 | Ethoxy urea | 3 |
3 | Sorbierite | 3 |
4 | Glycerine | 2 |
5 | Organosilicon quaternary ammonium salt | 0.5 |
6 | Borneol | 0.01 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Flower water is entered in pot, sequentially adds ethoxy urea, sorbierite stirs evenly;
S2:After borneol, glycerine, organosilicon quaternary ammonium salt are sufficiently mixed, it is added in pot, stirs evenly;S3:It checks whether
It is bright, and its pH value is detected by national standard inspection, it takes the dish out of the pot after up to standard.
Embodiment two:(being suitble to autumn and winter use)
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Hua Shui | 85 |
2 | Ethoxy urea | 5 |
3 | Sorbierite | 4 |
4 | Glycerine | 3 |
5 | Organosilicon quaternary ammonium salt | 2.5 |
6 | Trimethylglycine | 0.5 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Flower water is entered in pot, ethoxy urea, sorbierite, glycerine is sequentially added and stirs evenly;S2:Organosilicon season is added
Ammonium salt stirs evenly;
S3:It checks whether transparent, and checks its pH value by national standard, take the dish out of the pot after up to standard.
Embodiment three:(being suitble to oxter and body skin)
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Water | 80 or 89.9 |
2 | Flower water or essence | 10 or 0.1 |
3 | Ethoxy urea | 3 |
4 | Sorbierite | 3 |
5 | Glycerine | 2 |
6 | Organosilicon quaternary ammonium salt | 2 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Jiang Shui and Hua Shui enter in pot, sequentially add ethoxy urea urea, sorbierite, glycerine and stir evenly;
S2:Essence addition organosilicon quaternary ammonium salt is stirred evenly, is added in pot;
S3:It checks whether transparent, and checks its pH value by national standard, take the dish out of the pot after up to standard.
Example IV:(being suitble to reproduction and its periphery)
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Water | 90.99 |
2 | Boric acid | 0.5 |
3 | Sorbierite | 3 |
4 | Glycerine | 2 |
5 | Organosilicon quaternary ammonium salt | 3.5 |
6 | Essential oil | 0.01 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Water is entered in pot, sequentially adds sorbierite, glycerine stirs evenly;
S2:Addition stirs evenly essential oil and organosilicon quaternary ammonium salt, is added in pot;
S3:It checks whether transparent, addition boric acid, simultaneously will be transferred to 5.5 by pH value, and take the dish out of the pot after up to standard.
Embodiment five:(being suitble to foodcare-winter special)
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Water | 82.39 |
2 | Ethoxy urea | 8 |
3 | Sorbierite | 3 |
4 | Glycerine | 2 |
5 | Organosilicon quaternary ammonium salt | 4 |
6 | Boric acid | 0.6 |
7 | Tea tree ethereal oil | 0.01 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Water is entered in pot, ethoxy urea, sorbierite, glycerine is sequentially added and stirs evenly;
S2:Tea tree ethereal oil addition organosilicon quaternary ammonium salt is stirred evenly, is added in pot and stirs evenly again;
S3:It checks whether transparent, and checks its pH value by national standard, take the dish out of the pot after up to standard.
Novel anti-pollution moisturizing skin makeup liquid prepared by embodiment one and embodiment two was dispatched to super at 2016 and 2017
It is on probation to cross 100 people, face has acne that cannot fully recover for a long time a bit for they, has hormone face, has allergy skin quality, have
Apparent effect.Novel anti-pollution moisturizing skin makeup liquid prepared by embodiment three was summer in 2017, extensively to the emerging hair in Baiyun District, Guangzhou City
Sanitation worker near is on probation, and reflection has the positive effect for removing peculiar smell.Novel anti-pollution moisturizing skin makeup liquid prepared by example IV
Reproduction was distributed in 2017 has the women of peculiar smell to use, and indicates to use rear off-flavor elimination.Embodiment five is prepared novel
Anti-pollution moisturizing skin makeup liquid year given from 2016 to 2017 foot disturb itch, peel, the crowd of foot odour it is on probation, indicate that symptom disappears
It loses, is obviously improved using foot's skin after a week.
Embodiment six:
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Deionized water | 86.74 |
2 | Ethoxy urea | 2 |
3 | Sorbierite | 3 |
4 | Glycerine | 4 |
5 | Organosilicon quaternary ammonium salt | 3 |
6 | Moisturizing additive | 1.25 |
7 | Tea tree ethereal oil | 0.01 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Deionized water is entered in pot, ethoxy urea, sorbierite, glycerine is sequentially added and is stirred for 300r/min with rotating speed
15min is uniform;
S2:It is that 500r/min stirrings 20min is uniform that organosilicon quaternary ammonium salt, tea tree ethereal oil, moisturizing additive, which is added, with rotating speed,
Up to anti-pollution moisturizing skin makeup liquid.
The moisturizing additive is mussel polysaccharide modifier.
The preparation method of the mussel polysaccharide modifier:The hydrogen that 130g mass fractions are 16% is added in 10g mussel polysaccharides
In aqueous solution of sodium oxide temperature be 35 DEG C with rotating speed be 300r/min stir 40min, be added 15g monoxones temperature be 65 DEG C
It is that 300r/min stirs 3h with rotating speed, is cooled to room temperature, with 0.2mol/L vinegar acid for adjusting pH to 7, obtains reaction solution;By reaction solution
It is to collect precipitation after 6000r/min centrifuges 30min with rotating speed with the 95wt% ethyl alcohol alcohol precipitations of 5 times of volumes, it will precipitation precipitation weight
The deionized water dissolving for measuring 3 times of volumes, obtains lysate;By the lysate 95wt% ethyl alcohol alcohol precipitations of 5 times of volumes, it is with rotating speed
6000r/min centrifuge 30min after collect precipitation, temperature be 50 DEG C of dry 20h to get mussel polysaccharide modifier.
Embodiment seven:
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Deionized water is entered in pot, ethoxy urea, sorbierite, glycerine is sequentially added and is stirred for 300r/min with rotating speed
15min is uniform;
S2:It is that 500r/min stirrings 20min is uniform that organosilicon quaternary ammonium salt, tea tree ethereal oil, moisturizing additive, which is added, with rotating speed,
Up to anti-pollution moisturizing skin makeup liquid.
The moisturizing additive is mussel polysaccharide.
Embodiment eight:
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Deionized water | 86.74 |
2 | Ethoxy urea | 2 |
3 | Sorbierite | 3 |
4 | Glycerine | 4 |
5 | Organosilicon quaternary ammonium salt | 3 |
6 | Moisturizing additive | 1.25 |
7 | Tea tree ethereal oil | 0.01 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Deionized water is entered in pot, ethoxy urea, sorbierite, glycerine is sequentially added and is stirred for 300r/min with rotating speed
15min is uniform;
S2:It is that 500r/min stirrings 20min is uniform that organosilicon quaternary ammonium salt, tea tree ethereal oil, moisturizing additive, which is added, with rotating speed,
Up to anti-pollution moisturizing skin makeup liquid.
The moisturizing additive is agar oligosaccharide.
Embodiment nine:
The novel anti-pollution moisturizing skin makeup formula of liquid of the present embodiment is as follows:
Serial number | Material name | Dosage (%) |
1 | Deionized water | 86.74 |
2 | Ethoxy urea | 2 |
3 | Sorbierite | 3 |
4 | Glycerine | 4 |
5 | Organosilicon quaternary ammonium salt | 3 |
6 | Moisturizing additive | 1.25 |
7 | Tea tree ethereal oil | 0.01 |
The preparation method of the novel anti-pollution moisturizing skin makeup liquid of the present embodiment, includes the following steps:
S1:Deionized water is entered in pot, sequentially adds after ethoxy urea stirs evenly emulsification to enter in pot, sorbierite, glycerine are to turn
Speed is that 300r/min stirrings 15min is uniform;
S2:It is that 500r/min stirrings 20min is uniform that organosilicon quaternary ammonium salt, tea tree ethereal oil, moisturizing additive, which is added, with rotating speed,
Up to anti-pollution moisturizing skin makeup liquid.
The moisturizing additive is that mussel polysaccharide modifier, agar oligosaccharide are 1 in mass ratio:0.25 mixes.
The preparation method of the mussel polysaccharide modifier:The hydrogen that 130g mass fractions are 16% is added in 10g mussel polysaccharides
In aqueous solution of sodium oxide temperature be 35 DEG C with rotating speed be 300r/min stir 40min, be added 15g monoxones temperature be 65 DEG C
It is that 300r/min stirs 3h with rotating speed, is cooled to room temperature, with 0.2mol/L vinegar acid for adjusting pH to 7, obtains reaction solution;By reaction solution
It is to collect precipitation after 6000r/min centrifuges 30min with rotating speed with the 95wt% ethyl alcohol alcohol precipitations of 5 times of volumes, it will precipitation precipitation weight
The deionized water dissolving for measuring 3 times of volumes, obtains lysate;By the lysate 95wt% ethyl alcohol alcohol precipitations of 5 times of volumes, it is with rotating speed
6000r/min centrifuge 30min after collect precipitation, temperature be 50 DEG C of dry 20h to get mussel polysaccharide modifier.
Test case one
The performance of keeping humidity for the anti-pollution moisturizing skin makeup liquid that embodiment six to embodiment nine is prepared is tested.
Performance of keeping humidity is tested:It is tested using keratoderma hydration rate, instrument used is Corneometer CM825,
By measuring the variation of water content of stratum corneum is weighed using the variation of keratoderma capacitance before and after product, to evaluate
Moisture-keeping efficacy.Test method:120 female subjects are randomly divided into 4 groups, every group 30, the age:25-35 Sui 10,35-
45 years old 10,45-55 Sui 10, subject or so forearm bend side mark 3 × 3cm2The square Experimental Area of size, with a left side
Test zone of the arm as anti-pollution moisturizing skin makeup liquid, uniform smearing anti-pollution moisturizing skin makeup liquid 0.1g every square centimeter, right arm are corresponding
Symmetrical region be blank control, smear anti-pollution moisturizing skin makeup liquid 8 with Corneometer CM825 test detection after 1 hour
The moisture of experiment position, is repeated 5 times, obtains average value, calculated hydration rate respectively after hour.Hydration rate (%)=(test
Value-blank value)/blank value × 100.
Specific test result is shown in Table 7.Each group comparison result shows that P < 0.05, difference have statistical significance.
Table 7:Performance of keeping humidity test result table
Hydration rate, % | |
Embodiment six | 75 |
Embodiment seven | 71 |
Embodiment eight | 73 |
Embodiment nine | 81 |
Test case two
The removing free radical performance for the anti-pollution moisturizing skin makeup liquid that embodiment six to embodiment nine is prepared is tested.
The measurement of Green Tea Extract, using DPPH methods:
DPPH accurately is weighed, is configured to the solution of 0.2mmol/L DPPH, Cord blood is protected from light in brown bottle.Use deionization
Anti-pollution moisturizing skin makeup liquid sample is diluted to 1.0mg/mL by water, obtains sample liquid.Take 2mL sample liquids in test tube, be added 2mL,
0.2mmol/L DPPH solution is uniformly mixed, and is protected from light at room temperature after standing 30min, with ultraviolet specrophotometer UV-2000 (You Ni
Ke (Shanghai) limited instrument company) absorbance value at 517nm is measured, it is calculated as Ai, while measuring 2mL sample liquids and adding the anhydrous second of 2mL
Alcohol is protected from light at room temperature after standing 30min, is surveyed with ultraviolet specrophotometer UV-2000 (You Nike (Shanghai) limited instrument company)
Be scheduled on absorbance value at 517nm, be calculated as Aj and 2mL, 0.2mmol/L DPPH solution add 2ml distilled water stand, with ultraviolet point
Light photometer UV-2000 (You Nike (Shanghai) limited instrument company) measures the absorbance value at 517nm, is calculated as Ac.Sample pair
The clearance rate of DPPH free radicals is calculated as follows:DPPH free radical scavenging activities=[1- (Ai-Aj)/Ac] × 100%.
It removes free radical the performance test results and is shown in Table 8.
Table 8:Remove free radical the performance test results table
Claims (10)
1. a kind of novel anti-pollution moisturizing skin makeup liquid, which is characterized in that including organosilicon quaternary ammonium salt, the change of the organosilicon quaternary ammonium salt
Formula is
(C2H5O)2SiCH3(CH2)3N+(CH3)2C18H37Cl-。
2. novel anti-pollution moisturizing skin makeup liquid as described in claim 1, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, ethoxy urea 0-8%, organosilicon quaternary ammonium salt 0.3-4%, other raw materials
0-5%, surplus are water and/or flower water;Other described raw materials are borneol or essential oil or camphor or essence or boric acid or moisturizing addition
Agent etc..
3. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, other raw materials
0.1-5%, surplus are water and/or flower water;Other described raw materials are that borneol or essential oil or camphor or essence or boric acid or moisturizing add
Add agent etc..
4. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, borneol 0.05-
0.5%, surplus is flower water.
5. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, surplus are flower
Water.
6. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, Hua Shui 6%~
12%, surplus is water.
7. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, boric acid 0.1-1%, organosilicon quaternary ammonium salt 0.3-4%, surplus are water.
8. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that by the component of following weight percent content
Composition:Sorbierite 1%~10%, glycerine 1%~5%, ethoxy urea 1-8%, organosilicon quaternary ammonium salt 0.3-4%, surplus is water.
9. novel anti-pollution moisturizing skin makeup liquid as claimed in claim 2, which is characterized in that the moisturizing additive changes for mussel polysaccharide
Property object and/or agar oligosaccharide;
The preparation method of the mussel polysaccharide modifier:It is 10-20% that 120-140g mass fractions, which are added, in 9-11g mussel polysaccharides
Sodium hydrate aqueous solution in temperature be 20-40 DEG C stirring 30-50min, be added 10-20g monoxones temperature be 60-70 DEG C
1-4h is stirred, is cooled to room temperature, with 0.1-0.5mol/L vinegar acid for adjusting pH to 6-8, obtains reaction solution;By reaction solution with 4-5 times
The 95wt% ethyl alcohol alcohol precipitations of volume, are collected after centrifugation precipitation, and the precipitation water dissolution of 2-4 times of volume of Sediment weight obtains molten
Solve liquid;By the lysate 95wt% ethyl alcohol alcohol precipitations of 4-5 times of volume, precipitation is collected after centrifugation, is 40-60 DEG C of drying in temperature
15-25h to get.
10. the preparation method of novel anti-pollution moisturizing skin makeup liquid as described in any one of claim 1-9, which is characterized in that will be each
Raw material stirs evenly to obtain the final product.
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