CN108385066B - 一种无氢金属掺杂类金刚石涂层制备方法及其制品 - Google Patents
一种无氢金属掺杂类金刚石涂层制备方法及其制品 Download PDFInfo
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- CN108385066B CN108385066B CN201810160012.9A CN201810160012A CN108385066B CN 108385066 B CN108385066 B CN 108385066B CN 201810160012 A CN201810160012 A CN 201810160012A CN 108385066 B CN108385066 B CN 108385066B
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- metal
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- arc
- diamond
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 91
- 239000002184 metal Substances 0.000 title claims abstract description 89
- 239000011248 coating agent Substances 0.000 title claims abstract description 77
- 238000000576 coating method Methods 0.000 title claims abstract description 77
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 111
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 51
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 49
- 239000010439 graphite Substances 0.000 claims abstract description 49
- 239000002245 particle Substances 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 41
- 230000008569 process Effects 0.000 claims abstract description 35
- 238000001914 filtration Methods 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 238000005516 engineering process Methods 0.000 claims abstract description 9
- 238000007740 vapor deposition Methods 0.000 claims abstract description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 28
- 238000000151 deposition Methods 0.000 claims description 24
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- 238000007733 ion plating Methods 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 230000009471 action Effects 0.000 claims description 11
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 8
- 238000005137 deposition process Methods 0.000 claims description 7
- 230000007246 mechanism Effects 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 230000005672 electromagnetic field Effects 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 239000002131 composite material Substances 0.000 abstract description 15
- 230000008021 deposition Effects 0.000 abstract description 15
- 239000000725 suspension Substances 0.000 abstract description 9
- 238000007599 discharging Methods 0.000 abstract description 5
- 238000000678 plasma activation Methods 0.000 abstract description 4
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 27
- 125000004429 atom Chemical group 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 5
- 229910021645 metal ion Inorganic materials 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- -1 and in addition Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000007737 ion beam deposition Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 229910000997 High-speed steel Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000001994 activation Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000004050 hot filament vapor deposition Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
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CN201810160012.9A CN108385066B (zh) | 2018-02-26 | 2018-02-26 | 一种无氢金属掺杂类金刚石涂层制备方法及其制品 |
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CN201810160012.9A CN108385066B (zh) | 2018-02-26 | 2018-02-26 | 一种无氢金属掺杂类金刚石涂层制备方法及其制品 |
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CN108385066A CN108385066A (zh) | 2018-08-10 |
CN108385066B true CN108385066B (zh) | 2020-05-12 |
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Families Citing this family (6)
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CN109576652B (zh) * | 2018-12-20 | 2024-04-30 | 江苏徐工工程机械研究院有限公司 | 一种电弧离子镀膜装置 |
CN110205589B (zh) * | 2019-07-12 | 2023-12-08 | 江苏徐工工程机械研究院有限公司 | 一种脉冲碳离子激发源装置 |
CN110257797A (zh) * | 2019-07-22 | 2019-09-20 | 上海妙壳新材料科技有限公司 | 一种热阳极法生产高性能类金刚石的装置及其使用方法 |
CN112063975B (zh) * | 2020-07-28 | 2022-08-12 | 温州职业技术学院 | 一种通过调制强流脉冲电弧制备ta-C涂层的方法 |
CN112497483A (zh) * | 2020-11-30 | 2021-03-16 | 江苏利宇剃须刀有限公司 | 一种镀有金刚石膜的陶瓷剃须刀的制备工艺 |
CN115961243A (zh) * | 2022-12-29 | 2023-04-14 | 集美大学 | 一种高致密度的Ta-C涂层的制备方法 |
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CN101787512A (zh) * | 2009-12-31 | 2010-07-28 | 中国地质大学(北京) | 一种多元金属元素掺杂类金刚石膜的制备方法 |
CN102936718B (zh) * | 2012-11-08 | 2014-07-09 | 温州职业技术学院 | 一种多结构耦合磁场适应型旋转弧离子镀装置 |
CN102965618A (zh) * | 2012-12-07 | 2013-03-13 | 中国地质大学(北京) | 一种金属掺杂无氢类金刚石碳膜的制备方法 |
KR20160009785A (ko) * | 2014-07-16 | 2016-01-27 | 한국광기술원 | 자장여과 아크 플라즈마를 이용한 dlc 코팅 장치 |
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- 2018-02-26 CN CN201810160012.9A patent/CN108385066B/zh active Active
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Application publication date: 20180810 Assignee: Hebei macro target Technology Co.,Ltd. Assignor: WENZHOU VOCATIONAL & TECHNICAL College Contract record no.: X2020330000059 Denomination of invention: A preparation method of hydrogen free metal doped diamond-like carbon coating and its products Granted publication date: 20200512 License type: Exclusive License Record date: 20200819 |
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Effective date of registration: 20220815 Address after: Building 10-11 West Taishan Avenue, Luotang Village, Taishan Street, Haiyan County, Jiaxing City, Zhejiang Province 314300 Patentee after: Jiaxing aitico nanotechnology Co.,Ltd. Address before: 325000 incubator of Wenzhou National University Science Park, 38 Dongfang South Road, Ouhai District, Wenzhou City, Zhejiang Province Patentee before: WENZHOU VOCATIONAL & TECHNICAL College |
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