CN108369299B - 抛光光学表面的方法和光学元件 - Google Patents

抛光光学表面的方法和光学元件 Download PDF

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Publication number
CN108369299B
CN108369299B CN201680070686.9A CN201680070686A CN108369299B CN 108369299 B CN108369299 B CN 108369299B CN 201680070686 A CN201680070686 A CN 201680070686A CN 108369299 B CN108369299 B CN 108369299B
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China
Prior art keywords
polishing
optical surface
geometry
region
optical
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CN201680070686.9A
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English (en)
Chinese (zh)
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CN108369299A (zh
Inventor
J.霍夫曼
R.菲克特尔
F-J.斯蒂克尔
M.马特纳
M.赛特纳
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/02—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor by means of tools with abrading surfaces corresponding in shape with the lenses to be made
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
    • B24B31/112—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Physical Vapour Deposition (AREA)
CN201680070686.9A 2015-12-02 2016-11-16 抛光光学表面的方法和光学元件 Active CN108369299B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015223983.7 2015-12-02
DE102015223983.7A DE102015223983A1 (de) 2015-12-02 2015-12-02 Verfahren zum Polieren einer optischen Oberfläche und optisches Element
PCT/EP2016/077866 WO2017093020A1 (de) 2015-12-02 2016-11-16 Verfahren zum polieren einer optischen oberfläche und optisches element

Publications (2)

Publication Number Publication Date
CN108369299A CN108369299A (zh) 2018-08-03
CN108369299B true CN108369299B (zh) 2020-11-10

Family

ID=57348658

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680070686.9A Active CN108369299B (zh) 2015-12-02 2016-11-16 抛光光学表面的方法和光学元件

Country Status (4)

Country Link
JP (2) JP2019505829A (pt)
CN (1) CN108369299B (pt)
DE (1) DE102015223983A1 (pt)
WO (1) WO2017093020A1 (pt)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107322411B (zh) * 2017-06-09 2023-04-11 中国科学院西安光学精密机械研究所 一种大口径非球面光学元件抛光装置
DE102017216128A1 (de) * 2017-09-13 2019-03-14 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements
DE102018202570A1 (de) * 2018-02-20 2019-08-22 Carl Zeiss Smt Gmbh Verfahren zum Polieren eines Werkstücks bei der Herstellung eines optischen Elements
US11443950B2 (en) * 2019-03-01 2022-09-13 Zygo Corporation Method for figure control of optical surfaces
JP7162844B2 (ja) * 2019-03-29 2022-10-31 株式会社ロジストラボ 光学素子の製造方法
CN115319625A (zh) * 2022-08-11 2022-11-11 浙江百康光学股份有限公司 工件抛光工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7118449B1 (en) * 2004-09-20 2006-10-10 Carl Zeiss Smt Ag Method of manufacturing an optical element
CN1946543A (zh) * 2003-08-23 2007-04-11 埃西勒国际通用光学公司 采用圆坯制造镜片的方法

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Publication number Priority date Publication date Assignee Title
JPS5958415A (ja) * 1982-09-29 1984-04-04 Seiko Epson Corp 累進多焦点レンズ
JPS63221954A (ja) * 1987-03-11 1988-09-14 Matsushita Electric Ind Co Ltd 曲面研磨方法
JPH09239653A (ja) * 1996-03-06 1997-09-16 Nikon Corp 研磨装置
JP2001246539A (ja) * 2000-03-03 2001-09-11 Inst Of Physical & Chemical Res 非軸対称非球面ミラーの研削加工方法
JP2001322063A (ja) * 2000-05-18 2001-11-20 Canon Inc 光学素子の加工方法
JP3890186B2 (ja) * 2000-08-11 2007-03-07 キヤノン株式会社 研磨方法及び光学素子及び光学素子の成形用金型
JP2002346899A (ja) * 2001-03-23 2002-12-04 Ricoh Co Ltd 曲面加工法及び加工装置
JP2002370147A (ja) * 2001-06-12 2002-12-24 Canon Inc 研磨工具
JP3882764B2 (ja) * 2003-02-19 2007-02-21 セイコーエプソン株式会社 累進屈折力レンズ
DE102007013563A1 (de) * 2007-03-21 2008-09-25 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Herstellung eines Elements mit mindestens einer Freiformfläche mit hoher Formgenauigkeit und geringer Oberflächenrauhigkeit
JP5029485B2 (ja) * 2008-05-12 2012-09-19 株式会社島津製作所 非球面反射光学素子
PL2184132T3 (pl) * 2008-11-07 2013-08-30 Essilor Int Sposób i urządzenie do wytwarzania soczewki optycznej
KR101039144B1 (ko) * 2008-12-10 2011-06-07 한국표준과학연구원 입력된 데이터에 근거하여 대구경 광학렌즈로 연마하는 장치
JP5399167B2 (ja) * 2009-08-19 2014-01-29 オリンパス株式会社 研磨方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1946543A (zh) * 2003-08-23 2007-04-11 埃西勒国际通用光学公司 采用圆坯制造镜片的方法
US7118449B1 (en) * 2004-09-20 2006-10-10 Carl Zeiss Smt Ag Method of manufacturing an optical element

Also Published As

Publication number Publication date
WO2017093020A1 (de) 2017-06-08
JP2021119393A (ja) 2021-08-12
DE102015223983A1 (de) 2017-06-08
JP7053925B2 (ja) 2022-04-12
CN108369299A (zh) 2018-08-03
JP2019505829A (ja) 2019-02-28

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