CN108155181A - 叠层太阳能电池及其制造方法 - Google Patents
叠层太阳能电池及其制造方法 Download PDFInfo
- Publication number
- CN108155181A CN108155181A CN201710670180.8A CN201710670180A CN108155181A CN 108155181 A CN108155181 A CN 108155181A CN 201710670180 A CN201710670180 A CN 201710670180A CN 108155181 A CN108155181 A CN 108155181A
- Authority
- CN
- China
- Prior art keywords
- solar cell
- layer
- electrode
- perovskite
- lamination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003475 lamination Methods 0.000 title claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 title abstract description 19
- 238000002161 passivation Methods 0.000 claims abstract description 94
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 70
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 70
- 239000010703 silicon Substances 0.000 claims abstract description 70
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 44
- 230000005684 electric field Effects 0.000 claims description 20
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 13
- 239000000654 additive Substances 0.000 claims description 12
- 230000000996 additive effect Effects 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 10
- 238000010304 firing Methods 0.000 abstract description 36
- 238000000034 method Methods 0.000 abstract description 29
- 230000007547 defect Effects 0.000 abstract description 10
- 230000006866 deterioration Effects 0.000 abstract description 7
- 238000005054 agglomeration Methods 0.000 abstract description 2
- 230000002776 aggregation Effects 0.000 abstract description 2
- 238000012545 processing Methods 0.000 description 36
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 18
- 239000002003 electrode paste Substances 0.000 description 11
- 239000012535 impurity Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 239000004020 conductor Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 229910004205 SiNX Inorganic materials 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000005611 electricity Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 229910004012 SiCx Inorganic materials 0.000 description 4
- 229910020286 SiOxNy Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- JTCFNJXQEFODHE-UHFFFAOYSA-N [Ca].[Ti] Chemical compound [Ca].[Ti] JTCFNJXQEFODHE-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000002322 conducting polymer Substances 0.000 description 4
- 229920001940 conductive polymer Polymers 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 4
- 239000011572 manganese Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000010948 rhodium Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229920001167 Poly(triaryl amine) Polymers 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- -1 halide anion Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052713 technetium Inorganic materials 0.000 description 2
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 description 2
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910015845 BBr3 Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910019213 POCl3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000003854 Surface Print Methods 0.000 description 1
- 229910008559 TiSrO3 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NPNMHHNXCILFEF-UHFFFAOYSA-N [F].[Sn]=O Chemical compound [F].[Sn]=O NPNMHHNXCILFEF-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- ZEWMZYKTKNUFEF-UHFFFAOYSA-N indium;oxozinc Chemical compound [In].[Zn]=O ZEWMZYKTKNUFEF-UHFFFAOYSA-N 0.000 description 1
- HRHKULZDDYWVBE-UHFFFAOYSA-N indium;oxozinc;tin Chemical compound [In].[Sn].[Zn]=O HRHKULZDDYWVBE-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical compound [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl chloride Substances ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/078—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier including different types of potential barriers provided for in two or more of groups H01L31/062 - H01L31/075
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
- H01L25/167—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/0029—Processes of manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2004—Light-sensitive devices characterised by the electrolyte, e.g. comprising an organic electrolyte
- H01G9/2009—Solid electrolytes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0687—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0725—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/10—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
- H10K30/57—Photovoltaic [PV] devices comprising multiple junctions, e.g. tandem PV cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
- H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
- H10K39/10—Organic photovoltaic [PV] modules; Arrays of single organic PV cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/50—Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2016-0163838 | 2016-12-02 | ||
KR1020160163838 | 2016-12-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108155181A true CN108155181A (zh) | 2018-06-12 |
CN108155181B CN108155181B (zh) | 2021-03-12 |
Family
ID=59313096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710670180.8A Active CN108155181B (zh) | 2016-12-02 | 2017-08-08 | 叠层太阳能电池及其制造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11462655B2 (zh) |
EP (1) | EP3331029B1 (zh) |
JP (2) | JP2018093168A (zh) |
CN (1) | CN108155181B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109473502A (zh) * | 2018-12-19 | 2019-03-15 | 赵怡程 | 一种太阳能电池叠层结构及其制备方法 |
CN111430501A (zh) * | 2018-12-20 | 2020-07-17 | Imec 非营利协会 | 双面太阳能电池的平滑后侧掺杂层 |
WO2022037653A1 (zh) * | 2020-08-20 | 2022-02-24 | 隆基绿能科技股份有限公司 | 一种叠层电池 |
CN114447025A (zh) * | 2022-01-06 | 2022-05-06 | 青海黄河上游水电开发有限责任公司光伏产业技术分公司 | 一种叠层钙钛矿太阳能电池及其制作方法 |
CN114830365A (zh) * | 2020-11-16 | 2022-07-29 | 株式会社东芝 | 多层接合型光电变换元件及其制造方法 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN209389043U (zh) * | 2018-11-27 | 2019-09-13 | 晶澳(扬州)太阳能科技有限公司 | 晶体硅太阳能电池及光伏组件 |
CN111244210A (zh) * | 2018-11-29 | 2020-06-05 | 中国科学院大连化学物理研究所 | 一种柔性钙钛矿/微晶硅叠层太阳电池及其制造方法 |
KR20200075640A (ko) | 2018-12-18 | 2020-06-26 | 엘지전자 주식회사 | 텐덤 태양전지 |
ES2947010T3 (es) * | 2018-12-20 | 2023-07-31 | Totalenergies Onetech | Unidad de generación solar en tándem de tres terminales |
WO2020246074A1 (ja) * | 2019-06-07 | 2020-12-10 | パナソニックIpマネジメント株式会社 | 4端子タンデム太陽電池 |
CN110335946A (zh) * | 2019-06-26 | 2019-10-15 | 上海黎元新能源科技有限公司 | 一种钙钛矿太阳能电池的钙钛矿吸光层材料及太阳能电池 |
EP3764406A1 (en) | 2019-07-11 | 2021-01-13 | Oxford Photovoltaics Limited | Multi-junction photovoltaic device |
US11398355B2 (en) * | 2019-10-01 | 2022-07-26 | Seoul National University R&Db Foundation | Perovskite silicon tandem solar cell and method for manufacturing the same |
KR102574926B1 (ko) * | 2019-10-01 | 2023-09-06 | 서울대학교산학협력단 | 페로브스카이트 실리콘 탠덤 태양전지 및 이의 제조 방법 |
US20220416107A1 (en) * | 2019-12-20 | 2022-12-29 | Arizona Board Of Regents On Behalf Of Arizona State University | Bifacial tandem photovoltaic cells and modules |
JPWO2021131428A1 (zh) * | 2019-12-24 | 2021-07-01 | ||
KR102483918B1 (ko) * | 2020-08-26 | 2022-12-30 | 성균관대학교산학협력단 | 개구부를 포함하는 양면 수광형 실리콘 탠덤형 태양 전지의 제조 방법 |
CN112466962B (zh) * | 2020-11-19 | 2021-11-23 | 晶科绿能(上海)管理有限公司 | 太阳能电池 |
WO2022180250A1 (en) * | 2021-02-26 | 2022-09-01 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Perc -tandem solar cell with sacrificial layer |
CN113284967B (zh) * | 2021-07-22 | 2021-10-08 | 浙江爱旭太阳能科技有限公司 | 一种太阳能电池及其掺杂区结构、电池组件及光伏系统 |
CN113284961B (zh) * | 2021-07-22 | 2021-09-28 | 浙江爱旭太阳能科技有限公司 | 一种太阳能电池及其钝化接触结构、电池组件及光伏系统 |
DE102022201714A1 (de) | 2022-02-18 | 2023-08-24 | Singulus Technologies Aktiengesellschaft | Erzeugung texturierter Oberflächen, Herstellung von Tandemsolarzellen und Tandemsolarzelle |
CN115000188B (zh) * | 2022-05-25 | 2024-01-19 | 中国科学院电工研究所 | 一种用于晶硅异质结太阳电池迎光面的局域接触结构 |
CN117317041A (zh) * | 2023-11-29 | 2023-12-29 | 浙江晶科能源有限公司 | 太阳能电池及光伏组件 |
CN117525180B (zh) * | 2024-01-05 | 2024-03-12 | 通威太阳能(眉山)有限公司 | 太阳电池及其制备方法、光伏组件 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101118914A (zh) * | 2007-08-31 | 2008-02-06 | 李毅 | 一种太阳能电池及制造方法 |
CN101183687A (zh) * | 2006-11-17 | 2008-05-21 | 三星Sdi株式会社 | 染料敏化太阳能电池 |
JP2009212122A (ja) * | 2008-02-29 | 2009-09-17 | Toppan Printing Co Ltd | 太陽電池用裏面保護シート及びこれを用いた太陽電池 |
CN102693842A (zh) * | 2011-03-25 | 2012-09-26 | 索尼公司 | 光电转换器件、光电转换器件阵列、光电转换器件的制造方法以及电子设备 |
JP2014090020A (ja) * | 2012-10-29 | 2014-05-15 | Hitachi Chemical Co Ltd | バリア層形成用組成物、バリア層付き半導体基板、太陽電池用基板の製造方法および太陽電池素子の製造方法 |
US20150040973A1 (en) * | 2013-08-12 | 2015-02-12 | Samsung Electronics Co., Ltd. | Light transmission type two-sided solar cell |
CN104769736A (zh) * | 2012-09-18 | 2015-07-08 | 埃西斯创新有限公司 | 光电器件 |
US20160126401A1 (en) * | 2014-10-29 | 2016-05-05 | Sru Corporation | Tandem photovoltaic device |
US20160163904A1 (en) * | 2014-12-03 | 2016-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | 2-terminal metal halide semiconductor/c-silicon multijunction solar cell with tunnel junction |
CN106025087A (zh) * | 2016-07-13 | 2016-10-12 | 苏州协鑫集成科技工业应用研究院有限公司 | 叠层太阳能电池及其制备方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003124481A (ja) | 2001-10-11 | 2003-04-25 | Mitsubishi Heavy Ind Ltd | 太陽電池 |
US20090101202A1 (en) * | 2007-10-17 | 2009-04-23 | Industrial Technology Research Institute | Method of fast hydrogen passivation to solar cells made of crystalline silicon |
WO2011033826A1 (ja) * | 2009-09-18 | 2011-03-24 | 信越化学工業株式会社 | 太陽電池、その製造方法及び太陽電池モジュール |
KR20120084104A (ko) * | 2011-01-19 | 2012-07-27 | 엘지전자 주식회사 | 태양전지 |
KR20140082012A (ko) * | 2012-12-21 | 2014-07-02 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
WO2015017885A1 (en) * | 2013-08-06 | 2015-02-12 | Newsouth Innovations Pty Limited | A high efficiency stacked solar cell |
CN110061139B (zh) * | 2013-12-17 | 2023-04-18 | 牛津大学科技创新有限公司 | 包含金属卤化物钙钛矿和钝化剂的光伏装置 |
US20160035927A1 (en) * | 2014-08-01 | 2016-02-04 | International Business Machines Corporation | Tandem Kesterite-Perovskite Photovoltaic Device |
CN107636844B (zh) * | 2015-03-17 | 2021-05-28 | 欧提腾股份有限公司 | 组成物、含组成物的装置及他们的制造方法与提高电池效率的方法 |
CN106058054A (zh) | 2016-07-13 | 2016-10-26 | 苏州协鑫集成科技工业应用研究院有限公司 | 叠层太阳能电池及其制备方法 |
-
2017
- 2017-07-10 EP EP17180470.1A patent/EP3331029B1/en active Active
- 2017-08-07 JP JP2017152240A patent/JP2018093168A/ja active Pending
- 2017-08-08 CN CN201710670180.8A patent/CN108155181B/zh active Active
- 2017-08-14 US US15/676,160 patent/US11462655B2/en active Active
-
2019
- 2019-08-15 JP JP2019149055A patent/JP7005565B2/ja active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101183687A (zh) * | 2006-11-17 | 2008-05-21 | 三星Sdi株式会社 | 染料敏化太阳能电池 |
CN101118914A (zh) * | 2007-08-31 | 2008-02-06 | 李毅 | 一种太阳能电池及制造方法 |
JP2009212122A (ja) * | 2008-02-29 | 2009-09-17 | Toppan Printing Co Ltd | 太陽電池用裏面保護シート及びこれを用いた太陽電池 |
CN102693842A (zh) * | 2011-03-25 | 2012-09-26 | 索尼公司 | 光电转换器件、光电转换器件阵列、光电转换器件的制造方法以及电子设备 |
CN104769736A (zh) * | 2012-09-18 | 2015-07-08 | 埃西斯创新有限公司 | 光电器件 |
JP2014090020A (ja) * | 2012-10-29 | 2014-05-15 | Hitachi Chemical Co Ltd | バリア層形成用組成物、バリア層付き半導体基板、太陽電池用基板の製造方法および太陽電池素子の製造方法 |
US20150040973A1 (en) * | 2013-08-12 | 2015-02-12 | Samsung Electronics Co., Ltd. | Light transmission type two-sided solar cell |
US20160126401A1 (en) * | 2014-10-29 | 2016-05-05 | Sru Corporation | Tandem photovoltaic device |
US20160163904A1 (en) * | 2014-12-03 | 2016-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | 2-terminal metal halide semiconductor/c-silicon multijunction solar cell with tunnel junction |
CN106025087A (zh) * | 2016-07-13 | 2016-10-12 | 苏州协鑫集成科技工业应用研究院有限公司 | 叠层太阳能电池及其制备方法 |
Non-Patent Citations (1)
Title |
---|
RUDI SANTBERGEN: "Minimizing optical losses in monolithic", 《OPTICS EXPRESS》 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109473502A (zh) * | 2018-12-19 | 2019-03-15 | 赵怡程 | 一种太阳能电池叠层结构及其制备方法 |
CN111430501A (zh) * | 2018-12-20 | 2020-07-17 | Imec 非营利协会 | 双面太阳能电池的平滑后侧掺杂层 |
WO2022037653A1 (zh) * | 2020-08-20 | 2022-02-24 | 隆基绿能科技股份有限公司 | 一种叠层电池 |
CN114830365A (zh) * | 2020-11-16 | 2022-07-29 | 株式会社东芝 | 多层接合型光电变换元件及其制造方法 |
CN114830365B (zh) * | 2020-11-16 | 2023-11-28 | 株式会社东芝 | 多层接合型光电变换元件及其制造方法 |
CN114447025A (zh) * | 2022-01-06 | 2022-05-06 | 青海黄河上游水电开发有限责任公司光伏产业技术分公司 | 一种叠层钙钛矿太阳能电池及其制作方法 |
Also Published As
Publication number | Publication date |
---|---|
JP7005565B2 (ja) | 2022-01-21 |
EP3331029B1 (en) | 2021-09-01 |
EP3331029A1 (en) | 2018-06-06 |
US20180158976A1 (en) | 2018-06-07 |
US11462655B2 (en) | 2022-10-04 |
JP2018093168A (ja) | 2018-06-14 |
JP2019195111A (ja) | 2019-11-07 |
CN108155181B (zh) | 2021-03-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108155181A (zh) | 叠层太阳能电池及其制造方法 | |
JP6524150B2 (ja) | タンデム太陽電池、これを含むタンデム太陽電池モジュール及びこの製造方法 | |
Gil et al. | Recent progress in inorganic hole transport materials for efficient and stable perovskite solar cells | |
KR102457927B1 (ko) | 페로브스카이트 실리콘 텐덤 태양전지의 제조 방법 | |
JP5002595B2 (ja) | 色素増感太陽電池モジュールおよびその製造方法 | |
KR102367784B1 (ko) | 텐덤 태양전지, 이를 포함하는 텐덤 태양전지 모듈 및 이의 제조방법 | |
KR102457929B1 (ko) | 텐덤 태양전지 및 그 제조 방법 | |
CN112018209B (zh) | 一种钙钛矿-硅异质结叠层太阳能电池及其制作方法 | |
WO2010001877A1 (ja) | 色素増感太陽電池、その製造方法および色素増感太陽電池モジュール | |
WO2010044445A1 (ja) | 色素増感太陽電池および色素増感太陽電池モジュール | |
KR20120138021A (ko) | 태양전지 모듈 | |
JP2011159540A (ja) | 太陽電池および太陽電池モジュール | |
KR20180130396A (ko) | 페로브스카이트 실리콘 탠덤 태양전지 및 제조 방법 | |
JP2005285473A (ja) | 光電変換装置 | |
JP6029982B2 (ja) | 光電変換素子 | |
CN110892496B (zh) | 具有包括掺杂半导体材料的多个晶粒的光吸收层的光伏器件 | |
JP2023508244A (ja) | 太陽電池及びその製造方法 | |
JP2007172915A (ja) | 光電変換装置 | |
CN220156965U (zh) | 钙钛矿叠层太阳能电池结构 | |
CN106463269A (zh) | 光电转换元件、色素敏化太阳能电池以及色素敏化太阳能电池模块 | |
KR20230166327A (ko) | 탠덤 태양전지 및 이의 제조방법 | |
JP2009059782A (ja) | 光電変換装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract | ||
EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20180612 Assignee: Hanhua thinksin Co.,Ltd. Assignor: LG ELECTRONICS Inc. Contract record no.: X2022990000645 Denomination of invention: Tandem solar cell and method of making the same Granted publication date: 20210312 License type: Common License Record date: 20220914 |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20221021 Address after: No. 3, Yingbin Avenue, Shangrao Economic and Technological Development Zone, Jiangxi Province Patentee after: Shangrao Jingke Green Energy Technology Development Co.,Ltd. Address before: Seoul, South Kerean Patentee before: LG ELECTRONICS Inc. |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: No. 3, Yingbin Avenue, Shangrao Economic and Technological Development Zone, Jiangxi Province 334100 Patentee after: Shangrao Xinyuan Yuedong Technology Development Co.,Ltd. Address before: No. 3, Yingbin Avenue, Shangrao Economic and Technological Development Zone, Jiangxi Province 334100 Patentee before: Shangrao Jingke Green Energy Technology Development Co.,Ltd. |