CN108145149A - 一种基于电镀Ni-Co-P非晶态粉末制备方法 - Google Patents
一种基于电镀Ni-Co-P非晶态粉末制备方法 Download PDFInfo
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- 238000007747 plating Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 10
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 4
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- 239000010439 graphite Substances 0.000 claims abstract description 4
- 239000010935 stainless steel Substances 0.000 claims abstract description 4
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- 238000005480 shot peening Methods 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 12
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 8
- 239000000654 additive Substances 0.000 claims description 8
- 230000000996 additive effect Effects 0.000 claims description 8
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- 229910021653 sulphate ion Inorganic materials 0.000 claims description 5
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 235000002906 tartaric acid Nutrition 0.000 claims description 4
- 239000011975 tartaric acid Substances 0.000 claims description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 3
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 claims description 3
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims description 3
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 3
- 125000000129 anionic group Chemical group 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims 1
- 229910017709 Ni Co Inorganic materials 0.000 abstract 2
- 238000000498 ball milling Methods 0.000 description 6
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
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- 125000001309 chloro group Chemical class Cl* 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
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- 238000007254 oxidation reaction Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 3
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
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- 229910021645 metal ion Inorganic materials 0.000 description 2
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- 229910001369 Brass Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical group OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
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- 235000013339 cereals Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
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- 238000005238 degreasing Methods 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- -1 hydrogen Sodium hydroxide Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
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- 239000000696 magnetic material Substances 0.000 description 1
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- 239000003595 mist Substances 0.000 description 1
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- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
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- 238000004544 sputter deposition Methods 0.000 description 1
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Classifications
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- B22F1/0003—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
- C25D5/06—Brush or pad plating
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- Chemical Kinetics & Catalysis (AREA)
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- Powder Metallurgy (AREA)
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Abstract
一种基于电镀Ni‑Co‑P非晶态粉末的成分为Ni 53‑82 wt%,Co 5‑25 wt%,Fe 5‑20 wt%,P 3‑18 wt%;其粉末为非晶态结构。制备方法其特征在于,包括以下步骤:(1)金属基板选择及被镀表面的除锈、脱脂处理;(2)采用电镀方法制备Ni合金非晶态镀层,阳极采用石墨板或不锈钢板,电极的电流密度为0.05‑0.5 A/mm2,滴定盐酸或硫酸溶液使镀液Ph值小于3,施镀温度为40‑90℃;(3)采用轧制、弯曲、喷丸等方法使非晶合金镀层从金属基板表面脱落;(4)脱落的非晶合金镀层采用球磨机、颗粒破碎机等方式进行破碎,球磨机、颗粒破碎机应采用强制冷却方式或间隙工作方式;(5)筛分成不同粗细的Ni‑Co‑P合金非晶态粉末。
Description
技术领域
本发明涉及一种非晶合金粉末,尤其是涉及一种基于电镀Ni-Co-P非晶态粉末制备方法。
背景技术
随着电子电力、通信工业的发展,电子元器件向小型化、高频化和大电流方向发
展,而且对电子设备的电磁兼容性能的要求也越来越高,传统的非晶带材铁芯、软磁铁氧体
及金属磁粉芯等已不能满足需求。普通磁性材料性能缺陷主要表现在:(1) 非晶带材铁芯在高频工作时感应涡流导致损耗很大,限制其在高频领域的应用;(2) 软磁铁氧体高频损耗低,但是饱和磁感应强度和磁导率低,不能满足小型化和大电流的发展需求;(3) 金属磁粉芯存在着高频损耗高、直流叠加特性差或者价格昂贵等问题,限制了其应用范围。非晶结构具有长程无序、短程有序的结构,使粉末具有很多独特的性能。非晶磁性粉末由于其优异的软磁性能,可以满足各种电子元器件稳定化、小型化、高频化、大电流、高功率的需求,能极大促进汽车、电子、航空航天领域等高新技术行业的发展。而钴基非晶合金粉末除具有优异的磁性能,还具有耐高温、耐燃气腐蚀、耐磨、耐蚀等性能,在电子、涂层和硬质合金中得到广泛应用。
到目前为止,非晶合金粉末的制备工艺主要有水雾法、气雾法以及使用非晶薄带破碎制粉的工艺。水雾法具有大的冷却速率,可满足制备非晶态粉末的要求。然而,在水雾化过程中,所获得的粉末易形成氧化物,氧含量高,再者当熔融金属凝固时,产生的水蒸气会覆盖在熔融金属的表面,该水蒸气膜的存在将导致熔融的核心金属冷却强度降低,从而使粉末中心部分不能获得非晶态结构的问题,影响器件性能。气雾法由于冷却强度受限,只能制备非晶形成能力强的非晶合金粉末,且生产成本高。直接破碎法的优点在于对物料的选择性不强,材料利用率高,但需对非晶薄带进行脆化退火,很容易由于退火不均造成薄带内部晶化转变的不均匀,而且在破碎后容易产生带有锐角的粉末颗粒,为粉末的后续加工带来困难。
而与液态急冷法、溅射法制备非晶合金材料相比,电镀法更为经济,应用范围也更为广阔。电刷镀镀层的形成从本质上讲和电镀相同,都是溶液中的金属离子在负极(工件)上放电结晶的过程。但是和电镀相比,电刷镀中镀笔和工件有相对运动,因而被镀表面不是整体同时发生金属离子还原结晶,而是被镀表面各点在镀笔与其接触时发生瞬间放电结晶。因此,电镀技术在工艺方面有其独特之处,其特点可归纳如下:
1、设备简单、工艺简单,操作灵活;
2、费用低,经济效益大;
3、粉末合金成分比例可调控范围大。
发明内容
针对上述问题,本发明基于电镀+剥离+破碎的原理,提供了一种基于电镀Ni-Co-P非晶态粉末制备方法。
本发明的Ni-Co-P非晶态粉末的成分为Ni 53-82 wt %,Co 5-25 wt%,Fe 5-20wt%,P 3-18 wt%;其粉末为非晶态结构。
本发明一种Ni-Co-P非晶态粉末制备方法。包括以下步骤:
(1)金属基板选择及被镀表面的处理:金属基板的在常温下的延伸率不小于10%,被镀表面可采用机械或化学方法除锈、脱脂;
(2)电镀液的组成:硫酸镍或氯化镍1-4 mol/L(优选1.5-2.5 mol/L)、硫酸钴或氯化钴0.2-1.5 mol/L、亚磷酸0.1-0.6 mol/L、磷酸0.5-1.5 mol/L、添加剂1-8g/L、可溶性硫酸盐或氯化盐10-50 g/L、余量水;
上述添加剂为酒石酸与十二烷基苯磺酸钠的混合物;
上述电镀液中3种盐采用相同阴离子型,即均为可溶性硫酸盐或氯化盐;
(3)采用电镀方法制备Ni合金非晶态镀层,阳极采用石墨板或不锈钢板,电极的电流密度为0.05-0.5 A/mm2,滴定盐酸或硫酸溶液使镀液Ph值小于3,施镀温度为40-90℃;
(4)采用轧制、弯曲、喷丸等方法使非晶合金镀层从金属基板表面脱落;
(5)非晶合金颗粒的破碎,脱落的非晶合金镀层采用球磨机、颗粒破碎机等方式进行破碎。破碎时,球磨机、颗粒破碎机应采用强制冷却方式或间隙工作方式,以防止非晶合金颗粒在破碎时产生较大温升,发生晶化转变;
(6)筛分成不同粗细的Ni-Co-P合金非晶态粉末。
与现有技术相比,本发明具有以下优点:
1.与气雾法和直接破碎法相比,本工艺具有设备投资少、工艺简单,对非晶合金形成能力要求不高等特点;
2.与水雾法相比,粉末不会产生氧化和部分非晶化的问题;
3.与直接破碎法相比,由于采用PH值较小条件下沉积,致使镀层内产生了较大的内应力和较多孔隙,镀层无需脆化退火即可脱落与破碎,且也不会产生带有锐角的粉末颗粒;
4.与制备电镀镀层相比,本发明对镀层应力和表面质量没有要求,因此可采用更大的电流密度,既提高了非晶合金镀层的制备速度,也有利于获得更疏松和具有更大内应力的非晶合金镀层,从而更易对非晶合金镀层进行剥离与脱落;
6.与急冷法制备非晶合金粉末相比,本发明无需考虑材料的非晶形成能力,可通过调整电镀液各主要成分的浓度配比,可获得不同组元构成和比例的非晶合金粉末,因此,本方法的适用性更为广泛,可操作性更强,可满足不同场合对非晶合金粉末性能的要求。
具体实施方式
以下结合实施例对本发明作进一步说明。
实施例1 Ni66Co24 P10非晶合金粉末的制备
制备工艺,包括以下步骤:
(1)金属基板表面的预处理:金属基板选用08F钢板,被镀基板表面分别经氢氧化钠溶液和盐酸溶液清洗,以去除油脂和氧化;
(2)电镀液组成:氯化镍1.6 mol/L、磷酸0.6 mol/L、氯化钴0.6 mol/L、亚磷酸0.3mol/L、添加剂1.5 g/L,可溶性氯化盐15 g/L、余量水;
上述添加剂为酒石酸与十二烷基硫酸钠质量之比为1:1的混合物;
上述可溶性氯化盐为氯化钾;
(3)非晶合金镀层的制备:预处理后的金属板接入阴极,阳极采用石墨板,搅拌电镀液,电极的电流密度为0.05 A/mm2,施镀温度为65 ℃,滴定盐酸使电镀液Ph值为1;
(4)采用弯曲法剥离非晶合金镀层,弯曲半径为0.2 m;
(5)非晶合金颗粒的破碎,非晶合金颗粒在氩气保护下采用行星球磨机进行破碎,球磨2h,球料比为5:1,球磨方式采用间隙工作方式,球磨机每球磨3min,休息10min,避免非晶粉末产生较大的温升;
(6)筛分成不同粗细的Ni66Co24 P10非晶合金粉末。
实施例2 Ni75Co18P7非晶合金粉末的制备
制备工艺,包括以下步骤:
(1)金属基板表面的预处理:金属基板选用黄铜板,板厚为1mm,被镀基板表面分别经氢氧化钠溶液和盐酸溶液清洗,以去除油脂和氧化;
(2)电镀液组成:硫酸镍1.8 mol/L、磷酸0.7 mol/L、硫酸钴0.45 mol/L、亚磷酸0.25mol/L、添加剂3 g/L,可溶性硫酸盐20 g/L、余量水;
上述添加剂为酒石酸与十二烷基苯磺酸钠质量之比为1:2的混合物;
上述可溶性氯化盐为硫酸钠;
(3)非晶合金镀层的制备:预处理后的镀件接入阴极,阳极采用不锈钢板,搅拌电镀液,电极的电流密度为0.1 A/mm2,施镀温度为75 ℃,滴定盐酸使电镀液Ph值为2;
(4)采用轧制压延法剥离非晶合金镀层,轧制压下率为8%;
(5)非晶合金颗粒的破碎,采用行星球磨机破碎,非晶合金颗粒在氩气保护破碎,球磨3h,球料比为5:1,球磨方式采用间隙工作方式,球磨机每球磨3min,休息10min,避免非晶粉末产生较大的温升;
(6)筛分成不同粗细的Ni75Co18P7非晶合金粉末。
Claims (4)
1.一种基于电镀Ni-Co-P非晶态粉末的成分为Ni 53-82 wt %,Co 5-25 wt%,Fe 5-20wt%,P 3-18 wt%;其粉末为非晶态结构。
2.一种Ni-Co-P非晶态粉末制备方法,其特征在于,包括以下步骤:
(1)金属基板选择及被镀表面的除锈、脱脂处理;
(2)电镀液的组成:硫酸镍或氯化镍1-4 mol/L、硫酸钴或氯化钴0.2-1.5 mol/L、亚磷酸0.1-0.6 mol/L、磷酸0.5-1.5 mol/L、添加剂1-8g/L、可溶性硫酸盐或氯化盐10-50 g/L、余量水;
(3)采用电镀方法制备Ni合金非晶态镀层,阳极采用石墨板或不锈钢板,电极的电流密度为0.05-0.5 A/mm2,滴定盐酸或硫酸溶液使镀液Ph值小于3,施镀温度为40-90℃;
(4)采用轧制、弯曲、喷丸等方法使非晶合金镀层从金属基板表面脱落;
(5)脱落的非晶合金镀层采用球磨机、颗粒破碎机等方式进行破碎,球磨机、颗粒破碎机应采用强制冷却方式或间隙工作方式;
(6)筛分成不同粗细的Ni-Co-P合金非晶态粉末。
3.权利要求2所述添加剂为酒石酸与十二烷基苯磺酸钠的混合物。
4.权利要求2所述电镀液中3种盐采用相同阴离子型,即均为可溶性硫酸盐或氯化盐。
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