CN108109966A - 静态随机存取存储器及其制造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 230000003068 static effect Effects 0.000 title claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 66
- 238000000034 method Methods 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 230000008021 deposition Effects 0.000 claims abstract description 6
- 238000005530 etching Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 9
- 210000002186 septum of brain Anatomy 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B10/00—Static random access memory [SRAM] devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B10/00—Static random access memory [SRAM] devices
- H10B10/12—Static random access memory [SRAM] devices comprising a MOSFET load element
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2023056705A1 (zh) * | 2021-10-08 | 2023-04-13 | 长鑫存储技术有限公司 | 静态随机存取存储器单元及其形成方法 |
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CN106601750A (zh) * | 2016-12-30 | 2017-04-26 | 上海集成电路研发中心有限公司 | 带有u型沟槽的半浮栅存储器件及制备方法 |
US20170124243A1 (en) * | 2013-03-14 | 2017-05-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Layout Optimization of a Main Pattern and a Cut Pattern |
CN107481923A (zh) * | 2016-06-08 | 2017-12-15 | 中芯国际集成电路制造(上海)有限公司 | 掩膜层结构、半导体器件及其制造方法 |
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2018
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US5308742A (en) * | 1992-06-03 | 1994-05-03 | At&T Bell Laboratories | Method of etching anti-reflection coating |
US5445984A (en) * | 1994-11-28 | 1995-08-29 | United Microelectronics Corporation | Method of making a split gate flash memory cell |
US5599729A (en) * | 1995-09-14 | 1997-02-04 | Lg Semicon Co., Ltd. | Static random access memory cell and method of fabricating the same |
CN1158495A (zh) * | 1995-12-29 | 1997-09-03 | 现代电子产业株式会社 | 用以形成半导体装置精微图样之方法 |
US5783473A (en) * | 1997-01-06 | 1998-07-21 | Mosel Vitelic, Inc. | Structure and manufacturing process of a split gate flash memory unit |
US6297099B1 (en) * | 2001-01-19 | 2001-10-02 | Taiwan Semiconductor Manufacturing Company | Method to free control tunneling oxide thickness on poly tip of flash |
CN100593859C (zh) * | 2002-07-02 | 2010-03-10 | 桑迪士克股份有限公司 | 用于使用多重门极层制造逻辑元件的技术 |
KR20060000791A (ko) * | 2004-06-29 | 2006-01-06 | 주식회사 하이닉스반도체 | 플래시 메모리 소자의 플로팅 게이트 형성 방법 |
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CN107481923A (zh) * | 2016-06-08 | 2017-12-15 | 中芯国际集成电路制造(上海)有限公司 | 掩膜层结构、半导体器件及其制造方法 |
CN106601750A (zh) * | 2016-12-30 | 2017-04-26 | 上海集成电路研发中心有限公司 | 带有u型沟槽的半浮栅存储器件及制备方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023056705A1 (zh) * | 2021-10-08 | 2023-04-13 | 长鑫存储技术有限公司 | 静态随机存取存储器单元及其形成方法 |
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Effective date of registration: 20230712 Address after: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee after: Huaian Xide Industrial Design Co.,Ltd. Address before: 223300 no.599, East Changjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: HUAIAN IMAGING DEVICE MANUFACTURER Corp. |
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Application publication date: 20180601 Assignee: Nanjing sanyueban Information Technology Co.,Ltd. Assignor: Huaian Xide Industrial Design Co.,Ltd. Contract record no.: X2023980053763 Denomination of invention: Static Random Access Memory and Its Manufacturing Method Granted publication date: 20210917 License type: Common License Record date: 20231224 |
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