CN108103468B - 一种金刚石涂层刀片及其制备方法 - Google Patents

一种金刚石涂层刀片及其制备方法 Download PDF

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CN108103468B
CN108103468B CN201711450281.0A CN201711450281A CN108103468B CN 108103468 B CN108103468 B CN 108103468B CN 201711450281 A CN201711450281 A CN 201711450281A CN 108103468 B CN108103468 B CN 108103468B
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雷君
许立
王聚云
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Funik Ultrahard Material Co Ltd
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Abstract

本发明提供一种金刚石涂层刀片的制备方法,其包括以下步骤:采用磁控溅射法依次在硬质合金基体表面依次沉积氮化铬层和碳化铌层,得到含过渡层的硬质合金;将所述含过渡层的硬质合金置于金刚石悬浮液超声处理,得到种晶后的硬质合金;采用化学气相沉积法在所述种晶后的硬质合金基体表面沉积金刚石涂层,得到金刚石涂层刀片。该方法可以有效提高金刚石涂层和硬质合金的结合强度。同时,本发明还提供由该方法制得的金刚石涂层刀片,它具有耐冲击性能好、使用寿命长的优点。

Description

一种金刚石涂层刀片及其制备方法
技术领域
本发明属于涂层刀片领域,具体地,涉及一种金刚石涂层刀片及其制备方法。
背景技术
金刚石涂层工具可广泛应用于加工有色金属、非金属、复合材料、石墨等,金刚石涂层工具制造设备投资小,性价比高,极富市场竞争力,具有广阔的发展前景。与硬质合金刀片相比,具有寿命长、加工精度高、加工速度快、可干式切削从而减少环境污染等优点。与聚晶金刚石刀片相比,则具有刀片形状可复杂,成本低,一片多刀刃等优点。目前广泛应用的金刚石涂层沉积方法是化学气相沉积法,刀片基体大多选用硬质合金,就硬质合金金刚石涂层刀片而言,大量研究表明,由于金刚石涂层与硬质合金基体在热膨胀系数方面存在较大的差异,且金刚石沉积过程中,在高温驱动下硬质合金粘结相中的钴原子会不断地从基体内部扩散至表面,这些钴原子在金刚石涂层生长过程中溶解碳或促进石墨形成,界面处石墨的存在会抑制金刚石相的生长,从而大大削弱金刚石涂层与刀片基体结合强度,进一步降低涂层刀片的切削性能和寿命。
目前常见的解决途径是酸碱两步法,酸碱两步法虽可有效去除硬质合金基体表面的粘结相钴,但会使刀片基体表面产生很多孔隙,降低了金刚石涂层刀片的力学强度,且硬质合金基体内部的钴原子在金刚石沉积过程中会继续向表面扩散,对基体界面上金刚石涂层生长的负面影响。
发明内容
有鉴于此,本发明提供一种金刚石涂层刀片及其制备方法,以解决上述问题。
具体地,本发明采取如下技术方案:
一种金刚石涂层刀片的制备方法,其包括以下步骤:
沉积过渡层 采用磁控溅射法依次在硬质合金基体表面依次沉积氮化铬层和碳化铌层,得到含过渡层的硬质合金;
种晶 将所述含过渡层的硬质合金置于金刚石悬浮液超声处理,在所述硬质合金表面形成金刚石晶种,得到种晶后的硬质合金;
沉积金刚石涂层 采用化学气相沉积法在所述种晶后的硬质合金基体表面沉积金刚石涂层,得到金刚石涂层刀片。
基于上述,所述沉积过渡层的步骤包括:先以铬为靶材、氮气为反应气体,在功率为150~300 W,脉冲频率80~120 kHz所述硬质合金基体的温度为400~700℃条件下,在所述硬质合金基体表面沉积所述氮化铬层;再在以碳化铌为靶材继续沉积碳化铌层,得到所述含过渡层的硬质合金。
优选的,所述氮化铬层的沉积速度为11~18 μm/h,所述碳化铌层的沉积速度为3μm/h。
基于上述,所述氮化铬层的厚度为0.6~1.2 μm。
基于上述,所述碳化铌层的厚度为0.6~1.2 μm。
基于上述,所述种晶的步骤包括:将所述含过渡层的硬质合金置于所述金刚石悬浮液中超声20~50 min,在所述硬质合金表面形成金刚石晶种,然后干燥,得到所述种晶后的硬质合金。
基于上述,所述金刚石悬浮液的制备步骤包括:将粒径为20~80 nm的金刚石颗粒分散于醇溶液中,得到所述金刚石悬浮液。
基于上述,所述沉积金刚石涂层的步骤包括:在压力为1~3 kPa,温度为900~1200℃的条件下,以氢气、甲烷为反应气体源,采用热丝化学沉积法在所述种晶后的硬质合金基体表面沉积金刚石涂层6~20 h,得到所述金刚石涂层刀片。
一种金刚石涂层刀片,它由权利要求1~7任一项所述的金刚石涂层刀片的制备方法制得。
基于上述,所述金刚石涂层的厚度为3~15μm。
与现有技术相比,本发明具有突出的实质性特点和显著进步。具体的说,本发明提供的金刚石涂层刀片的制备方法中先通过磁控溅射技术在硬质合金表面依次沉积氮化铬层和碳化铌层,可以有效阻挡钴扩撒,抑制金刚石涂层中非晶碳或石墨碳的形成,克服了钴对金刚石涂层沉积的不利影响;同时由于氮化铬的热膨胀系数接近硬质合金,碳化铌的热膨胀系数接近金刚石,而氮化铬层和碳化铌层通过冶金结合,保持硬质合金基体和金刚石涂层间的连续性,缓解涂层应力,达到提高金刚石涂层和硬质合金的结合强度的效果;另外,所述种晶的步骤使金刚石颗粒附着于所述含过渡层的硬质合金表面,可以有效提高金刚石沉积的成核率,进一步改善金刚石的结合强度,提高金刚石的生长速度。同时,本发明还提供由该方法制得的金刚石涂层刀片,该金刚石涂层刀片具有耐冲击性能好,使用寿命长的优点。
具体实施方式
下面通过具体实施方式,对本发明的技术方案做进一步的详细描述。
实施例1
本实施例提供一种金刚石涂层刀片的制备方法,其包括以下步骤:
清洗 先将硬质合金基体放入丙酮和甲醇混合溶液中超声清洗30 min,除去硬质合金基体表面的杂质和油污,再在50℃条件下干燥后对硬质合金基体进行表面喷砂处理;
沉积过渡层 采用磁控溅射技术对喷砂处理后的硬质合金刀片表面进行沉积过渡层;先以纯铬为靶材,氮气为反应气体,在功率为250 W,所述硬质合金基体的温度为700℃的条件下,在所述硬质合金表面沉积3 min氮化铬层;再以碳化铌为靶材,在功率150 W,脉冲频率100 kHz的条件下,继续沉积20 min碳化铌层,得到含过渡层的硬质合金。
种晶 将所述含过渡层的硬质合金置于含有金刚石悬浮液中超声30 min,在所述硬质合金表面形成金刚石晶种,得到种晶后的硬质合金;其中,所述金刚石悬浮液的制备步骤包括:将粒径为20 nm的金刚石颗粒分散于甲醇溶液中,得到所述金刚石悬浮液;
沉积金刚石涂层,在压力为1.5 kPa,温度为1000℃的条件下,以氢气、甲烷为反应气体源,采用热丝化学沉积法在所述种晶后的硬质合金表面沉积金刚石涂层10 h,得到金刚石涂层刀片。
经检测,所述金刚石涂层刀片中,金刚石涂层的厚度为4.7μm,氮化铬层的厚度为0.9 μm,碳化铌层的厚度为1.2μm;所述金刚石涂层刀片对碳化硅粉的耐冲击时间可达25s。
实施例2
本实施例提供一种金刚石涂层刀片的制备方法,其包括以下步骤:
沉积过渡层 采用磁控溅射技术对喷砂处理后的硬质合金刀片表面进行沉积过渡层;先以纯铬为靶材,氮气为反应气体,在功率为300 W,所述硬质合金基体的温度为600℃的条件下,在所述硬质合金表面沉积2 min氮化铬层;再以碳化铌为靶材,在功率150 W,脉冲频率120 kHz的条件下,继续沉积10 min碳化铌层,得到含过渡层的硬质合金。
种晶 将所述含过渡层的硬质合金置于金刚石悬浮液中超声50 min,在所述硬质合金表面形成金刚石晶种,得到种晶后的硬质合金;其中,所述金刚石悬浮液的制备步骤包括:将粒径为80 nm的金刚石颗粒分散于乙醇溶液中,得到所述金刚石悬浮液;
沉积金刚石涂层,在压力为1 kPa,温度为1200℃的条件下,以氢气、甲烷为反应气体源,采用热丝化学沉积法在所述种晶后的硬质合金表面沉积金刚石涂层20 h,得到金刚石涂层刀片。
经检测,所述金刚石涂层刀片中,金刚石涂层的厚度为8μm,氮化铬层的厚度为0.6μm,碳化铌层的厚度为0.6μm;所述金刚石涂层刀片对碳化硅粉的耐冲击时间可达28 s。
实施例3
沉积过渡层 采用磁控溅射技术对喷砂处理后的硬质合金刀片表面进行沉积过渡层;先以纯铬为靶材,氮气为反应气体,在功率为250 W,所述硬质合金基体的温度为700℃的条件下,在所述硬质合金表面沉积4 min氮化铬层;再以碳化铌为靶材,在功率200 W,脉冲频率80 kHz的条件下,继续沉积15 min碳化铌层,得到含过渡层的硬质合金。
种晶 将所述含过渡层的硬质合金置于含有金刚石悬浮液中超声20 min,在所述硬质合金表面形成金刚石晶种,得到种晶后的硬质合金;其中,所述金刚石悬浮液的制备步骤包括:将粒径为20 nm的金刚石颗粒分散于甲醇溶液中,得到所述金刚石悬浮液;
沉积金刚石涂层,在压力为3 kPa,温度为900℃的条件下,以氢气、甲烷为反应气体源,采用热丝化学沉积法在所述种晶后的硬质合金表面沉积金刚石涂层6 h,得到金刚石涂层刀片。
经检测,所述金刚石涂层刀片中,金刚石涂层的厚度为3μm,氮化铬层的厚度为1.2μm,碳化铌层的厚度为0.8 μm;所述金刚石涂层刀片对碳化硅粉的耐冲击时间可达22 s。
对比实验1
本实验提供一种金刚石涂层刀片的制备方法,它与实施例1的区别在于:它不包括所述沉积过渡层的步骤。
经检测,由该方法得到的金刚石涂层刀片对碳化硅粉的耐冲击时间可达10 s。
对比实验2
本实验提供一种金刚石涂层刀片的制备方法,它与实施例1的区别在于:所述沉积过渡层的步骤不包括沉积氮化铬层的步骤。
经检测,由该方法得到的金刚石涂层刀片对碳化硅粉的耐冲击时间可达13s。
对比实验3
本实验提供一种金刚石涂层刀片的制备方法,它与实施例1的区别在于:所述沉积过渡层的步骤不包括沉积碳化铌层的步骤。
经检测,由该方法得到的金刚石涂层刀片对碳化硅粉的耐冲击时间可达12s。
对比实验4
本实验提供一种金刚石涂层刀片的制备方法,它与实施例1的区别在于:所述沉积过渡层的步骤中先沉积碳化铌层再沉积碳化铬层。
经检测,由该方法得到的金刚石涂层刀片对碳化硅粉的耐冲击时间可达11 s。
最后应当说明的是:以上实施例仅用以说明本发明的技术方案而非对其限制;尽管参照较佳实施例对本发明进行了详细的说明,所属领域的普通技术人员应当理解:依然可以对本发明的具体实施方式进行修改或者对部分技术特征进行等同替换;而不脱离本发明技术方案的精神,其均应涵盖在本发明请求保护的技术方案范围当中。

Claims (2)

1.一种金刚石涂层刀片的制备方法,其包括以下步骤:
沉积过渡层 先以纯铬为靶材,氮气为反应气体,在功率为300 W、硬质合金基体的温度为600℃的条件下,在所述硬质合金表面沉积2 min氮化铬层;再以碳化铌为靶材、在功率150 W、脉冲频率120 kHz的条件下,继续沉积10 min碳化铌层,得到含过渡层的硬质合金;
种晶 将所述含过渡层的硬质合金置于金刚石悬浮液中超声50 min,在所述含过渡层的硬质合金表面形成金刚石晶种,得到种晶后的硬质合金;其中,所述金刚石悬浮液的制备步骤包括:将粒径为80 nm的金刚石颗粒分散于乙醇溶液中,得到所述金刚石悬浮液;
沉积金刚石涂层,在压力为1 kPa,温度为1200℃的条件下,以氢气、甲烷为反应气体源,采用热丝化学沉积法在所述种晶后的硬质合金表面沉积金刚石涂层20 h,得到金刚石涂层刀片;
所述金刚石涂层的厚度为8μm,所述氮化铬层的厚度为0.6μm,所述碳化铌层的厚度为0.6μm。
2.一种金刚石涂层刀片,其特征在于,它由权利要求1所述的金刚石涂层刀片的制备方法制得。
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Publication number Priority date Publication date Assignee Title
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006052435A (ja) * 2004-08-11 2006-02-23 Tocalo Co Ltd 半導体加工装置用部材及びその製造方法
CN104746030A (zh) * 2015-04-23 2015-07-01 太原理工大学 提高硬质合金与金刚石涂层结合强度的方法
CN105506574A (zh) * 2015-12-24 2016-04-20 富耐克超硬材料股份有限公司 纳米金刚石涂层的制备方法及纳米金刚石刀片
CN106637130A (zh) * 2016-12-29 2017-05-10 东莞市吉和金属制品有限公司 一种硬质合金刀片及其制备方法
CN107267984A (zh) * 2016-04-08 2017-10-20 株洲钻石切削刀具股份有限公司 金刚石涂层刀具的制备方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006052435A (ja) * 2004-08-11 2006-02-23 Tocalo Co Ltd 半導体加工装置用部材及びその製造方法
CN104746030A (zh) * 2015-04-23 2015-07-01 太原理工大学 提高硬质合金与金刚石涂层结合强度的方法
CN105506574A (zh) * 2015-12-24 2016-04-20 富耐克超硬材料股份有限公司 纳米金刚石涂层的制备方法及纳米金刚石刀片
CN107267984A (zh) * 2016-04-08 2017-10-20 株洲钻石切削刀具股份有限公司 金刚石涂层刀具的制备方法
CN106637130A (zh) * 2016-12-29 2017-05-10 东莞市吉和金属制品有限公司 一种硬质合金刀片及其制备方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"Study of CrNx and NbC interlayers for HFCVD diamond deposition onto WC-Co substrates";K. Petrikowski等;《Diamond & Related Materials》;20130111;第33卷;第39页左栏第19行至第右栏第6行,及第43页倒数第8-28行 *
"基于中间过渡层技术提高金刚石薄膜与硬质合金基体间附着力的研究进展";崔雨潇等;《中国科技论文》;20150331;第10卷(第6期);674-679 *

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