CN107918245B - 硬化性组合物及其硬化膜、包含硬化膜的显示元件 - Google Patents

硬化性组合物及其硬化膜、包含硬化膜的显示元件 Download PDF

Info

Publication number
CN107918245B
CN107918245B CN201710649396.6A CN201710649396A CN107918245B CN 107918245 B CN107918245 B CN 107918245B CN 201710649396 A CN201710649396 A CN 201710649396A CN 107918245 B CN107918245 B CN 107918245B
Authority
CN
China
Prior art keywords
curable composition
meth
acrylate
solvent
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710649396.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN107918245A (zh
Inventor
冈本优纪
目黒聡
堀田佑策
和田亜弥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
Original Assignee
JNC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JNC Corp filed Critical JNC Corp
Publication of CN107918245A publication Critical patent/CN107918245A/zh
Application granted granted Critical
Publication of CN107918245B publication Critical patent/CN107918245B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/12Esters of monohydric alcohols or phenols
    • C08F20/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/38Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/20Carboxylic acid amides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
    • C08K5/53Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397Phosphine oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D135/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D135/02Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04Homopolymers or copolymers of monomers containing silicon
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Materials For Photolithography (AREA)
CN201710649396.6A 2016-10-07 2017-08-01 硬化性组合物及其硬化膜、包含硬化膜的显示元件 Active CN107918245B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-198919 2016-10-07
JP2016198919 2016-10-07

Publications (2)

Publication Number Publication Date
CN107918245A CN107918245A (zh) 2018-04-17
CN107918245B true CN107918245B (zh) 2022-11-01

Family

ID=61898587

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710649396.6A Active CN107918245B (zh) 2016-10-07 2017-08-01 硬化性组合物及其硬化膜、包含硬化膜的显示元件

Country Status (4)

Country Link
JP (1) JP6939293B2 (ja)
KR (1) KR20180038956A (ja)
CN (1) CN107918245B (ja)
TW (1) TW201813982A (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104211867A (zh) * 2014-08-21 2014-12-17 苏州瑞红电子化学品有限公司 一种分子量窄分布的丙烯酸酯类共聚物及其光刻胶组合物
CN104411746A (zh) * 2012-06-25 2015-03-11 Jsr株式会社 固化性组合物、固化膜和显示元件
WO2015077161A1 (en) * 2013-11-21 2015-05-28 3M Innovative Properties Company Liquid optical adhesive compositions
CN104788613A (zh) * 2014-01-22 2015-07-22 捷恩智株式会社 热硬化性树脂组合物、其硬化膜、热硬化型硬涂剂及显示元件
JP2015158638A (ja) * 2014-02-25 2015-09-03 東洋インキScホールディングス株式会社 感光性樹脂組成物、ならびにそれを用いた塗膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5029836B2 (ja) * 2008-03-19 2012-09-19 Jsr株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
GB0910747D0 (en) * 2009-06-22 2009-08-05 Unilever Plc Branched polymer dispersants
JP5733557B2 (ja) * 2010-06-04 2015-06-10 東レ・ファインケミカル株式会社 接着剤用アクリル樹脂組成物
JP6451500B2 (ja) * 2015-05-22 2019-01-16 Jnc株式会社 熱硬化性樹脂組成物およびその硬化膜
JP2016216646A (ja) * 2015-05-22 2016-12-22 Jnc株式会社 重合体の製造方法およびその重合体

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104411746A (zh) * 2012-06-25 2015-03-11 Jsr株式会社 固化性组合物、固化膜和显示元件
WO2015077161A1 (en) * 2013-11-21 2015-05-28 3M Innovative Properties Company Liquid optical adhesive compositions
CN104788613A (zh) * 2014-01-22 2015-07-22 捷恩智株式会社 热硬化性树脂组合物、其硬化膜、热硬化型硬涂剂及显示元件
JP2015158638A (ja) * 2014-02-25 2015-09-03 東洋インキScホールディングス株式会社 感光性樹脂組成物、ならびにそれを用いた塗膜
CN104211867A (zh) * 2014-08-21 2014-12-17 苏州瑞红电子化学品有限公司 一种分子量窄分布的丙烯酸酯类共聚物及其光刻胶组合物

Also Published As

Publication number Publication date
TW201813982A (zh) 2018-04-16
CN107918245A (zh) 2018-04-17
JP2018062646A (ja) 2018-04-19
JP6939293B2 (ja) 2021-09-22
KR20180038956A (ko) 2018-04-17

Similar Documents

Publication Publication Date Title
KR101839397B1 (ko) 실란커플링제, 네거티브형 감광성 수지 조성물, 경화막, 및 터치 패널용 부재
KR101428075B1 (ko) 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 소자
CN106575078B (zh) 感光性组合物、硬化膜及其制法、触摸屏及其显示装置、液晶显示装置及有机el显示装置
US9994728B2 (en) Photosensitive resin composition and color filter using the same
JP6471509B2 (ja) 熱硬化性樹脂組成物及びその硬化膜
JP6127497B2 (ja) 着色組成物、カラーフィルタ、表示素子及びポリシロキサン
CN107918245B (zh) 硬化性组合物及其硬化膜、包含硬化膜的显示元件
CN106167664B (zh) 热硬化性树脂组合物、其硬化膜及显示元件
CN110760257B (zh) 硬化性组合物、硬化膜及彩色滤光片基板
CN108351590B (zh) 感光性树脂组合物和由其制备的固化膜
JP6737027B2 (ja) 光硬化性樹脂組成物およびその硬化膜を備えるカラーフィルター
WO2017090879A1 (en) Photosensitive resin composition and cured film prepared therefrom
US20180253004A1 (en) Photosensitive resin composition and organic insulating film prepared therefrom
WO2017095009A1 (en) Photosensitive resin composition and organic insulating film prepared therefrom
CN111149058A (zh) 透明感光性树脂组合物、光刻间隔物、液晶显示装置、光刻间隔物的制造方法、液晶显示装置的制造方法及透明感光性树脂组合物在透镜扫描曝光中的应用
KR20180107716A (ko) 감광성 조성물
KR20180038381A (ko) 투명 감광성 수지 조성물 및 이를 이용한 유기 절연막
KR101840061B1 (ko) 알칼리 가용성 고분자 화합물 및 이의 제조방법
KR20160133724A (ko) 네거티브형 감광성 수지 조성물 및 이를 이용한 절연막
KR20150127360A (ko) 감광성 수지 조성물 및 이를 이용한 절연막
KR20140102347A (ko) 옥심 에스터계 광개시제를 포함하는 감광성 수지 조성물 및 이를 이용한 절연막
WO2017057853A1 (en) Photosensitive resin composition and organic insulating film prepared therefrom
KR20190063843A (ko) 감광성 수지 조성물 및 이로부터 제조된 유기 절연막
KR20130104297A (ko) 감광성 수지 조성물 및 이를 이용한 절연막
KR20180110582A (ko) 감광성 조성물

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant