CN107849688B - 背板、溅射靶及它们的制造方法 - Google Patents
背板、溅射靶及它们的制造方法 Download PDFInfo
- Publication number
- CN107849688B CN107849688B CN201680040289.7A CN201680040289A CN107849688B CN 107849688 B CN107849688 B CN 107849688B CN 201680040289 A CN201680040289 A CN 201680040289A CN 107849688 B CN107849688 B CN 107849688B
- Authority
- CN
- China
- Prior art keywords
- cover member
- thickness
- plate
- back plate
- joined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015138918 | 2015-07-10 | ||
JP2015-138918 | 2015-07-10 | ||
PCT/JP2016/069346 WO2017010293A1 (ja) | 2015-07-10 | 2016-06-29 | バッキングプレート、スパッタリングターゲットおよびそれらの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107849688A CN107849688A (zh) | 2018-03-27 |
CN107849688B true CN107849688B (zh) | 2020-05-19 |
Family
ID=57756925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201680040289.7A Active CN107849688B (zh) | 2015-07-10 | 2016-06-29 | 背板、溅射靶及它们的制造方法 |
Country Status (5)
Country | Link |
---|---|
JP (3) | JP6151870B2 (ja) |
KR (1) | KR102116923B1 (ja) |
CN (1) | CN107849688B (ja) |
TW (1) | TWI669405B (ja) |
WO (1) | WO2017010293A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107849688B (zh) * | 2015-07-10 | 2020-05-19 | 住友化学株式会社 | 背板、溅射靶及它们的制造方法 |
TWI687534B (zh) * | 2018-09-07 | 2020-03-11 | 住華科技股份有限公司 | 背板、使用其之濺射靶材及其使用方法 |
CN112805402A (zh) * | 2018-11-21 | 2021-05-14 | 住友化学株式会社 | 背板、溅射靶及它们的制造方法 |
JP6677853B1 (ja) * | 2019-02-07 | 2020-04-08 | 住友化学株式会社 | スパッタリングターゲット、ターゲット材とバッキングプレートを接合する方法およびスパッタリングターゲットの製造方法 |
JP6801911B2 (ja) * | 2020-09-07 | 2020-12-16 | 京浜ラムテック株式会社 | バッキングプレートおよびその製造方法 |
CN112222553A (zh) * | 2020-09-27 | 2021-01-15 | 宁波江丰电子材料股份有限公司 | 一种钼靶焊接方法 |
CN112323026A (zh) * | 2020-10-29 | 2021-02-05 | 珠海和泽科技有限公司 | 靶材背板及其制作方法 |
US20220310371A1 (en) | 2021-03-26 | 2022-09-29 | Sumitomo Chemical Company, Limited | Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target |
DE202021106391U1 (de) * | 2021-11-23 | 2021-11-29 | Pilatus Flugzeugwerke Ag | Luftfahrzeugkomponente und Luftfahrzeug |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3818084B2 (ja) * | 2000-12-22 | 2006-09-06 | 日立電線株式会社 | 冷却板とその製造方法及びスパッタリングターゲットとその製造方法 |
JP2006150454A (ja) * | 2000-12-22 | 2006-06-15 | Hitachi Cable Ltd | 冷却板とその製造方法及びスパッタリングターゲットとその製造方法 |
JP4852897B2 (ja) | 2005-06-07 | 2012-01-11 | 日立電線株式会社 | 冷却板 |
JP5401921B2 (ja) * | 2008-10-30 | 2014-01-29 | 日本軽金属株式会社 | 伝熱板の製造方法 |
JP2010284693A (ja) * | 2009-06-12 | 2010-12-24 | Mitsubishi Heavy Ind Ltd | 冷却板およびその製造方法 |
JP5541629B2 (ja) | 2010-12-16 | 2014-07-09 | 株式会社アルバック | バッキングプレート及びその製造方法 |
CN201999986U (zh) * | 2011-01-21 | 2011-10-05 | 许舒华 | 具冷却流道的背板结构 |
CN107849688B (zh) * | 2015-07-10 | 2020-05-19 | 住友化学株式会社 | 背板、溅射靶及它们的制造方法 |
-
2016
- 2016-06-29 CN CN201680040289.7A patent/CN107849688B/zh active Active
- 2016-06-29 KR KR1020187000591A patent/KR102116923B1/ko active IP Right Grant
- 2016-06-29 WO PCT/JP2016/069346 patent/WO2017010293A1/ja active Application Filing
- 2016-06-29 JP JP2016569863A patent/JP6151870B2/ja active Active
- 2016-07-05 TW TW105121248A patent/TWI669405B/zh active
-
2017
- 2017-04-24 JP JP2017085430A patent/JP6286088B2/ja active Active
-
2018
- 2018-02-02 JP JP2018017406A patent/JP2018095971A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2017193779A (ja) | 2017-10-26 |
JP2018095971A (ja) | 2018-06-21 |
KR20180042214A (ko) | 2018-04-25 |
CN107849688A (zh) | 2018-03-27 |
TW201708582A (zh) | 2017-03-01 |
JP6286088B2 (ja) | 2018-02-28 |
WO2017010293A1 (ja) | 2017-01-19 |
KR102116923B1 (ko) | 2020-05-29 |
TWI669405B (zh) | 2019-08-21 |
JP6151870B2 (ja) | 2017-06-21 |
JPWO2017010293A1 (ja) | 2017-07-13 |
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