CN107815671B - 一种化学镍专用后浸剂及印制线路板上金方法 - Google Patents
一种化学镍专用后浸剂及印制线路板上金方法 Download PDFInfo
- Publication number
- CN107815671B CN107815671B CN201710991710.9A CN201710991710A CN107815671B CN 107815671 B CN107815671 B CN 107815671B CN 201710991710 A CN201710991710 A CN 201710991710A CN 107815671 B CN107815671 B CN 107815671B
- Authority
- CN
- China
- Prior art keywords
- wiring board
- preserved material
- printed wiring
- chemical nickel
- dedicated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
本发明属于集成电路技术领域,具体涉及一种化学镍专用后浸剂及印制线路板上金方法,包含十二烷基苯磺酸钠、脂肪酸钾、三乙酸铵,所述化学镍专用后浸剂为弱碱性试剂。本发明配置的弱碱性化学镍专用后浸剂可以用于密IC、BGA线路板阻焊桥、开窗位基材及油墨处,防止或杜绝渗镀、毛边问题的产生,可有效去除活化中带酸性的残留药水及有机络合物,并且通过采用所配置的化学镍专用后浸剂,可以显著提高产品品质,尤其是CEM‑1单面纸板孔内上金孔内上金不良率可以显著降低至0。
Description
技术领域
本发明属于集成电路技术领域,具体涉及一种化学镍专用后浸剂及印制线路板上金方法。
背景技术
印制线路板化镍金处理的过程包括除油(酸洗)、微蚀、酸洗、预浸、活化、化学镍、化学金,工序之间通过水洗去除大部分的前一工序所残留的浸泡溶液。其中活化通过钯后浸工序所采用的后浸剂为酸性试剂,一般为稀释的硫酸,以去除钯周围的有机络合物及还原剂,显着提高钯层的导电能力,从而确保在大面积的非导体表面也能获得有效而可靠的直接电镀层,但酸性后浸剂对开窗位置基材清洗效果差,尤其是CEM-1板材,无法清洗感觉基材开窗位置活化残留的钯,会导致在镀镍中镍槽内沉上一层镍,然后在镀金中金槽内沉上一层金,从而导致最后得到的产品品质不良。
发明内容
本发明针对上述问题,提供一种化学镍专用后浸剂及印制线路板上金方法。
本发明的有益效果如下:一种化学镍专用后浸剂,包含十二烷基苯磺酸钠、脂肪酸钾、三乙酸铵,所述化学镍专用后浸剂为弱碱性试剂。
所述十二烷基苯磺酸钠的质量含量为1-1.5%、脂肪酸钾的质量含量为0.5-0.75%、三乙酸铵的质量含量为0.5-0.75%,其余为水。
一种印制线路板上金方法,包括除油(酸洗)、微蚀、酸洗、预浸、钯活化、化学镍、化学金,在后浸工序中,所用的后浸剂为上述的化学镍专用后浸剂。
在后浸工序中,先将水加至总量的1/2至5/6,以30~50ml/L的浓度加入后浸剂,充分搅拌至完全混合,然后加水至总量,将印制线路板放入,在20~30摄氏度下浸泡2~5分钟,然后取出进入下一步工序。
印制线路板后浸在5 μm P.P. 滤心连续过滤下进行,并通过气震及电震进行震动。
后浸剂稀释搅拌通过摆动及药液循环搅拌。
在钯活化工序中,印制线路板活化浸泡时间为75~85 s。
在化学镍工序中,浸泡温度为69~71摄氏度。
本发明的有益效果如下:本发明配置的弱碱性化学镍专用后浸剂可以用于密 IC、BGA 线路板阻焊桥、开窗位基材及油墨处,防止或杜绝渗镀、毛边问题的产生,可有效去除活化中带酸性的残留药水及有机络合物,并且通过采用所配置的化学镍专用后浸剂,可以显著提高产品品质,尤其是CEM-1单面纸板孔内上金孔内上金不良率可以显著降低至0。
具体实施方式
下面结合具体实施例,可以更好地说明本发明。
实施例1
CEM-1单面纸板上金,包括以下步骤:
A:利用酸性清洁剂对CEM-1单面纸板进行清洁除油,45℃下处理5分钟,然后水洗;
B:利用微蚀剂对CEM-1单面纸板进行微蚀处理,采用100g/LSPS与2%硫酸混合,20-30℃下处理1-1.5分钟,水洗;
C:利用酸性清洁剂对CEM-1单面纸板进行酸洗,采用3%硫酸,室温下处理1-1.5分钟,水洗;
D:利用预浸剂对CEM-1单面纸板进行预浸处理,采用7.5ml/L硫酸,室温下处理1分钟,水洗;
E:利用钯活化剂对CEM-1单面纸板进行钯活化处理,采用100ml/L YC-42M,在25-30℃下处理80 s,水洗;
F:利用后浸剂对CEM-1单面纸板进行后浸处理,后浸剂包含十二烷基苯磺酸钠、脂肪酸钾、三乙酸铵,其中配比为:十二烷基苯磺酸钠的质量含量为1-1.5%、脂肪酸钾的质量含量为0.5-0.75%、三乙酸铵的质量含量为0.5-0.75%,其余为水,先将水加至总量的1/2至5/6,以30~50ml/L的浓度加入配好的后浸剂,充分搅拌至完全混合,通过摆动及药液循环搅拌,然后加水至总量,将CEM-1单面纸板放入,在20~30摄氏度下浸泡2~5分钟,在5 μmP.P. 滤心连续过滤下进行,并通过气震及电震进行震动,然后取出,水洗;
G:利用化学镍对CEM-1单面纸板进行镀镍,采用200 ml/LKG-531和60 ml/LKG-531H,70℃下处理20分钟,水洗;
H:利用化学金对CEM-1单面纸板进行镀金,采用100 ml/LKG-545HS和1.0 g/L KAu(CN)2,80℃下处理10分钟,水洗,得到上金后的CEM-1单面纸板。
试验结果,生产共计9075PNL,孔内上金总不良数量0PNL,孔内上金总不良比例0%。
对比例1
A:利用酸性清洁剂对CEM-1单面纸板进行清洁除油,45℃下处理5分钟,然后水洗;
B:利用微蚀剂对CEM-1单面纸板进行微蚀处理,采用100g/LSPS与2%硫酸混合,20-30℃下处理1-1.5分钟,水洗;
C:利用酸性清洁剂对CEM-1单面纸板进行酸洗,采用3%硫酸,室温下处理1-1.5分钟,水洗;
D:利用预浸剂对CEM-1单面纸板进行预浸处理,采用7.5ml/L硫酸,室温下处理1分钟,水洗;
E:利用钯活化剂对CEM-1单面纸板进行钯活化处理,采用100ml/L YC-42M,在25-30℃下处理150 s,水洗;
F:利用后浸剂对CEM-1单面纸板进行后浸处理,后浸剂采用30 ml/L硫酸,以30ml/L的浓度加入配好的后浸剂,充分搅拌至完全混合,通过摆动及药液循环搅拌,然后加水至总量,将CEM-1单面纸板放入,在20~30摄氏度下浸泡50~60s,在5 μm P.P. 滤心连续过滤下进行,并通过气震及电震进行震动,然后取出,水洗;
G:利用化学镍对CEM-1单面纸板进行镀镍,采用200 ml/LKG-531和60 ml/LKG-531H,81℃下处理20分钟,水洗;
H:利用化学金对CEM-1单面纸板进行镀金,采用100 ml/LKG-545HS和1.0 g/L KAu(CN)2,80℃下处理10分钟,水洗,得到上金后的CEM-1单面纸板。
试验结果,生产共计3880PNL,孔内上金总不良数量1278PNL,孔内上金总不良比例32.94%。
本发明通过减少钯活化浸泡时间,可以减少孔内基材对钯的吸附量;通过弱碱性后浸剂可更有效去除活化后单面纸板残留的酸性试剂;将化学镍浸泡温度降低为70℃,可降低活性
以上所述仅为本发明的实施例,并非用来限制本发明的保护范围;本发明的保护范围由权利要求书中的权利要求限定,并且凡是依发明所作的等效变化与修改,都在本发明专利的保护范围之内。
Claims (7)
1.一种化学镍专用后浸剂,其特征在于:包含十二烷基苯磺酸钠、脂肪酸钾、三乙酸铵,所述化学镍专用后浸剂为弱碱性试剂,所述十二烷基苯磺酸钠的质量含量为1-1.5%、脂肪酸钾的质量含量为0.5-0.75%、三乙酸铵的质量含量为0.5-0.75%,其余为水。
2.一种印制线路板上金方法,钯活化工序、后浸工序、化学镍工序,其特征在于:在后浸工序中,所用的后浸剂为权利要求1所述的化学镍专用后浸剂。
3.根据权利要求2所述的印制线路板上金方法,其特征在于:在后浸工序中,先将水加至总量的1/2至5/6,以30~50ml/L的浓度加入后浸剂,充分搅拌至完全混合,然后加水至总量,将印制线路板放入,在20~30摄氏度下浸泡2~5分钟,然后取出进入下一步工序。
4.根据权利要求3所述的印制线路板上金方法,其特征在于:印制线路板后浸在5 μmP.P. 滤心连续过滤下进行,并通过气震及电震进行震动。
5.根据权利要求4所述的印制线路板上金方法,其特征在于:后浸剂稀释搅拌通过摆动及药液循环搅拌。
6.根据权利要求2所述的印制线路板上金方法,其特征在于:在钯活化工序中,印制线路板活化浸泡时间为75~85 s。
7.根据权利要求2所述的印制线路板上金方法,其特征在于:在化学镍工序中,浸泡温度为60~71摄氏度。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710991710.9A CN107815671B (zh) | 2017-10-23 | 2017-10-23 | 一种化学镍专用后浸剂及印制线路板上金方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710991710.9A CN107815671B (zh) | 2017-10-23 | 2017-10-23 | 一种化学镍专用后浸剂及印制线路板上金方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107815671A CN107815671A (zh) | 2018-03-20 |
CN107815671B true CN107815671B (zh) | 2019-01-25 |
Family
ID=61608654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710991710.9A Active CN107815671B (zh) | 2017-10-23 | 2017-10-23 | 一种化学镍专用后浸剂及印制线路板上金方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107815671B (zh) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN85105468A (zh) * | 1985-07-18 | 1987-01-14 | 交通部公路科学研究所 | 难焊金属的预刷镀钎焊法 |
CN101525744A (zh) * | 2009-04-27 | 2009-09-09 | 深圳市成功化工有限公司 | 印刷线路板的表面处理方法 |
CN101990363A (zh) * | 2010-08-06 | 2011-03-23 | 雷玉菡 | 一种电子线路板的镀金方法 |
CN102912329A (zh) * | 2012-11-15 | 2013-02-06 | 苏州正信电子科技有限公司 | 一种用于线路板的化学镀镍钯金工艺 |
CN103789751A (zh) * | 2012-11-01 | 2014-05-14 | 南京华显高科有限公司 | Ito表面化学镀镍镀金前表面清洁的方法 |
CN106987830A (zh) * | 2017-04-11 | 2017-07-28 | 深圳市创智成功科技有限公司 | 铝基材印制线路板化学镍钯金工艺 |
-
2017
- 2017-10-23 CN CN201710991710.9A patent/CN107815671B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN85105468A (zh) * | 1985-07-18 | 1987-01-14 | 交通部公路科学研究所 | 难焊金属的预刷镀钎焊法 |
CN101525744A (zh) * | 2009-04-27 | 2009-09-09 | 深圳市成功化工有限公司 | 印刷线路板的表面处理方法 |
CN101990363A (zh) * | 2010-08-06 | 2011-03-23 | 雷玉菡 | 一种电子线路板的镀金方法 |
CN103789751A (zh) * | 2012-11-01 | 2014-05-14 | 南京华显高科有限公司 | Ito表面化学镀镍镀金前表面清洁的方法 |
CN102912329A (zh) * | 2012-11-15 | 2013-02-06 | 苏州正信电子科技有限公司 | 一种用于线路板的化学镀镍钯金工艺 |
CN106987830A (zh) * | 2017-04-11 | 2017-07-28 | 深圳市创智成功科技有限公司 | 铝基材印制线路板化学镍钯金工艺 |
Also Published As
Publication number | Publication date |
---|---|
CN107815671A (zh) | 2018-03-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102014101069B4 (de) | Metallablöse-Additiv, Zusammensetzung beinhaltend dasselbe und Verfahren zum Ablösen von Metall unter Verwendung der Zusammensetzung | |
CN105208797B (zh) | 一种半塞孔沉镍金制作方法 | |
CN104561943B (zh) | 用于线路板的化学镀镍钯合金工艺 | |
CN106987830B (zh) | 铝基材印制线路板化学镍钯金工艺 | |
CN106572602A (zh) | 一种去除pcb阻焊层的方法 | |
CN105018904B (zh) | 一种用于柔性电路板化学镀镍的溶液及其施镀方法 | |
TWI426157B (zh) | 剝金組成物以及使用方法 | |
CN107815671B (zh) | 一种化学镍专用后浸剂及印制线路板上金方法 | |
US20150376735A1 (en) | Tin stripping additive and application thereof | |
CN106413276A (zh) | 一种返洗阻焊塞孔的方法 | |
KR100264446B1 (ko) | 에칭폐액의 재이용방법 | |
JP5513799B2 (ja) | 廃プラスチック及びエッチング廃液の再資源化方法 | |
CN105828533A (zh) | 化学镀镍磷合金溶液及其应用在印制线路板上沉积镍磷合金的方法 | |
Smith et al. | Pilot trials of immersion silver deposition using a choline chloride based ionic liquid | |
CN102797028B (zh) | 剥金组成物以及使用方法 | |
CN108342759A (zh) | 一种金刚线上砂装置及金刚线加工设备 | |
CN106521590A (zh) | 一种铝合金胎体金刚石复合电镀工艺 | |
CN108929452A (zh) | 一种线路板溶胀剂及其制备方法 | |
CN103993300B (zh) | 环保型无氰化学镀厚金镀液及无氰化学镀厚金方法 | |
WO2013109404A2 (en) | Low etch process for direct metalization | |
CN106337196B (zh) | 用于印制线路板贵金属表面处理的微观孔隙封闭剂 | |
CN107815669A (zh) | 一种pcb化学镍金的方法 | |
CN110552007A (zh) | 高效环保的退镀并提取金元素的方法 | |
CN102380409B (zh) | 一种高效破氰的催化剂及其制备方法 | |
TWI542701B (zh) | 以酸浸出廢觸媒中所含金屬之方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |