CN107567682B - 具有波限制结构的板波装置和制造方法 - Google Patents

具有波限制结构的板波装置和制造方法 Download PDF

Info

Publication number
CN107567682B
CN107567682B CN201580076411.1A CN201580076411A CN107567682B CN 107567682 B CN107567682 B CN 107567682B CN 201580076411 A CN201580076411 A CN 201580076411A CN 107567682 B CN107567682 B CN 107567682B
Authority
CN
China
Prior art keywords
guided wave
layer
single crystal
piezoelectric layer
crystal piezoelectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201580076411.1A
Other languages
English (en)
Chinese (zh)
Other versions
CN107567682A (zh
Inventor
K.巴塔查吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qorvo US Inc
Original Assignee
Qorvo US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qorvo US Inc filed Critical Qorvo US Inc
Publication of CN107567682A publication Critical patent/CN107567682A/zh
Application granted granted Critical
Publication of CN107567682B publication Critical patent/CN107567682B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02228Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02259Driving or detection means
    • H03H9/02275Comb electrodes
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02543Characteristics of substrate, e.g. cutting angles
    • H03H9/02574Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/25Constructional features of resonators using surface acoustic waves
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/07Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/072Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/08Shaping or machining of piezoelectric or electrostrictive bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/87Electrodes or interconnections, e.g. leads or terminals
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H2003/027Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the microelectro-mechanical [MEMS] type

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Micromachines (AREA)
CN201580076411.1A 2014-12-17 2015-12-17 具有波限制结构的板波装置和制造方法 Active CN107567682B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462093184P 2014-12-17 2014-12-17
US62/093184 2014-12-17
US201462093753P 2014-12-18 2014-12-18
US62/093753 2014-12-18
PCT/US2015/066424 WO2016100692A2 (en) 2014-12-17 2015-12-17 Plate wave devices with wave confinement structures and fabrication methods

Publications (2)

Publication Number Publication Date
CN107567682A CN107567682A (zh) 2018-01-09
CN107567682B true CN107567682B (zh) 2021-01-22

Family

ID=55071237

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580076411.1A Active CN107567682B (zh) 2014-12-17 2015-12-17 具有波限制结构的板波装置和制造方法

Country Status (4)

Country Link
US (6) US10374573B2 (enExample)
JP (2) JP6800882B2 (enExample)
CN (1) CN107567682B (enExample)
WO (2) WO2016100692A2 (enExample)

Families Citing this family (229)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9225311B2 (en) 2012-02-21 2015-12-29 International Business Machines Corporation Method of manufacturing switchable filters
DE112013003118B4 (de) * 2012-06-22 2017-12-07 Murata Manufacturing Co., Ltd. Bauelement für elastische Wellen
US10374573B2 (en) 2014-12-17 2019-08-06 Qorvo Us, Inc. Plate wave devices with wave confinement structures and fabrication methods
WO2016154397A1 (en) * 2015-03-24 2016-09-29 Carnegie Mellon University Two-dimensional mode resonators
US10530329B2 (en) 2016-01-22 2020-01-07 Qorvo Us, Inc. Guided wave devices with selectively thinned piezoelectric layers
US10173262B2 (en) * 2016-02-04 2019-01-08 The Aerospace Corporation Systems and methods for monitoring temperature using acoustic waves during processing of a material
US10938367B2 (en) 2016-03-31 2021-03-02 Qorvo Us, Inc. Solidly mounted layer thin film device with grounding layer
US10160061B2 (en) * 2016-08-15 2018-12-25 The Aerospace Corporation Systems and methods for modifying acoustic waves based on selective heating
US10804879B2 (en) * 2016-09-30 2020-10-13 Intel Corporation Film bulk acoustic resonator (FBAR) devices for high frequency RF filters
US10924086B2 (en) * 2016-10-14 2021-02-16 Qorvo Us, Inc. Surface acoustic wave (SAW) device with antireflective structure
US20180152169A1 (en) * 2016-11-30 2018-05-31 Skyworks Solutions, Inc. Saw filters with stepped-profile piezoelectric substrate
JP2018110291A (ja) * 2016-12-28 2018-07-12 株式会社村田製作所 弾性波デバイス
US11032011B2 (en) * 2017-04-06 2021-06-08 Arizona Board Of Regents On Behalf Of The University Of Arizona Systems and methods for a quantum-analogue computer
DE102017111448B4 (de) * 2017-05-24 2022-02-10 RF360 Europe GmbH SAW-Vorrichtung mit unterdrückten Störmodensignalen
US11539341B2 (en) 2017-07-04 2022-12-27 Kyocera Corporation Acoustic wave device, multiplexer, and communication apparatus
RU2658596C1 (ru) * 2017-08-07 2018-06-21 Акционерное общество "Научно-производственное предприятие "Радар ммс" Чувствительный элемент на поверхностных акустических волнах для измерения давления жидкостей и газов
US11451209B2 (en) * 2017-10-31 2022-09-20 The Board Of Trustees Of The University Of Illinois Interdigital transducers on a piezoelectric thin-film for signal compression
US11316495B2 (en) * 2017-11-15 2022-04-26 Huawei Technologies Co., Ltd. Surface acoustic wave device
US11218132B2 (en) * 2017-12-12 2022-01-04 Ii-Vi Delaware, Inc. Acoustic resonator
FR3076126A1 (fr) 2017-12-26 2019-06-28 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de realisation d'un resonateur acoustique a ondes de volume a capacite parasite reduite
US11323096B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator with periodic etched holes
US11936358B2 (en) 2020-11-11 2024-03-19 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with low thermal impedance
US11146232B2 (en) 2018-06-15 2021-10-12 Resonant Inc. Transversely-excited film bulk acoustic resonator with reduced spurious modes
US11206009B2 (en) 2019-08-28 2021-12-21 Resonant Inc. Transversely-excited film bulk acoustic resonator with interdigital transducer with varied mark and pitch
US12237826B2 (en) 2018-06-15 2025-02-25 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch
US11323090B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator using Y-X-cut lithium niobate for high power applications
US12088281B2 (en) 2021-02-03 2024-09-10 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with multi-mark interdigital transducer
US11323089B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Filter using piezoelectric film bonded to high resistivity silicon substrate with trap-rich layer
US12040779B2 (en) 2020-04-20 2024-07-16 Murata Manufacturing Co., Ltd. Small transversely-excited film bulk acoustic resonators with enhanced Q-factor
US10637438B2 (en) 2018-06-15 2020-04-28 Resonant Inc. Transversely-excited film bulk acoustic resonators for high power applications
US10601392B2 (en) 2018-06-15 2020-03-24 Resonant Inc. Solidly-mounted transversely-excited film bulk acoustic resonator
US11996827B2 (en) 2018-06-15 2024-05-28 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with periodic etched holes
US10911023B2 (en) 2018-06-15 2021-02-02 Resonant Inc. Transversely-excited film bulk acoustic resonator with etch-stop layer
US10756697B2 (en) 2018-06-15 2020-08-25 Resonant Inc. Transversely-excited film bulk acoustic resonator
US11929731B2 (en) 2018-02-18 2024-03-12 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with optimized electrode mark, and pitch
US11509279B2 (en) 2020-07-18 2022-11-22 Resonant Inc. Acoustic resonators and filters with reduced temperature coefficient of frequency
US10790802B2 (en) 2018-06-15 2020-09-29 Resonant Inc. Transversely excited film bulk acoustic resonator using rotated Y-X cut lithium niobate
US20200403599A1 (en) * 2018-02-26 2020-12-24 Kyocera Corporation Acoustic wave element
FR3079668B1 (fr) * 2018-03-29 2020-03-27 Frec'n'sys Dispositif d'onde acoustique de surface sur substrat composite
JP7169083B2 (ja) * 2018-04-04 2022-11-10 太陽誘電株式会社 弾性波デバイスおよびマルチプレクサ
CN108540105A (zh) * 2018-04-11 2018-09-14 武汉大学 射频谐振器结构
SG10201905013VA (en) * 2018-06-11 2020-01-30 Skyworks Solutions Inc Acoustic wave device with spinel layer
US12283944B2 (en) 2018-06-15 2025-04-22 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with recessed rotated-Y-X cut lithium niobate
US12191837B2 (en) 2018-06-15 2025-01-07 Murata Manufacturing Co., Ltd. Solidly-mounted transversely-excited film bulk acoustic device
US12212306B2 (en) 2018-06-15 2025-01-28 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method
US11323095B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Rotation in XY plane to suppress spurious modes in XBAR devices
US12021496B2 (en) * 2020-08-31 2024-06-25 Murata Manufacturing Co., Ltd. Resonators with different membrane thicknesses on the same die
US10868513B2 (en) 2018-06-15 2020-12-15 Resonant Inc. Transversely-excited film bulk acoustic filters with symmetric layout
US10826462B2 (en) 2018-06-15 2020-11-03 Resonant Inc. Transversely-excited film bulk acoustic resonators with molybdenum conductors
US12375056B2 (en) 2018-06-15 2025-07-29 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators
US11329628B2 (en) 2020-06-17 2022-05-10 Resonant Inc. Filter using lithium niobate and lithium tantalate transversely-excited film bulk acoustic resonators
US11374549B2 (en) 2018-06-15 2022-06-28 Resonant Inc. Filter using transversely-excited film bulk acoustic resonators with divided frequency-setting dielectric layers
US10917072B2 (en) 2019-06-24 2021-02-09 Resonant Inc. Split ladder acoustic wave filters
US12463619B2 (en) 2018-06-15 2025-11-04 Murata Manufacturing Co., Ltd. Filter device
US10985728B2 (en) 2018-06-15 2021-04-20 Resonant Inc. Transversely-excited film bulk acoustic resonator and filter with a uniform-thickness dielectric overlayer
US12009798B2 (en) 2018-06-15 2024-06-11 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with electrodes having irregular hexagon cross-sectional shapes
US11901878B2 (en) 2018-06-15 2024-02-13 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes with a wider top layer
US11349450B2 (en) 2018-06-15 2022-05-31 Resonant Inc. Symmetric transversely-excited film bulk acoustic resonators with reduced spurious modes
US11171629B2 (en) 2018-06-15 2021-11-09 Resonant Inc. Transversely-excited film bulk acoustic resonator using pre-formed cavities
US12224732B2 (en) 2018-06-15 2025-02-11 Murata Manufacturing Co., Ltd. Solidly-mounted transversely-excited film bulk acoustic resonators and filters for 27 GHz communications bands
US10819309B1 (en) 2019-04-05 2020-10-27 Resonant Inc. Transversely-excited film bulk acoustic resonator package and method
US10998882B2 (en) 2018-06-15 2021-05-04 Resonant Inc. XBAR resonators with non-rectangular diaphragms
US12218650B2 (en) 2018-06-15 2025-02-04 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator
US10797675B2 (en) 2018-06-15 2020-10-06 Resonant Inc. Transversely excited film bulk acoustic resonator using rotated z-cut lithium niobate
US11146238B2 (en) 2018-06-15 2021-10-12 Resonant Inc. Film bulk acoustic resonator fabrication method
US11349452B2 (en) 2018-06-15 2022-05-31 Resonant Inc. Transversely-excited film bulk acoustic filters with symmetric layout
US11996825B2 (en) 2020-06-17 2024-05-28 Murata Manufacturing Co., Ltd. Filter using lithium niobate and rotated lithium tantalate transversely-excited film bulk acoustic resonators
US12184261B2 (en) 2018-06-15 2024-12-31 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with a cavity having round end zones
US11916539B2 (en) 2020-02-28 2024-02-27 Murata Manufacturing Co., Ltd. Split-ladder band N77 filter using transversely-excited film bulk acoustic resonators
US10998877B2 (en) 2018-06-15 2021-05-04 Resonant Inc. Film bulk acoustic resonator fabrication method with frequency trimming based on electric measurements prior to cavity etch
US11967945B2 (en) 2018-06-15 2024-04-23 Murata Manufacturing Co., Ltd. Transversly-excited film bulk acoustic resonators and filters
US10992284B2 (en) 2018-06-15 2021-04-27 Resonant Inc. Filter using transversely-excited film bulk acoustic resonators with multiple frequency setting layers
US11264966B2 (en) 2018-06-15 2022-03-01 Resonant Inc. Solidly-mounted transversely-excited film bulk acoustic resonator with diamond layers in Bragg reflector stack
US12149227B2 (en) 2018-06-15 2024-11-19 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator package
US12095446B2 (en) 2018-06-15 2024-09-17 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch
US10992283B2 (en) 2018-06-15 2021-04-27 Resonant Inc. High power transversely-excited film bulk acoustic resonators on rotated Z-cut lithium niobate
US11996822B2 (en) 2018-06-15 2024-05-28 Murata Manufacturing Co., Ltd. Wide bandwidth time division duplex transceiver
US12237827B2 (en) 2018-06-15 2025-02-25 Murata Manufacturing Co., Ltd. Solidly-mounted transversely-excited film bulk acoustic filters with multiple piezoelectric plate thicknesses
US11728785B2 (en) 2018-06-15 2023-08-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator using pre-formed cavities
US12081187B2 (en) 2018-06-15 2024-09-03 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator
US12155374B2 (en) 2021-04-02 2024-11-26 Murata Manufacturing Co., Ltd. Tiled transversely-excited film bulk acoustic resonator high power filters
US12113512B2 (en) 2021-03-29 2024-10-08 Murata Manufacturing Co., Ltd. Layout of XBARs with multiple sub-resonators in parallel
US11909381B2 (en) 2018-06-15 2024-02-20 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes having a narrower top layer
US11876498B2 (en) 2018-06-15 2024-01-16 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method
US11323091B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator with diaphragm support pedestals
US11201601B2 (en) 2018-06-15 2021-12-14 Resonant Inc. Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method
US12119808B2 (en) 2018-06-15 2024-10-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator package
US11228296B2 (en) 2018-06-15 2022-01-18 Resonant Inc. Transversely-excited film bulk acoustic resonator with a cavity having a curved perimeter
US12191838B2 (en) 2018-06-15 2025-01-07 Murata Manufacturing Co., Ltd. Solidly-mounted transversely-excited film bulk acoustic device and method
US12119805B2 (en) 2018-06-15 2024-10-15 Murata Manufacturing Co., Ltd. Substrate processing and membrane release of transversely-excited film bulk acoustic resonator using a sacrificial tub
US11888463B2 (en) 2018-06-15 2024-01-30 Murata Manufacturing Co., Ltd. Multi-port filter using transversely-excited film bulk acoustic resonators
US12095441B2 (en) 2018-06-15 2024-09-17 Murata Manufacturing Co., Ltd. Transversely excited film bulk acoustic resonator with recessed interdigital transducer fingers
US12155371B2 (en) 2021-03-29 2024-11-26 Murata Manufacturing Co., Ltd. Layout of xbars with multiple sub-resonators in series
US11949402B2 (en) 2020-08-31 2024-04-02 Murata Manufacturing Co., Ltd. Resonators with different membrane thicknesses on the same die
US11870423B2 (en) 2018-06-15 2024-01-09 Murata Manufacturing Co., Ltd. Wide bandwidth temperature-compensated transversely-excited film bulk acoustic resonator
US12244295B2 (en) 2018-06-15 2025-03-04 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes having a narrower top layer
US12301212B2 (en) 2018-06-15 2025-05-13 Murata Manufacturing Co., Ltd. XBAR resonators with non-rectangular diaphragms
US12170516B2 (en) 2018-06-15 2024-12-17 Murata Manufacturing Co., Ltd. Filters using transversly-excited film bulk acoustic resonators with frequency-setting dielectric layers
US12040781B2 (en) 2018-06-15 2024-07-16 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator package
US11646714B2 (en) * 2018-07-10 2023-05-09 Texas Instruments Incorporated Laterally vibrating bulk acoustic wave resonator
US11738539B2 (en) 2018-07-17 2023-08-29 II-VI Delaware, Inc Bonded substrate including polycrystalline diamond film
US11750169B2 (en) 2018-07-17 2023-09-05 Ii-Vi Delaware, Inc. Electrode-defined unsuspended acoustic resonator
US12076973B2 (en) 2018-07-17 2024-09-03 Ii-Vi Delaware, Inc. Bonded substrate including polycrystalline diamond film
US11362640B2 (en) * 2018-07-17 2022-06-14 Ii-Vi Delaware, Inc. Electrode-defined unsuspended acoustic resonator
DE102019115589B4 (de) 2018-07-17 2024-06-13 Ii-Vi Delaware, Inc. Elektrodenbegrenzter resonator
US10630256B2 (en) 2018-09-07 2020-04-21 Vtt Technical Research Centre Of Finland Ltd Two-stage lateral bulk acoustic wave filter
JP7163965B2 (ja) * 2018-09-20 2022-11-01 株式会社村田製作所 弾性波装置
US12081188B2 (en) * 2018-10-16 2024-09-03 Skyworks Solutions, Inc. Acoustic wave devices
JP7501529B2 (ja) * 2018-10-31 2024-06-18 株式会社村田製作所 フィルタデバイス及びフィルタデバイスを製造する方法
EP3878097A1 (en) * 2018-11-13 2021-09-15 Huawei Technologies Co., Ltd. Surface acoustic wave device with phononic crystal
US12063027B2 (en) 2018-11-21 2024-08-13 Skyworks Solutions, Inc. Acoustic wave device with ceramic substrate
US11621694B2 (en) * 2018-12-06 2023-04-04 Texas Instruments Incorporated Lamb wave resonator-based torque sensor
CN109831172B (zh) * 2018-12-20 2022-03-01 苏州敏芯微电子技术股份有限公司 一种体声波谐振器的制备方法
US11489511B2 (en) * 2018-12-30 2022-11-01 Texas Instruments Incorporated Highly dispersive bulk acoustic wave resonators
US11177791B2 (en) * 2019-02-01 2021-11-16 Qorvo Us, Inc. High quality factor transducers for surface acoustic wave devices
US11876501B2 (en) 2019-02-26 2024-01-16 Skyworks Solutions, Inc. Acoustic wave device with multi-layer substrate including ceramic
US11901873B2 (en) * 2019-03-14 2024-02-13 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with partial BRAGG reflectors
DE112020001227T5 (de) 2019-03-14 2022-02-10 Resonant Inc. Transversal angeregter akustischer Filmresonator mit Lambda-Halbe-Dielektrikumschicht
JP7517701B2 (ja) * 2019-04-03 2024-07-17 国立大学法人東北大学 高次モードの弾性表面波を利用するデバイス
TWI810698B (zh) * 2019-06-12 2023-08-01 美商特拉華公司 電極界定未懸掛之聲波共振器
US10911021B2 (en) 2019-06-27 2021-02-02 Resonant Inc. Transversely-excited film bulk acoustic resonator with lateral etch stop
US12034423B2 (en) 2019-06-27 2024-07-09 Murata Manufacturing Co., Ltd XBAR frontside etch process using polysilicon sacrificial layer
US10862454B1 (en) 2019-07-18 2020-12-08 Resonant Inc. Film bulk acoustic resonators in thin LN-LT layers
US11329625B2 (en) * 2019-07-18 2022-05-10 Resonant Inc. Film bulk acoustic sensors using thin LN-LT layer
CN110460319B (zh) * 2019-08-20 2020-10-09 电子科技大学 一种集成鱼鳞形反射镜阵列的体声波谐振器及其加工方法
CN117177652A (zh) * 2019-08-28 2023-12-05 株式会社村田制作所 具有多隔膜厚度的横向激励薄膜体声波谐振器及制作方法
WO2021042345A1 (zh) * 2019-09-05 2021-03-11 刘宇浩 一种体声波谐振装置的形成方法
WO2021060507A1 (ja) 2019-09-27 2021-04-01 株式会社村田製作所 弾性波装置
US12301201B2 (en) * 2019-09-27 2025-05-13 Skyworks Solutions, Inc. Acoustic wave element having high acoustic velocity layer
US11881837B2 (en) * 2019-11-21 2024-01-23 Skyworks Solutions, Inc. Acoustic wave device with acoustic velocity regions
US11552614B2 (en) 2019-12-03 2023-01-10 Skyworks Solutions, Inc. Laterally excited bulk wave device with acoustic mirrors
US11463065B2 (en) 2019-12-03 2022-10-04 Skyworks Solutions, Inc. Laterally excited bulk wave device with acoustic mirror
JP7561343B2 (ja) * 2019-12-09 2024-10-04 三安ジャパンテクノロジー株式会社 表面弾性波フィルタ、デュプレクサ及びモジュール
CN113098431B (zh) * 2020-01-08 2023-09-08 中芯集成电路(宁波)有限公司 用于制作声波谐振器复合基板及表声波谐振器及制造方法
US12255625B2 (en) 2020-02-28 2025-03-18 Murata Manufacturing Co., Ltd. Filter using transversely-excited film bulk acoustic resonators with inductively coupled sub-resonators
US11418167B2 (en) 2020-02-28 2022-08-16 Resonant, Inc. Transversely-excited film bulk acoustic resonator with multi-pitch interdigital transducer
CN115191084A (zh) * 2020-03-18 2022-10-14 株式会社村田制作所 弹性波装置及复合滤波器装置
US12278617B2 (en) 2020-04-20 2025-04-15 Murata Manufacturing Co., Ltd. High Q solidly-mounted transversely-excited film bulk acoustic resonators
US12341493B2 (en) 2020-04-20 2025-06-24 Murata Manufacturing Co., Ltd. Low loss transversely-excited film bulk acoustic resonators and filters
US12341490B2 (en) 2020-04-20 2025-06-24 Murata Manufacturing Co., Ltd. Low loss transversely-excited film bulk acoustic resonators and filters
WO2021222433A1 (en) * 2020-04-29 2021-11-04 Murata Manufacturing Co., Ltd. Elastic wave device and ladder filter
US11811391B2 (en) 2020-05-04 2023-11-07 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with etched conductor patterns
US11469733B2 (en) 2020-05-06 2022-10-11 Resonant Inc. Transversely-excited film bulk acoustic resonators with interdigital transducer configured to reduce diaphragm stress
US12074584B2 (en) 2020-05-28 2024-08-27 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes
US12267062B2 (en) 2020-06-17 2025-04-01 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with three-layer electrodes
US10992282B1 (en) 2020-06-18 2021-04-27 Resonant Inc. Transversely-excited film bulk acoustic resonators with electrodes having a second layer of variable width
US11742828B2 (en) 2020-06-30 2023-08-29 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with symmetric diaphragm
CN111817678B (zh) * 2020-07-03 2021-12-28 中国科学院上海微系统与信息技术研究所 单片式混合集成声波谐振器阵列及其制备方法
US11482981B2 (en) 2020-07-09 2022-10-25 Resonanat Inc. Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate
WO2022014495A1 (ja) * 2020-07-15 2022-01-20 株式会社村田製作所 弾性波装置
US11264969B1 (en) 2020-08-06 2022-03-01 Resonant Inc. Transversely-excited film bulk acoustic resonator comprising small cells
US11671070B2 (en) 2020-08-19 2023-06-06 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators using multiple dielectric layer thicknesses to suppress spurious modes
US11271539B1 (en) 2020-08-19 2022-03-08 Resonant Inc. Transversely-excited film bulk acoustic resonator with tether-supported diaphragm
KR20250114434A (ko) * 2020-08-31 2025-07-29 가부시키가이샤 무라타 세이사쿠쇼 동일한 다이 상에서 상이한 멤브레인 두께를 가진 공진기
CN116057835A (zh) * 2020-09-09 2023-05-02 株式会社村田制作所 弹性波装置
US11894835B2 (en) 2020-09-21 2024-02-06 Murata Manufacturing Co., Ltd. Sandwiched XBAR for third harmonic operation
US11728784B2 (en) 2020-10-05 2023-08-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters
US11405019B2 (en) 2020-10-05 2022-08-02 Resonant Inc. Transversely-excited film bulk acoustic resonator matrix filters
US11405017B2 (en) 2020-10-05 2022-08-02 Resonant Inc. Acoustic matrix filters and radios using acoustic matrix filters
US11929733B2 (en) 2020-10-05 2024-03-12 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator matrix filters with input and output impedances matched to radio frequency front end elements
US11476834B2 (en) 2020-10-05 2022-10-18 Resonant Inc. Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors
US11658639B2 (en) 2020-10-05 2023-05-23 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband
US11463066B2 (en) 2020-10-14 2022-10-04 Resonant Inc. Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate
CN112217490B (zh) * 2020-10-22 2021-09-14 展讯通信(上海)有限公司 层状温补型声表面波谐振器与封装方法
CN112290904A (zh) * 2020-10-29 2021-01-29 武汉大学 基于嵌入型电极的超高频谐振器
US12119806B2 (en) 2020-10-30 2024-10-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with spiral interdigitated transducer fingers
US12003226B2 (en) 2020-11-11 2024-06-04 Murata Manufacturing Co., Ltd Transversely-excited film bulk acoustic resonator with low thermal impedance
US12255617B2 (en) 2020-11-11 2025-03-18 Murata Manufacturing Co., Ltd. Solidly-mounted transversely-excited film bulk acoustic resonators with low thermal impedance
US12431856B2 (en) 2020-11-12 2025-09-30 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with reduced loss in the aperture direction
US11496113B2 (en) 2020-11-13 2022-11-08 Resonant Inc. XBAR devices with excess piezoelectric material removed
US12028039B2 (en) 2020-11-13 2024-07-02 Murata Manufacturing Co., Ltd. Forming XBAR devices with excess piezoelectric material removed
US12362725B2 (en) 2020-11-13 2025-07-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic filters with excess piezoelectric material removed
US12255626B2 (en) 2020-11-13 2025-03-18 Murata Manufacturing Co., Ltd. Solidly-mounted transversely-excited film bulk acoustic filters with excess piezoelectric material removed
US11405020B2 (en) 2020-11-26 2022-08-02 Resonant Inc. Transversely-excited film bulk acoustic resonators with structures to reduce acoustic energy leakage
CN112564666B (zh) * 2020-12-03 2024-06-11 武汉敏声新技术有限公司 一种中空型超高频谐振器
WO2022124391A1 (ja) * 2020-12-11 2022-06-16 株式会社村田製作所 弾性波装置
CN112653414B (zh) * 2020-12-17 2024-04-12 广东广纳芯科技有限公司 兰姆波谐振器及具备该兰姆波谐振器的滤波器和电子设备
CN112886941B (zh) * 2020-12-23 2022-04-26 杭州左蓝微电子技术有限公司 声表面波谐振器及其制造方法
WO2022153943A1 (ja) * 2021-01-12 2022-07-21 株式会社村田製作所 弾性波装置
US12166468B2 (en) 2021-01-15 2024-12-10 Murata Manufacturing Co., Ltd. Decoupled transversely-excited film bulk acoustic resonators for high power filters
US12126318B2 (en) 2021-01-15 2024-10-22 Murata Manufacturing Co., Ltd. Filters using decoupled transversely-excited film bulk acoustic resonators
US11239816B1 (en) 2021-01-15 2022-02-01 Resonant Inc. Decoupled transversely-excited film bulk acoustic resonators
US12463615B2 (en) 2021-01-21 2025-11-04 Murata Manufacturing Co., Ltd Transversely-excited film bulk acoustic resonators with improved coupling and reduced energy leakage
US12113510B2 (en) 2021-02-03 2024-10-08 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with multiple piezoelectric membrane thicknesses on the same chip
US12308826B2 (en) 2021-02-03 2025-05-20 Murata Manufacturing Co., Ltd. Bandpass filters using transversely-excited film bulk acoustic resonators
US12308825B2 (en) 2021-02-12 2025-05-20 Murata Manufacturing Co., Ltd Transversely-excited film bulk acoustic resonators with narrow gaps between busbars and ends of interdigital transducer fingers
US12126328B2 (en) 2021-03-24 2024-10-22 Murata Manufacturing Co., Ltd. Acoustic filters with shared acoustic tracks
US12348216B2 (en) 2021-03-24 2025-07-01 Murata Manufacturing Co., Ltd. Acoustic filters with shared acoustic tracks and cascaded series resonators
US12355426B2 (en) 2021-03-24 2025-07-08 Murata Manufacturing Co., Ltd. Acoustic filters with shared acoustic tracks
US12289099B2 (en) 2021-03-24 2025-04-29 Murata Manufacturing Co., Ltd. Acoustic filters with shared acoustic tracks for series and shunt resonators
US12341492B2 (en) 2021-03-29 2025-06-24 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with busbar side edges that form angles with a perimeter of the cavity
US12224735B2 (en) 2021-03-30 2025-02-11 Murata Manufacturing Co., Ltd. Diplexer using decoupled transversely-excited film bulk acoustic resonators
WO2022212569A1 (en) 2021-03-30 2022-10-06 Resonant Inc. Filter for 6 ghz wi-fi using transversely-excited film bulk acoustic resonators
US20220321088A1 (en) * 2021-03-31 2022-10-06 Skyworks Solutions, Inc. Acoustic wave device with double side acoustic mirror
US12237823B2 (en) 2021-04-02 2025-02-25 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with solidly mounted resonator (SMR) pedestals
US12249971B2 (en) 2021-04-02 2025-03-11 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with solidly mounted resonator (SMR) pedestals
US12255633B2 (en) 2021-04-16 2025-03-18 Murata Manufacturing Co., Ltd. Filter using transversely-excited film bulk acoustic resonators
US12126316B2 (en) 2021-04-16 2024-10-22 Murata Manufacturing Co., Ltd Transversely-excited film bulk acoustic resonator
US12255607B2 (en) 2021-04-30 2025-03-18 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with buried oxide strip acoustic confinement structures
US12160220B2 (en) 2021-04-30 2024-12-03 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with oxide strip acoustic confinement structures
US12057823B2 (en) 2021-05-07 2024-08-06 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with concentric interdigitated transducer fingers
US12075700B2 (en) * 2021-05-07 2024-08-27 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator fabrication using polysilicon pillars
WO2022270405A1 (ja) * 2021-06-22 2022-12-29 株式会社村田製作所 弾性波装置
US12170513B2 (en) 2021-06-30 2024-12-17 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with reduced substrate to contact bump thermal resistance
CN113489471B (zh) * 2021-07-12 2023-11-17 无锡市好达电子股份有限公司 一种低损耗的声表面波装置
CN113328724A (zh) * 2021-07-22 2021-08-31 绍兴汉天下微电子有限公司 一种体声波谐振器及其制作方法
US12456962B2 (en) 2021-09-24 2025-10-28 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators wafer-level packaging using a dielectric cover
CN117597866A (zh) * 2021-09-24 2024-02-23 株式会社村田制作所 滤波器装置
US12225387B2 (en) 2021-09-29 2025-02-11 Murata Manufacturing Co., Ltd. Communications device with concurrent operation in 5GHZ and 6GHZ U-NII frequency ranges
US12451864B2 (en) 2021-09-29 2025-10-21 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with curved shaped ends of fingers or opposing busbars
US20230103956A1 (en) * 2021-10-04 2023-04-06 Skyworks Solutions, Inc. Stacked single mirror acoustic wave device and double mirror acoustic wave device
US12316297B2 (en) * 2021-10-12 2025-05-27 Skyworks Solutions, Inc. Interdigital transducer electrode for acoustic wave device with improved response
CN117730481A (zh) * 2021-10-26 2024-03-19 株式会社村田制作所 弹性波装置
US12407326B2 (en) 2021-11-04 2025-09-02 Murata Manufacturing Co., Ltd. Stacked die transversely-excited film bulk acoustic resonator (XBAR) filters
US12424999B2 (en) 2021-12-28 2025-09-23 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with gap dielectric stripes in busbar-electrode gaps
US12494768B2 (en) 2021-12-28 2025-12-09 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with gap dielectric stripes in busbar-electrode gaps
US12413196B2 (en) 2022-02-16 2025-09-09 Murata Manufacturing Co., Ltd. Tuning acoustic resonators with back-side coating
WO2023162594A1 (ja) * 2022-02-22 2023-08-31 京セラ株式会社 弾性波装置および通信装置
CN119013894A (zh) * 2022-03-29 2024-11-22 株式会社村田制作所 弹性波装置
US12489417B2 (en) 2022-04-12 2025-12-02 Murata Manufacturing Co., Ltd. Ladder filter with transversely-excited film bulk acoustic resonators having different pitches
US20240002216A1 (en) * 2022-06-30 2024-01-04 Texas Instruments Incorporated Micro-acoustic resonator springy anchor based on offset acoustic reflector trenches
CN119422327A (zh) * 2022-07-15 2025-02-11 株式会社村田制作所 弹性波装置
US12494757B2 (en) * 2022-09-16 2025-12-09 Shenzhen Newsonic Technology Co., Ltd. Structure and manufacturing method of surface acoustic wave filter with interdigital transducer
US12489415B2 (en) 2022-10-19 2025-12-02 Murata Manufacturing Co., Ltd. Acoustic resonator lid for thermal transport
US20240275357A1 (en) * 2023-02-09 2024-08-15 Qorvo Us, Inc. Surface acoustic wave device having an interface layer between an idt and a piezoelectric layer
US20240333260A1 (en) * 2023-03-28 2024-10-03 Skyworks Solutions, Inc. Stacked surface acoustic wave device
WO2025192328A1 (ja) * 2024-03-14 2025-09-18 京セラ株式会社 弾性波装置
CN119341517A (zh) * 2024-12-20 2025-01-21 天通瑞宏科技有限公司 一种声表面滤波器及其制备方法
CN119363063A (zh) * 2024-12-27 2025-01-24 天通瑞宏科技有限公司 一种具有板波抑制的晶圆结构

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5664509A (en) * 1979-12-20 1981-06-01 Kinseki Kk Surface elastic wave element
JP2004187204A (ja) * 2002-12-06 2004-07-02 Sony Corp 音響共振器および信号処理装置
CN101034880A (zh) * 2006-02-16 2007-09-12 精工爱普生株式会社 拉姆波式高频设备、拉姆波式高频设备的制造方法
US7586239B1 (en) * 2007-06-06 2009-09-08 Rf Micro Devices, Inc. MEMS vibrating structure using a single-crystal piezoelectric thin film layer
WO2010077313A1 (en) * 2008-12-17 2010-07-08 Sand9, Inc. Mechanical resonating structures including a temperature compensation structure
US7812692B2 (en) * 2007-06-01 2010-10-12 Georgia Tech Research Corporation Piezo-on-diamond resonators and resonator systems
US7898158B1 (en) * 2007-11-01 2011-03-01 Rf Micro Devices, Inc. MEMS vibrating structure using a single-crystal piezoelectric thin-film layer having domain inversions
CN102089970A (zh) * 2008-07-11 2011-06-08 松下电器产业株式会社 板波元件和使用该板波元件的电子设备
CN103283147A (zh) * 2010-12-24 2013-09-04 株式会社村田制作所 弹性波装置及其制造方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3088189B2 (ja) 1992-02-25 2000-09-18 三菱電機株式会社 弾性表面波装置
JP3318920B2 (ja) 1994-05-10 2002-08-26 住友電気工業株式会社 表面弾性波素子
US6767749B2 (en) 2002-04-22 2004-07-27 The United States Of America As Represented By The Secretary Of The Navy Method for making piezoelectric resonator and surface acoustic wave device using hydrogen implant layer splitting
DE10325281B4 (de) * 2003-06-04 2018-05-17 Snaptrack, Inc. Elektroakustisches Bauelement und Verfahren zur Herstellung
US7353710B2 (en) * 2003-11-27 2008-04-08 Kyocera Corporation Pressure sensor device with surface acoustic wave elements
JP4483323B2 (ja) 2004-02-05 2010-06-16 セイコーエプソン株式会社 弾性表面波デバイス
JP2007202087A (ja) * 2005-05-11 2007-08-09 Seiko Epson Corp ラム波型高周波デバイス
US7619347B1 (en) 2005-05-24 2009-11-17 Rf Micro Devices, Inc. Layer acoustic wave device and method of making the same
US20070057734A1 (en) * 2005-09-09 2007-03-15 Ruby Richard C Oscillatory circuit having two oscillators
DE102005055871A1 (de) 2005-11-23 2007-05-24 Epcos Ag Elektroakustisches Bauelement
JP4315174B2 (ja) 2006-02-16 2009-08-19 セイコーエプソン株式会社 ラム波型高周波デバイスの製造方法
JP4627269B2 (ja) 2006-02-24 2011-02-09 日本碍子株式会社 圧電薄膜デバイスの製造方法
US7408286B1 (en) 2007-01-17 2008-08-05 Rf Micro Devices, Inc. Piezoelectric substrate for a saw device
US8490260B1 (en) 2007-01-17 2013-07-23 Rf Micro Devices, Inc. Method of manufacturing SAW device substrates
US9391588B2 (en) 2007-08-31 2016-07-12 Rf Micro Devices, Inc. MEMS vibrating structure using an orientation dependent single-crystal piezoelectric thin film layer
US8278802B1 (en) 2008-04-24 2012-10-02 Rf Micro Devices, Inc. Planarized sacrificial layer for MEMS fabrication
JP5433367B2 (ja) 2008-11-19 2014-03-05 日本碍子株式会社 ラム波装置
DE112010000861B4 (de) * 2009-01-15 2016-12-15 Murata Manufacturing Co., Ltd. Piezoelektrisches Bauelement und Verfahren zur Herstellung eines piezoelektrischenBauelements
FR2947398B1 (fr) 2009-06-30 2013-07-05 Commissariat Energie Atomique Dispositif resonant a ondes acoustiques guidees et procede de realisation du dispositif
JP5650553B2 (ja) * 2011-02-04 2015-01-07 太陽誘電株式会社 弾性波デバイスの製造方法
FR2974691B1 (fr) * 2011-04-28 2019-08-30 Commissariat A L'energie Atomique Et Aux Energies Alternatives Dispositif electromecanique a ondes acoustiques comprenant une zone de transduction et une cavite etendue
JP6092535B2 (ja) * 2012-07-04 2017-03-08 太陽誘電株式会社 ラム波デバイスおよびその製造方法
US9466430B2 (en) 2012-11-02 2016-10-11 Qorvo Us, Inc. Variable capacitor and switch structures in single crystal piezoelectric MEMS devices using bimorphs
US9991872B2 (en) 2014-04-04 2018-06-05 Qorvo Us, Inc. MEMS resonator with functional layers
US10374573B2 (en) 2014-12-17 2019-08-06 Qorvo Us, Inc. Plate wave devices with wave confinement structures and fabrication methods

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5664509A (en) * 1979-12-20 1981-06-01 Kinseki Kk Surface elastic wave element
JP2004187204A (ja) * 2002-12-06 2004-07-02 Sony Corp 音響共振器および信号処理装置
CN101034880A (zh) * 2006-02-16 2007-09-12 精工爱普生株式会社 拉姆波式高频设备、拉姆波式高频设备的制造方法
US7812692B2 (en) * 2007-06-01 2010-10-12 Georgia Tech Research Corporation Piezo-on-diamond resonators and resonator systems
US7586239B1 (en) * 2007-06-06 2009-09-08 Rf Micro Devices, Inc. MEMS vibrating structure using a single-crystal piezoelectric thin film layer
US7898158B1 (en) * 2007-11-01 2011-03-01 Rf Micro Devices, Inc. MEMS vibrating structure using a single-crystal piezoelectric thin-film layer having domain inversions
CN102089970A (zh) * 2008-07-11 2011-06-08 松下电器产业株式会社 板波元件和使用该板波元件的电子设备
WO2010077313A1 (en) * 2008-12-17 2010-07-08 Sand9, Inc. Mechanical resonating structures including a temperature compensation structure
CN103283147A (zh) * 2010-12-24 2013-09-04 株式会社村田制作所 弹性波装置及其制造方法

Also Published As

Publication number Publication date
US20190341904A1 (en) 2019-11-07
US20160182009A1 (en) 2016-06-23
US20160182007A1 (en) 2016-06-23
US10348269B2 (en) 2019-07-09
US20230134688A1 (en) 2023-05-04
WO2016100692A3 (en) 2016-09-09
US10389332B2 (en) 2019-08-20
WO2016100692A4 (en) 2016-11-10
US11476827B2 (en) 2022-10-18
JP7313327B2 (ja) 2023-07-24
JP6800882B2 (ja) 2020-12-16
US20190379345A1 (en) 2019-12-12
US10374573B2 (en) 2019-08-06
US20160182008A1 (en) 2016-06-23
CN107567682A (zh) 2018-01-09
JP2021044835A (ja) 2021-03-18
WO2016100692A2 (en) 2016-06-23
JP2018506930A (ja) 2018-03-08
US11545955B2 (en) 2023-01-03
WO2016100626A1 (en) 2016-06-23

Similar Documents

Publication Publication Date Title
CN107567682B (zh) 具有波限制结构的板波装置和制造方法
JP2018506930A5 (enExample)
US11588466B2 (en) Guided wave devices with selectively loaded piezoelectric layers
CN108140723B (zh) 压电元件、压电传声器、压电谐振子以及压电元件的制造方法
JP6642499B2 (ja) 弾性波装置
CN111146327A (zh) 单晶压电结构及其制造方法、单晶压电层叠结构的电子设备
WO2021135014A1 (zh) 单晶压电结构及具有其的电子设备
JP2012507902A (ja) 複数の調和的共振を有するバルク波を有する共振構造体における交差結合フィルタ要素
WO2019141205A1 (en) Surface acoustic wave device with unidirectional transducer
TWI810698B (zh) 電極界定未懸掛之聲波共振器
WO2023236332A1 (en) Plate mode resonator device
JP4680561B2 (ja) 圧電薄膜素子の製造方法
JP4693406B2 (ja) 圧電薄膜デバイス及びその製造方法
JP2008236463A (ja) Saw共振子素子およびsaw共振子
JP2006109128A (ja) 圧電薄膜素子

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant