CN107523804A - 用于膜轮廓调节的喷头帘式气体方法和系统 - Google Patents
用于膜轮廓调节的喷头帘式气体方法和系统 Download PDFInfo
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- CN107523804A CN107523804A CN201710462095.2A CN201710462095A CN107523804A CN 107523804 A CN107523804 A CN 107523804A CN 201710462095 A CN201710462095 A CN 201710462095A CN 107523804 A CN107523804 A CN 107523804A
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
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- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
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- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211279875.0A CN115584490A (zh) | 2016-06-17 | 2017-06-19 | 用于膜轮廓调节的喷头帘式气体方法和系统 |
| CN202211279459.0A CN115584489A (zh) | 2016-06-17 | 2017-06-19 | 用于膜轮廓调节的喷头帘式气体方法和系统 |
| CN202211279416.2A CN115584488A (zh) | 2016-06-17 | 2017-06-19 | 用于膜轮廓调节的喷头帘式气体方法和系统 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/186,275 US9738977B1 (en) | 2016-06-17 | 2016-06-17 | Showerhead curtain gas method and system for film profile modulation |
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| TW201809342A (zh) | 2018-03-16 |
| US9738977B1 (en) | 2017-08-22 |
| KR102744016B1 (ko) | 2024-12-17 |
| CN115584490A (zh) | 2023-01-10 |
| CN115584489A (zh) | 2023-01-10 |
| KR102605484B1 (ko) | 2023-11-23 |
| TWI743135B (zh) | 2021-10-21 |
| KR20170142891A (ko) | 2017-12-28 |
| US10202691B2 (en) | 2019-02-12 |
| KR102396162B1 (ko) | 2022-05-09 |
| KR20240122380A (ko) | 2024-08-12 |
| US20170362713A1 (en) | 2017-12-21 |
| KR102333807B1 (ko) | 2021-12-01 |
| SG10202012689YA (en) | 2021-01-28 |
| CN115584488A (zh) | 2023-01-10 |
| JP2017224816A (ja) | 2017-12-21 |
| SG10201704782VA (en) | 2018-01-30 |
| JP7171165B2 (ja) | 2022-11-15 |
| KR20210150331A (ko) | 2021-12-10 |
| KR20220066008A (ko) | 2022-05-23 |
| KR20230164622A (ko) | 2023-12-04 |
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