CN107408417B - 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 - Google Patents

双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 Download PDF

Info

Publication number
CN107408417B
CN107408417B CN201680018150.2A CN201680018150A CN107408417B CN 107408417 B CN107408417 B CN 107408417B CN 201680018150 A CN201680018150 A CN 201680018150A CN 107408417 B CN107408417 B CN 107408417B
Authority
CN
China
Prior art keywords
double
glass plate
ray
double curvature
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201680018150.2A
Other languages
English (en)
Chinese (zh)
Other versions
CN107408417A (zh
Inventor
河原直树
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Denki Co Ltd
Original Assignee
Rigaku Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Denki Co Ltd filed Critical Rigaku Denki Co Ltd
Publication of CN107408417A publication Critical patent/CN107408417A/zh
Application granted granted Critical
Publication of CN107408417B publication Critical patent/CN107408417B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/315—Accessories, mechanical or electrical features monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Optical Elements Other Than Lenses (AREA)
CN201680018150.2A 2015-03-26 2016-03-23 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法 Active CN107408417B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015063764A JP6069609B2 (ja) 2015-03-26 2015-03-26 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
JP2015-063764 2015-03-26
PCT/JP2016/059266 WO2016152940A1 (ja) 2015-03-26 2016-03-23 二重湾曲ｘ線集光素子、二重湾曲ｘ線分光素子およびそれを備える装置ならびにその素子の製造方法

Publications (2)

Publication Number Publication Date
CN107408417A CN107408417A (zh) 2017-11-28
CN107408417B true CN107408417B (zh) 2019-06-21

Family

ID=56977439

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680018150.2A Active CN107408417B (zh) 2015-03-26 2016-03-23 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法

Country Status (5)

Country Link
US (1) US10175185B2 (https=)
EP (1) EP3276630B1 (https=)
JP (1) JP6069609B2 (https=)
CN (1) CN107408417B (https=)
WO (1) WO2016152940A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
EP3603516A1 (de) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH Röntgenvorrichtung und verfahren zum betrieb der röntgenvorrichtung
WO2021101712A1 (en) * 2019-11-22 2021-05-27 Zygo Corporation Method of reducing roughness and/or defects on an optical surface and mirror formed by same
US12062465B2 (en) * 2022-08-19 2024-08-13 Uchicago Argonne, Llc System and method for bending crystal wafers for use in high resolution analyzers

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011117741A (ja) * 2009-11-30 2011-06-16 Canon Inc Ｘ線モノクロメータ、その製造方法及びｘ線分光装置
CN103057122A (zh) * 2012-12-19 2013-04-24 青岛宙庆工业设计有限公司 一种制备双曲面亚克力玻璃的方法

Family Cites Families (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4203034A (en) * 1978-06-01 1980-05-13 University Of Florida Board Of Regents Diffraction camera for imaging penetrating radiation
US4807268A (en) * 1983-11-04 1989-02-21 University Of Southern California Scanning monochrometer crystal and method of formation
US4599741A (en) * 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
JPH0755841B2 (ja) * 1987-02-03 1995-06-14 旭硝子株式会社 合せガラス用ガラス板の曲げ加工方法
JPH0833497B2 (ja) * 1987-03-25 1996-03-29 株式会社島津製作所 Ｘ線湾曲結晶
NL8801019A (nl) * 1988-04-20 1989-11-16 Philips Nv Roentgen spectrometer met dubbel gebogen kristal.
JP2727745B2 (ja) * 1989-08-24 1998-03-18 旭硝子株式会社 曲げ合せガラス及び合せガラス用素板ガラスの曲げ加工方法
JPH03131539A (ja) * 1989-10-17 1991-06-05 Asahi Glass Co Ltd 曲げ成型用プレス型とガラス板の曲げ成型方法及びその装置
US5127028A (en) * 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
US5164975A (en) * 1991-06-13 1992-11-17 The United States Of America As Represented By The United States Department Of Energy Multiple wavelength X-ray monochromators
JPH08201593A (ja) 1995-01-26 1996-08-09 Nikon Corp 非球面反射光学素子
JPH08201589A (ja) 1995-01-26 1996-08-09 Nikon Corp Ｘ線分光素子
JPH10502741A (ja) * 1995-04-26 1998-03-10 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ Ｘ線分析装置用のｘ線光学素子の製造方法
JP3705504B2 (ja) * 1995-10-24 2005-10-12 株式会社アサヒオプティカル 眼鏡用樹脂レンズの注型成形用モールド
EP0884736B1 (en) * 1997-06-11 2004-01-28 Istituto Nazionale Di Fisica Nucleare Multi-stepped diffractor constructed with constant step width angle (multi-stepped monochromator)
US5923720A (en) * 1997-06-17 1999-07-13 Molecular Metrology, Inc. Angle dispersive x-ray spectrometer
US5892809A (en) * 1997-09-10 1999-04-06 Wittry; David B. Simplified system for local excitation by monochromatic x-rays
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
US6285506B1 (en) * 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6498830B2 (en) * 1999-02-12 2002-12-24 David B. Wittry Method and apparatus for fabricating curved crystal x-ray optics
US6236710B1 (en) * 1999-02-12 2001-05-22 David B. Wittry Curved crystal x-ray optical device and method of fabrication
US6931097B1 (en) * 1999-07-22 2005-08-16 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
JP2001057328A (ja) * 1999-08-18 2001-02-27 Nikon Corp 反射マスク、露光装置および集積回路の製造方法
US6381303B1 (en) * 1999-09-29 2002-04-30 Jordan Valley Applied Radiation Ltd. X-ray microanalyzer for thin films
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6606371B2 (en) * 1999-12-20 2003-08-12 Agere Systems Inc. X-ray system
US6697454B1 (en) * 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
US6829327B1 (en) * 2000-09-22 2004-12-07 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
ES2271277T3 (es) * 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
WO2003048745A2 (en) * 2001-12-04 2003-06-12 X-Ray Optical Systems, Inc. X-ray fluorescence analyser for analysing fluid streams using a semiconductor-type detector and focusing means
US6680996B2 (en) * 2002-02-19 2004-01-20 Jordan Valley Applied Radiation Ltd. Dual-wavelength X-ray reflectometry
US6816570B2 (en) * 2002-03-07 2004-11-09 Kla-Tencor Corporation Multi-technique thin film analysis tool
EP1468428B1 (fr) * 2002-06-19 2006-09-27 Xenocs Ensemble optique et procede associe
US7104690B2 (en) * 2002-07-26 2006-09-12 X-Ray Optical Systems, Inc. Diagnosing system for an x-ray source assembly
DE60334910D1 (de) * 2002-08-02 2010-12-23 X Ray Optical Sys Inc Optische Vorrichtung aus einer Vielzahl von gekrümmten optischen Kristallen zum Fokussieren von Röntgenstrahlen
US7763820B1 (en) * 2003-01-27 2010-07-27 Spectramet, Llc Sorting pieces of material based on photonic emissions resulting from multiple sources of stimuli
US20050011227A1 (en) * 2003-03-26 2005-01-20 Hoya Corporation Method of preparation of lens
DE102004014954A1 (de) * 2003-03-27 2005-03-10 Hoya Corp Verfahren zur Herstellung eines Glassubstrats für einen Maskenrohling und Verfahren zur Herstellung eines Maskenrohlings
WO2004111624A2 (en) * 2003-06-02 2004-12-23 X-Ray Optical Systems, Inc. Method and apparatus for implementing xanes analysis
EP1644723B1 (en) * 2003-06-17 2019-11-06 X-Ray Optical Systems, Inc. Moveable transparent barrier for x-ray analysis of a pressurized sample
WO2005018289A2 (en) * 2003-08-04 2005-02-24 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability using tube power adjustments and remote calibration
US7092843B2 (en) * 2003-10-21 2006-08-15 X-Ray Optical Systems, Inc. Apparatus and method for suppressing insignificant variations in measured sample composition data, including data measured from dynamically changing samples using x-ray analysis techniques
US7298817B2 (en) * 2003-12-01 2007-11-20 X-Ray Optical Systems, Inc. Portable and on-line arsenic analyzer for drinking water
WO2006022333A1 (ja) 2004-08-27 2006-03-02 Tohoku University 曲率分布結晶レンズ、曲率分布結晶レンズを有するｘ線装置及び曲率分布結晶レンズの作製方法
US7120228B2 (en) * 2004-09-21 2006-10-10 Jordan Valley Applied Radiation Ltd. Combined X-ray reflectometer and diffractometer
US7076024B2 (en) * 2004-12-01 2006-07-11 Jordan Valley Applied Radiation, Ltd. X-ray apparatus with dual monochromators
JP2006308487A (ja) * 2005-04-28 2006-11-09 Canon Inc 多層膜反射鏡、該多層膜反射鏡の再利用方法、及びこれらの多層膜反射鏡による露光装置
US7415096B2 (en) * 2005-07-26 2008-08-19 Jordan Valley Semiconductors Ltd. Curved X-ray reflector
WO2007016484A2 (en) * 2005-08-01 2007-02-08 The Research Foundation Of State University Of New York X-ray imaging systems employing point-focusing, curved monochromating optics
WO2007019053A1 (en) * 2005-08-04 2007-02-15 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
US7317784B2 (en) * 2006-01-19 2008-01-08 Broker Axs, Inc. Multiple wavelength X-ray source
JP4997815B2 (ja) * 2006-04-12 2012-08-08 旭硝子株式会社 高平坦かつ高平滑なガラス基板の作製方法
JP2007285791A (ja) * 2006-04-14 2007-11-01 Rigaku Industrial Co 湾曲ｘ線分光素子の製造方法ならびその湾曲ｘ線分光素子およびそれを用いるｘ線分析装置
JP5315251B2 (ja) * 2006-11-16 2013-10-16 エックス−レイ オプティカル システムズ インコーポレーテッド それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法
US7440541B2 (en) * 2006-12-27 2008-10-21 Innov-X-Systems, Inc. Dual source XRF system
JP2008175755A (ja) * 2007-01-22 2008-07-31 Institute X-Ray Technologies Co Ltd 分光結晶およびその製造方法
JPWO2008090988A1 (ja) 2007-01-25 2010-05-20 株式会社ニコン 光学素子、これを用いた露光装置、及びデバイス製造方法
CN101883980B (zh) * 2007-03-15 2013-06-12 X射线光学系统公司 用于确定样品价态的x射线荧光方法
EP2075569B1 (en) * 2007-12-31 2012-02-15 Xenocs S.A. X-ray beam device
EP2260294A4 (en) * 2008-02-25 2012-02-08 X Ray Optical Sys Inc SAMPLE MODULE WITH SAMPLE FLOWS WINDOW SPLIT, FOR X-RAY ANALYSIS SYSTEM
US7738630B2 (en) * 2008-03-05 2010-06-15 X-Ray Optical Systems, Inc. Highly aligned x-ray optic and source assembly for precision x-ray analysis applications
MX2010009713A (es) * 2008-03-05 2011-03-29 X Ray Optical Sys Inc Sistema xrf teniendo bandas de energia de excitacion multiples en un paquete altamente alineado.
US7590220B1 (en) * 2008-03-10 2009-09-15 General Electric Company X-ray inspection and detection system and method
US7933383B2 (en) * 2008-04-11 2011-04-26 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
JP5344123B2 (ja) 2008-07-18 2013-11-20 独立行政法人 宇宙航空研究開発機構 Ｘ線反射体、ｘ線反射装置およびｘ線反射鏡作成方法
US8058621B2 (en) * 2009-10-26 2011-11-15 General Electric Company Elemental composition detection system and method
US9008271B2 (en) * 2010-08-19 2015-04-14 Convergent R.N.R. Ltd System for X-ray irradiation of target volume
WO2012050620A1 (en) * 2010-10-14 2012-04-19 Caldera Pharmaceuticals, Inc. Method for analysis using x-ray flourescence
JP5929903B2 (ja) * 2011-04-01 2016-06-08 旭硝子株式会社 合わせガラス、およびその製造方法
US8557149B2 (en) * 2011-04-08 2013-10-15 Uchicago Argonne, Llc System and method for implementing enhanced optics fabrication
EP2721396B1 (en) * 2011-06-20 2018-04-04 X-Ray Optical Systems, Inc. Online monitoring of contaminants in crude and heavy fuels, and refinery applications thereof
US8855809B2 (en) * 2011-09-01 2014-10-07 Spectramet, Llc Material sorting technology
US9240254B2 (en) * 2011-09-27 2016-01-19 Revera, Incorporated System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy
CN103946693B (zh) * 2011-10-06 2017-05-03 X射线光学系统公司 可移除式x‑射线分析仪用的可移动型运输及屏蔽装置
EP2814573B1 (en) * 2012-02-13 2018-03-21 Convergent R.N.R Ltd Imaging-guided delivery of x-ray radiation
CN104272424A (zh) * 2012-02-28 2015-01-07 X射线光学系统公司 具有使用多材料x 射线管阳极和单色光学装置产生的多激励能带的x射线分析器
KR102064643B1 (ko) * 2012-03-30 2020-01-08 호야 가부시키가이샤 마스크 블랭크용 기판, 다층 반사막 부착 기판, 투과형 마스크 블랭크, 반사형 마스크 블랭크, 투과형 마스크, 반사형 마스크 및 반도체 장치의 제조 방법
JP6206901B2 (ja) * 2012-12-14 2017-10-04 大学共同利用機関法人 高エネルギー加速器研究機構 散乱強度分布の測定方法及び測定装置
JP6470176B2 (ja) * 2013-07-22 2019-02-13 Hoya株式会社 多層反射膜付き基板、ｅｕｖリソグラフィー用反射型マスクブランク、ｅｕｖリソグラフィー用反射型マスク及びその製造方法、並びに半導体装置の製造方法
KR101875790B1 (ko) * 2013-09-18 2018-07-06 호야 가부시키가이샤 반사형 마스크 블랭크 및 그 제조방법, 반사형 마스크 그리고 반도체 장치의 제조방법
WO2015046095A1 (ja) * 2013-09-27 2015-04-02 Hoya株式会社 導電膜付き基板、多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法
US9551677B2 (en) * 2014-01-21 2017-01-24 Bruker Jv Israel Ltd. Angle calibration for grazing-incidence X-ray fluorescence (GIXRF)
US9666322B2 (en) * 2014-02-23 2017-05-30 Bruker Jv Israel Ltd X-ray source assembly
US9594036B2 (en) * 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) * 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
TWI650607B (zh) * 2014-10-21 2019-02-11 日商Ａｇｃ股份有限公司 Euvl用附反射層之基板及其製造方法、以及euvl用反射型光罩基底及euvl用反射型光罩
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011117741A (ja) * 2009-11-30 2011-06-16 Canon Inc Ｘ線モノクロメータ、その製造方法及びｘ線分光装置
CN103057122A (zh) * 2012-12-19 2013-04-24 青岛宙庆工业设计有限公司 一种制备双曲面亚克力玻璃的方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《红外玻璃的微压印研究》;刘君娥;《中国优秀硕士学位论文全文数据库（电子期刊）》;20110415(第4期);第41-42页 *

Also Published As

Publication number Publication date
EP3276630A4 (en) 2018-08-01
EP3276630B1 (en) 2019-06-26
US20180011035A1 (en) 2018-01-11
WO2016152940A1 (ja) 2016-09-29
EP3276630A1 (en) 2018-01-31
CN107408417A (zh) 2017-11-28
US10175185B2 (en) 2019-01-08
WO2016152940A8 (ja) 2017-08-31
JP6069609B2 (ja) 2017-02-01
JP2016183888A (ja) 2016-10-20

Similar Documents

Publication Publication Date Title
CN107408417B (zh) 双重弯曲x射线聚光元件及其结构体、双重弯曲x射线分光元件及其结构体的制造方法
CN105074512B (zh) 曲面衍射光栅、其制造方法以及光学装置
US20150192713A1 (en) Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same
US9806054B2 (en) Flexible substrate holder, device and method for detaching a first substrate
CN103975256A (zh) 微透镜阵列及其制作方法
Iwert et al. First results from a novel curving process for large area scientific imagers
JP5567135B2 (ja) 積層鏡面プレートの組み立て方法
CN104897699A (zh) 一种可以对块体材料进行加工并实现原子尺度原位变形的方法和装置
JP2007212272A (ja) 二重曲率ヨハンソン型ｘ線分光結晶の作製方法
US20120034421A1 (en) Precision spacing for stacked wafer assemblies
JPH08201589A (ja) Ｘ線分光素子
JPWO2007072906A1 (ja) 曲率分布結晶レンズの製造方法、偏光制御装置、ｘ線反射率測定装置およびｘ線反射率測定方法
CN109786495A (zh) 超大规模凝视型红外探测器拼接基板及其制备方法
CN214150510U (zh) 一种透射电镜高分辨原位温差加压芯片
Wang et al. Adjusting light distribution for generating microlens arrays with a controllable profile and fill factor
CN114823285A (zh) 超薄芯片及其平整化方法和应用
CN108387417B (zh) 一种避免镶嵌料影响样品测试数据的方法
CN108288512A (zh) 竖直的锯齿结构x射线折射透镜
CN119374768B (zh) 基于压力测量胶片的芯片粘接残余应力的测量结构和方法
CN110243679A (zh) 一种热双金属拉伸驱动器及其制备方法
Ginga On-chip dielectric cohesive fracture characterization and mitigation investigation through off-chip carbon nanotube interconnects
CN111341886B (zh) 分离探测器混成芯片的工装、制备方法、分离方法
Emmony et al. A new technique for generating spherical surfaces
US20210370557A1 (en) Methods and systems for making fibrillar adhesion structures
JPH0731542Y2 (ja) ボンディングツール

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant