CN107385420A - 一种性能优异的氧化锌薄膜的制备方法 - Google Patents
一种性能优异的氧化锌薄膜的制备方法 Download PDFInfo
- Publication number
- CN107385420A CN107385420A CN201710696678.1A CN201710696678A CN107385420A CN 107385420 A CN107385420 A CN 107385420A CN 201710696678 A CN201710696678 A CN 201710696678A CN 107385420 A CN107385420 A CN 107385420A
- Authority
- CN
- China
- Prior art keywords
- deionized water
- substrate
- zinc
- flexible polyester
- polyester
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/04—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1233—Organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
Abstract
本发明公开了一种性能优异的氧化锌薄膜的制备方法,本发明对聚酯基底进行等离子体表面处理,有效解决了氧化物透明导电薄膜与柔性聚酯基底匹配性不好,附着性差,容易发生脱落的关键性问题,本发明采用溶胶凝胶旋涂法成膜,不需复杂的设备,工艺简单,可实现大规模工业化生产。
Description
技术领域
本发明涉及导电材料领域,具体涉及一种性能优异的氧化锌薄膜的制备方法。
背景技术
透明导电薄膜是一种兼备高导电及可见光波段高透明特性的基础光电材料,广泛应用于显示器、发光器件、太阳能电池、传感器、柔性触摸屏等光电显示领域,具有广泛的商业应用前景。
透明导电氧化物(TCO)薄膜因其在可见光范围内高透过率、对红外光具有高反射率以及较低的电阻率,在太阳能电池、平板液晶显示器、发光二极管(LED)等光电器件领域显示出了其广阔的应用前景。目前商用的TCO薄膜,使用最多的是掺锡氧化铟薄膜(ITO),但是,ITO薄膜中的铟元素价格昂贵而且有毒。与此同时,掺铝氧化锌薄膜(AZO)具有原材料广泛、价格便宜、无毒环保等优点,成为ITO薄膜的极佳替代者。制备AZO薄膜的方法主要有:电子束真空蒸发、磁控溅射、化学气象沉积、脉冲激光沉积、分子束外延、喷雾热解、原子层沉积以及溶胶凝胶旋涂法。在这些方法中,溶胶凝胶法制备AZO薄膜既简单又廉价,具有工艺过程简单、不需复杂昂贵的设备、成膜均匀性好、结晶温度低以及易于进行精确掺杂等众多优点。
经对现有技术检索,大多数技术是利用各类导电物质制备的油墨涂布或者喷涂在柔性基底上制备成柔性透明导电薄膜,此类技术制备的透明导电薄膜,虽然具有较好的薄膜附着力,但光学透过率和导电性能仍然有待提升。
发明内容
本发明提供一种性能优异的氧化锌薄膜的制备方法,本发明对聚酯基底进行等离子体表面处理,有效解决了氧化物透明导电薄膜与柔性聚酯基底匹配性不好,附着性差,容易发生脱落的关键性问题,本发明采用溶胶凝胶旋涂法成膜,不需复杂的设备,工艺简单,可实现大规模工业化生产。
为了实现上述目的,本发明提供了一种性能优异的氧化锌薄膜的制备方法,该方法包括如下步骤:
(1)对聚酯基底进行等离子体表面处理
将柔性聚酯基底放入含有一定洗洁剂的去离子水中,在去离子水中超声10-15min;然后,用柔软干净的毛刷逐一对柔性聚酯基底的正反面进行洗刷以去除基底表面的污垢和油污,之后,用去离子水反复冲洗基底,直至基底无泡沫为止;接着,将柔性聚酯放入乙醇中超声10-15min,以去除基底表面的有机物,之后,用去离子水反复冲洗基底4-6次;接着,将柔性聚酯基底进行去离子水超声25-30mins,然后,将容器中超声后的去离子水倒出,加入新的去离子水;最后,将洁净的柔性聚酯从去离子水中逐一取出平铺在洁净的大号培养皿上,一起放进温度为55-60℃的洁净烘箱内进行烘烤24-30h;
将清洗、干燥后的柔性聚酯基底放入磁控溅射机的腔体内,关闭磁控溅射机的所有阀门、窗口、所有靶材正下方的溅射挡板,对腔体进行抽真空,至3×10-4-5×10-4pa;
将反溅射挡板旋转至柔性聚酯基底的正上方,通入氩气和氧气,调节聚酯基底与反溅射挡板的间距,设定相应的氩氧比例、总体气体流量、工作气压、溅射功率和等离子体处理时间,对柔性聚酯基底表面进行反溅射等离子体处理;
(2)制备导电溶胶
将二水合醋酸锌溶解在溶剂中,使锌离子的摩尔浓度为0.5-1mol/L,在30-35℃条件下搅拌至溶解后,向溶液中依次加入稳定剂和硫酸铝,按摩尔比,Al3+:Zn2+=0.02-0.03:1,混合溶液在75-85℃的水浴中恒温搅拌4-5h,所得混合溶液在室温下陈化25-30h,得到导电溶胶;
(3)将导电溶胶,使用旋涂法在上述经等离子表面处理后的聚酯基底上制备氧化锌凝胶薄膜,将得到氧化锌凝胶薄膜在空气中,100-105℃条件下干燥10-20分钟;接着在空气中,450-500℃条件下热处理10-20分钟,得到氧化锌薄膜。
优选的,在步骤(1)中,等离子处理的工艺为:聚酯基底与反溅射挡板的间距为35-40mm;氩氧比例为5:1-6:1;氧气和氩气纯度均为99.99%;总气体流量为20-25sccm;工作气压为0.4-0.6pa;溅射功率为25-45W;等离子体处理时间为70-90s。
具体实施方式
实施例一
将柔性聚酯基底放入含有一定洗洁剂的去离子水中,在去离子水中超声10min;然后,用柔软干净的毛刷逐一对柔性聚酯基底的正反面进行洗刷以去除基底表面的污垢和油污,之后,用去离子水反复冲洗基底,直至基底无泡沫为止;接着,将柔性聚酯放入乙醇中超声10min,以去除基底表面的有机物,之后,用去离子水反复冲洗基底4次;接着,将柔性聚酯基底进行去离子水超声25mins,然后,将容器中超声后的去离子水倒出,加入新的去离子水;最后,将洁净的柔性聚酯从去离子水中逐一取出平铺在洁净的大号培养皿上,一起放进温度为55℃的洁净烘箱内进行烘烤24h。
将清洗、干燥后的柔性聚酯基底放入磁控溅射机的腔体内,关闭磁控溅射机的所有阀门、窗口、所有靶材正下方的溅射挡板,对腔体进行抽真空,至3×10-4。
将反溅射挡板旋转至柔性聚酯基底的正上方,通入氩气和氧气,调节聚酯基底与反溅射挡板的间距,设定相应的氩氧比例、总体气体流量、工作气压、溅射功率和等离子体处理时间,对柔性聚酯基底表面进行反溅射等离子体处理。等离子处理的工艺为:聚酯基底与反溅射挡板的间距为35mm;氩氧比例为5:1;氧气和氩气纯度均为99.99%;总气体流量为20sccm;工作气压为0.4pa;溅射功率为25W;等离子体处理时间为70s。
将二水合醋酸锌溶解在溶剂中,使锌离子的摩尔浓度为0.5mol/L,在30-35℃条件下搅拌至溶解后,向溶液中依次加入稳定剂和硫酸铝,按摩尔比,Al3+:Zn2+=0.02:1,混合溶液在75℃的水浴中恒温搅拌4h,所得混合溶液在室温下陈化25h,得到导电溶胶。
将导电溶胶,使用旋涂法在上述经等离子表面处理后的聚酯基底上制备氧化锌凝胶薄膜,将得到氧化锌凝胶薄膜在空气中,100℃条件下干燥1分钟;接着在空气中,450℃条件下热处理10分钟,得到氧化锌薄膜。
实施例二
将柔性聚酯基底放入含有一定洗洁剂的去离子水中,在去离子水中超声15min;然后,用柔软干净的毛刷逐一对柔性聚酯基底的正反面进行洗刷以去除基底表面的污垢和油污,之后,用去离子水反复冲洗基底,直至基底无泡沫为止;接着,将柔性聚酯放入乙醇中超声15min,以去除基底表面的有机物,之后,用去离子水反复冲洗基底6次;接着,将柔性聚酯基底进行去离子水超声30mins,然后,将容器中超声后的去离子水倒出,加入新的去离子水;最后,将洁净的柔性聚酯从去离子水中逐一取出平铺在洁净的大号培养皿上,一起放进温度为60℃的洁净烘箱内进行烘烤30h。
将清洗、干燥后的柔性聚酯基底放入磁控溅射机的腔体内,关闭磁控溅射机的所有阀门、窗口、所有靶材正下方的溅射挡板,对腔体进行抽真空,至5×10-4pa。
将反溅射挡板旋转至柔性聚酯基底的正上方,通入氩气和氧气,调节聚酯基底与反溅射挡板的间距,设定相应的氩氧比例、总体气体流量、工作气压、溅射功率和等离子体处理时间,对柔性聚酯基底表面进行反溅射等离子体处理。等离子处理的工艺为:聚酯基底与反溅射挡板的间距为40mm;氩氧比例为6:1;氧气和氩气纯度均为99.99%;总气体流量为25sccm;工作气压为0.6pa;溅射功率为45W;等离子体处理时间为90s。
将二水合醋酸锌溶解在溶剂中,使锌离子的摩尔浓度为1mol/L,在30-35℃条件下搅拌至溶解后,向溶液中依次加入稳定剂和硫酸铝,按摩尔比,Al3+:Zn2+=0.03:1,混合溶液在85℃的水浴中恒温搅拌5h,所得混合溶液在室温下陈化30h,得到导电溶胶。
将导电溶胶,使用旋涂法在上述经等离子表面处理后的聚酯基底上制备氧化锌凝胶薄膜,将得到氧化锌凝胶薄膜在空气中,105℃条件下干燥20分钟;接着在空气中,500℃条件下热处理20分钟,得到氧化锌薄膜。
以上所述,仅是本发明的较佳实施例,并非对本发明做任何限制,凡是根据发明技术实质对以上实施例所作的任何简单修改、变更以及等效结构变化,均仍属于本发明技术方案的保护范围内。
Claims (2)
1.一种性能优异的氧化锌薄膜的制备方法,该方法包括如下步骤:
(1)对聚酯基底进行等离子体表面处理
将柔性聚酯基底放入含有一定洗洁剂的去离子水中,在去离子水中超声10-15min;然后,用柔软干净的毛刷逐一对柔性聚酯基底的正反面进行洗刷以去除基底表面的污垢和油污,之后,用去离子水反复冲洗基底,直至基底无泡沫为止;接着,将柔性聚酯放入乙醇中超声10-15min,以去除基底表面的有机物,之后,用去离子水反复冲洗基底4-6次;接着,将柔性聚酯基底进行去离子水超声25-30mins,然后,将容器中超声后的去离子水倒出,加入新的去离子水;最后,将洁净的柔性聚酯从去离子水中逐一取出平铺在洁净的大号培养皿上,一起放进温度为55-60℃的洁净烘箱内进行烘烤24-30h;
将清洗、干燥后的柔性聚酯基底放入磁控溅射机的腔体内,关闭磁控溅射机的所有阀门、窗口、所有靶材正下方的溅射挡板,对腔体进行抽真空,至3×10-4-5×10-4pa;
将反溅射挡板旋转至柔性聚酯基底的正上方,通入氩气和氧气,调节聚酯基底与反溅射挡板的间距,设定相应的氩氧比例、总体气体流量、工作气压、溅射功率和等离子体处理时间,对柔性聚酯基底表面进行反溅射等离子体处理;
(2)制备导电溶胶
将二水合醋酸锌溶解在溶剂中,使锌离子的摩尔浓度为0.5-1mol/L,在30-35℃条件下搅拌至溶解后,向溶液中依次加入稳定剂和硫酸铝,按摩尔比,Al3+:Zn2+=0.02-0.03:1,混合溶液在75-85℃的水浴中恒温搅拌4-5h,所得混合溶液在室温下陈化25-30h,得到导电溶胶;
(3)将导电溶胶,使用旋涂法在上述经等离子表面处理后的聚酯基底上制备氧化锌凝胶薄膜,将得到氧化锌凝胶薄膜在空气中,100-105℃条件下干燥10-20分钟;接着在空气中,450-500℃条件下热处理10-20分钟,得到氧化锌薄膜。
2.如权利要求1所述的方法,其特征在于,在步骤(1)中,等离子处理的工艺为:聚酯基底与反溅射挡板的间距为35-40mm;氩氧比例为5:1-6:1;氧气和氩气纯度均为99.99%;总气体流量为20-25sccm;工作气压为0.4-0.6pa;溅射功率为25-45W;等离子体处理时间为70-90s。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710696678.1A CN107385420A (zh) | 2017-08-15 | 2017-08-15 | 一种性能优异的氧化锌薄膜的制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710696678.1A CN107385420A (zh) | 2017-08-15 | 2017-08-15 | 一种性能优异的氧化锌薄膜的制备方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN107385420A true CN107385420A (zh) | 2017-11-24 |
Family
ID=60354594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710696678.1A Pending CN107385420A (zh) | 2017-08-15 | 2017-08-15 | 一种性能优异的氧化锌薄膜的制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107385420A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110931657A (zh) * | 2019-12-06 | 2020-03-27 | 中国乐凯集团有限公司 | 一种钙钛矿薄膜太阳能电池用柔性复合衬底及其制备方法 |
WO2021018125A1 (zh) * | 2019-08-01 | 2021-02-04 | 杭州三花研究院有限公司 | 换热器及其制备方法、换热系统 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58156533A (ja) * | 1982-03-10 | 1983-09-17 | Toshiba Corp | 酸化亜鉛被膜の形成法 |
CN1948221A (zh) * | 2006-09-26 | 2007-04-18 | 中国科学院上海硅酸盐研究所 | 溶胶-凝胶法制备高温铁磁性的ZnO:( Co,Al)纳米材料的方法 |
CN101560059A (zh) * | 2009-05-27 | 2009-10-21 | 中南大学 | 掺铝氧化锌涂膜和纳米棒阵列材料及其制备方法 |
CN106086789A (zh) * | 2016-06-30 | 2016-11-09 | 上海交通大学 | 通过磁控溅射在聚酯表面沉积透明导电薄膜的界面层方法 |
CN106847673A (zh) * | 2017-03-12 | 2017-06-13 | 苏州南尔材料科技有限公司 | 一种硅基底氧化锌薄膜的制备方法 |
-
2017
- 2017-08-15 CN CN201710696678.1A patent/CN107385420A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58156533A (ja) * | 1982-03-10 | 1983-09-17 | Toshiba Corp | 酸化亜鉛被膜の形成法 |
CN1948221A (zh) * | 2006-09-26 | 2007-04-18 | 中国科学院上海硅酸盐研究所 | 溶胶-凝胶法制备高温铁磁性的ZnO:( Co,Al)纳米材料的方法 |
CN101560059A (zh) * | 2009-05-27 | 2009-10-21 | 中南大学 | 掺铝氧化锌涂膜和纳米棒阵列材料及其制备方法 |
CN106086789A (zh) * | 2016-06-30 | 2016-11-09 | 上海交通大学 | 通过磁控溅射在聚酯表面沉积透明导电薄膜的界面层方法 |
CN106847673A (zh) * | 2017-03-12 | 2017-06-13 | 苏州南尔材料科技有限公司 | 一种硅基底氧化锌薄膜的制备方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021018125A1 (zh) * | 2019-08-01 | 2021-02-04 | 杭州三花研究院有限公司 | 换热器及其制备方法、换热系统 |
CN110931657A (zh) * | 2019-12-06 | 2020-03-27 | 中国乐凯集团有限公司 | 一种钙钛矿薄膜太阳能电池用柔性复合衬底及其制备方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Eshaghi et al. | Optical and electrical properties of indium tin oxide (ITO) nanostructured thin films deposited on polycarbonate substrates “thickness effect” | |
CN105449106B (zh) | 一种基于超薄金属的透明电极及其制备方法 | |
CN106098806A (zh) | 一种增强附着力的光电薄膜及其应用 | |
CN101748405B (zh) | 透明导电膜及其制造方法、太阳能电池及平板显示装置 | |
CN102763174A (zh) | 透明导电膜的制造方法及透明导电膜、使用该透明导电膜的元件、透明导电基板以及使用该透明导电基板的器件 | |
EP2717320A1 (en) | Conductive suede glass special for solar cells, and preparation method and application thereof | |
CN102943253A (zh) | 一种掺铝氧化锌透明导电薄膜及其制备方法 | |
CN102157575A (zh) | 新型多层膜结构的透明导电氧化物薄膜及其制备方法 | |
CN103590000A (zh) | 低温沉积柔性晶态氧化铟锡透明导电薄膜的制备方法 | |
CN107385420A (zh) | 一种性能优异的氧化锌薄膜的制备方法 | |
CN104993057B (zh) | 一种采用石墨烯薄膜与金属网复合的透明电极的生产方法 | |
CN106435533A (zh) | 一种制备高性能azo透明导电薄膜的方法 | |
CN105624625A (zh) | 一种提高ZnO/Ag/ZnO透明导电膜光电性能的方法 | |
CN107507675A (zh) | 一种氧化锡导电薄膜的制备方法 | |
CN107326326B (zh) | 一种电学器件用Al掺杂的氧化锌薄膜制备方法 | |
CN106847673A (zh) | 一种硅基底氧化锌薄膜的制备方法 | |
CN1818129A (zh) | 电子束蒸发低温制备锡掺杂氧化铟ito薄膜的方法 | |
CN106920598A (zh) | 一种在硅基底上制备氧化锡导电薄膜的方法 | |
CN107086083A (zh) | 一种具有柔性衬底的金属导电薄膜的制备方法 | |
CN106893984A (zh) | 增强可见光波段透射的掺锡氧化铟基复合薄膜的制备方法 | |
US10103282B2 (en) | Direct texture transparent conductive oxide served as electrode or intermediate layer for photovoltaic and display applications | |
Kim et al. | Properties of working electrodes with IGZO layers in a dye sensitized solar cell | |
CN106024110B (zh) | 一种锡酸锶基柔性透明导电电极及其制备方法 | |
CN102352484A (zh) | 在pet柔性衬底上制备掺钛氧化锌透明导电薄膜的方法 | |
CN104498916B (zh) | 一种无电沉积制备掺铝氧化锌薄膜的方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20171124 |