CN107298613A - A kind of high slow release planting material of mushroom high yield and preparation method thereof - Google Patents

A kind of high slow release planting material of mushroom high yield and preparation method thereof Download PDF

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Publication number
CN107298613A
CN107298613A CN201710627759.6A CN201710627759A CN107298613A CN 107298613 A CN107298613 A CN 107298613A CN 201710627759 A CN201710627759 A CN 201710627759A CN 107298613 A CN107298613 A CN 107298613A
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parts
well mixed
room temperature
mushroom
slow release
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余正红
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Anhui Feng Xing Ecological Agriculture Technology Co Ltd
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Anhui Feng Xing Ecological Agriculture Technology Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C05FERTILISERS; MANUFACTURE THEREOF
    • C05GMIXTURES OF FERTILISERS COVERED INDIVIDUALLY BY DIFFERENT SUBCLASSES OF CLASS C05; MIXTURES OF ONE OR MORE FERTILISERS WITH MATERIALS NOT HAVING A SPECIFIC FERTILISING ACTIVITY, e.g. PESTICIDES, SOIL-CONDITIONERS, WETTING AGENTS; FERTILISERS CHARACTERISED BY THEIR FORM
    • C05G5/00Fertilisers characterised by their form
    • C05G5/10Solid or semi-solid fertilisers, e.g. powders
    • C05G5/12Granules or flakes
    • CCHEMISTRY; METALLURGY
    • C05FERTILISERS; MANUFACTURE THEREOF
    • C05BPHOSPHATIC FERTILISERS
    • C05B1/00Superphosphates, i.e. fertilisers produced by reacting rock or bone phosphates with sulfuric or phosphoric acid in such amounts and concentrations as to yield solid products directly
    • C05B1/02Superphosphates
    • CCHEMISTRY; METALLURGY
    • C05FERTILISERS; MANUFACTURE THEREOF
    • C05FORGANIC FERTILISERS NOT COVERED BY SUBCLASSES C05B, C05C, e.g. FERTILISERS FROM WASTE OR REFUSE
    • C05F17/00Preparation of fertilisers characterised by biological or biochemical treatment steps, e.g. composting or fermentation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E50/00Technologies for the production of fuel of non-fossil origin
    • Y02E50/30Fuel from waste, e.g. synthetic alcohol or diesel
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/40Bio-organic fraction processing; Production of fertilisers from the organic fraction of waste or refuse

Abstract

The invention discloses a kind of high slow release planting material of mushroom high yield, its raw material includes wood chip, cotton seed hulls, tea seed episperm, wheat bran skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, urea, urea phosphate, wheat bran, vinasse, corncob, rape stalk, Controlled-release filler and mould proof auxiliary agent.The present invention also proposes a kind of preparation method of the above-mentioned high slow release planting material of mushroom high yield.The high slow release planting material of mushroom high yield that the present invention is prepared has excellent sustained release performance, can efficiently provide abundant nutriment for mushroom growth, can prevent planting material mildew, improve the yield and quality of mushroom.

Description

A kind of high slow release planting material of mushroom high yield and preparation method thereof
Technical field
The present invention relates to the technical field of cultivating champignon, more particularly to a kind of high slow release planting material of mushroom high yield and its system Preparation Method.
Background technology
Mushroom contains high protein, low fat, polysaccharide, several amino acids and multivitamin as a kind of edible mushroom.Mushroom With a variety of medicinal functions, such as improve body's immunity, anti-oxidant, anti-aging, cancer-resisting, lowering blood pressure and blood fat and Cholesterol, mushroom also has therapeutic action to diabetes, pulmonary tuberculosis, catarrhal jaundice, neuritis etc., can be used for digestion not again Good, constipation etc., therefore, mushroom commands a ready sale in the market.At present, mushroom growth planting type mainly has segment wood cultivated and planted for material Training, segment wood cultivated input and output are high, but need a large amount of timber, cause many timber to waste, are also not suitable for the few ground of forest Area;Substituting stuff cultivation is although with short production cycle, and biological efficiency is also high, and can utilize various agricultural wastes, can be in city Township's broad development, still, the nutriment of the planting material of substituting stuff cultivation are single, and the release efficiency of nutriment is low, and planting material Easy mildew, the demand of actual plantation can not be met by causing the yield and quality of mushroom.
The content of the invention
To solve technical problem present in background technology, the present invention propose a kind of high slow release planting material of mushroom high yield and Its preparation method, the high slow release planting material of mushroom high yield prepared has excellent sustained release performance, can be mushroom growth Abundant nutriment is efficiently provided, planting material mildew can be prevented, the yield and quality of mushroom is improved.
A kind of high slow release planting material of mushroom high yield proposed by the present invention, its raw material includes by weight:Wood chip 20-50 Part, excessively 5-15 parts of cotton seed hulls, 3-5 parts of tea seed episperm, 1-5 parts of wheat bran skin, 2-4 parts of pulverized limestone, 3-5 parts of biogas residue, 1-3 parts of dregs of beans, phosphorus Sour calcium 3-5 parts, 1-3 parts of precipitated calcium carbonate, 3-6 parts of urea, 4-8 parts of urea phosphate, 6-12 parts of wheat bran, 2-5 parts of vinasse, corncob 2- 5 parts, 2-5 parts of rape stalk, 5-15 parts of Controlled-release filler, mould proof auxiliary agent 4-8 parts.
Preferably, the raw material of Controlled-release filler includes by weight:3-9 parts of PLA, 4-8 parts of stannic chloride, tapioca starch 2-8 Part, 1-5 parts of chitosan, 3-6 parts of attapulgite clay, 2-6 parts of acetum, 1-5 parts of cetyl trimethylammonium bromide, poly- second two 3-6 parts of alcohol, 2-5 parts of potassium peroxydisulfate, 4-8 parts of Silane coupling reagent KH-570.
Preferably, Controlled-release filler is prepared by following technique:PLA is heated up, is incubated, is vacuumized, then add chlorine Change tin to be well mixed, continue to heat up, be incubated, decompression is cooled to room temperature material A;By tapioca starch, chitosan, attapulgite clay, vinegar Acid solution and cetyl trimethylammonium bromide are well mixed, stir, washing, and suction filtration is dried, is cooled to room temperature and obtains material B; Then material A, material B, polyethylene glycol, potassium peroxydisulfate and Silane coupling reagent KH-570 are well mixed, heated up, insulation, then Stirring, dries to constant weight after granulation, is cooled to room temperature and obtains Controlled-release filler.
Preferably, Controlled-release filler is prepared by following technique:PLA is warming up to 80-120 DEG C, 30- is incubated 50min, 1-2h is vacuumized in 0.03-0.05MPa, is then added stannic chloride and is well mixed, and is continuously heating to 120-140 DEG C, guarantor Warm 10-20min, is decompressed to 0.05-0.07Mpa, is cooled to room temperature material A;By tapioca starch, chitosan, attapulgite clay, acetic acid Solution and cetyl trimethylammonium bromide are well mixed, and 20-40min is stirred in 650-850r/min rotating speeds, wash, suction filtration, In 80-90 DEG C of dry 1-3h, it is cooled to room temperature and obtains material B;Then by material A, material B, polyethylene glycol, potassium peroxydisulfate and silicon Alkane coupling agent kh-570 is well mixed, and is warming up to 90-120 DEG C, is incubated 20-40min, is then stirred in 1500-2500r/min rotating speeds 2-4h is mixed, is dried after granulation to constant weight, is cooled to room temperature and obtains Controlled-release filler.
Preferably, the raw material of mould proof auxiliary agent includes by weight:3-9 parts of ammonium nitrate, 2-5 parts of polyvinylpyrrolidone, go 4-8 parts of ionized water, 3-5 parts of nano titanium oxide, 2-5 parts of zirconium sulfate, 1-4 parts of sodium chloride, 3-5 parts of silicone emulsion, lignin 2-6 Part, 1-4 parts of nano aluminum nitride, 3-6 parts of lightweight calcium activated, 2-5 parts of zinc stearate, 4-8 parts of epoxychloropropane, two thioamido first Sour sodium 3-4 parts, 2-5 parts of disodium hydrogen phosphate.
Preferably, mould proof auxiliary agent is prepared by following technique:Ammonium nitrate, polyvinylpyrrolidone and deionized water are mixed Close uniform, stirring then heats up, and is incubated, then add nano titanium oxide, zirconium sulfate, sodium chloride and silicone emulsion mixing equal Even, then stirring adds lignin, nano aluminum nitride, lightweight calcium activated, zinc stearate, epoxychloropropane, two thioamido first Sour sodium and disodium hydrogen phosphate are well mixed, and are stirred, and are heated up, and insulation is then dried, and is sieved after grinding, is cooled to room temperature and is prevented Mould auxiliary agent.
Preferably, mould proof auxiliary agent is prepared by following technique:Ammonium nitrate, polyvinylpyrrolidone and deionized water are mixed Close uniform, 20-40min is stirred in 650-850r/min rotating speeds, be then warming up to 60-80 DEG C, be incubated 20-30min, then add Nano titanium oxide, zirconium sulfate, sodium chloride and silicone emulsion are well mixed, and 10- is stirred in 1500-2500r/min rotating speeds 30min, then adds lignin, nano aluminum nitride, lightweight calcium activated, zinc stearate, epoxychloropropane, dithiocarbamate Sodium and disodium hydrogen phosphate are well mixed, and 20-40min is stirred in 3500-4500r/min rotating speeds, are warming up to 80-120 DEG C, insulation 20-40min, then in 80-90 DEG C of dry 2-4h, crosses 40-60 mesh sieves, is cooled to room temperature and obtains mould proof auxiliary agent after grinding.
A kind of preparation method of the high slow release planting material of mushroom high yield of the present invention, comprises the following steps:
S1, by wood chip, cotton seed hulls, tea seed episperm, wheat bran skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, Wheat bran, corncob and the ground 20-40 mesh sieves of rape stalk, are then mixed with water, and are warming up to 80-100 DEG C, are incubated 1- 3h, is cooled to room temperature addition vinasse and is well mixed, in room temperature fermentation 2-6d, then dry to constant weight and obtain material I;
S3, calcium superphosphate, precipitated calcium carbonate, urea is well mixed with urea phosphate, is heated to 135-145 DEG C, is incubated 20- 30min, is cooled to room temperature and obtains material II;
S4, material I and material II be well mixed, be then heated to 50-70 DEG C, 2-4h be incubated, in 3500-5500r/ Min stirs into slurry, then delivers in comminutor slurry and is granulated, and is cooled to room temperature and obtains the high slow release cultivation of mushroom high yield Training material.
A kind of high slow release planting material of mushroom high yield of the present invention, its raw material includes wood chip, cotton seed hulls, tea seed episperm, wheat bran Skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, urea, urea phosphate, wheat bran, vinasse, corncob, rape straw Stalk, Controlled-release filler and mould proof auxiliary agent.Wherein, Controlled-release filler is incubated by the way that PLA is heated up, vacuumizes, then add chlorination Tin is well mixed, and is continued to heat up, is incubated, and decompression is cooled to room temperature material A;By tapioca starch, chitosan, attapulgite clay, acetic acid Solution and cetyl trimethylammonium bromide are well mixed, stir, washing, and suction filtration is dried, is cooled to room temperature and obtains material B;So Material A, material B, polyethylene glycol, potassium peroxydisulfate and Silane coupling reagent KH-570 are well mixed afterwards, heated up, insulation is then stirred Mix, dried after granulation to constant weight, be cooled to room temperature and obtain Controlled-release filler, apply to the high slow release cultivation of mushroom high yield of the present invention In material, release efficiency and quality of the planting material to nutriment material are effectively increased, is that the growth of mushroom is efficiently supported Material supply, effectively increases the yield of mushroom.Wherein, mould proof auxiliary agent is by by ammonium nitrate, polyvinylpyrrolidone and deionization Water is well mixed, stirring, is then heated up, and is incubated, and then adds nano titanium oxide, zirconium sulfate, sodium chloride and silicone emulsion mixed Close uniform, then stirring adds lignin, nano aluminum nitride, lightweight calcium activated, zinc stearate, epoxychloropropane, two thio amine Base sodium formate and disodium hydrogen phosphate are well mixed, stir, and heat up, and insulation is then dried, and is sieved after grinding, is cooled to room temperature and obtains To mould proof auxiliary agent, in the high slow release planting material of mushroom high yield for applying to the present invention, planting material mildew when in use can be avoided, The growing environment of health is provided for the growth of mushroom, the yield and quality of mushroom is effectively increased.What the present invention was prepared The high slow release planting material of mushroom high yield has excellent sustained release performance, can efficiently provide abundant nutrients for mushroom growth Matter, can prevent planting material mildew, improve the yield and quality of mushroom.
Embodiment
The present invention is described in detail with reference to specific embodiment, it should be appreciated that embodiment is served only for illustrating this hair It is bright, rather than for limiting the invention, any modification made on the basis of the present invention, equivalent substitution etc. are in this hair In bright protection domain.
In embodiment, the parts by weight of wood chip can be 20 parts, 25 parts, 30 parts, 35 parts, 40 parts, 45 parts, 50 parts; The parts by weight of cotton seed hulls can be 5 parts, 6 parts, 7 parts, 8 parts, 9 parts, 10 parts, 11 parts, 12 parts, 13 parts, 14 parts, 15 parts;Tea seed episperm Parts by weight can be 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts;The parts by weight of wheat bran skin can for 1 part, 2 parts, 3 parts, 4 parts, 5 Part;The parts by weight of pulverized limestone can be 2 parts, 2.5 parts, 3 parts, 3.5 parts, 4 parts;The parts by weight of biogas residue can for 3 parts, 3.5 parts, 4 Part, 4.5 parts, 5 parts;The parts by weight of dregs of beans can be 1 part, 1.5 parts, 2 parts, 2.5 parts, 3 parts;The parts by weight of calcium superphosphate can be 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts;The parts by weight of precipitated calcium carbonate can be 1 part, 1.5 parts, 2 parts, 2.5 parts, 3 parts;Urea Parts by weight can be 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts, 5.5 parts, 6 parts;The parts by weight of urea phosphate can for 4 parts, 4.5 Part, 5 parts, 5.5 parts, 6 parts, 6.5 parts, 7 parts, 7.5 parts, 8 parts;The parts by weight of wheat bran can for 6 parts, 7 parts, 8 parts, 9 parts, 10 parts, 11 parts, 12 parts;The parts by weight of vinasse can be 2 parts, 2.5 parts, 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts;The parts by weight of corncob It can be 2 parts, 2.5 parts, 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts;The parts by weight of rape stalk can for 2 parts, 2.5 parts, 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts;The parts by weight of Controlled-release filler can for 5 parts, 6 parts, 7 parts, 8 parts, 9 parts, 10 parts, 11 parts, 12 parts, 13 parts, 14 parts, 15 parts;The parts by weight of mould proof auxiliary agent can be 4 parts, 5 parts, 6 parts, 7 parts, 8 parts.
Embodiment 1
A kind of high slow release planting material of mushroom high yield proposed by the present invention, its raw material includes by weight:35 parts of wood chip, cotton 10 parts of seed shell, 4 parts of tea seed episperm, 3 parts of wheat bran skin, 3 parts of pulverized limestone, 4 parts of biogas residue, 2 parts of dregs of beans, 4 parts of calcium superphosphate, precipitated calcium carbonate 2 parts, 4.5 parts of urea, 6 parts of urea phosphate, 8 parts of wheat bran, 3.5 parts of vinasse, 3.5 parts of corncob, 3.5 parts of rape stalk, Controlled-release filler 10 parts, 6 parts of mould proof auxiliary agent.
Embodiment 2
A kind of high slow release planting material of mushroom high yield proposed by the present invention, its raw material includes by weight:20 parts of wood chip, cotton 15 parts of seed shell, 3 parts of tea seed episperm, 5 parts of wheat bran skin, 2 parts of pulverized limestone, 5 parts of biogas residue, 1 part of dregs of beans, 5 parts of calcium superphosphate, precipitated calcium carbonate 1 part, it is 6 parts of urea, 4 parts of urea phosphate, 12 parts of wheat bran, 2 parts of vinasse, 5 parts of corncob, 2 parts of rape stalk, 15 parts of Controlled-release filler, anti- Mould 4 parts of auxiliary agent.
Controlled-release filler is prepared by following technique:3 parts of PLAs are warming up to 120 DEG C by weight, 30min is incubated, 1h is vacuumized in 0.05MPa, 8 parts of stannic chlorides is then added and is well mixed, be continuously heating to 120 DEG C, be incubated 20min, be decompressed to 0.05Mpa, is cooled to room temperature material A;By 8 parts of tapioca starch, 1 part of chitosan, 6 parts of attapulgite clays, 2 parts of acetums and 5 parts Cetyl trimethylammonium bromide is well mixed, and 40min is stirred in 650r/min rotating speeds, is washed, suction filtration, in 80 DEG C of dry 3h, It is cooled to room temperature and obtains material B;Then by material A, material B, 3 parts of polyethylene glycol, 5 parts of potassium peroxydisulfates and 4 parts of silane couplers KH-570 is well mixed, and is warming up to 120 DEG C, is incubated 20min, then stirs 2h in 2500r/min rotating speeds, is dried after granulation to perseverance Weight, is cooled to room temperature and obtains Controlled-release filler.
Mould proof auxiliary agent is prepared by following technique:By weight by 3 parts of ammonium nitrate, 5 parts of polyvinylpyrrolidones and 4 parts Deionized water is well mixed, and 20min is stirred in 850r/min rotating speeds, is then warming up to 80 DEG C, is incubated 20min, then adds 5 parts Nano titanium oxide, 2 parts of zirconium sulfates, 4 parts of sodium chloride and 3 parts of silicone emulsions are well mixed, in the stirring of 2500r/min rotating speeds 10min, then adds 6 parts of lignin, 1 part of nano aluminum nitride, 6 parts of lightweight calcium activateds, 2 parts of zinc stearates, 8 parts of epoxy chloropropionates Alkane, 3 parts of dithiocarbamate sodium and 5 parts of disodium hydrogen phosphates are well mixed, and are stirred 40min in 3500r/min rotating speeds, are warming up to 80 DEG C, 40min is incubated, then in 80 DEG C of dry 4h, 40 mesh sieves is crossed after grinding, room temperature is cooled to and obtains mould proof auxiliary agent.
Embodiment 3
A kind of high slow release planting material of mushroom high yield proposed by the present invention, its raw material includes by weight:50 parts of wood chip, cotton 5 parts of seed shell, 5 parts of tea seed episperm, 1 part of wheat bran skin, 4 parts of pulverized limestone, 3 parts of biogas residue, 3 parts of dregs of beans, 3 parts of calcium superphosphate, precipitated calcium carbonate 3 Part, 3 parts of urea, 8 parts of urea phosphate, 6 parts of wheat bran, 5 parts of vinasse, 2 parts of corncob, 5 parts of rape stalk, 5 parts of Controlled-release filler, mould proof help 8 parts of agent.
A kind of preparation method of the high slow release planting material of mushroom high yield of the present invention, comprises the following steps:
S1, by wood chip, cotton seed hulls, tea seed episperm, wheat bran skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, Wheat bran, corncob and ground 40 mesh sieve of rape stalk, are then mixed with water, and are warming up to 80 DEG C, are incubated 3h, are cooled to room Temperature adds vinasse and is well mixed, and in room temperature fermentation 2d, then dries to constant weight and obtains material I;
S3, calcium superphosphate, precipitated calcium carbonate, urea is well mixed with urea phosphate, is heated to 145 DEG C, is incubated 20min, It is cooled to room temperature and obtains material II;
S4, material I and material II be well mixed, be then heated to 70 DEG C, be incubated 2h, slurry is stirred into 5500r/min Material, then slurry is delivered in comminutor and is granulated, be cooled to room temperature and obtain the high slow release planting material of mushroom high yield.
Embodiment 4
A kind of high slow release planting material of mushroom high yield proposed by the present invention, its raw material includes by weight:25 parts of wood chip, cotton 12 parts of seed shell, 3.5 parts of tea seed episperm, 4 parts of wheat bran skin, 2.5 parts of pulverized limestone, 4.5 parts of biogas residue, 1.5 parts of dregs of beans, 4.5 parts of calcium superphosphate, 1.5 parts of precipitated calcium carbonate, 5 parts of urea, 5 parts of urea phosphate, 11 parts of wheat bran, 3 parts of vinasse, 4 parts of corncob, 3 parts of rape stalk, sustained release 12 parts of filler, 5 parts of mould proof auxiliary agent.
Controlled-release filler is prepared by following technique:4 parts of PLAs are warming up to 115 DEG C by weight, 35min is incubated, 1.2h is vacuumized in 0.045MPa, 7 parts of stannic chlorides is then added and is well mixed, be continuously heating to 125 DEG C, 18min, decompression is incubated To 0.055Mpa, room temperature material A is cooled to;By 7 parts of tapioca starch, 2 parts of chitosans, 5 parts of attapulgite clays, 3 parts of acetums and 4 Part cetyl trimethylammonium bromide is well mixed, and 35min, washing, suction filtration, in 82 DEG C of dryings are stirred in 680r/min rotating speeds 2.5h, is cooled to room temperature and obtains material B;Then by material A, material B, 4 parts of polyethylene glycol, 4 parts of potassium peroxydisulfates and 5 parts of silane idols Join agent KH-570 to be well mixed, be warming up to 115 DEG C, be incubated 25min, then stir 2.5h in 2200r/min rotating speeds, done after granulation It is dry to constant weight, be cooled to room temperature and obtain Controlled-release filler.
Mould proof auxiliary agent is prepared by following technique:By weight by 4 parts of ammonium nitrate, 4 parts of polyvinylpyrrolidones and 5 parts Deionized water is well mixed, and 25min is stirred in 820r/min rotating speeds, is then warming up to 75 DEG C, is incubated 22min, is then added 4.5 Part nano titanium oxide, 3 parts of zirconium sulfates, 3 parts of sodium chloride and 3.5 parts of silicone emulsions are well mixed, in the stirring of 2200r/min rotating speeds 15min, then adds 5 parts of lignin, 2 parts of nano aluminum nitrides, 5 parts of lightweight calcium activateds, 3 parts of zinc stearates, 7 parts of epoxy chloropropionates Alkane, 3.2 parts of dithiocarbamate sodium and 4 parts of disodium hydrogen phosphates are well mixed, and 35min, heating are stirred in 3800r/min rotating speeds To 85 DEG C, 35min is incubated, then in 82 DEG C of dry 3.5h, 45 mesh sieves is crossed after grinding, room temperature is cooled to and obtains mould proof auxiliary agent.
A kind of preparation method of the high slow release planting material of mushroom high yield of the present invention, comprises the following steps:
S1, by wood chip, cotton seed hulls, tea seed episperm, wheat bran skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, Wheat bran, corncob and ground 25 mesh sieve of rape stalk, are then mixed with water, and are warming up to 95 DEG C, are incubated 1.5h, are cooled to Room temperature adds vinasse and is well mixed, and in room temperature fermentation 5d, then dries to constant weight and obtains material I;
S3, calcium superphosphate, precipitated calcium carbonate, urea is well mixed with urea phosphate, is heated to 138 DEG C, is incubated 28min, It is cooled to room temperature and obtains material II;
S4, material I and material II be well mixed, be then heated to 55 DEG C, be incubated 3.5h, stirred into 3800r/min Slurry, then slurry is delivered in comminutor granulated, and is cooled to room temperature and obtains the high slow release planting material of mushroom high yield.
Embodiment 5
A kind of high slow release planting material of mushroom high yield proposed by the present invention, its raw material includes by weight:45 parts of wood chip, cotton 8 parts of seed shell, 4.5 parts of tea seed episperm, 2 parts of wheat bran skin, 3.5 parts of pulverized limestone, 3.5 parts of biogas residue, 2.5 parts of dregs of beans, 3.5 parts of calcium superphosphate, 2.5 parts of precipitated calcium carbonate, 4 parts of urea, 7 parts of urea phosphate, 7 parts of wheat bran, 4 parts of vinasse, 3 parts of corncob, 4 parts of rape stalk, sustained release 8 parts of filler, 7 parts of mould proof auxiliary agent.
Controlled-release filler is prepared by following technique:8 parts of PLAs are warming up to 85 DEG C by weight, 45min is incubated, in 0.035MPa vacuumizes 1.8h, then adds 5 parts of stannic chlorides and is well mixed, be continuously heating to 135 DEG C, is incubated 12min, is decompressed to 0.065Mpa, is cooled to room temperature material A;By 3 parts of tapioca starch, 4 parts of chitosans, 4 parts of attapulgite clays, 5 parts of acetums and 2 parts Cetyl trimethylammonium bromide is well mixed, and 25min, washing, suction filtration, in 88 DEG C of dryings are stirred in 820r/min rotating speeds 1.5h, is cooled to room temperature and obtains material B;Then by material A, material B, 5 parts of polyethylene glycol, 3 parts of potassium peroxydisulfates and 7 parts of silane idols Join agent KH-570 to be well mixed, be warming up to 95 DEG C, be incubated 35min, then stir 3.5h in 1800r/min rotating speeds, done after granulation It is dry to constant weight, be cooled to room temperature and obtain Controlled-release filler.
Mould proof auxiliary agent is prepared by following technique:By weight by 8 parts of ammonium nitrate, 3 parts of polyvinylpyrrolidones and 7 parts Deionized water is well mixed, and 35min is stirred in 680r/min rotating speeds, is then warming up to 65 DEG C, is incubated 28min, is then added 3.5 Part nano titanium oxide, 4 parts of zirconium sulfates, 2 parts of sodium chloride and 4.5 parts of silicone emulsions are well mixed, in the stirring of 1800r/min rotating speeds 25min, then adds 3 parts of lignin, 3 parts of nano aluminum nitrides, 4 parts of lightweight calcium activateds, 4 parts of zinc stearates, 5 parts of epoxy chloropropionates Alkane, 3.8 parts of dithiocarbamate sodium and 3 parts of disodium hydrogen phosphates are well mixed, and 25min, heating are stirred in 4200r/min rotating speeds To 115 DEG C, 25min is incubated, then in 88 DEG C of dry 2.5h, 55 mesh sieves is crossed after grinding, room temperature is cooled to and obtains mould proof auxiliary agent.
A kind of preparation method of the high slow release planting material of mushroom high yield of the present invention, comprises the following steps:
S1, by wood chip, cotton seed hulls, tea seed episperm, wheat bran skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, Wheat bran, corncob and ground 35 mesh sieve of rape stalk, are then mixed with water, and are warming up to 85 DEG C, are incubated 2.5h, are cooled to Room temperature adds vinasse and is well mixed, and in room temperature fermentation 3d, then dries to constant weight and obtains material I;
S3, calcium superphosphate, precipitated calcium carbonate, urea is well mixed with urea phosphate, is heated to 142 DEG C, is incubated 22min, It is cooled to room temperature and obtains material II;
S4, material I and material II be well mixed, be then heated to 65 DEG C, be incubated 2.5h, stirred into 5200r/min Slurry, then slurry is delivered in comminutor granulated, and is cooled to room temperature and obtains the high slow release planting material of mushroom high yield.
The foregoing is only a preferred embodiment of the present invention, but protection scope of the present invention be not limited thereto, Any one skilled in the art the invention discloses technical scope in, technique according to the invention scheme and its Inventive concept is subject to equivalent substitution or change, should all be included within the scope of the present invention.

Claims (8)

1. a kind of high slow release planting material of mushroom high yield, it is characterised in that its raw material includes by weight:20-50 parts of wood chip, cotton 5-15 parts of seed shell, 3-5 parts of tea seed episperm, 1-5 parts of wheat bran skin, 2-4 parts of pulverized limestone, 3-5 parts of biogas residue, 1-3 parts of dregs of beans, calcium superphosphate 3- 5 parts, 1-3 parts of precipitated calcium carbonate, 3-6 parts of urea, 4-8 parts of urea phosphate, 6-12 parts of wheat bran, 2-5 parts of vinasse, 2-5 parts of corncob, oil 2-5 parts of dish stalk, 5-15 parts of Controlled-release filler, mould proof auxiliary agent 4-8 parts.
2. the high slow release planting material of mushroom high yield according to claim 1, it is characterised in that the raw material of Controlled-release filler is by weight Amount part includes:3-9 parts of PLA, 4-8 parts of stannic chloride, 2-8 parts of tapioca starch, 1-5 parts of chitosan, 3-6 parts of attapulgite clay, acetic acid 2-6 parts of solution, 1-5 parts of cetyl trimethylammonium bromide, 3-6 parts of polyethylene glycol, 2-5 parts of potassium peroxydisulfate, silane coupler KH- 570 4-8 parts.
3. the high slow release planting material of mushroom high yield according to claim 1 or 2, it is characterised in that Controlled-release filler is by as follows It is prepared by technique:PLA is heated up, is incubated, vacuumizes, stannic chloride is then added and is well mixed, continues to heat up, insulation subtracts Pressure, is cooled to room temperature material A;By tapioca starch, chitosan, attapulgite clay, acetum and cetyl trimethylammonium bromide It is well mixed, stir, washing, suction filtration is dried, is cooled to room temperature and obtains material B;Then by material A, material B, polyethylene glycol, Potassium peroxydisulfate and Silane coupling reagent KH-570 are well mixed, heat up, and insulation is followed by stirring for, and is dried to constant weight, is cooled to after granulation Room temperature obtains Controlled-release filler.
4. the high slow release planting material of mushroom high yield according to claim any one of 1-3, it is characterised in that Controlled-release filler is pressed It is prepared by following technique:PLA is warming up to 80-120 DEG C, 30-50min is incubated, 1- is vacuumized in 0.03-0.05MPa 2h, then adds stannic chloride and is well mixed, be continuously heating to 120-140 DEG C, be incubated 10-20min, be decompressed to 0.05- 0.07Mpa, is cooled to room temperature material A;By tapioca starch, chitosan, attapulgite clay, acetum and cetyl trimethyl bromine Change ammonium to be well mixed, 20-40min, washing, suction filtration, in 80-90 DEG C of dry 1-3h, cooling are stirred in 650-850r/min rotating speeds Material B is obtained to room temperature;Then material A, material B, polyethylene glycol, potassium peroxydisulfate and Silane coupling reagent KH-570 are mixed equal It is even, 90-120 DEG C is warming up to, 20-40min is incubated, then 2-4h is stirred in 1500-2500r/min rotating speeds, dried extremely after granulation Constant weight, is cooled to room temperature and obtains Controlled-release filler.
5. the high slow release planting material of mushroom high yield according to claim any one of 1-4, it is characterised in that mould proof auxiliary agent Raw material includes by weight:3-9 parts of ammonium nitrate, 2-5 parts of polyvinylpyrrolidone, 4-8 parts of deionized water, nano titanium oxide 3- 5 parts, 2-5 parts of zirconium sulfate, 1-4 parts of sodium chloride, 3-5 parts of silicone emulsion, 2-6 parts of lignin, 1-4 parts of nano aluminum nitride, lightweight live 3-6 parts of calcium of property, 2-5 parts of zinc stearate, 4-8 parts of epoxychloropropane, 3-4 parts of dithiocarbamate sodium, disodium hydrogen phosphate 2-5 Part.
6. the high slow release planting material of mushroom high yield according to claim any one of 1-5, it is characterised in that mould proof auxiliary agent is pressed It is prepared by following technique:Ammonium nitrate, polyvinylpyrrolidone and deionized water are well mixed, stirs, then heats up, is protected Temperature, it is well mixed then to add nano titanium oxide, zirconium sulfate, sodium chloride and silicone emulsion, stirring, then add lignin, Nano aluminum nitride, lightweight calcium activated, zinc stearate, epoxychloropropane, dithiocarbamate sodium and disodium hydrogen phosphate mixing are equal It is even, stir, heat up, insulation is then dried, and is sieved after grinding, is cooled to room temperature and obtains mould proof auxiliary agent.
7. the high slow release planting material of mushroom high yield according to claim any one of 1-6, it is characterised in that mould proof auxiliary agent is pressed It is prepared by following technique:Ammonium nitrate, polyvinylpyrrolidone and deionized water are well mixed, in 650-850r/min rotating speeds 20-40min is stirred, 60-80 DEG C is then warming up to, 20-30min is incubated, nano titanium oxide, zirconium sulfate, chlorination is then added Sodium and silicone emulsion are well mixed, and 10-30min is stirred in 1500-2500r/min rotating speeds, then add lignin, nano silicon nitride Aluminium, lightweight calcium activated, zinc stearate, epoxychloropropane, dithiocarbamate sodium and disodium hydrogen phosphate are well mixed, in 3500-4500r/min rotating speeds stir 20-40min, are warming up to 80-120 DEG C, 20-40min are incubated, then in 80-90 DEG C of drying 2-4h, crosses 40-60 mesh sieves, is cooled to room temperature and obtains mould proof auxiliary agent after grinding.
8. a kind of preparation method of the high slow release planting material of mushroom high yield according to claim any one of 1-7, its feature It is, comprises the following steps:
S1, by wood chip, cotton seed hulls, tea seed episperm, wheat bran skin, pulverized limestone, biogas residue, dregs of beans, calcium superphosphate, precipitated calcium carbonate, wheat bran, Corncob and the ground 20-40 mesh sieves of rape stalk, are then mixed with water, and are warming up to 80-100 DEG C, are incubated 1-3h, cooling Vinasse is added to room temperature to be well mixed, and in room temperature fermentation 2-6d, is then dried to constant weight and is obtained material I;
S3, calcium superphosphate, precipitated calcium carbonate, urea is well mixed with urea phosphate, is heated to 135-145 DEG C, is incubated 20- 30min, is cooled to room temperature and obtains material II;
S4, material I and material II be well mixed, be then heated to 50-70 DEG C, be incubated 2-4h, stirred in 3500-5500r/min Slurry is mixed, then slurry is delivered in comminutor and granulated, room temperature is cooled to and obtains the high slow release planting material of mushroom high yield.
CN201710627759.6A 2017-07-28 2017-07-28 A kind of high slow release planting material of mushroom high yield and preparation method thereof Withdrawn CN107298613A (en)

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CN108383648A (en) * 2018-05-24 2018-08-10 贵州益寿农业科技有限公司 A kind of mushroom culture medium and preparation method thereof of oil-containing tea seed episperm
CN108934784A (en) * 2018-10-18 2018-12-07 安徽铜草花现代农业科技有限公司 A kind of mushroom high-yield culturing culture medium
CN110574636A (en) * 2019-10-14 2019-12-17 贵州同辉食用菌发展有限公司 High-quality shiitake mushroom stick and preparation method thereof

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CN103467175A (en) * 2013-08-15 2013-12-25 安徽中祝农业发展有限公司 Shiitake cultivation medium and preparation method thereof
CN106396935A (en) * 2016-08-31 2017-02-15 贵定县金盛绿色科技发展有限公司 Slow release fertilizer formula for apples
CN106608749A (en) * 2015-10-21 2017-05-03 代戡 Shiitake mushroom special slow-release nutritional agent and preparation method thereof

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CN103467175A (en) * 2013-08-15 2013-12-25 安徽中祝农业发展有限公司 Shiitake cultivation medium and preparation method thereof
CN106608749A (en) * 2015-10-21 2017-05-03 代戡 Shiitake mushroom special slow-release nutritional agent and preparation method thereof
CN106396935A (en) * 2016-08-31 2017-02-15 贵定县金盛绿色科技发展有限公司 Slow release fertilizer formula for apples

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108383648A (en) * 2018-05-24 2018-08-10 贵州益寿农业科技有限公司 A kind of mushroom culture medium and preparation method thereof of oil-containing tea seed episperm
CN108383648B (en) * 2018-05-24 2020-08-25 贵州益寿农业科技有限公司 Preparation method of mushroom culture medium containing camellia seed shells
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CN110574636A (en) * 2019-10-14 2019-12-17 贵州同辉食用菌发展有限公司 High-quality shiitake mushroom stick and preparation method thereof

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Application publication date: 20171027