CN107130290B - 单晶的制造方法和制造装置 - Google Patents
单晶的制造方法和制造装置 Download PDFInfo
- Publication number
- CN107130290B CN107130290B CN201710111932.7A CN201710111932A CN107130290B CN 107130290 B CN107130290 B CN 107130290B CN 201710111932 A CN201710111932 A CN 201710111932A CN 107130290 B CN107130290 B CN 107130290B
- Authority
- CN
- China
- Prior art keywords
- monocrystalline
- maximum brightness
- row
- diameter
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/26—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using television detectors; using photo or X-ray detectors
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016036629A JP6447537B2 (ja) | 2016-02-29 | 2016-02-29 | 単結晶の製造方法および製造装置 |
| JP2016-036629 | 2016-02-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107130290A CN107130290A (zh) | 2017-09-05 |
| CN107130290B true CN107130290B (zh) | 2019-07-30 |
Family
ID=59721692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710111932.7A Active CN107130290B (zh) | 2016-02-29 | 2017-02-28 | 单晶的制造方法和制造装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6447537B2 (https=) |
| CN (1) | CN107130290B (https=) |
| TW (1) | TWI615513B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107818559B (zh) * | 2017-09-22 | 2021-08-20 | 太原理工大学 | 晶体接种状态检测方法和晶体接种状态图像的采集装置 |
| JP6885301B2 (ja) * | 2017-11-07 | 2021-06-09 | 株式会社Sumco | 単結晶の製造方法及び装置 |
| DE112020006173T5 (de) * | 2019-12-18 | 2022-11-17 | Sumco Corporation | Einkristall-Herstellungssystem und Einkristall-Herstellungsverfahren |
| TWI770661B (zh) * | 2020-04-20 | 2022-07-11 | 日商Sumco股份有限公司 | 單結晶製造裝置及單結晶的製造方法 |
| CN115682966A (zh) * | 2021-07-29 | 2023-02-03 | 内蒙古中环协鑫光伏材料有限公司 | 一种等径制程中硅棒在线直径的检测方法 |
| CN114926440A (zh) * | 2022-05-26 | 2022-08-19 | 之江实验室 | 一种基于同心椭圆弦长比的单晶硅直径检测方法及装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI911856A7 (fi) * | 1990-04-27 | 1991-10-28 | Nippon Kokan Kk | Foerfarande och apparat foer bestaemning av diametern hos en enskild silikonkristall. |
| JP3484758B2 (ja) * | 1994-05-17 | 2004-01-06 | 三菱住友シリコン株式会社 | 結晶成長装置及び結晶成長方法 |
| US5922127A (en) * | 1997-09-30 | 1999-07-13 | Memc Electronic Materials, Inc. | Heat shield for crystal puller |
| JP4089500B2 (ja) * | 2003-05-06 | 2008-05-28 | 株式会社Sumco | 単結晶引き上げ装置内の融液の液面位置測定方法 |
| JP4918897B2 (ja) * | 2007-08-29 | 2012-04-18 | 株式会社Sumco | シリコン単結晶引上方法 |
| TWI411709B (zh) * | 2009-03-27 | 2013-10-11 | Sumco Corp | 單晶直徑的控制方法 |
| JP5678635B2 (ja) * | 2010-12-13 | 2015-03-04 | 株式会社Sumco | シリコン単結晶の製造装置、シリコン単結晶の製造方法 |
| JP5664573B2 (ja) * | 2012-02-21 | 2015-02-04 | 信越半導体株式会社 | シリコン融液面の高さ位置の算出方法およびシリコン単結晶の引上げ方法ならびにシリコン単結晶引上げ装置 |
| JP6078974B2 (ja) * | 2012-04-04 | 2017-02-15 | 株式会社Sumco | シリコン単結晶の製造方法 |
| JP5924090B2 (ja) * | 2012-04-12 | 2016-05-25 | 株式会社Sumco | 単結晶引き上げ方法 |
-
2016
- 2016-02-29 JP JP2016036629A patent/JP6447537B2/ja active Active
- 2016-11-07 TW TW105136099A patent/TWI615513B/zh active
-
2017
- 2017-02-28 CN CN201710111932.7A patent/CN107130290B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN107130290A (zh) | 2017-09-05 |
| JP2017154901A (ja) | 2017-09-07 |
| TWI615513B (zh) | 2018-02-21 |
| TW201732097A (zh) | 2017-09-16 |
| JP6447537B2 (ja) | 2019-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107130290B (zh) | 单晶的制造方法和制造装置 | |
| KR101416093B1 (ko) | 차열 부재 하단면과 원료 융액면 사이의 거리 측정방법 및 그 거리 제어방법 | |
| TWI596243B (zh) | 單結晶的製造方法及裝置 | |
| CN109750352B (zh) | 单晶的制造方法及装置 | |
| KR101729472B1 (ko) | 차열부재 하단면과 원료 융액면 사이의 거리 측정 방법 및 제어 방법, 그리고 실리콘 단결정의 제조 방법 | |
| JP6477356B2 (ja) | 単結晶の製造方法および製造装置 | |
| JP6465008B2 (ja) | シリコン単結晶の製造方法 | |
| JP6645406B2 (ja) | 単結晶の製造方法 | |
| TW202140865A (zh) | 單結晶製造裝置及單結晶的製造方法 | |
| WO2018116590A1 (ja) | シリコン単結晶の製造方法、熱遮蔽体および単結晶引き上げ装置 | |
| JP6939714B2 (ja) | 融液面と種結晶の間隔測定方法、種結晶の予熱方法、及び単結晶の製造方法 | |
| US20250043459A1 (en) | Manufacturing method of single crystal and single crystal manufacturing device | |
| TWI782726B (zh) | 單結晶的製造方法 | |
| KR102783938B1 (ko) | 실리콘 단결정의 제조 방법 및 장치 그리고 실리콘 웨이퍼의 제조 방법 | |
| JP7845123B2 (ja) | シリコン単結晶の製造システム及び製造方法 | |
| JP2011032136A (ja) | 液面高さレベル把握方法 | |
| KR20260055413A (ko) | 실리콘 원료의 높이의 변화량의 측정 방법 및 이를 이용한 실리콘 단결정의 제조 방법 및 실리콘 단결정 제조 장치 | |
| TW202526113A (zh) | 矽原料的高度的變化量的測定方法及使用其之矽單結晶的製造方法及矽單結晶製造裝置 | |
| TW202227681A (zh) | 引晶位置的檢測方式 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |