JP6447537B2 - 単結晶の製造方法および製造装置 - Google Patents
単結晶の製造方法および製造装置 Download PDFInfo
- Publication number
- JP6447537B2 JP6447537B2 JP2016036629A JP2016036629A JP6447537B2 JP 6447537 B2 JP6447537 B2 JP 6447537B2 JP 2016036629 A JP2016036629 A JP 2016036629A JP 2016036629 A JP2016036629 A JP 2016036629A JP 6447537 B2 JP6447537 B2 JP 6447537B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- diameter
- row
- luminance
- fusion ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/26—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using television detectors; using photo or X-ray detectors
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016036629A JP6447537B2 (ja) | 2016-02-29 | 2016-02-29 | 単結晶の製造方法および製造装置 |
| TW105136099A TWI615513B (zh) | 2016-02-29 | 2016-11-07 | 單晶的製造方法及製造裝置 |
| CN201710111932.7A CN107130290B (zh) | 2016-02-29 | 2017-02-28 | 单晶的制造方法和制造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016036629A JP6447537B2 (ja) | 2016-02-29 | 2016-02-29 | 単結晶の製造方法および製造装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017154901A JP2017154901A (ja) | 2017-09-07 |
| JP2017154901A5 JP2017154901A5 (https=) | 2018-05-10 |
| JP6447537B2 true JP6447537B2 (ja) | 2019-01-09 |
Family
ID=59721692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016036629A Active JP6447537B2 (ja) | 2016-02-29 | 2016-02-29 | 単結晶の製造方法および製造装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6447537B2 (https=) |
| CN (1) | CN107130290B (https=) |
| TW (1) | TWI615513B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107818559B (zh) * | 2017-09-22 | 2021-08-20 | 太原理工大学 | 晶体接种状态检测方法和晶体接种状态图像的采集装置 |
| JP6885301B2 (ja) * | 2017-11-07 | 2021-06-09 | 株式会社Sumco | 単結晶の製造方法及び装置 |
| DE112020006173T5 (de) * | 2019-12-18 | 2022-11-17 | Sumco Corporation | Einkristall-Herstellungssystem und Einkristall-Herstellungsverfahren |
| TWI770661B (zh) * | 2020-04-20 | 2022-07-11 | 日商Sumco股份有限公司 | 單結晶製造裝置及單結晶的製造方法 |
| CN115682966A (zh) * | 2021-07-29 | 2023-02-03 | 内蒙古中环协鑫光伏材料有限公司 | 一种等径制程中硅棒在线直径的检测方法 |
| CN114926440A (zh) * | 2022-05-26 | 2022-08-19 | 之江实验室 | 一种基于同心椭圆弦长比的单晶硅直径检测方法及装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI911856A7 (fi) * | 1990-04-27 | 1991-10-28 | Nippon Kokan Kk | Foerfarande och apparat foer bestaemning av diametern hos en enskild silikonkristall. |
| JP3484758B2 (ja) * | 1994-05-17 | 2004-01-06 | 三菱住友シリコン株式会社 | 結晶成長装置及び結晶成長方法 |
| US5922127A (en) * | 1997-09-30 | 1999-07-13 | Memc Electronic Materials, Inc. | Heat shield for crystal puller |
| JP4089500B2 (ja) * | 2003-05-06 | 2008-05-28 | 株式会社Sumco | 単結晶引き上げ装置内の融液の液面位置測定方法 |
| JP4918897B2 (ja) * | 2007-08-29 | 2012-04-18 | 株式会社Sumco | シリコン単結晶引上方法 |
| TWI411709B (zh) * | 2009-03-27 | 2013-10-11 | Sumco Corp | 單晶直徑的控制方法 |
| JP5678635B2 (ja) * | 2010-12-13 | 2015-03-04 | 株式会社Sumco | シリコン単結晶の製造装置、シリコン単結晶の製造方法 |
| JP5664573B2 (ja) * | 2012-02-21 | 2015-02-04 | 信越半導体株式会社 | シリコン融液面の高さ位置の算出方法およびシリコン単結晶の引上げ方法ならびにシリコン単結晶引上げ装置 |
| JP6078974B2 (ja) * | 2012-04-04 | 2017-02-15 | 株式会社Sumco | シリコン単結晶の製造方法 |
| JP5924090B2 (ja) * | 2012-04-12 | 2016-05-25 | 株式会社Sumco | 単結晶引き上げ方法 |
-
2016
- 2016-02-29 JP JP2016036629A patent/JP6447537B2/ja active Active
- 2016-11-07 TW TW105136099A patent/TWI615513B/zh active
-
2017
- 2017-02-28 CN CN201710111932.7A patent/CN107130290B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN107130290A (zh) | 2017-09-05 |
| JP2017154901A (ja) | 2017-09-07 |
| TWI615513B (zh) | 2018-02-21 |
| TW201732097A (zh) | 2017-09-16 |
| CN107130290B (zh) | 2019-07-30 |
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