CN107003616B - 包含多个单独可控的写入头的光刻设备 - Google Patents

包含多个单独可控的写入头的光刻设备 Download PDF

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Publication number
CN107003616B
CN107003616B CN201580064789.XA CN201580064789A CN107003616B CN 107003616 B CN107003616 B CN 107003616B CN 201580064789 A CN201580064789 A CN 201580064789A CN 107003616 B CN107003616 B CN 107003616B
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China
Prior art keywords
light
substrate wafer
write head
scanning
spot
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Chinese (zh)
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CN107003616A (zh
Inventor
S.里克特
E.盖斯勒
D.多林
S.K.拉克什马南
G.鲁道夫
M.沃尔克
M.德冈瑟
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201580064789.XA 2014-11-27 2015-04-28 包含多个单独可控的写入头的光刻设备 Active CN107003616B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014224314.9 2014-11-27
DE102014224314 2014-11-27
PCT/EP2015/059143 WO2016082941A1 (en) 2014-11-27 2015-04-28 Lithography apparatus comprising a plurality of individually controllable write heads

Publications (2)

Publication Number Publication Date
CN107003616A CN107003616A (zh) 2017-08-01
CN107003616B true CN107003616B (zh) 2021-11-30

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CN201580064789.XA Active CN107003616B (zh) 2014-11-27 2015-04-28 包含多个单独可控的写入头的光刻设备

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Country Link
US (2) US20170255110A1 (https=)
EP (1) EP3224675A1 (https=)
JP (2) JP2017535821A (https=)
KR (2) KR102415072B1 (https=)
CN (1) CN107003616B (https=)
TW (2) TWI707207B (https=)
WO (1) WO2016082941A1 (https=)

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TWI707207B (zh) 2014-11-27 2020-10-11 德商卡爾蔡司Ｓｍｔ有限公司 包含多個可個別控制之寫入頭的微影裝置
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US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
TWI905274B (zh) * 2021-09-24 2025-11-21 日商信越化學工業股份有限公司 掃描型縮小投影光學系統、雷射加工裝置、雷射誘導正向轉移裝置、雷射加工方法、雷射誘導正向轉移方法、封裝有照射對象物的基板的製造方法、封裝有微小元件的基板的製造方法、不良部位的去除方法以及再轉印方法
EP4180871A1 (en) * 2021-11-16 2023-05-17 Mycronic Ab Multi head scanning lithographic laser writer
CN116360221A (zh) * 2021-12-28 2023-06-30 上海微电子装备（集团）股份有限公司 曝光系统和曝光系统的剂量控制方法
CN117192913B (zh) * 2023-09-11 2025-05-16 安徽工程大学 一种基于三维移动曝光提高光刻分辨率的系统及方法

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Also Published As

Publication number Publication date
CN107003616A (zh) 2017-08-01
JP7235808B2 (ja) 2023-03-08
US11003090B2 (en) 2021-05-11
KR20170093168A (ko) 2017-08-14
US20200166852A1 (en) 2020-05-28
EP3224675A1 (en) 2017-10-04
JP2017535821A (ja) 2017-11-30
KR102415072B1 (ko) 2022-06-30
TW202105084A (zh) 2021-02-01
KR102595081B1 (ko) 2023-10-27
KR20220098039A (ko) 2022-07-08
TWI737491B (zh) 2021-08-21
JP2021152683A (ja) 2021-09-30
WO2016082941A1 (en) 2016-06-02
TWI707207B (zh) 2020-10-11
US20170255110A1 (en) 2017-09-07
TW201619716A (zh) 2016-06-01

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