TWI707207B - 包含多個可個別控制之寫入頭的微影裝置 - Google Patents

包含多個可個別控制之寫入頭的微影裝置 Download PDF

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Publication number
TWI707207B
TWI707207B TW104113490A TW104113490A TWI707207B TW I707207 B TWI707207 B TW I707207B TW 104113490 A TW104113490 A TW 104113490A TW 104113490 A TW104113490 A TW 104113490A TW I707207 B TWI707207 B TW I707207B
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TW
Taiwan
Prior art keywords
light
substrate wafer
scanning
individual
writing
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TW104113490A
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English (en)
Chinese (zh)
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TW201619716A (zh
Inventor
史蒂芬 里奇特
安里柯 傑斯勒
德克 朵林
庫瑪 拉斯曼儂 森希爾
古特 魯道夫
馬丁 佛克
馬庫斯 狄君特
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德商卡爾蔡司Ｓｍｔ有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW104113490A 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置 TWI707207B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014224314.9 2014-11-27
DE102014224314 2014-11-27

Publications (2)

Publication Number Publication Date
TW201619716A TW201619716A (zh) 2016-06-01
TWI707207B true TWI707207B (zh) 2020-10-11

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TW104113490A TWI707207B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置
TW109131151A TWI737491B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置

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TW109131151A TWI737491B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置

Country Status (7)

Country Link
US (2) US20170255110A1 (https=)
EP (1) EP3224675A1 (https=)
JP (2) JP2017535821A (https=)
KR (2) KR102415072B1 (https=)
CN (1) CN107003616B (https=)
TW (2) TWI707207B (https=)
WO (1) WO2016082941A1 (https=)

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TWI707207B (zh) 2014-11-27 2020-10-11 德商卡爾蔡司Ｓｍｔ有限公司 包含多個可個別控制之寫入頭的微影裝置
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TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
TWI905274B (zh) * 2021-09-24 2025-11-21 日商信越化學工業股份有限公司 掃描型縮小投影光學系統、雷射加工裝置、雷射誘導正向轉移裝置、雷射加工方法、雷射誘導正向轉移方法、封裝有照射對象物的基板的製造方法、封裝有微小元件的基板的製造方法、不良部位的去除方法以及再轉印方法
EP4180871A1 (en) * 2021-11-16 2023-05-17 Mycronic Ab Multi head scanning lithographic laser writer
CN116360221A (zh) * 2021-12-28 2023-06-30 上海微电子装备（集团）股份有限公司 曝光系统和曝光系统的剂量控制方法
CN117192913B (zh) * 2023-09-11 2025-05-16 安徽工程大学 一种基于三维移动曝光提高光刻分辨率的系统及方法

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US20040240813A1 (en) * 2003-05-29 2004-12-02 Dainippon Screen Mfg. Co., Ltd. Pattern writing apparatus
US20080226034A1 (en) * 2007-03-12 2008-09-18 Weir Michael P Power modulation of a scanning beam for imaging, therapy, and/or diagnosis

Also Published As

Publication number Publication date
CN107003616A (zh) 2017-08-01
JP7235808B2 (ja) 2023-03-08
CN107003616B (zh) 2021-11-30
US11003090B2 (en) 2021-05-11
KR20170093168A (ko) 2017-08-14
US20200166852A1 (en) 2020-05-28
EP3224675A1 (en) 2017-10-04
JP2017535821A (ja) 2017-11-30
KR102415072B1 (ko) 2022-06-30
TW202105084A (zh) 2021-02-01
KR102595081B1 (ko) 2023-10-27
KR20220098039A (ko) 2022-07-08
TWI737491B (zh) 2021-08-21
JP2021152683A (ja) 2021-09-30
WO2016082941A1 (en) 2016-06-02
US20170255110A1 (en) 2017-09-07
TW201619716A (zh) 2016-06-01

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