CN106896651B - 曝光方法 - Google Patents

曝光方法 Download PDF

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Publication number
CN106896651B
CN106896651B CN201710045631.9A CN201710045631A CN106896651B CN 106896651 B CN106896651 B CN 106896651B CN 201710045631 A CN201710045631 A CN 201710045631A CN 106896651 B CN106896651 B CN 106896651B
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CN
China
Prior art keywords
substrate
light shield
exposure
face
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710045631.9A
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English (en)
Chinese (zh)
Other versions
CN106896651A (zh
Inventor
加藤正纪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN106896651A publication Critical patent/CN106896651A/zh
Application granted granted Critical
Publication of CN106896651B publication Critical patent/CN106896651B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN201710045631.9A 2013-06-14 2014-05-02 曝光方法 Active CN106896651B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-126150 2013-06-14
JP2013126150 2013-06-14
CN201480033588.9A CN105308507B (zh) 2013-06-14 2014-05-02 基板处理装置以及器件制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201480033588.9A Division CN105308507B (zh) 2013-06-14 2014-05-02 基板处理装置以及器件制造方法

Publications (2)

Publication Number Publication Date
CN106896651A CN106896651A (zh) 2017-06-27
CN106896651B true CN106896651B (zh) 2018-06-12

Family

ID=52022046

Family Applications (4)

Application Number Title Priority Date Filing Date
CN201710045631.9A Active CN106896651B (zh) 2013-06-14 2014-05-02 曝光方法
CN201810586865.9A Active CN108873613B (zh) 2013-06-14 2014-05-02 扫描曝光装置以及扫描曝光方法
CN201811631647.9A Active CN110045580B (zh) 2013-06-14 2014-05-02 扫描曝光装置
CN201480033588.9A Active CN105308507B (zh) 2013-06-14 2014-05-02 基板处理装置以及器件制造方法

Family Applications After (3)

Application Number Title Priority Date Filing Date
CN201810586865.9A Active CN108873613B (zh) 2013-06-14 2014-05-02 扫描曝光装置以及扫描曝光方法
CN201811631647.9A Active CN110045580B (zh) 2013-06-14 2014-05-02 扫描曝光装置
CN201480033588.9A Active CN105308507B (zh) 2013-06-14 2014-05-02 基板处理装置以及器件制造方法

Country Status (6)

Country Link
JP (4) JP6344387B2 (ko)
KR (4) KR101988818B1 (ko)
CN (4) CN106896651B (ko)
HK (2) HK1257717A1 (ko)
TW (4) TWI646408B (ko)
WO (1) WO2014199744A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017151291A1 (en) 2016-03-04 2017-09-08 Applied Materials, Inc. Wire grid polarizer manufacturing method
JP7232586B2 (ja) * 2018-07-31 2023-03-03 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1242104A (zh) * 1996-11-28 2000-01-19 株式会社尼康 曝光装置以及曝光方法
CN103477286A (zh) * 2011-09-07 2013-12-25 株式会社尼康 基板处理装置

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JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
JPH08288203A (ja) * 1995-04-11 1996-11-01 Nikon Corp 走査型露光装置
JPH08293461A (ja) * 1995-04-21 1996-11-05 Nikon Corp 照明装置および該装置を備えた投影露光装置
JPH10256476A (ja) * 1997-03-12 1998-09-25 Canon Inc 柱状デバイス及び露光装置及びデバイス製造方法
US6416908B1 (en) * 2000-06-29 2002-07-09 Anvik Corporation Projection lithography on curved substrates
JP2003178954A (ja) * 2001-12-12 2003-06-27 Canon Inc 露光装置及びデバイスの製造方法
EP1646074A4 (en) * 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD OF MANUFACTURE
JP2006235533A (ja) 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
US20070084368A1 (en) * 2005-10-13 2007-04-19 Ryan Vest Dynamic UV-exposure and thermal development of relief image printing elements
JP2007227438A (ja) * 2006-02-21 2007-09-06 Nikon Corp 露光装置及び方法並びに光露光用マスク
JP2007227703A (ja) * 2006-02-24 2007-09-06 Seiko Epson Corp 基板分割方法、基板分割装置、電気光学装置、電子機器
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
WO2008029917A1 (fr) 2006-09-08 2008-03-13 Nikon Corporation Masque, appareil d'exposition et procédé de fabrication du dispositif
JP5104107B2 (ja) 2007-08-02 2012-12-19 ウシオ電機株式会社 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法
EP2048543B1 (en) * 2007-10-09 2013-12-04 ASML Netherlands B.V. An optical focus sensor, an inspection apparatus and a lithographic apparatus
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
US8625076B2 (en) * 2010-02-09 2014-01-07 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer edge exposure module
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
CN102834778A (zh) * 2010-04-13 2012-12-19 株式会社尼康 曝光装置、基板处理装置以及器件制造方法
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
KR101837917B1 (ko) * 2011-04-25 2018-03-12 가부시키가이샤 니콘 기판처리장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1242104A (zh) * 1996-11-28 2000-01-19 株式会社尼康 曝光装置以及曝光方法
CN103477286A (zh) * 2011-09-07 2013-12-25 株式会社尼康 基板处理装置

Also Published As

Publication number Publication date
JP2018077507A (ja) 2018-05-17
TW201809916A (zh) 2018-03-16
KR20200012040A (ko) 2020-02-04
HK1220513A1 (zh) 2017-05-05
CN110045580A (zh) 2019-07-23
WO2014199744A1 (ja) 2014-12-18
KR20180128522A (ko) 2018-12-03
JP6451826B2 (ja) 2019-01-16
JP2019045874A (ja) 2019-03-22
TWI752469B (zh) 2022-01-11
KR20160021191A (ko) 2016-02-24
TW202032294A (zh) 2020-09-01
TWI604275B (zh) 2017-11-01
KR102178173B1 (ko) 2020-11-12
JP2020170162A (ja) 2020-10-15
CN110045580B (zh) 2021-07-23
TWI646408B (zh) 2019-01-01
KR101924270B1 (ko) 2018-11-30
JP6690695B2 (ja) 2020-04-28
KR20190067257A (ko) 2019-06-14
JP6344387B2 (ja) 2018-06-20
CN108873613A (zh) 2018-11-23
KR101988818B1 (ko) 2019-06-12
JPWO2014199744A1 (ja) 2017-02-23
TWI693480B (zh) 2020-05-11
CN106896651A (zh) 2017-06-27
TW201908877A (zh) 2019-03-01
JP7070598B2 (ja) 2022-05-18
CN108873613B (zh) 2020-11-13
KR102072956B1 (ko) 2020-02-03
CN105308507A (zh) 2016-02-03
TW201502716A (zh) 2015-01-16
HK1257717A1 (zh) 2019-10-25
CN105308507B (zh) 2018-12-25

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