CN1068198A - 可变形镜光闸装置 - Google Patents
可变形镜光闸装置 Download PDFInfo
- Publication number
- CN1068198A CN1068198A CN92103085A CN92103085A CN1068198A CN 1068198 A CN1068198 A CN 1068198A CN 92103085 A CN92103085 A CN 92103085A CN 92103085 A CN92103085 A CN 92103085A CN 1068198 A CN1068198 A CN 1068198A
- Authority
- CN
- China
- Prior art keywords
- mentioned
- electrode
- wall
- metal
- metal level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims abstract description 49
- 230000003287 optical effect Effects 0.000 claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims description 55
- 239000002184 metal Substances 0.000 claims description 55
- 239000010410 layer Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 20
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 239000012792 core layer Substances 0.000 claims description 7
- 238000013517 stratification Methods 0.000 claims description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 4
- 229920005591 polysilicon Polymers 0.000 claims description 4
- 238000000429 assembly Methods 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 3
- 230000011218 segmentation Effects 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 230000008569 process Effects 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 230000009881 electrostatic interaction Effects 0.000 description 2
- 238000009415 formwork Methods 0.000 description 2
- 244000228957 Ferula foetida Species 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3596—With planar waveguide arrangement, i.e. in a substrate, regardless if actuating mechanism is outside the substrate
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/354—Switching arrangements, i.e. number of input/output ports and interconnection types
- G02B6/3544—2D constellations, i.e. with switching elements and switched beams located in a plane
- G02B6/3548—1xN switch, i.e. one input and a selectable single output of N possible outputs
- G02B6/3552—1x1 switch, e.g. on/off switch
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/351—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements
- G02B6/353—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being a shutter, baffle, beam dump or opaque element
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3564—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details
- G02B6/3568—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details characterised by the actuating force
- G02B6/357—Electrostatic force
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3564—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details
- G02B6/3584—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details constructional details of an associated actuator having a MEMS construction, i.e. constructed using semiconductor technology such as etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Mechanical Optical Scanning Systems (AREA)
Abstract
一种装置,它包括一含有一电极(38a、38b)及电
极和一可单独偏移的元件(32)之间的间隙的微型机
械开关,上述偏移元件(32)有一连在它下面的垂直光
闸(40),当电极被寻址时,可偏移元件(32)的运动引
起光闸升高或降低。这样一种装置可起开关作用。
它公开了一种使用在波导中的实施例及制造方法。
Description
本发明涉及一种与可变形镜装置(DMD8)基本上相似的结构,特别涉及一种具有可单独偏移的元件的装置。
可变形镜装置(DMD8)通常由一悬挂在一阵列或一系列电极之上的反射表面组成。在一些情况下,反射表面是一薄膜,本发明涉及的DMD8的类型是另一种。它的反射表面分成若干可单独控制的镜片,这些镜片互相分离,
这些DMD8通常是这样制成的:在一基底上构成一电极阵列;用一聚合物间隔层覆盖该电极阵列;用金属覆盖上述间隔层;而该金属被制成图案,以便构成入口孔及构成单个镜片和铰链(hing);然后将该间隔层蚀刻掉并留下间隔层的某些部分以支持镜金属。在一些DMD结构中,全部间隔层都被去除,而用金属柱来支持镜片。这样构成的单独镜片包括一寻址电极,至少一个支持柱和悬挂在电极上的空气隙之上的一个镜片。
这类装置的一些结构是悬臂梁,扭转梁和挠曲梁。悬臂梁DMD有一支持在它的一边的镜片。该镜片由一个薄的铰链(支点)支持着,以便其有运动的自由度。当空气隙下面的电极被用电气方式寻址时,该镜片被静电作用吸向电极并依靠它的铰链向下偏移。扭转梁DMD由布置在镜片两边的两个铰链支持着。这种典型的DMD有两个寻址电极。当其中一个电极被寻址时,镜片被静电作用吸向那个电极,从而引起该镜片倾斜到设有寻址的电极的那一边,并绕由上述两铰链所确定的中央梁发生扭转。挠曲梁DMD有四个铰链,各设在四个边的一边。当设置在该挠曲梁的正下方的一个电极被寻址时,镜片以活塞运动那样的方式偏移。
这些装置可在许多领域里应用,例如打印机、显示系统、交换网络及其它许多方面。DMD装置的结构可广泛应用作为开关或控制器。
本发明的目的和优点很明显,且在以后的描述中将部分表现出来,本发明是通过提供一种提升或降低一金属光闸(Shutter)的结构来完成的。该结构由一基底(基片)、一电极和一悬挂在该电极之上的空气隙的上方的可反射光的金属元件组成。该金属元件有一固定于其上的垂直结构。当该电极被寻址时,上述金属元件偏移,同时引起上述附着的垂直结构与金属元件一起运动。
该装置是按下列步骤制造的:在一基底上构成一电极;用一有机聚合物间隔层覆盖该晶片;在上述间隔层上制作图案并用金属覆盖;在该金属上制作图案并蚀刻以构成铰链(转动支点)和可动的金属元件,该金属元件包括垂直地固定于其上的结构;然后该薄片被分割且去除阻隔层以便金属元件在空气隙上运动。
图1是表示制造光闸装置的流程图;
图2a是表示一扭转梁光闸装置的顶视图;
图2b是光闸在上方时扭转梁装置的侧视图;
图2c是光闸在下方时扭转梁装置的侧视图;
图3a是表示另一种扭转梁光闸装置的侧视图;
图3b是另一种扭转梁光闸装置的顶视图;
图4a表示一挠曲梁光闸装置的侧视图;
图4b表示一桡曲梁光闸装置的顶视图;
图5a是一悬臂梁光闸装置的顶视图;
图5b是一悬臂梁光闸装置的侧视图;
图6是一用来作为波导开关的光闸装置的截面图;
图7a是制造金属光闸装置的另一种流程图;以及
图7b表示另一种光闸装置。
基本的DMD结构可作改变以用于多种目的。因为它容易偏移,所以特别适用于作为可控制的光闸装置,该装置有一垂直结构固定于金属元件的下面或顶面,它随着金属元件运动而运动。为了构成叫做光闸的垂直结构,DMD的制造过程需作一些变动。
图1表示制造过程的流程图。在步骤10,必须确定该光闸装置是否用在波导中,因为用于波导的装置要求的最初制造步骤不同。如果回答是“否”,则通过线路12直接进行步骤14。在步骤14,在基底上构成电极,该基底可以是硅或砷化镓。电极能通过许多方法形成,其中之一是通过淀积一金属层,在其上制作图案再蚀刻这一系列步骤完成。其它方法包括在多晶硅上形成电极以及扩散或移植形成电极。电极形成之后,则该过程进行步骤16,步骤16是用一聚合物间隔层复盖该薄片。作为该步骤的一部分,根据装置的类型,聚合物上可制成图案,以便当金属沉淀在它上面时,可形成支持柱和光闸。下一个步骤18是通过沉淀金属层,制作图案和蚀刻,来形成金属元件、铰链和光闸。第一层金属是制铰链用的薄层。该薄层也填充沟道以便形成柱,(如果要用支柱的话),并填充局部沟道以形成光闸。然后用二氧化硅覆盖该薄金属层,上述二氧化硅被制成图案以便覆盖铰链。一厚金属层然后被设置并用二氧化硅遮掩以形成金属元件。最后,整个结构被蚀刻并且除了在第二个掩模留下来限定金属元件的地方以外,厚金属被去除。除了在留下的厚金属的下面以及铰链被遮掩的地方以外,薄金属都被去除。光闸可相对于金属元件梁有各种不同的取向。其中一些取向是垂直的、对角线、偏心的和不偏心的。其中一些以后将作讨论。如果该装置使用沟道,那么铰链/梁金属会充填它们,构成支持柱。在步骤20,可能通过锯开晶片而将该晶片分成许多单个装置。晶片被分割后,聚合物间隔层在步骤22中被去除。如果希望得到带有金属支持柱的结构,全部聚合物间隔层都应被去除。如果没有制成沟道图案,那么一部分聚合物间隔层将留下来去支持金属元件。这样就允许金属元件在将它们与电极分离开的空气隙上方自由移动。最后,在步骤23,该装置被封装。另一条可采用的路径是24,这是如果光闸装置是用在波导中的情形。该过程是通过路径24从步骤10进行到步骤26。在步骤26,波导的较低层在基底上形成。在步骤28,形成波导芯层,接着步骤30形成较上层。较上的波导层被制成图案,在波导芯层蚀刻一间隙。然后该过程延续到步骤14,按照上面描述过的过程进行。两种最终结构之间差别仅是:第一结构的DMD的光闸悬挂在基底一电极的上方;第二结构的DMD的光闸悬挂在一电极的上方,使得该光闸在电极被寻址时进入波导间隙。
图2a表示一扭转梁光闸装置的顶视图。金属元件32由铰链36a和36b悬挂在寻址电极38a和38b的上方。铰链36a和36b本身分别由柱34a和34b支持着,在该例子中,金属光闸40悬挂在波导42中的间隙44的上方,该装置的侧视图如图2b所示。金属元件32在该状态下没被寻址,此时光闸40悬在波导间隙44之上。当图2b中被波导42遮住的寻址电极38b被寻址时,金属元件向电极偏转,同时使光闸40降低到波导间隙44内,如图2c所示。这样可阻止任何光通过波导间隙传输,因而该装置象一接通/断开的开关一样工作。另外,DMD光闸可装配得使其在未寻址状态下,光闸处在波导间隙内(即“切断”)。在该情况下,当在金属元件与光闸相对的另一侧的电极38a被寻址时,金属元件向另一面倾斜,从而使光闸升出波导间隙,这样寻址状态下可使光通过该间隙而传输(即“接通”)。
另外,该装置能以模拟方式工作。光闸偏移的距离能由加到寻址电极上的电压量控制。采用该方法,光闸能部分降低以便采用模拟方式限制传输的光量到任何一水平,即从全部传输到完全切断。该方法与先前的寻址方法有差别,原先方法的传输衰减是数字化的,即只有全部通过或切断。
图3a表示扭转梁光闸装置的另一个实施例。在该结构中,铰链36a和36b的轴垂直于波导42的轴。光闸44也垂直于波导42的轴,但仍悬挂在间隙44之上。图3b是表示寻址电极38b位置的顶视图。与上面讨论的结构相似,当电极38b被寻址时,光闸从未编址的“接通”(ON)状态倾斜到波导42中,充填间隙44,阻碍光的传输,变成“切断”(OFF)状态。
图4a是表示桡曲梁光闸装置。金属元件32对角线悬挂在间隙之上,并由四个铰链支持。从顶视图4b看到光闸40在金属元件32中央。光闸40垂直于波导42中的间隙44悬挂。注意这里仅有一个寻址电址电极38,它位于金属元件下面的大部分区域。当电极38被寻址时,金属元件依靠它的铰链46a、46b、46c和46d向下移动,这样就象先前的装置那样,使光闸40进入间隙44。
另一个实施例是悬臂梁光闸装置,如图5a表示。铰链36仅支持金属元件32的一边。电极与桡曲梁的电极相似,它位于金属元件下面的大部分区域,图5b是该装置的侧视图。而且,悬臂梁光闸装置的运行方式与先前描述的其它装置相似。
图2a、2b和2c的扭转梁光闸/波导装置的中央的截面图如图6所示。层48是基底上形成的较底层。波导芯层50在较低层的上方。较上层52建在该芯层之上。寻址电极38a和38b在该实施例中是在层52的上。电极也可放在其他地方,只要它们与金属元件相近,并能引起它们偏转。光闸40从金属元件42下垂至间隙44。跨越间隙54的距离能被做到所需的任何尺寸。在一具体的实施例中,间隙是1μm宽。芯层52由一0.25μm厚的Si3N4层组成。夹在两层2.5μm厚的SiO2层之间。另一个可能的结构是光闸设置在元件的上方,而不是悬挂在元件的下面。该实施例能被适用于上面讨论的任何一种装置。这种变换的结构如图7a的扭转梁所示。可动的金属元件在其上方有光闸结构40,在该实施例中,波导42的轴是在金属元件结构的一边。当电极38a被用电的方式寻址时,金属元件向它倾斜,将光闸40降低使其进入间隙44。如上面所讨论,该装置也能以模拟方式工作,其中倾斜的距离即光通过的量由所加电压的量控制。
图7b是光闸设置的装置上表面的光电栅装置制造过程的流程图。除了在三个主要流程步骤上,该流程基本上与图1所示的流程相似。在图7b中,第一个区别是在步骤56,该步骤将间隔层覆盖到晶片上。如果需要的话在阻隔层上可制作带有供淀积支柱用的沟道的图案。如图1中所示的那样。用于淀积光闸的局部沟道可省略。在该实施例中,光闸并不悬挂在金属元件的下方。下一个差别在步骤58,此时,形成铰链和元件。在图1中,铰链,元件和光闸可通过设置一薄的金属层,在其上加掩模,设置一厚的金属层,再在其上加掩模,然后蚀刻所有金属来形成。本过程除了第一层不充填局部沟道以形成光闸外,其余与图1所示的过程相似。另外,金属层的最后蚀刻并不在此步骤完成。步骤60可加入到图1的过程中。因为此时光闸仍然没有形成。因此这个步骤是必需的。在步骤58中形成的金属层由薄金属、掩模、厚金属和另一掩模所组成。但还没有进行蚀刻。在步骤60,可沉积另一金属层并加上掩模以形成光闸。然后所有的三个金属层和掩模被蚀刻掉。在光闸处留下三层,在金属元件处留下两层,而在铰链处留下一层。每一层的厚度可调整以形成一最佳结构。
本结构作为一开关的应用已越出波导的范围。在其它许多方面也可应用该类型的装置。该结构的切换速度和紧凑性使得它优于目前使用的许多微型机械开关。
这样,尽管至此只对DMD光闸装置的一特别的实施例作了描述。这些具体的说明并不是作为下列权利要求书所保护的本发明的范围的限制。
Claims (38)
1、一种可偏移装置,其特征在于它包括:
a.一基底;
b.一在上述基底上形成的电极;
c.至少一个在上述电极的旁边、且在上述基底上形成的支持结构;
d.一位于上述电极上方、与支持结构相连接的可动金属元件;
e.一在上述电极和上述元件之间的空气间隙;以及
f.一与上述元件相连接的垂直结构。
2、如权利要求1所述的装置,其特征在于上述基底是硅。
3、如权利要求1所述的装置,其特征在于上述基底是砷化镓。
4、如权利要求1所述的装置,其特征在于上述电极是金属。
5、如权利要求1所述的装置,其特征在于上述电极是多晶硅。
6、如权利要求1所述的装置,其特征在于上述支持结构包含一金属柱。
7、如权利要求1所述的装置,其特征在于上述支持结构由有机聚合物构成。
8、如权利要求1所述的装置,其特征在于上述表面通过一铰链与上述支持结构相连接。
9、如权利要求1所述的装置,其特征在于上述表面通过两个铰链与上述支持结构相连接。
10、如权利要求1所述的装置,其特征在于上述表面与上述支持结构通过四个铰链相连接。
11、一种制造方法,其特征在于它包括:
a.在一基底上形成电极;
b.用聚合物间隔层覆盖上述电极;
c.在上述间隔层上制作图案;
d.在上述间隔层上形成金属层;
e.在上述金属层上制作图案,以便形成铰链、金属元件和垂直地固定于上述金属元件的底面的结构;
f.将上述基底分割成许多单个装置;
g.从上述装置中去除一部分间隔层;以及
h.封装上述单个装置。
12、如权利要求11所述的方法,其特征在于上述形成电极的步骤包括沉积金属、在其上制作图案和蚀刻该金属。
13、如权利要求11所述的方法,其特征在于上述形成电极的步骤包括将某种材料扩散进去以作为电极。
14、如权利要求11所述的方法,其特征在于上述形成电极的步骤包括用多晶硅形成电极。
15、如权利要求11所述的方法,其特征在于上述在所述间隔层上制作图案的步骤包括在上述间隔层上制作带有局部沟道的图案。
16、如权利要求11所述的方法,其特征在于上述形成金属层的步骤包括在上述垫片上淀积金属。
17、如权利要求11所述的方法,其特征在于上述形成一金属层的步骤包括在上述间隔层上淀积上述金属之前,在上述间隔层上制作带有沟道的图案。
18、如权利要求11所述的方法,其特征在于上述分割步骤包括锯开上述晶片。
19、如权利要求11所述的方法,其特征在于上述去除步骤包括基本上去除全部间隔层。
20、如权利要求11所述的方法,其特征在于上述去除步骤包括去除一部分间隔层且留下一部分上述间隔层作为支持结构。
21、一种可偏移装置,其特征在于它包括:
a.一基底;
b.一在上述基底上的下包层;
c.一在上述下包层上的波导芯层;
d.一在上述波导芯层上的上包层;
e.一包含一金属元件和一固定于上述金属元件的垂直结构的可变形金属元件结构;上述结构悬挂在上述波导芯层的上方,并与上述芯层由一空气间隙隔开;以及
f.一用来对上述金属元件进行电气寻址的与上述空气间隙相邻的电极。
22、如权利要求21所述的装置,其特征在于上述基底是硅。
23、如权利要求21所述的装置,其特征在于上述下包层是氧化硅。
24、如权利要求21所述的装置,其特征在于上述波导芯层是四氮化三硅。
25、如权利要求21所述的装置,其特征在于上述上包层是氧化硅。
26、一种制造方法,其特征在于,它包括:
a.在一基底上形成一电极;
b.用一聚合物间隔层覆盖上述电极;
c.在上述间隔层上形成一金属层;
d.在金属层上制作图案以形成铰链和金属元件;
e.在上述金属层上形成一金属光闸层;
f.在上述光闸层上制作图案;
g.去除一部分上述金属层和上述光闸层;
h.将上述基底分割成许多单个装置;
i.从上述装置中去除一部分上述间隔层;以及
j.封装上述单个装置。
27、如权利要求26所述的方法,其特征在于上述形成电极的步骤包括淀积金属、在其上制作图案和蚀刻该金属。
28、如权利要求26所述的方法,其特征在于上述形成电极的步骤包括将某种材料扩散进去,以作为一电极。
29、如权利要求26所述的方法,其特征在于上述形成电极的步骤包括用多晶硅构成上述电极。
30、如权利要求26所述的方法,其特征在于上述形成电极的步骤包括在上述间隔层上淀积金属。
31、如权利要求26所述的方法,其特征在于上述形成金属层的步骤包括在上述间隔层上淀积上述金属层之前在上述间隔层上制作带有沟道的图案。
32、如权利要求26所述的方法,其特征在于上述在上述金属层上制作图案的步骤包括在上述金属层上加掩模。
33、如权利要求26所述的方法,其特征在于上述形成上述光闸金属层包括在上述金属层上淀积上述光闸层。
34、如权利要求26所述的方法,其特征在于在上述光闸层上制作图案包括在上述光闸层上加掩模。
35、如权利要求26所述的方法,其特征在于上述去除部分上述光闸层和金属层的步骤包括蚀刻上述层。
36、如权利要求26所述的方法,其特征在于上述分割步骤包括锯开上述晶片。
37、如权利要求26所述的方法,其特征在于上述去除步骤包括基本上去除全部间隔层。
38、如权利要求26所述的方法,其特征在于上述去除步骤包括去除一部分上述间隔层并留下一部分间隔层作为支持结构。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US691,920 | 1991-04-26 | ||
US07/691,920 US5226099A (en) | 1991-04-26 | 1991-04-26 | Digital micromirror shutter device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1068198A true CN1068198A (zh) | 1993-01-20 |
CN1041020C CN1041020C (zh) | 1998-12-02 |
Family
ID=24778505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN92103085A Expired - Fee Related CN1041020C (zh) | 1991-04-26 | 1992-04-23 | 可变形镜光闸装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5226099A (zh) |
EP (1) | EP0510629B1 (zh) |
JP (1) | JP3213048B2 (zh) |
KR (1) | KR100261400B1 (zh) |
CN (1) | CN1041020C (zh) |
DE (1) | DE69221196T2 (zh) |
TW (1) | TW295636B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018023968A1 (zh) * | 2016-08-01 | 2018-02-08 | 华为技术有限公司 | 光开关和光交换系统 |
Families Citing this family (321)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0615147B1 (en) * | 1992-01-16 | 1998-08-05 | Texas Instruments Incorporated | Micromechanical deformable mirror device (DMD) |
US5602671A (en) * | 1990-11-13 | 1997-02-11 | Texas Instruments Incorporated | Low surface energy passivation layer for micromechanical devices |
US6219015B1 (en) | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
US6674562B1 (en) | 1994-05-05 | 2004-01-06 | Iridigm Display Corporation | Interferometric modulation of radiation |
US5345521A (en) * | 1993-07-12 | 1994-09-06 | Texas Instrument Incorporated | Architecture for optical switch |
US5389182A (en) * | 1993-08-02 | 1995-02-14 | Texas Instruments Incorporated | Use of a saw frame with tape as a substrate carrier for wafer level backend processing |
US7550794B2 (en) | 2002-09-20 | 2009-06-23 | Idc, Llc | Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer |
US7460291B2 (en) | 1994-05-05 | 2008-12-02 | Idc, Llc | Separable modulator |
US7776631B2 (en) | 1994-05-05 | 2010-08-17 | Qualcomm Mems Technologies, Inc. | MEMS device and method of forming a MEMS device |
US7123216B1 (en) | 1994-05-05 | 2006-10-17 | Idc, Llc | Photonic MEMS and structures |
US7297471B1 (en) | 2003-04-15 | 2007-11-20 | Idc, Llc | Method for manufacturing an array of interferometric modulators |
US7138984B1 (en) | 2001-06-05 | 2006-11-21 | Idc, Llc | Directly laminated touch sensitive screen |
US8014059B2 (en) | 1994-05-05 | 2011-09-06 | Qualcomm Mems Technologies, Inc. | System and method for charge control in a MEMS device |
US6680792B2 (en) | 1994-05-05 | 2004-01-20 | Iridigm Display Corporation | Interferometric modulation of radiation |
US6360424B1 (en) | 1994-06-06 | 2002-03-26 | Case Western Reserve University | Method of making micromotors with utilitarian features |
US5705318A (en) * | 1994-06-06 | 1998-01-06 | Case Western Reserve University | Micromotors and methods of fabrication |
US6029337A (en) * | 1994-06-06 | 2000-02-29 | Case Western Reserve University | Methods of fabricating micromotors with utilitarian features |
WO1995034943A1 (en) * | 1994-06-10 | 1995-12-21 | Case Western Reserve University | Micromotors with utilitarian features and methods of their fabrication |
US5788468A (en) * | 1994-11-03 | 1998-08-04 | Memstek Products, Llc | Microfabricated fluidic devices |
US5629794A (en) * | 1995-05-31 | 1997-05-13 | Texas Instruments Incorporated | Spatial light modulator having an analog beam for steering light |
US5841579A (en) | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
US7907319B2 (en) | 1995-11-06 | 2011-03-15 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with optical compensation |
US5638946A (en) * | 1996-01-11 | 1997-06-17 | Northeastern University | Micromechanical switch with insulated switch contact |
US5914805A (en) * | 1996-06-27 | 1999-06-22 | Xerox Corporation | Gyricon display with interstitially packed particles |
US5825529A (en) * | 1996-06-27 | 1998-10-20 | Xerox Corporation | Gyricon display with no elastomer substrate |
US5754332A (en) * | 1996-06-27 | 1998-05-19 | Xerox Corporation | Monolayer gyricon display |
US6055091A (en) * | 1996-06-27 | 2000-04-25 | Xerox Corporation | Twisting-cylinder display |
US5894367A (en) * | 1996-09-13 | 1999-04-13 | Xerox Corporation | Twisting cylinder display using multiple chromatic values |
US5904790A (en) * | 1997-10-30 | 1999-05-18 | Xerox Corporation | Method of manufacturing a twisting cylinder display using multiple chromatic values |
US5922268A (en) * | 1997-10-30 | 1999-07-13 | Xerox Corporation | Method of manufacturing a twisting cylinder display using multiple chromatic values |
US7471444B2 (en) | 1996-12-19 | 2008-12-30 | Idc, Llc | Interferometric modulation of radiation |
US6097859A (en) | 1998-02-12 | 2000-08-01 | The Regents Of The University Of California | Multi-wavelength cross-connect optical switch |
US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US5961767A (en) * | 1997-05-15 | 1999-10-05 | Lucent Technologies, Inc. | Method for forming micron-sized and smaller liquid droplets |
US5923798A (en) * | 1997-05-15 | 1999-07-13 | Lucent Technologies, Inc. | Micro machined optical switch |
KR100270813B1 (ko) * | 1997-07-11 | 2000-11-01 | 윤종용 | 화상표시장치용가동형마이크로미러 |
US5959375A (en) * | 1997-09-30 | 1999-09-28 | Garcia; Ernest J. | Device and method for redirecting electromagnetic signals |
US6088102A (en) | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
US5974207A (en) * | 1997-12-23 | 1999-10-26 | Lucent Technologies, Inc. | Article comprising a wavelength-selective add-drop multiplexer |
US5900192A (en) * | 1998-01-09 | 1999-05-04 | Xerox Corporation | Method and apparatus for fabricating very small two-color balls for a twisting ball display |
US5976428A (en) * | 1998-01-09 | 1999-11-02 | Xerox Corporation | Method and apparatus for controlling formation of two-color balls for a twisting ball display |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
US7532377B2 (en) | 1998-04-08 | 2009-05-12 | Idc, Llc | Movable micro-electromechanical device |
KR100703140B1 (ko) | 1998-04-08 | 2007-04-05 | 이리다임 디스플레이 코포레이션 | 간섭 변조기 및 그 제조 방법 |
US6498870B1 (en) | 1998-04-20 | 2002-12-24 | Omm, Inc. | Micromachined optomechanical switches |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US6130770A (en) | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6101036A (en) | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6303986B1 (en) | 1998-07-29 | 2001-10-16 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
US6404942B1 (en) | 1998-10-23 | 2002-06-11 | Corning Incorporated | Fluid-encapsulated MEMS optical switch |
US6389189B1 (en) | 1998-10-23 | 2002-05-14 | Corning Incorporated | Fluid-encapsulated MEMS optical switch |
US6205267B1 (en) * | 1998-11-20 | 2001-03-20 | Lucent Technologies | Optical switch |
US6173105B1 (en) * | 1998-11-20 | 2001-01-09 | Lucent Technologies | Optical attenuator |
US6445840B1 (en) | 1999-05-28 | 2002-09-03 | Omm, Inc. | Micromachined optical switching devices |
US6453083B1 (en) | 1999-05-28 | 2002-09-17 | Anis Husain | Micromachined optomechanical switching cell with parallel plate actuator and on-chip power monitoring |
US6445841B1 (en) | 1999-05-28 | 2002-09-03 | Omm, Inc. | Optomechanical matrix switches including collimator arrays |
US6449406B1 (en) | 1999-05-28 | 2002-09-10 | Omm, Inc. | Micromachined optomechanical switching devices |
US6201633B1 (en) | 1999-06-07 | 2001-03-13 | Xerox Corporation | Micro-electromechanical based bistable color display sheets |
DE19941045A1 (de) * | 1999-08-28 | 2001-04-12 | Bosch Gmbh Robert | Mikroschwingvorrichtung |
WO2003007049A1 (en) | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Photonic mems and structures |
EP1094355A1 (en) | 1999-10-19 | 2001-04-25 | Corning Incorporated | Electrical interconnection of planar lightwave circuits |
US6643426B1 (en) | 1999-10-19 | 2003-11-04 | Corning Incorporated | Mechanically assisted release for MEMS optical switch |
US6440252B1 (en) | 1999-12-17 | 2002-08-27 | Xerox Corporation | Method for rotatable element assembly |
US6360036B1 (en) | 2000-01-14 | 2002-03-19 | Corning Incorporated | MEMS optical switch and method of manufacture |
EP1128201A1 (en) * | 2000-02-25 | 2001-08-29 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Switching device, particularly for optical switching |
US6545671B1 (en) | 2000-03-02 | 2003-04-08 | Xerox Corporation | Rotating element sheet material with reversible highlighting |
US6351580B1 (en) * | 2000-03-27 | 2002-02-26 | Jds Uniphase Corporation | Microelectromechanical devices having brake assemblies therein to control movement of optical shutters and other movable elements |
US6360539B1 (en) * | 2000-04-05 | 2002-03-26 | Jds Uniphase Corporation | Microelectromechanical actuators including driven arched beams for mechanical advantage |
US6498674B1 (en) | 2000-04-14 | 2002-12-24 | Xerox Corporation | Rotating element sheet material with generalized containment structure |
US6709886B2 (en) | 2000-04-25 | 2004-03-23 | Umachines, Inc. | Method of fabricating micromachined devices |
US6639713B2 (en) * | 2000-04-25 | 2003-10-28 | Umachines, Inc. | Silicon micromachined optical device |
US6504525B1 (en) | 2000-05-03 | 2003-01-07 | Xerox Corporation | Rotating element sheet material with microstructured substrate and method of use |
US6539143B1 (en) | 2000-07-31 | 2003-03-25 | Sarcon Microsystems, Inc. | Optical switching system |
US6411754B1 (en) * | 2000-08-25 | 2002-06-25 | Corning Incorporated | Micromechanical optical switch and method of manufacture |
TW531669B (en) | 2000-09-15 | 2003-05-11 | Ibm | Optical devices |
US6567574B1 (en) | 2000-10-06 | 2003-05-20 | Omm, Inc. | Modular three-dimensional optical switch |
US6962771B1 (en) * | 2000-10-13 | 2005-11-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dual damascene process |
US6556741B1 (en) | 2000-10-25 | 2003-04-29 | Omm, Inc. | MEMS optical switch with torsional hinge and method of fabrication thereof |
US6524500B2 (en) | 2000-12-28 | 2003-02-25 | Xerox Corporation | Method for making microencapsulated gyricon beads |
US6690350B2 (en) | 2001-01-11 | 2004-02-10 | Xerox Corporation | Rotating element sheet material with dual vector field addressing |
US6707591B2 (en) | 2001-04-10 | 2004-03-16 | Silicon Light Machines | Angled illumination for a single order light modulator based projection system |
WO2002086572A1 (en) * | 2001-04-18 | 2002-10-31 | L3 Optics, Inc. | Collapse based integrated electrostatic active optical elements and method for manufacture thereof |
JP2003057569A (ja) * | 2001-06-07 | 2003-02-26 | Sumitomo Electric Ind Ltd | 光スイッチ及び光スイッチアレイ |
JPWO2002103432A1 (ja) * | 2001-06-13 | 2004-10-07 | 住友電気工業株式会社 | 光スイッチ |
US6782205B2 (en) | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US6747781B2 (en) | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
DE60230673D1 (de) * | 2001-07-05 | 2009-02-12 | Ibm | Mikrosystemschalter |
KR100452112B1 (ko) * | 2001-07-18 | 2004-10-12 | 한국과학기술원 | 정전 구동기 |
US6589625B1 (en) | 2001-08-01 | 2003-07-08 | Iridigm Display Corporation | Hermetic seal and method to create the same |
US6829092B2 (en) | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
CA2461188C (en) * | 2001-09-21 | 2011-02-15 | Sumitomo Electric Industries, Ltd. | Optical switch and optical switch array |
KR100393193B1 (ko) * | 2001-09-29 | 2003-07-31 | 삼성전자주식회사 | 광 도파로와 mems 액추에이터를 구비한 가변 광 감쇠기 |
US6699570B2 (en) | 2001-11-06 | 2004-03-02 | Xerox Corporation | Colored cyber toner using multicolored gyricon spheres |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
US6794119B2 (en) | 2002-02-12 | 2004-09-21 | Iridigm Display Corporation | Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
US6574033B1 (en) | 2002-02-27 | 2003-06-03 | Iridigm Display Corporation | Microelectromechanical systems device and method for fabricating same |
US6728023B1 (en) | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US20030227035A1 (en) * | 2002-06-05 | 2003-12-11 | Hiromu Ishii | Micromachine and manufacturing method therefor |
US6829258B1 (en) | 2002-06-26 | 2004-12-07 | Silicon Light Machines, Inc. | Rapidly tunable external cavity laser |
US6714337B1 (en) | 2002-06-28 | 2004-03-30 | Silicon Light Machines | Method and device for modulating a light beam and having an improved gamma response |
US6813059B2 (en) | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US7781850B2 (en) | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
TWI289708B (en) | 2002-12-25 | 2007-11-11 | Qualcomm Mems Technologies Inc | Optical interference type color display |
TW200413810A (en) | 2003-01-29 | 2004-08-01 | Prime View Int Co Ltd | Light interference display panel and its manufacturing method |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
JP2004264787A (ja) * | 2003-03-04 | 2004-09-24 | Ntt Electornics Corp | 光減衰量制御方法および光減衰量制御装置 |
JP2004294890A (ja) * | 2003-03-27 | 2004-10-21 | Ntt Electornics Corp | 可変光減衰器 |
TW594360B (en) | 2003-04-21 | 2004-06-21 | Prime View Int Corp Ltd | A method for fabricating an interference display cell |
TW570896B (en) | 2003-05-26 | 2004-01-11 | Prime View Int Co Ltd | A method for fabricating an interference display cell |
US7221495B2 (en) | 2003-06-24 | 2007-05-22 | Idc Llc | Thin film precursor stack for MEMS manufacturing |
JP2005099678A (ja) * | 2003-08-20 | 2005-04-14 | Olympus Corp | 光遮断装置および光スイッチ装置 |
TWI231865B (en) | 2003-08-26 | 2005-05-01 | Prime View Int Co Ltd | An interference display cell and fabrication method thereof |
TW593126B (en) | 2003-09-30 | 2004-06-21 | Prime View Int Co Ltd | A structure of a micro electro mechanical system and manufacturing the same |
US20070009899A1 (en) * | 2003-10-02 | 2007-01-11 | Mounts William M | Nucleic acid arrays for detecting gene expression in animal models of inflammatory diseases |
US7012726B1 (en) | 2003-11-03 | 2006-03-14 | Idc, Llc | MEMS devices with unreleased thin film components |
US7142346B2 (en) | 2003-12-09 | 2006-11-28 | Idc, Llc | System and method for addressing a MEMS display |
US7161728B2 (en) | 2003-12-09 | 2007-01-09 | Idc, Llc | Area array modulation and lead reduction in interferometric modulators |
US7532194B2 (en) | 2004-02-03 | 2009-05-12 | Idc, Llc | Driver voltage adjuster |
US7342705B2 (en) | 2004-02-03 | 2008-03-11 | Idc, Llc | Spatial light modulator with integrated optical compensation structure |
US7119945B2 (en) | 2004-03-03 | 2006-10-10 | Idc, Llc | Altering temporal response of microelectromechanical elements |
US7706050B2 (en) | 2004-03-05 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | Integrated modulator illumination |
US7720148B2 (en) * | 2004-03-26 | 2010-05-18 | The Hong Kong University Of Science And Technology | Efficient multi-frame motion estimation for video compression |
US7476327B2 (en) | 2004-05-04 | 2009-01-13 | Idc, Llc | Method of manufacture for microelectromechanical devices |
US7060895B2 (en) | 2004-05-04 | 2006-06-13 | Idc, Llc | Modifying the electro-mechanical behavior of devices |
US7164520B2 (en) | 2004-05-12 | 2007-01-16 | Idc, Llc | Packaging for an interferometric modulator |
US7256922B2 (en) | 2004-07-02 | 2007-08-14 | Idc, Llc | Interferometric modulators with thin film transistors |
EP2246726B1 (en) | 2004-07-29 | 2013-04-03 | QUALCOMM MEMS Technologies, Inc. | System and method for micro-electromechanical operating of an interferometric modulator |
US7889163B2 (en) | 2004-08-27 | 2011-02-15 | Qualcomm Mems Technologies, Inc. | Drive method for MEMS devices |
US7515147B2 (en) | 2004-08-27 | 2009-04-07 | Idc, Llc | Staggered column drive circuit systems and methods |
US7499208B2 (en) | 2004-08-27 | 2009-03-03 | Udc, Llc | Current mode display driver circuit realization feature |
US7560299B2 (en) | 2004-08-27 | 2009-07-14 | Idc, Llc | Systems and methods of actuating MEMS display elements |
US7551159B2 (en) | 2004-08-27 | 2009-06-23 | Idc, Llc | System and method of sensing actuation and release voltages of an interferometric modulator |
US7602375B2 (en) | 2004-09-27 | 2009-10-13 | Idc, Llc | Method and system for writing data to MEMS display elements |
US7317568B2 (en) | 2004-09-27 | 2008-01-08 | Idc, Llc | System and method of implementation of interferometric modulators for display mirrors |
US7583429B2 (en) * | 2004-09-27 | 2009-09-01 | Idc, Llc | Ornamental display device |
US7369296B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator |
US7304784B2 (en) | 2004-09-27 | 2007-12-04 | Idc, Llc | Reflective display device having viewable display on both sides |
US7420725B2 (en) | 2004-09-27 | 2008-09-02 | Idc, Llc | Device having a conductive light absorbing mask and method for fabricating same |
US7424198B2 (en) | 2004-09-27 | 2008-09-09 | Idc, Llc | Method and device for packaging a substrate |
US7657242B2 (en) * | 2004-09-27 | 2010-02-02 | Qualcomm Mems Technologies, Inc. | Selectable capacitance circuit |
US7321456B2 (en) | 2004-09-27 | 2008-01-22 | Idc, Llc | Method and device for corner interferometric modulation |
US7130104B2 (en) | 2004-09-27 | 2006-10-31 | Idc, Llc | Methods and devices for inhibiting tilting of a mirror in an interferometric modulator |
US7161730B2 (en) | 2004-09-27 | 2007-01-09 | Idc, Llc | System and method for providing thermal compensation for an interferometric modulator display |
US7692839B2 (en) | 2004-09-27 | 2010-04-06 | Qualcomm Mems Technologies, Inc. | System and method of providing MEMS device with anti-stiction coating |
US7415186B2 (en) | 2004-09-27 | 2008-08-19 | Idc, Llc | Methods for visually inspecting interferometric modulators for defects |
US7405924B2 (en) | 2004-09-27 | 2008-07-29 | Idc, Llc | System and method for protecting microelectromechanical systems array using structurally reinforced back-plate |
US7653371B2 (en) * | 2004-09-27 | 2010-01-26 | Qualcomm Mems Technologies, Inc. | Selectable capacitance circuit |
US7369294B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | Ornamental display device |
US7310179B2 (en) | 2004-09-27 | 2007-12-18 | Idc, Llc | Method and device for selective adjustment of hysteresis window |
US7586484B2 (en) | 2004-09-27 | 2009-09-08 | Idc, Llc | Controller and driver features for bi-stable display |
US7936497B2 (en) | 2004-09-27 | 2011-05-03 | Qualcomm Mems Technologies, Inc. | MEMS device having deformable membrane characterized by mechanical persistence |
US7372613B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | Method and device for multistate interferometric light modulation |
US7750886B2 (en) | 2004-09-27 | 2010-07-06 | Qualcomm Mems Technologies, Inc. | Methods and devices for lighting displays |
US7684104B2 (en) | 2004-09-27 | 2010-03-23 | Idc, Llc | MEMS using filler material and method |
US8124434B2 (en) | 2004-09-27 | 2012-02-28 | Qualcomm Mems Technologies, Inc. | Method and system for packaging a display |
BRPI0509575A (pt) | 2004-09-27 | 2007-10-09 | Idc Llc | método e dispositivo para modulação de luz interferométrica de multi-estados |
US8008736B2 (en) | 2004-09-27 | 2011-08-30 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device |
US7359066B2 (en) | 2004-09-27 | 2008-04-15 | Idc, Llc | Electro-optical measurement of hysteresis in interferometric modulators |
US7535466B2 (en) | 2004-09-27 | 2009-05-19 | Idc, Llc | System with server based control of client device display features |
US7532195B2 (en) | 2004-09-27 | 2009-05-12 | Idc, Llc | Method and system for reducing power consumption in a display |
US7492502B2 (en) | 2004-09-27 | 2009-02-17 | Idc, Llc | Method of fabricating a free-standing microstructure |
US20060176487A1 (en) | 2004-09-27 | 2006-08-10 | William Cummings | Process control monitors for interferometric modulators |
US7417783B2 (en) | 2004-09-27 | 2008-08-26 | Idc, Llc | Mirror and mirror layer for optical modulator and method |
US7554714B2 (en) | 2004-09-27 | 2009-06-30 | Idc, Llc | Device and method for manipulation of thermal response in a modulator |
US8310441B2 (en) | 2004-09-27 | 2012-11-13 | Qualcomm Mems Technologies, Inc. | Method and system for writing data to MEMS display elements |
US7675669B2 (en) | 2004-09-27 | 2010-03-09 | Qualcomm Mems Technologies, Inc. | Method and system for driving interferometric modulators |
US7626581B2 (en) | 2004-09-27 | 2009-12-01 | Idc, Llc | Device and method for display memory using manipulation of mechanical response |
US7345805B2 (en) | 2004-09-27 | 2008-03-18 | Idc, Llc | Interferometric modulator array with integrated MEMS electrical switches |
US7289259B2 (en) | 2004-09-27 | 2007-10-30 | Idc, Llc | Conductive bus structure for interferometric modulator array |
US7343080B2 (en) | 2004-09-27 | 2008-03-11 | Idc, Llc | System and method of testing humidity in a sealed MEMS device |
US7373026B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | MEMS device fabricated on a pre-patterned substrate |
US7893919B2 (en) | 2004-09-27 | 2011-02-22 | Qualcomm Mems Technologies, Inc. | Display region architectures |
US7405861B2 (en) | 2004-09-27 | 2008-07-29 | Idc, Llc | Method and device for protecting interferometric modulators from electrostatic discharge |
US7843410B2 (en) | 2004-09-27 | 2010-11-30 | Qualcomm Mems Technologies, Inc. | Method and device for electrically programmable display |
US7944599B2 (en) | 2004-09-27 | 2011-05-17 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US7808703B2 (en) | 2004-09-27 | 2010-10-05 | Qualcomm Mems Technologies, Inc. | System and method for implementation of interferometric modulator displays |
US7446927B2 (en) | 2004-09-27 | 2008-11-04 | Idc, Llc | MEMS switch with set and latch electrodes |
US7545550B2 (en) | 2004-09-27 | 2009-06-09 | Idc, Llc | Systems and methods of actuating MEMS display elements |
US7916103B2 (en) | 2004-09-27 | 2011-03-29 | Qualcomm Mems Technologies, Inc. | System and method for display device with end-of-life phenomena |
US20060076634A1 (en) | 2004-09-27 | 2006-04-13 | Lauren Palmateer | Method and system for packaging MEMS devices with incorporated getter |
US7453579B2 (en) | 2004-09-27 | 2008-11-18 | Idc, Llc | Measurement of the dynamic characteristics of interferometric modulators |
US7564612B2 (en) | 2004-09-27 | 2009-07-21 | Idc, Llc | Photonic MEMS and structures |
US7679627B2 (en) * | 2004-09-27 | 2010-03-16 | Qualcomm Mems Technologies, Inc. | Controller and driver features for bi-stable display |
US7136213B2 (en) | 2004-09-27 | 2006-11-14 | Idc, Llc | Interferometric modulators having charge persistence |
US8878825B2 (en) | 2004-09-27 | 2014-11-04 | Qualcomm Mems Technologies, Inc. | System and method for providing a variable refresh rate of an interferometric modulator display |
US7368803B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | System and method for protecting microelectromechanical systems array using back-plate with non-flat portion |
US7417735B2 (en) | 2004-09-27 | 2008-08-26 | Idc, Llc | Systems and methods for measuring color and contrast in specular reflective devices |
US7299681B2 (en) | 2004-09-27 | 2007-11-27 | Idc, Llc | Method and system for detecting leak in electronic devices |
US7668415B2 (en) | 2004-09-27 | 2010-02-23 | Qualcomm Mems Technologies, Inc. | Method and device for providing electronic circuitry on a backplate |
US7349136B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | Method and device for a display having transparent components integrated therein |
US7701631B2 (en) | 2004-09-27 | 2010-04-20 | Qualcomm Mems Technologies, Inc. | Device having patterned spacers for backplates and method of making the same |
US7302157B2 (en) | 2004-09-27 | 2007-11-27 | Idc, Llc | System and method for multi-level brightness in interferometric modulation |
US7527995B2 (en) | 2004-09-27 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Method of making prestructure for MEMS systems |
US7429334B2 (en) | 2004-09-27 | 2008-09-30 | Idc, Llc | Methods of fabricating interferometric modulators by selectively removing a material |
US7710629B2 (en) | 2004-09-27 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | System and method for display device with reinforcing substance |
US7355780B2 (en) | 2004-09-27 | 2008-04-08 | Idc, Llc | System and method of illuminating interferometric modulators using backlighting |
US7920135B2 (en) * | 2004-09-27 | 2011-04-05 | Qualcomm Mems Technologies, Inc. | Method and system for driving a bi-stable display |
US7630119B2 (en) | 2004-09-27 | 2009-12-08 | Qualcomm Mems Technologies, Inc. | Apparatus and method for reducing slippage between structures in an interferometric modulator |
US7460246B2 (en) | 2004-09-27 | 2008-12-02 | Idc, Llc | Method and system for sensing light using interferometric elements |
US7813026B2 (en) | 2004-09-27 | 2010-10-12 | Qualcomm Mems Technologies, Inc. | System and method of reducing color shift in a display |
US7327510B2 (en) | 2004-09-27 | 2008-02-05 | Idc, Llc | Process for modifying offset voltage characteristics of an interferometric modulator |
US7719500B2 (en) | 2004-09-27 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | Reflective display pixels arranged in non-rectangular arrays |
US7724993B2 (en) | 2004-09-27 | 2010-05-25 | Qualcomm Mems Technologies, Inc. | MEMS switches with deforming membranes |
US7289256B2 (en) | 2004-09-27 | 2007-10-30 | Idc, Llc | Electrical characterization of interferometric modulators |
US7259449B2 (en) | 2004-09-27 | 2007-08-21 | Idc, Llc | Method and system for sealing a substrate |
US7553684B2 (en) | 2004-09-27 | 2009-06-30 | Idc, Llc | Method of fabricating interferometric devices using lift-off processing techniques |
TW200628877A (en) | 2005-02-04 | 2006-08-16 | Prime View Int Co Ltd | Method of manufacturing optical interference type color display |
US7948457B2 (en) | 2005-05-05 | 2011-05-24 | Qualcomm Mems Technologies, Inc. | Systems and methods of actuating MEMS display elements |
KR20080027236A (ko) | 2005-05-05 | 2008-03-26 | 콸콤 인코포레이티드 | 다이나믹 드라이버 ic 및 디스플레이 패널 구성 |
US7920136B2 (en) | 2005-05-05 | 2011-04-05 | Qualcomm Mems Technologies, Inc. | System and method of driving a MEMS display device |
EP2495212A3 (en) | 2005-07-22 | 2012-10-31 | QUALCOMM MEMS Technologies, Inc. | Mems devices having support structures and methods of fabricating the same |
EP1910218A1 (en) | 2005-07-22 | 2008-04-16 | Qualcomm Mems Technologies, Inc. | Mems devices having support structures and methods of fabricating the same |
EP1910216A1 (en) | 2005-07-22 | 2008-04-16 | QUALCOMM Incorporated | Support structure for mems device and methods therefor |
US7355779B2 (en) | 2005-09-02 | 2008-04-08 | Idc, Llc | Method and system for driving MEMS display elements |
WO2007041302A2 (en) | 2005-09-30 | 2007-04-12 | Qualcomm Mems Technologies, Inc. | Mems device and interconnects for same |
US7630114B2 (en) | 2005-10-28 | 2009-12-08 | Idc, Llc | Diffusion barrier layer for MEMS devices |
US8391630B2 (en) | 2005-12-22 | 2013-03-05 | Qualcomm Mems Technologies, Inc. | System and method for power reduction when decompressing video streams for interferometric modulator displays |
US7795061B2 (en) | 2005-12-29 | 2010-09-14 | Qualcomm Mems Technologies, Inc. | Method of creating MEMS device cavities by a non-etching process |
US7762463B2 (en) * | 2006-01-05 | 2010-07-27 | Lockheed Martin Corporation | MEMS-based security system |
US7636151B2 (en) | 2006-01-06 | 2009-12-22 | Qualcomm Mems Technologies, Inc. | System and method for providing residual stress test structures |
US7916980B2 (en) | 2006-01-13 | 2011-03-29 | Qualcomm Mems Technologies, Inc. | Interconnect structure for MEMS device |
US7382515B2 (en) | 2006-01-18 | 2008-06-03 | Qualcomm Mems Technologies, Inc. | Silicon-rich silicon nitrides as etch stops in MEMS manufacture |
US7652814B2 (en) | 2006-01-27 | 2010-01-26 | Qualcomm Mems Technologies, Inc. | MEMS device with integrated optical element |
US8194056B2 (en) | 2006-02-09 | 2012-06-05 | Qualcomm Mems Technologies Inc. | Method and system for writing data to MEMS display elements |
WO2007095127A1 (en) | 2006-02-10 | 2007-08-23 | Qualcomm Mems Technologies, Inc. | Method and system for updating of displays showing deterministic content |
US7603001B2 (en) | 2006-02-17 | 2009-10-13 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing back-lighting in an interferometric modulator display device |
US7582952B2 (en) | 2006-02-21 | 2009-09-01 | Qualcomm Mems Technologies, Inc. | Method for providing and removing discharging interconnect for chip-on-glass output leads and structures thereof |
US7547568B2 (en) | 2006-02-22 | 2009-06-16 | Qualcomm Mems Technologies, Inc. | Electrical conditioning of MEMS device and insulating layer thereof |
US7550810B2 (en) | 2006-02-23 | 2009-06-23 | Qualcomm Mems Technologies, Inc. | MEMS device having a layer movable at asymmetric rates |
US7450295B2 (en) | 2006-03-02 | 2008-11-11 | Qualcomm Mems Technologies, Inc. | Methods for producing MEMS with protective coatings using multi-component sacrificial layers |
US7643203B2 (en) * | 2006-04-10 | 2010-01-05 | Qualcomm Mems Technologies, Inc. | Interferometric optical display system with broadband characteristics |
US7903047B2 (en) * | 2006-04-17 | 2011-03-08 | Qualcomm Mems Technologies, Inc. | Mode indicator for interferometric modulator displays |
US7527996B2 (en) | 2006-04-19 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Non-planar surface structures and process for microelectromechanical systems |
US7623287B2 (en) | 2006-04-19 | 2009-11-24 | Qualcomm Mems Technologies, Inc. | Non-planar surface structures and process for microelectromechanical systems |
US7417784B2 (en) | 2006-04-19 | 2008-08-26 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing a porous surface |
US7711239B2 (en) | 2006-04-19 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing nanoparticles |
US8049713B2 (en) | 2006-04-24 | 2011-11-01 | Qualcomm Mems Technologies, Inc. | Power consumption optimized display update |
US7369292B2 (en) * | 2006-05-03 | 2008-05-06 | Qualcomm Mems Technologies, Inc. | Electrode and interconnect materials for MEMS devices |
US7321457B2 (en) | 2006-06-01 | 2008-01-22 | Qualcomm Incorporated | Process and structure for fabrication of MEMS device having isolated edge posts |
US7649671B2 (en) | 2006-06-01 | 2010-01-19 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device with electrostatic actuation and release |
US7405863B2 (en) | 2006-06-01 | 2008-07-29 | Qualcomm Mems Technologies, Inc. | Patterning of mechanical layer in MEMS to reduce stresses at supports |
US7471442B2 (en) | 2006-06-15 | 2008-12-30 | Qualcomm Mems Technologies, Inc. | Method and apparatus for low range bit depth enhancements for MEMS display architectures |
US7766498B2 (en) * | 2006-06-21 | 2010-08-03 | Qualcomm Mems Technologies, Inc. | Linear solid state illuminator |
US7702192B2 (en) | 2006-06-21 | 2010-04-20 | Qualcomm Mems Technologies, Inc. | Systems and methods for driving MEMS display |
US7835061B2 (en) | 2006-06-28 | 2010-11-16 | Qualcomm Mems Technologies, Inc. | Support structures for free-standing electromechanical devices |
US7385744B2 (en) | 2006-06-28 | 2008-06-10 | Qualcomm Mems Technologies, Inc. | Support structure for free-standing MEMS device and methods for forming the same |
US7777715B2 (en) | 2006-06-29 | 2010-08-17 | Qualcomm Mems Technologies, Inc. | Passive circuits for de-multiplexing display inputs |
US7388704B2 (en) | 2006-06-30 | 2008-06-17 | Qualcomm Mems Technologies, Inc. | Determination of interferometric modulator mirror curvature and airgap variation using digital photographs |
US7527998B2 (en) | 2006-06-30 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Method of manufacturing MEMS devices providing air gap control |
US7586602B2 (en) | 2006-07-24 | 2009-09-08 | General Electric Company | Method and apparatus for improved signal to noise ratio in Raman signal detection for MEMS based spectrometers |
US7566664B2 (en) | 2006-08-02 | 2009-07-28 | Qualcomm Mems Technologies, Inc. | Selective etching of MEMS using gaseous halides and reactive co-etchants |
US7763546B2 (en) | 2006-08-02 | 2010-07-27 | Qualcomm Mems Technologies, Inc. | Methods for reducing surface charges during the manufacture of microelectromechanical systems devices |
US7845841B2 (en) | 2006-08-28 | 2010-12-07 | Qualcomm Mems Technologies, Inc. | Angle sweeping holographic illuminator |
EP1943551A2 (en) | 2006-10-06 | 2008-07-16 | Qualcomm Mems Technologies, Inc. | Light guide |
KR101628340B1 (ko) | 2006-10-06 | 2016-06-08 | 퀄컴 엠이엠에스 테크놀로지스, 인크. | 디스플레이 장치 및 디스플레이의 형성 방법 |
US8107155B2 (en) | 2006-10-06 | 2012-01-31 | Qualcomm Mems Technologies, Inc. | System and method for reducing visual artifacts in displays |
WO2008045311A2 (en) | 2006-10-06 | 2008-04-17 | Qualcomm Mems Technologies, Inc. | Illumination device with built-in light coupler |
US7855827B2 (en) | 2006-10-06 | 2010-12-21 | Qualcomm Mems Technologies, Inc. | Internal optical isolation structure for integrated front or back lighting |
WO2008045224A2 (en) * | 2006-10-06 | 2008-04-17 | Qualcomm Mems Technologies, Inc | Thin light bar and method of manufacturing |
WO2008045462A2 (en) * | 2006-10-10 | 2008-04-17 | Qualcomm Mems Technologies, Inc. | Display device with diffractive optics |
US7545552B2 (en) | 2006-10-19 | 2009-06-09 | Qualcomm Mems Technologies, Inc. | Sacrificial spacer process and resultant structure for MEMS support structure |
US7864395B2 (en) | 2006-10-27 | 2011-01-04 | Qualcomm Mems Technologies, Inc. | Light guide including optical scattering elements and a method of manufacture |
US7702194B2 (en) * | 2006-11-07 | 2010-04-20 | Olympus Corporation | Beam steering element and associated methods for manifold fiberoptic switches |
US8131123B2 (en) | 2006-11-07 | 2012-03-06 | Olympus Corporation | Beam steering element and associated methods for manifold fiberoptic switches and monitoring |
US8000568B2 (en) * | 2006-11-07 | 2011-08-16 | Olympus Corporation | Beam steering element and associated methods for mixed manifold fiberoptic switches |
US7720329B2 (en) * | 2006-11-07 | 2010-05-18 | Olympus Corporation | Segmented prism element and associated methods for manifold fiberoptic switches |
US7769255B2 (en) * | 2006-11-07 | 2010-08-03 | Olympus Corporation | High port count instantiated wavelength selective switch |
US7873246B2 (en) * | 2006-11-07 | 2011-01-18 | Olympus Corporation | Beam steering element and associated methods for manifold fiberoptic switches and monitoring |
US7724417B2 (en) * | 2006-12-19 | 2010-05-25 | Qualcomm Mems Technologies, Inc. | MEMS switches with deforming membranes |
US7706042B2 (en) | 2006-12-20 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | MEMS device and interconnects for same |
US7535621B2 (en) | 2006-12-27 | 2009-05-19 | Qualcomm Mems Technologies, Inc. | Aluminum fluoride films for microelectromechanical system applications |
US7777954B2 (en) | 2007-01-30 | 2010-08-17 | Qualcomm Mems Technologies, Inc. | Systems and methods of providing a light guiding layer |
US7733552B2 (en) | 2007-03-21 | 2010-06-08 | Qualcomm Mems Technologies, Inc | MEMS cavity-coating layers and methods |
US7733439B2 (en) | 2007-04-30 | 2010-06-08 | Qualcomm Mems Technologies, Inc. | Dual film light guide for illuminating displays |
US7719752B2 (en) | 2007-05-11 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same |
US7625825B2 (en) | 2007-06-14 | 2009-12-01 | Qualcomm Mems Technologies, Inc. | Method of patterning mechanical layer for MEMS structures |
US8068268B2 (en) | 2007-07-03 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | MEMS devices having improved uniformity and methods for making them |
US7595926B2 (en) | 2007-07-05 | 2009-09-29 | Qualcomm Mems Technologies, Inc. | Integrated IMODS and solar cells on a substrate |
US7570415B2 (en) | 2007-08-07 | 2009-08-04 | Qualcomm Mems Technologies, Inc. | MEMS device and interconnects for same |
US8022896B2 (en) * | 2007-08-08 | 2011-09-20 | Qualcomm Mems Technologies, Inc. | ESD protection for MEMS display panels |
US7949213B2 (en) | 2007-12-07 | 2011-05-24 | Qualcomm Mems Technologies, Inc. | Light illumination of displays with front light guide and coupling elements |
US8068710B2 (en) | 2007-12-07 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | Decoupled holographic film and diffuser |
KR101458904B1 (ko) * | 2008-01-18 | 2014-11-07 | 삼성디스플레이 주식회사 | 표시 장치 |
US7863079B2 (en) | 2008-02-05 | 2011-01-04 | Qualcomm Mems Technologies, Inc. | Methods of reducing CD loss in a microelectromechanical device |
US8654061B2 (en) | 2008-02-12 | 2014-02-18 | Qualcomm Mems Technologies, Inc. | Integrated front light solution |
WO2009102731A2 (en) | 2008-02-12 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Devices and methods for enhancing brightness of displays using angle conversion layers |
WO2009102733A2 (en) | 2008-02-12 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Integrated front light diffuser for reflective displays |
CA2715299A1 (en) | 2008-02-14 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Device having power generating black mask and method of fabricating the same |
US8190025B2 (en) * | 2008-02-28 | 2012-05-29 | Olympus Corporation | Wavelength selective switch having distinct planes of operation |
US8094358B2 (en) * | 2008-03-27 | 2012-01-10 | Qualcomm Mems Technologies, Inc. | Dimming mirror |
US7660028B2 (en) * | 2008-03-28 | 2010-02-09 | Qualcomm Mems Technologies, Inc. | Apparatus and method of dual-mode display |
US7787130B2 (en) | 2008-03-31 | 2010-08-31 | Qualcomm Mems Technologies, Inc. | Human-readable, bi-state environmental sensors based on micro-mechanical membranes |
US7787171B2 (en) * | 2008-03-31 | 2010-08-31 | Qualcomm Mems Technologies, Inc. | Human-readable, bi-state environmental sensors based on micro-mechanical membranes |
US7852491B2 (en) | 2008-03-31 | 2010-12-14 | Qualcomm Mems Technologies, Inc. | Human-readable, bi-state environmental sensors based on micro-mechanical membranes |
US8077326B1 (en) | 2008-03-31 | 2011-12-13 | Qualcomm Mems Technologies, Inc. | Human-readable, bi-state environmental sensors based on micro-mechanical membranes |
US8049951B2 (en) | 2008-04-15 | 2011-11-01 | Qualcomm Mems Technologies, Inc. | Light with bi-directional propagation |
US8118468B2 (en) * | 2008-05-16 | 2012-02-21 | Qualcomm Mems Technologies, Inc. | Illumination apparatus and methods |
CA2726120A1 (en) * | 2008-05-28 | 2009-12-23 | Qualcomm Mems Technologies, Inc. | Front light devices and methods of fabrication thereof |
EP2307795A2 (en) * | 2008-06-04 | 2011-04-13 | QUALCOMM MEMS Technologies, Inc. | Edge shadow reducing methods for prismatic front light |
US7860668B2 (en) * | 2008-06-18 | 2010-12-28 | Qualcomm Mems Technologies, Inc. | Pressure measurement using a MEMS device |
US8172417B2 (en) | 2009-03-06 | 2012-05-08 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
US8736590B2 (en) | 2009-03-27 | 2014-05-27 | Qualcomm Mems Technologies, Inc. | Low voltage driver scheme for interferometric modulators |
US8979349B2 (en) | 2009-05-29 | 2015-03-17 | Qualcomm Mems Technologies, Inc. | Illumination devices and methods of fabrication thereof |
WO2011017204A1 (en) * | 2009-08-03 | 2011-02-10 | Qualcomm Mems Technologies, Inc. | Microstructures for light guide illumination |
US8711361B2 (en) * | 2009-11-05 | 2014-04-29 | Qualcomm, Incorporated | Methods and devices for detecting and measuring environmental conditions in high performance device packages |
US20110169428A1 (en) * | 2010-01-08 | 2011-07-14 | Qualcomm Mems Technologies, Inc. | Edge bar designs to mitigate edge shadow artifact |
US20110176196A1 (en) * | 2010-01-15 | 2011-07-21 | Qualcomm Mems Technologies, Inc. | Methods and devices for pressure detection |
EP2556403A1 (en) | 2010-04-09 | 2013-02-13 | Qualcomm Mems Technologies, Inc. | Mechanical layer of an electromechanical device and methods of forming the same |
US8390916B2 (en) | 2010-06-29 | 2013-03-05 | Qualcomm Mems Technologies, Inc. | System and method for false-color sensing and display |
US8904867B2 (en) | 2010-11-04 | 2014-12-09 | Qualcomm Mems Technologies, Inc. | Display-integrated optical accelerometer |
US8902484B2 (en) | 2010-12-15 | 2014-12-02 | Qualcomm Mems Technologies, Inc. | Holographic brightness enhancement film |
US8714023B2 (en) | 2011-03-10 | 2014-05-06 | Qualcomm Mems Technologies, Inc. | System and method for detecting surface perturbations |
US9134527B2 (en) | 2011-04-04 | 2015-09-15 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US8963159B2 (en) | 2011-04-04 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US8659816B2 (en) | 2011-04-25 | 2014-02-25 | Qualcomm Mems Technologies, Inc. | Mechanical layer and methods of making the same |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4580873A (en) * | 1983-12-30 | 1986-04-08 | At&T Bell Laboratories | Optical matrix switch |
US4844577A (en) * | 1986-12-19 | 1989-07-04 | Sportsoft Systems, Inc. | Bimorph electro optic light modulator |
JPS6431211A (en) * | 1987-07-28 | 1989-02-01 | Toshiba Corp | Position control device |
FR2618914B1 (fr) * | 1987-07-31 | 1991-12-06 | Alain Souloumiac | Perfectionnements apportes aux interrupteurs optomagnetiques |
DE3817035C1 (en) * | 1988-05-19 | 1989-08-17 | Messerschmitt-Boelkow-Blohm Gmbh, 8012 Ottobrunn, De | Micromechanical switch for optical fibres |
GB8921722D0 (en) * | 1989-09-26 | 1989-11-08 | British Telecomm | Micromechanical switch |
US5046806A (en) * | 1990-02-22 | 1991-09-10 | Cst Coldswitch Holdings Inc. | Single fibre control switches |
US5042889A (en) * | 1990-04-09 | 1991-08-27 | At&T Bell Laboratories | Magnetic activation mechanism for an optical switch |
-
1991
- 1991-04-26 US US07/691,920 patent/US5226099A/en not_active Expired - Lifetime
-
1992
- 1992-04-23 CN CN92103085A patent/CN1041020C/zh not_active Expired - Fee Related
- 1992-04-23 EP EP92106928A patent/EP0510629B1/en not_active Expired - Lifetime
- 1992-04-23 DE DE69221196T patent/DE69221196T2/de not_active Expired - Fee Related
- 1992-04-24 JP JP10687692A patent/JP3213048B2/ja not_active Expired - Fee Related
- 1992-04-25 KR KR1019920007040A patent/KR100261400B1/ko not_active IP Right Cessation
- 1992-09-02 TW TW081106944A patent/TW295636B/zh active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018023968A1 (zh) * | 2016-08-01 | 2018-02-08 | 华为技术有限公司 | 光开关和光交换系统 |
CN107678098A (zh) * | 2016-08-01 | 2018-02-09 | 华为技术有限公司 | 光开关和光交换系统 |
CN107678098B (zh) * | 2016-08-01 | 2019-09-03 | 华为技术有限公司 | 光开关和光交换系统 |
US10705295B2 (en) | 2016-08-01 | 2020-07-07 | Huawei Technologies Co., Ltd. | Optical switch and optical switching system |
Also Published As
Publication number | Publication date |
---|---|
KR920020776A (ko) | 1992-11-21 |
DE69221196T2 (de) | 1998-01-08 |
JPH06148540A (ja) | 1994-05-27 |
EP0510629A1 (en) | 1992-10-28 |
JP3213048B2 (ja) | 2001-09-25 |
EP0510629B1 (en) | 1997-07-30 |
DE69221196D1 (de) | 1997-09-04 |
CN1041020C (zh) | 1998-12-02 |
TW295636B (zh) | 1997-01-11 |
KR100261400B1 (ko) | 2000-07-01 |
US5226099A (en) | 1993-07-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1068198A (zh) | 可变形镜光闸装置 | |
US5526951A (en) | Fabrication method for digital micro-mirror devices using low temperature CVD | |
EP0694801B1 (en) | Improvements in and relating to micro-mechanical devices | |
US8278726B2 (en) | Controlling electromechanical behavior of structures within a microelectromechanical systems device | |
EP1704424B1 (en) | High contrast spatial light modulator and method | |
US5454906A (en) | Method of providing sacrificial spacer for micro-mechanical devices | |
US5233459A (en) | Electric display device | |
CN100580508C (zh) | 具有提高对比度的数字微镜装置及其方法 | |
AU774240B2 (en) | Microelectromechanical optical switch and method of manufacture thereof | |
US7852544B2 (en) | Separable modulator | |
CN101176026B (zh) | 用于半导体器件的消反射涂层及其方法 | |
US20030203530A1 (en) | Single crystal silicon micromirror and array | |
EP0690329A2 (en) | Improved hinge for micro-mechanical device | |
CN102203658A (zh) | 用于顺性机构的制造结构和方法 | |
CN101999091A (zh) | 带有应力梁的机械式光调制器 | |
WO2002084753A1 (en) | Micro piezoelectric actuator and method for fabricating same | |
JPH07301753A (ja) | M×n個のアクチュエーテッドミラーアレーの製造方法 | |
CA2463900A1 (en) | Digital optical switch apparatus and process for manufacturing same | |
CN1072804C (zh) | 可驱动反射镜阵列及其制造方法 | |
CN1365009A (zh) | 用于制造微型结构的方法 | |
US20040212868A1 (en) | Trench-embeded mirror structure for double substrate spatial light modulator | |
KR970060514A (ko) | 유전층을 갖는 박막형 광로 조절 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C15 | Extension of patent right duration from 15 to 20 years for appl. with date before 31.12.1992 and still valid on 11.12.2001 (patent law change 1993) | ||
OR01 | Other related matters | ||
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |