CN1064720C - 真空蒸发设备 - Google Patents

真空蒸发设备 Download PDF

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Publication number
CN1064720C
CN1064720C CN92110361A CN92110361A CN1064720C CN 1064720 C CN1064720 C CN 1064720C CN 92110361 A CN92110361 A CN 92110361A CN 92110361 A CN92110361 A CN 92110361A CN 1064720 C CN1064720 C CN 1064720C
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CN
China
Prior art keywords
evaporation source
deposition plate
vacuum vessel
evaporation
clamping device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN92110361A
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English (en)
Chinese (zh)
Other versions
CN1070434A (zh
Inventor
早川菜
龟山诚
寺田顺司
铃木博幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN1070434A publication Critical patent/CN1070434A/zh
Application granted granted Critical
Publication of CN1064720C publication Critical patent/CN1064720C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
CN92110361A 1991-09-11 1992-09-08 真空蒸发设备 Expired - Fee Related CN1064720C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP231910/1991 1991-09-11
JP23191091A JPH0570931A (ja) 1991-09-11 1991-09-11 真空蒸着装置および防着板
JP231910/91 1991-09-11

Publications (2)

Publication Number Publication Date
CN1070434A CN1070434A (zh) 1993-03-31
CN1064720C true CN1064720C (zh) 2001-04-18

Family

ID=16930975

Family Applications (1)

Application Number Title Priority Date Filing Date
CN92110361A Expired - Fee Related CN1064720C (zh) 1991-09-11 1992-09-08 真空蒸发设备

Country Status (2)

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JP (1) JPH0570931A (ja)
CN (1) CN1064720C (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4874851B2 (ja) 2007-03-30 2012-02-15 富士フイルム株式会社 真空成膜装置
CN101698931B (zh) * 2009-11-18 2012-11-07 九江学院 一种制备超晶格热电薄膜材料的双闪蒸法装置
CN103160788B (zh) * 2011-12-16 2017-06-30 上海大学 真空蒸发系统
CN105154831B (zh) * 2015-09-07 2016-10-05 京东方科技集团股份有限公司 一种真空蒸发源装置及真空蒸镀设备
CN105349948A (zh) * 2015-12-04 2016-02-24 贵州大学 一种新型热蒸发镀膜器及其使用方法
KR101901072B1 (ko) * 2017-10-31 2018-09-20 캐논 톡키 가부시키가이샤 증발원 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법
CN108642454B (zh) * 2018-06-26 2020-07-03 云谷（固安）科技有限公司 一种蒸镀设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4395440A (en) * 1980-10-09 1983-07-26 Matsushita Electric Industrial Co., Ltd. Method of and apparatus for manufacturing ultrafine particle film
US4950642A (en) * 1987-08-07 1990-08-21 Hitachi, Ltd. Method for fabricating superconducting oxide thin films by activated reactive evaporation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4395440A (en) * 1980-10-09 1983-07-26 Matsushita Electric Industrial Co., Ltd. Method of and apparatus for manufacturing ultrafine particle film
US4950642A (en) * 1987-08-07 1990-08-21 Hitachi, Ltd. Method for fabricating superconducting oxide thin films by activated reactive evaporation

Also Published As

Publication number Publication date
JPH0570931A (ja) 1993-03-23
CN1070434A (zh) 1993-03-31

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Granted publication date: 20010418

Termination date: 20110908