CN106463341A - 使用多阶推顶器从胶带剥离半导体芯片的系统及方法 - Google Patents
使用多阶推顶器从胶带剥离半导体芯片的系统及方法 Download PDFInfo
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- CN106463341A CN106463341A CN201580031923.6A CN201580031923A CN106463341A CN 106463341 A CN106463341 A CN 106463341A CN 201580031923 A CN201580031923 A CN 201580031923A CN 106463341 A CN106463341 A CN 106463341A
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Classifications
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- H—ELECTRICITY
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
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- H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
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- Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
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- Y10S156/941—Means for delaminating semiconductive product
- Y10S156/943—Means for delaminating semiconductive product with poking delaminating means, e.g. jabbing means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T156/1126—Using direct fluid current against work during delaminating
- Y10T156/1132—Using vacuum directly against work during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1179—Gripping and pulling work apart during delaminating with poking during delaminating [e.g., jabbing, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
- Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
- Y10T156/1983—Poking delaminating means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201403372S | 2014-06-18 | ||
SG10201403372SA SG10201403372SA (en) | 2014-06-18 | 2014-06-18 | System and method for peeling a semiconductor chip from a tape using a multistage ejector |
PCT/SG2015/050109 WO2015195045A1 (en) | 2014-06-18 | 2015-05-13 | System and method for peeling a semiconductor chip from a tape using a multistage ejector |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106463341A true CN106463341A (zh) | 2017-02-22 |
CN106463341B CN106463341B (zh) | 2019-03-26 |
Family
ID=54935881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201580031923.6A Active CN106463341B (zh) | 2014-06-18 | 2015-05-13 | 使用多阶推顶器从胶带剥离半导体芯片的系统及方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9929036B2 (zh) |
KR (1) | KR102274157B1 (zh) |
CN (1) | CN106463341B (zh) |
MY (1) | MY188507A (zh) |
PH (1) | PH12016502349B1 (zh) |
SG (1) | SG10201403372SA (zh) |
TW (1) | TWI664068B (zh) |
WO (1) | WO2015195045A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108666257A (zh) * | 2017-03-31 | 2018-10-16 | 日月光半导体制造股份有限公司 | 元件剥离装置及元件剥离方法 |
CN113594079A (zh) * | 2020-04-30 | 2021-11-02 | 先进科技新加坡有限公司 | 用于将电子元件从粘性载体分离的顶出器单元 |
CN114162432A (zh) * | 2020-09-11 | 2022-03-11 | 健策精密工业股份有限公司 | 均热片的包装盒与包装方法 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6797569B2 (ja) * | 2016-06-13 | 2020-12-09 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
JP7217605B2 (ja) * | 2018-09-21 | 2023-02-03 | ファスフォードテクノロジ株式会社 | 半導体製造装置、突上げ治具および半導体装置の製造方法 |
US11062923B2 (en) * | 2018-09-28 | 2021-07-13 | Rohinni, LLC | Apparatus to control transfer parameters during transfer of semiconductor devices |
KR102617347B1 (ko) * | 2018-10-04 | 2023-12-26 | 삼성전자주식회사 | 다이 이젝터 및 상기 다이 이젝터를 포함하는 다이 공급 장치 |
DE102018125682B4 (de) * | 2018-10-16 | 2023-01-19 | Asm Assembly Systems Gmbh & Co. Kg | Ejektorvorrichtung sowie Verfahren zum Unterstützen eines Ablösens eines auf einer Haltefolie angeordneten elektrischen Bauteils |
KR102656718B1 (ko) * | 2018-11-05 | 2024-04-12 | 세메스 주식회사 | 다이 이젝팅 장치 |
KR20200109044A (ko) * | 2019-03-12 | 2020-09-22 | 삼성전자주식회사 | 칩 이젝팅 장치 |
JP7274902B2 (ja) * | 2019-03-25 | 2023-05-17 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
US11600516B2 (en) * | 2020-05-13 | 2023-03-07 | Asmpt Singapore Pte. Ltd. | Die ejector height adjustment |
JP7039675B2 (ja) * | 2020-11-18 | 2022-03-22 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
KR20220119395A (ko) * | 2021-02-17 | 2022-08-29 | 가부시키가이샤 신가와 | 반도체 다이의 픽업 장치 및 픽업 방법 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1210760C (zh) * | 2001-10-23 | 2005-07-13 | 富士通株式会社 | 用可位移接触部件剥离半导体器件的方法和装置 |
US20070293022A1 (en) * | 2006-06-19 | 2007-12-20 | Samsung Electronics Co., Ltd. | Method of and apparatus for detaching semiconductor chips from a tape |
CN101335191A (zh) * | 2007-06-19 | 2008-12-31 | 株式会社瑞萨科技 | 半导体集成电路装置的制造方法 |
US20110088845A1 (en) * | 2009-10-20 | 2011-04-21 | Chi Ming Chong | Universal die detachment apparatus |
CN102148142A (zh) * | 2010-02-05 | 2011-08-10 | 先进自动器材有限公司 | 用于薄晶粒分离和拾取的控制与监测系统 |
CN103367136A (zh) * | 2012-03-30 | 2013-10-23 | 贝思瑞士股份公司 | 将半导体芯片从箔拆下的方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4624813B2 (ja) * | 2005-01-21 | 2011-02-02 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体製造装置 |
US7238258B2 (en) | 2005-04-22 | 2007-07-03 | Stats Chippac Ltd. | System for peeling semiconductor chips from tape |
US7665204B2 (en) * | 2006-10-16 | 2010-02-23 | Asm Assembly Automation Ltd. | Die detachment apparatus comprising pre-peeling structure |
US8221583B2 (en) * | 2007-01-20 | 2012-07-17 | Stats Chippac Ltd. | System for peeling semiconductor chips from tape |
TWI463580B (zh) * | 2007-06-19 | 2014-12-01 | Renesas Electronics Corp | Manufacturing method of semiconductor integrated circuit device |
JP2009064938A (ja) | 2007-09-06 | 2009-03-26 | Shinkawa Ltd | 半導体ダイのピックアップ装置及びピックアップ方法 |
MY150953A (en) * | 2008-11-05 | 2014-03-31 | Esec Ag | Die-ejector |
US8141612B2 (en) * | 2009-04-02 | 2012-03-27 | Asm Assembly Automation Ltd | Device for thin die detachment and pick-up |
-
2014
- 2014-06-18 SG SG10201403372SA patent/SG10201403372SA/en unknown
-
2015
- 2015-05-13 WO PCT/SG2015/050109 patent/WO2015195045A1/en active Application Filing
- 2015-05-13 CN CN201580031923.6A patent/CN106463341B/zh active Active
- 2015-05-13 US US15/319,259 patent/US9929036B2/en active Active
- 2015-05-13 MY MYPI2016001977A patent/MY188507A/en unknown
- 2015-05-13 KR KR1020177001322A patent/KR102274157B1/ko active IP Right Grant
- 2015-06-17 TW TW104119571A patent/TWI664068B/zh active
-
2016
- 2016-11-25 PH PH12016502349A patent/PH12016502349B1/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1210760C (zh) * | 2001-10-23 | 2005-07-13 | 富士通株式会社 | 用可位移接触部件剥离半导体器件的方法和装置 |
US20070293022A1 (en) * | 2006-06-19 | 2007-12-20 | Samsung Electronics Co., Ltd. | Method of and apparatus for detaching semiconductor chips from a tape |
CN101335191A (zh) * | 2007-06-19 | 2008-12-31 | 株式会社瑞萨科技 | 半导体集成电路装置的制造方法 |
US20110088845A1 (en) * | 2009-10-20 | 2011-04-21 | Chi Ming Chong | Universal die detachment apparatus |
CN102148142A (zh) * | 2010-02-05 | 2011-08-10 | 先进自动器材有限公司 | 用于薄晶粒分离和拾取的控制与监测系统 |
CN103367136A (zh) * | 2012-03-30 | 2013-10-23 | 贝思瑞士股份公司 | 将半导体芯片从箔拆下的方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108666257A (zh) * | 2017-03-31 | 2018-10-16 | 日月光半导体制造股份有限公司 | 元件剥离装置及元件剥离方法 |
CN108666257B (zh) * | 2017-03-31 | 2021-03-09 | 日月光半导体制造股份有限公司 | 元件剥离装置及元件剥离方法 |
CN113594079A (zh) * | 2020-04-30 | 2021-11-02 | 先进科技新加坡有限公司 | 用于将电子元件从粘性载体分离的顶出器单元 |
CN113594079B (zh) * | 2020-04-30 | 2024-01-16 | 先进科技新加坡有限公司 | 用于将电子元件从粘性载体分离的顶出器单元 |
CN114162432A (zh) * | 2020-09-11 | 2022-03-11 | 健策精密工业股份有限公司 | 均热片的包装盒与包装方法 |
CN114162432B (zh) * | 2020-09-11 | 2024-05-24 | 健策精密工业股份有限公司 | 均热片的包装盒与包装方法 |
Also Published As
Publication number | Publication date |
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TW201600312A (zh) | 2016-01-01 |
SG10201403372SA (en) | 2016-01-28 |
TWI664068B (zh) | 2019-07-01 |
MY188507A (en) | 2021-12-17 |
PH12016502349A1 (en) | 2017-02-13 |
US9929036B2 (en) | 2018-03-27 |
KR102274157B1 (ko) | 2021-07-09 |
PH12016502349B1 (en) | 2017-02-13 |
US20170133259A1 (en) | 2017-05-11 |
WO2015195045A1 (en) | 2015-12-23 |
KR20170029511A (ko) | 2017-03-15 |
CN106463341B (zh) | 2019-03-26 |
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