CN106415774B - 电子显微镜装置及使用该电子显微镜装置的拍摄方法 - Google Patents

电子显微镜装置及使用该电子显微镜装置的拍摄方法 Download PDF

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CN106415774B
CN106415774B CN201580027482.2A CN201580027482A CN106415774B CN 106415774 B CN106415774 B CN 106415774B CN 201580027482 A CN201580027482 A CN 201580027482A CN 106415774 B CN106415774 B CN 106415774B
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CN106415774A (zh
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小林光俊
中平健治
田中麻纪
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Hitachi Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Image Processing (AREA)
  • Microscoopes, Condenser (AREA)
CN201580027482.2A 2014-07-02 2015-05-27 电子显微镜装置及使用该电子显微镜装置的拍摄方法 Active CN106415774B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014-136874 2014-07-02
JP2014136874A JP6190768B2 (ja) 2014-07-02 2014-07-02 電子顕微鏡装置およびそれを用いた撮像方法
PCT/JP2015/065319 WO2016002397A1 (ja) 2014-07-02 2015-05-27 電子顕微鏡装置およびそれを用いた撮像方法

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CN106415774A CN106415774A (zh) 2017-02-15
CN106415774B true CN106415774B (zh) 2017-12-15

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US (1) US9824853B2 (enExample)
JP (1) JP6190768B2 (enExample)
CN (1) CN106415774B (enExample)
DE (1) DE112015001902B4 (enExample)
WO (1) WO2016002397A1 (enExample)

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WO2016026038A1 (en) * 2014-08-18 2016-02-25 Viewsiq Inc. System and method for embedded images in large field-of-view microscopic scans
WO2017034976A1 (en) * 2015-08-21 2017-03-02 Cummins Filtration Ip, Inc. High speed rotating crankcase ventilation filter media and media pack
CN111001225B (zh) 2015-08-28 2021-11-19 康明斯过滤Ip公司 具有定向的液体排放口和气体出口的旋转聚结元件
JP6391170B2 (ja) * 2015-09-03 2018-09-19 東芝メモリ株式会社 検査装置
US10096097B2 (en) * 2016-08-01 2018-10-09 The United States Of America As Represented By The Secretary Of The Navy Content-aware bidirectional image edge highlighting
JP7107653B2 (ja) * 2017-08-31 2022-07-27 東レエンジニアリング先端半導体Ｍｉテクノロジー株式会社 画像生成方法
JP7171010B2 (ja) * 2018-03-07 2022-11-15 株式会社日立ハイテクサイエンス 断面加工観察装置、断面加工観察方法及びプログラム
EP3598474A1 (en) 2018-07-19 2020-01-22 FEI Company Adaptive specimen image acquisition using an artificial neural network
CN109087293B (zh) * 2018-07-27 2020-10-16 新华三大数据技术有限公司 一种调节电子显微镜成像参数的方法及装置
EP3948923A4 (en) * 2019-03-28 2022-12-21 Massachusetts Institute of Technology System and method for learning-guided electron microscopy
WO2021140620A1 (ja) * 2020-01-09 2021-07-15 株式会社日立ハイテク 画像を生成するシステム、及び非一時的コンピュータ可読媒体
KR102831613B1 (ko) * 2020-07-14 2025-07-09 주식회사 히타치하이테크 시료상 관찰 장치 및 그 방법
WO2024157405A1 (ja) * 2023-01-26 2024-08-02 株式会社日立ハイテク 荷電粒子線装置、画像処理方法および画像処理プログラム

Citations (5)

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CN1364241A (zh) * 2000-03-06 2002-08-14 奥林巴斯光学工业株式会社 适用于分段像观察装置的图案形成部件和分段像观察装置
WO2012014935A1 (ja) * 2010-07-29 2012-02-02 株式会社日立ハイテクノロジーズ 検査方法及び装置
WO2012111054A1 (ja) * 2011-02-17 2012-08-23 株式会社 日立ハイテクノロジーズ 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法
US20140009597A1 (en) * 2012-07-05 2014-01-09 Cannon Kabushiki Kaisha Microscope apparatus and control method for same
CN103703537A (zh) * 2011-07-20 2014-04-02 株式会社日立高新技术 扫描电子显微镜及扫描透过电子显微镜

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SG92679A1 (en) * 2000-02-29 2002-11-19 Inst Materials Research & Eng Selective deposition of a particle beam based on charging characteristics of a sample
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JP2011033423A (ja) * 2009-07-31 2011-02-17 Hitachi High-Technologies Corp パターン形状選択方法、及びパターン測定装置
JP5188529B2 (ja) * 2010-03-30 2013-04-24 株式会社日立ハイテクノロジーズ 電子ビーム照射方法、及び走査電子顕微鏡
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JP5537488B2 (ja) * 2011-04-15 2014-07-02 株式会社日立ハイテクノロジーズ 荷電粒子顕微鏡装置および画像撮像方法
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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1364241A (zh) * 2000-03-06 2002-08-14 奥林巴斯光学工业株式会社 适用于分段像观察装置的图案形成部件和分段像观察装置
WO2012014935A1 (ja) * 2010-07-29 2012-02-02 株式会社日立ハイテクノロジーズ 検査方法及び装置
WO2012111054A1 (ja) * 2011-02-17 2012-08-23 株式会社 日立ハイテクノロジーズ 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法
CN103703537A (zh) * 2011-07-20 2014-04-02 株式会社日立高新技术 扫描电子显微镜及扫描透过电子显微镜
US20140009597A1 (en) * 2012-07-05 2014-01-09 Cannon Kabushiki Kaisha Microscope apparatus and control method for same

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DE112015001902B4 (de) 2021-01-21
DE112015001902T5 (de) 2017-02-02
US20170169992A1 (en) 2017-06-15
JP2016015252A (ja) 2016-01-28
JP6190768B2 (ja) 2017-08-30
WO2016002397A1 (ja) 2016-01-07
CN106415774A (zh) 2017-02-15
US9824853B2 (en) 2017-11-21

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