DE112015001902B4 - Elektronenmikroskopvorrichtung und sie verwendendes Abbildungsverfahren - Google Patents

Elektronenmikroskopvorrichtung und sie verwendendes Abbildungsverfahren Download PDF

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Publication number
DE112015001902B4
DE112015001902B4 DE112015001902.2T DE112015001902T DE112015001902B4 DE 112015001902 B4 DE112015001902 B4 DE 112015001902B4 DE 112015001902 T DE112015001902 T DE 112015001902T DE 112015001902 B4 DE112015001902 B4 DE 112015001902B4
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German (de)
English (en)
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DE112015001902T5 (de
Inventor
Mitsutoshi KOBAYASHI
Kenji Nakahira
Maki Tanaka
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Image Processing (AREA)
  • Microscoopes, Condenser (AREA)
DE112015001902.2T 2014-07-02 2015-05-27 Elektronenmikroskopvorrichtung und sie verwendendes Abbildungsverfahren Active DE112015001902B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014-136874 2014-07-02
JP2014136874A JP6190768B2 (ja) 2014-07-02 2014-07-02 電子顕微鏡装置およびそれを用いた撮像方法
PCT/JP2015/065319 WO2016002397A1 (ja) 2014-07-02 2015-05-27 電子顕微鏡装置およびそれを用いた撮像方法

Publications (2)

Publication Number Publication Date
DE112015001902T5 DE112015001902T5 (de) 2017-02-02
DE112015001902B4 true DE112015001902B4 (de) 2021-01-21

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DE112015001902.2T Active DE112015001902B4 (de) 2014-07-02 2015-05-27 Elektronenmikroskopvorrichtung und sie verwendendes Abbildungsverfahren

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Country Link
US (1) US9824853B2 (enExample)
JP (1) JP6190768B2 (enExample)
CN (1) CN106415774B (enExample)
DE (1) DE112015001902B4 (enExample)
WO (1) WO2016002397A1 (enExample)

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CN107076980A (zh) * 2014-08-18 2017-08-18 维斯科技有限公司 用于大视场显微扫描中嵌入图像的系统和方法
CN107847839B (zh) * 2015-08-21 2020-05-29 康明斯过滤Ip公司 高速旋转曲轴箱通风过滤介质和介质包
WO2017040256A1 (en) 2015-08-28 2017-03-09 Cummins Filtration Ip, Inc Rotating coalescing element with directed liquid drainage and gas outlet
JP6391170B2 (ja) * 2015-09-03 2018-09-19 東芝メモリ株式会社 検査装置
US10096097B2 (en) * 2016-08-01 2018-10-09 The United States Of America As Represented By The Secretary Of The Navy Content-aware bidirectional image edge highlighting
JP7107653B2 (ja) * 2017-08-31 2022-07-27 東レエンジニアリング先端半導体Ｍｉテクノロジー株式会社 画像生成方法
JP7171010B2 (ja) * 2018-03-07 2022-11-15 株式会社日立ハイテクサイエンス 断面加工観察装置、断面加工観察方法及びプログラム
EP3598474A1 (en) 2018-07-19 2020-01-22 FEI Company Adaptive specimen image acquisition using an artificial neural network
CN109087293B (zh) * 2018-07-27 2020-10-16 新华三大数据技术有限公司 一种调节电子显微镜成像参数的方法及装置
US11164721B2 (en) 2019-03-28 2021-11-02 Massachusetts Institute Of Technology System and method for learning-guided electron microscopy
KR20250166347A (ko) * 2020-01-09 2025-11-27 주식회사 히타치하이테크 화상을 생성하는 시스템, 및 비일시적 컴퓨터 가독 매체
WO2022013945A1 (ja) 2020-07-14 2022-01-20 株式会社日立ハイテク 試料像観察装置、及びその方法
JPWO2024157405A1 (enExample) * 2023-01-26 2024-08-02

Citations (2)

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US20140009597A1 (en) * 2012-07-05 2014-01-09 Cannon Kabushiki Kaisha Microscope apparatus and control method for same
US20140226003A1 (en) * 2011-05-13 2014-08-14 Fibics Incorporated Microscopy imaging method and system

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
JPH0562630A (ja) * 1991-08-30 1993-03-12 Jeol Ltd 複数の記録位置を備えた電子顕微鏡
SG92679A1 (en) * 2000-02-29 2002-11-19 Inst Materials Research & Eng Selective deposition of a particle beam based on charging characteristics of a sample
CN100449348C (zh) * 2000-03-06 2009-01-07 奥林巴斯光学工业株式会社 适用于分段像观察装置的图案形成部件
US7634061B1 (en) * 2004-03-26 2009-12-15 Nova R & D, Inc. High resolution imaging system
JP2011033423A (ja) * 2009-07-31 2011-02-17 Hitachi High-Technologies Corp パターン形状選択方法、及びパターン測定装置
JP5188529B2 (ja) * 2010-03-30 2013-04-24 株式会社日立ハイテクノロジーズ 電子ビーム照射方法、及び走査電子顕微鏡
JP5324534B2 (ja) * 2010-07-29 2013-10-23 株式会社日立ハイテクノロジーズ 検査方法及び装置
JP5537460B2 (ja) * 2011-02-17 2014-07-02 株式会社日立ハイテクノロジーズ 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法
JP2012226874A (ja) * 2011-04-15 2012-11-15 Ccs Inc 反射型照明装置
JP5537488B2 (ja) * 2011-04-15 2014-07-02 株式会社日立ハイテクノロジーズ 荷電粒子顕微鏡装置および画像撮像方法
JP5712074B2 (ja) * 2011-07-20 2015-05-07 株式会社日立ハイテクノロジーズ 走査透過電子顕微鏡
US9390887B2 (en) * 2013-09-17 2016-07-12 Kla-Tencor Corporation Non-invasive charged particle beam monitor
JP6242745B2 (ja) * 2014-05-13 2017-12-06 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び当該装置を用いる検査方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140226003A1 (en) * 2011-05-13 2014-08-14 Fibics Incorporated Microscopy imaging method and system
US20140009597A1 (en) * 2012-07-05 2014-01-09 Cannon Kabushiki Kaisha Microscope apparatus and control method for same

Also Published As

Publication number Publication date
JP6190768B2 (ja) 2017-08-30
JP2016015252A (ja) 2016-01-28
WO2016002397A1 (ja) 2016-01-07
US20170169992A1 (en) 2017-06-15
DE112015001902T5 (de) 2017-02-02
CN106415774B (zh) 2017-12-15
CN106415774A (zh) 2017-02-15
US9824853B2 (en) 2017-11-21

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