CN106409723A - UV irradiation apparatus and UV irradiation method - Google Patents
UV irradiation apparatus and UV irradiation method Download PDFInfo
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- CN106409723A CN106409723A CN201610622675.9A CN201610622675A CN106409723A CN 106409723 A CN106409723 A CN 106409723A CN 201610622675 A CN201610622675 A CN 201610622675A CN 106409723 A CN106409723 A CN 106409723A
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- resettlement section
- irradiation
- ultraviolet
- substrate
- room
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- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 title abstract 6
- 239000000758 substrate Substances 0.000 claims abstract description 150
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 38
- 239000001301 oxygen Substances 0.000 claims description 38
- 229910052760 oxygen Inorganic materials 0.000 claims description 38
- 230000005855 radiation Effects 0.000 claims description 38
- 238000001816 cooling Methods 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 22
- 230000001105 regulatory effect Effects 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 claims description 9
- 238000003825 pressing Methods 0.000 claims description 9
- 230000002035 prolonged effect Effects 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 24
- 238000005286 illumination Methods 0.000 description 54
- 230000007246 mechanism Effects 0.000 description 30
- 239000000203 mixture Substances 0.000 description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 230000003068 static effect Effects 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 9
- 230000003028 elevating effect Effects 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000007711 solidification Methods 0.000 description 5
- 230000008023 solidification Effects 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/0231—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to electromagnetic radiation, e.g. UV light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02345—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
- H01L21/02348—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light treatment by exposure to UV light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31058—After-treatment of organic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention relates to a UV irradiation apparatus and a UV irradiation method. The invention aims at providing a UV irradiation apparatus which can prevent the generation of particles in a receiving part and keep a substrate clean. The UV irradiation apparatus comprises a receiving part which can receive a substrate in an enclosed space; an irradiation part which is arranged outside the receiving part and can irradiate ultraviolet ray to the substrate; a moving part which is arranged outside the receiving part and can make the irradiation part move outside the receiving part. Therefore, ultraviolet ray can be irradiated from the exterior of the receiving part to the substrate received in the receiving part.
Description
Technical field
The present invention relates to ultraviolet lamp and ultraviolet irradiation method.
Background technology
On the glass substrate of display floater constituting liquid crystal display etc., it is formed with wiring pattern and electrode pattern etc. micro-
Thin pattern.For example, such pattern can be formed using methods such as photoetching processes.Photoetching process includes following operation：By resist film
Coat the operation of glass substrate, the operation that resist film is exposed, by the operation of resist film development after exposure and to aobvious
The operation (solidification (cure) operation) of the light such as the resist film irradiation ultraviolet radiation of movie queen.
Above-mentioned curing process can be carried out using to the ultraviolet lamp of substrate irradiation ultraviolet radiation.For example, patent literary composition
Offer and in 1, disclose the belt carrying mechanism with carrying substrate in the horizontal direction and the ultraviolet photograph to substrate irradiation ultraviolet radiation
Penetrate the composition of mechanism.
Patent Document 2 discloses to have and keep the substrate holder of substrate, send out to the ultraviolet of substrate irradiation ultraviolet radiation
Source of students and the composition changing the reflecting plate in ultraviolet irradiation direction sending from ultraviolet occurring source.
Prior art literature
Patent documentation
Patent documentation 1：Japanese Unexamined Patent Publication 4-97515 publication
Patent documentation 2：Japanese Unexamined Patent Publication 2006-114848 publication
Content of the invention
Invent problem to be solved
However, in patent documentation 1, being to be provided with the upper of ultraviolet irradiation machine structure etc. above belt carrying mechanism
Lid, in the space being capped covering on one side carrying substrate one side irradiation ultraviolet radiation in the horizontal direction composition, therefore, in carrying
It is possible to produce fine dust etc. in space (hereinafter referred to as " particle (particle) " during substrate.).
In patent documentation 2, it is to make on substrate holder in the indoor setting substrate holder of process and motor, with motor
Lower movement or the composition of rotation, therefore, when making substrate mobile it is possible to process indoor generation particle.
In above-mentioned patent documentation 1 and 2, due to being possible to when making substrate mobile produce particle, therefore, the particle of generation has
When be attached on substrate, keep board cleaning in terms of have problems.
In view of above-mentioned such situation, it is an object of the invention to provide a kind of ultraviolet lamp and ultraviolet irradiate
Method, described ultraviolet lamp and ultraviolet irradiation method can suppress to produce particle in resettlement section, and substrate can be kept clear
Clean.
Means for solving the problems
The ultraviolet lamp that one mode of the present invention is related to includes：Resettlement section, described resettlement section can be in confined air
Interior collecting substrate；Irradiation portion, described irradiation portion is arranged at the outside of above-mentioned resettlement section, can irradiate ultraviolet to aforesaid substrate
Line；And move portion, described move portion is arranged at the outside of above-mentioned resettlement section, makes above-mentioned irradiation portion in the outside of above-mentioned resettlement section
Mobile, so that irradiating above-mentioned ultraviolet from the outside of above-mentioned resettlement section to the aforesaid substrate of the inside being housed in above-mentioned resettlement section
Line.
By above-mentioned composition, can making substrate in the state of there is the internal stationary of resettlement section of confined space,
Outside mobile irradiation portion in resettlement section, while the substrate irradiation ultraviolet radiation of inside to resettlement section, therefore, there is no need to consider companion
Produce particle with the movement of substrate.Further, since be irradiated the movement in portion in the outside of resettlement section, therefore, even if false
If produce particle along with the movement of irradiation portion, by making resettlement section be confined space, also it is avoided that particle invades collecting
In portion.Therefore, can suppress to produce particle in resettlement section, board cleaning can be kept.
In addition, by irradiation portion mobile in the state of making substrate static, even if thus being contrasted using plan view size
The big substrate in portion of penetrating, compared with the situation of moving substrate in the state of making irradiation portion static, also can save and irradiate purple to substrate
Required space (space) during outside line, can reduce area occupied (footprint).
In addition, by being formed as making the static state in resettlement section of substrate, as long as thus guaranteeing substrate in resettlement section
Receiving space, therefore, and makes substrate compared with the situation of movement in resettlement section, can reduce the volume of resettlement section, it will hold
Easily carry out the management of the oxygen concentration dew point in resettlement section.In addition, can reduce to use when adjusting the oxygen concentration in resettlement section
The consumption of nitrogen.
In above-mentioned ultraviolet lamp, transmissive portions can be provided with above-mentioned resettlement section, described transmissive portions transmissive
Above-mentioned ultraviolet.
By above-mentioned composition, the simple composition that employ transmissive portions can be utilized, irradiate ultraviolet via transmissive portions to substrate
Line.
In above-mentioned ultraviolet lamp, above-mentioned resettlement section may include top board, and described top board covers the upper of aforesaid substrate
Side, above-mentioned transmissive portions may be placed at above-mentioned top board.
By above-mentioned composition, simple composition that transmissive portions are provided with the top board of resettlement section can be utilized, via transmission
Portion is to substrate irradiation ultraviolet radiation.In addition, by a part for resettlement section arrange transmissive portions, thus with the entirety of resettlement section
The situation of setting transmissive portions is compared, and can improve the maintainability of transmissive portions.
In above-mentioned ultraviolet lamp, above-mentioned move portion may include：Guide portion, described guide portion is to press from both sides every above-mentioned receipts
The mode in appearance portion extends along the moving direction of above-mentioned irradiation portion；With gate frame, the side to cross over above-mentioned resettlement section for the described gate frame
Formula is formed as gate, and is set to move along guide sections；Above-mentioned gate frame can arrange maintaining part, described guarantor
Portion of holding keeps above-mentioned irradiation portion.
By above-mentioned composition, compared with the general situation along the mobile irradiation portion of guide rail (rail), can be utilized and there is Gao Gang
Property gate frame make irradiation portion along guide portion move, therefore, can stably be irradiated the movement in portion.
In above-mentioned ultraviolet lamp, above-mentioned resettlement section may include the first resettlement section and the second resettlement section, and described
One resettlement section and the second resettlement section can house aforesaid substrate in confined space, and along above-mentioned irradiation portion moving direction simultaneously
Row；Guide sections may include the first guide rail and the second guide rail, and described first guide rail is in the way of pressing from both sides every above-mentioned first resettlement section
Extend, described second guide rail is arranged side by side with above-mentioned first guide rail along the moving direction of above-mentioned irradiation portion, and to press from both sides every above-mentioned second
The mode of resettlement section extends.
By above-mentioned composition, irradiation portion can be moved along the first guide rail and the second guide rail, therefore, can be performed continuously to first
The ultraviolet of the substrate in resettlement section irradiates and the ultraviolet of the substrate in the second resettlement section is irradiated.
Further, since including the first resettlement section and the second resettlement section, so two plate bases can be processed simultaneously.
Further, since the static shape in first resettlement section with confined space and in the second resettlement section of substrate can be made
Under state, mobile irradiation portion outside the first resettlement section and outside the second resettlement section, while into the first resettlement section and the second collecting
Substrate irradiation ultraviolet radiation in portion, therefore, can suppress to produce particle in the first resettlement section and in the second resettlement section, can keep base
Plate cleans.
In addition, having in the first resettlement section and the composition of the second resettlement section, not only can achieve that area occupied reduces, each collecting
The management of the oxygen concentration dew point in portion becomes easy, and can cut down the nitrogen using during the oxygen concentration in each resettlement section of regulation
Consumption.
In above-mentioned ultraviolet lamp, can above-mentioned first guide rail on the moving direction of above-mentioned irradiation portion with above-mentioned
Between second guide rail, releasably setting guiding assisted parts, described guiding assisted parts assists the movement of above-mentioned gate frame.
By above-mentioned composition, by handling guiding assisted parts, changeable only along the side in the first guide rail or the second guide rail
The pattern of mobile gate frame and the pattern continuously along the first guide rail and the mobile gate frame of the second guide rail.For example, drawn by dismounting
Lead assisted parts, may be switched to the pattern only along the mobile gate frame of the side in the first guide rail or the second guide rail.On the other hand, pass through
Connect guiding assisted parts, may be switched to the pattern continuously along the first guide rail and the mobile gate frame of the second guide rail.
In above-mentioned ultraviolet lamp, can be in the outside setting cooling end of above-mentioned resettlement section, described cooling end can be by
Above-mentioned irradiation portion cooling.
By above-mentioned composition, irradiation portion can be cooled down, therefore, even if the continuous driving such as when to substrate Continuous irradiation ultraviolet
In the case of dynamic irradiation portion, irradiation portion also can be suppressed overheated.
In above-mentioned ultraviolet lamp, above-mentioned move portion can make above-mentioned cooling end and above-mentioned irradiation portion together upper
State the outside mobile of resettlement section.
By above-mentioned composition, irradiation portion and cooling end can be made in the lump integratedly to move, therefore, shine with separately mobile
Penetrate portion and the situation of cooling end is compared, the simplification that achievable device is constituted.
In above-mentioned ultraviolet lamp, oxygen concentration adjustment portion can be set in above-mentioned resettlement section, described oxygen concentration is adjusted
The oxygen concentration of the internal atmosphere of the above-mentioned resettlement section of section portion scalable.
By above-mentioned composition, the oxygen concentration of the internal atmosphere of resettlement section can be adjusted to the concentration of regulation, therefore, can be on rule
To substrate irradiation ultraviolet radiation under conditions of fixed oxygen concentration.
In above-mentioned ultraviolet lamp, dew point adjustment portion, described dew point adjustment portion can be set in above-mentioned resettlement section
The dew point of the internal atmosphere of the above-mentioned resettlement section of scalable.
By above-mentioned composition, the dew point of the internal atmosphere of resettlement section can be adjusted to the dew point of regulation, therefore, can be in regulation
Dew point under conditions of to substrate irradiation ultraviolet radiation.
The ultraviolet irradiation method that one mode of the present invention is related to is the use of the ultraviolet of following ultraviolet lamps
Line illuminating method, described ultraviolet lamp includes：Resettlement section, described resettlement section can house substrate in confined space；With
Irradiation portion, described irradiation portion is arranged at the outside of above-mentioned resettlement section, can be to aforesaid substrate irradiation ultraviolet radiation；
Described ultraviolet irradiation method comprises the following steps：House step, aforesaid substrate is housed in above-mentioned resettlement section
Confined space in；Irradiating step, to aforesaid substrate irradiation ultraviolet radiation；And moving step, make above-mentioned irradiation portion in above-mentioned collecting
The outside of portion is moved, so that upper in the confined space within above-mentioned resettlement section to being housed in from the outside of above-mentioned resettlement section
State substrate and irradiate above-mentioned ultraviolet.
With it, can making substrate in the state of there is the internal stationary of resettlement section of confined space,
The outside mobile irradiation portion of resettlement section while the substrate irradiation ultraviolet radiation of inside to resettlement section, therefore, there is no need to consider adjoint
The movement of substrate and produce particle.Further, since be irradiated the movement in portion in the outside of resettlement section, therefore, even if assuming
Produce particle along with the movement of irradiation portion, by making resettlement section be confined space, be also avoided that particle invades resettlement section
Interior.Therefore, can suppress to produce particle in resettlement section, board cleaning can be kept.
In addition, by irradiation portion mobile in the state of making substrate static, even if thus being contrasted using plan view size
The big substrate in portion of penetrating, compared with the situation of moving substrate in the state of making irradiation portion static, also can save and irradiate purple to substrate
Required space during outside line, can reduce area occupied.
In addition, by being formed as making the static state in resettlement section of substrate, as long as thus guaranteeing substrate in resettlement section
Receiving space, therefore, and makes substrate compared with the situation of movement in resettlement section, can reduce the volume of resettlement section, it will hold
Easily carry out the management of the oxygen concentration dew point in resettlement section.In addition, can reduce to use when adjusting the oxygen concentration in resettlement section
The consumption of nitrogen.
In above-mentioned ultraviolet irradiation method, transmissive portions can be provided with above-mentioned resettlement section, described transmissive portions transmissive
Above-mentioned ultraviolet, above-mentioned moving step can make above-mentioned irradiation portion outside mobile in above-mentioned resettlement section, so that via above-mentioned
The aforesaid substrate penetrating the inside to above-mentioned resettlement section for the portion irradiates above-mentioned ultraviolet.
With it, the simple composition that employ transmissive portions can be utilized, via transmissive portions to substrate irradiation ultraviolet radiation.
In above-mentioned ultraviolet irradiation method, above-mentioned moving step can make above-mentioned irradiation portion one end of guide portion with another
Move back and forth between end, described guide portion moving direction along above-mentioned irradiation portion in the way of pressing from both sides every above-mentioned resettlement section extends.
With it, and making the situation that irradiation portion only moves between one end of guide portion and the other end in one direction
Compare, even if when to substrate irradiation ultraviolet radiation repeatedly, also can smoothly and efficiently irradiate.Further, since one irradiation of setting
I.e. it is enough in portion, therefore, the simplification that achievable device is constituted.
In above-mentioned ultraviolet irradiation method, can be in the outside setting cooling end of above-mentioned resettlement section, described cooling end can be by
Above-mentioned irradiation portion cooling, above-mentioned moving step can make above-mentioned cooling end and above-mentioned irradiation portion together in the outside of above-mentioned resettlement section
Mobile.
With it, irradiation portion and cooling end can be made in the lump integratedly to move, therefore, irradiate with separately mobile
The situation of portion and cooling end is compared, the simplification that achievable device is constituted.
In above-mentioned ultraviolet irradiation method, it may include oxygen concentration regulating step, described oxygen concentration regulating step is to adjust
The oxygen concentration of the internal atmosphere of above-mentioned resettlement section.
With it, the oxygen concentration of the internal atmosphere of resettlement section can be adjusted to the concentration of regulation, therefore, can be in regulation
Oxygen concentration under conditions of to substrate irradiation ultraviolet radiation.
In above-mentioned ultraviolet irradiation method, it may include dew point regulating step, described dew point regulating step is to adjust above-mentioned
The dew point of the internal atmosphere of resettlement section.
With it, the dew point of the internal atmosphere of resettlement section can be adjusted to the dew point of regulation, therefore, can be in regulation
To substrate irradiation ultraviolet radiation under conditions of dew point.
The effect of invention
By the present invention, it is possible to provide following ultraviolet lamps and ultraviolet irradiation method, described ultraviolet irradiates dress
Put and ultraviolet irradiation method can suppress to produce particle in resettlement section, board cleaning can be kept.
Brief description
The axonometric chart of the ultraviolet lamp that [Fig. 1] is related to for first embodiment.
The top view of the ultraviolet lamp that [Fig. 2] is related to for first embodiment.
[Fig. 3] is the side-looking of ultraviolet lamp that is related to of first embodiment of the III-III sectional view comprising Fig. 2
Figure.
The axonometric chart of the ultraviolet lamp that [Fig. 4] is related to for second embodiment.
The top view of the ultraviolet lamp that [Fig. 5] is related to for second embodiment.
The side view of the ultraviolet lamp that [Fig. 6] is related to for second embodiment.
Description of reference numerals
1,201 ... ultraviolet lamp
10 ... substrates
10A ... first substrate (substrate)
10B ... second substrate (substrate)
Rooms 2,202 ... (resettlement section)
5,205 ... carrying mechanisms (move portion)
6 ... cooling ends
7 ... gas supply parts (oxygen concentration adjustment portion, dew point adjustment portion)
20 ... top boards
23 ... transmissive portions
40 ... irradiation portions
50,250 ... guide portion
54 ... gate frames
54c ... maintaining part
202A ... first room (the first resettlement section)
202B ... second Room (the second resettlement section)
209 ... ribbon conveyers (auxiliary guide portion)
251A ... first guide rail
251B ... second guide rail
Specific embodiment
Hereinafter, it is explained with reference to embodiments of the present invention.In the following description, set XYZ rectangular coordinate system,
With reference to this XYZ rectangular coordinate system, the position relationship of each component is illustrated.Using the prescribed direction in horizontal plane as X-direction,
Using direction vertical with X-direction in the horizontal plane as Y-direction, will be (i.e. vertical with the direction that X-direction and Y-direction are respectively perpendicular
Direction) as Z-direction.
(first embodiment)
The axonometric chart of the ultraviolet lamp 1 that Fig. 1 is related to for first embodiment.Fig. 2 is related to for first embodiment
Ultraviolet lamp 1 top view.Fig. 3 is the ultraviolet that is related to of first embodiment of the III-III sectional view comprising Fig. 2
The side view of beam irradiating apparatus 1.
＜ ultraviolet lamp ＞
As shown in FIG. 1 to 3, ultraviolet lamp 1 is the device carrying out ultraviolet irradiation for substrate 10.Ultraviolet
Irradiation unit 1 has room (chamber) 2 (resettlement section), platform (stage) 3, illumination unit 4, carrying mechanism 5 (move portion), cooling
Portion 6, gas supply part 7 and control unit 8.Control unit 8 sums up the element controlling ultraviolet lamp 1.
＜ room ＞
Room 2 houses the substrate 10 carrying out ultraviolet irradiation process.Room 2 is formed as box like, becomes rectangle during vertical view.Specifically
For, room 2 is formed by following key elements：Top board 20, described top board 20 covers the top of substrate 10, is rectangular plate-like；Perisporium 21, institute
State the side that perisporium 21 covers substrate 10 in the mode of surrounding, be rectangular box-like；With base plate 22, described base plate 22 covers substrate 10
Lower section.In the -Y direction side of perisporium 21, it is provided with substrate carrying-in/carrying-out mouth 21a, described substrate carrying-in/carrying-out mouth 21a is used for base
Plate 10 is moved into room 2 and is taken out of from room 2.
For example, top board 20, perisporium 21 and base plate 22 are formed by the light obstructing member blocking ultraviolet.Thus, can avoid to
During substrate 10 irradiation ultraviolet radiation of the inside of room 2, ultraviolet appears to the outside of room 2.
Room 2 is configured to house substrate 10 in confined space.For example, by using welding etc. by top board 20, perisporium 21
And each connecting portion of base plate 22 is seamlessly connected, the air-tightness in room 2 can be improved.For example, the decompression such as pump machanism can be set in room 2
Mechanism (not shown).Thus, substrate 10 can be housed in the state of making decompression in room 2.
As shown in figure 3, the heating arrangements 11 of heating substrate 10 can be arranged in room 2.Heating arrangements 11 have and substrate 10
The rectangular plate-like of same plane view dimensions, is configured in the way of supporting substrate 10 from below.Heating arrangements 11 quilt
It is installed on platform 3.Heating arrangements 11 include heater etc. (not shown).
＜ transmissive portions ＞
As shown in Fig. 2 the transmissive portions 23 of transmissive ultraviolet are provided with the top board 20 of room 2.Transmissive portions 23 constitute top
A part for plate 20.Transmissive portions 23 are formed as the rectangular plate-like less than top board 20 when overlooking.Transmissive portions 23 are installed in rectangle
Peristome 20h, described peristome 20h makes top board 20 through-thickness opening.For example, transmissive portions 23 use quartzy, heat-resisting glass
Glass, resin sheet, resin film etc..
Transmissive portions 23 are sized to the size more than substrate 10.Thus, when to substrate 10 irradiation ultraviolet radiation, can
Ultraviolet is avoided to be blocked by the light shielding part (parts beyond transmissive portions 23) of top board 20, therefore, can be overall to above substrate 10
Equably irradiation ultraviolet radiation.
It should be noted that the size of peristome 20h can be set to put into the size taking out substrate 10.In addition, thoroughly
Penetrate portion 23 also can detachably be embedded in peristome 20h.Thus, when transmissive portions 23 are embedded peristome 20h, can make
Obtaining in room 2 becomes confined space, in transmissive portions 23 under peristome 20h dismounting, can put into substrate 10 in room 2 or from room
Take out in 2.
＜ platform ＞
Platform 3 supports room 2 and carrying mechanism 5 with upper surface.Platform 3 becomes the tabular in z-direction with thickness.
Platform 3 is supported from below by framework bottom 31.
Framework bottom 31 is that the prism of many steel etc. is combined into clathrate and is formed.
It should be noted that in the bottom of framework bottom 31, being rotatably provided with multiple wheel 31a.Thus, may be used
Framework bottom 31 is made to move freely in X/Y plane.
Framework 32 is provided with platform 3.Framework 32 has post portion 33 and wall portion 34.
Post portion 33 is the prism of many steel etc. is combined into clathrate and to be formed, by room 2, illumination unit 4 and carrying
Mechanism 5 surrounds.
Wall portion 34 is arranged at the gap (between each prism) in post portion 33, covers room 2, illumination unit 4 and carrying mechanism 5
About and over.
For example, wall portion 34 can be formed by transparent sheet material.Thus, can be in the external visual identification framework 32 of framework 32
Element.
＜ elevating mechanism ＞
As shown in figure 3, in the lower section of room 2, being provided with elevating mechanism 25, described elevating mechanism 25 can make substrate 10 along Z side
To movement.Multiple lifter pins (lift pin) 25a is provided with elevating mechanism 25.The top (+Z side of multiple lifter pin 25a
End) it is configured in the same face parallel with X/Y plane.
Make the top of multiple lifter pin 25a can insert platform 3, base plate 22 and heating arrangements 11.
Specifically, multiple inserting hole 3a are formed with platform 3, the plurality of inserting hole 3a makes platform 3 through-thickness open
Mouthful.Multiple inserting hole 22a are formed with base plate 22, the plurality of inserting hole 22a is located at and each inserting hole in plan view
The position that 3a overlaps, makes base plate 22 through-thickness opening.It is formed with multiple inserting hole 11a in heating arrangements 11, described many
Individual inserting hole 11a is located at, in plan view, the position overlapping with each inserting hole 22a, so that heating arrangements 11 through-thickness is opened
Mouthful.The top of multiple lifter pin 25a is arranged to, and can be supported with the lower surface of substrate 10 by each inserting hole 3a, 22a, 11a
Connect, away from.Therefore, by the top of multiple lifter pin 25a, thus supporting substrate 10 according to the mode parallel with X/Y plane.
Elevating mechanism 25 is supported the substrate 10 being housed in room 2 and so that it is moved along the Z-direction in room 2.In Fig. 3, many
The top of individual lifter pin 25a is abutted with the lower surface of substrate 10 by each inserting hole 3a, 22a, 11a, and makes on described substrate 10
Rise, thus, display makes the state that substrate 10 leaves from heating arrangements 11.
It should be noted that in elevating mechanism 25, in exterior arrangement driving source 25b of room 2, described driving source 25b makes many
Individual lifter pin 25a lifting.Therefore, even if assuming to produce particle along with the driving of driving source 25b, by making room 2 be airtight
Space, is also avoided that particle invades in room 2.
＜ illumination unit ＞
Illumination unit 4 is arranged on the outside of room 2.Illumination unit 4 has irradiation portion 40 and condensing member 41.
Irradiation portion 40 is configured to, and can irradiate the ultraviolet such as i line to substrate 10.
Herein, " ultraviolet " refers to, the lower limit of wave-length coverage be 1nm about, the upper limit be luminous ray short wavelength end
Light.
For example, irradiation portion 40 uses metal halide lamp.
It should be noted that irradiation portion 40 not limited to this, it is possible to use high voltage mercury lamp, LED.In addition, for irradiation portion
For 40, multiple above-mentioned lamps also can be combined.
For example, light filter can be set in the lower surface of irradiation portion 40, described light filter intercepts the one-tenth that wavelength is less than 300nm
Point.Thus, the wavelength of the ultraviolet being projected by light filter becomes more than 300nm, therefore, can suppress because of ultraviolet irradiation
And lead to substrate 10 excessive temperature to raise.
Condensing member 41 is by the ultraviolet rays collection projecting from irradiation portion 40 to substrate 10.By making ultraviolet in substrate 10
Upper optically focused, can suppress the ultraviolet projecting from irradiation portion 40 to diffuse to the outside of substrate 10, therefore, can improve illumination.
＜ carrying mechanism ＞
As shown in Figures 1 and 2, carrying mechanism 5 is arranged on the outside of room 2.Carrying mechanism 5 makes illumination unit 4 in room 2
Outside mobile, so that from the outside of room 2 to substrate 10 irradiation ultraviolet radiation being housed within room 2.Carrying mechanism 5 has and draws
Lead portion 50, pedestal 53 and gate frame 54.
Guide portion 50 has a pair of guide rails 51 and slide block (slider) 52.For example, guide portion 50 is driven using linear motor
Dynamic device.
A pair of guide rails 51 is pressing from both sides compartment 2 from -Y direction side and +Y direction side in the way of along the mobile side as illumination unit 4
Extend to the X-direction of (moving direction of irradiation portion 40).
Slide block 52 is configured to slide along a pair of guide rails 51.
Pedestal 53 is arranged on the corner of platform 3, and arrange multiple (in such as present embodiment corner each one amount to four
Individual).Each pedestal 53 supports the X-direction both ends of a pair of guide rails 51.
Gate frame 54 is formed as gate in the way of crossing over room 2 in the Y direction, and so as to can move along a pair of guide rails 51
Dynamic.Gate frame 54 have along Z-direction extend a pair of door pillar portion 54a and in the way of connecting between a pair of door pillar portion 54a along Y
The linking part 54b that direction extends.In the bottom of each door pillar portion 54a of gate frame 54, slide block 52 is installed.
As shown in figure 3, the inside of the linking part 54b in gate frame 54, it is provided with maintaining part 54c keeping illumination unit 4.
Maintaining part 54c forms the recess being recessed upward from the lower surface of the Y-direction pars intermedia of gate frame 54.Remove in illumination unit 4 and shine
The recess penetrating part maintained portion 54c outside face 4a (lower surface) surrounds, and is coated to by the wall portion of gate frame 54.For example, gate
Frame 54 is formed by the light obstructing member blocking ultraviolet.Thus, can avoid when from illumination unit 4 irradiation ultraviolet radiation, ultraviolet to
The side diffusion of gate frame 54, can (substrate 10 in room 2) irradiation ultraviolet radiation downward.
As shown in Fig. 2 in the X direction, length L1 of each guide rail 51 is longer than length L2 of room 2 (L1 ＞ L2).This embodiment party
In formula, in the X direction, make length L1 of each guide rail 51 than length L2 of room 2 and 2 times of length (2 × L3) of gate frame 54 plus and
Length (L2+2 × L3) longer.Thus, in top view, illumination unit 4 can be made to move from the region at the -X direction end beyond room 2
Region to the +X direction end beyond room 2.
＜ cooling end ＞
As shown in Figures 1 and 2, the outside in room 2 is provided with the cooling end 6 that can cool down illumination unit 4.Cooling end 6 quilt
It is installed on the side of sidewall portion (door pillar portion 54a) of the +Y direction side of gate frame 54.For example, cooling end 6 uses hair-dryer.Thus, can be by
The steam being produced from illumination unit 4 is to outside drain.
Carrying mechanism 5 makes cooling end 6 and illumination unit 4 together outside mobile in room 2.
＜ gas supply part ＞
It is provided with gas supply part 7, the state of the internal atmosphere of described gas supply part 7 scalable room 2 in room 2.Gas
Body supply unit 7 supplies the nitrogen (N as dry gas2), helium (He), the non-active gas such as argon (Ar).
Herein, gas supply part be equivalent to above described in " oxygen concentration adjustment portion " and " dew point adjustment portion ".
By gas supply part 7, the dew point of the internal atmosphere of scalable room 2, the moisture concentration in scalable room 2.
For example, gas supply part 7 adjusts the supply of dry gas, and the dew point of the internal atmosphere of room 2 is adjusted to -80 DEG C
More than (moisture concentration be 0.54ppm, on the basis of quality) and for -5 DEG C (moisture concentrations as 4000ppm, on the basis of quality)
Below.
For example, in the atmosphere in pre- pattern (prepattern) solidification after the exposure by resist film, by as above
Described make dew point be below the preferred upper limit, the solidification of pattern can be made easily to carry out.On the other hand, by for preferred lower limit
More than, workability with device aspect etc. can be improved.
In addition, passing through gas supply part 7, the also oxygen concentration of the internal atmosphere of scalable room 2.The oxygen of the internal atmosphere of room 2
Concentration (on the basis of quality) is more low better.Specifically, the oxygen concentration preferably making the internal atmosphere of room 2 is below 1000ppm,
The oxygen concentration more preferably making the internal atmosphere of room 2 is below 500ppm.
For example, in the atmosphere in the pre- pattern solidification after the exposure by resist film, by making oxygen concentration as mentioned above
Below the preferred upper limit, the solidification of pattern can be made easily to carry out.
＜ ultraviolet irradiation method ＞
Next, ultraviolet irradiation method of the present embodiment is described.In present embodiment, using above-mentioned ultraviolet
Beam irradiating apparatus 1 are to substrate 10 irradiation ultraviolet radiation.The action carrying out in each portion of ultraviolet lamp 1 can pass through control unit 8
It is controlled.
Ultraviolet irradiation method of the present embodiment includes housing step, irradiating step and moving step.
House in step, room 2 houses substrate 10 in confined space.For example, via substrate carrying-in/carrying-out mouth 21a, by base
Plate 10 is transported in room 2, then occlusion substrate carrying-in/carrying-out mouth 21a and make room 2 airtight.
In irradiating step, illumination unit 4 is to substrate 10 irradiation ultraviolet radiation.
In moving step, carrying mechanism 5 makes illumination unit 4 outside mobile in room 2, so that from the outside of room 2 to quilt
It is housed in substrate 10 irradiation ultraviolet radiation within room 2.
In moving step, make illumination unit 4 outside mobile in room 2 so that via transmissive portions 23 to room 2 within base
Plate 10 irradiation ultraviolet radiation.As noted previously, as the side of sidewall portion in the +Y direction side of gate frame 54 is provided with cooling end 6, therefore, exist
In moving step, make cooling end 6 and illumination unit 4 together outside mobile in room 2.
In moving step, make illumination unit 4 at the -X direction end (one end) of a pair of guide rails 51 and +X direction end (other end)
Between move back and forth.For example, in the top view of Fig. 3, make illumination unit 4 from the region at the -X direction end beyond room 2 to beyond room 2
The region at +X direction end move back and forth.
It should be noted that ultraviolet irradiation method of the present embodiment includes gas supplying step.
Herein, gas supplying step be equivalent to above described in " oxygen concentration regulating step " and " dew point regulating step ".
In gas supplying step, the dew point of the internal atmosphere of gas supply part 7 regulation room 2.In addition, gas supplying step
In, the oxygen concentration of the internal atmosphere of gas supply part 7 regulation room 2.
As described above, passing through present embodiment, can be in the shape making the internal stationary in the room 2 with confined space for the substrate 10
Under state, make illumination unit 4 room 2 outside mobile while, to substrate 10 irradiation ultraviolet radiation of the inside of room 2, therefore, no
Need to consider the movement of adjoint substrate 10 and produce particle.Further, since be irradiated the movement of unit 4 in the outside of room 2, because
This, even if assuming to produce particle along with the movement of illumination unit 4, by making room 2 be confined space, be also avoided that particle is invaded
Enter in room 2.Therefore, can suppress to produce particle in room 2, substrate 10 can be kept to clean.
In addition, by illumination unit 4 mobile in the state of making substrate 10 static, even if thus using plan view size
The substrate 10 bigger than illumination unit 4, compared with the situation of moving substrate 10 in the state of making illumination unit 4 static, also can save
About to required space during substrate 10 irradiation ultraviolet radiation, area occupied can be reduced.
In addition, by being formed as making the static state in room 2 of substrate 10, as long as thus guaranteeing the receipts of substrate 10 in room 2
Hold space, therefore, and make substrate 10 compared with the situation of movement in room 2, the volume of room 2 can be reduced, it will easily carry out
The management of the oxygen concentration dew point in room 2.In addition, the consumption of the nitrogen using during the oxygen concentration in regulation room 2 can be reduced.
In addition, by the transmissive portions 23 arranging transmissive ultraviolet in room 2, thus can be utilized employ transmissive portions 23
Simple composition, via transmissive portions 23 to substrate 10 irradiation ultraviolet radiation.
In addition, cover the top board 20 of substrate 10 top by making room 2 include, and transmissive portions 23 are arranged on top board 20, from
And simple composition that transmissive portions 23 are provided with the top board 20 of room 2 can be utilized, irradiate purple via transmissive portions 23 to substrate 10
Outside line.In addition, by arranging transmissive portions 23 in a part for room 2, thus the situation phase with setting transmissive portions in the entirety of room 2
Ratio can improve the maintainability of transmissive portions 23.
In addition, carrying mechanism 5 includes：A pair of guide rails 51 (guide portion 50), the pair of guide rail 51 (guide portion 50) is to press from both sides
The mode of compartment 2 extends along the moving direction of illumination unit 4；With gate frame 54, described gate frame 54 shape in the way of crossing over room 2
Become gate, and be set to move along a pair of guide rails 51, and be provided with gate frame 54 and keep illumination unit 4
Maintaining part 54c, thus, compared with the general situation along the mobile illumination unit 4 of guide rail, can be utilized the gate frame with high rigidity
54 make illumination unit 4 mobile along a pair of guide rails 51, therefore, can stably be irradiated the movement of unit 4.
In addition, the cooling end 6 that illumination unit 4 can be cooled down by the outside setting in room 2, illumination unit 4 can be cooled down,
Therefore, even if in the case of the Continuous Drive illumination unit 4 such as when to substrate 10 Continuous irradiation ultraviolet, also can suppress to irradiate single
Unit 4 is overheated.
In addition, carrying mechanism 5 makes cooling end 6 and illumination unit 4 outside mobile in room 2 together, thus, can make in the lump
Illumination unit 4 and cooling end 6 integratedly move, therefore, with the situation phase separately moving illumination unit 4 and cooling end 6
The ratio simplification that achievable device is constituted.
In addition, by the setting oxygen concentration of internal atmosphere of scalable room 2 and the gas supply part 7 of dew point in room 2, can
The oxygen concentration of the internal atmosphere of room 2 is adjusted to the concentration specifying, therefore, can be to substrate 10 under conditions of the oxygen concentration of regulation
Irradiation ultraviolet radiation.In addition, the dew point of the internal atmosphere of room 2 can be adjusted to the dew point of regulation, therefore, can be in the dew point of regulation
Under the conditions of to substrate 10 irradiation ultraviolet radiation.
In addition, in moving step, by making illumination unit 4 at the -X direction end (one end) of a pair of guide rails 51 and +X direction end
Move back and forth between (other end), thus and making illumination unit 4 only along one between one end of a pair of guide rails 51 and the other end
The situation of direction movement is compared, even if when to substrate 10 irradiation ultraviolet radiation repeatedly, also can smoothly and efficiently irradiate.In addition,
Due to one illumination unit 4 of setting, i.e. it is enough, therefore, the simplification that achievable device is constituted.
(second embodiment)
Next, being illustrated to second embodiment of the present invention using Fig. 4～Fig. 6.
The axonometric chart of the ultraviolet lamp 201 that Fig. 4 is related to for second embodiment.Fig. 5 relates to for second embodiment
And ultraviolet lamp 201 top view.The side-looking of the ultraviolet lamp 201 that Fig. 6 is related to for second embodiment
Figure.
In second embodiment, with respect to first embodiment, especially different in the following areas：Room 202 has the first Room
202A (the first resettlement section) and the aspect of second Room 202B (the second resettlement section)；Guide portion 250 has the first guide rail 251A and
The aspect of two guide rail 251B.In Fig. 4～Fig. 6, same symbol is marked to the composition same with first embodiment, and it is detailed to omit it
Describe in detail bright.
＜ ultraviolet lamp ＞
As shown in Fig. 4～Fig. 6, ultraviolet lamp 201 has room 202, platform 203, illumination unit 4, carrying mechanism
205th, cooling end 6, gas supply part 7 and control unit 8.Control unit 8 sums up the element controlling ultraviolet lamp 201.
Room 202 has the first Room 202A and second Room 202B.
First Room 202A and second Room 202B are that X-direction is arranged side by side along the moving direction of illumination unit 4.
First Room 202A houses first substrate 10A, and second Room 202B houses second substrate 10B.It should be noted that first
Substrate 10A and second substrate 10B can be using mutually the same substrate, it is possible to use substrate different from each other.
Platform 203 supports the first Room 202A, second Room 202B and carrying mechanism 205 with upper surface.It is visible that platform 203 becomes vertical view
The OBL tabular extending in X direction.
Platform 203 is supported from below by framework bottom 231.
Framework bottom 231 is that the prism of many steel etc. is combined into clathrate and is formed.
Framework 232 is provided with platform 203.Framework 232 has post portion 233 and wall portion 234.
Post portion 233 is that the prism of many steel etc. is combined into clathrate and is formed, by the first Room 202A, second Room
202B, illumination unit 4 and carrying mechanism 205 surround.
Wall portion 234 is arranged at the gap (between each prism) in post portion 233, covers the first Room 202A, second Room 202B, photograph
Penetrate about and over unit 4 and carrying mechanism 205.
For example, wall portion 234 can be formed by transparent sheet material.Thus, framework 232 can be identified from the external visual of framework 232
Interior element.
Carrying mechanism 205 is arranged on the outside of the first Room 202A and second Room 202B.Carrying mechanism 205 makes illumination unit
4 is outside mobile in each room 202A, 202B, so that from the outside of each room 202A, 202B to being housed in each room 202A, 202B
Internal each substrate 10A, 10B irradiation ultraviolet radiation.Carrying mechanism 205 has guide portion 250, pedestal 53 and gate frame 54.
Guide portion 250 has a pair first guide rail 251A and a pair second guide rail 251B and slide block 52.
A pair first guide rail 251A are prolonged in the way of pressing from both sides every the first Room 202A from -Y direction side and +Y direction side in X direction
Stretch.
A pair second guide rail 251B are prolonged in the way of pressing from both sides every second Room 202B from -Y direction side and +Y direction side in X direction
Stretch.
Slide block 52 is configured to slide along each couple of guide rail 251A, guide rail 251B.
Pedestal 53 is arranged on platform 203, and arranges multiple (being eight in such as present embodiment).Each pedestal 53 is supported
The X-direction both ends of each couple of guide rail 251A, 251B.
Gate frame 54 is arranged to move along each couple of guide rail 251A, 251B.The lower end of each door pillar portion 54a of gate frame 54
Portion is placed in slide block 52 upper surface.
As shown in figure 5, in the X direction, length L11, L12 of each guide rail 251A, 251B length than each room 202A, 202B
L21, L22 length (L11 ＞ L21, L12 ＞ L22).In present embodiment, in the X direction, make the length of each guide rail 251A, 251B
2 times of length (2 × L3) of length L21, L22 than each room 202A, 202B of L11, L12 and gate frame 54 plus and length (L21+
2 × L3, L22+2 × L3) longer.Thus, in top view, illumination unit 4 can be made from the -X direction end beyond each room 202A, 202B
The mobile region to the +X direction end beyond each room 202A, 202B in region.
＜ ribbon conveyer (belt conveyor) ＞
In present embodiment, it is the first guide rail 251A and the second guide rail in X-direction in the moving direction of illumination unit 4
Between 251B, releasably it is provided with the ribbon conveyer 209 (guiding assisted parts) of auxiliary gate frame 54 movement.Ribbon conveyer
209 are extended in the way of bridging between the first guide rail 251A and the second guide rail 251B in X direction.Ribbon conveyer 209 is set
It is set to changeable direction of rotation.Thus, auxiliary gate frame 54 from the first guide rail 251A to the movement of the second guide rail 251B with from the
Two guide rail 251B are to the movement of the first guide rail 251A.
＜ ultraviolet irradiation method ＞
Next, ultraviolet irradiation method of the present embodiment is described.In present embodiment, using above-mentioned ultraviolet
Beam irradiating apparatus 201, to each substrate 10A, 10B irradiation ultraviolet radiation.The action carrying out in each portion of ultraviolet lamp 201 can
It is controlled by control unit 8.It should be noted that in ultraviolet irradiation method of the present embodiment, for first
The same method of embodiment, description is omitted.
In moving step, make illumination unit 4 in the -X direction end of a pair first guide rail 251A and a pair second guide rail 251B
+X direction end between move back and forth.For example, in the top view of Fig. 5, make illumination unit 4 from the -X direction beyond the first Room 202A
The region at end moves back and forth to the region at the +X direction end beyond second Room 202B.As described above, the mobile side in illumination unit 4
It is provided with ribbon conveyer 209 between the first guide rail 251A in i.e. X-direction and the second guide rail 251B, therefore, can be successfully
It is irradiated moving back and forth of unit 4.
As described above, passing through present embodiment, room 202 includes the first Room 202A and second Room 202B, described first Room
202A and second Room 202B can house each substrate 10A, 10B, and moving direction (the X side along illumination unit 4 in confined space
To) side by side, guide portion 250 includes the first guide rail 251A and the second guide rail 251B, and described first guide rail 251A is to press from both sides every the first Room
The mode of 202A extends, described second guide rail 251B along illumination unit 4 moving direction (X-direction) and the first guide rail 251A simultaneously
Row, and extended in the way of pressing from both sides every second Room 202B, thus, illumination unit 4 can be made along the first guide rail 251A and the second guide rail
251B moves, and therefore, can be performed continuously the ultraviolet to the substrate 10A in the first Room 202A and irradiates and to second Room 202B
The ultraviolet of interior substrate 10B irradiates.
Further, since including the first Room 202A and second Room 202B, so two plate base 10A, 10B can be processed simultaneously.
Further, since the static state in each room 202A, the 202B with confined space of each substrate 10A, 10B can be made
Under, mobile illumination unit 4 outside each room 202A, 202B is while irradiate to each substrate 10A, the 10B in each room 202A, 202B
Ultraviolet, therefore, can suppress to produce particle in each room 202A, 202B, can keep each substrate 10A, 10B cleaning.
In addition, in there is the composition of the first Room 202A and second Room 202B, not only can achieve that area occupied reduces, each room
The management of the oxygen concentration dew point in 202A, 202B becomes easy, and the oxygen that can cut down in regulation each room 202A, 202B is dense
The consumption of the nitrogen using when spending.
In addition, by the first guide rail 251A on the moving direction (X-direction) of illumination unit 4 and the second guide rail 251B it
Between, the releasably ribbon conveyer 209 of setting auxiliary gate frame 54 movement, thus can be come by loading and unloading ribbon conveyer 209
Switching is only led along the pattern of the mobile gate frame 54 of the side in the first guide rail 251A or the second guide rail 251B with continuously along first
The pattern of the mobile gate frame 54 of rail 251A and the second guide rail 251B.For example, by dismantling ribbon conveyer 209, only may be switched to
Pattern along the mobile gate frame 54 of the side in the first guide rail 251A or the second guide rail 251B.On the other hand, by connecting belt
Conveyer 209, may be switched to the pattern continuously along the mobile gate frame 54 of the first guide rail 251A and the second guide rail 251B.
It should be noted that variously-shaped, combination of each member of formation shown in above-mentioned example etc. is example, can be based on
Design requirement etc. carries out various changes.
For example, in above-mentioned embodiment, it is provided with a room or two rooms, but not limited to this, may also set up more than three
Multiple rooms.
In addition, in above-mentioned second embodiment, employing ribbon conveyer as auxiliary guide portion, but not limited to this,
Linear motor driver can be used.For example, ribbon conveyer and linear motor driver can also be set up in the X direction.By
This, scalable gate frame 54 displacement in the X direction.
In addition, in above-mentioned second embodiment, being provided with the first guide rail and the second guide rail, but also can only arrange one and lead
Rail.In this case, in the X direction, make the length that length L21, L22 that the length of guide rail is than each room 202A, 202B adds sum more
Long.
It should be noted that for each element hereinbefore recorded as embodiment or its variation, can
Appropriately combined without departing from the gist of the present invention, in addition, suitably can not use combined multiple compositions to want yet
A part of element in element.
Claims (16)
1. ultraviolet lamp, it includes：
Resettlement section, described resettlement section can house substrate in confined space,
Irradiation portion, described irradiation portion is arranged at the outside of described resettlement section, can to described substrate irradiation ultraviolet radiation, and
Move portion, described move portion is arranged at the outside of described resettlement section, makes described irradiation portion in the outside of described resettlement section
Mobile, so that irradiating described ultraviolet from the outside of described resettlement section to the described substrate of the inside being housed in described resettlement section
Line.
2. ultraviolet lamp as claimed in claim 1, wherein,
It is provided with transmissive portions in described resettlement section, ultraviolet described in described transmissive portions transmissive.
3. ultraviolet lamp as claimed in claim 2, wherein,
Described resettlement section includes top board, and described top board covers the top of described substrate,
Described transmissive portions are arranged at described top board.
4. the ultraviolet lamp as any one of claims 1 to 3, wherein, described move portion includes：
Guide portion, described guide portion moving direction along described irradiation portion in the way of pressing from both sides every described resettlement section extends, and
Gate frame, described gate frame is formed as gate in the way of crossing over described resettlement section, and is set to draw along described
The portion that leads moves,
Described gate frame is provided with maintaining part, described maintaining part keeps described irradiation portion.
5. ultraviolet lamp as claimed in claim 4, wherein,
Described resettlement section includes the first resettlement section and the second resettlement section, and described first resettlement section and the second resettlement section can be in confined airs
The described substrate of interior collecting, and arranged side by side along the moving direction of described irradiation portion,
Described guide portion includes the first guide rail and the second guide rail, and described first guide rail is prolonged in the way of pressing from both sides every described first resettlement section
Stretch, described second guide rail is arranged side by side with described first guide rail along the moving direction of described irradiation portion, and to press from both sides every the described second receipts
The mode in appearance portion extends.
6. ultraviolet lamp as claimed in claim 5, wherein,
Between described first guide rail on the moving direction of described irradiation portion and described second guide rail, releasably it is provided with and draws
Lead assisted parts, described guiding assisted parts assists the movement of described gate frame.
7. the ultraviolet lamp as any one of claim 1～6, wherein,
The outside of described resettlement section is provided with cooling end, described irradiation portion can be cooled down by described cooling end.
8. ultraviolet lamp as claimed in claim 7, wherein,
Described move portion makes described cooling end and described irradiation portion outside mobile in described resettlement section together.
9. the ultraviolet lamp as any one of claim 1～8, wherein,
It is provided with oxygen concentration adjustment portion in described resettlement section, the inside gas of resettlement section described in described oxygen concentration adjustment portion scalable
The oxygen concentration of atmosphere.
10. the ultraviolet lamp as any one of claim 1～9, wherein,
It is provided with dew point adjustment portion in described resettlement section, the internal atmosphere of resettlement section described in described dew point adjustment portion scalable
Dew point.
11. ultraviolet irradiation methods, it is the use of the ultraviolet irradiation method of following ultraviolet lamps, described ultraviolet
Irradiation unit includes：
Resettlement section, described resettlement section can house substrate in confined space, and
Irradiation portion, described irradiation portion is arranged at the outside of described resettlement section, can to described substrate irradiation ultraviolet radiation,
Described ultraviolet irradiation method comprises the following steps：
House step, described substrate be housed in the confined space in described resettlement section,
Irradiating step, to described substrate irradiation ultraviolet radiation, and
Moving step, makes described irradiation portion outside mobile in described resettlement section, so that from the outside of described resettlement section to quilt
The described substrate being housed in the confined space within described resettlement section irradiates described ultraviolet.
12. ultraviolet irradiation methods as claimed in claim 11, wherein,
It is provided with transmissive portions in described resettlement section, ultraviolet described in described transmissive portions transmissive,
Described moving step is, makes described irradiation portion outside mobile in described resettlement section so that via described transmissive portions to
The described substrate of the inside of described resettlement section irradiates described ultraviolet.
13. ultraviolet irradiation methods as described in claim 11 or 12, wherein,
Described moving step is so that described irradiation portion is moved back and forth between one end of guide portion and the other end, described guide portion
In the way of pressing from both sides every described resettlement section, the moving direction along described irradiation portion extends.
14. ultraviolet irradiation methods as any one of claim 11～13, wherein,
The outside of described resettlement section is provided with cooling end, described irradiation portion can be cooled down by described cooling end,
Described moving step is to make described cooling end and described irradiation portion outside mobile in described resettlement section together.
15. ultraviolet irradiation methods as any one of claim 11～14, described ultraviolet irradiation method includes oxygen
Concentration regulating step, described oxygen concentration regulating step is to adjust the oxygen concentration of the internal atmosphere of described resettlement section.
16. ultraviolet irradiation methods as any one of claim 11～15, described ultraviolet irradiation method includes revealing
Point regulating step, described dew point regulating step is to adjust the dew point of the internal atmosphere of described resettlement section.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
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| JP2015153347A JP6596257B2 (en) | 2015-08-03 | 2015-08-03 | Ultraviolet irradiation apparatus and ultraviolet irradiation method |
| JP2015-153347 | 2015-08-03 |
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| JP (1) | JP6596257B2 (en) |
| KR (1) | KR102654792B1 (en) |
| CN (1) | CN106409723B (en) |
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| JP6866193B2 (en) * | 2017-03-10 | 2021-04-28 | 東京応化工業株式会社 | Ultraviolet irradiation device and ultraviolet irradiation method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008096835A1 (en) * | 2007-02-05 | 2008-08-14 | Tokyo Electron Limited | Substrate processing method and coating/developing apparatus |
| CN101976004A (en) * | 2010-09-03 | 2011-02-16 | 深圳市华星光电技术有限公司 | Ultraviolet curing device for liquid crystal panel and curing method |
| CN103168275A (en) * | 2010-11-04 | 2013-06-19 | 株式会社Orc制作所 | Exposure device |
| WO2014129259A1 (en) * | 2013-02-22 | 2014-08-28 | 東京エレクトロン株式会社 | Film-forming method, computer storage medium, and film-forming system |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62143426A (en) * | 1985-12-18 | 1987-06-26 | Hitachi Ltd | Light irradiation device |
| JPH0497515A (en) | 1990-08-15 | 1992-03-30 | Nec Corp | Resist removing apparatus |
| JP3704677B2 (en) * | 2000-06-28 | 2005-10-12 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| KR20030082729A (en) * | 2002-04-18 | 2003-10-23 | 주식회사 디엠에스 | Exposure system |
| JP4086582B2 (en) * | 2002-08-06 | 2008-05-14 | キヤノン株式会社 | Illumination apparatus and exposure apparatus |
| JP4342974B2 (en) * | 2003-02-12 | 2009-10-14 | 東京エレクトロン株式会社 | Curing apparatus and method, and coating film forming apparatus |
| JP4508738B2 (en) * | 2004-06-17 | 2010-07-21 | 東京応化工業株式会社 | Heat stabilizer |
| JP2006114848A (en) | 2004-10-18 | 2006-04-27 | Apex Corp | Equipment and method for ultraviolet irradiation processing and semiconductor manufacturing equipment |
| JP4859660B2 (en) * | 2006-12-27 | 2012-01-25 | 東京応化工業株式会社 | Substrate treatment device |
| JP5186224B2 (en) * | 2008-01-29 | 2013-04-17 | 東京応化工業株式会社 | Substrate treatment device |
| JP5281350B2 (en) * | 2008-09-29 | 2013-09-04 | 株式会社オーク製作所 | Peripheral exposure apparatus and peripheral exposure method |
| WO2011080852A1 (en) * | 2009-12-28 | 2011-07-07 | シャープ株式会社 | Method and apparatus for manufacturing liquid crystal display panel |
| JP5891013B2 (en) * | 2011-11-18 | 2016-03-22 | 東京応化工業株式会社 | Ultraviolet irradiation apparatus and substrate processing apparatus |
| JP6072644B2 (en) * | 2013-08-05 | 2017-02-01 | 東京エレクトロン株式会社 | Ultraviolet irradiation apparatus, substrate processing method, program, and computer storage medium |
-
2015
- 2015-08-03 JP JP2015153347A patent/JP6596257B2/en active Active
-
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008096835A1 (en) * | 2007-02-05 | 2008-08-14 | Tokyo Electron Limited | Substrate processing method and coating/developing apparatus |
| CN101976004A (en) * | 2010-09-03 | 2011-02-16 | 深圳市华星光电技术有限公司 | Ultraviolet curing device for liquid crystal panel and curing method |
| CN103168275A (en) * | 2010-11-04 | 2013-06-19 | 株式会社Orc制作所 | Exposure device |
| WO2014129259A1 (en) * | 2013-02-22 | 2014-08-28 | 東京エレクトロン株式会社 | Film-forming method, computer storage medium, and film-forming system |
Also Published As
| Publication number | Publication date |
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| CN106409723B (en) | 2022-08-23 |
| KR20170016286A (en) | 2017-02-13 |
| JP2017034118A (en) | 2017-02-09 |
| TWI688994B (en) | 2020-03-21 |
| TW201709285A (en) | 2017-03-01 |
| JP6596257B2 (en) | 2019-10-23 |
| KR102654792B1 (en) | 2024-04-05 |
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