KR20030082729A - Exposure system - Google Patents
Exposure system Download PDFInfo
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- KR20030082729A KR20030082729A KR1020020021190A KR20020021190A KR20030082729A KR 20030082729 A KR20030082729 A KR 20030082729A KR 1020020021190 A KR1020020021190 A KR 1020020021190A KR 20020021190 A KR20020021190 A KR 20020021190A KR 20030082729 A KR20030082729 A KR 20030082729A
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- South Korea
- Prior art keywords
- chamber
- light
- light source
- transparent window
- exposure system
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- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 14
- 230000001678 irradiating effect Effects 0.000 claims abstract description 9
- 238000007789 sealing Methods 0.000 claims abstract description 5
- 230000003287 optical effect Effects 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000000712 assembly Effects 0.000 description 4
- 238000000429 assembly Methods 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
Abstract
본 발명은 단일의 광 어셈블리를 사용하면서도 기판상에 광을 고르게 조사하도록 하여, 생산 비용을 감축할 수 있는 노광 시스템을 개시한다. 개시된 본 발명의 노광 시스템은, LCD용 기판을 노광시키기 위한 공정이 진행되는 공간을 한정하며, 천정 부위가 오픈된 챔버와, 상기 오픈된 챔버의 천정 부위를 밀폐시키는 투명 창, 및 상기 챔버 상부에 소정 거리 이격되도록 배치되며, 소정 방향으로 이동하면서 상기 챔버내로 광을 조사하는 광 어셈블리를 포함한다.The present invention discloses an exposure system capable of evenly irradiating light onto a substrate while using a single light assembly, thereby reducing production costs. The disclosed exposure system of the present invention defines a space in which a process for exposing an LCD substrate is performed, and includes a chamber in which a ceiling part is opened, a transparent window sealing the ceiling part of the open chamber, and an upper portion of the chamber. It is arranged to be spaced apart a predetermined distance, and includes a light assembly for irradiating light into the chamber while moving in a predetermined direction.
Description
본 발명은 노광 시스템에 관한 것으로, 보다 구체적으로는 LCD(liquid crystal display) 제조용 노광 시스템의 광원 구조에 관한 것이다.The present invention relates to an exposure system, and more particularly to a light source structure of an exposure system for manufacturing a liquid crystal display (LCD).
현재, 액정 표시 장치(liquid crystal display)와 같은 평판 디스플레이 장치는 퍼스널 컴퓨터, 나아가 텔레비전에 이르기까지 다양한 영역으로 이용분야가 확대되고 있다. 이러한 액정 표시 장치는 알려진 바와 같이 TFT(Thin filmtransistor) 및 화소 전극이 형성되는 하부 기판과, 컬러 필터 및 공통 전극이 형성되는 상부 기판 및 그 사이의 액정층으로 구성된다. 여기서, 각 기판상에 배치되는 각 구성 요소 예를들어, TFT, 화소 전극 및 컬러 필터들은 공지의 포토리소그라피 공정에 의하여 제작되고 있다.Currently, flat panel display devices, such as liquid crystal displays, have been widely used in various fields ranging from personal computers to televisions. The liquid crystal display is, as is known, composed of a lower substrate on which a thin film transistor (TFT) and a pixel electrode are formed, an upper substrate on which a color filter and a common electrode are formed, and a liquid crystal layer therebetween. Here, each component disposed on each substrate, for example, a TFT, a pixel electrode, and color filters, is manufactured by a known photolithography process.
여기서, 상기한 포토리소그라피 공정이 진행되는 LCD용 노광 시스템을 도 1을 참조하여 설명하도록 한다.Here, a description will be given of an LCD exposure system in which the photolithography process is performed with reference to FIG. 1.
도 1에 도시된 바와 같이, 노광 공정이 진행되는 챔버(10) 하부에 LCD용 기판(15)을 지지하는 지지대(20)가 구비된다. 지지대(20) 상부에는 LCD용 기판(15)과 마주하도록 포토 마스크(레티클:25)가 배치된다. 이때, 포토 마스크(25)는 수개의 광차단 패턴(25a)을 포함할 수 있다. 챔버(10) 상부 외벽 표면에는 수개의 광 어셈블리(30)가 배치된다. 광 어셈블리(30)는 광원(35)과, 광원(35)을 둘러싸는 하우징(housing:37)과, 하우징(37)과 챔버(10)의 상부 외벽 사이에 개재되며 챔버(10)의 외벽을 밀폐하는 투명 윈도우(39)를 포함한다. 이때, 하나의 노광 시스템에 수개의 광 어셈블리(30)가 필요한 것은, LCD용 기판(15) 및 포토 마스크(25)가 반도체 디바이스 보다 대형이므로, 대형의 LCD용 기판(15)에 동시에 고른 광을 조사하기 위함이다.As shown in FIG. 1, a support 20 for supporting the LCD substrate 15 is provided under the chamber 10 where the exposure process is performed. A photo mask (reticle) 25 is disposed on the support 20 to face the LCD substrate 15. In this case, the photomask 25 may include several light blocking patterns 25a. Several light assemblies 30 are disposed on the upper outer wall surface of the chamber 10. The light assembly 30 is interposed between the light source 35, the housing 37 surrounding the light source 35, the housing 37 and the upper outer wall of the chamber 10, and defines the outer wall of the chamber 10. It includes a transparent window 39 for sealing. At this time, several optical assemblies 30 are required in one exposure system because the LCD substrate 15 and the photomask 25 are larger than the semiconductor device, so that light uniformly applied to the large LCD substrate 15 at the same time can be obtained. To investigate.
그러나, 상기한 광 어셈블리(30)중 광원의 하우징(37)이 매우 고가이므로, 다수의 광 어셈블리(30)를 노광 시스템(50)에 장착하게 되면, 비용이 상승하게 되는 문제점이 있다.However, since the housing 37 of the light source of the above light assembly 30 is very expensive, when the plurality of light assemblies 30 are mounted to the exposure system 50, the cost increases.
따라서, 본 발명이 이루고자 하는 기술적 과제는, 단일의 광 어셈블리를 사용하면서도 기판상에 광을 고르게 조사하도록 하여, 비용을 감축할 수 있는 노광 시스템을 제공하는 것이다.Therefore, the technical problem to be achieved by the present invention is to provide an exposure system that can reduce the cost by evenly irradiating light onto the substrate while using a single light assembly.
도 1은 일반적인 노광 시스템을 나타낸 단면도이다.1 is a cross-sectional view showing a general exposure system.
도 2는 본 발명에 따른 노광 시스템을 나타낸 단면도이다.2 is a cross-sectional view of an exposure system according to the present invention.
도 3은 본 발명의 노광 시스템의 상면도이다.3 is a top view of the exposure system of the present invention.
(도면의 주요 부분에 대한 부호의 설명)(Explanation of symbols for the main parts of the drawing)
100 : 챔버 110 : LCD용 기판100: chamber 110: LCD substrate
120 : 지지대 130 : 포토 마스크120: support 130: photo mask
140 : 투명창 150 : 광 어셈블리140: transparent window 150: light assembly
154 : 하우징 158 : 이송부154: housing 158: transfer part
본 발명의 목적과 더불어 그의 다른 목적 및 신규한 특징은, 본 명세서의 기재 및 첨부 도면에 의하여 명료해질 것이다.Other objects and novel features as well as the objects of the present invention will become apparent from the description of the specification and the accompanying drawings.
본원에서 개시된 발명중, 대표적 특징의 개요를 간단하게 설명하면 다음과 같다.Among the inventions disclosed herein, an outline of representative features is briefly described as follows.
본 발명의 일 실시예에 따른 노광 시스템은, 노광 공정이 진행되는 공간을 한정하는 챔버, 및 상기 챔버 상부에 배치되며, 소정 방향으로 이동하면서 상기 챔버내에 광을 조사하는 광 어셈블리를 포함한다.An exposure system according to an embodiment of the present invention includes a chamber defining a space in which an exposure process is performed, and an optical assembly disposed above the chamber and irradiating light into the chamber while moving in a predetermined direction.
이러한 챔버는, 노광 처리될 기판을 지지하는 지지대와, 상기 지지대 상부에 패턴 형상을 부여하기 위한 포토 마스크를 구비한다. 아울러, 상기 챔버의 상부 천정 부분은 상기 광 어셈블리로부터 광이 조사될 수 있도록 투명한 창을 구비한다.The chamber includes a support for supporting a substrate to be exposed and a photo mask for imparting a pattern shape on the support. In addition, the upper ceiling portion of the chamber has a transparent window so that light can be irradiated from the light assembly.
또한, 광 어셈블리는, 광원과, 상기 광원을 둘러싸는 광원 하우징, 상기 광원 하우징 저면에 위치한 투명 윈도우 및 상기 광 어셈블리를 소정 방향 즉 광 투과 방향에 직각을 이루는 방향으로 왕복 이송시키는 이송 수단을 포함한다. 이때, 상기 광 어셈블리는 이송이 용이하도록 상기 챔버와 소정거리 만큼 이격 설치되는 것이 바람직하다.The optical assembly also includes a light source, a light source housing surrounding the light source, a transparent window positioned on the bottom of the light source housing, and transfer means for reciprocating the light assembly in a direction perpendicular to a predetermined direction, ie, a light transmission direction. . In this case, the optical assembly is preferably spaced apart from the chamber by a predetermined distance to facilitate the transfer.
또한, 본 발명의 다른 실시예에 따른 노광 시스템은, LCD용 기판을 노광시키기 위한 공정이 진행되는 공간을 한정하며, 천정 부위가 오픈된 챔버와, 상기 오픈된 챔버의 천정 부위를 밀폐시키는 투명창, 및 상기 챔버 상부에 소정 거리 이격되도록 배치되며, 소정 방향으로 이동하면서 상기 챔버내로 광을 조사하는 광 어셈블리를 포함한다.In addition, the exposure system according to another embodiment of the present invention, limiting the space in which the process for exposing the substrate for the LCD proceeds, the transparent window for sealing the chamber and the ceiling of the open chamber and the ceiling of the open chamber And an optical assembly disposed above the chamber to be spaced a predetermined distance apart and irradiating light into the chamber while moving in a predetermined direction.
(실시예)(Example)
이하 첨부한 도면에 의거하여 본 발명의 바람직한 실시예를 설명하도록 한다. 그러나, 본 발명의 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 발명의 범위가 아래에서 상술하는 실시예들로 인해 한정되어지는 것으로 해석되어져서는 안 된다. 본 발명의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 발명을 보다 완전하게 설명하기 위해서 제공되어지는 것이다. 따라서, 도면에서의 요소의 형상 등은 보다 명확한 설명을 강조하기 위해서 과장되어진 것이며, 도면상에서 동일한 부호로 표시된 요소는 동일한 요소를 의미한다.Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings. However, embodiments of the present invention may be modified in many different forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. Embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art. Accordingly, the shape and the like of the elements in the drawings are exaggerated to emphasize a more clear description, and the elements denoted by the same reference numerals in the drawings means the same elements.
도 2는 본 발명에 따른 노광 시스템을 나타낸 단면도이고, 도 3은 본 발명에 따른 노광 시스템의 상면도이다.2 is a cross-sectional view of an exposure system according to the present invention, and FIG. 3 is a top view of the exposure system according to the present invention.
먼저, 도 2에 도시된 바와 같이, 노광이 진행되는 챔버(100) 하부에 LCD용 기판(110)을 안착,지지하는 지지대(120)가 구비된다. 이때, LCD용 기판(110)은 예를들어 유리 기판일 수 있으며, 노출된 표면에는 패턴 예정층(도시되지 않음)과 포토 레지스트막(도시되지 않음)이 순차적으로 피복되어 있다. 또한, 챔버(100)는 LCD용 기판의 노광 공정이 진행될 공간을 한정하는 역할을 하며, 그 천정 부분은 오픈되어 있다.First, as shown in FIG. 2, a support 120 for mounting and supporting the LCD substrate 110 is provided under the chamber 100 where the exposure is performed. In this case, the LCD substrate 110 may be, for example, a glass substrate, and a pattern predetermined layer (not shown) and a photoresist film (not shown) are sequentially coated on the exposed surface. In addition, the chamber 100 serves to define a space where the exposure process of the LCD substrate is to be performed, and the ceiling part is open.
챔버(100) 내부의 공간에, 기판(110) 표면과 일정 거리를 두고 대향되도록 포토 마스크(130)가 배치된다. 포토 마스크(130)는 포토 레지스트막을 선택적으로 노광시키기 위한 수개의 광차단 패턴(130a)을 포함한다. 이 광차단 패턴(130a)은 LCD용 기판(110)과 대향하는 포토 마스크(130) 표면에 배치된다.In the space inside the chamber 100, the photo mask 130 is disposed to face the surface of the substrate 110 at a predetermined distance. The photo mask 130 includes several light blocking patterns 130a for selectively exposing the photoresist film. The light blocking pattern 130a is disposed on the surface of the photo mask 130 facing the LCD substrate 110.
챔버(100)의 천정 부분에는 투명창(140)이 설치된다. 투명창(140)은 도 3에 도시된 바와 같이 챔버(100) 천정 부분의 오픈된 영역을 모두 차폐할 수 있도록 플레이트(plate) 형상으로 형성되어, 챔버(100) 내부를 밀폐한다. 이때, 투명창(140)은 광투과 물질 예를들어, 석영 물질로 형성될 수 있다.The transparent window 140 is installed at the ceiling of the chamber 100. As shown in FIG. 3, the transparent window 140 is formed in a plate shape to shield all the open areas of the ceiling portion of the chamber 100, thereby sealing the inside of the chamber 100. In this case, the transparent window 140 may be formed of a light transmitting material, for example, a quartz material.
챔버(100)의 상부에 단일의 광 어셈블리(150)가 설치된다. 광 어셈블리(150)는 광원(152), 광원(154)을 둘러싸는 하우징(154) 및 하우징(154) 저면에 설치된 투명 윈도우(156)를 포함하고, 상기 광 어셈블리(150)를 소정 방향으로 왕복 이동시키는 이송부(158)를 더 포함한다. 이때, 본 발명의 광 어셈블리(150)는 종래의 개별 광 어셈블리(150)와 그 크기는 동일할 수 있지만, 이송부(158)의 장착으로 왕복 이송이 가능하다. 이에따라, LCD용 기판(110) 전면에 고르게 광을 조사할 수 있다. 아울러, 광 어셈블리(150)는 챔버(100)와 별도로, 즉, 일정 거리를 가지고 배치되어, 자유자재로 이송이 가능하다. 이때, 광 어셈블리(150)의 저면과, 챔버(100) 천정 부위는 투명 물질로 되어 있으므로, 광이 흡수됨이 없이 광 조사가 용이하다.A single light assembly 150 is installed on the top of the chamber 100. The light assembly 150 includes a light source 152, a housing 154 surrounding the light source 154, and a transparent window 156 installed on the bottom of the housing 154, and reciprocating the light assembly 150 in a predetermined direction. It further includes a transfer unit 158 for moving. At this time, the optical assembly 150 of the present invention may be the same size as the conventional individual optical assembly 150, but can be reciprocated by the mounting of the transfer unit 158. Accordingly, light may be evenly applied to the entire surface of the LCD substrate 110. In addition, the optical assembly 150 is disposed separately from the chamber 100, that is, having a predetermined distance, it is possible to transfer freely. At this time, since the bottom surface of the light assembly 150 and the ceiling portion of the chamber 100 are made of a transparent material, light irradiation is easy without light being absorbed.
이러한 본 발명의 노광 시스템(200)은 다음과 같이 동작한다.The exposure system 200 of the present invention operates as follows.
광 어셈블리(150)는 이송부(158)에 의하여 일정 방향 예를들어 기판의 장방향으로 이동되면서 챔버(100) 내부로 광을 조사한다. 이때, 이송부(158)는 일정 속도를 가지고 광 어셈블리(150)를 이동시키므로써, 광원(152)으로부터 챔버(110)내의 포토 마스크(130)에 고르게 광을 조사하게 한다. 또한, 광 어셈블리(150)의 저면에는 투명한 윈도우(156)가 구비되어 있고, 챔버의 천정 부분에도 투명창(140)이 설치되었으므로, 광 조사시 광이 흡수됨이 없이 포토 마스크(130)에 전달된다. 그후, 포토 마스크(130)에 도달된 광은 광차단 패턴(130a)에 의하여 일부 흡수 및 일부 통과되어, LCD용 기판(110)에 고르게 광이 전달된다.The light assembly 150 irradiates light into the chamber 100 while being moved in a predetermined direction, for example, in the long direction of the substrate by the transfer unit 158. In this case, the transfer unit 158 moves the light assembly 150 at a constant speed, thereby uniformly radiating light from the light source 152 to the photo mask 130 in the chamber 110. In addition, since the transparent window 156 is provided at the bottom of the light assembly 150 and the transparent window 140 is also installed at the ceiling of the chamber, the light is transmitted to the photo mask 130 without being absorbed when irradiated with light. . Thereafter, the light reaching the photo mask 130 is partially absorbed and partially passed by the light blocking pattern 130a, and the light is evenly transmitted to the LCD substrate 110.
이때, 광 어셈블리(150)가 움직이면서 광을 조사하므로써, 하나의 광 어셈블리(150)만으로도 충분히 노광이 가능하다. 이에따라, 광 어셈블리(150)를 추가로 장착할 필요가 없으므로, 비용이 크게 절감된다.At this time, by irradiating light while the light assembly 150 moves, only one light assembly 150 can be sufficiently exposed. Accordingly, there is no need to additionally mount the optical assembly 150, so the cost is greatly reduced.
이상에서 자세히 설명한 바와 같이, 본 발명에 의하면, 챔버 상부에 이송부를 구비하여 왕복 이동이 가능한 단일의 광 어셈블리를 설치한다. 이에따라, 노광 공정시 광 어셈블리를 이송시키면서 노광하므로써, 광 어셈블리의 수를 감소시킬 수 있다. 이에따라, 고가를 갖는 다수개의 하우징이 요구되지 않으므로, 노광 시스템의 생산 비용을 크게 감소시킬 수 있다.As described in detail above, according to the present invention, a single optical assembly capable of reciprocating is provided with a transfer part in the upper portion of the chamber. Accordingly, the number of light assemblies can be reduced by exposing while transporting the light assembly during the exposure process. Accordingly, since a large number of expensive housings are not required, the production cost of the exposure system can be greatly reduced.
이상 본 발명을 바람직한 실시예를 들어 상세하게 설명하였으나, 본 발명은 상기 실시예에 한정되지 않고, 본 발명의 기술적 사상의 범위 내에서 당 분야에서 통상의 지식을 가진 자에 의하여 여러가지 변형이 가능하다.Although the present invention has been described in detail with reference to preferred embodiments, the present invention is not limited to the above embodiments, and various modifications may be made by those skilled in the art within the scope of the technical idea of the present invention. .
Claims (6)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
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| KR1020020021190A KR20030082729A (en) | 2002-04-18 | 2002-04-18 | Exposure system |
| CNB031093760A CN1229694C (en) | 2002-04-18 | 2003-04-08 | Exposure system |
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| Application Number | Priority Date | Filing Date | Title |
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| KR1020020021190A KR20030082729A (en) | 2002-04-18 | 2002-04-18 | Exposure system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20170016286A (en) * | 2015-08-03 | 2017-02-13 | 도오꾜오까고오교 가부시끼가이샤 | Uv irradiation apparatus and uv irradiation method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100578262B1 (en) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | Large area mask fixing device using vacuum, exposure device and exposure method using the same |
| CN100399139C (en) * | 2006-06-22 | 2008-07-02 | 友达光电股份有限公司 | Exposure machine and exposure system |
| CN102402131A (en) * | 2011-11-11 | 2012-04-04 | 深南电路有限公司 | Exposure system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06177093A (en) * | 1992-12-07 | 1994-06-24 | Matsushita Electric Ind Co Ltd | Semiconductor manufacturing apparatus |
| JPH1010482A (en) * | 1996-06-25 | 1998-01-16 | Sharp Corp | Thermostatic chamber |
| KR20010044059A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Electron cyclotron resonance ashing apparatus for processing glass substrate or waper |
| KR20010044057A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Left-right driving type ultraviolet rays irradiating apparatus having quartz dividing plate |
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2002
- 2002-04-18 KR KR1020020021190A patent/KR20030082729A/en not_active Application Discontinuation
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06177093A (en) * | 1992-12-07 | 1994-06-24 | Matsushita Electric Ind Co Ltd | Semiconductor manufacturing apparatus |
| JPH1010482A (en) * | 1996-06-25 | 1998-01-16 | Sharp Corp | Thermostatic chamber |
| KR20010044059A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Electron cyclotron resonance ashing apparatus for processing glass substrate or waper |
| KR20010044057A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Left-right driving type ultraviolet rays irradiating apparatus having quartz dividing plate |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20170016286A (en) * | 2015-08-03 | 2017-02-13 | 도오꾜오까고오교 가부시끼가이샤 | Uv irradiation apparatus and uv irradiation method |
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| CN1452013A (en) | 2003-10-29 |
| CN1229694C (en) | 2005-11-30 |
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