CN1229694C - Exposure system - Google Patents
Exposure system Download PDFInfo
- Publication number
- CN1229694C CN1229694C CNB031093760A CN03109376A CN1229694C CN 1229694 C CN1229694 C CN 1229694C CN B031093760 A CNB031093760 A CN B031093760A CN 03109376 A CN03109376 A CN 03109376A CN 1229694 C CN1229694 C CN 1229694C
- Authority
- CN
- China
- Prior art keywords
- darkroom
- lighting fixture
- exposure system
- light source
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR200221190 | 2002-04-18 | ||
KR1020020021190A KR20030082729A (en) | 2002-04-18 | 2002-04-18 | Exposure system |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1452013A CN1452013A (en) | 2003-10-29 |
CN1229694C true CN1229694C (en) | 2005-11-30 |
Family
ID=29244748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031093760A Expired - Fee Related CN1229694C (en) | 2002-04-18 | 2003-04-08 | Exposure system |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20030082729A (en) |
CN (1) | CN1229694C (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100578262B1 (en) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | Apparatus for fixing mask by vacuum and exposure method of the same |
CN100399139C (en) * | 2006-06-22 | 2008-07-02 | 友达光电股份有限公司 | Exposure machine and exposure system |
CN102402131A (en) * | 2011-11-11 | 2012-04-04 | 深南电路有限公司 | Exposure system |
JP6596257B2 (en) * | 2015-08-03 | 2019-10-23 | 東京応化工業株式会社 | Ultraviolet irradiation apparatus and ultraviolet irradiation method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06177093A (en) * | 1992-12-07 | 1994-06-24 | Matsushita Electric Ind Co Ltd | Semiconductor manufacturing apparatus |
JPH1010482A (en) * | 1996-06-25 | 1998-01-16 | Sharp Corp | Thermostatic chamber |
KR20010044059A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Electron cyclotron resonance ashing apparatus for processing glass substrate or waper |
KR20010044057A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Left-right driving type ultraviolet rays irradiating apparatus having quartz dividing plate |
-
2002
- 2002-04-18 KR KR1020020021190A patent/KR20030082729A/en not_active Application Discontinuation
-
2003
- 2003-04-08 CN CNB031093760A patent/CN1229694C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1452013A (en) | 2003-10-29 |
KR20030082729A (en) | 2003-10-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140228 |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140228 Address after: Gyeonggi Do Lingtong paldal Gu Dong 1009-1 N3. Tada Building 8 Patentee after: Display Mfg. Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Mfg. Service Co., Ltd. |
|
TR01 | Transfer of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20051130 Termination date: 20190408 |
|
CF01 | Termination of patent right due to non-payment of annual fee |