CN100399139C - Exposure machine and exposure system - Google Patents
Exposure machine and exposure system Download PDFInfo
- Publication number
- CN100399139C CN100399139C CNB2006100940972A CN200610094097A CN100399139C CN 100399139 C CN100399139 C CN 100399139C CN B2006100940972 A CNB2006100940972 A CN B2006100940972A CN 200610094097 A CN200610094097 A CN 200610094097A CN 100399139 C CN100399139 C CN 100399139C
- Authority
- CN
- China
- Prior art keywords
- platform
- exposure
- display panels
- exposure machine
- conveying device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Abstract
The present invention relates to an exposure machine which is used for exposing at least one first LCD panel and one second LCD panel. The present invention comprises a body, at least one first exposure source and one second exposure source, wherein the body has at least one first platform and one second platform, the second platform is positioned under the first platform, and the first LCD panel and the second LCD panel are separately arranged on the first platform and the second platform. The first exposure source and the second exposure source are separately arranged above the first platform and the second platform to separately expose the first LCD panel and the second LCD panel.
Description
Technical field
The present invention relates to a kind of exposure machine and exposure system, and particularly relate to a kind of exposure machine and exposure system of the exposure of layering simultaneously multi-disc display panels.
Background technology
In recent years LCD (liquid crystal display, technology LCD) is progressive fast, for the key parameter of liquid crystal indicator quality, for example improved space is there's no one who doesn't or isn't actively sought in reaction time, visual angle, brightness, contrast etc.
In view of this, auto polymerization macromolecule auxiliary ligand is to (polymer stabilized alignment, PSA) after technology is suggested to, since the display panels of this technology manufacturing have fast-response time, with great visual angle, advantage such as high aperture (high-luminous-efficiency), high contrast and technology is simple, since open, be subjected to suitable attention always, be regarded as to become the mainstream technology in the liquid crystal indicator of future generation market.
And in the PSA technology, it is mainly at multi-zone vertical alignment nematic (multi-domain vertical aligned, MVA) add micro-response type monomer (reactive monomer) in the type liquid crystal, and under the irradiation that applies voltage and ultraviolet light (UV light), the response type monomer can the concurrent looks segregation phenomenon of polymerization reaction take place.When polymerizable molecular is piled up at the interface, because polymerizable molecular is with the interaction force of liquid crystal molecule between, make polymerizable molecular arrange and pile up, thereby make the liquid crystal molecule in the panel on certain orientation, have tilt angle (pre-tile angle) along the liquid crystal molecule direction.And this tilt angle is except the toppling direction of decision display panels liquid crystal molecule by driven time the, the also light transmission capacity of direct relation liquid crystal molecule under different driven.
Yet if when applying voltage and UV light exposure technology for the first time, monomer is complete reaction not, and the monomer that residues in the panel is subjected to further reaction under the extraneous irradiate light easily.To have influence on the tilt angle of liquid crystal molecule thus, cause tilt angle local distribution inequality, and have panel optical property instability and ghost problems such as (image sticking) to take place.And the ghost of this type that is taken place, mainly be because due to the liquid crystal molecule tilt angle difference, be can't be restorative flaw, and in panel shows, very easily be found especially, under the quality requirements more and more harsh in the face of display panels, will become the mainstream technology with practicality and volume production but this type is added the LCD Technology of response type monomer, the ghost problem that solves because of micro-monomer residue caused is inevitable.
Summary of the invention
In view of this, purpose of the present invention is exactly in that a kind of exposure machine and exposure system are provided, and in photochemically reactive mode, the residual monomer in the display panels that adds the response type monomer can complete reaction be finished.
According to purpose of the present invention, a kind of exposure machine is proposed, be used at least one first display panels and one second display panels are exposed, comprise a body and at least one first exposure source and one second exposure source.Body has at least one first platform and one second platform, and second platform is positioned under first platform, and first display panels and second display panels are placed in respectively on first platform and second platform.First exposure source and second exposure source are arranged at respectively on first platform and second platform, in order to first display panels and second display panels of exposing respectively.
According to purpose of the present invention, a kind of exposure system is proposed, comprise a plurality of platforms, a plurality of display panels and at least one exposure source.A plurality of platforms are positioned on the Different Plane, and a plurality of display panels are arranged on the platform.At least one exposure source is arranged at the platform top, in order to the display panels that exposes respectively.
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, following conjunction with figs. and preferred embodiment are to illustrate in greater detail the present invention.
Description of drawings
Figure 1A illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention one;
Figure 1B illustrates the synoptic diagram of the another kind of exposure machine of the embodiment of the invention one;
Fig. 2 illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention two;
Fig. 3 illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention three; And
Fig. 4 illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention four.
The simple symbol explanation
10,40: the one LCD panels
20,50: the two LCD panels
30,60: the three LCD panels
100,100a, 200,300,400: exposure machine
110,210,310,410: body
112,212,312,412: the first platforms
114,214,314,414: the second platforms
116,216,316,416: the three platforms
120,220,320,420: the first exposure sources
130,230,330,430: the second exposure sources
140,240,340,440: the three exposure sources
150,350,450: attemperating unit
312a, 412a: first conveying device
312b, 314b, 316b: partition wall
314a, 414a: second conveying device
316a, 416a: the 3rd conveying device
320a: the first sub-exposure source
320b: the second sub-exposure source
320c: the 3rd sub-exposure source
470a, 470b: transfer device
Embodiment
The invention provides exposure machine and system with a plurality of platforms, each platform is positioned on the Different Plane.The multi-disc display panels is arranged on the platform and exposes, and exposure source is arranged at each platform top, in order to the display panels that exposes respectively.Below do explanation with different embodiment respectively.
Embodiment one
Please refer to Figure 1A, it illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention one.Exposure machine 100 comprises body 110 and first exposure source 120, second exposure source 130 and the 3rd exposure source 140.First exposure source 120, second exposure source 130 and the 3rd exposure source 140 can independently be opened respectively or close, and comprise a plurality of ultraviolet lamps (UV lamp) respectively.The wavelength coverage of the light wave that ultraviolet lamp produced is beneficial to monomer and reacts between 300 nanometers (nm)～400nm.Body 110 has first platform 112, second platform 114 and the 3rd platform 116.Second platform 114 is positioned under first platform 112, and the 3rd platform 116 is positioned at again under second platform 114, and first platform 112, second platform 114 and the 3rd platform 116 are parallel to the ground in fact.The one LCD panel 10, the 2nd LCD panel 20 and the 3rd LCD panel 30 are placed in respectively on first platform 112, second platform 114 and the 3rd platform 116, in addition, can place a plurality of LCD panels on first platform 112, second platform 114 or the 3rd platform 116, the present invention does not limit to.First exposure source 120, second exposure source 130 and the 3rd exposure source 140 are arranged at respectively on first platform 112, second platform 114 and the 3rd platform 116, in order to a LCD panel 10, the 2nd LCD panel 20 and the 3rd LCD panel 30 of exposing respectively.Because exposure machine 100 adopts the vertical demixing structure to carry out exposure technology, exposes in the plane compared with tradition and can save many spaces.Can be in the limited factory building of floor area the more LCD panel of exposure quantity, and the monomer complete reaction that can provide the longer time shutter to be beneficial to be doped in the liquid crystal finishes, and reduces the probability that ghost takes place.
In addition, exposure machine 100 also comprises attemperating unit 150, the temperature range of may command the one LCD panel 10, the 2nd LCD20 panel and the 3rd LCD panel 30 or is preferably controlled temperature range between 25 ℃～60 ℃ between-20 ℃～120 ℃, be beneficial to the reaction of monomer.
Please refer to Figure 1B, it illustrates the synoptic diagram of the another kind of exposure machine of the embodiment of the invention one.The main difference part of exposure machine 100a and exposure machine 100 is to increase voltage and applies module 160, and all the other and exposure machine 100 components identical continue to continue to use its label.Voltage applies module 160 and comprises first voltage bringing device 162, second voltage bringing device 164 and tertiary voltage bringing device 166, can apply voltage to a LCD panel 10, the 2nd LCD panel 20 and the 3rd LCD panel 30 respectively.Therefore exposure machine 100a can apply simultaneously that voltage exposes and do not apply the technology that voltage exposes, and this is that traditional single machine can't be accomplished.And the exposure machine 100 of present embodiment and 100a are not restricted to three layers, and the quantity of layering can be looked the actual needs design, does not influence scope of the present invention.In addition, first voltage bringing device 162, second voltage bringing device 164 and the tertiary voltage bringing device 166 of corresponding first platform 112, second platform 114 and the 3rd platform 116 can or apply a voltage to a plurality of LCD panels that are positioned on first platform 112, second platform 114 and the 3rd platform 116 respectively one by one in order to the while respectively.
Embodiment two
Please refer to Fig. 2, it illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention two.The main difference part of the exposure machine 100a of exposure machine 200 and embodiment one, first platform 212, second platform 214, the 3rd platform 216 that are body 210 are perpendicular to the ground in fact, and a LCD panel 10, the 2nd LCD panel 20 and the 3rd LCD panel 30 are arranged at respectively on first platform 212, second platform 214 and the 3rd platform 216 and expose with first exposure source 220, second exposure source 230 and the 3rd exposure source 240.All the other and exposure machine 100a components identical continue to continue to use label and no longer describe its function.
Embodiment three
Please refer to Fig. 3, it illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention three.The main difference part of the exposure machine 100a of exposure machine 300 and embodiment one, be also to comprise the first conveying device 312a, the second conveying device 314a and the 3rd conveying device 316a respectively in this first platform 312, second platform 314 and the 3rd platform 316, in order to carry a LCD panel 40, the 2nd LCD panel 50 and the 3rd LCD panel 60 respectively.The first conveying device 312a, the second conveying device 314a and the 3rd conveying device 316a comprise that respectively a plurality of rollers are to drive the LCD panel in the present embodiment.Yet, also can adopt conveying belt to substitute roller carrying LCD panel.All the other and exposure machine 100a components identical continue to continue to use label and no longer describe its function.In addition, first voltage bringing device 162, second voltage bringing device 164 and the tertiary voltage bringing device 166 of the corresponding first conveying device 312a, the second conveying device 314a and the 3rd conveying device 316a can or apply a voltage to a plurality of LCD panels that are positioned on the first conveying device 312a, the second conveying device 314a and the 3rd conveying device 316a respectively one by one in order to the while respectively.
In addition, as shown in Figure 3, first platform 312, second platform 314 and the 3rd platform 316 correspondences are distinguished first～the 3rd subregion (not indicating), only stay for the LCD panel and carry the opening that passes through with partition wall 312b, 314b and 316b.Distinguish first～the 3rd sub-exposure source corresponding to first of each platform～the 3rd subregion and first exposure source 320, second exposure source 330 and the 3rd exposure source 340 are also corresponding.For example first, second, third of first exposure source 320 sub-exposure source 320a, 320b, 320c corresponds respectively to first of first platform 312～the 3rd subregion (indicating).Therefore on each platform, get final product the switch of subregion control exposure source, can be more flexibly in response to the demand of exposing on the technology.Certainly, the exposure machine 300 of present embodiment is not limited to only divide into three sub regions, can look actual needs and distinguish more subregion.
In addition, the attemperating unit 350 of present embodiment can be designed to be able to control respectively the temperature of LCD panel when first of each platform～the 3rd subregion, makes up to produce with sub-exposure source to have more multifarious exposure environment.And partition wall 312b, 314b, 316b preferably can adopt the material of heat insulation and/or anti-UV light, for example are acryl, macromolecular material, asbestos or nano material.First～the 3rd subregion can be considered a plurality of cavitys, and each cavity can independent temperature control, so attemperating unit need be connected to each cavity (not necessarily will be connected to the LCD panel).
Embodiment four
Please refer to Fig. 4, it illustrates the synoptic diagram of a kind of exposure machine of the embodiment of the invention four.The main difference part of exposure machine 400 and exposure machine 100a is that first platform 412, second platform 414 and the 3rd platform 416 form acute angle with ground in fact.And compare with exposure machine 300, first conveying device 412a of first platform 412 and second platform 414 and the throughput direction of the second conveying device 414a are respectively toward the lower-left and the bottom right, and the 3rd conveying device 416a of the 3rd platform 416 also carries toward the lower-left, therefore constitutes the transport path of one " it " font.Transmit the LCD panel and see through transfer device 470a between first platform 412 and second platform 414, also transmit the LCD panel between second platform 414 and the 3rd platform 416 by transfer device 470b.Transfer device 470a, 470b do explanation with rotating movable engagement plate in the present embodiment, yet can also transmit the LCD panel with jacking gear.Exposure machine 400 in the present embodiment can be delivered directly to orlop by the superiors with the LCD panel, and each platform can control the unlatching and the voltage application of exposure source respectively, produces flexile exposure environment.And the platform of visual actual needs design varying number is with the demand in response to technology.All the other and exposure machine 100a components identical continue to continue to use label and no longer narrate its function.
The various embodiments described above can individually or be combined to form exposure system, comprise a plurality of platforms, are positioned on the Different Plane; A plurality of display panels are arranged on those platforms; And exposure source at least, be arranged at those platforms tops, in order to those display panels that expose respectively.In addition, many exposure machines can form exposure system.
Disclosed exposure machine of the above embodiment of the present invention and exposure system are utilized UV light-emitting component composition UV exposure mechanism cheaply, and further are extended for the design of multiple field, and become the multiple field exposure system.Utilize this multiple field exposure system, can once carry out the half-finished exposure technology of multi-disc LCD panel, and can apply voltage and segmentation exposure respectively.Except can saving the technology cost and the device space, taking into account under the consideration of volume production time-histories, more plenty of time fully reacts by monomer, solves the optical property instability and the ghost problem of the display panels of response type monomer technology.
In sum; though the present invention discloses as above with preferred embodiment, yet it is not that those skilled in the art without departing from the spirit and scope of the present invention in order to qualification the present invention; can do a little change and retouching, thus protection scope of the present invention should with claim the person of being defined be as the criterion.
Claims (17)
1. an exposure machine is used at least one first display panels and one second display panels are exposed, and comprising:
Body has at least one first platform and one second platform, and this second platform is positioned under this first platform, and this first display panels and this second display panels are placed in respectively on this first platform and this second platform; And
At least one first exposure source and one second exposure source are arranged at respectively on this first platform and this second platform, in order to this first display panels and this second display panels of exposing respectively.
2. exposure machine as claimed in claim 1, wherein this first exposure source and this second exposure source can independently be opened or close.
3. exposure machine as claimed in claim 1, wherein this first exposure source and this second exposure source comprise at least one ultraviolet lamp respectively.
4. exposure machine as claimed in claim 3, wherein the wavelength coverage of the light wave that this ultraviolet lamp produced is between 300 nanometers～400nm.
5. exposure machine as claimed in claim 1 also comprises at least one first voltage bringing device and one second voltage bringing device, respectively in order to this first display panels and this second display panels are applied voltage.
6. exposure machine as claimed in claim 1 wherein also comprises first conveying device and second conveying device respectively in this first platform and this second platform, in order to carry this first display panels and this second display panels.
7. exposure machine as claimed in claim 6, wherein this first conveying device and this second conveying device comprise a plurality of rollers respectively.
8. exposure machine as claimed in claim 6, wherein this first conveying device and this second conveying device comprise conveying belt respectively.
9. exposure machine as claimed in claim 6, wherein this first conveying device and this second conveying device have different throughput directions.
10. exposure machine as claimed in claim 1 also comprises at least one transfer device, in order to transmit this first display panels to this second platform from this first platform.
11. exposure machine as claimed in claim 1, also comprise attemperating unit, wherein this first platform has at least one first subregion and one second subregion, and this attemperating unit has different temperatures in order to control when this first display panels is positioned at this first subregion and this second subregion.
12. exposure machine as claimed in claim 1 also comprises attemperating unit, in order to the temperature range of controlling this first display panels and this second display panels between-20 ℃～120 ℃.
13. exposure machine as claimed in claim 1 also comprises attemperating unit, in order to the temperature range of controlling this first display panels and this second display panels between 25 ℃～60 ℃.
14. exposure machine as claimed in claim 1, wherein this first platform and this second platform are parallel to the ground in fact.
15. exposure machine as claimed in claim 1, wherein this first platform and this second platform are perpendicular to the ground in fact.
16. exposure machine as claimed in claim 1, wherein this first platform and this second platform form acute angle with ground in fact.
17. an exposure system comprises:
A plurality of platforms are positioned on the Different Plane;
A plurality of display panels are arranged on those platforms; And
At least two exposure sources are arranged at those platform tops, in order to those display panels that expose respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100940972A CN100399139C (en) | 2006-06-22 | 2006-06-22 | Exposure machine and exposure system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100940972A CN100399139C (en) | 2006-06-22 | 2006-06-22 | Exposure machine and exposure system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1869780A CN1869780A (en) | 2006-11-29 |
| CN100399139C true CN100399139C (en) | 2008-07-02 |
Family
ID=37443477
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100940972A Active CN100399139C (en) | 2006-06-22 | 2006-06-22 | Exposure machine and exposure system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100399139C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102722054B (en) * | 2012-06-21 | 2016-01-06 | 深圳市华星光电技术有限公司 | A kind of light alignment method of liquid crystal material and device |
| CN106547150A (en) * | 2016-11-23 | 2017-03-29 | 惠科股份有限公司 | A kind of light reaction machine |
| CN111552123A (en) * | 2020-05-25 | 2020-08-18 | Tcl华星光电技术有限公司 | Ultraviolet irradiation device for liquid crystal alignment and ultraviolet irradiation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1452013A (en) * | 2002-04-18 | 2003-10-29 | 显像制造服务股份有限公司 | Exposure system |
| US6744511B1 (en) * | 1998-08-11 | 2004-06-01 | Nikon Corporation | Stage device having drive mechanism for driving a movable stage, and exposure apparatus and method of detecting position of the stage |
| CN1648729A (en) * | 2005-03-17 | 2005-08-03 | 友达光电股份有限公司 | Exposure device for exposure base plate and method of exposure panel |
| JP2006098774A (en) * | 2004-09-29 | 2006-04-13 | Nsk Ltd | Proximity exposure apparatus |
-
2006
- 2006-06-22 CN CNB2006100940972A patent/CN100399139C/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6744511B1 (en) * | 1998-08-11 | 2004-06-01 | Nikon Corporation | Stage device having drive mechanism for driving a movable stage, and exposure apparatus and method of detecting position of the stage |
| CN1452013A (en) * | 2002-04-18 | 2003-10-29 | 显像制造服务股份有限公司 | Exposure system |
| JP2006098774A (en) * | 2004-09-29 | 2006-04-13 | Nsk Ltd | Proximity exposure apparatus |
| CN1648729A (en) * | 2005-03-17 | 2005-08-03 | 友达光电股份有限公司 | Exposure device for exposure base plate and method of exposure panel |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1869780A (en) | 2006-11-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101329412A (en) | Tensioned optical element and display | |
| CN102628579B (en) | LGP, backlight module and display unit | |
| US20080192352A1 (en) | Optical diffuser film and light assembly | |
| EP2116873A2 (en) | Optical diffuser film with linear domains of varying diffusion | |
| US20130242605A1 (en) | Optical diffusing film and a liquid crystal display backlight using the same | |
| US20070242197A1 (en) | Transflective LC Display Having Backlight With Spatial Color Separation | |
| Meng et al. | Color-switchable liquid crystal smart window with multi-layered light guiding structures | |
| CN101581804A (en) | Tensioned optical element having crimping frame and spring | |
| CN102272666A (en) | Passive and hybrid daylight-coupled backlights for sunlight viewable displays | |
| TW200909943A (en) | Thin film bulk and surface diffuser | |
| CN100399139C (en) | Exposure machine and exposure system | |
| CN101251679B (en) | Optical device with self-supporting film assembly | |
| CN101021645A (en) | Liquid crystal display | |
| CN101392884A (en) | Optical element package, backlight unit and liquid crystal display | |
| CN111983866A (en) | Light modulation glass and preparation method thereof | |
| US7782420B2 (en) | Optical element covering member, backlight, and liquid crystal display device | |
| CN1474201A (en) | Optical element containing nano composite particles | |
| US8698789B2 (en) | Display apparatus including sub-light source groups | |
| JP2006079042A (en) | Light diffusion plate and mixture composition of polycarbonate and copolyester | |
| TWI410476B (en) | Polymer film without cholesteric liquid crystal, polymer film and reflective display module | |
| JP5166560B2 (en) | Method for producing polymer film having photonic crystal structure | |
| Kwon | A color‐filterless LCD with RGB LED and lenticular‐lens arrays | |
| CN102532567A (en) | Method for manufacturing polymeric membrane with photonic crystal structure | |
| US7850359B2 (en) | Optical film of a display, method for producing the same and said display | |
| TWI330763B (en) | Exposing apparatus and exposing system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |