CN1452013A - Exposure system - Google Patents

Exposure system Download PDF

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Publication number
CN1452013A
CN1452013A CN03109376A CN03109376A CN1452013A CN 1452013 A CN1452013 A CN 1452013A CN 03109376 A CN03109376 A CN 03109376A CN 03109376 A CN03109376 A CN 03109376A CN 1452013 A CN1452013 A CN 1452013A
Authority
CN
China
Prior art keywords
darkroom
lighting fixture
exposure system
light source
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN03109376A
Other languages
Chinese (zh)
Other versions
CN1229694C (en
Inventor
朴庸硕
赵汉范
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Weihai dianmei Shiguang electromechanical Co Ltd
Original Assignee
Display Manufacturing Services Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Display Manufacturing Services Co Ltd filed Critical Display Manufacturing Services Co Ltd
Publication of CN1452013A publication Critical patent/CN1452013A/en
Application granted granted Critical
Publication of CN1229694C publication Critical patent/CN1229694C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)

Abstract

An exposure system is provided to uniformly irradiate lights on a substrate even with a single optical assembly, accordingly the producing cost can be reduced. The exposure system includes a darkroom for providing a space for exposure process treatment of a LCD base plate, a top open, a transparency window for closing the top open to airproof the darkroom, and a lighting unit for spacing a fixed distance away from the top of the darkroom, and for transmitting the lights to the interior of the darkroom in one fixed direction.

Description

Exposure system
Technical field
The present invention is relevant with exposure system, especially, is related to a kind of light supply apparatus that exposure system inside is used to make liquid crystal display (LCD) device that is installed in.
Background technology
In recent years, flat-panel monitor, LCD (LCD) for example such as has been widely used in from PC to the TV at various fields.As everyone knows, LCD comprises a thin film transistor (TFT) (TFT) substrate, a color filter film substrate, and a liquid crystal layer therebetween.Wherein, be positioned at each element on the substrate, for example, a TFT, a pixel electrode, perhaps a color filter film all is to produce by known photoetching process.
Below in conjunction with Fig. 1 an exposure system that adopts photoetching process to make LCD is described in detail.
As shown in Figure 1, in the camera bellows bottom that will carry out exposure-processed a pedestal 20 that is used to support LCD substrate 15 is installed.A photomask 25 (a perhaps graticule (reticle)) is set and over against LCD substrate 15 on pedestal 20.Wherein, photomask 25 can comprise several photoresistance mould 25a.
Several lighting fixtures 30 are arranged on the top of darkroom 10 outside surfaces.Lighting fixture 30 comprises the frame 37 of 35, one ambient light sources of a light source, and the transparency window between frame 37 and outside surface top, darkroom, with the closed front in darkroom with the sealing darkroom.Wherein, an exposure system need be installed a plurality of lighting fixtures, and to the uniform light of LCD substrate 15 emissions, this substrate is greater than a common semiconductor substrate with simultaneously.
Yet because the included frame 37 cost costlinesses of lighting fixture 30, being provided with of a plurality of lighting fixtures 30 increased production cost.
Summary of the invention
The invention provides an exposure system, even under the situation that adopts single lighting fixture, by this exposure system, light also can be radiated on the substrate equably, thereby has reduced production cost.
An aspect of of the present present invention, the exposure system that is provided comprise a darkroom, and the space of carrying out the exposure technology process is provided, and a lighting fixture, and this accessory is arranged on the darkroom, and move with a direction of determining, so that emission light is to inside, darkroom.
The darkroom comprises that one is about to carry out the pedestal of the substrate of exposure-processed in order to support, and a photomask, is used to make the top Cheng Mo of pedestal.In addition, the top in darkroom comprises a transparency cover, and lighting fixture is by this transparency cover and to darkroom internal emission light.
Lighting fixture comprises a light source, the light source frame of an ambient light source, and a transparency window is arranged at the bottom of light source frame, and a mobile unit, makes the direction of lighting fixture to determine, i.e. the to-and-fro movement perpendicular to the direction of the light of being launched.Wherein, for ease of moving, preferably, lighting fixture and darkroom be the distance to determine at interval.
Corresponding to another aspect of the present invention, an exposure system is provided, comprise a darkroom, this darkroom has determined that one is carried out the space of exposure-processed to the LCD substrate, and has an open top, a transparency cover, the open top in sealing darkroom, with the sealing darkroom, and a lighting fixture, the top in this device and darkroom is the distance to determine at interval, and moves with the internal emission light to the darkroom with the direction of determining.
Description of drawings
In conjunction with the drawings and to the detailed description of its reference example, can make above and other characteristics of the present invention and advantage become clearer and more definite.
Figure 1 shows that the cross section view of exposure device commonly used;
Figure 2 shows that the cross section view of exposure system of the present invention;
Figure 3 shows that the top plan view of exposure system of the present invention.
Embodiment
Accompanying drawing in conjunction with the preferred embodiments will prove absolutely the present invention.But the present invention can implement with various forms, and the present invention should be interpreted as the situation that is confined to the embodiment that this paper proposes.In addition, provide this embodiment, and thought of the present invention is understood by technician's (being proficient in this leader's personnel) fully so that the present invention thoroughly discloses fully.In the accompanying drawings, for the purpose of clear, amplify the shape of element, and in different accompanying drawings, adopted identical reference number to represent similar elements.
At first, as shown in Figure 2, exposure system 200 comprises a darkroom 100.This darkroom has an open top, determines a space of LCD substrate 110 being carried out exposure-processed.A pedestal 120 in order to support LCD substrate 110, is installed within the darkroom 100.Wherein, LCD substrate 110 can adopt, for example, and a glass substrate, and comprise a film forming layer (end shows) and a photoresist layer (end shows), order is mounted thereon.
Position over against LCD substrate 110 within the darkroom is provided with a photomask 130, and with LCD substrate 110 fixed range at interval.Photomask 130 comprises a large amount of photoresistance mould 130a, is used for photoresist layer is exposed.Photoresistance mould 130a is arranged on the surface of photomask 130 position over against LCD substrate 110.
Transparency cover 140 is arranged at the top in darkroom and makes the darkroom sealing.Transparency cover 140 is made into sheet to hide the open top in darkroom 100.Wherein, transparency cover 140 for example can adopt light transmissive material such as right English and make.
Single lighting fixture 150 is set on darkroom 100.Lighting fixture 150 comprises the frame 154 of 152, one ambient light sources of a light source, and a transparency window 156 that is installed in frame 154 bottoms.Lighting fixture 150 and then comprise a mobile unit 158 can move back and forth on the direction of determining by these mobile unit 158 lighting fixtures 150.Wherein, although the equal and opposite in direction of the size of lighting fixture 150 and existing lighting fixture 150, lighting fixture 150 of the present invention can be moved by mobile unit 158.Therefore, light can shine the surface of whole LCD substrate 110 equably.And, because lighting fixture 150 is separated by with the distance of determining, so lighting fixture 150 can move freely with darkroom 100.Wherein, the top in the bottom of lighting fixture 150 and darkroom 100 is made by transparent material, helps the emission of light and does not absorb light.
Below will the course of work of exposure system 200 of the present invention be described.
Lighting fixture 150 moves with the direction of determining, for example, along the direction of substrate length, and emission light is to 100 inside, darkroom.Wherein, mobile unit 158 is with constant speed portable lamp electro-optical device 150, thus make lighting fixture 150 can be equably with irradiate light to the darkroom photomask 130 in 100.And owing to be provided with a transparency window 156 in the bottom of lighting fixture 150, light can shine on the photomask 130 and not be absorbed.After light arrived photomask 130, part light was absorbed by photoresistance mould 130a and the part transmission is gone out.Therefore, light is transferred to LCD substrate 110 equably.
Wherein, when lighting fixture 150 moves and launches light, only adopt a lighting fixture to be enough to expose.Therefore, owing to the lighting fixture 150 that does not need other are installed reduces cost greatly.
As mentioned above, corresponding to the present invention, an exposure system comprises a single lighting fixture with a mobile unit on the darkroom, and mobile unit allows lighting fixture to move back and forth.Therefore, exposure-processed can be carried out, and the number of lighting fixture can be reduced by the portable lamp electro-optical device.Owing to do not need to be provided with the frame of several costlinesses, so can reduce the production cost of exposure system greatly.
The present invention has given to specify in conjunction with its preferred embodiment, but those skilled in the art should be clear and definite, is not violating under the situation of the spirit and scope of the present invention that limited by following claim, can carry out the change of various forms and details to the present invention.

Claims (6)

1. an exposure system comprises:
A darkroom is defined as carrying out the space of exposure technology process, it is characterized in that this darkroom comprises a pedestal, in order to supporting the substrate that is about to exposure, and a photomask, in order to top Cheng Mo to pedestal; And
A lighting fixture is arranged on the darkroom and moves and launch light to inside, darkroom with the direction of determining.
2. exposure system as claimed in claim 1 is characterized in that, the top in darkroom comprises a transparency cover, lighting fixture by this transparency cover with light emission within the darkroom.
3. exposure system as claimed in claim 1 is characterized in that, lighting fixture comprises a light source, the light source frame of an ambient light source, a transparency window is positioned at the bottom of light source frame, and a mobile unit, makes lighting fixture with the to-and-fro movement perpendicular to the direction of emission light.
4. exposure system as claimed in claim 3 is characterized in that, lighting fixture and darkroom are provided with at interval with fixed range.
5. an exposure system comprises:
A darkroom is defined as the space of liquid crystal display substrate experience exposure-processed, and has an open top;
A transparency window, the open top in sealing darkroom is with the sealing darkroom; And
A lighting fixture is launched light to inside, darkroom with the top in darkroom at a distance of the distance of determining and with the direction of determining.
6. exposure system as claimed in claim 5 is characterized in that, lighting fixture comprises a light source, the light source frame of an ambient light source, a transparency window that is arranged at light source frame bottom, and a mobile unit move back and forth lighting fixture with fixing direction.
CNB031093760A 2002-04-18 2003-04-08 Exposure system Expired - Fee Related CN1229694C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR200221190 2002-04-18
KR1020020021190A KR20030082729A (en) 2002-04-18 2002-04-18 Exposure system

Publications (2)

Publication Number Publication Date
CN1452013A true CN1452013A (en) 2003-10-29
CN1229694C CN1229694C (en) 2005-11-30

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNB031093760A Expired - Fee Related CN1229694C (en) 2002-04-18 2003-04-08 Exposure system

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KR (1) KR20030082729A (en)
CN (1) CN1229694C (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100342284C (en) * 2003-11-13 2007-10-10 显示器生产服务株式会社 Mask supporting apparatus using vacuum and light exposing system, and method using the same
CN100399139C (en) * 2006-06-22 2008-07-02 友达光电股份有限公司 Exposure machine and exposure system
CN102402131A (en) * 2011-11-11 2012-04-04 深南电路有限公司 Exposure system

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6596257B2 (en) * 2015-08-03 2019-10-23 東京応化工業株式会社 Ultraviolet irradiation apparatus and ultraviolet irradiation method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06177093A (en) * 1992-12-07 1994-06-24 Matsushita Electric Ind Co Ltd Semiconductor manufacturing apparatus
JPH1010482A (en) * 1996-06-25 1998-01-16 Sharp Corp Thermostatic chamber
KR20010044059A (en) * 2000-06-29 2001-06-05 박용석 Electron cyclotron resonance ashing apparatus for processing glass substrate or waper
KR20010044057A (en) * 2000-06-29 2001-06-05 박용석 Left-right driving type ultraviolet rays irradiating apparatus having quartz dividing plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100342284C (en) * 2003-11-13 2007-10-10 显示器生产服务株式会社 Mask supporting apparatus using vacuum and light exposing system, and method using the same
CN100399139C (en) * 2006-06-22 2008-07-02 友达光电股份有限公司 Exposure machine and exposure system
CN102402131A (en) * 2011-11-11 2012-04-04 深南电路有限公司 Exposure system

Also Published As

Publication number Publication date
CN1229694C (en) 2005-11-30
KR20030082729A (en) 2003-10-23

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SE01 Entry into force of request for substantive examination
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ASS Succession or assignment of patent right

Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD.

Effective date: 20140228

TR01 Transfer of patent right

Effective date of registration: 20140228

Address after: Gyeonggi Do Lingtong paldal Gu Dong 1009-1 N3. Tada Building 8

Patentee after: Display Mfg. Service Co., Ltd.

Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd

Address before: Gyeonggi Do, South Korea

Patentee before: Display Mfg. Service Co., Ltd.

TR01 Transfer of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20051130

Termination date: 20190408

CF01 Termination of patent right due to non-payment of annual fee